EP3244239A1 - Optischer artikel mit einem substrat mit einer antireflexbeschichtung - Google Patents
Optischer artikel mit einem substrat mit einer antireflexbeschichtung Download PDFInfo
- Publication number
- EP3244239A1 EP3244239A1 EP16305552.8A EP16305552A EP3244239A1 EP 3244239 A1 EP3244239 A1 EP 3244239A1 EP 16305552 A EP16305552 A EP 16305552A EP 3244239 A1 EP3244239 A1 EP 3244239A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- optical article
- coating
- polymer coating
- article according
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 50
- 239000000758 substrate Substances 0.000 title claims abstract description 13
- 239000006117 anti-reflective coating Substances 0.000 title description 6
- 238000000576 coating method Methods 0.000 claims abstract description 103
- 239000011248 coating agent Substances 0.000 claims abstract description 98
- 229920000642 polymer Polymers 0.000 claims abstract description 65
- 230000003667 anti-reflective effect Effects 0.000 claims abstract description 10
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 230000001747 exhibiting effect Effects 0.000 claims abstract description 3
- 239000000084 colloidal system Substances 0.000 claims description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 6
- 229910001882 dioxygen Inorganic materials 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 6
- 238000005299 abrasion Methods 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 2
- 239000000523 sample Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 6
- 238000004630 atomic force microscopy Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000009832 plasma treatment Methods 0.000 description 5
- -1 polysiloxane Polymers 0.000 description 5
- JHQVCQDWGSXTFE-UHFFFAOYSA-N 2-(2-prop-2-enoxycarbonyloxyethoxy)ethyl prop-2-enyl carbonate Chemical compound C=CCOC(=O)OCCOCCOC(=O)OCC=C JHQVCQDWGSXTFE-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 229920002313 fluoropolymer Polymers 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000004811 fluoropolymer Substances 0.000 description 3
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000572 ellipsometry Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- NFRRMEMOPXUROM-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CC)OCC1CO1 NFRRMEMOPXUROM-UHFFFAOYSA-N 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- FNBIAJGPJUOAPB-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)C(CC)OCC1CO1 FNBIAJGPJUOAPB-UHFFFAOYSA-N 0.000 description 2
- ZNXDCSVNCSSUNB-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CO[Si](OC)(OC)CCOCC1CO1 ZNXDCSVNCSSUNB-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- QLUOTIPAKQNTGM-UHFFFAOYSA-N 1-(oxiran-2-ylmethoxy)butyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)C(CCC)OCC1CO1 QLUOTIPAKQNTGM-UHFFFAOYSA-N 0.000 description 1
- YDLRHJCZKKFTCD-UHFFFAOYSA-N 1-(oxiran-2-ylmethoxy)ethyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)C(C)OCC1CO1 YDLRHJCZKKFTCD-UHFFFAOYSA-N 0.000 description 1
- RSZSZOBFBLDTDV-UHFFFAOYSA-N 1-(oxiran-2-ylmethoxy)propyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)C(CC)OCC1CO1 RSZSZOBFBLDTDV-UHFFFAOYSA-N 0.000 description 1
- ROYZOPPLNMOKCU-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl-tripropoxysilane Chemical compound C1C(CC[Si](OCCC)(OCCC)OCCC)CCC2OC21 ROYZOPPLNMOKCU-UHFFFAOYSA-N 0.000 description 1
- KRSNNVWORUWKSH-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxy)ethyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CCOCC1CO1 KRSNNVWORUWKSH-UHFFFAOYSA-N 0.000 description 1
- ALRJENJPEPZEBR-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxy)propyl-tripropoxysilane Chemical compound CCCO[Si](OCCC)(OCCC)CC(C)OCC1CO1 ALRJENJPEPZEBR-UHFFFAOYSA-N 0.000 description 1
- YXYCGBBZGQNOFX-UHFFFAOYSA-N 3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl-tripropoxysilane Chemical compound C1C(CCC[Si](OCCC)(OCCC)OCCC)CCC2OC21 YXYCGBBZGQNOFX-UHFFFAOYSA-N 0.000 description 1
- PTOCVXOZAZOZTJ-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl(tripropoxy)silane Chemical compound C1C(C[Si](OCCC)(OCCC)OCCC)CCC2OC21 PTOCVXOZAZOZTJ-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- CIUQDSCDWFSTQR-UHFFFAOYSA-N [C]1=CC=CC=C1 Chemical compound [C]1=CC=CC=C1 CIUQDSCDWFSTQR-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000006118 anti-smudge coating Substances 0.000 description 1
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Inorganic materials O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- JKJWYKGYGWOAHT-UHFFFAOYSA-N bis(prop-2-enyl) carbonate Chemical compound C=CCOC(=O)OCC=C JKJWYKGYGWOAHT-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- OJFSSMMLSDOSEX-UHFFFAOYSA-N butyl-[1-(7-oxabicyclo[4.1.0]heptan-4-yl)propoxy]-dipropoxysilane Chemical compound C1C(C(CC)O[Si](OCCC)(OCCC)CCCC)CCC2OC21 OJFSSMMLSDOSEX-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000013068 control sample Substances 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- TVAHKKLDNUOPAT-UHFFFAOYSA-N dibutoxy-ethyl-[1-(7-oxabicyclo[4.1.0]heptan-4-yl)butoxy]silane Chemical compound C1C(C(CCC)O[Si](CC)(OCCCC)OCCCC)CCC2OC21 TVAHKKLDNUOPAT-UHFFFAOYSA-N 0.000 description 1
- IFBXOJJVPCVSDH-UHFFFAOYSA-N dibutoxy-methyl-[1-(7-oxabicyclo[4.1.0]heptan-4-yl)butoxy]silane Chemical compound C1C(C(CCC)O[Si](C)(OCCCC)OCCCC)CCC2OC21 IFBXOJJVPCVSDH-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- PBDDFKGMGASJHE-UHFFFAOYSA-N dimethoxy-methyl-(7-oxabicyclo[4.1.0]heptan-4-ylmethoxy)silane Chemical compound C1C(CO[Si](C)(OC)OC)CCC2OC21 PBDDFKGMGASJHE-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- MEXGMFLNFVSECQ-UHFFFAOYSA-N dimethoxy-methyl-[3-[2-(oxiran-2-ylmethoxy)ethoxy]propyl]silane Chemical compound CO[Si](C)(OC)CCCOCCOCC1CO1 MEXGMFLNFVSECQ-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- ICCDZMWNLNRHGP-UHFFFAOYSA-N methyl-[3-(oxiran-2-ylmethoxy)propyl]-bis(prop-1-en-2-yloxy)silane Chemical compound CC(=C)O[Si](C)(OC(C)=C)CCCOCC1CO1 ICCDZMWNLNRHGP-UHFFFAOYSA-N 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- IMZDHGUWOUSUDA-UHFFFAOYSA-N oxiran-2-ylmethoxymethyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)COCC1CO1 IMZDHGUWOUSUDA-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000636 poly(norbornene) polymer Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000003553 thiiranes Chemical class 0.000 description 1
- MLTZHLHGXYAZPU-UHFFFAOYSA-N tributoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)COCC1CO1 MLTZHLHGXYAZPU-UHFFFAOYSA-N 0.000 description 1
- VBZKZUHVIFHDDD-UHFFFAOYSA-N tributoxy-[1-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C(CCC)OCC1CO1 VBZKZUHVIFHDDD-UHFFFAOYSA-N 0.000 description 1
- HBXRMPFDHZIUFJ-UHFFFAOYSA-N tributoxy-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C(C)OCC1CO1 HBXRMPFDHZIUFJ-UHFFFAOYSA-N 0.000 description 1
- XQDYAOWPTAJENA-UHFFFAOYSA-N tributoxy-[1-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C(CC)OCC1CO1 XQDYAOWPTAJENA-UHFFFAOYSA-N 0.000 description 1
- AAIBUMCPBXSZDU-UHFFFAOYSA-N tributoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCOCC1CO1 AAIBUMCPBXSZDU-UHFFFAOYSA-N 0.000 description 1
- RXTGGEGRYABTMQ-UHFFFAOYSA-N tributoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CC(C)OCC1CO1 RXTGGEGRYABTMQ-UHFFFAOYSA-N 0.000 description 1
- NKLKGGCLDYNMKP-UHFFFAOYSA-N tributoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OCCCC)(OCCCC)OCCCC)CCC2OC21 NKLKGGCLDYNMKP-UHFFFAOYSA-N 0.000 description 1
- GTOPGQCTLBXYNX-UHFFFAOYSA-N tributoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OCCCC)(OCCCC)OCCCC)CCC2OC21 GTOPGQCTLBXYNX-UHFFFAOYSA-N 0.000 description 1
- VQFQVYFUZUTIMU-UHFFFAOYSA-N triethoxy(7-oxabicyclo[4.1.0]heptan-4-ylmethyl)silane Chemical compound C1C(C[Si](OCC)(OCC)OCC)CCC2OC21 VQFQVYFUZUTIMU-UHFFFAOYSA-N 0.000 description 1
- UNKMHLWJZHLPPM-UHFFFAOYSA-N triethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CCO[Si](OCC)(OCC)COCC1CO1 UNKMHLWJZHLPPM-UHFFFAOYSA-N 0.000 description 1
- OHKFEBYBHZXHMM-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCO[Si](OCC)(OCC)C(CCC)OCC1CO1 OHKFEBYBHZXHMM-UHFFFAOYSA-N 0.000 description 1
- SJQPASOTJGFOMU-UHFFFAOYSA-N triethoxy-[1-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)C(C)OCC1CO1 SJQPASOTJGFOMU-UHFFFAOYSA-N 0.000 description 1
- RWJUTPORTOUFDY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)ethyl]silane Chemical compound CCO[Si](OCC)(OCC)CCOCC1CO1 RWJUTPORTOUFDY-UHFFFAOYSA-N 0.000 description 1
- CFUDQABJYSJIQY-UHFFFAOYSA-N triethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CC(C)OCC1CO1 CFUDQABJYSJIQY-UHFFFAOYSA-N 0.000 description 1
- NLKPPXKQMJDBFO-UHFFFAOYSA-N triethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OCC)(OCC)OCC)CCC2OC21 NLKPPXKQMJDBFO-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- LFBULLRGNLZJAF-UHFFFAOYSA-N trimethoxy(oxiran-2-ylmethoxymethyl)silane Chemical compound CO[Si](OC)(OC)COCC1CO1 LFBULLRGNLZJAF-UHFFFAOYSA-N 0.000 description 1
- FFJVMNHOSKMOSA-UHFFFAOYSA-N trimethoxy-[1-(oxiran-2-ylmethoxy)butyl]silane Chemical compound CCCC([Si](OC)(OC)OC)OCC1CO1 FFJVMNHOSKMOSA-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- HTVULPNMIHOVRU-UHFFFAOYSA-N trimethoxy-[2-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CC(C)OCC1CO1 HTVULPNMIHOVRU-UHFFFAOYSA-N 0.000 description 1
- DBUFXGVMAMMWSD-UHFFFAOYSA-N trimethoxy-[3-(7-oxabicyclo[4.1.0]heptan-4-yl)propyl]silane Chemical compound C1C(CCC[Si](OC)(OC)OC)CCC2OC21 DBUFXGVMAMMWSD-UHFFFAOYSA-N 0.000 description 1
- ZOWVSEMGATXETK-UHFFFAOYSA-N trimethoxy-[4-(7-oxabicyclo[4.1.0]heptan-4-yl)butyl]silane Chemical compound C1C(CCCC[Si](OC)(OC)OC)CCC2OC21 ZOWVSEMGATXETK-UHFFFAOYSA-N 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Definitions
- the present invention concerns an optical article, in particular an ophthalmic lens, comprising an antireflective polymer coating and a method for manufacturing such an optical article.
- a typical optical article construction such as an ophthalmic lens construction, comprises a substrate, preferably made of an organic glass, at least a main surface of which is usually coated with polymeric coatings to improve the impact and/or abrasion and/or scratch resistance of the organic glass.
- an antireflective coating In order to impart antireflecting properties to the optical article, whether or not coated with the above polymer coatings, it is usual to form on the substrate or the polymer coatings an antireflective coating.
- an antireflective coating is made of a stack of inorganic layers having alternatively low and high refractive indexes.
- the superficial nanostructures are mechanically weak and are easily altered by external mechanical action, such as rubbing, wiping, etc., therefore resulting in a decrease and even a loss of the antireflective properties.
- the aim of the present invention is to provide an optical article having antireflecting properties without the drawbacks of the known prior art.
- the aim of the present invention is to provide an optical article having antireflective properties which does not comprise an antireflective coating made of a stack of inorganic material layers and does not exhibit the mechanical weaknesses of a coating with a roughened surface.
- an optical article comprising a substrate with two main surfaces, at least one of which is covered by a polymer coating having an outer surface, said coating comprising a first superficial layer beneath the outer surface having a first refractive index n1 and a second layer beneath the first superficial layer having a second refractive index n2, with n2 ⁇ n1, and having the lowest refractive index of said polymer coating, and said coating exhibiting antireflective properties due to the difference between refractive indexes n1 and n2, said refractive index difference within the coating resulting from a plasma, a corona and/or an ion beam treatment of an initial polymer coating, through the outer surface.
- the plasma, corona and/or ion beam treatment is partially eliminating the organic material of the coating in a subsurface of this coating, creating a porosity that involves a decrease of the refractive index in a certain depth of the coating. A layer having a lower porosity is then created.
- a profile of porosity and/or refractive index from the outer surface of the coating is created within the depth of the coating until reaching a minimum and thereafter the refractive index increases again while progressing in the depth of the coating up to achieving the refractive index of the polymer coating before any treatment.
- the surface roughness of the coating is not or slightly affected by the treatment and a densification of the polymeric material can happen in a thin layer. In certain cases, it might increase superficially the refractive index of the coating.
- outer surface [of a coating] means the surface of the coating that is the farthest from the substrate.
- a layer A When a layer A is positioned beneath a layer B, it means that the layer B is farther from the outer surface.
- the refractive indexes are measured at 25°C at a wavelength of 550 nm.
- a layer of the organic coating is defined as a layer wherein the refractive index is homogeneous and can be measured.
- the first superficial layer and the second layer are adjacent.
- first layer and the second layer are not adjacent and the refractive index within the polymer coating can vary in a continuous or a discontinuous manner from the first superficial layer to the second layer, in particular the variation of the refractive index within the polymer coating can be a gradient.
- the thickness of the first superficial layer, second and third layer might typically range from 1 to 55 nm. In one embodiment they are preferably thin (typically from 1 to 5 nm).
- the difference n1-n2 of the refractive indexes is higher than or equal to 0.05, more preferably higher than or equal to 0.10, better higher than or equal to the following values: 0.15, 0.20, 0.25, 0.30 and the refractive index n 2 of the second layer exhibits the lowest refractive index of the polymer coating after plasma, corona and/or ion beam treatment.
- the refractive index n1 in the first superficial layer ranges from 1.45 to 1.65 and the refractive index n2 in the second layer ranges from 1.25 to less than 1.45.
- the second layer has a higher porosity than the first layer.
- the porosity measurement is the ellipsometry method utilising the Lorentz-Lorentz equation expressed in the case of a blend of 2 materials wherein the second material is air. It is necessary to introduce in the formula the refractive index of the dense material (e.g. the coating material).
- the maximum porosity of the second layer ranges from 10 to 70%, preferably from 20 to 60% and more preferably from 20 to 40%..A typical value for the porosity of the second layer is 30%.
- the outer surface of the polymer coating exhibits a greater hardness after the plasma and/or ion beam treatment than initially.
- the polymer coating has in general a thickness ranging from 1 to 10 microns, preferably from 2 ⁇ m to 4 ⁇ m.
- the second layer is located 15 nm to 55 nm beneath the outer surface of the polymer coating.
- the coating comprises a third layer located beneath said second layer and having a refractive index n 3 >n 2 .
- the refractive index within the polymer coating can vary in a continuous or a discontinuous manner from the second layer to the third layer, in particular the variation of the refractive index within the polymer coating can be a gradient.
- the refractive index of the third layer is the same as the initial refractive index of the polymer coating before plasma, corona or ion beam treatment.
- n 3 ⁇ n 1 .
- the outer surface of the polymer coating has a low roughness.
- said outer surface of the coating has a roughness Ra lower than 10 nm, preferably lower than 5 nm, more preferably lower than 2 nm, Ra being determined by Atomic Force Microscopy (AFM).
- AFM Atomic Force Microscopy
- Ra is defined classically as the arithmetic average of absolute values of the vertical deviations of the roughness profile from the mean line.
- the polymer coating comprises a matrix comprising organic groups.
- Organic groups groups containing carbon atoms).
- the polymer coating comprises -(Si-O)- units and is preferably a polysiloxane.
- the polymer coating comprises at least one epoxysilane polymer and optionally at least one colloid.
- the polymer coating comprises an abrasion resistant and/or anti-scratch coating.
- Preferred epoxysilane polymers are epoxyalkoxysilane polymers and in particular epoxytrialkoxysilane polymers such as ⁇ -glycidoxypropyltrimethoxysilane and ⁇ -glycidoxypropyltriethoxysilane polymers.
- said epoxysilane has the following formula: R n Y m Si(X) 4-n-m (I)
- R groups are monovalent organic groups linked to the Si atom by a carbon atom and comprising at least one, preferably one epoxy function
- X groups are hydrolyzable groups
- R 2 is an alkyl group, preferably a methyl group or a hydrogen atom, more preferably a hydrogen atom ; a and c are integers ranging from 1 to 6 and b is representing 0, 1 or 2.
- epoxy-functional alkoxysilanes are suitable as hydrolysis precursors, including epoxydialkoxysilanes such as ⁇ -glycidoxypropylmethyldimethoxysilane, ⁇ -glycidoxypropylmethyldiethoxysilane, ⁇ -glycidoxypropyl-methyl-diisopropenoxysilane, and ⁇ -glycidoxyethoxypropylmethyldimethoxysilane;
- Epoxytrialkoxysilane such as glycidoxymethyl-trimethoxysilane, glycidoxymethyltriethoxysilane, glycidoxymethyl-tripropoxysilane, glycidoxymethyl-tributoxysilane, beta-glycidoxyethyltrimethoxysilane, beta-glycidoxyethyltriethoxysilane, beta-glycidoxyethyl-tripropoxysilane, beta-glycidoxyethyl-tributoxysilane, beta-glycidoxyethyltrimethoxysilane, alpha-glycidoxyethyl-triethoxysilane, alpha-glycidoxyethyl-tripropoxysilane, alpha-glycidoxyethyltributoxysilane, gamma-glycidoxypropyl-trimethoxysilane, gamma-glycidoxypropyl-triethoxys
- epoxysilanes are chosen within the group consisting of ⁇ -glycidoxypropyl triethoxysilane, ⁇ -glycidoxypropyl trimethoxysilane, 2-(3,4-epoxycyclohexyl) ethyl trimethoxysilane and 2-(3,4-epoxycyclohexyl) ethyltriethoxysilane or a mixture of two or more thereof.
- GLYMO ⁇ -glycidoxypropyltrimethoxysilane
- the epoxysilane is hydrolyzed, preferably before being mixed to the other components of the composition.
- the hydrolysis may be performed as known in the art, by using acidic catalysts (hydrochloric acid, acetic acid), in presence of water.
- acidic catalysts hydroochloric acid, acetic acid
- the alkoxysilane is reacted with a stoichiometric amount of water to hydrolyze the hydrolysable groups, typically the alkoxy groups.
- the coating comprises colloids.
- the colloids that can be used are preferably chosen between silica and high index oxides such as TiO 2 , ZrO 2 , Sb 2 O 5 , WO 3 .
- coating compositions of the polymeric coating contain at least 30%, preferably 30% to 60% by weight of solid material (inorganic colloid) and more preferably 40 to 55 % by weight in the dry content of the coating.
- Preferred colloid is colloidal silica.
- Preferred abrasion resistant coatings are those comprising an epoxysilane polymer and a colloid and in particular those disclosed in EP-0.614.957 .
- the substrate may be any classical substrate used in the optical field such as a mineral or an organic glass, for example an organic glass made of a thermoplastic or thermocurable plastic.
- substrate materials are polycarbonates, polyamides, polyimides, polysulfones, copolymers of polyethylene therephthalate and polycarbonate, polyolefins such as polynorbornenes, resins resulting from polymerization or (co)polymerization of alkylene glycol bis allyl carbonates such as polymers and copolymers of diethylene glycol bis(allylcarbonate) (marketed, for instance, under the trade name CR-39 ® by the PPG Industries company, the corresponding marketed lenses being referred to as ORMA ® lenses from ESSILOR), polycarbonates such as those derived from bisphenol A, (meth)acrylic or thio(meth)acrylic polymers and copolymers such as polymethyl methacrylate (PMMA), urethane and thiourethane polymers and copolymers, epoxy polymers and copolymers, episulfide polymers and copolymers.
- PMMA polymethyl methacrylate
- PMMA polymethyl methacrylate
- a low surface energy hydrophobic material such as fluorinated resins or fluorinated polymers can be applied as a top coat on the surface of the article having a coating according to the invention.
- the surface energy of such a top coat is lower than or equal to 14 mJ/m 2 , preferably lower than or equal to 12 mJ/m 2 .
- such a low surface energy coating comprises at least one of a fluoropolymer or a fluorosilane.
- fluoropolymers or fluorosilanes include, but are not limited to, Teflon® and commercially available fluorosilanes such as Dow Corning 2604, 2624 and 2634; Daikin Optool DSX®, Shinetsu OPTRON®, heptadecafluorosilane (manufactured, for example, by GELEST), FLUOROSYL® (manufactured, for example, by CYTONIX); FAS13, CYTOPTM (from ASAHI) etc.
- Such coatings can be applied to the nanostructured surface of the article by dipping, vapor coating, spraying, application with a roller, and other suitable method known in the art.
- compositions containing fluorosilanes recommended for the preparation of hydrophobic and/or oleophobic top-coats are described in U.S. Pat. No. 6,183,872 . They contain fluoropolymers with organic groups carrying silicon-based groups represented by the following general formula and with a molecular weight of 5.10 2 to 1.10 5 :
- R F represents a perfluoroalkyl group
- Z represents a fluoro or trifluoromethyl group
- a, b, c, d and e each representing, independently from each other, 0 or an integer greater than or equal to 1, provided that the sum a+b+c+d+e is not less than 1 and that the order of the repeated units between the brackets indexed under a, b, c, d and e are not limited to the one given
- Y represents H or an alkyl group comprising from 1 to 4 carbon atoms
- X represents an atom of hydrogen, bromine or iodine
- R 1 represents an hydroxyl group or a hydrolysable group
- R 2 represents an atom of hydrogen or a monovalent hydrocarbon group
- m represents 0, 1 or 2
- n represents 1, 2 or 3
- p represents an integer equal to at least 1, preferably equal to at least 2.
- perfluoropolyethers of formula: wherein Y, R 1 , m and p are as defined above and a is an integer from 1 to 50.
- a formulation containing a fluorosilane given by the previous formula (1) is marketed by DAIKIN INDUSTRIES with the name OPTOOL DSX®.
- a fluorosilane compound given by the formula (2) above is marketed by SHIN-ETSU CHEMICAL CO, Ltd with the name KY-130®.
- Fluorosilane compounds given by the formula (2) and methods for preparing them are also described in the patent application EP 1 300 433 .
- the coating of the present invention has antireflective properties, i.e. the outer surface of said polymer coating exhibits a Rv value lower than 2.5%, preferably lower than one of the following values: 2.4%, 2.3%, 2.2%, 2.1%, 2%, 1.9%, 1.8%, 1.7%, 1.6%, 1.5% at 15°incidence and better lower than 2.5% at 15° and 45°incidence.
- Luminous reflection Rv is such as defined in the ISO 13666:1998 Standard, and measured in accordance with the ISO 8980-4 Standard (for an angle of incidence lower than 17°, typically of 15°).
- the present invention also concerns a method of manufacturing an optical article as disclosed above which comprises treating with a plasma and/or an ion beam a polymer coating, through its outer surface, of an optical article comprising a substrate with two main surfaces at least one of which is covered by a polymer coating having an outer surface, to create a first superficial layer beneath the outer surface having a first refractive index n1 and a second layer beneath the first superficial blayer having a second refractive index n2, with n2 ⁇ n1, thereby imparting antireflective properties to the coating.
- the plasma treatment comprises submitting the outer surface of the polymer coating to an oxygen plasma, preferably under a pressure ranging from 10 milliTorrs to 150 milliTorrs, during a period ranging from 5 minutes to 80 minutes, preferably 15 to 40 minutes, better 15 to 25 minutes..
- the dioxygen plasma is generated using a radiofrequency source with a tension ranging from 100 to 600 V, preferably 100 to 300 V and an applied power ranging from 10 W to 250 W, preferably 20 to 100 W.
- the applied surface power density is preferably ranging from 0.05 to 1.5 W/cm 2 , more preferably from 0.1 to 0.55 W/cm 2.
- the optical article is treated by a plasma, preferably a dioxygen plasma, obtained by a radiofrequency source with a power ranging from 10 to 50 watts.
- a plasma preferably a dioxygen plasma
- the initial optical articles used in the following examples are ORMA® ophthalmic lenses of organic glass constituted by a diethylene glycol di(allylcarbonate) polymer with a central thickness of 2 mm which were dip coated in a polymer coating composition according to example 3 of EP-0.614.957 and then precured for 15 minutes at 60°C. They were then placed in an oven at 100°C for 3 hours.
- the thickness of the resulting coating was 3 ⁇ m.
- the plasma treatment of the initial optical article A has been effected in a vacuum chamber equipped with a metallic electrode of 15 cm diameter.
- the samples (4 at the same time) were mounted on the electrode which was fed with a RF power (13.56 MHz).
- the plasma was a dioxygen plasma under a pressure of 100 mTorr, a RF power of 26 W and a tension of 120 V or 270 V. Treatment was effected on either one side (coating side) or both sides for different durations.
- Sample A6 is subjected to a wiping test using a tribometer Pin-On-Disk Tribometer (TRB) from the CSM company.
- TRB Pin-On-Disk Tribometer
- the reflection spectrum of the sample A6 is first measured, and then sample A6 is subjected to wiping using a silicone pin (8 shore 0) which bears on a Cemoi® cloth placed on the sample.
- the sample is then moved under the cloth.
- Contact areas are depending on the bearing strength and are 0.3 cm 2 for 1 N, 0.5 cm 2 for 2N, 0.65 cm 2 for 5N and 1.1 cm 2 for 10N.
- Figure 3 shows that the reflection spectrum of the sample does not change after the test which means that the antireflective properties of the polymer coating are not altered.
- the refractive indexes have been determined by spectro-ellipsometry on samples similar to samples A1-A6 but with further measurements for intermediate times of treatment.
- Figure 5 shows images obtained by atomic force microscopy of the outer surface of a lens sample A obtained as described in 1.above (control) and a sample according to the invention: same lens sample obtained as described in 1) above is treated by a dioxygen plasma at 250 W, 20 minutes.
- the obtained sample has 2.5% increase in transmission and clearly, the roughness of the outer surface of the sample according to the invention is less than that of the control sample. This means that the antireflective property of the optical articles of the invention is not a result of an increase of the roughness of the coating outer surface.
- the surface hardness was measured by nanoindentation on a sample A (control) and, a sample according to the invention (sample treated by a dioxygen plasma at 26, W, 270 V).
- Hardness H has been determined by nanoindentation as described in WO2015166144 .
- a sample A has been annealed at a temperature of 120°C during 1 hour in atmospheric conditions.
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EP16305552.8A EP3244239B1 (de) | 2016-05-11 | 2016-05-11 | Optischer artikel mit einem substrat mit einer antireflexbeschichtung |
PCT/EP2017/061289 WO2017194657A1 (en) | 2016-05-11 | 2017-05-11 | Optical article comprising a substrate with an antireflective coating |
CN201780029027.5A CN109196389B (zh) | 2016-05-11 | 2017-05-11 | 包括具有减反射涂层的基材的光学制品 |
US16/300,379 US10877182B2 (en) | 2016-05-11 | 2017-05-11 | Optical article comprising a substrate with an antireflective coating |
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EP16305552.8A EP3244239B1 (de) | 2016-05-11 | 2016-05-11 | Optischer artikel mit einem substrat mit einer antireflexbeschichtung |
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CN111247457B (zh) | 2017-08-31 | 2022-03-15 | 康宁股份有限公司 | 混合梯度干涉硬涂层 |
EP3845933B1 (de) * | 2019-12-31 | 2022-09-07 | Essilor International | Computerimplementiertes verfahren zum entwurf eines interferenzstapels für eine optische komponente |
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CN109196389B (zh) | 2021-04-30 |
US20190121000A1 (en) | 2019-04-25 |
EP3244239B1 (de) | 2022-05-04 |
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