EP3013598A1

EP3013598A1 - Method for producing a multilayer element, and multilayer element

Info

Publication number: EP3013598A1
Application number: EP14733628.3A
Authority: EP
Inventors: Ludwig Brehm; Tibor MANNSFELD; Juri Attner; Thorsten SCHALLER
Original assignee: Leonhard Kurz Stiftung and Co KG
Current assignee: Leonhard Kurz Stiftung and Co KG
Priority date: 2013-06-28
Filing date: 2014-06-26
Publication date: 2016-05-04
Anticipated expiration: 2034-06-26
Also published as: CN105431302A; RU2016102641A3; CA2926821A1; EP3013598B1; AU2014301007A1; BR112015032480A2; HRP20170741T1; US10926571B2; MX2015017592A; RU2664356C2; MX346389B; RU2016102641A; CN105431302B; JP6478230B2; HUE034529T2; WO2014207165A1; US20180304667A1; CA2926821C; JP2016533921A; DE102013106827A1

Abstract

The invention relates to a method for producing a multilayer element (100, 200, 300, 400) and to a multilayer element (100, 200, 300, 400) produced using said method. A single-layer or multi-layer first décor layer (3) is applied to a carrier layer having a first side (11) and a second side (12). A metal layer (5) is applied to the side of the first décor layer (3) facing away from the carrier layer and is structured such that the metal layer (5) has a first thickness in one or more first zones (8) and a second thickness, different from the first thickness, in one or more second zones (9), wherein the second thickness is in particular equal to zero. A single-layer or multi-layer second décor layer (7) is applied to the side of the metal layer (5) facing away from the first décor layer (3), and using the metal layer (5) as a mask, is structured in such a manner that the first décor layer (3) and/or second décor layer (7) is at least partially removed in the first zones (8) or second zones (9).

Description

Method for producing a multilayer body

as well as multilayer bodies

The invention relates to a method for producing a multilayer body having a carrier layer and a single-layer or multi-layer decorative layer formed on and / or in the carrier layer, as well as a multilayer body

Security element and a security document.

Optical security elements are often used to make it difficult to copy documents or products to prevent their misuse, especially counterfeiting. How to find optical security elements

Use for securing documents, banknotes, credit and debit cards, identity cards, packaging of high quality products and the like. In this case, it is known to use optically variable elements as optical security elements which can not be duplicated by conventional copying methods. It is also known security elements with a structured

To equip metal layer, which is in the form of a text, logo or other pattern. The production of a structured metal layer from a metal layer applied in a planar manner, for example by sputtering or vapor deposition, requires a large number of processes, in particular when producing particularly fine structures should be, which have a high security against counterfeiting. For example, it is known to partially demetallize and thus structure a metal layer applied over the entire area by positive or negative etching or by laser ablation. Alternatively, it is possible to apply metal layers by means of using vapor masks already in structured form on a support.

The more manufacturing steps are provided for the production of the security element, the greater importance receives the register or register accuracy of the individual process steps, i. the accuracy of the positioning of the individual tools relative to each other in the formation of the security element with respect to already existing on the security element features or

Layers or structures. Object of the present invention is to provide a particularly difficult to reproduce multilayer body and a method for producing such a multilayer body.

The object is achieved by a method for producing a multilayer body, in particular an optical security element or an optical

Decor element solved, wherein the method:

a) a single or multi-layered first decorative layer is applied to a carrier layer;

b) at least one metal layer is applied on the side facing away from the carrier layer of the first decorative layer;

c) the at least one metal layer is structured in such a way that the

Metal layer is provided in one or more first zones of the multilayer body in a first layer thickness and is provided in one or more second zones of the multilayer body in a different from the first layer thickness second layer thickness, in particular, the second layer thickness is equal to zero;

d) on the side of the metal layer facing away from the first decorative layer, a or multi-layered second decorative layer is applied;

e) the first and / or second decorative layer is patterned using the metal layer as a mask in a first region of the multilayer body such that the first and / or second decorative layer is at least partially removed in the first or second zones.

The steps a) to e) of the process according to the invention are preferably carried out in the order indicated. The object is further achieved by a multilayer body comprising a single-layer or multi-layered first decorative layer, a single or multi-layered second decorative layer and at least one metal layer arranged between the first and second decorative layers, wherein the metal layer is structured in such a way that the at least one metal layer in a first area of the

Multilayer body is provided in one or more first zones of the multilayer body in a first layer thickness and is provided in one or more second zones of the multilayer body in a different from the first layer thickness second layer thickness, wherein in particular the second layer thickness is equal to zero, and wherein the first and second decorative layer congruent to each other and to the metal layer are structured. The first and the second decorative layer and the metal layer preferably have partial structures, so that the first and second decorative layer in the first region in the first or second zones congruent to each other and the metal layer are at least partially removed.

Such a multilayer body is preferably by means of the above

available method described.

The multilayer body according to the invention can be used, for example, as a label, laminating film, hot stamping film or transfer film to provide an optical security element which is suitable for securing documents, banknotes, credit and debit cards, identity cards, packaging of high quality Products and the like is used. In this case, the decorative layers and the at least one register layer arranged precisely arranged metal layer can serve as an optical security element. By the invention, the training is particularly forgery-proof

Achieved multi-layer body. In the method, the metal layer serves as a mask, preferably as a mask, during the manufacture of the multilayer body

Exposure Mask for Exposure, i. the photoactivation of a

photoactivatable layer, which may be comprised by the first and / or second decorative layer, or as a mask for protecting the first zones or the second zones, for example, prior to solvent attack, and on the finished multilayer body to provide an optical effect. The metal layer thus fulfills several completely different functions. The structuring according to step c) and / or step e) can in this case also take place only in a partial area of the multi-layer body, which then in particular forms the first area.

Preferably, the first and second decorative layers are patterned using the metal layer as a mask in the first region such that the first and second decorative layers are at least partially removed respectively in the first or second zones, or the metal layer using the first or second decorative layer as Mask is structured. As a result, the register-accurate structuring of the first decorative layer, the second decorative layer and the metal layer is achieved without additional use of registration devices and a very precise registration

Structuring of these layers relative to each other allows. In conventional methods for producing an etching mask by means of a

Mask exposure, wherein the mask either as a separate unit, for example as a separate foil or as a separate glass plate / glass roller, or as a If there is a subsequently printed-on layer, there may be the problem that linear and / or non-linear distortions in the multilayer body caused by prior alignment of the mask on the multilayer body are not completely compensated for over the entire surface of the multilayer body due to thermal and / or mechanical straining process steps can, although the mask alignment on existing (usually arranged on the horizontal and / or vertical edges of the multilayer body) registration or registration marks is done. The tolerance varies over the entire surface of the multilayer body in a comparatively large

Area. The method preferably uses the first and second zones defined by the patterning of the first or second decorative layer or the metal layer, directly or indirectly, as a mask for structuring the remaining layers, so that these problems are avoided. The trained as a decorative layer or metal layer mask is therefore all

Subsequent process steps of the multilayer body subjected, and thus automatically follows all possibly caused by these process steps distortion in the multilayer body itself. Thus, no additional tolerances, especially no additional tolerance variations, occur over the surface of the multi-layer body, as the subsequent generation of a mask and thereby necessary as register-accurate subsequent positioning of this independent of the previous process mask is avoided. The tolerances or register accuracies in the

The inventive method is based only in possibly not absolutely exactly trained edges of the first and second zones and the metal layer whose quality is determined by the particular manufacturing method used. The tolerances or register accuracies in the

inventive methods are approximately in the micrometer range, and thus far below the resolution of the eye; i.e. the unarmed

human eye can no longer perceive existing tolerances. Register or register accuracy is to be understood as meaning the positional arrangement of superimposed layers.

A layer comprises at least one layer. A decorative layer comprises one or more decorative and / or protective layers which are in particular formed as lacquer layers. The decorative layers can be arranged over the entire surface or in pattern-like structured form on the carrier layer.

When an arrangement of an object in the first zone and / or the second zone is described below, it is to be understood that the object is arranged such that the object and the first and / or the second zone are perpendicular to the plane of the carrier layer overlap seen.

The at least one metal layer may consist of a single metal layer or of a sequence of two or more metal layers, preferably

different metal layers exist. The metal used for the metal layers is preferably aluminum, copper, gold, silver or an alloy of these metals. It is further advantageous if in step c), i. for structuring the

Metal layer, an activatable by means of electromagnetic radiation first resist layer is applied to the first decorative layer facing away from the metal layer and the first resist layer using a

Exposure mask is exposed by means of said electromagnetic radiation. Subsequently, further steps for structuring the metal layer, such as development, etching and stripping, then preferably follow.

It is advantageous if the following procedure is followed: The second decorative layer applied in step d) comprises one or more second colored resist layers which can be activated by means of electromagnetic radiation. In step e), the one or more second, colored resist layers are produced from the side of the carrier layer by means of said electromagnetic radiation exposed, wherein the metal layer serves as an exposure mask. In this way, the second decorative layer can be structured in the perfect register to the metal layer. In a further advantageous embodiment, the one or more second, colored resist layers comprise at least two different colorants or colorants of different concentration containing resist layers. One or more of the one or more second, colored resist layers may be applied in pattern form by means of a printing process. These colored resist layers are preferably formed in pattern form to form a first motif.

It is particularly advantageous if the first resist layer is exposed in step c) from the side of the carrier layer, wherein the mask for exposing the first resist layer is formed by the first decorative layer. For this purpose, the first decorative layer has a first transmittance in the first region in the one or more first zones perpendicular to the plane of the carrier layer and one in the one or more second zones in comparison to the first one

Transmittance greater second transmittance, said transmissions preferably refer to an electromagnetic radiation having a suitable for photoactivation of the first resist layer wavelength.

In the exposure of the photoactivatable layer by means of said

electromagnetic radiation from the photoactivatable layer

Thus, the first decorative layer acts as an exposure mask, since in the first zone it has a transmittance which is reduced compared to the transmittance of the second zone. Next, the exposure takes place through the

Metal layer and thus the layer to be structured. It is also expedient if a particular colored etching resist layer is partially applied to a partial region of the metal layer in which no first resist layer is provided. In the case of a later etching process, the etching resist layer allows the metal layer to be patterned independently of the exposure of the first resist layer in this subregion, as a result of which further graphic effects can be achieved. Preferably, the

Etch resist layer while polyvinyl chloride.

The first decorative layer also fulfills several completely different functions, namely the function of an exposure mask and the provision of optical information.

The first decorative layer is preferably designed so that a viewer of an article decorated by means of the multi-layer body can view the at least one metal layer through the first decorative layer. For example, the first decorative layer can be transparent or translucent. Further, it is also possible that the first decorative layer a (colored) second, for the

human viewer forms visible motif, which is designed independently of the first and second zones. This can be the first decorative layer

for example, be transparent or translucent colored.

By using the first decorative layer as the exposure mask, the first resist layer is precisely aligned with the first and second zones of the

Multilayer body structured, i. the structures of the structured first resist layer are arranged in register with the first and second zones of the decorative layer. In addition, according to this embodiment of the method, the at least one metal layer is patterned in register with the resist layer. Thus, the method allows the formation of at least four mutually register formed layers: the first decorative layer, the first

Resist layer, the at least one metal layer and the second decorative layer. As a result of the method, the multilayer body has the metal layer as well as the two decor layers register exactly in the first zone or in the second zone of the multilayer body.

By using the first decorative layer as an exposure mask for the first resist layer or the metal layer as an exposure mask for a

If necessary, the second resist layer encompassed by the second decorative layer inevitably results in a perfect register accuracy of the respective ones

Exposure mask to the metal layer or the second decorative layer, i. the first decorative layer and the structured metal layer itself act at least in some areas as exposure masks. The first decorative layer or the metal layer and the exposure mask thus each form a common functional unit. The method, which is as simple as it is effective, gives rise to a considerable advantage over conventional methods in which a separate exposure mask has to be registered in layers of the multilayer body, wherein in practice register deviations can only be completely avoided in very few cases.

It is possible for the first decorative layer to comprise a first lacquer layer which is arranged in the first zone with a first layer thickness and in the second zone either not or with a smaller second layer thickness compared to the first layer thickness on the carrier layer, so that the first decorative layer in the first zone having said first transmittance and in the second zone said second transmittance. As a result, the mask function of the first decorative layer is realized in a simple manner.

The lacquer layers can be particularly patterned by a printing process, such as gravure, offset printing, screen printing, inkjet printing, so that both the mask function and the

desired optical effect can be realized. To be able to realize a variety of optical effects or security features, it is also advantageous if the paint layers contain a UV absorber and / or a colorant. In the case of the process variants which comprise an exposure through the first decorative layer, it has proven advantageous to choose the thickness and the material of the first decorative layer such that the first transmittance is greater than zero. The thickness and the material of the first decorative layer are chosen so that electromagnetic radiation with the appropriate wavelength for the photoactivation partially penetrates the first decorative layer in the first zone. The exposure mask formed by the first decorative layer is therefore designed to be radiation-permeable in the first zone.

It has proven useful if the thickness and the material of the first decorative layer are chosen such that the ratio between the second and the first transmittance is equal to or greater than 2. The ratio between the first and the second transmittance is preferably 1: 2, also referred to as contrast 1: 2. A contrast of 1: 2 is at least one

Order of magnitude lower than conventional masks. It has hitherto not been customary to use a mask for exposing a resist layer, which mask has as little contrast as the preferably used first decorative layer described here. Upon exposure of a resist to a conventional mask (e.g., a chrome mask), there are opaque (OD> 2) and fully transparent areas; So the mask has a high contrast. A conventional aluminum mask has a typical contrast of 1: 100 because the typical transmittance of an aluminum layer is at values around 1%, corresponding to an optical density (= OD) of 2.0. Of the

Transmittance (= T) and the OD are linked together as follows: T = 10 ^"c (ie OD = 0 corresponds to T = 100%, OD = 2 corresponds to T = 1%, OD = 3 corresponds to T = 0.1%) In contrast to the conventional exposure methods, the resist layer is exposed not only by a mask with low contrast (= decorative layer) but also by the metal layer. The area of the photoactivatable first resist layer (smaller transmittance) exposed through the first zones is preferably activated to a lesser extent than the area of the photoactivatable first resist layer exposed to the second zones (larger

Transmittance). In this case, the first resist layer may be temporarily applied to the metal layer during the production of the multilayer body, where it serves to structure the metal layer, or else be part of the second decorative layer or serve for structuring the second decorative layer.

It has proven useful if the thickness and the material of the first decorative layer is selected so that the electromagnetic radiation, measured after passing through a layer package consisting of the carrier layer and the decorative layer, in the first zone a transmittance of about 0% to 30%, preferably from about 1% to 15% and in the second zone has a transmittance of about 60% to 100%, preferably from about 70% to 90%. The transmittances from these ranges of values are preferably selected such that a contrast of 1: 2 results. According to a second embodiment, the first resist layer is exposed in step c) from the side facing away from the carrier layer, wherein for exposing the first resist layer, a mask between the first resist layer and a light source, which is used for exposure, is arranged. The mask has, viewed perpendicularly to the plane of the carrier layer, a first transmittance in the first region in the one or more first zones and a second transmittance greater in the one or more second zones compared to the first transmittance, the said

Transference levels preferably refer to an electromagnetic radiation having a suitable wavelength for photoactivation of the first resist layer. Since no structures are yet introduced into the multilayer body at this stage of the process, an external mask can be used without register problems. The structures in the metal layer produced by means of the external mask then later act in the described manner as a mask for the generation of additional register-accurate structures in the first and / or second decorative layer.

It has proven useful to use a positive photoresist whose solubility increases upon activation by exposure, or to use a negative photoresist, to form the photoactivatable layers, in particular the first and / or second resist layers activated by electro-magnetic radiation Solubility decreases upon activation by exposure. Exposure is the selective irradiation of a photoactivatable layer through an exposure mask with the aim of locally modifying the solubility of the photoactivatable layer by a photochemical reaction. By the type of photochemically achievable

Solubility change distinguishes the following photoactivatable

Layers that may be formed as photoresists: In a first type of photoactivatable layers (eg, negative resist), their solubility decreases by exposure to unexposed areas of the layer, for example because the light causes the layer to cure In a second type of photoactivatable layers (eg, positive resist), their solubility increases by exposure to unexposed zones of the layer, for example, because the light results in the decomposition of the layer.

Furthermore, it has proven useful if the first and / or second resist layer when using a positive photoresist in the second zone or at

Use of a negative photoresist in the first zone is removed. This can be done by a solvent such as a caustic or acid. When using a positive photoresist, the more exposed second region of the

Resist layer in the one or more second zones a higher solubility than the less exposed first region of the resist layer in the one or more first zones. Therefore, a solvent dissolves the material of the resist layer (positive photoresist) disposed in the second zone faster and better than the material of the resist layer disposed in the first zone. By using a solvent, the resist layer can therefore be patterned, ie the resist layer is removed in the second zone, but remains in the first zone.

The first resist layer is then preferably used as an etching mask for an etching step, by means of which the regions of the metal layer not covered with the first resist layer or one of the metal layers are removed.

Subsequently, the first resist layer may be stripped, i. be removed.

It is advantageous if for the exposure of the first and / or second

Resist layer UV radiation is used, preferably with a

Radiation maximum in the range of 365 nm. The transmission properties of the decorative layer used as a mask can thus be different in the ultraviolet range than in the visual range. Thus, the structure of the mask is not dependent on the visually perceptible optical effect of the

Decorative layers should be achieved. In the range of 365 nm is also PET

(= Polyethylene terephthalate), which can form an essential part of the carrier layer, transparent. In the range of this wavelength is the maximum of the emission of a high pressure mercury radiator. It is possible that the first and / or second resist layer has a thickness in the

Range of 0.3 μιτι to 0.7 μιτι has.

In a further advantageous embodiment of the invention, step c) is carried out after step d), and in step c) the metal layer is structured using the second decorative layer as a mask, in particular by applying an etchant and removing the areas of the metal layer which are not protected by the mask. In step e) then the first decorative layer using the Metal simply as a mask, especially by applying a solvent and removing the non-mask protected areas of the first

Decor layer, structured. The second decorative layer has here in addition to the optical function achieved by the Einfarbung so an additional function as a mask, on the basis of which follows the register-accurate structuring of the metal layer. Thus, without the use of external masks, a perfect registration between the second decorative layer and the metal layer can be achieved, so that the

Exactly cover the structures of the two layers. At the same time, this embodiment does not require exposure and development steps, resulting in a particularly simple procedure. After the metal layer has been patterned using the second decorative layer, the metal layer can in turn be used as a mask for structuring the first decorative layer, for example by removing the zones of the first decorative layer not covered by the metal layer by a solvent.

It is also advantageous if the second decorative layer is applied by pattern printing, wherein the second decorative layer is provided in the first zones with a third layer thickness and is provided in the second zones with a fourth layer thickness different from the third layer thickness, in particular the fourth Layer thickness is zero. As a result, both the mask function and the desired optical effect of the second decorative layer can be realized in a simple manner.

In a further advantageous embodiment, the second decorative layer is resistant to an etchant used for patterning the metal layer and to a solvent used for structuring the first decorative layer. Thus, the second decorative layer both as a protective mask for structuring the metal layer and for structuring the first

Serve decor layer. It is also advantageous if the second decorative layer comprises one or more colored layers, which are applied in particular by a printing process. In a further advantageous embodiment, the first resist layer and / or areas of the first decorative layer not protected by the metal layer are removed by a solvent. A preferred embodiment also provides for substantially completely removing ("stripping") the resist layer during the work step for structuring the metal layer or in a separate, subsequent, subsequent work step

Reduction of the number of superimposed layers in the

Multi-layered bodies whose durability and durability are increased because adhesion problems between adjacent layers are minimized.

Furthermore, the optical appearance of the multilayer body can be improved, since after removal of the resist layer, which in particular can be colored and / or not completely transparent, but only translucent or opaque, the underlying areas are exposed again. For special

However, it is also possible to leave the first resist layer on the structured layer without particularly high demands on the durability or the visual appearance.

It has proven useful if, in step c), the zones of the metal layer not protected by the first resist layer and / or the second decorative layer are removed by an etchant. This can be done by an etchant such as an acid or alkali. It is preferred if the removal of the regions

Resist layer in the respective area and thus exposed areas of the metal layer layer in the same process step takes place. This can be achieved in a simple manner by a solvent / etchant, such as a lye or acid, which is capable of producing both the resist layer-in the case of a positive resist in the exposed region, in the case of a negative resist in the unexposed region-and the layer to be structured to remove, that attacks both materials. In this case, the resist layer must be formed so that they to remove the solvent used to be structured layer or etchant at

Using a positive resist in the unexposed area, using a negative resist in the exposed area for at least a sufficient time, i. withstands the exposure time of the solvent or etchant.

It has also proved to be useful if the carrier layer comprises at least one functional layer, in particular a release layer and / or a protective lacquer layer, on the side facing the first decorative layer. This is particularly advantageous when using the multilayer film as a transfer film in which the functional layer easily removes the carrier layer of a

Transfer layer, which comprises at least one layer of the first and second decorative layer and the metal layer allows

It is also advantageous if the first and / or second decorative layer a

Replizierlackschicht include, in which a surface relief is molded, and / or that in the first decorative layer facing surface of the support layer, a surface relief is molded.

Preferably, the surface relief diffractive structure comprises a preferably having a spatial frequency between 200 and 2000 lines / mm, in particular a hologram, Kinegram ^®, a linear grating or a cross grating, a

Zero-order diffraction structure, in particular with a spatial frequency of more than 2000 lines / mm, a blazed grating, a refractive structure, in particular a microlens field or a retroreflective structure, an optical lens, a free-form surface structure, and / or a matt structure, in particular an isotropic or anisotropic matt structure. Matt structure refers to a structure with light-scattering properties, which preferably has a stochastic surface matt profile. Matt structures have

preferably a relief depth (peak-to-valley, PV) between 100 nm and 5000 nm, more preferably between 200 nm and 2000 nm. Matt structures preferably have a surface roughness (Ra) between 50 nm and 2000 nm, more preferably between 100 nm and 1000 nm. The matte effect can either isotropic, ie equal to all azimuth angles, or anisotropic, ie

varying at different azimuth angles, be.

Under a replication layer is generally a superficial with a

Relief structure produced layer understood. These include, for example, organic layers such as plastic or lacquer layers or inorganic layers such as inorganic plastics (for example silicones), semiconductor layers, metal layers etc., but also combinations thereof. It is preferred that the replication layer is formed as a replicate varnish layer. To form the relief structure, a radiation-curable or thermosetting

(Thermosetting) Replizierschicht or a thermoplastic Replizierlackschicht be applied, a relief are molded into the replication and the replication, if necessary, be cured with the embossed relief. It is also advantageous if after structuring the metal layer a

Leveling layer is applied, which rests in particular on the carrier layer facing away from the surface areas of the first decorative layer, the second decorative layer and / or the carrier layer. It is preferred if, after the structuring of the metal layer, the metal layer and the first resist layer in the first or the second zone are removed and present in the other region, or in the corresponding regions

Process variants in the protected zones of the second resist layer present and removed in the remaining area. By applying the

Leveling layer recessed areas / wells of the metal layer, the first decorative layer and / or the second decorative layer can be at least partially filled. It is possible that by applying the compensating layer, recessed regions / depressions of the first or second resist layer are at least partially filled. The leveling layer may comprise one or more different layer materials. The compensation layer may be formed as a protective and / or adhesive and / or decorative layer. It is possible that on the side facing away from the carrier layer side of the

Leveling layer, an adhesion-promoting layer (adhesive layer) is applied, which may also be formed in a multilayered manner. Thus, the multilayer body formed as a laminating film or transfer film may be bonded to a target substrate adjacent to the primer layer, e.g. in a hot stamping or IMD (IMD = In-Mold Decoration) process. The

Target substrate may be, for example, paper, cardboard, textile or another

Fiber, or a plastic or composite material such as paper, cardboard, textile and plastic and thereby be flexible or predominantly rigid.

Preferably, the side facing away from the carrier layer of the

Multi-layer body applied a protective lacquer on the multi-layer body. This protects the multilayer body against environmental influences and mechanical

Manipulations.

It is also advantageous if the first and / or second decorative layer by

Exposure is bleached. In order for any remaining photoreactive substances in the unexposed areas of the multilayer body are reacted and prevents later uncontrolled bleaching. In this way, a particularly color-stable multilayer body is obtained.

Preferably, the multi-layer body comprises a particular full-surface carrier layer. The carrier layer must be permeable to the radiation used in the respective exposure step. In the case of the following carrier materials, it is also possible to use electromagnetic radiation having a wavelength in the range from 254 to 314 nm: olefinic carrier material such as PP (=

Polypropylene) or PE (= polyethylene), carrier material based on PVC and PVC copolymer, carrier material based on polyvinyl alcohol and

Polyvinyl acetate, polyester carrier based on aliphatic raw materials.

It is possible that the carrier layer has a single-layer or multi-layer carrier film. A thickness of the carrier foil of the multilayer body according to the invention in the range of 12 to 100 μιτι has been proven. As a material for the carrier film is for example PET, but also other plastic materials, such as PMMA (= polymethyl methacrylate) in question. It is particularly expedient if the first decorative layer has, seen in the first zone, a first transmittance perpendicular to the plane of the carrier layer and a second transmittance in the second zone in comparison with the first transmittance, the said ones being

Transmissionsgrade to an electromagnetic radiation in the visual and / or ultraviolet and / or infrared spectrum. As already explained by the method, such a first decorative layer itself as

Exposure mask for the structuring of the metal layer are used, so that there is a multi-layer body with a register-accurate layer arrangement.

It is also possible that the second decorative layer in the first zone or the second zone at least one by means of said electromagnetic

Radiation photoactivated resist layer, wherein the at least one metal layer and the resist layer are precisely aligned with each other.

It is possible that the first and / or second decorative layer comprises one or more layers, which are colored with at least one opaque and / or at least one transparent colorant, at least in one

Wavelength range of the electromagnetic spectrum colored or

is color-producing, in particular colorfully colored or colorful color-producing, in particular that a colorant is contained in one or more of the layers of the first and / or second decorative layer, the outside of the visible

Spectrum can be stimulated and a visually recognizable colored

Impression created. It is preferable that the first and / or second visible light decorating layer having a wavelength in a range of about 380 to 750 nm is at least partially transmissive. It is possible for the first and / or second decorative layer to comprise at least one pigment or at least one colorant of the color cyan, magenta, yellow or black (CMYK = cyan magenta yellow key;

Black as color depth) or the color red, green or blue (RGB), in particular for producing a subtractive mixed color, is colored, and / or with at least one red and / or green and / or blue fluorescent

radiation-responsive pigment or dye is provided and thereby

In particular, an additive mixed color can be generated upon irradiation. Alternatively to a mixed color can also pigments or dyes

Use find that produce a specific, premixed as a special color or as a color from a special color system (eg RAL, HKS, Pantone ^® ), such as orange or violet.

As a result, the first decorative layer fulfills a dual function in the process variants in which exposure takes place through the first decorative layer. On the one hand, the first decorative layer serves as an exposure mask for forming at least one metal layer, which is arranged in register with the first and second zones of the multilayer body. In particular, the first decorative layer serves as an exposure mask for a partial demetallization of a

Metal layer. On the other hand, both decorative layers, or at least one or more layers of the respective decorative layer, serve on the multi-layer body as an optical element, in particular as a single- or multi-colored ink layer for coloring the at least one structured layer, wherein the

Color layer register over and / or next to / adjacent to the at least one metal layer layer is arranged.

It is possible for the first and / or second decorative layer to comprise a replication lacquer layer into which an at least one relief structure comprises

Surface relief is molded and the at least one metal layer is disposed on the surface of the at least one relief structure. It is possible for the at least one relief structure to be arranged at least partially in the first zone and / or in the second zone. In this case, the surface layout of the relief structure can be adapted to the surface layout of the first and the second zone, in particular in register formed, or the surface layout of the relief structure is formed, for example, as a continuous endless pattern regardless of the area layout of the first and second zones. The relief structure can of course also in the process variants that do not require zones of different transmission in the decorative layer, are introduced and adapted to the surface layout of the decorative layer. The inventive arrangement of the resist layer on the first side of the carrier layer so that the resist layer is disposed on the side facing away from the carrier layer side of at least one metal layer and the decorative layer on the other side of the at least one metal layer, it is possible, the layer to be patterned at least partially on a relief structure, as opposed to patterning processes using washcoat.

It is possible for the first and / or second decorative layer to comprise one or more of the following layers: liquid-crystal layer, polymer layer,

in particular conductive or semiconducting polymer layer, interference thin film layer packet, pigment layer.

It is possible that the first and / or decorative layer has a thickness in the range of 0.5 μm to 5 μm. It is possible that UV-absorbers may be added to the material for forming the decorative layer, especially if the material of the decorative layer does not contain a sufficient amount of UV-absorbing constituents, such as, for example, UV-absorbing pigments or UV-absorbing dyes. It is possible that the decorative layer inorganic absorber with high Streuanteilteil, in particular nano-scaled UV absorbers based on inorganic oxides has. Particularly suitable oxides are T1O2 and ZnO in

highly dispersed form, as in sunscreen creams with a high sun protection factor can be used. These inorganic absorbers lead to a high degree of scattering and are therefore particularly suitable for a matt,

in particular silk matt, coloring the decorative layers suitable. However, it is also possible for the decorative layers to comprise organic UV absorbers, in particular benzotriazole derivatives, with a mass fraction in the range of about 3% to 5%, in particular if the material of the decorative layers does not contain a sufficient amount of UV-absorbing constituents, as

For example, UV-absorbing pigments or UV-absorbing dyes. Suitable organic UV absorber sold under the trade name Tinuvin ^® by the company BASF. It is possible that the decorative layer or organic or inorganic fluorescent dyes, fluorescent pigments in combination with finely divided pigments, especially Mikrolith ^® - K has. By exciting these fluorescent pigments, the UV radiation is for the most part already filtered out in the respective decorative layer, so that only an insignificant fraction of the radiation reaches the resist layer. The fluorescent pigments can be used in the multilayer body as an additional security feature. The use of UV-activatable resist layers offers advantages: By using a UV absorber, which has a transparent effect in the visual wavelength range, in the first and / or second decorative layer, the "color" property of the respective decorative layer can be in the visual wavelength range of

desired properties of the respective decorative layer for structuring the respective resist layer (for example, sensitive in the near UV) and thereby the at least one metal layer are separated. In this way, a high contrast between the first and the second zone can be achieved, regardless of the visually recognizable coloring of the decorative layers. It is possible that the at least one metal layer has a thickness in the range of 20 nm to 70 nm. It is preferable that the metal layer of the

Multilayer body as a reflection layer for from the side of the replication layer incident light is used. By combining a relief structure of

A replication layer and a metal layer arranged underneath can be used to generate a multiplicity of different optical effects which can be used effectively for safety aspects. The metal layer may be made, for example

Aluminum or copper or silver exist in a subsequent

Process step is galvanically reinforced. The metal used for galvanic reinforcement may be the same or different than the metal of the patterned layer. An example is e.g. the galvanic reinforcement of a thin aluminum layer, copper layer or silver layer with copper.

It is possible that recesses of the first and / or second decorative layer and the metal layer are filled with a leveling layer.

It is preferred if the refractive index n1 of the compensation layer in

visible wavelength range in the range of 90% to 1 10% of

Refractive index n2 of the replication layer is. It is preferred if in the first or second zones where the metal layer is removed and a spatial structure, i. a relief, formed on the surface, the

Recesses and elevations of the relief is equalized by means of a compensation layer having a similar refractive index as the replication (An = | n2-n11 <0.15). In this way, the one through the relief

formed optical effect in the zones in which the leveling layer is applied directly to the replication layer, no longer perceptible, because by leveling with a material with sufficiently similar

Refractive index no optically sufficiently effective interface can arise.

It is possible that the leveling layer may be used as an adhesion layer, e.g.

Adhesive layer is formed.

The invention will be explained by way of example with reference to the drawings. Show it a schematic section of a first manufacturing stage of in

Fig. 1 d shown multilayer body;

a schematic section of a second manufacturing stage of in

Fig. 1 d shown multilayer body;

a schematic section of a third manufacturing stage of in

Fig. 1 d shown multilayer body;

a schematic section of a first after a

Embodiment of the inventive method prepared multilayer body;

a schematic section of a first manufacturing stage of in

Fig. 2d shown multilayer body;

a schematic section of a second manufacturing stage of in

Fig. 2d shown multilayer body;

a schematic section of a third manufacturing stage of in

Fig. 2d shown multilayer body;

a schematic section of one after a second

Embodiment of the inventive method prepared multilayer body;

a schematic section of a first manufacturing stage of in

3e shown multilayer body;

a schematic section of a second manufacturing stage of in

3e shown multilayer body;

a schematic section of a third manufacturing stage of in

3e shown multilayer body;

a schematic section of a fourth manufacturing stage of in

3e shown multilayer body;

a schematic section of one after a third

Embodiment of the inventive method prepared multilayer body;

a schematic section of a first manufacturing stage of in

Fig. 4d shown multilayer body; 4b shows a schematic section of a second manufacturing stage of the multilayer body shown in FIG. 4d;

4c shows a schematic section of a third manufacturing stage of the in

Fig. 4d shown multilayer body;

Fig. 4d is a schematic section of a fourth

Embodiment of the inventive method prepared multilayer body;

1 a to 3 e are each drawn schematically and not to scale in order to ensure a clear representation of the essential features.

Fig. 1a shows an intermediate product 100a in the preparation of a

Multi-layer body 100, which is shown in the finished state in Fig. 1 d. The multilayer body 100 according to FIG. 1 d comprises a carrier layer with a first side 1 1 and a second side 12. The carrier layer comprises a carrier foil 1 and a functional layer 2. On the functional layer 2 a first decorative layer 3 is arranged which has a first decorative layer 3 a first zone 8 formed first lacquer layer 31 and a replication 4 includes. On the replication layer 4, a metal layer 5 is arranged in register with the first lacquer layer 3. On the metal layer 5, a second decorative layer 7 arranged in register with the metal layer 5 is provided. A leveling layer 10 fills height differences between the replication layer 4, the metal layer 5 and the second decorative layer 7. The carrier film 1 is preferably transparent

Plastic film with a thickness between 8 μιτι and 125 μιτι, preferably in the range of 12 to 50 μιτι, more preferably in the range of 16 to 23 μιτι. The carrier film 1 may be formed as a mechanically and thermally stable film of a transparent material, for example of ABS (= acrylonitrile-butadiene-styrene), BOPP (= Biaxially Oriented Polypropylene), but preferably of PET. The carrier film 1 can hereby be monoaxially or biaxially stretched. Further, it is also possible that the carrier film 1 not only of a layer, but also consists of several layers. For example, it is possible for the carrier foil 1 to be next to a plastic carrier, for example one at the top

described plastic film, a release layer, which allows the detachment of the layers consisting of the layers 2 to 6 and 10 layer structure of the plastic film, for example when using the

Multi-layer body 100 as a hot stamping foil

The functional layer 2 may comprise a release layer, e.g. of heat-melting material, which facilitates detachment of the carrier film 1 from the layers of the multilayer body 100, which are arranged on a side of the release layer 2 facing away from the carrier film 1. This is particularly advantageous when the multilayer body 100 is formed as a transfer layer, as e.g. is used in a hot stamping process or an IMD process. Furthermore, it has proven useful, in particular if the multilayer body 100 is used as a transfer film, if the functional layer 2 contains, in addition to a release layer, a protective layer, e.g. a protective lacquer layer. After bonding the multilayer body 100 to a substrate and peeling off the carrier foil 1 from the layers of the multilayer body 100, which are arranged on a side of the peel layer 2 facing away from the carrier foil 1, the protective layer forms one of the upper layers on the surface of the substrate arranged layers and layers arranged below it from abrasion, damage, chemical attack, etc. protect. Of the

Multilayer body 100 may be a portion of a transfer film, for example a hot stamping foil, which may be disposed on a substrate by means of an adhesive layer. The adhesive layer is preferably arranged on the side of the compensation layer 10 facing away from the carrier film 1. The adhesive layer may be a hot melt adhesive which melts upon thermal exposure and bonds the multi-layer body 100 to the surface of the substrate.

On the functional layer 2 is in the zone 8, the transparent, colored

Paint layer 31 printed. Transparent means that the lacquer layer 31 in the visible wavelength range is at least partially transparent to radiation. Colored means that the varnish layer 31 shows a visible color impression with sufficient daylight. The lacquer layer 31 may in this case comprise a plurality of differently colored partial regions, as indicated for example in FIG. 1d by different shading. As a result, a first motif can be provided. Further, the decorative layer 7, as indicated in Fig. 1 d by different shades, form different colored areas or areas with different optical properties, which provide in particular a second motif.

Both the zones 8 printed with the lacquer layer 31 and the unprinted zones 9 of the functional layer 2 are covered by a replication layer 4, which preferably has any existing relief structures of the decorative layer 3, i. the differing levels in the printed 8 and unprinted zones 9, equalized.

In the register and when viewed perpendicular to the plane of the carrier layer 1 congruent to the lacquer layer 31, a thin metal layer 5 is arranged on the replication 4. Coincident with the metal layer 5, a second decorative layer 7 is arranged. Both the zones 8 of the replication layer 4 covered by the metal layer 5 and the decorative layer 7 and the uncovered zones 9 of the replication layer 4 are covered by a compensation layer 10, which is formed by the relief structures and the metal layer 5 arranged in some regions

caused structures (e.g., relief structure, different layer thicknesses, height offset), i. covered and fills, so that the

Multilayer body on the side facing away from the carrier film 1

Leveling layer 10 has a flat, substantially structureless surface. If the compensating layer 10 has a similar refractive index as the replicating layer 4, ie if the refractive index difference is less than about 0.15, then those not covered with the metal layer 5 will be directly attached to the

Leveling layer 10 adjacent zones of the relief structures in the

Replicating layer 4 optically extinguished, because there because of the similar

Refractive index of both layers no more visually recognizable layer boundaries between the replication layer 4 and the compensation layer 10 are more present. FIGS. 1 a to 1 c now show production stages of the multilayer body 100 shown in FIG. 1 d. Identical elements as in FIG. 1 d are designated by the same reference numerals.

FIG. 1a shows a first production stage 100a of the multilayer body 100, in which the carrier foil 1 comprises a functional layer 2 on a first side 11, on which in turn a decorative layer 3 is arranged. One side of the functional layer 2 is adjacent to the carrier film 1, its other side to the decorative layer 3. The decorative layer 3 has a first zone 8, in which a lacquer layer 31 is formed, and a second zone 9, in which the lacquer layer 31 is not present is on. The lacquer layer 31 is printed on the functional layer 2, e.g. by

Screen printing, gravure printing or offset printing. The formation of the lacquer layer 31 by regions (in the first zones 8) results in a pattern-shaped one

It is also possible for the lacquer layer to consist of a plurality of partial layers which overlap one another, in particular regions, which in particular have different optical properties, in particular different colors. The lacquer layer 31 has

preferably a layer thickness of 0.1 μιτι to 2 μιτι, more preferably from 0.3 μιτι to 1, 5 μιτι on. On the functional layer 2 and the partially disposed (in the zones 8) thereon lacquer layer 31, a replication 4 is applied, the

Part of the first decorative layer 3 is. It can be an organic Layer applied by conventional coating methods, such as printing, casting or spraying, in liquid form. The order of the replication layer 4 is provided here over the entire surface. The layer thickness of

The replication layer 4 varies as it compensates for the different levels of the decorative layer 3 including the printed first zone 8 and the unprinted second zone 9; In the first zone 8, the layer thickness of the replication layer 4 is thinner than in the second zone 9, so that the side facing away from the carrier layer 1 side of the replication layer 4 before the formation of relief structures in a flat, substantially featureless surface.

The Replizierlackschicht 9 preferably has a layer thickness of 0.1 μιτι to 3 μιτι, more preferably from 0.1 μιτι to 1, 5 μιτι on.

But it can also be an order of the replication 4 only in one

Part of the multi-layer body 100 may be provided. The surface of the replication layer 4 can be structured in regions by known methods. For this purpose, for example, a replicating layer 4 is a thermoplastic Replizierlack applied by printing, spraying or painting and a relief structure in the particular thermally curable / dryable

Replicate varnish 4 by means of a heated punch or a heated

Replication roller molded. The replication layer 4 can also be a UV-curable replication lacquer which is structured, for example, by a replication roller and cured simultaneously and / or subsequently by means of UV radiation. However, the structuring can also be produced by UV irradiation through an exposure mask.

On the replication 4, the metal layer 5 is applied. The metal layer 5 may be formed, for example, as a vapor-deposited metal layer, for example of silver or aluminum. The order of the metal layer is provided here over the entire surface. However, an application may also be provided only in a partial region of the multilayer body 100, for example with the aid of a partially shielding vapor deposition mask. The metal layer preferably has a layer thickness of 20 nm to 70 nm.

On the metal layer 5, a photoactivatable resist layer 6 is applied. The resist layer 6 is formed in the present embodiment as a positive resist (release of the activated = exposed areas). The resist layer 6 may be an organic layer which is applied in a liquid form by classical coating methods such as printing, casting or spraying. It can also be provided that the

Resist layer 6 is vapor-deposited or laminated as a dry film.

In the photoactivatable layer 6 can be, for example, a positive photoresist AZ Clariant or act of MICROPOSIT ^® S1818 from Shipley 1512 in which a surface density of 0.1 g / m ² to 10 g / m ^2, preferably from 0.1 g / m ² to 1 g / m ^{2 is} applied to the layer 5 to be structured. The layer thickness depends on the desired resolution and the process. The order is provided here over the entire area. However, an application may also be provided only in a partial area of the multilayer body 100.

FIG. 1 b shows a second manufacturing stage 100 b of the multilayer body 100, in which the first manufacturing stage 100 a of the multilayer body 100 was irradiated and subsequently developed. Electromagnetic radiation with a

Wavelength suitable for activating the photoactivatable resist layer 6 is produced from the second side 12 of the carrier foil 1, i. the side of

Carrier film 1, which is opposite to the coated with the resist layer 6 side of the carrier film 1, blasted through the multilayer body 100d. The irradiation serves to activate the photoactivatable resist layer 6 in the second zone 9, in which the decorative layer 3 has a higher transmittance than in the first zone 8. The strength and duration of the exposure with the

Electromagnetic radiation is thus on the multilayer body 100a

agreed that the radiation in the second zone 9 to activate the photoactivatable resist layer 6 leads, however, does not lead to activation of the photoactivatable resist layer 6 in the printed with the resist layer 31 first zone 8. It has proven useful if the contrast between the first zone 8 and the second zone 9 caused by the lacquer layer 31 is greater than two. Furthermore, it has proven useful if the lacquer layer 31 are designed so that the radiation after passing through the entire

Multilayer body 100a has a ratio of transmittances, i. one

Contrast ratio of about 1: 2 between the first zone 8 and the second zone 9 has.

The exposure is preferably carried out with an illuminance of 100 mW / cm ² to 500 mW / cm ² , preferably from 150 mW / cm ² to 350 mW / cm ² .

For developing the exposed resist layer 6, a developer solution, e.g. As solvents or alkalis, in particular a sodium carbonate solution or a sodium hydroxide solution applied to the side facing away from the carrier film 1 surface of the exposed photoactivatable resist layer 6. As a result, the exposed resist layer 6 in the second zone 9 has been removed. In the first zone 8, the resist layer 6 is obtained because the amount of radiation absorbed in these zones has not led to sufficient activation. As already mentioned, in the exemplary embodiment illustrated in FIG. 1a, the resist layer 6 is therefore formed from a positive photoresist. In such a photoresist, the more exposed zones 9 are in the developing solution, e.g. the solvent, soluble. In contrast, in a negative photoresist, the unexposed or less exposed zones 8 are soluble in the developer solution.

Subsequently, the metal layer 5 in the second zone 9 is removed by an etchant. This is possible because in the second zone 9 the metal layer 5 is not protected by the developed resist layer 6 serving as an etching mask

Attack of the etchant is protected. The etchant may be, for example, an acid or alkali, for example NaOH (sodium hydroxide). or Na 2 CO 3 (sodium carbonate) at a concentration of 0.05% to 5%, preferably from 0.3% to 3%. In this way, the areas of the metal layer 5 shown in FIG. 1 b are formed. In the next step, the remaining areas of the resist layer 6 are also removed ("stripping").

In this way, therefore, the metal layer 5 can be structured in register with the first and second zones 8 and 9 defined by the lacquer layer 31 without additional technological effort. In conventional methods of forming an etch mask by mask exposure, the mask being formed either as a separate unit, e.g. as a separate foil or as a separate one

Glass plate / glass roller, or is present as a subsequently printed layer, the problem arises that by previous, in particular thermally and / or mechanically consuming process steps, e.g. When generating a replication structure in the replication layer 4, caused linear and / or non-linear distortions in the multilayer body 100 can not be fully compensated over the entire surface of the multilayer body 100, although the

Masks alignment on existing (usually arranged on the horizontal and / or vertical edges of the multilayer body) register or

Registration marks. The tolerance fluctuates over the entire surface of the multi-layer body 100 in a relatively large area.

Thus, the first and second zones 8 and 9 defined by the lacquer layer 31 are used as a mask, wherein the lacquer layer 31 is applied in an early process step in the production of the multilayer body 100 as described above. As a result, no additional tolerances and no additional tolerance variations over the surface of the

Multi-layer body 100 occur because the subsequent generation of a mask and the necessary register-accurate subsequent positioning of this mask independent of the previous process is avoided. The tolerances or register accuracies in the method according to the invention lie only in the not absolutely exact course of the color edge of the defined by the lacquer layer 31 first and second zones 8 and 9, whose quality is determined by the particular printing method used, and are approximately in the micrometer range, and thus far below the

Resolving power of the eye; i.e. the unarmed human eye can no longer perceive existing tolerances.

The next, shown in Fig. 1 c intermediate 100c is from the

Intermediate product 100b is obtained by applying a further, second decorative layer 7 to the zones 8 covered by the structured layer 5 and to the zones 9 of the replication layer 4 not covered by the structured layer 5, in particular partially. The second decorative layer 7 comprises at least one second photoactivatable resist layer. Preferably, the second decorative layer 7 has two or more, in particular differently colored second resist layers. The second resist layers can also be printed in pattern form here. The second resist layers may also have a multilayer structure. The second resist layers may also be partially colorless transparent or translucent, i. have no coloring. As with the first resist layer 6, it may be in the second

Resist layer, for example, a positive photoresist AZ 1512 from Clariant or MICROPOSIT ^® S1818 from Shipley act, which in a surface density of 0.1 g / m ² to 10 g / m ^2, preferably from 0.5 g / m ² to 1 g / m ^{2 is} applied. The order is provided here over the entire area. However, an application may also be provided only in a partial area of the multilayer body 100. Since the second decorative layer 7 should at least partially be retained in the finished multi-layer body 100, dyes, pigments, nanoparticles or the like may additionally be incorporated into the lacquer in order to achieve an optical effect. The second decorative layer 7 is now also exposed from the side 12 of the carrier layer 1, for which purpose the parameters already described during the exposure of the first resist layer 6 can be used. During the exposure of Second decor layer 7 now the lacquer layer 31 and the metal layer 5 act together as a mask, so that the at least one resist layer of the second decorative layer 7 is exposed only in the zone 9, while the area covered by lacquer layer 31 and structured layer 5 remains unexposed. Like the first resist layer 6, now the second decorative layer 7 is developed with a

Developer solution, z. B. an alkali, in particular a sodium carbonate solution or a sodium hydroxide solution. This will make the exposed one

Resist layer of the second decorative layer 7 in the second zone 9 removed. In the first zone 8, the second resist layer is retained because the amount of radiation absorbed in these zones has not led to sufficient activation. When using a negative resist, this reverses as already described, so that the second resist layer is removed in the first zone 8 and is retained in the second zone 9. The multilayer body 100 shown in FIG. 1 d is formed from the fabrication stage 100 c of the multilayer body 100 illustrated in FIG. 1 c by providing a compensating layer 10 on the exposed second decorative layer 7 arranged in the first zone 8 and on the second zone 9 arranged in the second zone 9. by removing the metal layer 5 and the first 6 and second resist layer exposed replication layer 4 is applied. The order of

Compensation layer 10 is provided here over the entire surface.

As a leveling layer is in particular a UV-crosslinked or a

used heat-crosslinked paint.

It is possible for the leveling layer 10 to be applied in the first zone 8 and the second zone 9, each in a different layer thickness, e.g. by doctoring, printing or spraying, so that the leveling layer 10 has a flat, substantially featureless surface on its side facing away from the carrier layer 1 side. The layer thickness of the compensation layer 10 varies, since it varies the levels of the first zone 8

arranged metal layer 5 and exposed in the second zone 9 Replicating 4 compensated / equalized. In the second zone 9, the layer thickness of the compensation layer 10 is greater than the layer thickness of the metal layer 5 is selected in the first zone 8, so that the side facing away from the carrier layer 1 side of the compensation layer 10 has a flat surface. But it can also be an order of the leveling layer 10 only in a portion of the

Multi-layer body 100 may be provided. It is possible for one or more further layers, e.g. an adhesive or adhesive layer. With the described method, therefore, the first and second zones 8 and 9 defined by the lacquer layer 31 and by the metal layer 5 are used as a mask for structuring the second decorative layer 7. As a result, no additional tolerances and no additional tolerance fluctuations over the surface of the multi-layer body 100 occur, since the subsequent generation of a mask and thereby required register-accurate subsequent positioning of this independent of the previous process mask is avoided. Thus, a multi-layer body 100 is obtained, in which the lacquer layer 31 of the decorative layer 3, the metal layer 5 and the second decorative layer 7 are arranged in the perfect register.

FIG. 2 d shows a further multilayer body 200, which is produced by a variant of the method. The process steps and intermediates 200a, 200b and 200c are shown in FIGS. 2a to 2c. The further

Multilayer body 200 corresponds to that shown in FIG. 1 d

Multi-layer body 100. For the same structures and functional elements, therefore, the same reference numerals are used.

The multilayer body 200 also comprises a carrier layer with a first side 11 and a second side 12. The carrier layer comprises a carrier foil 1 and a functional layer 2. On the functional layer 2 a first decorative layer 3 is arranged, which is formed by a replication layer 4 , Alternatively, the decorative layer 3 may be formed of a plurality of layers and, for example, a colored layer and have a replication layer. On the replication layer

4, a metal layer 5 is arranged. On the metal layer 5, a second decorative layer 7 arranged in register with the metal layer 5 is provided. A

Leveling layer 10 fills height differences between the replication layer 4, the metal layer 5 and the second decorative layer 7. In this case, the materials and application methods already described with reference to the multilayer body 100 can be used for the individual layers.

The multi-layer body 200 differs from the multi-layer body 100 only in that the decorative layer 3 does not have separate lacquer areas 31, but is formed entirely from a colored replication lacquer which may contain dyes, pigments, UV-activatable substances, nanoparticles or the like or alternatively completely from one correspondingly colored lacquer layer and a transparent colorless Replizierlack is formed.

In the production of the multilayer body 200, the intermediate product 200a shown in FIG. 2a is first provided. Analogous to the production of the

Multi-layer body 100 is first a carrier film 1 with a

Provided functional layer 2, on the entire surface of the decorative layer 3 is applied. As already described, reliefs, for example diffractive structures, can additionally be introduced into the replication layer 4 of the decorative layer 3. The replication layer 4 is then metallized over the entire surface in the manner already described. On the thus obtained metallic, to be structured layer

5 will now be one or more, even differently colored

Resist layers comprehensive second decorative layer 7 imprinted part of the area, so that in the zone 8, the metal layer 5 is protected by the second decorative layer 7, while in the zone 9, the metal layer 5 is not covered by the second decorative layer 7. To produce the desired optical effects, the second decorative layer 7 comprises layers, in particular resist layers, which may contain dyes, pigments, UV-activatable substances, nanoparticles or the like. The second decorative layer 7 may be formed, for example, from a PVC-based paint. In order to obtain the intermediate product 200b shown in FIG

Intermediate product 200a of the multilayer body 200 is then treated with an etchant, in particular a sodium carbonate solution or a sodium hydroxide solution, which has a surface facing away from the carrier film 1

Intermediate 200a is applied. While the zone 8 are protected by the second decorative layer 7 from the action, the liquor can dissolve the metal layer 5 in the zone 9, so that the metal layer 5 is removed in the zone 9. In this way it can be achieved that the metal layer 5 is formed in the perfect register to the second decorative layer 7. The second decorative layer 7 thus acts as an etch resist here.

The intermediate product 200b is subsequently treated with a solvent, which should preferably have a flash point of more than 65 ° C. The solvent is chosen so that the second decorative layer 7 is insensitive to the solvent, while the material of the replication layer 4 can dissolve in the solvent.

Suitable lacquers, in particular for the replication varnish 4, via these

Properties include, for example, polyacrylates or polyacrylates in combination with cellulose derivatives.

In zone 8, however, the replication layer is protected by attack of the solvent by the metal layer 5 and the second decorative layer 7, so that the replication layer 4 dissolves only in the unprotected zone 9. As a result, the intermediate product 200c shown in Fig. 2c is obtained.

In order to obtain the finished multi-layer body 200, finally, a compensation layer 10 is applied, which may be present

Relief structures in the replication 4, as well as the removed zones 9 of the replication layer 4 and the metal layer 5 compensates, so that a smooth surface of the multi-layer body 200 results. As with the multilayer body Of course, even more functional layers or the like can be applied.

In contrast to the method described above, therefore, no exposure is necessary here in order to obtain a register-containing arrangement of three layers (first decorative layer 3, metal layer 5)

and second decorative layer 7). The resolution of the structures produced is limited only by the achievable when printing the second decorative layer 7 resolution and the lateral diffusion of the liquor or the solvent in the corresponding process steps.

3e shows a further multi-layer body 300, which is produced by a variant of the method. The process steps and intermediates 300a, 300b, 300c and 300d are shown in FIGS. 3a to 3d. The further

Multilayer body 300 also corresponds to that in FIG. 1 d and FIG. 2 d

shown multilayer bodies 100 and 200. For the same structures and functional elements, therefore, the same reference numerals are used.

The multilayer body 300 also comprises a carrier layer with a first side 11 and a second side 12, which comprises a carrier foil 1 and a functional layer 2. On this a replication layer 4 is arranged, which is colored and at the same time acts as a first decorative layer 3. Alternatively, the decorative layer 3 may also be multi-layered and, for example, have a colored layer and a replication layer. On the replication layer 4 is a

Metal layer 5 in register with the first decorative layer 3 and arranged in register with the metal layer 5 second decorative layer 7 is provided. Height differences of the replication layer 4, the metal layer 5 and the second decorative layer 7 are filled by a leveling layer 10. For the individual layers can already be the basis of the

Multi-layer body 100 described materials and application method find application. Like the multi-layer body 200, the same differs Multi-layer body 300 of the multi-layer body 100 only in that the decorative layer 3 has no separate lacquer areas 31, but is formed entirely from a colored replicate, which may contain dyes, pigments, UV-activated substances, nanoparticles or the like, or alternatively completely from a suitably colored lacquer layer and a transparent colorless replicate varnish is formed.

FIG. 3a shows a first intermediate product 300a in the production of the

Multi-layer body 300 according to a variant of the method. Analogous to

Production of the multi-layer body 100 and 200, a carrier film 1 is first provided with a functional layer 2, on the entire surface of the decorative layer 3 is applied. As already described, reliefs, for example diffractive structures, can additionally be introduced into the replication layer 4 of the decorative layer 3. The replication layer 4 is then metallized over the entire surface in the manner already described. On the metal layer 5 thus obtained, a resist 6 is now applied over the entire surface.

On the side facing away from the carrier sheet 1 of the resist 6, a mask 13 is now placed. In contrast to the method described in the production of the multilayer body 100, however, the mask 13 here is a separate part, ie it is not formed by structures of the multilayer body 300 itself. The mask includes zones 8 that are opaque to the electromagnetic radiation used to expose the photoactivatable resist 6, and zones 9 that are transparent to said radiation. Since the mask 13 is arranged on the side of the resist 6 facing away from the carrier film 1, the exposure of the resist 6 must likewise take place from this side, ie it can not take place from the side of the carrier film 1, as in the production of the multilayer body 100. All other parameters of the exposure and subsequent

Development of the resist 6, however, correspond to the method explained with reference to the production of the multilayer body 100. After the exposure of the resist 6, the mask 13 can be removed, and in the manner already described Resist 6 to be developed. Subsequently, the already on

described type, the metal layer 5 is structured by an etchant.

In the example shown, a combination of a positive resist 6 with a positive mask 13 is used. The resist 6 is therefore protected in the zone 8 by the mask and exposed only in the zone 9. In the zone 9, the resist 6 is thus removed during the development, so that the metal layer 5 is exposed in the zone 5 and is removed by the etchant in the subsequent etching step.

Of course, a negative mask can also be used in combination with a negative resist.

After the etching, the intermediate product 300b shown in FIG. 3b is obtained, in which the structured layer is present only in the zones 8, while in the zones 9 the replication layer 4 is exposed. In the zones 8, moreover, the resist 6 is still on the surface of the metal layer 5 facing away from the carrier film 1

available.

In order to obtain the intermediate product 300c shown in Fig. 3c from the intermediate product 300b, the resist 6 is removed by solvent treatment

Reference is made to the embodiments according to Figures 2c and 2d, which can also be applied to the manner already described in the production of the multilayer body 100. When the resist 6 is removed, the replication layer 4 in the zone 9 simultaneously becomes in which she is not by the

Metal layer 5 is protected, removed.

In the next step, a second decorative layer 7 is now on the

Metal layer 5 and the exposed zones 9 of the functional layer 2 applied over the entire surface, so that the intermediate product 300d shown in Fig. 3d is obtained. The second decorative layer 7 comprises at least one layer of one

photoactivatable resist, preferably two or more photoactivatable, differently colored layers, and acts simultaneously as

Leveling layer, the height differences due to the partial removal the metal layer 5 and the replication layer 4 compensates. As with the

Multi-layer body 100, the second decorative layer 7 remains partially in the finished multi-layer body and takes over there an optical function. The second

Decor layer 7 therefore comprises at least one layer which is filled with dyes,

Pigments, UV-active substances, nanoparticles or the like is colored.

In the intermediate product 300d, the zone 8 formed by the remaining decorative layer 3 and the metal layer 5 is intransparent for the electromagnetic radiation used to expose the resist of the second decorative layer 7. Analogously to the production of the multilayer body 100, an exposure of the resist of the second decorative layer 7 can now be carried out from the side of the carrier film and the resist can then be developed in the manner already described. Since the remaining decorative layer 3 acts together with the metal layer 5 as a mask, the resist is thus exposed only in the zone 9. When using a positive resist, the resist is thus removed in the zone 9 during development, so that it remains only where it rests directly on the metal layer 5. In order to arrive at the finished multi-layer body 300, the zone 9, in which the resist of the second decorative layer 7 has been removed, with a

Equalizing layer 10 provided to compensate for the height differences.

Optionally, a crosslinked, transparent sealing layer 14 can also be applied to the side of the multilayer body 300 facing away from the carrier film 1 in order to protect its surface against mechanical damage.

With this method, therefore, a structure of three register-accurate layers, namely the first decorative layer 3, the metal layer 5 and the second decorative layer 7 is obtained. Since an external mask is used only for structuring the metal layer 5, which then serves as a mask for removing the replication layer in the zone 8 or for exposing the resist of the second decorative layer 7 in the zone 8, the problems described at the outset occur the use of masks does not occur here. The remaining Zonen8 the first decorative layer 3 and the second decorative layer 7 necessarily arise

grid-precise to the metal layer 5. Fig. 4d shows a further multi-layer body 400, which is produced by a variant of the method. The process steps and intermediates 400a, 400b and 400c are shown in FIGS. 4a to 4c.

The multilayer body 400 differs from the multilayer body 100 shown in FIG. 1 a only in that the second decorative layer 7 is formed in a first partial area by a photoactivatable resist layer and in a second partial area by a partially applied etching resist layer. In the second subarea, the decorative layer 3 may have first zones 8 and / or second zones 9 as well as in the first subarea.

In the first subregion, the structure of the multilayer body 400 corresponds to the multilayer body 100 in FIGS. 1 a to 1 d, and the method steps described there are also carried out in order to produce a multilayer body 400, as shown in FIG. 4 d in the first subarea. Deviating from the multi-layer body 100, the second subarea is now provided in which, instead of the photoactivatable resist layer 6, an etching resist layer 15 is partially applied. The motif or the external shape of the etching resist layer 15 is intended to determine the motif or the external shape of the partial metallization to be achieved. The etching resist layer 15 may consist, for example, of a PVC-based lacquer and be colored by means of pigments and / or dyes or be colorless transparent or translucent.

After developing the photoactivatable resist layer, the metal layer 5 in the second zone 9 is removed by an etchant. This is possible because in the second zone 9, the metal layer 5 is not affected by the developed as an etching mask resist layer 6 in the first portion and also as

Etch mask serving etch resist layer 15 in the second portion before the attack the etchant is protected. The etchant may be, for example, an acid or alkali, for example NaOH (sodium hydroxide) or Na ₂ CO ₃ (sodium carbonate) in a concentration of 0.05% to 5%, preferably of 0.3% to 3%. In this way, the areas of the metal layer 5 shown in Figure 4b are formed.

In the next step, the remaining areas of the resist layer 6 are also removed ("stripped"), but the etch resist layer 15 is retained on the metal layer 5.

In this way, therefore, the metal layer 5 can be structured in register with the first and second zones 8 and 9 defined by the lacquer layer 31 without additional technological effort in the first partial area and in register with the etching resist layer 15 in the second partial area.

As in FIG. 1c, a second, second decorative layer 7 is applied to the zones 8 covered by the structured layer 5 and to the zones 9 of the replication layer 4 not covered by the structured layer 5 in the first partial region. The second decorative layer 7 comprises at least one second photoactivatable resist layer. Preferably, the second decorative layer 7 has two or more, in particular differently colored second resist layers. The second resist layers can also be printed in pattern form here. The etching resist layer 15 still present in the second subregion likewise forms a part of the decorative layer 7.

Alternatively, the application of the decorative layer 7 in the first portion may also be omitted, so that in the first portion of the metal layer 5 is present without coating and in the second portion with the applied etching resist layer 15. Thus, for example, a coloring of the metal layer 5 by means of colored etching resist layer 15th take place only in the second subarea and in the first subregion, the metal layer 5 is true to register the first Decorative layer before, however, is not colored on the side facing away from the first decorative layer and in the case of aluminum silver glossy reflective.

As described with reference to FIGS. 1 c and 1 d, the decorative layer 7 is exposed, developed and partially removed in the first subarea.

As shown in Fig. 1 d, is also shown in FIG. 4d

Multilayer body 400 formed from the manufacturing stage 400c of the multi-layer body 400 shown in Figure 4c by a compensation layer 10 on the arranged in the first zone 8, the second exposed decorative layer 7 as well as those arranged in the second zone 9, by removing the metal layer 5 and the first 6 and second resist layer exposed replication layer 4 is applied. The order of the leveling layer 10 is provided here over the entire surface. The

Leveling layer 10 may be designed one or more layers or even omitted. It is possible for an adhesion-promoting layer (not shown here) to be exerted on the side of the compensating layer 10 facing away from the carrier layer

(Adhesive layer) is applied, which may also be formed in a multilayered manner.

LIST OF REFERENCE NUMBERS

1 carrier film

2 functional layer

3 first decorative layer

4 replication layer

5 metal layer

6 resist layer

7 second decor layer

8 first zone

9 second zone

10 leveling layer

1 1 first page

12 second page

13 mask

14 sealing layer

15 etch resist layer

31 first varnish layer (out of 3)

32 second layer of varnish (from 3)

100 multi-layer body

200 multi-layer body

300 multi-layer body

400 multilayer bodies

Claims

claims

Method for producing a multilayer body (100, 200, 300), in particular an optical security element or an optical decorative element, wherein in the method:

a) a single or multi-layered first decorative layer (3) is applied to a carrier layer;

b) at least one metal layer (5) on the

Carrier side facing away from the first decorative layer (3) is applied; c) the at least one metal layer (5) is patterned such that the metal layer (5) in one or more first zones (8) of the

Multi-layer body (100, 200, 300) is provided in a first layer thickness and in one or more second zones (9) of the multi-layer body (100, 200, 300) is provided in a different from the first layer thickness second layer thickness, in particular the second layer thickness is zero;

d) on the first decorative layer (3) facing away from the

Metal layer (5) a single or multi-layer second decorative layer (7) is applied;

e) the first and / or second decorative layer (7) using the metal layer (5) as a mask in a first region of the multilayer body is structured such that the first (3) and second decorative layer (7) in the first (8) or second zones (9) is at least partially removed.

Method according to claim 1,

characterized,

the first (3) and the second decorative layer (7) are structured using the metal layer (5) as a mask in the first region such that the first (3) and second decorative layer (7) in each case in the first (8) or second zones (9) are at least partially removed or that the

Metal layer (5) using the first (3) or second decorative layer (7) is structured as a mask.

Method according to claim 1 or 2,

characterized,

in step c), a first resist layer (6) which can be activated by means of electromagnetic radiation is applied to the side of the metal layer (5) facing away from the first decorative layer (3), and the first resist layer (6) is formed by means of an exposure mask by means of said

is exposed to electromagnetic radiation.

Method according to claim 3,

characterized,

that the second decorative layer (7) one or more second means

Electromagnetic radiation activatable, colored resist layers comprises and that in step e) the one or more second, colored resist layers is exposed by means of said electromagnetic radiation from the side of the carrier layer ago, wherein the metal layer (5) serves as an exposure mask.

Method according to claim 4,

characterized,

that the one or more second, colored resist layers at least two different colorants or colorants of different

Include concentration-containing resist layers.

6. The method according to claim 4 or 5,

characterized,

that one or more of the one or more second, colored

Resist layers are applied pattern-wise by means of a printing process, and in particular form a first motif.

7. The method according to any one of claims 3 to 6,

characterized,

in that the first resist layer (6) is exposed in step c) from the side of the carrier layer, wherein the mask for exposing the first resist layer (6) is formed by the first decorative layer (3), wherein the first decorative layer (3) is perpendicular to the plane the carrier layer has a first transmittance in the first region in the one or more first zones (8) and a second transmittance in the one or more second zones (9) which is greater than the first transmittance, wherein said transmittances are at one electromagnetic

Obtain radiation with a wavelength suitable for photoactivation of the first resist layer (6).

8. The method according to claim 7,

characterized,

in that the first decorative layer (3) comprises one or more in particular colored first lacquer layers which either in the first region in the one or more first zones (8) with a first layer thickness and in the one or more second zones (9) either not or with a second layer thickness smaller than the first layer thickness, so that the first decorative layer (3) in particular in the first region in the one or more first zones (8) the said first transmittance and in one or more second zones (9) said second one

Transmittance has.

9. The method according to claim 8,

characterized,

that the one or more first lacquer layers by means of a

Printing method pattern-applied.

10. The method according to any one of claims 8 or 9,

characterized,

the one or more first paint layers each comprise a UV absorber and / or a colorant.

1 1. Method according to one of claims 7 to 10,

characterized,

the layer thickness and the material of the first decorative layer (3) are selected such that the first transmittance is greater than zero and / or the thickness and the material of the first decorative layer (3) are chosen such that the ratio between the second transmittance and the first transmittance is greater than two.

12. The method according to any one of claims 3 to 1 1,

characterized,

in that a partial area of the metal layer (5) in which no first resist layer (6) is provided is partially colored in particular

Ätzresistschicht is applied.

13. The method according to any one of claims 1 to 12,

characterized,

that the thickness and the material of the first decorative layer (3) is selected such that the electromagnetic radiation, measured after a passage through a layer package consisting of the carrier layer and the first Decor layer (3), in the first region in the one or more first zones (8) a transmittance of about about 0% to 30%, preferably from about 1% to 15% and in the one or more second zones ( 9) one

Transmittance of about 60% to 100%, preferably from about 70% to 90%.

14. The method according to any one of claims 3 to 6,

characterized,

in that the first resist layer (6) is exposed in step c) from the side facing away from the carrier layer, wherein for exposing the first resist layer (6) a mask (13) is inserted between the first resist layer (6) and a light source used for exposure is arranged, wherein the mask seen perpendicular to the plane of the carrier layer in the first region in the one or more first zones (8) has a first

Transmittance and in the one or more second zones (9) a larger compared to the first transmittance second

Transmittance, wherein said transmittances refer to an electromagnetic radiation having a suitable for a photoactivation of the first resist layer (6) wavelength.

15. The method according to any one of claims 3 to 14,

characterized,

in that for the formation of the first (6) and / or second resist layer a positive photoresist whose solubility upon activation by

Or a negative photoresist whose solubility decreases upon activation by exposure is used, and

the first and / or second resist layer is removed using a positive photoresist in the first region in the one or more second zones (9) or when using a negative photoresist in the first region in the one or more first zones (8), is preferably removed by a solvent.

16. The method according to any one of claims 3 to 15,

characterized,

in that UV radiation is used for the exposure of the first and / or second resist layer, preferably with a radiation maximum in the region of 365 nm.

17. The method according to claim 1 or 2,

characterized,

that step c) is carried out after step d) and in step c) the

Metal layer (5) using the second decorative layer (7) as a mask, in particular by applying an etchant and removing the not protected by the mask areas of the metal layer (5), structured and that in step e), the first decorative layer (3) below Use of

Metal layer (5) as a mask, in particular by applying a

Solvent and removing the mask not protected

Regions of the first decorative layer (3), is structured.

18. The method according to claim 17,

characterized,

the second decorative layer (7) is applied in pattern form by printing, wherein the second decorative layer (7) is provided in the first zones (8) with a third layer thickness and in the second zones (9) with a fourth layer thickness different from the third layer thickness is provided, in particular, the fourth layer thickness is equal to zero.

19. The method according to claim 17 or 18,

characterized,

in that the second decorative layer (7) is opposite to an etchant used for structuring the metal layer (5) and opposite to a

Structuring the first decorative layer (3) used solvent resistant.

20. The method according to any one of claims 17 to 19,

characterized,

the second decorative layer (7) comprises one or more colored layers, which are applied in particular by a printing process.

21. Method according to one of the preceding claims,

characterized,

the first resist layer (6) and / or areas of the first decorative layer (3) not protected by the metal layer (5) are removed by a solvent.

22. The method according to any one of the preceding claims,

characterized,

in that in step c) the zones (8) of the metal layer (5) not protected by the first resist layer (6) and / or the second decorative layer (7) are removed by an etchant.

23. The method according to any one of the preceding claims,

characterized,

the carrier layer comprises at least one functional layer (2), in particular a release layer and / or a protective lacquer layer, on the side facing the first decorative layer (3).

24. The method according to any one of the preceding claims,

characterized,

the first (3) and / or second decorative layer (7) comprises a replication lacquer layer into which a surface relief is molded, and / or a surface relief is molded into the surface of the carrier layer facing the first decorative layer (3).

25. The method according to claim 24,

characterized, the surface relief comprises a diffractive structure, in particular a hologram, a Kinegram®, a linear grating or a cross grating, a zero-order diffraction structure or a blazed grating, comprising a refractive structure, in particular a microlens field or a retroreflective structure, an optical lens or comprises a free-form surface structure, and / or comprises a matt structure, in particular comprises an isotropic or anisotropic matt structure.

Method according to one of the preceding claims,

characterized,

that after the structuring of the metal layer (5), the first decorative layer (3) and / or the second decorative layer (7), a compensating layer (10) is applied, which faces away from the carrier layer in particular

Surface regions of the first decorative layer (3), the second decorative layer (7) and / or the carrier layer rests.

Method according to one of the preceding claims,

characterized,

in that a protective lacquer is applied to the multilayer body (100, 200, 300, 400) on the side of the multilayer body (100, 200, 300, 400) facing away from the carrier layer.

Method according to one of the preceding claims,

characterized,

the first (3) and / or second decorative layer (7) is bleached by exposure.

Multi-layer body (100, 200, 300, 400), in particular produced by a method according to one of the preceding claims, with a single or multi-layered first decorative layer (3), a single or multi-layered second decorative layer (7) and at least one, between the first (3) and second decorative layer (7) arranged metal layer (5), wherein the Metal layer (5) is structured such that the at least one

Metal layer (5) in a first region of the multilayer body (100, 200, 300) in one or more first zones (8) of the multilayer body (100, 200, 300) is provided in a first layer thickness and in one or more second zones (9 ) of the multilayer body (100, 200, 300) is provided in a different from the first layer thickness second layer thickness, in particular the second layer thickness is equal to zero, and wherein the first and second decorative layer (7) congruent to one another and to the metal layer (5) structured are, in particular so that the first (3) and second decorative layer (7) in the first region in the first (8) or second zones (9) congruent to each other and the metal layer (5) are at least partially removed.

30. multilayer body (100, 200, 300, 400) according to claim 29,

characterized,

in that the multi-layer body (100, 200, 300) comprises an in particular full-surface carrier layer.

31. Multilayer body (100, 200, 300, 400) according to claim 29 or 30,

characterized,

the first decorative layer (3), viewed perpendicular to the plane of the carrier layer, has a first one in the first region in the first zones (8)

Transmittance and in the second zones (9) has a larger compared to the first transmittance second transmittance, wherein said transmittances refer to an electromagnetic radiation in the visual and / or ultraviolet and / or infrared spectrum.

32. Multilayer body (100, 200, 300, 400) according to claim 31,

characterized,

that the second decorative layer (7) in the first zone (8) or the second zone (9) at least one by means of said electromagnetic radiation Photoactivated resist layer, wherein the at least one

Metal layer (5) and the resist layer precisely aligned with each other so on the first side (1 1) of the carrier layer are arranged, that the resist layer on the side facing away from the carrier layer side of the at least one metal layer (5) and the first decorative layer (3) on the another side of the at least one metal layer (5) is arranged.

33. Multilayer body (100, 200, 300, 400) according to one of claims 29 to 32,

characterized,

the first (3) and / or second decorative layer (7) comprises one or more layers colored with at least one opaque and / or at least one transparent colorant, at least in one

Wavelength range of the electromagnetic spectrum is colored or color-producing, in particular colorfully colorful or color-producing, in particular that a colorant in one or more of the layers of the first (3) and / or second decorative layer (7) is contained, which can be excited outside the visible spectrum and creates a visually recognizable colored impression.

34. Multilayer body (100, 200, 300, 400) according to one of claims 29 to 33,

characterized,

the first (3) and / or second decorative layer (3) comprises one or more layers dyed with at least one colorant of the color yellow, magenta, cyan or black (CMYK) or the color red, green or blue (RGB) , and / or is provided with at least one red and / or green and / or blue fluorescent radiation-stimulable pigment or dye and thereby produces an additive color upon irradiation.

35. multilayer body (100, 200, 300, 400) according to one of claims 29 to 34, characterized,

in that the first (3) and / or second decorative layer (7) comprises a replicate varnish layer into which at least one relief structure comprises

Surface relief is molded and the at least one metal layer (5) is arranged on the surface of the at least one relief structure.

36. Multilayer body (100, 200, 300, 400) according to claim 35,

characterized,

the at least one relief structure is arranged at least partially in the first zones (8) and / or in the second zones (9), in particular being arranged congruently to the first (8) or second zones (9).

37. Multilayer body (100, 200, 300, 400) according to one of claims 29 to 36,

characterized,

in that first (3) and / or second decorative layer (7) comprises one or more of the following layers: liquid-crystal layer, polymer layer,

Thin film layer, pigment layer.

38. Multilayer body (100, 200, 300, 400) according to one of claims 29 to 37,

characterized,

the first (3) and / or second decorative layer (7) has a thickness in the range from 0.5 to 5 μm.

39. Multilayer body (100, 200, 300, 400) according to one of claims 29 to 38,

characterized,

that one or more layers of the first (3) and / or second

Decorative layer (7) inorganic absorber with high Streuanteilteil, in particular nano-scaled UV absorber based on inorganic oxides having.

40. Multilayer body (100, 200, 300, 400) according to one of claims 24 to 39,

characterized,

in that the metal layer (5) has a thickness in the range from 20 to 70 nm.

41. Multilayer body (100, 200, 300, 400) according to one of Claims 29 to 40,

characterized,

in that recesses of the first (3) and / or the second decorative layer (7) and / or of the at least one metal layer (5) are filled with a leveling layer (10).

42. Multilayer body (100, 200, 300, 400) according to claim 41,

characterized,

that the refractive index of the compensating layer (10) in the visible

Wavelength range in the range of 90% to 1 10% of the refractive index of the replicating lacquer layer (4).

43. Multilayer body (100, 200, 300, 400) according to claim 41 or 42,

characterized,

the compensation layer (10) is formed as an adhesion layer.

44. Security element for security or value documents, in particular in the form of a transfer film or laminating film, which has a

Multilayer body (100, 200, 300, 400) according to one of Claims 29 to 43 or produced according to one of Claims 1 to 28.

45. Secure document, in particular a passport, a passport, a bank card, an identity card, a banknote, a security, a ticket or a security packaging, with a security element according to claim 44.