EP3475333A1 - Film de copolymere a blocs nanostructure comprenant un bloc biodegradable de type polyester - Google Patents
Film de copolymere a blocs nanostructure comprenant un bloc biodegradable de type polyesterInfo
- Publication number
- EP3475333A1 EP3475333A1 EP17737339.6A EP17737339A EP3475333A1 EP 3475333 A1 EP3475333 A1 EP 3475333A1 EP 17737339 A EP17737339 A EP 17737339A EP 3475333 A1 EP3475333 A1 EP 3475333A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- block
- block copolymer
- copolymer
- pbl
- initiator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229920001400 block copolymer Polymers 0.000 title claims abstract description 85
- 229920000229 biodegradable polyester Polymers 0.000 title abstract description 3
- 239000004622 biodegradable polyester Substances 0.000 title abstract description 3
- 229920000642 polymer Polymers 0.000 claims abstract description 45
- 229920001577 copolymer Polymers 0.000 claims abstract description 41
- 229920000728 polyester Polymers 0.000 claims abstract description 16
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 13
- GSCLMSFRWBPUSK-UHFFFAOYSA-N beta-Butyrolactone Chemical compound CC1CC(=O)O1 GSCLMSFRWBPUSK-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims abstract description 8
- 239000003999 initiator Substances 0.000 claims description 45
- 239000000178 monomer Substances 0.000 claims description 36
- 238000006116 polymerization reaction Methods 0.000 claims description 21
- 229920000428 triblock copolymer Polymers 0.000 claims description 20
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 15
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 15
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 15
- 229920002857 polybutadiene Polymers 0.000 claims description 14
- -1 polytetramethylene Polymers 0.000 claims description 13
- 239000005062 Polybutadiene Substances 0.000 claims description 12
- 229920001223 polyethylene glycol Polymers 0.000 claims description 10
- 229920000359 diblock copolymer Polymers 0.000 claims description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 7
- 125000005395 methacrylic acid group Chemical group 0.000 claims description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 6
- 150000001993 dienes Chemical class 0.000 claims description 6
- 150000002009 diols Chemical class 0.000 claims description 6
- 229920001451 polypropylene glycol Polymers 0.000 claims description 6
- 229920006163 vinyl copolymer Polymers 0.000 claims description 5
- 238000010526 radical polymerization reaction Methods 0.000 claims description 4
- FAXGGGOODQWKDU-UHFFFAOYSA-N 3-methyl-1,5-dioxacycloundecane-6,11-dione Chemical compound CC1COC(=O)CCCCC(=O)OC1 FAXGGGOODQWKDU-UHFFFAOYSA-N 0.000 claims description 3
- 229920002101 Chitin Polymers 0.000 claims description 3
- 229920001661 Chitosan Polymers 0.000 claims description 3
- 229920002307 Dextran Polymers 0.000 claims description 3
- 229920000616 Poly(1,4-butylene adipate) Polymers 0.000 claims description 3
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- 229920002367 Polyisobutene Polymers 0.000 claims description 3
- 229920002472 Starch Polymers 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 229920002678 cellulose Polymers 0.000 claims description 3
- 239000001913 cellulose Substances 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- 238000007334 copolymerization reaction Methods 0.000 claims description 3
- 150000004676 glycans Chemical class 0.000 claims description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 3
- 229920001281 polyalkylene Polymers 0.000 claims description 3
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 3
- 229920001195 polyisoprene Polymers 0.000 claims description 3
- 229920001282 polysaccharide Polymers 0.000 claims description 3
- 239000005017 polysaccharide Substances 0.000 claims description 3
- 229920001296 polysiloxane Polymers 0.000 claims description 3
- 239000008107 starch Substances 0.000 claims description 3
- 235000019698 starch Nutrition 0.000 claims description 3
- 125000000524 functional group Chemical group 0.000 claims 1
- 125000003396 thiol group Chemical group [H]S* 0.000 claims 1
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 34
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 32
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 28
- 239000010408 film Substances 0.000 description 24
- 239000002904 solvent Substances 0.000 description 24
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 238000000034 method Methods 0.000 description 20
- 229920001610 polycaprolactone Polymers 0.000 description 20
- 238000005481 NMR spectroscopy Methods 0.000 description 18
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 18
- 238000000113 differential scanning calorimetry Methods 0.000 description 15
- 239000000203 mixture Substances 0.000 description 15
- 239000004632 polycaprolactone Substances 0.000 description 15
- 238000002360 preparation method Methods 0.000 description 15
- 229910052786 argon Inorganic materials 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 12
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 11
- 239000004793 Polystyrene Substances 0.000 description 11
- 238000005329 nanolithography Methods 0.000 description 11
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 11
- 239000004926 polymethyl methacrylate Substances 0.000 description 10
- 238000005204 segregation Methods 0.000 description 10
- 229920000747 poly(lactic acid) Polymers 0.000 description 9
- 229920000070 poly-3-hydroxybutyrate Polymers 0.000 description 9
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 8
- 101150065749 Churc1 gene Proteins 0.000 description 8
- 102100038239 Protein Churchill Human genes 0.000 description 8
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000004320 controlled atmosphere Methods 0.000 description 7
- 238000012544 monitoring process Methods 0.000 description 7
- 238000005191 phase separation Methods 0.000 description 7
- 239000004626 polylactic acid Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 230000009477 glass transition Effects 0.000 description 6
- 229920002521 macromolecule Polymers 0.000 description 6
- 239000012429 reaction media Substances 0.000 description 6
- 239000003377 acid catalyst Substances 0.000 description 5
- 229920001519 homopolymer Polymers 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 229940098779 methanesulfonic acid Drugs 0.000 description 5
- 229920002223 polystyrene Polymers 0.000 description 5
- 230000037452 priming Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 150000002596 lactones Chemical class 0.000 description 4
- 239000002086 nanomaterial Substances 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 3
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 description 2
- 238000004630 atomic force microscopy Methods 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 238000002270 exclusion chromatography Methods 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 230000000813 microbial effect Effects 0.000 description 2
- 238000000386 microscopy Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000218 poly(hydroxyvalerate) Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000001338 self-assembly Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 230000005469 synchrotron radiation Effects 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 150000003573 thiols Chemical group 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- WHBMMWSBFZVSSR-GSVOUGTGSA-M (R)-3-hydroxybutyrate Chemical compound C[C@@H](O)CC([O-])=O WHBMMWSBFZVSSR-GSVOUGTGSA-M 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- FYGFQAJDFJYPLK-UHFFFAOYSA-N 3-butyloxiran-2-one Chemical compound CCCCC1OC1=O FYGFQAJDFJYPLK-UHFFFAOYSA-N 0.000 description 1
- WHBMMWSBFZVSSR-UHFFFAOYSA-M 3-hydroxybutyrate Chemical compound CC(O)CC([O-])=O WHBMMWSBFZVSSR-UHFFFAOYSA-M 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- JJTUDXZGHPGLLC-IMJSIDKUSA-N 4511-42-6 Chemical compound C[C@@H]1OC(=O)[C@H](C)OC1=O JJTUDXZGHPGLLC-IMJSIDKUSA-N 0.000 description 1
- 241000589149 Azotobacter vinelandii Species 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 208000037170 Delayed Emergence from Anesthesia Diseases 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 208000034530 PLAA-associated neurodevelopmental disease Diseases 0.000 description 1
- 229920000331 Polyhydroxybutyrate Polymers 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- WHBMMWSBFZVSSR-UHFFFAOYSA-N R3HBA Natural products CC(O)CC(O)=O WHBMMWSBFZVSSR-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical group 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 229920002988 biodegradable polymer Polymers 0.000 description 1
- 239000004621 biodegradable polymer Substances 0.000 description 1
- 238000006065 biodegradation reaction Methods 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
- 238000007707 calorimetry Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000012718 coordination polymerization Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000002408 directed self-assembly Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000007431 microscopic evaluation Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000000399 orthopedic effect Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000005015 poly(hydroxybutyrate) Substances 0.000 description 1
- 229920006216 polyvinyl aromatic Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000000235 small-angle X-ray scattering Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000006276 transfer reaction Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 125000002348 vinylic group Chemical group 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/06—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
- C08G63/08—Lactones or lactides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/18—Block or graft polymers
- C08G64/183—Block or graft polymers containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/445—Block-or graft-polymers containing polysiloxane sequences containing polyester sequences
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Definitions
- the present invention relates to the field of nanostructured block copolymers having nano-domains oriented in a particular direction.
- the invention relates to a block copolymer film comprising at least one biodegradable block, polyester type, able to be easily removed after structuring, and having a high phase segregation, with a low Lo period preferably less than 20 nm.
- noted Lo means the minimum distance separating two neighboring domains of the same chemical composition, separated by a different chemical composition area.
- block copolymers it is possible to structure the arrangement of the constituent blocks of the copolymers, by phase segregation between the blocks thus forming nano-domains, at scales of less than 50 nm. Because of this ability to nanostructure, the use of block copolymers in the fields of electronics or optoelectronics is now well known.
- the most studied block copolymer films so far are the films based on polystyrene-i-poly (methyl methacrylate), hereinafter denoted PS-> PMMA.
- PS-> PMMA polystyrene-i-poly (methyl methacrylate)
- a block of the copolymer must be selectively removed to create a porous film of the residual block, the patterns of which may be subsequently transferred by etching to an underlying layer.
- PS-b-PMMA film PMMA (Poly (methyl methacrylate)
- PS Polystyrene
- the nano-domains must be oriented perpendicular to the surface of the underlying layer.
- Such structuring of the domains requires particular conditions such as the preparation of the surface of the underlying layer, but also the composition of the block copolymer.
- An important factor is the phase segregation factor, also referred to as the Flory-Huggins interaction parameter and denoted by " ⁇ ".
- This parameter makes it possible to control the size of the nano domains. More particularly, it defines the tendency of blocks of the block copolymer to separate into nano-domains.
- the product ⁇ , the Flory-Huggins parameter ⁇ and the degree of polymerization N give an indication of the compatibility of two blocks and whether they can separate at a given temperature. For example, a diblock copolymer of strictly symmetrical composition separates into micro domains if the product ⁇ is greater than 10.49. If this product ⁇ is less than 10.49, the blocks mix and the phase separation is not observed at the observation temperature.
- PLA poly lactic acid
- PCL polycaprolactone
- PS polystyrene
- PDMS polydimethylsiloxane
- PTMSS polytrimethylsilylstyrene
- copolymers with biodegradable polyesters can be used as a drug encapsulant or as biodegradable implants, particularly in orthopedics, to suppress the interventions that were necessary in the past to remove metal parts such as pins for example.
- Such polymers can also be used in coating and plastic formulations.
- the Applicant has therefore been interested in these polymers for incorporating them into block copolymers, because of their biodegradability, so that they can be easily removed after nano-structuring and allow the creation of a residual porous film intended to serve as a mask. nanolithography.
- Polycaprolactones and polybutyrolactones also have good physicochemical properties and good thermal stability up to temperatures of at least 200-250 ° C.
- Organo-catalysts have been developed to allow the ring-opening polymerization of lactones, in particular ⁇ -caprolactone denoted “ ⁇ -CL” in the following description.
- AMS methanesulfonic acid
- AMS in combination with a protic initiator of alcohol type, AMS is capable of promoting the controlled polymerization of the cyclic monomer ⁇ -caprolactone.
- the protic initiator allows fine control of average molar masses as well as chain ends.
- PBL polybutyrolactone
- PHB poly-3-hydroxybutyrate
- PBL polybutyrolactone
- PHB poly-3-hydroxybutyrate
- trifluoromethanesulfonic acid also called triflic acid and noted HOTf
- triflic acid is an organic catalyst of choice for carrying out the controlled polymerization of ⁇ -butyrolactone (BBL) in the presence alcohol.
- This catalyst, HOTf is to date the only organic catalyst allowing the block copolymerization of BBL with other monomers of lactone or carbonate type.
- the PBL polymer is bio-resourced because it is made from raw materials of renewable origin, it is biodegradable and biocompatible. Thanks to these properties, such a polymer finds applications in the fields of medical and packaging in particular.
- Block copolymers combining isotactic PHB with polyesters such as PLA, PCL or PHV show a phase separation induced by the high crystallinity of these polymers.
- DSC Differential Scanning Calorimetry
- ATRP Atom Transfer Radical Polymerization
- the DSC characterization of this copolymer shows two distinct values of glass transition temperature, T g , at values close to those of the homopolymers, which is consistent with phase segregation.
- T g glass transition temperature
- T m melting temperature
- analysis by atomic force microscopy (AFM) of such a film after a period of annealing of 24 h at 120 ° C., shows the obtaining of a nano-structuring of lamellar morphology, with a period 40 nm.
- the Applicant therefore sought a solution for synthesizing a block copolymer film comprising at least one biodegradable block, of the Polyester type, which is nanostructured with a morphology and a controlled period, so as to be able to use it as a nanolithography mask.
- the block copolymer film must have a period of less than or equal to 20 nm.
- the invention therefore aims to remedy at least one of the disadvantages of the prior art.
- the invention aims in particular to provide a nano-structured nano-structured block copolymer film, said copolymer comprising at least a first polyester-type biodegradable block and being capable of nano-structuring into nanodomains with a controlled morphology and with a controlled Lo period and less than 20 nm.
- a nano-structured block copolymer film in nano-domains said copolymer comprising at least a first polyester-type biodegradable block, and a second block of a chemical nature different from the first one.
- said block copolymer being characterized in that the first block of polyester type is polybutyrolactone (PBL) and in that the second block is derived from a polymer carrying a hydoxy function on at least one end and acting as macro-initiator of the polymerization of ⁇ -butyrolactone (BBL) in polybutyrolactone (PBL),
- PBL polybutyrolactone
- block copolymer is a diblock or triblock copolymer
- the number-average molecular mass of each block of PBL is between 1,000 and 20,000 g / mol; the number-average molecular weight of the block copolymer is between 2,000 and 30,000 g / mol;
- the molar ratio of monomer ( ⁇ -BL) to macro-initiator is between 60/1 and 160/1;
- the second macro-initiator block is derived from a mono- or polyhydroxylated oligomer or polymer chosen from: (alkoxy) polyalkylene glycols, such as (methoxy) polyethylene glycol (MPEG / PEG), polypropylene glycol (PPG) and polytetramethylene glycol (PTMG); poly (alkyl) alkylene adipate diols such as poly (2-methyl-1,3-propylene adipate) diol (PMPA) and poly (1,4-butylene adipate) diol (PBA); polysiloxanes, such as mono or dihydroxylated polydimethylsiloxane (PDMS), or optionally hydrogenated mono- or dihydroxylated polydienes, such as ⁇ , ⁇ -dihydroxylated polybutadiene or ⁇ , ⁇ -dihydroxylated polyisoprene, preferably hydroxytelechelic polybutadiene; hydrogenated or not; or mono- or poly
- the term "monomer” as used refers to a molecule that can undergo polymerization.
- polymerization refers to the process of converting a monomer or mixture of monomers into a polymer.
- oligomer refers to a polymer compound of small size, comprising between 2 and 30 monomers, that is to say, whose degree of polymerization is between 2 and 30.
- copolymer block or “block” is meant a polymer comprising several monomer units of several types, or of the same type.
- block copolymer is meant a polymer comprising at least two blocks as defined above, the two blocks being different from one another and having a phase segregation parameter such that they are not miscible and separate into nano-domains.
- miscibility refers to the ability of two compounds to mix completely to form a homogeneous phase.
- the block copolymer according to the invention advantageously comprises a first biodegradable block, polyester type, capable of being easily removed after nanostructuration of the copolymer, so as to produce a porous film for use as a nanolithography mask.
- the block copolymer comprises at least one other block, different from the first, and which is incompatible with the first block, that is to say that they can not mix and separate into nano-domains.
- the first block of polyester type is polybutyrolactone, noted PBL in the following description.
- the second block for its part, is formed from an oligomer or a polymer whose chemical nature is incompatible with polybutyrolactone and comprising an alcohol function on at least one end.
- This second functionalized alcohol polymer makes it possible to serve as a macro-initiator for the polymerization of ⁇ -butyrolactone (BBL) in the presence of triflic acid (HOTf) as a catalyst.
- HATf triflic acid
- it comprises only a hydroxyl function on one end, it makes it possible to produce a diblock copolymer with the PBL.
- This second polymer forming the second block of the block copolymer and acting as macro-initiator of ⁇ -butyrolactone (BBL) may advantageously be chosen from an oligomer or a mono- or polyhydroxylated polymer, chosen in particular from: alkoxy) polyalkylene glycols, such as (methoxy) polyethylene glycol (MPEG / PEG), polypropylene glycol (PPG) and polytetramethylene glycol (PTMG); poly (alkyl) alkylene adipate diols such as poly (2-methyl-1,3-propylene adipate) diol (PMPA) and poly (1,4-butylene adipate) diol (PBA); polysiloxanes, such as mono or di-hydroxylated polydimethyl siloxane (PDMS); optionally hydrogenated,
- alkoxy polyalkylene glycols such as (methoxy) polyethylene glycol (MPEG / PEG), polypropylene glycol
- the macro-initiator may be a co-oligomer or a vinyl copolymer of the family of acrylic, methacrylic, styrenic or diene polymers, which results from a copolymerization between acrylic monomers, methacrylic, styrenic or dienes and functional monomers having a hydroxyl group, such as hydroxylated acrylic or methacrylic monomers, such as, for example, 4-hydroxybutyl acrylate, hydroxyethyl acrylate and hydroxyethyl methacrylate.
- This polymerization can be carried out according to a conventional free radical process, a controlled radical process or an anionic process.
- the macro-initiator may be a vinyl copolymer obtained by controlled radical polymerization in which the radical initiator and / or the control agent carry at least one hydroxyl or thiol function.
- the macro-initiator is advantageously chosen from hydroxylated polyolefins, that is to say any polymer derived from olefins bearing at least one hydroxyl function or telechelic hydroxy.
- the polydienes are referred to and among these, polybutadienes are preferred, and especially telechelic hydroxy polybutadiene.
- the polybutadiene hydroxy telechelic is a polymer marketed by the company Cray Valley, under the commercial reference Krasol ® and more particularly Krasol LBH-P3000 ® and Krasol HLBH-P3000 ® .
- the Krasol LBH-P3000 ® is a polybutadiene, prepared by anionic polymerization, with a number average molecular weight M n of the order of 3200 g / mol.
- the Krasol HLBH-P3000 ® is a hydrogenated polybutadiene having an average molecular weight M n is in the range of 3100 g / mol.
- the number-average molecular weight of each block of PBL is preferably between 1000 and 20000 g / mol.
- the number-average molecular mass of the block copolymer obtained is between 2,000 and 30,000 g / mol.
- the volume fraction of polyester, PBL, relative to the total volume of the block copolymer can vary between 25% and 75%. This volume fraction advantageously makes it possible to control the morphology of the nano-domains formed.
- the volume fraction of PBL in the copolymer is between 45 and 55%, the copolymer has a lamellar morphology, and when the volume fraction of PBL in the copolymer is between 65 and 75%, the copolymer has a cylindrical morphology. .
- the volume fraction of each block of the block copolymer is measured as described below. Within a block copolymer it is possible to measure, by proton NMR, the molar fraction of each polymer throughout the copolymer, then to go back to the mass fraction using the molar mass of each constituent polymer of a block. The volume fraction of each block can then be determined from the mass fraction of each block and the density of the polymer forming the block. Take the example of a PBL-b-Krasol®.
- the copolymer comprises 50% by weight of BBL monomer units, 50% by weight of macro-initiator units.
- the method for synthesizing such a block copolymer film comprises the steps of mixing the macro-initiator, for example a hydroxylated polyolefin macro-initiator, and more particularly a hydroxylated or dihydroxylated polybutadiene, with of ⁇ -butyrolactone (BBL), in a solvent, in the presence of trifluoromethanesulfonic acid as a catalyst for the polymerization reaction of ⁇ -butyrolactone, for the selective production, in one step, of a copolymer of blocks.
- the solvent is advantageously chosen from toluene, ethylbenzene or xylene. Toluene is however preferred to the other two solvents.
- the catalyst is then removed and the solution of the block copolymer obtained is applied in the form of a film on a surface to be etched, the surface energy of which has been neutralized beforehand.
- the solvent of the solution is evaporated and the film is annealed at a predetermined temperature to ensure nano-structuring of the copolymer in nano-domains perpendicular to the surface to be etched.
- the desired structuring for example the generation of nano-domains perpendicular to the surface, nevertheless requires the preparation of the surface on which the copolymer solution is deposited in order to control surface energy.
- the preferred surfaces include surfaces made of silicon, silicon having a native or thermal oxide layer, germanium, platinum, tungsten, gold, titanium nitrides, graphenes, BARC (bottom anti-reflective coating) or any other anti-reflective layer used in lithography.
- a solution of the block copolymer according to the invention is deposited and the solvent is evaporated according to known techniques of the skilled person such as for example the technique known as “spin coating”, “Doctor Blade””knifeSystem”,”slot die System” but any other technique can be used such as a dry deposit, that is to say to say without passing by a preliminary dissolution.
- a heat treatment is carried out which allows the block copolymer to organize properly, that is to say to obtain in particular a phase separation between the nano-domains whose size is ⁇ 10 nm. , with a controlled morphology and with a period ⁇ 20nm, an orientation of the domains, perpendicular to the surface to be engraved, a reduction in the number of defects.
- the temperature T of this heat treatment is such that it is less than 290 ° C, preferably less than 180 ° C, and greater than the highest glass transition temperature of the blocks constituting the copolymer. It is carried out under a solvent or a thermal atmosphere or by a combination of these two methods.
- This heat treatment, or annealing allows the block copolymer to organize properly, that is to say to obtain in particular a phase separation between the nano-domains, a controlled morphology of the nano-domains, a preferential orientation nano-domains and a reduction in the number of defects.
- the resulting block copolymer film has an ordered patterning for a given total degree of polymerization.
- the copolymer obtained is a diblock copolymer of the PBL-b-PBT type or triblocks of the ⁇ -> - ⁇ ->->-type.
- the synthesis of the block copolymer according to the invention is preferably carried out at a temperature ranging from 20 to 120 ° C. and more preferably between 30 and 60 ° C., in particular when the solvent is toluene.
- the macro-initiator is a hydroxytelechelic polybutadiene, hydrogenated or not, it is indeed possible to obtain, at a temperature of the order of 30 ° C, block copolymers of PBL-i-Krasol®-i - PBL or PBL- ⁇ -Krasol® Hb-PBL having a number average molecular weight M n of up to 20,000 g / mol in a few hours and with a yield greater than or equal to 85% after purification.
- the molar ratio initiator / catalyst (HOTf) is preferably between 1/1 and 1/2.
- the reagents used in this process are preferably dried before being used, in particular by vacuum treatment, distillation or drying with an inert desiccant.
- the cylindrical or lamellar morphology of the nano-domains thus formed depends on the molar ratio of monomer (BBL) on macro-initiator in the initial mixture, but also on the nature of the macro-initiator forming the second block of the block copolymer and of its degree of polymerization.
- the molar ratio of BBL monomer to macro-initiator is preferably between 60/1 and 160/1.
- the molar ratio of monomer ( ⁇ -BL) to macro-initiator is preferably between 0.9N and 1.1N and for obtaining a cylindrical morphology, the monomer ( ⁇ -BL) molar ratio on macro-initiator is preferably between 0.25N and 0.35N or between 1 .8N and 2.2N, N being the degree of polymerization of the oligomer or polymer forming the macro-initiator.
- the molar ratio of monomer ( ⁇ -BL) to macro-initiator is between 60/1 and 90/1 and for obtaining a cylindrical morphology, the molar ratio of monomer ( ⁇ -BL) to macro-initiator is advantageously between 100/1 and 160/1.
- the first block of polybutyrolactone (PBL), which is biodegradable, is advantageously removed to form a nanolithography mask comprising a porous pattern perpendicular to the surface to be etched and having a Lo ⁇ 20 nm period.
- a block copolymer according to the invention thus makes it possible to obtain an assembly of the blocks perpendicularly to the surface on which it is deposited, with a significant phase segregation, making it possible to obtain nano-domains of small sizes, of the order of the nanometer to a few nanometers and controlled morphology, and a period less than or equal to 20nm.
- Such a block copolymer therefore allows better control of the lithography process whose resolution is high and compatible with the current requirements in terms of component dimensions.
- the toluene is dried using a MBraun SPS-800 solvent purifier.
- Methanesulfonic acid (AMS) and trifluoromethanesulfonic acid (HTOf) were used without further purification.
- Diisopropyl ethylamine (DIEA) was dried and distilled on Cah and stored on potassium hydroxide (KOH).
- the Schlenk tubes were dried with a vacuum heat gun in order to remove any trace of moisture.
- DSC differential scanning calorimetry
- the calorimetry analyzes were carried out between -80 and 130 ° C. and the temperature values were recorded during the second temperature rise (at a rate of 10 ° C./min).
- SAXS Small angle X-ray scattering analysis
- This analysis technique consists of diffusing a monochromatic radiation through the sample to be analyzed.
- the scattered intensity is collected as a function of the scattering angle passing through the sample, the scattering angle being very close to the direct beam.
- the scattered photons provide information on the fluctuation of electron densities in the heterogeneous material.
- SAXS analysis a Nanostar SAXS (Bruker) or BM-26B DUBBLE station at the European Synchrotron Radiation Facility (ESFR) was used.
- PCL polycaprolactone
- PBL polybutyrolactone
- HETf trifluoromethanesulfonic acid
- AMS lower methanesulfonic acid
- the ratio of monomer / macro-initiator in the initial mixture, for the synthesis of each block copolymer differs from one example to another, so as to diversify the volume fractions between the blocks of different nature.
- the ability of these copolymers to segregate and nanostructure was first studied by DSC and then by SAXS and / or microscopic analysis was also performed. The results of the analyzes are summarized in Table I below.
- Example 1 (Comparative): Preparation of triblock copolymer ⁇ ! ⁇ ( ⁇ -caprolactone) 43-block-Krasol® LBH-P3000-block-poly ( ⁇ -caprolactone) 43
- the macro-initiator (Krasol® LBH-P3000, 2eq., 1 .5 g) and I ' ⁇ -CL (80 eq., 4.1 1 g) are weighed in a glove box and introduced into a dry schlenk .
- the reaction medium is stirred under argon at 30 ° C. for 2 h 30 min.
- the polymerization reaction of the ⁇ -CL monomer with the macro-initiator is as follows:
- Example 2 (Comparative) Preparation of a triblock copolymer poly (caprolactone) 80-block-Krasol LBH-P3000-block-poly ( ⁇ -caprolactone) [0076]
- the macro-initiator (Krasol LBH-P3000, 2eq., 1 5 g) and ⁇ -CL (160 eq., 8.22 g) are weighed in a glove box and introduced into a dry slurry.
- the schlenk is placed under a controlled atmosphere of argon, then the solvent is successively added ( 18 mL of toluene, [?
- a triblock copolymer of PCLso-b-Krasol-i -PCLso with a conversion level of 99% and a yield greater than 90% is obtained.
- Example 3 Preparation of triblock copolymer of polviB-butyrolactonehs-block-Krasol LBH-P3000-block-polv (B-butyrolactone) 75
- the macro-initiator (Krasol LBH-P3000, 2eq., 1 .27 g) and the ⁇ -BL (160 eq., 5.25 g) are weighed in a glove box and introduced into a dry schlenk.
- the reaction medium is stirred under argon at 30 ° C. for 3 h 30 min.
- the polymerization reaction of the monomer ⁇ -BL with the macro-initiator is as follows:
- Example 4 Preparation of a triblock copolymer polv (B-butyrolactone) 37-block-Krasol LBH-P3000-block-polv (B-butyrolactone) 37
- the macro-initiator (Krasol LBH-P3000, 2eq., 2.35 g) and the ⁇ -BL (80 eq., 4.60 g) are weighed in a glove box and introduced into a dry schlenk.
- the reaction medium is stirred under argon at 30 ° C. for 2 h 30 min.
- DIEA diisopropylethylamine
- Example 5 Preparation of a triblock copolymer polv (B-butyrolactone) 39-block-Krasol H LBH-P3000-block-polv (B-butyrolactone) 39
- the macro-initiator (Krasol HLBH-P3000, 2 eq., 0.77 g) and ⁇ -BL (80 eq., 1.28 g) are removed in a glove box and introduced into a dry schlenk.
- the reaction medium is stirred under argon at 30 ° C. for 1 h 15 min.
- DIEA diisopropylethylamine
- the polymerization reaction of the monomer ⁇ -CL with the macro-initiator is as follows:
- a triblock copolymer of PBL39-b-Krasol H-i -PBL39 is obtained with a conversion of 99% and a yield greater than 90%.
- Example 6 Preparation of a triblock copolymer polv (B-butyrolactone) 54-block-Krasol H LBH-P3000-block-polv (B-butyrolactone) 54
- the macro-initiator (Krasol HLBH-P3000, 2 eq., 0.5 g) and ⁇ -BL (120 eq., 1.71 g) are collected in a glove box and introduced into a dry schlenk.
- the reaction medium is stirred under argon at 30 ° C. for 3 h 30 min.
- an excess of diisopropylethylamine (DIEA) is then added to neutralize the catalyst.
- the solvent is then evaporated under vacuum.
- the polymer obtained is then dissolved in the minimum of dichloromethane, then precipitated by addition in cold methanol, filtered and dried under vacuum.
- a triblock copolymer of PBL54- ⁇ -krasol ⁇ ->- ⁇ 54 is obtained with a conversion of 99% and a yield greater than 90%.
- the reaction medium is stirred under argon at 30 ° C. for 6h30.
- DIEA diisopropylethylamine
- the SAXS analyzes, carried out on a Nanostar SAXS (Bruker) apparatus or at the BM-26B station of the DUBBLE line at the European Synchrotron Radiation Facility (ESFR), shed more light on the different behavior of block copolymers. depending on whether they incorporate PBL or PCL blocks.
- ESFR European Synchrotron Radiation Facility
- PCL-based block copolymers there is no nano-structuring of well-defined morphology, but simply phase separation due to PCL crystallinity and amorphous PCL / Krasol phases are miscible.
- PBL nanostructuring with a well-defined morphology is observed, whether with Krasol, hydrogenated Krasol or PDMS.
- the nano-structuring morphology depends on the volume fractions of PBL in the block copolymer, which are directly related to the monomer molar ratio of BBL on the oligomer or macro-initiator polymer. In all cases very low values of Lo period were measured: between 10.5 and 13.7nm.
- Lo period was measured: between 10.5 and 13.7nm.
- the different morphologies observed, as a function of the molar fractions of PBL and Krasol® or PDMS, and the measured period Lo are given in Table I below, in which are gathered all the results obtained on the different samples synthesized according to in Examples 1-7.
- Triblock copolymers PBL-6-Krasol-i-PBL, or PBL-6-Krasol H-i-PBL giving rise to nano-structuring were then selected for analysis by microscopy.
- a copolymer solution is deposited as a thin film on a surface, then the solvent is evaporated and the film is annealed at a temperature of 120 ° C for 24 hours.
- the deposited films have a thickness of the order of 30 nm.
- the results of microscopy analysis confirm the nano-structuring, with cylindrical or lamellar nano-domains perpendicular to the surface and having an average Lo period of 13 nm.
- the block copolymers incorporating a Polybutyrolactone polyester block are therefore capable of segregating, giving rise to a scaling structure. nanometric, whereas no nano-structuring is observed for triblock copolymers equivalent in size, based on polycaprolactone.
- copolymers obtained based on polybutyrolactone are capable of segregating for low molecular weights, typically less than 20000 g / mol, allowing access to various morphologies depending on their composition with very low structuring periods. value, less than 20 nm.
- the copolymer according to the invention differs strongly from conventional PS-b-PMMA block copolymers which do not make it possible to obtain periods lower than 20 nm.
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Abstract
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| Application Number | Priority Date | Filing Date | Title |
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| FR1655903A FR3053043B1 (fr) | 2016-06-24 | 2016-06-24 | Film de copolymere a blocs nanostructure comprenant un bloc biodegradable de type polyester |
| PCT/FR2017/051654 WO2017220934A1 (fr) | 2016-06-24 | 2017-06-22 | Film de copolymere a blocs nanostructure comprenant un bloc biodegradable de type polyester |
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| EP3475333A1 true EP3475333A1 (fr) | 2019-05-01 |
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| EP17737339.6A Withdrawn EP3475333A1 (fr) | 2016-06-24 | 2017-06-22 | Film de copolymere a blocs nanostructure comprenant un bloc biodegradable de type polyester |
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| US (1) | US20190187559A1 (fr) |
| EP (1) | EP3475333A1 (fr) |
| JP (1) | JP2019519665A (fr) |
| KR (1) | KR20190020792A (fr) |
| CN (1) | CN109843971A (fr) |
| FR (1) | FR3053043B1 (fr) |
| SG (1) | SG11201811481PA (fr) |
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| CN111978531B (zh) * | 2020-08-26 | 2022-06-24 | 烟台大学 | 纤维素接枝型全生物降解高分子材料及其制备方法 |
| CN113801308A (zh) * | 2021-09-28 | 2021-12-17 | 长春工业大学 | 一种含氟聚酯共聚物 |
| CN115873647B (zh) * | 2021-09-29 | 2023-12-19 | 兰州大学 | 提高二维纳米材料在基础油中分散稳定性的方法及提高润滑油润滑性能与抗磨损性能的方法 |
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| JP5315996B2 (ja) | 2006-07-18 | 2013-10-16 | 味の素株式会社 | 総合経腸栄養組成物 |
| FR2912751B1 (fr) | 2007-02-16 | 2012-07-13 | Arkema France | Procede de preparation de polylactones et polylactames |
| EP2093242A1 (fr) * | 2008-02-25 | 2009-08-26 | Total Petrochemicals Research Feluy | Complexes post-métallocéniques de groupe 3 basés sur des ligands bis(naphtoxy) pyridine et bis(naphtoxy) thiophène pour la polymérisation d'ouverture de cycle de monomères polaires cycliques |
| FR2953523B1 (fr) * | 2009-12-08 | 2013-02-15 | Arkema France | Procede de preparation d'un polymere d'au moins un monomere cyclique |
| ES2561434T3 (es) * | 2010-09-21 | 2016-02-26 | Total Research & Technology Feluy | Procedimiento de una etapa, un recipiente de preparación de copolímero multibloque y en gradiente |
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- 2017-06-22 US US16/311,465 patent/US20190187559A1/en not_active Abandoned
- 2017-06-22 EP EP17737339.6A patent/EP3475333A1/fr not_active Withdrawn
- 2017-06-22 CN CN201780049846.6A patent/CN109843971A/zh active Pending
- 2017-06-22 WO PCT/FR2017/051654 patent/WO2017220934A1/fr not_active Ceased
- 2017-06-22 JP JP2019520502A patent/JP2019519665A/ja active Pending
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| KR20190020792A (ko) | 2019-03-04 |
| TW201816508A (zh) | 2018-05-01 |
| CN109843971A (zh) | 2019-06-04 |
| FR3053043B1 (fr) | 2018-08-10 |
| FR3053043A1 (fr) | 2017-12-29 |
| US20190187559A1 (en) | 2019-06-20 |
| WO2017220934A1 (fr) | 2017-12-28 |
| SG11201811481PA (en) | 2019-01-30 |
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