EP3362855A4 - Microstructure patterns - Google Patents

Microstructure patterns Download PDF

Info

Publication number
EP3362855A4
EP3362855A4 EP16854644.8A EP16854644A EP3362855A4 EP 3362855 A4 EP3362855 A4 EP 3362855A4 EP 16854644 A EP16854644 A EP 16854644A EP 3362855 A4 EP3362855 A4 EP 3362855A4
Authority
EP
European Patent Office
Prior art keywords
microstructure patterns
microstructure
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP16854644.8A
Other languages
German (de)
French (fr)
Other versions
EP3362855A1 (en
EP3362855B1 (en
Inventor
Henry Claudius BILINSKY
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Microtau IP Pty Ltd
Original Assignee
Micro Tau Ip Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micro Tau Ip Pty Ltd filed Critical Micro Tau Ip Pty Ltd
Priority to EP22173388.4A priority Critical patent/EP4063952A1/en
Publication of EP3362855A1 publication Critical patent/EP3362855A1/en
Publication of EP3362855A4 publication Critical patent/EP3362855A4/en
Application granted granted Critical
Publication of EP3362855B1 publication Critical patent/EP3362855B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B64—AIRCRAFT; AVIATION; COSMONAUTICS
    • B64G—COSMONAUTICS; VEHICLES OR EQUIPMENT THEREFOR
    • B64G1/00—Cosmonautic vehicles
    • B64G1/22—Parts of, or equipment specially adapted for fitting in or to, cosmonautic vehicles
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Remote Sensing (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
EP16854644.8A 2015-10-13 2016-10-13 Microstructure patterns Active EP3362855B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP22173388.4A EP4063952A1 (en) 2015-10-13 2016-10-13 Microstructure patterns

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562240708P 2015-10-13 2015-10-13
PCT/AU2016/050960 WO2017063040A1 (en) 2015-10-13 2016-10-13 Microstructure patterns

Related Child Applications (2)

Application Number Title Priority Date Filing Date
EP22173388.4A Division-Into EP4063952A1 (en) 2015-10-13 2016-10-13 Microstructure patterns
EP22173388.4A Division EP4063952A1 (en) 2015-10-13 2016-10-13 Microstructure patterns

Publications (3)

Publication Number Publication Date
EP3362855A1 EP3362855A1 (en) 2018-08-22
EP3362855A4 true EP3362855A4 (en) 2019-07-03
EP3362855B1 EP3362855B1 (en) 2022-11-30

Family

ID=58516929

Family Applications (2)

Application Number Title Priority Date Filing Date
EP22173388.4A Withdrawn EP4063952A1 (en) 2015-10-13 2016-10-13 Microstructure patterns
EP16854644.8A Active EP3362855B1 (en) 2015-10-13 2016-10-13 Microstructure patterns

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP22173388.4A Withdrawn EP4063952A1 (en) 2015-10-13 2016-10-13 Microstructure patterns

Country Status (10)

Country Link
US (2) US10877377B2 (en)
EP (2) EP4063952A1 (en)
JP (2) JP6981663B6 (en)
CN (1) CN108369371A (en)
AU (1) AU2016340034B2 (en)
CA (1) CA3001742C (en)
PH (1) PH12018500787A1 (en)
SG (1) SG11201802842QA (en)
TW (1) TWI764946B (en)
WO (1) WO2017063040A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10877377B2 (en) 2015-10-13 2020-12-29 Microtau Ip Pty Ltd Microstructure patterns
DE102017206968B4 (en) * 2017-04-26 2019-10-10 4Jet Microtech Gmbh & Co. Kg Method and device for producing riblets
DE102017218543A1 (en) 2017-10-17 2019-04-18 Lufthansa Technik Ag Flow-optimized surface and vehicle with such a flow-optimized surface
WO2020131185A2 (en) 2018-09-26 2020-06-25 Dvorchak Enterprises Llc One component uv curable compositions and methods for making same
KR20210145138A (en) * 2019-03-26 2021-12-01 닛토덴코 가부시키가이샤 Manufacturing method of laminated film
EP3977206A4 (en) 2019-05-30 2023-06-14 Microtau IP Pty Ltd. Systems and methods for fabricating microstructures
CN110655622B (en) * 2019-09-04 2023-05-05 华东理工大学 Method for preparing polymer brush micropattern based on maskless lithography system
US20220072743A1 (en) * 2020-06-26 2022-03-10 The Research Foundation For The State University Of New York Thermoplastic components, systems, and methods for forming same
CN111880254B (en) * 2020-07-14 2021-05-14 浙江大学 Preparation method of grating with continuously-changed diffraction efficiency
CN112708401B (en) * 2020-12-24 2021-07-27 广东工业大学 Processing system and method for graphene film with micro thermal structure pattern
CN113527740A (en) * 2021-07-15 2021-10-22 伊诺福科光学技术有限公司 Radiation refrigeration film with surface periodic micro-nano structure and preparation method
WO2023170876A1 (en) * 2022-03-10 2023-09-14 株式会社ニコン Processing apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007264224A (en) * 2006-03-28 2007-10-11 Dainippon Printing Co Ltd Mask for manufacturing printing plate, printing plate, and method of manufacturing printing plate
DE102007021249A1 (en) * 2007-05-07 2008-11-20 Singulus Technologies Ag Oxygen inhibition of a curable material in structuring substrates

Family Cites Families (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4402571A (en) * 1981-02-17 1983-09-06 Polaroid Corporation Method for producing a surface relief pattern
JPS59143158A (en) * 1983-02-07 1984-08-16 W R Gureesu:Kk Production of print plate
DE3534293A1 (en) * 1985-09-26 1987-04-02 Messerschmitt Boelkow Blohm DEVICE FOR REDUCING FRICTION RESISTANCE
GB2226970B (en) * 1989-01-11 1992-10-21 British Aerospace Methods of manufacture and surface treatment using laser radiation
JP3504426B2 (en) * 1995-03-17 2004-03-08 株式会社荏原製作所 Processing method and processing apparatus using energy beam
JPH11233428A (en) * 1998-02-12 1999-08-27 Nikon Corp Aligner and manufacture of element
JP3262074B2 (en) * 1998-06-30 2002-03-04 キヤノン株式会社 Exposure method and exposure apparatus
US6345791B1 (en) 2000-04-13 2002-02-12 Lockheed Martin Corporation Streamwise variable height riblets for reducing skin friction drag of surfaces
US6858379B2 (en) * 2001-03-22 2005-02-22 Shipley Company, L.L.C. Photoresist compositions for short wavelength imaging
JP4203310B2 (en) * 2002-12-09 2008-12-24 富士フイルム株式会社 Method for producing antiglare antireflection film
JP4280509B2 (en) * 2003-01-31 2009-06-17 キヤノン株式会社 Projection exposure mask, projection exposure mask manufacturing method, projection exposure apparatus, and projection exposure method
US7704684B2 (en) 2003-12-01 2010-04-27 The Board Of Trustees Of The University Of Illinois Methods and devices for fabricating three-dimensional nanoscale structures
US20050260013A1 (en) * 2004-05-20 2005-11-24 Bert Vanlathem Digital control strip for flexogaphic printing
US20050271973A1 (en) * 2004-06-04 2005-12-08 Ziegler Michael J Negative acting photoresist with improved blocking resistance
JP4389791B2 (en) 2004-08-25 2009-12-24 セイコーエプソン株式会社 Fine structure manufacturing method and exposure apparatus
ATE502325T1 (en) 2004-10-22 2011-04-15 Eulitha Ag SYSTEM AND METHOD FOR GENERATING A PERIODIC AND/OR NEAR-PERIODIC PATTERN ON A SAMPLE
JP2006339359A (en) * 2005-06-01 2006-12-14 Seiko Epson Corp Method of manufacturing fine structure, and electronic apparatus
DE102005031057A1 (en) * 2005-07-02 2007-01-04 Punch Graphix Prepress Germany Gmbh Process for the exposure of flexographic printing plates
JP2008064903A (en) * 2006-09-06 2008-03-21 National Institute Of Advanced Industrial & Technology Device for producing three-dimensional structure, device for producing sensor, and method for producing three-dimensional structure
US8236480B2 (en) * 2007-05-24 2012-08-07 The United States of America, as represented by the Secretary of Commere, the National Institute of Standards and Technology Fabrication method of topographically modulated microstructures using pattern homogenization with UV light
FR2921862B1 (en) 2007-10-05 2011-04-22 Macdermid Printing Solutions Europ Sas METHOD FOR PRODUCING A RELIEF-IMAGE ARRAY USED PARTICULARLY IN THE FIELD OF FLEXOGRAPHY AND ARRANGEMENT CARRIED OUT ACCORDING TO THIS METHOD
US8399179B2 (en) * 2008-04-24 2013-03-19 Hewlett-Packard Development Company, L.P. High aspect ratio microstructures
US20100003605A1 (en) * 2008-07-07 2010-01-07 International Business Machines Corporation system and method for projection lithography with immersed image-aligned diffractive element
JP5521354B2 (en) 2009-02-27 2014-06-11 三菱レイヨン株式会社 Transparent film having fine concavo-convex structure on surface and method for producing the same
US8124193B2 (en) 2009-03-09 2012-02-28 Xerox Corporation Gloss control of UV curable formulations through micro-patterning
US8367306B1 (en) * 2009-07-13 2013-02-05 Hrl Laboratories, Llc Method of continuous or batch fabrication of large area polymer micro-truss structured materials
JP2011118344A (en) * 2009-11-02 2011-06-16 Mejiro Precision:Kk Method for forming three-dimensional pattern
EP2499539B1 (en) 2009-11-13 2014-06-18 Eulitha AG Optimized mask design for fabricating periodic and quasi-periodic patterns
US9036133B2 (en) 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8368871B2 (en) 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US9007566B2 (en) 2010-07-07 2015-04-14 Eulitha Ag Apparatus and method for printing a periodic pattern with a large depth of focus
US8524443B2 (en) 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
CN103154319B (en) * 2010-10-06 2016-08-10 3M创新有限公司 There is coating based on nano silicon and the antireflective article on barrier layer
US8525973B2 (en) 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
KR101755758B1 (en) 2010-11-16 2017-07-07 유리타 아. 게. Method and apparatus for printing high-resolution two-dimensional periodic patterns
JP5721858B2 (en) 2010-12-23 2015-05-20 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ System and method for manufacturing nanostructures over a large area
EP2663898B1 (en) 2011-01-12 2015-03-25 Eulitha A.G. Method and system for printing high-resolution periodic patterns
US8772740B2 (en) * 2011-04-08 2014-07-08 Esko-Graphics Imaging Gmbh UV curing creating flattop and roundtop structures on a single printing plate
JP2014515501A (en) * 2011-06-01 2014-06-30 ユーリタ アクチエンゲゼルシャフト Printing periodic patterns with multiple lasers
US20130337386A1 (en) * 2012-06-14 2013-12-19 Dirk De Rauw Processing apparatus for processing a flexographic plate, a method and a computer program product
US20140272237A1 (en) * 2013-03-15 2014-09-18 Prc-Desoto International, Inc. Strippable film assembly and coating for drag reduction
WO2014147562A2 (en) 2013-03-18 2014-09-25 Eulitha A.G. Methods and systems for printing periodic patterns
US20150248060A1 (en) * 2014-02-28 2015-09-03 Konica Minolta Laboratory U.S.A., Inc. Method of making thermal insulation film and thermal insulation film product
WO2016115640A1 (en) * 2015-01-23 2016-07-28 Li Minggan Methods and apparatus for creation of wrinkles in three-dimensional surfaces, and compositions of matter resulting from same
US10877377B2 (en) 2015-10-13 2020-12-29 Microtau Ip Pty Ltd Microstructure patterns

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007264224A (en) * 2006-03-28 2007-10-11 Dainippon Printing Co Ltd Mask for manufacturing printing plate, printing plate, and method of manufacturing printing plate
DE102007021249A1 (en) * 2007-05-07 2008-11-20 Singulus Technologies Ag Oxygen inhibition of a curable material in structuring substrates

Also Published As

Publication number Publication date
AU2016340034A1 (en) 2018-05-10
JP2022024037A (en) 2022-02-08
US10877377B2 (en) 2020-12-29
TW201825201A (en) 2018-07-16
EP3362855A1 (en) 2018-08-22
CN108369371A (en) 2018-08-03
WO2017063040A1 (en) 2017-04-20
PH12018500787A1 (en) 2018-10-29
JP6981663B2 (en) 2021-12-15
AU2016340034B2 (en) 2021-05-06
EP3362855B1 (en) 2022-11-30
SG11201802842QA (en) 2018-05-30
US20210165330A1 (en) 2021-06-03
TWI764946B (en) 2022-05-21
EP4063952A1 (en) 2022-09-28
CA3001742A1 (en) 2017-04-20
JP2018531785A (en) 2018-11-01
CA3001742C (en) 2023-02-28
JP6981663B6 (en) 2022-01-17
US20180307138A1 (en) 2018-10-25
NZ740947A (en) 2021-09-24

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