EP2955726A1 - Supraconducteur décollable, procédé de fabrication de supraconducteur décollable, et procédé de réparation pour fil supraconducteur - Google Patents

Supraconducteur décollable, procédé de fabrication de supraconducteur décollable, et procédé de réparation pour fil supraconducteur Download PDF

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Publication number
EP2955726A1
EP2955726A1 EP14765069.1A EP14765069A EP2955726A1 EP 2955726 A1 EP2955726 A1 EP 2955726A1 EP 14765069 A EP14765069 A EP 14765069A EP 2955726 A1 EP2955726 A1 EP 2955726A1
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EP
European Patent Office
Prior art keywords
carrier body
peelable
superconductive conductor
substrate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP14765069.1A
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German (de)
English (en)
Other versions
EP2955726A4 (fr
Inventor
Yuko OKUNO
Yoshikazu Okuno
Yoshinori Nagasu
Masaru Higuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Publication of EP2955726A1 publication Critical patent/EP2955726A1/fr
Publication of EP2955726A4 publication Critical patent/EP2955726A4/fr
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
    • H01B12/02—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
    • H01B12/06—Films or wires on bases or cores
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0036—Details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/20—Permanent superconducting devices
    • H10N60/203—Permanent superconducting devices comprising high-Tc ceramic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details

Definitions

  • the present invention relates to a peelable superconductive conductor, a peelable superconductive conductor production method, and a repair method for superconducting wire using a peelable superconductive conductor. Specifically, the present invention relates to a peelable superconductive conductor for repair, a peelable superconductive conductor production method, and a repair method for superconducting wire using a peelable superconductive conductor.
  • a tape shaped superconducting wire for repair is soldered to a surface of a stabilizing layer corresponding to the defect portion, and a channel for electric current is formed making a detour of the defect portion of the superconducting layer of the superconducting wire (for example, see patent document 1).
  • Patent Document 1 Japanese Patent Application Laid-Open Publication No. 2009-187743
  • the thickness of the substrate is thinner than the substrate of the superconducting wire which is to be repaired, and the thickness of the substrate is thin, specifically, 30 ⁇ m to 50 ⁇ m. Therefore, there are problems such as the superconducting wire for repair needs to be handled with care, and forming a superconducting layer on a thin substrate is very difficult from the viewpoint of handling in production.
  • the present invention was made in view of the above problems, and the object of the present invention is to provide a peelable superconductive conductor which is attached to a carrier body, which includes a thin substrate, and in which handling is made easy.
  • a peelable superconductive conductor including:
  • an extremely thin superconductive conductor is made for repair and connecting the superconducting wire, and the peelable superconductive conductor is adjusted and attached so that the superconductive conductor can be peeled from the carrier body.
  • the carrier body can be peeled from the peelable superconductive conductor before connecting to the superconducting wire to be repaired or the peelable superconductive conductor can be attached to the portion to be repaired and then the carrier body can be peeled from the peelable superconductive conductor.
  • the repair can be performed without applying damage to the repairing superconductive conductor.
  • the configuration other than the substrate for example, intermediate layer, superconducting layer, protecting layer, etc.
  • the superconducting characteristics specifically, Ic value [critical current value]
  • the configuration is the same as the superconducting wire to be repaired or connected.
  • a production method of a peelable superconductive conductor including:
  • the producing method of the peelable superconductive conductor is a method of attaching the carrier body in film forming.
  • the obtained superconductive conductor and carrier body can be used as is for repair, and the carrier body is peeled in repair.
  • the carrier body is able to resist high temperature in forming the super conducting film and has good thermal conductivity. Therefore, material the same as the thin film substrate for film forming is preferable, but alloy which is cheaper in cost can also be used.
  • a production method of a peelable superconductive conductor including:
  • the producing method of the peelable superconductive conductor is a method in which the handling carrier body attached in film forming is peeled and a different carrier body for repair is attached.
  • the handling carrier body is also able to resist high temperature in forming the super conducting film and has good thermal conductivity. Therefore, material the same as the thin film substrate for film forming is preferable, but alloy which is cheaper in cost can also be used.
  • the repairing carrier body does not receive thermal history, and therefore can be metallic or plastic.
  • a repair method for a superconducting wire including:
  • the thin superconductive conductor can be easily attached to the location of Ic deterioration, and it is possible to form a channel for electric current to detour the Ic deteriorated portion.
  • the peelable superconductive conductor of the first embodiment of the present invention is obtained by the following, in film forming, a superconducting layer is formed with a "handling carrier body" attached to a film forming substrate, and then the "handling carrier body” is peeled and attached to a "repair carrier body”. Three methods are described below.
  • the film forming substrate is partially joined to the handling carrier body, an intermediate layer, a superconducting layer, and a protecting layer are formed on the film forming substrate, the joint is removed (cut), and the handling carrier body is peeled and attached to the repair carrier body to produce a repairing superconductive conductor.
  • a tape shaped extremely thin substrate (thickness with 3 to 50 ⁇ m) formed from a Ni based or Fe based alloy such as hastelloy, stainless steel, etc. is prepared as a film forming substrate 20.
  • a handling carrier body 10 including a metal such as brass with a thickness so that the total thickness of the film forming substrate 20 and the handling carrier body 10 becomes 70 to 120 ⁇ m is placed on the film forming substrate 20.
  • the handling carrier body 10 is joined with the film forming substrate 20 at both edges in the width direction and/or successively or non-successively in the longitudinal direction in one or more spots in the width direction.
  • the substrate used for the repairing (connecting) superconductive conductor is 50 ⁇ m or smaller to suppress the thickness of the repaired (connected) location.
  • FIG. 2A shows an example in which there are joints in both edges
  • FIG. 2C shows an example in which there is a joint in the center portion.
  • Surface polishing is performed by mechanical polishing or electric field polishing on the face of the film forming substrate 20 opposite of the face on which the handling carrier body 10 is attached.
  • an arithmetic average roughness Ra of the surface of the film forming substrate 20 on which surface polishing is performed is 5 nm or less, and more suitably 2 nm or less.
  • a bed layer with a thickness of 100 nm formed from Gd 2 Zr 2 O 7 is formed using a sputtering apparatus on the film forming substrate 20 with the surface polished.
  • An alignment layer (IBAD-MgO layer) including MgO is formed by an IBAD method on the bed layer at room temperature to be 10 to 200 angstrom.
  • a LMO layer which is an oxide layer including crystalline material represented with a composition formula of LaMnO 3+ ⁇ ( ⁇ is oxygen non-stoichiometric amount) is formed on the alignment layer by a RF sputtering method to be 4 to 100 nm.
  • the LMO layer is an oxide layer including a crystalline material represented by a composition formula La z (Mn 1-x M x ) w O 3 + ⁇ (M is at least one selected from Cr, Al, Co and Ti, ⁇ is oxygen non-stoichiometric amount, and 0 ⁇ z/W ⁇ 2, 0 ⁇ x ⁇ 1) from the viewpoint of being able to make the phase transition temperature at which the crystal lattice of LMO becomes cubic crystal low.
  • the value of ⁇ is not limited, and is for example, -1 ⁇ ⁇ ⁇ 1.
  • a cap layer including CeO 2 is formed on the oxide layer by sputtering method at 650°C to be 200 nm, and this is to be an intermediate layer 31 of 3 layers.
  • the LMO layer formed between the alignment layer and the cap layer includes the function of enhancing the lattice match of the cap layer.
  • a superconducting layer 32 including a RE type superconductive conductor (RE is a single rare earth element or a plurality of rare earth elements such as Y, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb, Lu, etc., ⁇ is oxygen non-stoichiometric amount, for example, 0 or more and 1 or less) represented by a composition formula of YBCO, etc. being REBa 2 Cu 3 O 7 - ⁇ on the cap layer by MOCVD method at 845°C with a thickness of 1 ⁇ m.
  • An Ag or Ag alloy layer is formed on the superconducting layer using a sputtering method as a protecting layer (stabilizing layer) 33 with a thickness of 20 ⁇ m. With this, a superconductive conductor 1 is formed.
  • YAIO 3 yttrium aluminate
  • YSZ yttria stabilized zirconia
  • Y 2 O 3 Gd 2 O, Al 2 O 3 , B 2 O 3 , Sc 2 O 3 , Cr 2 O 3 , REZrO, CeO 2 , PrO 2 , RE 2 O 3 , etc.
  • RE represents a single rare earth element or a plurality of rare earth elements.
  • a film forming layer 30 includes the intermediate layer 31, the superconducting layer 32, and a protecting layer (stabilizing layer) 33.
  • the joint between the substrate 20 and the handling carrier body 10 is cut in the longitudinal direction (scissors or a cutting tool can be used, but when the length is long, a slitter or laser is used for cutting) and the handling carrier body 10 is removed from the obtained superconductive conductor 1 to obtain the extremely thin superconductive conductor.
  • the extremely thin superconductive conductor is attached to a repairing carrier body (metal plate or resin plate, for example, stainless steel plate, polypropylene plate, polypropylene terephthalate (PPT) resin plate) using double-sided tape with a very weak adhesion (for example, double-sided tape using recycled paper such as the product "Nicetack (registered trademark) Rimka (registered trademark)" as an adhesive layer.
  • a repairing carrier body metal plate or resin plate, for example, stainless steel plate, polypropylene plate, polypropylene terephthalate (PPT) resin plate
  • double-sided tape with a very weak adhesion for example, double-sided tape using recycled paper such as the product "Nicetack (registered trademark) Rimka (registered trademark)" as an adhesive layer.
  • the repairing carrier body which has heat resistance against heat generated in connection by soldering should be selected.
  • the metal plate stainless steel plate
  • PPT resin plate is used in the repairing carrier body.
  • One face of the repairing carrier body can be a tape shaped sheet (for example, masking tape, curing tape, etc.) which has an adhesive face, and in this case the above-described adhesive layer is not necessary.
  • the adhesion of the double-sided tape or the tape shaped sheet with one face being an adhesive face in relation to the film forming substrate 20 is within the range of 0.5 to 5 N.
  • the film forming substrate 20 and the handling carrier body 10 can be joined by laser welding, spot welding, joining with adhesive for metal with high temperature resistance (for example, pyroduct (927°C), Durabond 952 (1090°C), etc.), joining by brazing material (for example, Cu-ABA (1000°C or more), CUSIL-ABA (850°C), etc.), diffusion joining (heating and compressing joining material in a vacuum state or under argon atmosphere, and joining using diffusion of atoms).
  • adhesive for metal with high temperature resistance for example, pyroduct (927°C), Durabond 952 (1090°C), etc.
  • brazing material for example, Cu-ABA (1000°C or more), CUSIL-ABA (850°C), etc.
  • diffusion joining heatating and compressing joining material in a vacuum state or under argon atmosphere, and joining using diffusion of atoms).
  • the handling carrier body resists high temperature generated when the superconducting film is formed and has high thermal conductivity. Therefore, preferably, the material the same as the extremely thin substrate for film forming is used.
  • the film forming substrate is joined to the handling carrier body by pressure welding, the intermediate layer, the superconducting layer, and the protecting layer are formed on the film forming substrate, the handling carrier body is melted and removed by dipping in acid, and the result is attached to the repairing carrier body to produce the repairing superconductive conductor.
  • a tape shaped extremely thin substrate formed from a Ni based or Fe based alloy such as hastelloy, stainless steel, etc. is prepared as a film forming substrate 20.
  • a handling carrier body 10 including a metal such as brass is placed on one face of the film forming substrate 20.
  • warm or cold rolling is performed with a rolling mill so that the total thickness becomes 70 to 120 ⁇ m.
  • thermal processing at a temperature of about 650°C is performed. With this, a substrate in which two metals are completely joined is formed.
  • a peeling material can be placed between the film forming substrate 20 and handling carrier body 10 and rolled to prevent joining of the metals.
  • FIG. 3A a tape shaped extremely thin substrate formed from a Ni based or Fe based alloy such as hastelloy, stainless steel, etc.
  • the intermediate layer 31, the superconducting layer 32, and the protecting layer 33 are similarly formed on the film forming substrate 20 to produce the superconductive conductor 1.
  • the obtained superconductive conductor 1 is dipped in a solution of acid such as sulfuric acid, etc. which melts only the handling carrier body 10, and melts and removes the handling carrier body 10 to obtain the extremely thin superconductive conductor.
  • the extremely thin superconductive conductor is attached to a repairing carrier body (metal plate or resin plate, for example, stainless steel plate, polypropylene plate, polypropylene terephthalate (PPT) resin plate) using double-sided tape with a very weak adhesion (for example, double-sided tape using recycled paper such as the product "Nicetack (registered trademark) Rimka (registered trademark)" as an adhesive layer.
  • a repairing carrier body metal plate or resin plate, for example, stainless steel plate, polypropylene plate, polypropylene terephthalate (PPT) resin plate
  • double-sided tape with a very weak adhesion for example, double-sided tape using recycled paper such as the product "Nicetack (registered trademark) Rimka (registered trademark)" as an adhesive layer.
  • the repairing carrier body which has heat resistance against heat generated in connection by soldering should be selected.
  • the metal plate stainless steel plate
  • PPT resin plate is used in the repairing carrier body.
  • One face of the repairing carrier body can be a tape shaped sheet (for example, masking tape, curing tape, etc.) which has an adhesive face, and in this case the above-described adhesive layer is not necessary.
  • the adhesion of the double-sided tape or the tape shaped sheet with one face being an adhesive face in relation to the film forming substrate 20 is within the range of 0.5 to 5 N.
  • a tape shaped extremely thin film forming substrate formed from a Ni based or Fe based alloy such as hastelloy, stainless steel, etc. is prepared as a film forming substrate 20.
  • a handling carrier body 10 slightly larger than the extremely thin film forming substrate and including a metal such as brass is placed on the extremely thin film forming substrate.
  • a punch for swaging is used to form a substrate partially swaging two metals.
  • the intermediate layer 31, the superconducting layer 32, and the protecting layer 33 are formed on the film forming substrate 20 with a method similar to the above-described method. With this, the superconductive conductor 1 is produced.
  • the swaging portion of the handling carrier body of the obtained superconductive conductor is mechanically extended to remove the handling carrier body. With this the extremely thin superconductive conductor is obtained.
  • the extremely thin superconductive conductor is attached to a repairing carrier body (metal plate or resin plate, for example, stainless steel plate, polypropylene plate, polypropylene terephthalate (PPT) resin plate) using double-sided tape with a very weak adhesion (for example, double-sided tape using recycled paper such as the product "Nicetack (registered trademark) Rimka (registered trademark)" as an adhesive layer.
  • a repairing carrier body metal plate or resin plate, for example, stainless steel plate, polypropylene plate, polypropylene terephthalate (PPT) resin plate
  • double-sided tape with a very weak adhesion for example, double-sided tape using recycled paper such as the product "Nicetack (registered trademark) Rimka (registered trademark)" as an adhesive layer.
  • the repairing carrier body which has heat resistance against heat generated in connection by soldering should be selected.
  • the metal plate stainless steel plate
  • PPT resin plate is used in the repairing carrier body.
  • One face of the repairing carrier body can be a tape shaped sheet (for example, masking tape, curing tape, etc.) which has an adhesive face, and in this case the above-described adhesive layer is not necessary.
  • the adhesion of the double-sided tape or the tape shaped sheet with one face being an adhesive face in relation to the film forming substrate 20 is within the range of 0.5 to 5 N.
  • the peelable superconductive conductor of the second embodiment of the present invention is obtained by the following, in film forming, an intermediate layer, a superconducting layer, and a protecting layer are formed with a handling carrier body attached to a film forming substrate, and then the handling carrier body is used as is as the repairing carrier body. Two methods are described below.
  • the film forming substrate and the handling carrier body are joined by pressure welding, the intermediate layer, the superconducting layer, and the protecting layer are formed on the film forming substrate, and this is to be the repairing superconductive conductor as is.
  • the handling carrier body becomes the repairing carrier body as is.
  • a tape shaped extremely thin substrate formed from a Ni based alloy such as hastelloy, etc. is prepared as a film forming substrate 20.
  • a handling carrier body 10 made from, for example, brass is placed on one face of the film forming substrate 20.
  • warm or cold rolling is performed with a rolling mill so that the total thickness becomes 70 to 120 ⁇ m.
  • thermal processing at a temperature of about 650°C is performed. With this, a substrate in which two metals are completely joined is formed.
  • the intermediate layer 31, the superconducting layer 32, and the protecting layer 33 are formed on the substrate with a method similar to the first embodiment to produce the superconductive conductor 1. This is to be the peelable superconductive conductor for repair.
  • the peeling layer can be placed between the film forming substrate and the handling carrier body.
  • material with a high melting point and having heat resistance can be used such as simple metal, alloy, oxide and hydroxide of the following, Ta (melting point 2996°C), Nb (melting point 2500°C), Zr (melting point 2127°C), Ni (melting point 1455°C), Cr (melting point 1900°C), Ti (melting point 1727°C), Fe (melting point 1539°C), Si (melting point 1410°C), Mo (melting point 2622°C), Co (melting point 1478°C), V (melting point 1697°C), W (melting point 3382°C).
  • the substance of the peeling layer can be attached to the handling carrier body by plating method, and the film forming substrate can be formed by the plating method.
  • Inclusion such as carbon can be placed in between in rolling in the method of entirely joining the film forming substrate with the handling carrier body to intentionally enable peeling to become easier.
  • the peelable superconductive conductor obtained in the first embodiment and the second embodiment is used to repair an Ic deteriorated portion of the superconducting wire including the Ic deteriorated portion
  • the repairing carrier body can be easily peeled and removed from the peelable superconductive conductor, and the superconductive conductor including the thin film forming substrate, etc. can be joined to the Ic deteriorated portion by soldering, etc., and a bypass for electric current can be formed.
  • the repaired portion of the superconducting wire is repaired as described above, the increase of thickness can be suppressed to a minimum, and thickness does not become a problem when processed to a coil, etc.
  • Ic measurement of the superconducting wire including a certain length is performed (for example, TAPESTAR (registered trademark) of THEVA can be used), and when there is an Ic deteriorated portion, the deteriorated portion is specified, and the superconductive conductor is attached to the deteriorated portion using soldering.
  • the peelable superconductive conductor is placed and attached on the Ic deteriorated portion so as to overlap on the surrounding area of the deteriorated portion.
  • the superconducting layer of the superconductive conductor and the superconducting layer of the peelable superconductive conductor are positioned facing each other.
  • the peelable superconductive conductor can be used as the connecting superconductive conductor.
  • superconducting wires 50 and 50 are placed against each other and a peelable superconductive conductor 100 is placed crossing across the superconducting wires 50 and 50.
  • the repairing carrier body is held without peeling as reinforcing the handling of the superconducting wire.
  • the carrier body can be peeled.
  • a material with high strength such as hastelloy, stainless steel, etc. is used as the reinforcing carrier body.
  • the present invention is a peelable superconductive conductor, a peelable superconductive conductor production method, and a repair method for superconducting wire, and can be used in a superconductive conductor for repair.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
EP14765069.1A 2013-03-13 2014-02-05 Supraconducteur décollable, procédé de fabrication de supraconducteur décollable, et procédé de réparation pour fil supraconducteur Pending EP2955726A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013050192A JP6108888B2 (ja) 2013-03-13 2013-03-13 ピーラブル超電導導体、ピーラブル超電導導体の製造方法及び超電導線の補修方法
PCT/JP2014/052635 WO2014141776A1 (fr) 2013-03-13 2014-02-05 Supraconducteur décollable, procédé de fabrication de supraconducteur décollable, et procédé de réparation pour fil supraconducteur

Publications (2)

Publication Number Publication Date
EP2955726A1 true EP2955726A1 (fr) 2015-12-16
EP2955726A4 EP2955726A4 (fr) 2016-05-11

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EP14765069.1A Pending EP2955726A4 (fr) 2013-03-13 2014-02-05 Supraconducteur décollable, procédé de fabrication de supraconducteur décollable, et procédé de réparation pour fil supraconducteur

Country Status (6)

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US (1) US9508469B2 (fr)
EP (1) EP2955726A4 (fr)
JP (1) JP6108888B2 (fr)
KR (1) KR101806651B1 (fr)
CN (1) CN105164763B (fr)
WO (1) WO2014141776A1 (fr)

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KR102397467B1 (ko) * 2015-09-18 2022-05-13 한국전기연구원 고온 초전도 선재의 결함 보수 방법 및 고온 초전도 선재의 제조 방법
WO2021100969A1 (fr) * 2019-11-20 2021-05-27 주식회사 서남 Procédé d'exfoliation de couche supraconductrice et appareil d'exfoliation associé
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US20160027556A1 (en) 2016-01-28
CN105164763B (zh) 2017-04-26
EP2955726A4 (fr) 2016-05-11
JP6108888B2 (ja) 2017-04-05
CN105164763A (zh) 2015-12-16
KR20150132133A (ko) 2015-11-25
KR101806651B1 (ko) 2017-12-07
US9508469B2 (en) 2016-11-29
JP2014175293A (ja) 2014-09-22
WO2014141776A1 (fr) 2014-09-18

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