EP3317432A4 - Dispositif de génération d'impulsions et procédé pour un système de pulvérisation cathodique à magnétron - Google Patents
Dispositif de génération d'impulsions et procédé pour un système de pulvérisation cathodique à magnétron Download PDFInfo
- Publication number
- EP3317432A4 EP3317432A4 EP15897286.9A EP15897286A EP3317432A4 EP 3317432 A4 EP3317432 A4 EP 3317432A4 EP 15897286 A EP15897286 A EP 15897286A EP 3317432 A4 EP3317432 A4 EP 3317432A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- generation device
- magnetron sputtering
- pulse generation
- sputtering system
- magnetron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3444—Associated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/SE2015/050779 WO2017003339A1 (fr) | 2015-07-02 | 2015-07-02 | Dispositif de génération d'impulsions et procédé pour un système de pulvérisation cathodique à magnétron |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3317432A1 EP3317432A1 (fr) | 2018-05-09 |
EP3317432A4 true EP3317432A4 (fr) | 2018-07-04 |
Family
ID=57608555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP15897286.9A Withdrawn EP3317432A4 (fr) | 2015-07-02 | 2015-07-02 | Dispositif de génération d'impulsions et procédé pour un système de pulvérisation cathodique à magnétron |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP3317432A4 (fr) |
WO (1) | WO2017003339A1 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11069515B2 (en) | 2017-06-12 | 2021-07-20 | Starfire Industries Llc | Pulsed power module with pulse and ion flux control for magnetron sputtering |
TW202340495A (zh) | 2019-02-11 | 2023-10-16 | 美商應用材料股份有限公司 | 物理氣相沉積方法 |
US20230124940A1 (en) * | 2020-03-10 | 2023-04-20 | Slovenka Technicka Univerzita V. Bratilasve | Connection of high-performance pulse discharge plasma generator, especially for magnetron sputtering |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2437080A (en) * | 2006-04-11 | 2007-10-17 | Hauzer Techno Coating Bv | Vacuum treatment apparatus with additional voltage supply |
EP2325349A1 (fr) * | 2008-09-08 | 2011-05-25 | Kabushiki Kaisha Kobe Seiko Sho | Dispositif de pulvérisation cathodique |
US20140265852A1 (en) * | 2013-03-15 | 2014-09-18 | Lam Research Corporation | Dual Control Modes |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003022524A (ja) * | 2001-07-06 | 2003-01-24 | National Institute Of Advanced Industrial & Technology | 磁気記録材料用基板の製造方法及び磁気記録材料 |
AU2003203127A1 (en) * | 2002-03-15 | 2003-09-29 | Unaxis Balzers Ag | Vacuum plasma generator |
GB0608582D0 (en) * | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
KR20090118912A (ko) * | 2006-12-12 | 2009-11-18 | 오씨 외를리콘 발처스 악티엔게젤샤프트 | 고전력 임펄스 마그네트론 스퍼터링(hipims)을 구비한 rf 기판 바이어스 |
DE102008057286B3 (de) * | 2008-11-14 | 2010-05-20 | Systec System- Und Anlagentechnik Gmbh & Co. Kg | Verfahren und Vorrichtung zur PVD-Beschichtung mit schaltbarer Biasspannung |
US20110005920A1 (en) * | 2009-07-13 | 2011-01-13 | Seagate Technology Llc | Low Temperature Deposition of Amorphous Thin Films |
DE102013106351A1 (de) * | 2013-06-18 | 2014-12-18 | Innovative Ion Coatings Ltd. | Verfahren zur Vorbehandlung einer zu beschichtenden Oberfläche |
-
2015
- 2015-07-02 WO PCT/SE2015/050779 patent/WO2017003339A1/fr active Application Filing
- 2015-07-02 EP EP15897286.9A patent/EP3317432A4/fr not_active Withdrawn
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2437080A (en) * | 2006-04-11 | 2007-10-17 | Hauzer Techno Coating Bv | Vacuum treatment apparatus with additional voltage supply |
EP2325349A1 (fr) * | 2008-09-08 | 2011-05-25 | Kabushiki Kaisha Kobe Seiko Sho | Dispositif de pulvérisation cathodique |
US20140265852A1 (en) * | 2013-03-15 | 2014-09-18 | Lam Research Corporation | Dual Control Modes |
Non-Patent Citations (1)
Title |
---|
See also references of WO2017003339A1 * |
Also Published As
Publication number | Publication date |
---|---|
EP3317432A1 (fr) | 2018-05-09 |
WO2017003339A1 (fr) | 2017-01-05 |
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Legal Events
Date | Code | Title | Description |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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17P | Request for examination filed |
Effective date: 20180130 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
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A4 | Supplementary search report drawn up and despatched |
Effective date: 20180601 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 29/66 20060101ALI20180525BHEP Ipc: H01J 37/34 20060101ALI20180525BHEP Ipc: C23C 14/02 20060101AFI20180525BHEP Ipc: C23C 14/35 20060101ALI20180525BHEP |
|
DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20190606 |