EP3329331B1 - Dispositif de mise en forme d'un faisceau laser pour un capteur atomique - Google Patents

Dispositif de mise en forme d'un faisceau laser pour un capteur atomique Download PDF

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Publication number
EP3329331B1
EP3329331B1 EP16757293.2A EP16757293A EP3329331B1 EP 3329331 B1 EP3329331 B1 EP 3329331B1 EP 16757293 A EP16757293 A EP 16757293A EP 3329331 B1 EP3329331 B1 EP 3329331B1
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EP
European Patent Office
Prior art keywords
laser beam
retroreflector prism
plate
dielectric
atomic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP16757293.2A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP3329331A1 (fr
Inventor
Nicolas PASSILLY
Christophe Gorecki
Vincent MAURICE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite de Franche-Comte
Original Assignee
Centre National de la Recherche Scientifique CNRS
Universite de Franche-Comte
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Universite de Franche-Comte filed Critical Centre National de la Recherche Scientifique CNRS
Publication of EP3329331A1 publication Critical patent/EP3329331A1/fr
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Publication of EP3329331B1 publication Critical patent/EP3329331B1/fr
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0972—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/04—Prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G04—HOROLOGY
    • G04F—TIME-INTERVAL MEASURING
    • G04F5/00—Apparatus for producing preselected time intervals for use as timing standards
    • G04F5/14—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks
    • G04F5/145—Apparatus for producing preselected time intervals for use as timing standards using atomic clocks using Coherent Population Trapping

Definitions

  • the invention relates to the field of atomic sensors comprising alkaline vapor cells and laser beam shaping devices as well as laser beam shaping devices for such atomic sensors.
  • a typical atomic sensor according to the invention is a chip-scale atomic clock, known by the acronym CSAC (for Chip-Scale Atomic Clock).
  • CSAC Chip-Scale Atomic Clock
  • An example is the CSAC called SA.45s from the company MICROSEMI which has a volume of 16 cm3, a mass of 35 g and requires a power of only 120 mW.
  • Such an atomic micro-clock is also known from the work of the MAC-TFC consortium, the FEMTO-ST institute (acronym for Franche-Comté Electronique Mécanique Thermique et Optique - Sciences et Technologies) which has developed a very compact cesium vapor cell (a few mm3), with micro-machining MEMS (acronym for MicroElectroMechanical Systems) of the silicon and anodic welding (see for example “New approach of fabrication and dispensing of micromachined cesium vapor cell” by L. Nieradko, C. Gorecki, A. Douahi, V. Giordano, JC Beugnot, J. Dziuban and M. Moraja published in JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS August 2008 ).
  • Such a cell has an optical window diameter of approximately 2 millimeters.
  • the beam from such a vertical cavity laser is characterized by relatively low divergence (FWHM 10-15°) and size (about 20 microns at the output mirror).
  • the invention finally relates to an atomic sensor comprising a device for shaping a laser beam as defined in claim 11.
  • the dependent claims define additional embodiments.
  • the retro-reflecting prism 9 comprises an entry zone 12 for an incoming laser beam 5b, an exit zone 13 for an outgoing laser beam 5d as well as two reflection faces 14, 15 for an internal laser beam 5c .
  • Such a plane of section H of the retro-reflector prism 9 is in particular a plane perpendicular to the direction of intersection I between respective geometric planes of extension P1, P2 of the two reflection faces 14, 15.
  • the metal strips 18 are also juxtaposed with respect to each other in a passing direction DP of the metal network 17 perpendicular to the direction of the metal strip DM.
  • the geometric plane of extension PL of the dielectric network 20 can be parallel to the geometric plane of extension PP of the metal network 17.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ecology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Polarising Elements (AREA)
EP16757293.2A 2015-07-28 2016-07-21 Dispositif de mise en forme d'un faisceau laser pour un capteur atomique Active EP3329331B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1557210A FR3039657B1 (fr) 2015-07-28 2015-07-28 Dispositif de mise en forme d'un faisceau laser pour un capteur atomique
PCT/FR2016/051890 WO2017017351A1 (fr) 2015-07-28 2016-07-21 Dispositif de mise en forme d'un faisceau laser pour un capteur atomique

Publications (2)

Publication Number Publication Date
EP3329331A1 EP3329331A1 (fr) 2018-06-06
EP3329331B1 true EP3329331B1 (fr) 2022-03-30

Family

ID=55542729

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16757293.2A Active EP3329331B1 (fr) 2015-07-28 2016-07-21 Dispositif de mise en forme d'un faisceau laser pour un capteur atomique

Country Status (6)

Country Link
US (1) US11002977B2 (ja)
EP (1) EP3329331B1 (ja)
JP (1) JP6865733B2 (ja)
CN (1) CN108027587B (ja)
FR (1) FR3039657B1 (ja)
WO (1) WO2017017351A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110260851B (zh) * 2019-05-17 2021-07-02 北京航空航天大学 一种基于双亚波长光栅腔检测的光力学微机械陀螺
CN113406876B (zh) * 2021-06-18 2022-07-12 中国科学院国家授时中心 连续式cpt态制备与差分探测的方法及系统
CN116826521B (zh) * 2023-08-31 2023-11-28 中国航天三江集团有限公司 一种反射式原子气室及其制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8164721B2 (en) * 2003-12-11 2012-04-24 Tan Kim L Grating trim retarders
US7619485B2 (en) * 2007-01-31 2009-11-17 Teledyne Scientific & Imaging, Llc Compact optical assembly for chip-scale atomic clock
WO2009134269A1 (en) * 2008-05-01 2009-11-05 Agoura Technologies, Inc. A wire grid polarizer for use on the front side of lcds
US8816783B2 (en) 2009-09-04 2014-08-26 Csem Centre Suisse D'electronique Et De Microtechnique S.A. Device for an atomic clock
JP2012074111A (ja) * 2010-09-29 2012-04-12 Toppan Printing Co Ltd 広帯域１／４波長板
US8624682B2 (en) * 2011-06-13 2014-01-07 Honeywell International Inc. Vapor cell atomic clock physics package
US20130043956A1 (en) * 2011-08-15 2013-02-21 Honeywell International Inc. Systems and methods for a nanofabricated optical circular polarizer
JP2015082763A (ja) * 2013-10-23 2015-04-27 セイコーエプソン株式会社 光学モジュールおよび原子発振器
JP6361129B2 (ja) * 2013-12-20 2018-07-25 セイコーエプソン株式会社 ガスセル、量子干渉装置、原子発振器、電子機器および移動体
CN105514797B (zh) * 2016-01-13 2018-07-24 山西大学 基于双光子超精细能级光谱的激光频率锁定装置及方法

Also Published As

Publication number Publication date
US11002977B2 (en) 2021-05-11
FR3039657A1 (fr) 2017-02-03
FR3039657B1 (fr) 2017-08-18
WO2017017351A1 (fr) 2017-02-02
JP6865733B2 (ja) 2021-04-28
CN108027587B (zh) 2020-07-17
CN108027587A (zh) 2018-05-11
JP2018532133A (ja) 2018-11-01
US20180217384A1 (en) 2018-08-02
EP3329331A1 (fr) 2018-06-06

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