EP3381574A1 - Härtung von anstrichfilmen auf wasserbasis - Google Patents

Härtung von anstrichfilmen auf wasserbasis Download PDF

Info

Publication number
EP3381574A1
EP3381574A1 EP17164161.6A EP17164161A EP3381574A1 EP 3381574 A1 EP3381574 A1 EP 3381574A1 EP 17164161 A EP17164161 A EP 17164161A EP 3381574 A1 EP3381574 A1 EP 3381574A1
Authority
EP
European Patent Office
Prior art keywords
radiation sources
target film
chamber
radiation
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP17164161.6A
Other languages
English (en)
French (fr)
Inventor
Ömer Gökçe KUYUCU
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vestel Elektronik Sanayi ve Ticaret AS
Original Assignee
Vestel Elektronik Sanayi ve Ticaret AS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vestel Elektronik Sanayi ve Ticaret AS filed Critical Vestel Elektronik Sanayi ve Ticaret AS
Priority to EP17164161.6A priority Critical patent/EP3381574A1/de
Publication of EP3381574A1 publication Critical patent/EP3381574A1/de
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0209—Multistage baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B05D3/0263—After-treatment with IR heaters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun
    • F26B3/30—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun from infrared-emitting elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
    • B05D2401/20—Aqueous dispersion or solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0486—Operating the coating or treatment in a controlled atmosphere

Definitions

  • the present invention relates to curing wet water-based paint films, using heating radiation.
  • a water-based paint may comprise any water-based composition that can be applied as a thin film to a supporting substrate.
  • a water-based paint may comprise one or more pigments and/or other additives dissolved and/or suspended in water. Some water-based paints are curable by heating, whereby the solid film remaining on the substrate is rendered more resistant to water.
  • Curing of wet water-based paint films supported on a substrate may be carried out by using an irradiative technique according to which at least part of the radiation is absorbed by the substrate.
  • This technique can achieve good uniform heating and curing of the water-based paint film.
  • the inventor for the present application has identified the problem that such an irradiative technique can produce surface defects in the target film.
  • One aim of the research work carried out by the inventor for the present application is to provide a curing technique for which there is less risk of producing surface defects.
  • one embodiment of the curing technique developed by the inventor for the present application comprises operating one or more radiation sources having an emission spectrum characterised by a peak wavelength in the medium infrared range in combination with one or more radiation sources having an emission spectrum characterised by a peak wavelength in the short infrared range.
  • US2002/0034594 happens to describe a technique using a range of IR lamps at different wavelengths, but there is no mention in US2002/0034594 of the problem identified by the inventor for the present application, nor any mention of technical solution developed by the inventor for the present application.
  • a method of curing a target film comprising: controlling the operation of one or more of: (i) one or more first radiation sources for primarily heating the target film within a chamber, (ii) one or more second radiation sources for primarily evaporating water from the target film, and (iii) one or more extraction devices for extracting water vapour from the chamber, at least partly on the basis of one or more indicators of the concentration of water vapour at one or more locations within the chamber.
  • controlling the operation of one or more of (i) said one or more first radiation sources, (ii) said one or second radiation sources, and (iii) said one or more extraction devices is also based on one or more indicators of the temperature at the surface of the target film at one or more locations within the chamber.
  • the method comprises operating the one or more second radiation sources at an emission spectrum characterised by a peak wavelength within the infrared range longer than the peak wavelength of the emission spectrum of the one or more first radiation sources.
  • controlling the operation of one or more second radiation sources comprises switching between supplying and cutting power to the one or more second radiation sources.
  • controlling the one or more first radiation sources comprises controlling the distance of the one or more first radiation sources from the target film.
  • the method further comprises triggering an alert in response to detecting that a rate of evaporation of water from the target film exceeds a predetermined upper threshold or is lower than a predetermined lower threshold.
  • the method further comprises conveying the target film along a route through the chamber, locating said first and second radiation sources at a plurality of locations along the route, and providing heating radiation reflectors between said locations.
  • heating of the target film by radiation from the one or more first radiation sources occurs at least partly via absorption of radiation from the one or more first radiation sources by a substrate in thermal contact with the target film.
  • an apparatus for curing a target film comprising: a chamber; one or more first radiation sources for primarily heating the target film within the chamber; one or more second radiation sources for primarily evaporating water from the target film; one or more extraction devices for extracting water vapour from the chamber; and a controller configured to control operation of one or more of (i) said one or more first radiation sources, (ii) said one or more second radiation sources, and (iii) said one or more extraction devices at least partly on the basis of one or more indicators of the concentration of water vapour at one or more locations within the chamber.
  • the controller is configured to control the operation of one or more of (i) said one or more first radiation sources, (ii) said one or second radiation sources, and (iii) said one or more extraction devices also on the basis of one or more indicators of the temperature of the surface of the target film at one or more locations within the chamber.
  • the controller is configured to operate the one or more second radiation sources at an emission spectrum characterised by a peak wavelength within the infrared range longer than the peak wavelength of the emission spectrum of the one or more first radiation sources.
  • controlling operation of the one or more second radiation sources comprises switching between supplying and cutting power to the one or more second radiation sources.
  • controlling the one or more first radiation sources comprises controlling the distance of the one or more first radiation sources from the target film.
  • the controller is configured to trigger an alert in response to detecting that a rate of evaporation of water from the target film exceeds a predetermined upper threshold or is lower than a predetermined lower threshold.
  • the apparatus further comprises a conveyor for conveying the target film along a route through the chamber; said first and second radiation sources are located at a plurality of locations along the route; and wherein the apparatus further comprises heating radiation reflectors between said locations.
  • heating of the target film by radiation from the one or more first radiation sources occurs at least partly via absorption of radiation from the one or more first radiation sources by a substrate in thermal contact with the target film.
  • Figure 1 shows the arrangement of elements within the housing at one stage along the route of a target object through the oven - the same or similar arrangement of some or all of these same elements also exists within the housing at other stages (at different distances from the oven entrance) of the route of a target object through the oven.
  • the elements shown in Figure 1 comprise: a conveyor 4 to support and transport a target object comprising a wet water-based paint film 6 supported by a substrate 8 along a route through the oven from the oven entrance to the oven exit; short-wave IR lamps 10 (having an emission spectrum characterised by a peak wavelength in the range of about 0.75 to about 3 microns) moveable between at least proximal (P) and distal (D) positions relative to the target object; medium-wave IR lamps 11 having an emission spectrum characterised by a peak wavelength in the range of about 3 to about 8 microns; a humidity sensor 12 (one example of an absolute humidity sensor is a thermal hygrometer, which measures changes in the thermal conductivity of air).
  • a temperature sensor 13 one example of a temperature sensor is a remote-sensing thermometer such as a pyrometer or a radiometric thermometer which determines the temperature at the surface of the target object from the spectrum of the thermal radiation that it emits) to measure the temperature at the surface of the target object.
  • the curing apparatus also comprises extraction fans 14 on one or both sides of the conveyor 4 to remove gaseous material including water vapour from inside the curing chamber 2.
  • the short-wave IR lamps 10, medium-wave IR lamps 11 and extraction fans 14 at different stages along the route of the target object through the oven are independently controllable, such that e.g. medium-wave IR lamps 11 at one stage may be on while medium-wave IR lamps at one or more other stages may be off, and the same applies to the short-wave IR lamps 10 and the extraction fans 14.
  • the curing apparatus may also comprise infra-red reflectors between IR lamps 10, 11 at different stages, to better isolate IR lamps 10, 11 at one stage from IR lamps 10, 11 at adjacent stage(s) (i.e. to better avoid IR lamps 10, 11 at one stage heating the target object at another stage served by other IR lamps 10, 11), and thereby facilitate better independent control of the IR lamps 10, 11 at different stages.
  • the curing apparatus also includes a controller 16 configured to receive input signals from at least the humidity sensors 12 and the temperature sensors 13 at the plurality of stages and output control signals to control the following: supply power to the short-wave IR lamps 10; movement supply of power to the medium-wave IR lamps 11; and operation of the extraction fans 14.
  • the short-wave IR lamps 10 have an emission spectrum that is better suited than that of the medium-wave IR lamps 11 to penetration of radiation through the water-based paint film 6 and absorption by the substrate 8.
  • the medium-wave IR lamps 11 have an emission spectrum that is better suited than that of the short-wave IR lamps 10 to the evaporation of water from an outer surface portion of the water-based paint film 6.
  • a target object including an uncured water-based paint film 6 in thermal contact with a substrate 8 is placed on the conveyor 4 for transport through the oven.
  • the controller 16 monitors input signals from the humidity sensors 12 and temperature sensors 13 at different stages along the route (STEP 500 of Figure 5 ), and determines one or more operating parameters for the short-wave IR lamps, medium-wave IR lamps and extraction fans at the plurality of stages along the route to achieve the desired curing rate without causing excessive surface heating and surface defects (STEP 502 of Figure 5 ).
  • This cycle of feedback-based control is repeated throughout the passage of the target object through the oven to achieve good control of the curing process during the whole passage of the target object through the oven 2.
  • the controller operates the short-wave IR lamps 10 in the proximal position (P) relative to the conveyor 4, and supplies power to the medium-wave IR lamps 11 and the extraction fan(s) 14.
  • the controller 16 again operates the short-wave IR lamps 10 in the proximal position, but cuts the supply of power to the medium-wave IR lamps 11 and the extraction fan(s) 14.
  • the controller operates the short-wave IR lamps 10 in the distal position (D) and cuts the supply of power to the medium-wave IR lamps 11 and the extraction fans 14.
  • a relatively high concentration of water (high water content) in the water-based paint film 6 leads to a relatively high concentration of water vapour above the water-based paint film 6, which water vapour attenuates the radiation from the short-wave IR lamps 10, reducing the intensity of radiation absorbed by the substrate 8, and thereby reducing the heating of the water-based paint film 6 by the substrate 8.
  • the medium IR lamps 11 and extraction fan 14 can be operated (to increase the rate of water removal from the water-based paint film 6) and the short-wave IR lamps 10 can be operated in the proximal position, without any significant risk of excessive heating of the water-based paint film 6 by the short-wave IR lamps 10 and causing defects in the surface of the water-based paint film 6.
  • switching off the medium-wave IR lamps 11 and the extraction fan 9 reduces the rate of removal of water from the water-based paint film 6 and reduces the risk of excessive heating of the water-based paint film 6 by the short-wave IR lamps 10. Moving the short-wave IR lamps 10 from the proximal position to the distal position further reduces the risk of excessive heating of the water-based paint film 6 by the short-wave IR lamps 10.
  • the humidity sensors 12 may also be used to evaluate the performance of the system.
  • the controller 16 may be configured to trigger an alert if the humidity sensors indicate an excessively low or excessively high rate of evaporation of water from the target film.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
EP17164161.6A 2017-03-31 2017-03-31 Härtung von anstrichfilmen auf wasserbasis Withdrawn EP3381574A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP17164161.6A EP3381574A1 (de) 2017-03-31 2017-03-31 Härtung von anstrichfilmen auf wasserbasis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP17164161.6A EP3381574A1 (de) 2017-03-31 2017-03-31 Härtung von anstrichfilmen auf wasserbasis

Publications (1)

Publication Number Publication Date
EP3381574A1 true EP3381574A1 (de) 2018-10-03

Family

ID=58669577

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17164161.6A Withdrawn EP3381574A1 (de) 2017-03-31 2017-03-31 Härtung von anstrichfilmen auf wasserbasis

Country Status (1)

Country Link
EP (1) EP3381574A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117483161A (zh) * 2023-11-02 2024-02-02 江西省启光涂装机械有限公司 一种具有智能固化效果的彩漆涂布装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998031474A1 (en) * 1997-01-15 1998-07-23 Optimum Air Corporation System and method for drying and curing waterbased coatings
US20020034594A1 (en) 2000-05-09 2002-03-21 Shiveley James Thomas Rapid efficient infrared curing of powder coatings/wet coatings and for ultraviolet curing of coatings as applied to labaoratory and production processing
CN102806184A (zh) * 2011-06-01 2012-12-05 张家港市佳龙真空浸漆设备制造厂 静电喷漆的固化设备
US20140110390A1 (en) * 2012-10-19 2014-04-24 Nike, Inc. Energy Efficient Infrared Oven
US20160282047A1 (en) * 2015-03-24 2016-09-29 Cefla Deutschland Gmbh Drying Device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998031474A1 (en) * 1997-01-15 1998-07-23 Optimum Air Corporation System and method for drying and curing waterbased coatings
US20020034594A1 (en) 2000-05-09 2002-03-21 Shiveley James Thomas Rapid efficient infrared curing of powder coatings/wet coatings and for ultraviolet curing of coatings as applied to labaoratory and production processing
CN102806184A (zh) * 2011-06-01 2012-12-05 张家港市佳龙真空浸漆设备制造厂 静电喷漆的固化设备
US20140110390A1 (en) * 2012-10-19 2014-04-24 Nike, Inc. Energy Efficient Infrared Oven
US20160282047A1 (en) * 2015-03-24 2016-09-29 Cefla Deutschland Gmbh Drying Device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117483161A (zh) * 2023-11-02 2024-02-02 江西省启光涂装机械有限公司 一种具有智能固化效果的彩漆涂布装置

Similar Documents

Publication Publication Date Title
US10548226B1 (en) LED-based UV radiation source machine to process coatings
TWI641793B (zh) 高效能的紅外爐
US9841234B2 (en) Drying device
EP3381574A1 (de) Härtung von anstrichfilmen auf wasserbasis
KR20140009017A (ko) 히터 유닛 및 열처리 장치
JP2016005841A (ja) 可動基板上に過渡熱プロファイル処理を提供するための装置
FI974291A (fi) Menetelmä ja laite jäänpoistoon lentokoneesta infrapunasäteilyllä
US7225560B2 (en) Computer to plate curing system
TWI717484B (zh) 低溫乾燥裝置
US20210080178A1 (en) Method for drying wood using microwave
WO2016001456A1 (es) Dispositivo y procedimiento para el secado de productos
JP4912116B2 (ja) 水分・揮発性物質の低減方法及び低減装置
EA201600551A1 (ru) Способ и устройство для сушки обрезков древесины
TW201411779A (zh) 用於分離，至少部分乾燥與檢測電子元件的裝置與方法
EP3664120B1 (de) Vakuumkühlvorrichtung, ionenstrahlätzvorrichtung und betriebsverfahren
JP3912385B2 (ja) 木材乾燥装置
JP2020520551A (ja) 対象物の表面を処理するための装置
JP3886952B2 (ja) 木材乾燥方法及び装置
JP2017056190A5 (de)
JP2009052792A (ja) 近赤外線照射乾燥装置
RU2725484C1 (ru) Способ сушки моркови при приготовлении чипсов
KR20170014893A (ko) 마이크로파를 이용한 목재 건조공정의 제어방법
RU2588348C2 (ru) Свч-сушильная камера для сушки крупномерных лесоматериалов
SU896352A1 (ru) Ультрафиолетовый излучатель дл сушки изделий
CN118423960A (zh) 一种烘箱

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20190329

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20190710

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

REG Reference to a national code

Ref country code: DE

Ref legal event code: R079

Free format text: PREVIOUS MAIN CLASS: B05D0003020000

Ipc: F26B0003300000

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIC1 Information provided on ipc code assigned before grant

Ipc: B05D 3/04 20060101ALI20230703BHEP

Ipc: B05D 3/02 20060101ALI20230703BHEP

Ipc: F26B 3/30 20060101AFI20230703BHEP

INTG Intention to grant announced

Effective date: 20230720

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20231201