EP3238791A1 - Métode de traitement une semmelle de glisse d'un appareil de glisse et l'appareil de glisse comprenant cette semelle - Google Patents

Métode de traitement une semmelle de glisse d'un appareil de glisse et l'appareil de glisse comprenant cette semelle Download PDF

Info

Publication number
EP3238791A1
EP3238791A1 EP17168228.9A EP17168228A EP3238791A1 EP 3238791 A1 EP3238791 A1 EP 3238791A1 EP 17168228 A EP17168228 A EP 17168228A EP 3238791 A1 EP3238791 A1 EP 3238791A1
Authority
EP
European Patent Office
Prior art keywords
base
sliding surface
sliding
craters
zones
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP17168228.9A
Other languages
German (de)
English (en)
Other versions
EP3238791B1 (fr
Inventor
Francesco Ripamonti
Paolo Maria Ossi
Mario Francesco Moro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Penz Srl
Penz Srl
Politecnico di Milano
Original Assignee
Penz Srl
Penz Srl
Politecnico di Milano
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Penz Srl, Penz Srl, Politecnico di Milano filed Critical Penz Srl
Priority to SI201730229T priority Critical patent/SI3238791T1/sl
Publication of EP3238791A1 publication Critical patent/EP3238791A1/fr
Application granted granted Critical
Publication of EP3238791B1 publication Critical patent/EP3238791B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63C—SKATES; SKIS; ROLLER SKATES; DESIGN OR LAYOUT OF COURTS, RINKS OR THE LIKE
    • A63C5/00—Skis or snowboards
    • A63C5/04—Structure of the surface thereof
    • A63C5/0428—Other in-relief running soles
    • A—HUMAN NECESSITIES
    • A63—SPORTS; GAMES; AMUSEMENTS
    • A63C—SKATES; SKIS; ROLLER SKATES; DESIGN OR LAYOUT OF COURTS, RINKS OR THE LIKE
    • A63C5/00—Skis or snowboards
    • A63C5/04—Structure of the surface thereof
    • A63C5/044—Structure of the surface thereof of the running sole

Definitions

  • the present invention concerns a method for treating a base for sliding apparatuses, for example skis or suchlike, used in winter sports for sliding on snow-covered ground or suchlike, including ground prepared with artificial snow and similar materials, which have high sliding properties.
  • the present invention also concerns a base for a sliding apparatus and the sliding apparatus itself, used in particular for winter sports.
  • sliding apparatus we mean, hereafter in the description, each of the skis used for sliding or gliding on snow-covered ground or suchlike.
  • the multi-layer structure that the sliding structure is made of is similar in most types of modern sliding apparatuses present on the market.
  • the individual layers can be made with different geometries and materials or a different composition of materials, in order to obtain the desired characteristics, for example in terms of flexibility and manageability of the apparatus.
  • the techniques for assembling and producing normal sliding apparatuses are also consolidated and used by most producers.
  • the sliding properties of the sliding apparatus are a fundamental feature for performance, both in competitive sport and also in terms of the manageability and usability of the apparatus.
  • the tribology of the base of the sliding apparatus can be influenced by various parameters, including, principally, the characteristics of the material or materials it is made of, the sliding surface and the treatment of the base able in general to reduce to a minimum the dynamic friction between base and snow.
  • known ski apparatuses can have various problems regarding the wear of the materials, and therefore it often needs different and costly maintenance operations, both for the base and also the edges.
  • One purpose of the present invention is therefore to perfect an effective and precise method for treating a base for a sliding apparatus, in particular a sliding apparatus for sliding on snow-covered terrains, by means of which the base obtained has optimum sliding qualities on the snow and therefore by means of which the dynamic friction between the sliding apparatus in which it is installed and the snow-covered ground is reduced to a minimum.
  • Another purpose of the present invention is to perfect a method for treating a base for a sliding apparatus, in particular a sliding apparatus for sliding on snow-covered terrains, which allows to obtain a base and therefore in general a sliding apparatus which is durable and therefore in which the wear deriving from normal use is significantly reduced and which also requires minimum interventions in terms of maintenance compared with known bases and sliding apparatuses.
  • Another purpose of the present invention is to obtain a base for a sliding apparatus, in particular a sliding apparatus for snow-covered ground, which in its entirety is more efficient and performs better (greater precision in trajectories) compared with normal bases for sliding apparatuses known in the field.
  • Another purpose of the present invention is to obtain a sliding apparatus which is in its entirety is more efficient and long-lasting, and performs better in terms for example of precision in trajectories compared with known apparatuses.
  • the Applicant has devised, tested and embodied the present invention to overcome the shortcomings of the state of the art and to obtain these and other purposes and advantages.
  • a method for treating a base able to be used in a sliding apparatus and provided with at least a sliding surface comprises at least a first step of cutting the base by means of which a plurality of craters with a controlled depth and diameter are made on the sliding surface, and at least a second step of structuring and finishing the sliding surface in zones of the sliding surface defined inside the craters and/or in zones of the sliding surface defined between one crater and the other, so as to obtain a plurality of ridges distributed on the sliding surface of the base in the craters and/or between one crater and the other.
  • the craters have micrometric sizes and the ridges have nanometric sizes.
  • the craters are distributed in a preferably regular pattern on the sliding surface of the base.
  • the first cutting step is performed using a pulsed laser and allows to obtain craters of micrometric sizes.
  • the craters have a depth variable between about 0.5 ⁇ m and about 50 ⁇ m.
  • the craters have a diameter variable between about 5 ⁇ m and about 100 ⁇ m and preferably less than 50 ⁇ m.
  • the procedure for finishing and structuring the sliding surface is preferably a nanostructuring procedure performed by an ionic erosion process on the sliding surface.
  • the invention also concerns a sliding base comprising at least a sliding surface.
  • a plurality of craters are made in the sliding surface with a controlled depth and diameter and a plurality of ridges distributed in zones of the sliding surface of the base inside the craters and/or in zones situated between one crater and the other.
  • the base is made by at least one layer of metal material or metal alloys.
  • the base can have a thickness variable between about 0.2 mm and about 0.8 mm.
  • the invention also concerns a sliding apparatus comprising a plurality of overlapping layers and at least one base provided with at least one sliding surface.
  • the sliding surface comprises a plurality of craters with a controlled depth and diameter and a plurality of ridges distributed in zones of the sliding surface of the base inside the craters and/or in zones situated between one crater and the other.
  • the sliding apparatus comprises edges made in a single piece with the base.
  • a sliding apparatus 10 comprises a structure in which can be distinguished, starting from the bottom, a series of overlapping layers of the desired thickness, that is to say: a sliding base 11; a layer 12 of glass fiber or carbon fiber located above the base 11 and made for example of cross-laminated glass; a layer 13 of glass fiber or carbon fiber located above layer 12, for example a layer of cross-laminated glass; a layer 14 with anti-vibration functions, made for example of rubber or suchlike; a central core 15, made for example of multi-layer wood; a layer 16 of glass fiber or carbon fiber, located above the central core 15 and made for example of unidirectional laminate; a layer 17 of glass fiber or carbon fiber located above layer 16 and made for example of cross-laminated glass; another layer 18 with anti-vibration functions, made of rubber or suchlike for example; and an upper layer 19, preferably made of plastic material, for example with a base of thermoplastic polymers.
  • a sidewall 20 is also positioned, made for example of thermoplastic material, such as acrylonitrile-butadiene-styrene (ABS) or suchlike.
  • ABS acrylonitrile-butadiene-styrene
  • the base 11 of the sliding apparatus 10 which comprises a sliding surface 21 preferably made of metal material, integrates in a single piece the edges normally provided in any sliding apparatus and is produced starting from a strip with a thickness comprised between 0.2 and 0.8 mm for example, which therefore represents the thickness of the base 11.
  • materials for the basic strip from which the base 11 is obtained with standard cutting methods it is possible to use different types of metal materials, for example a first alloy with the commercial name of Titanal®, which is substantially an aluminum alloy, or stainless steel INOX AISI 301, which gives a better mechanical performance, or other metal materials, also combined with each other.
  • a first alloy with the commercial name of Titanal® which is substantially an aluminum alloy
  • stainless steel INOX AISI 301 which gives a better mechanical performance
  • other metal materials also combined with each other.
  • the strip is cut and shaped using a method similar to that used for conventional bases made of polymer such as UHMWPE (Ultra High Molecular Weight Polyethylene), then integrated into the sliding apparatus 10 using operations such as for example hot gluing and pressing.
  • UHMWPE Ultra High Molecular Weight Polyethylene
  • a hierarchical structuring is prepared, which provides for example a nano and microscopic control of the surface of the base 11.
  • the hierarchical structuring step is preferably divided into two working steps.
  • a cutting process is made on the sliding surface 21, for example with a pulsed laser (Laser Surface Texturing, LST), using a known machine and suitable for the purpose, for example equipped with a nanosecond laser, which currently represents a good compromise between efficiency and total working costs.
  • LST Pulser Surface Texturing
  • another type of laser could also be used, for example a femtosecond ultrafast laser.
  • the craters 22 obtained at the end of the first cutting step could be made using different techniques, for example by rollers provided with suitably sized indentations.
  • Each of the craters 22 will have a predetermined and controlled depth P and diameter D, so as to optimize the sliding performance and durability of the base 11 and hence of the sliding apparatus 10 in its entirety.
  • a depth P of the craters 22 which confers particular characteristics of slidability and efficiency on the base 11 applicable to the sliding apparatus 10 varies from about 0.5 ⁇ m to about 50 ⁇ m.
  • a diameter D of the craters 22 which confers particular characteristics of slidability and efficiency on the base 11 applicable to the sliding apparatus 10 varies from about 5 ⁇ m and about 100 ⁇ m and is preferably less than 50 ⁇ m.
  • these values of the depth P and diameter D of the craters 22 can be modified according to the technical characteristics and the type of sliding apparatus 10 to be obtained, depending for example whether it is used for Alpine skiing, cross country or other disciplines. Moreover, the parameters must also take into account the conditions of morphological variability of the snow cover.
  • the sliding surface 21 is covered by craters 22 disposed preferably in an orderly manner and a regular pattern 23, so as to guarantee a uniform treatment of the sliding surface 21 of the base 11.
  • the craters 22 distributed in a regular pattern 23 are shown only in a circled zone of the sliding surface 21 of the base 11; however, preferably, the regular pattern 23 of craters 22 will be made uniformly over the whole sliding surface 21 of the base 11.
  • the first laser working step it may be provided to smooth the base 11, to remove the flashes associated with the first working step.
  • the second step of finishing and structuring is begun, substantially comprising a nanostructuring of the sliding surface 21.
  • the operation to nanostructure the sliding surface 21 preferably takes place both in zones of the sliding surface 21 comprised inside the craters 22, and also in zones of the sliding surface 21 outside the craters 22, that is, defined between one crater and the other.
  • the purpose of this process is substantially to make a series of ridges 24, preferably of nanometric size, which are disposed inside and around each crater 22, uniformly, as shown schematically in fig. 4 and as shown by the image in fig. 6 .
  • the finishing and nanostructuring operation can be performed by an ionic erosion process, where the target consists of the base 11 and in particular its sliding surface 21.
  • the target is inserted in an environment where a vacuum has been created and it is subjected to a bombardment of ions, for example argon ions, so that the surface atoms of the material it consists of, in this case the sliding surface 21, are expelled.
  • ions for example argon ions
  • the ionic erosion process can be performed by passive devices able to generate magnetic fields, by means of radiofrequency, or by maintaining a continuous current inside the vacuum environment where the target is positioned, hence the base 11 with its sliding surface 21.
  • radiofrequency in the case of radiofrequency ionic erosion, the values of radiofrequency can be 13.56 MHz, as per international standards.
  • the pressure of the atmosphere inside the environment where the target is positioned, i.e. the sliding surface 21 of the base 11, is controlled in the range of tens of Pa, if necessary, starting from a reference vacuum in the range of 10 -4 Pa.
  • the ionic erosion power varies according to the metal or metal alloy that the base 11 is made of, and can vary for example between 50 W and 125 W.
  • the nanostructuring process through ionic erosion can be carried out in a plurality of different steps, separated by pauses. Indeed it has been found that dividing the ionic erosion process into different steps allows to obtain a better nanostructuring of the sliding surface 21.
  • each of them can have a predetermined duration of about 10 minutes.
  • the intervals between one ionic erosion step and the next can also have a duration of about 10 minutes.
  • a base 11 is obtained which is preferably treated with the operations as described above over the whole width of the sliding surface 21.
  • the sliding apparatus 10 on which the base 11 will be mounted will have the edges made in a single piece, that is, integrated with the base 11.
  • the base according to the present invention both when made of Titanal® and when made of INOX AISI 301, has irrefutable advantages both in terms of initial acceleration and in terms of travel compared with known bases made of polyethylene.
  • Solution Initial acceleration Travel time Titanal® vs polyethylene +15.9% -7.1% AISI301 vs polyethylene +14.8% -5.1%

Landscapes

  • Sliding-Contact Bearings (AREA)
EP17168228.9A 2016-04-26 2017-04-26 Métode de traitement une semmelle de glisse d'un appareil de glisse et l'appareil de glisse comprenant cette semelle Active EP3238791B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SI201730229T SI3238791T1 (sl) 2016-04-26 2017-04-26 Postopek za obdelavo drsne ploskve drsne naprave in drsna naprava, ki obsega tako drsno ploskev

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITUA2016A002890A ITUA20162890A1 (it) 2016-04-26 2016-04-26 Metodo di trattamento di una soletta per un'attrezzatura di scivolamento

Publications (2)

Publication Number Publication Date
EP3238791A1 true EP3238791A1 (fr) 2017-11-01
EP3238791B1 EP3238791B1 (fr) 2020-01-15

Family

ID=56801678

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17168228.9A Active EP3238791B1 (fr) 2016-04-26 2017-04-26 Métode de traitement une semmelle de glisse d'un appareil de glisse et l'appareil de glisse comprenant cette semelle

Country Status (3)

Country Link
EP (1) EP3238791B1 (fr)
IT (1) ITUA20162890A1 (fr)
SI (1) SI3238791T1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020000181B3 (de) * 2020-01-27 2021-03-11 Thomas Wimmer Vorrichtung und Verfahren zur Bearbeitung von Gleitflächen

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0785000A1 (fr) * 1996-01-16 1997-07-23 Salomon S.A. Planche de glisse comprenant une semelle de glisse munie d'empreintes d'alvéoles
JPH09300002A (ja) * 1996-05-17 1997-11-25 Aluminum Co Of America <Alcoa> 圧延された光沢金属製品
WO2003000483A1 (fr) * 2001-06-23 2003-01-03 Spaeth Bernd Corps a proprietes de surface ameliorees
EP1415686A1 (fr) * 2002-11-04 2004-05-06 gst Global Sports Tech. Ges.m.b.H. Procédé et dispositif pour structurer la semelle d'une planche de glisse sur neige, comme un ski ou un snowboard, ainsi que planche de glisse correspondante
DE102005026097A1 (de) * 2004-05-27 2006-02-02 Gebrüder Plenk GmbH Langlaufskifabrik Bereichsweise Verwendung einer bei Alpin-Skiern bekannten Laufflächenform für Skating-Ski und Skating-Ski mit dieser Laufflächenform
US20060251486A1 (en) * 2005-04-14 2006-11-09 Robert Schamesberger Method for machining the running surfaces of winter sports appliances

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0785000A1 (fr) * 1996-01-16 1997-07-23 Salomon S.A. Planche de glisse comprenant une semelle de glisse munie d'empreintes d'alvéoles
JPH09300002A (ja) * 1996-05-17 1997-11-25 Aluminum Co Of America <Alcoa> 圧延された光沢金属製品
WO2003000483A1 (fr) * 2001-06-23 2003-01-03 Spaeth Bernd Corps a proprietes de surface ameliorees
EP1415686A1 (fr) * 2002-11-04 2004-05-06 gst Global Sports Tech. Ges.m.b.H. Procédé et dispositif pour structurer la semelle d'une planche de glisse sur neige, comme un ski ou un snowboard, ainsi que planche de glisse correspondante
DE102005026097A1 (de) * 2004-05-27 2006-02-02 Gebrüder Plenk GmbH Langlaufskifabrik Bereichsweise Verwendung einer bei Alpin-Skiern bekannten Laufflächenform für Skating-Ski und Skating-Ski mit dieser Laufflächenform
US20060251486A1 (en) * 2005-04-14 2006-11-09 Robert Schamesberger Method for machining the running surfaces of winter sports appliances

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020000181B3 (de) * 2020-01-27 2021-03-11 Thomas Wimmer Vorrichtung und Verfahren zur Bearbeitung von Gleitflächen

Also Published As

Publication number Publication date
SI3238791T1 (sl) 2020-07-31
EP3238791B1 (fr) 2020-01-15
ITUA20162890A1 (it) 2017-10-26

Similar Documents

Publication Publication Date Title
DE10228743B4 (de) Verfahren zum Glätten und Polieren von Oberflächen durch Bearbeitung mit Laserstrahlung
EP0827802B1 (fr) Procédé pour réaliser une ligne de faible résistance au moyen d&#39;un laser
Okada et al. Surface modification of cemented carbide by EB polishing
EP3238791A1 (fr) Métode de traitement une semmelle de glisse d&#39;un appareil de glisse et l&#39;appareil de glisse comprenant cette semelle
EP2864506A1 (fr) Procédé et dispositif de fabrication d&#39;un composant métallique trempé à la presse
AU647614B2 (en) Knife blades
KR20190092496A (ko) 강판의 표면 지형을 압연하기 위한 롤 및 이를 제조하기 위한 방법
WO2016154644A1 (fr) Procédé et dispositif de fabrication additive d&#39;un corps
DE102011001744A1 (de) Verfahren zum Herstellen eines Beschlags, Beschlag, Haushaltsgerät und Möbel
EP3277482A1 (fr) Procédé et dispositif de fabrication additive d&#39;un corps
DE69404961T2 (de) Ski mit profilierter Lauffläche
DE102015122570B4 (de) Sortierung von Rohstoffstücken
CN106271096B (zh) 一种pcb板的加工方法
Ossi et al. METHOD FOR TREATING A SLIDING SURFACE OF A SLIDING DEVICE AND THE SLIDING DEVICE COMPRISING THAT SLIDING SURFACE
EP1745826B1 (fr) Procede de preparation de semelle d&#39;appareil de sport d&#39;hiver
WO2011098251A1 (fr) Procédé de réalisation d&#39;une pièce de fermeture auto-agrippante, procédé pour réaliser un cylindre de moulage, cylindre de moulage et pièce de fermeture auto-agrippante
DE102008028242A1 (de) Verfahren und Vorrichtung zum Scherschneiden von Blechbauteilen
EP0035718A1 (fr) Procédé pour la fabrication d&#39;une feuille ou bande en aluminium ou alliage d&#39;aluminium présentant une bonne aptitude à l&#39;emboutissage profond
DE102011055141A1 (de) Folienentfernvorrichtung und Verfahren zum Entfernen einer Folie von Objekten
EP2686371B1 (fr) Procédé de modification d&#39;une surface d&#39;un substrat par bombardement ionique
AT509585B1 (de) Verfahren zum bearbeiten einer kunststoff- insbesondere polyethylengleitfläche von gleiteinrichtungen
DE3935927C2 (fr)
DE938954C (de) Vorrichtung zum Behandeln der Laufkanten von Skiern
EP1690571A1 (fr) Ski pour saut à ski
DE2724711A1 (de) Ski

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20180426

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

INTG Intention to grant announced

Effective date: 20190913

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602017010822

Country of ref document: DE

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1224653

Country of ref document: AT

Kind code of ref document: T

Effective date: 20200215

REG Reference to a national code

Ref country code: CH

Ref legal event code: NV

Representative=s name: IPRIME RENTSCH KAELIN AG, CH

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20200115

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200607

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200415

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200515

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200415

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200416

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602017010822

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

REG Reference to a national code

Ref country code: AT

Ref legal event code: UEP

Ref document number: 1224653

Country of ref document: AT

Kind code of ref document: T

Effective date: 20200115

26N No opposition filed

Effective date: 20201016

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200426

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20200430

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200430

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20200426

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20200115

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20230419

Year of fee payment: 7

Ref country code: FR

Payment date: 20230420

Year of fee payment: 7

Ref country code: DE

Payment date: 20230427

Year of fee payment: 7

Ref country code: CH

Payment date: 20230502

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SI

Payment date: 20230420

Year of fee payment: 7

Ref country code: AT

Payment date: 20230425

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20230421

Year of fee payment: 7