EP3508285B1 - Matériau pour masque métallique, et procédé de fabrication de celui-ci - Google Patents

Matériau pour masque métallique, et procédé de fabrication de celui-ci Download PDF

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Publication number
EP3508285B1
EP3508285B1 EP17846646.2A EP17846646A EP3508285B1 EP 3508285 B1 EP3508285 B1 EP 3508285B1 EP 17846646 A EP17846646 A EP 17846646A EP 3508285 B1 EP3508285 B1 EP 3508285B1
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Prior art keywords
metal mask
mask material
rolling
less
sample
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EP17846646.2A
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German (de)
English (en)
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EP3508285A4 (fr
EP3508285A1 (fr
Inventor
Akihiro Omori
Takuya Okamoto
Yasuyuki Iida
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Proterial Ltd
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Hitachi Metals Ltd
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Publication of EP3508285A4 publication Critical patent/EP3508285A4/fr
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/46—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for sheet metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
    • B21B3/02—Rolling special iron alloys, e.g. stainless steel
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00—Heat treatment of ferrous alloys
    • C21D6/001—Heat treatment of ferrous alloys containing Ni
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/0068—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for particular articles not mentioned below
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working

Definitions

  • the present invention relates to a metal mask material and a production method therefor.
  • a metal mask is used for deposition on a substrate and generation of color patterning.
  • a method of performing etching processing on an Fe-Ni alloy thin plate is known as one of methods of forming an opening.
  • various methods have been proposed.
  • Patent Literature 1 describes a material for etching processing in which, in order to enable formation of a high-definition etching pattern, a surface roughness measured in a direction perpendicular to a rolling direction is Ra: 0.08 to 0.20 ⁇ m, a surface roughness measured in the rolling direction is Ra: 0.01 to 0.10 ⁇ m, and the surface roughness measured in a direction perpendicular to the rolling direction has a rough surface roughness Ra exceeding the surface roughness measured in the rolling direction by 0.02 ⁇ m.
  • Patent Literature 2 describes a metal mask material in which etching properties are improved by adjusting X-ray diffraction intensities of crystal orientations (111), (200), (220), and (311) on the rolled surface
  • Patent publication JP H09-209176 discloses a thin sheet for a metal mask, comprising an iron base alloy with 32-52% Ni.
  • the surface roughness in both longitudinal and perpendicular direction to the rolling direction is Ra: 0.08 ⁇ m or less, and Rz: 0.5 ⁇ m or less.
  • Patent Literature 1 and Patent Literature 2 are excellent inventions in consideration of improvement in etching processability, there is still room for further research for improving the adhesion at the same time.
  • An objective of the present invention is to provide a metal mask material in which change in shape after etching is minimized and which is suitable for obtaining favorable adhesion to a resist and etching processability and a production method therefor.
  • the inventors conducted extensive studies regarding various factors that influence etching processing such as a chemical composition, a surface roughness, and the residual stress. As a result, a configuration in which the adhesion to a resist can be improved and uniform etching processing is possible, and which is beneficial to minimize change in shape after etching has been found and thereby the present invention has been completed.
  • an aspect of the present invention is a metal mask material including, by mass%, C: 0.01% or less, Si: 0.5% or less, Mn: 1.0% or less, and Ni: 30 to 50%, with the balance being made up of Fe and inevitable impurities,
  • a skewness Rsk of the metal mask material in the rolling direction is smaller than a skewness Rsk of the metal mask material in the direction perpendicular to the rolling direction.
  • a surface roughness Ra of the metal mask material in the direction perpendicular to the rolling direction is larger than a surface roughness Ra of the metal mask material in the rolling direction.
  • an Rsk of the metal mask material in the direction perpendicular to the rolling direction is 1 or less.
  • an amount of warpage is 15 mm or less.
  • Another aspect of the present invention is a production method of a metal mask material by cold rolling a cold rolling material including, by mass%, C: 0.01% or less, Si: 0.5% or less, Mn: 1.0% or less, and Ni: 30 to 50%, with the balance being made up of Fe and inevitable impurities to obtain a metal mask material, wherein:
  • the bite angle of the rolling roller is 3.0° or less.
  • a rolling reduction ratio in the final pass of the finish cold rolling process is 15% to 35%.
  • a surface roughness Ra in a direction perpendicular to a circumferential direction of a roller used in the final pass of the finish cold rolling process is 0.05 to 0.25 ⁇ m.
  • a rolling speed in the finish cold rolling process is 150 m/min or less.
  • a metal mask material of the present invention includes a steel strip wound in a coil shape and a rectangular thin plate produced by cutting the steel strip.
  • the metal mask material of the present invention is an Fe-Ni alloy having a chemical composition including, by mass%, C: 0.01% or less, Si: 0.5% or less, Mn: 1.0% or less, and Ni: 30 to 50%, with the balance being made up of Fe and inevitable impurities are as follows.
  • C is an element that influences etching properties. Since etching properties deteriorate when an excess amount of C is included, the upper limit of C is set to 0.01%. There may be 0% of C, but it is incorporated in a small amount in a production process, and thus the lower limit is not particularly limited.
  • Si and Mn are generally used for the purpose of deoxidation and are contained in a small amount in the Fe-Ni alloy. However, when an excessive amount thereof is contained, since segregation easily occurs, Si: 0.5% or less, and Mn: 1.0% or less are set. Preferably, an amount of Si and an amount of Mn are Si: 0.1% or less, and Mn: 0.5% or less. The lower limits of Si and Mn can be set to, for example, 0.05% for Si and 0.05% for Mn.
  • Ni is an element that has a function of allowing adjustment of a coefficient of thermal expansion and greatly influences low thermal expansion characteristics. Since there is no effect of lowering a coefficient of thermal expansion when a content is less than 30% or exceeds 50%, a range for Ni is set to 30 to 50%. Preferably, an amount of Ni is 32 to 45%.
  • Components other than the above elements are Fe and inevitable impurities.
  • an arithmetic average roughness Ra (according to JIS-B-0601-2001) is 0.05 to 0.25 ⁇ m, and a maximum height Rz (according to JIS-B-0601-2001) is 1.5 ⁇ m or less.
  • Ra and Rz are within the above ranges, the material of the present invention can be etched with high precision.
  • Ra exceeds 0.25 ⁇ m, since the surface of the material is too rough, variations occur during etching, and etching processing with high precision becomes difficult.
  • Ra is less than 0.05 ⁇ m, the adhesion to a resist is likely to be lowered.
  • Rz exceeds 1.5 ⁇ m even if Ra is within the above range, this is not preferable because a large peak part in a roughness curve is formed in a part of the surface of the material, etching progresses from the peak part and this causes etching unevenness.
  • the lower limit of Rz is not particularly limited. However, in order to obtain higher adhesion, the lower limit of Rz is preferably set to 0.3 ⁇ m.
  • the upper limit of Ra is more preferably 0.20 ⁇ m, and the upper limit of Rz is more preferably 1.2 ⁇ m.
  • a surface roughness in a direction perpendicular to a rolling direction (hereinafter referred to as a "width direction” or “direction perpendicular to a rolling direction”) and a surface roughness in the rolling direction (hereinafter referred to as a “longitudinal direction”) of the metal mask material.
  • a surface roughness in the width direction of the metal mask material in the present embodiment is preferably larger than a surface roughness measured in the rolling direction. Accordingly, a rolling oil is easily discharged from between the roller and the material, and it is possible to minimize an oil pit formed by biting of the rolling oil.
  • Ra in the width direction is preferably a value that is higher than Ra in the rolling direction by 10% or more because the above effect of minimizing an oil pit is easily obtained.
  • the surface roughness can be measured using a contact type or non-contact type roughness meter that is generally used.
  • the metal mask material of the present embodiment has a skewness Rsk (according to JIS-B-0601-2001) ⁇ 0 in a direction perpendicular to the rolling direction of the material in addition to the above surface roughness.
  • Rsk according to JIS-B-0601-2001
  • the upper limit of Rsk is preferably 1.0 and more preferably 0.5.
  • Rsk in the rolling direction of the material is set to be smaller than an Rsk in the width direction, it is possible to improve the above effect of minimizing occurrence of oil pits.
  • Rsk in the rolling direction is smaller than the value of Rsk in the width direction, it may be a value of less than 0 (negative value).
  • the metal mask material of the present embodiment is applied to a material with a plate thickness of 0.5 mm or less in order to sufficiently obtain the above effect of Rsk.
  • the plate thickness is 0.2 mm or less.
  • the lower limit of the plate thickness is set to 0.10 mm in order for a bite angle to be described below to be easily adjusted to 1.0° or more.
  • a sample with a length of 150 mm and a width of 30 mm is cut out, the sample is etched from one side, and an amount of warpage when 60% of the plate thickness of the sample is removed is 15 mm or less.
  • an amount of warpage when 60% of the plate thickness of the sample is removed is 15 mm or less.
  • an amount of warpage when any of 20%, 30%, and 50% of the plate thickness of the sample is removed is 15 mm or less. More preferably, amounts of warpage when any of 20, 30, and 50% of the plate thickness of the sample is removed are all 15 mm or less.
  • the amount of warpage is preferably 13 mm or less, more preferably 11 mm or less, and still more preferably 9 mm or less.
  • an amount of warpage when 50% of the plate thickness of the sample is removed, in which the balance of the stress easily breaks and large warpage is likely to occur is 9 mm or less, and an amount of warpage when 20% or 30% of the plate thickness is removed is preferably 7 mm or less.
  • the sample is cut so that a longitudinal direction corresponds to the rolling direction, and the warpage is measured.
  • the sample is hung of which an upper end of the cut sample is in contact with a vertical surface plate, and a horizontal distance between a lower end of the cut sample separated from the vertical surface plate due to warpage and the vertical surface plate is measured as an amount of warpage.
  • processes of vacuum melting-hot forging-hot rolling-cold rolling can be applied.
  • a homogenization heat treatment is performed at about 1,200 °C in a step before cold rolling, and during the cold rolling process, in order to reduce the hardness of the cold rolled material, annealing at 800 to 950 °C can be performed at least once.
  • a polishing process of removing scale on the surface and an ear trimming process of removing an off-gauge part (a part with a thick plate thickness) at the end of the material and removing an ear wave part generated in rolling processing may be performed.
  • a furnace used during the heat treatment process existing furnaces such as a vertical type furnace and a horizontal type furnace (a horizontal furnace) may be used.
  • a vertical type furnace in which deflection due to an own weight is unlikely to occur is preferably used.
  • a rolling reduction ratio in a final pass of a finish cold rolling process is adjusted to 35% or less.
  • the rolling reduction ratio exceeds 35%, the residual distortion of the material increases and the occurrence of deformation during etching processing tends to increase.
  • the upper limit of the rolling reduction ratio is 30%.
  • the lower limit of the rolling reduction ratio is preferably set to 15%. More preferably, the lower limit of the rolling reduction ratio is 18%, and most preferably, the lower limit of the rolling reduction ratio is 20%.
  • the number of passes in the finish cold rolling is not particularly limited, and it may be performed a plurality of times (for example, three times or more). However, in order to perform rolling so that polishing marks to be described below are prevented from being crushed, finish rolling is preferably performed in one pass.
  • a roller used in the finish cold rolling a roller having a surface roughness Ra of 0.05 to 0.25 ⁇ m in a direction perpendicular to a circumferential direction (a direction in which a roller rotates) of the roller can be used.
  • the upper limit of Ra is 0.15 ⁇ m.
  • a desired roughness can be imparted to the metal mask material.
  • the material of the roller is not particularly limited.
  • an alloy tool steel roller defined in JIS-G4404 can be used.
  • a polishing mark is preferably formed on the roller in the circumferential direction.
  • a grindstone having a roughness at which a roughness in a direction perpendicular to the circumferential direction of the roller can be set to Ra: 0.05 to 0.25 ⁇ m is prepared, and the grindstone is pressed while rolling the roller for formation. More preferably, a difference between a roughness in the circumferential direction of the roller in the present embodiment and a surface roughness in a direction perpendicular to the circumferential direction is an Ra of 0.02 ⁇ m or more according to the polishing mark.
  • a bite angle which is an angle at which the rolled material and a work roller start to come in contact with each other is set to 1.0° or more.
  • the bite angle is adjusted in this manner, it is possible to minimize an excess occurrence of oil pit and obtain a desired surface roughness.
  • the upper limit of the bite angle can be set to 3.0°.
  • the upper limit of the bite angle is 2.0°.
  • R indicates the radius of the roller
  • h 0 indicates the plate thickness of the material before rolling
  • h 1 indicates the plate thickness of the material after rolling.
  • a rolling speed is preferably set to 150 m/min or less.
  • the rolling speed is set to 150 m/min or less, an amount of a rolling oil introduced between the work roller and the metal mask material is reduced, the occurrence of an oil pit is minimized, and it is possible to adjust Rsk to have a positive value more reliably.
  • the upper limit of the rolling speed is 120 m/min. Most preferably, the upper limit is set to 100 m/min.
  • the lower limit of the rolling speed is not particularly set, but since the production efficiency is lowered if the rolling speed is too low, 20 m/min can be set. 30 m/min is preferable.
  • distortion relief annealing may be performed in order to remove distortion remaining in an etching processing material after finish rolling and minimize shape defects occurring in the material.
  • the distortion relief annealing is preferably performed at a temperature of about 400 to 700 °C.
  • an annealing time is not particularly limited. However, when the time is too long, characteristics such as the tensile strength significantly deteriorate, and when the time is too short, an effect of removing the distortion is not obtained. Therefore, about 0.5 to 3.0 min is preferable. More preferably, the lower limit of the distortion relief annealing time is 1.2 min and most preferably the lower limit of the distortion relief annealing time is 1.5 min.
  • a bite angle of the roller of sample No. 1 was 1.28°.
  • a bite angle of the roller of sample No. 2 was 2.22°.
  • a rolling speed during the finish cold rolling was about 100 m/min.
  • a roughness Ra in a direction perpendicular to a circumferential direction (a direction in which a roller rotates) of the roller used for finish cold rolling was in a range of 0.08 to 0.25 ⁇ m.
  • sample No. 1 After the finish cold rolling, distortion relief annealing was performed on sample No. 1 at a temperature of 600 °C for 2 minutes and on sample No. 2 at a temperature of 630 °C for 1 minute.
  • a sample No. 11 in which a bite angle of a roller was adjusted to less than 1.0° by adjusting rolling conditions was prepared.
  • a chemical composition, a final plate thickness, and distortion relief annealing condition of the sample No. 11 were the same as those of sample No. 1.
  • [Table 1] (mass%) Sample No. C Si Mn Ni Balance 1 0.002 0.024 0.22 35.8 Fe and inevitable impurities 2 0.002 0.024 0.27 35.8 Fe and inevitable impurities
  • a surface roughness and a warpage of the obtained sample were measured.
  • Surface roughnesses Ra, Rz, and Rsk were measured according to measurement methods shown in JIS B0601 and JIS B0651, three places were randomly selected, and surface roughnesses in the longitudinal direction and the width direction were measured.
  • a stylus type roughness meter was used as a measurement device and measurement was performed under conditions of an evaluation length of 4 mm, a measurement speed of 0.3 mm/s, and a cutoff value of 0.8 mm. Table 2 shows average values at three places.
  • a cut sample with a length of 150 mm and a width of 30 mm was prepared, and etched from one side so that the plate thickness became 2/5 (60% of the plate thickness was removed), and an amount of warpage when the cut sample was hung on a vertical surface plate was then measured and evaluated.
  • the cut sample was collected from the central part in the width direction from the prepared so that the length direction corresponded to the rolling direction.
  • a ferric chloride aqueous solution was used as an etching solution, and the etching solution with a liquid temperature of 50 °C was sprayed thereon and thus a test piece corroded.
  • Table 2 Sample No.
  • sample No. 1 and sample No. 2 as metal mask materials of the example of the present invention had an optimal surface state such that it exhibited favorable adhesion and uniform etching processability, and it was possible to minimize change in shape after deep etching exceeding half of the plate thickness.
  • sample No. 11 as a comparative example had adhesion that was highly likely to be lower than that of the example of the present invention because Rsk in the width direction was a negative value.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Heat Treatment Of Sheet Steel (AREA)
  • Metal Rolling (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)

Claims (10)

  1. Matériau pour masque métallique, ce matériau pour masque métallique étant caractérisé en ce qu'il inclut, en pourcentage en masse : C : 0,01 % ou moins, Si : 0,5 % ou moins, Mn : 1,0 % ou moins, et Ni : 30 à 50 %, le reste étant composé de Fe et d'impuretés stables, dans lequel,
    pour le matériau pour masque métallique, à la fois une rugosité de surface dans un sens de laminage et une rugosité de surface dans un sens perpendiculaire au sens de laminage sont de 0,05 µm ≤ Ra ≤ 0,25 µm et Rz ≤ 1,5 µm,
    le matériau pour masque métallique a une asymétrie Rsk de 0 ou plus dans un sens perpendiculaire au sens de laminage, et,
    lorsqu'un échantillon d'une longueur de 150 mm et d'une largeur de 30 mm est découpé dans le matériau pour masque métallique et que 60 % de l'épaisseur de plaque de l'échantillon sont enlevés en attaquant l'échantillon depuis un côté, une amplitude de déformation est de 15 mm ou moins, et l'épaisseur de plaque est de 0,10 mm ou plus et 0,5 mm ou moins.
  2. Matériau pour masque métallique selon la revendication 1,
    dans lequel une asymétrie Rsk du matériau pour masque métallique dans le sens de laminage est inférieure à une asymétrie Rsk du matériau pour masque métallique dans le sens perpendiculaire au sens de laminage.
  3. Matériau pour masque métallique selon la revendication 1 ou 2,
    dans lequel une rugosité de surface Ra du matériau pour masque métallique dans le sens perpendiculaire au sens de laminage est supérieure à une rugosité de surface Ra du matériau pour masque métallique dans le sens de laminage.
  4. Matériau pour masque métallique selon l'une quelconque des revendications 1 à 3,
    dans lequel une Rsk du matériau pour masque métallique dans le sens perpendiculaire au sens de laminage est de 1,0 ou moins.
  5. Matériau pour masque métallique selon l'une quelconque des revendications 1 à 4,
    dans lequel, lorsqu'un échantillon d'une longueur de 150 mm et d'une largeur de 30 mm est découpé dans le matériau pour masque métallique et qu'un pourcentage quelconque parmi 20 %, 30 % et 50 % de l'épaisseur de plaque de l'échantillon est enlevé en attaquant l'échantillon depuis un côté, une amplitude de déformation est de 15 mm ou moins.
  6. Procédé de production d'un matériau pour masque métallique, le procédé de production d'un matériau pour masque métallique étant caractérisé par le laminage à froid d'un matériau de laminage froid incluant, en pourcentage en masse : C : 0,01 % ou moins, Si : 0,5 % ou moins, Mn : 1,0 % ou moins, et Ni : 30 à 50 %, le reste étant composé de Fe et d'impuretés inévitables, pour obtenir un matériau pour masque métallique, dans lequel :
    les conditions, dans un passage final d'un processus de laminage à froid de finition pour le matériau de laminage froid, sont qu'un rapport de réduction de laminage est de 35 % ou moins, et qu'un angle de morsure d'un rouleau de laminage est de 1,0° ou plus ;
    pour le matériau pour masque métallique, à la fois une rugosité de surface dans un sens de laminage et une rugosité de surface dans un sens perpendiculaire au sens de laminage sont de 0,05 µm ≤ Ra ≤ 0,25 µm et Rz ≤ 1,5 µm, et qu'une asymétrie Rsk est de 0 ou plus dans le sens perpendiculaire au sens de laminage, et,
    lorsqu'un échantillon d'une longueur de 150 mm et d'une largeur de 30 mm est découpé dans le matériau pour masque métallique et que 60 % de l'épaisseur de plaque de l'échantillon sont enlevés en attaquant l'échantillon depuis un côté, une amplitude de déformation est de 15 mm ou moins ; et
    l'épaisseur de plaque après laminage à froid de finition est de 0,10 mm ou plus et 0,5 mm ou moins.
  7. Procédé de production d'un matériau pour masque métallique selon la revendication 6,
    dans lequel l'angle de morsure du rouleau de laminage est de 3,0° ou moins.
  8. Procédé de production d'un matériau pour masque métallique selon la revendication 6 ou 7,
    dans lequel un rapport de réduction de laminage dans le passage final du processus de laminage à froid de finition est de 15 % à 35 %.
  9. Procédé de production d'un matériau pour masque métallique selon l'une quelconque des revendications 6 à 8,
    dans lequel une rugosité de surface Ra dans un sens perpendiculaire à un sens circonférentiel d'un rouleau utilisé dans le passage final du processus de laminage à froid de finition est de 0,05 à 0,25 µm.
  10. Procédé de production d'un matériau pour masque métallique selon l'une quelconque des revendications 6 à 9,
    dans lequel une vitesse de laminage dans le processus de laminage à froid de finition est de 150 m/min ou moins.
EP17846646.2A 2016-08-31 2017-08-31 Matériau pour masque métallique, et procédé de fabrication de celui-ci Active EP3508285B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016169881 2016-08-31
PCT/JP2017/031349 WO2018043642A1 (fr) 2016-08-31 2017-08-31 Matériau pour masque métallique, et procédé de fabrication de celui-ci

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EP3508285A1 EP3508285A1 (fr) 2019-07-10
EP3508285A4 EP3508285A4 (fr) 2020-05-13
EP3508285B1 true EP3508285B1 (fr) 2021-09-29

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JP (1) JP6646882B2 (fr)
KR (1) KR102164912B1 (fr)
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WO (1) WO2018043642A1 (fr)

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CN116083843A (zh) * 2017-09-07 2023-05-09 Lg伊诺特有限公司 金属材料oled沉积掩模及沉积掩模的残余应力的测量方法
EP3712296A4 (fr) 2017-11-14 2021-08-11 Dai Nippon Printing Co., Ltd. Plaque métallique pour produire des masques pour dépôt en phase vapeur, procédé de production de plaques métalliques, masque pour dépôt en phase vapeur, procédé de production d'un masque pour dépôt en phase vapeur, et dispositif de masque pour dépôt en phase vapeur comprenant un masque pour dépôt en phase vapeur
TWI805853B (zh) * 2018-09-27 2023-06-21 日商日鐵化學材料股份有限公司 金屬遮罩材料及其製造方法與金屬遮罩
KR20210042026A (ko) * 2019-10-08 2021-04-16 다이니폰 인사츠 가부시키가이샤 증착 마스크를 제조하기 위한 금속판, 금속판의 제조 방법, 증착 마스크 및 증착 마스크의 제조 방법
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KR20190030754A (ko) 2019-03-22
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JPWO2018043642A1 (ja) 2019-06-24
EP3508285A4 (fr) 2020-05-13
EP3508285A1 (fr) 2019-07-10
CN109641248B (zh) 2021-04-06
JP6646882B2 (ja) 2020-02-14
KR102164912B1 (ko) 2020-10-13

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