EP2790783A4 - STEERING SYSTEM FOR A DREAM GENERATOR - Google Patents

STEERING SYSTEM FOR A DREAM GENERATOR

Info

Publication number
EP2790783A4
EP2790783A4 EP12858121.2A EP12858121A EP2790783A4 EP 2790783 A4 EP2790783 A4 EP 2790783A4 EP 12858121 A EP12858121 A EP 12858121A EP 2790783 A4 EP2790783 A4 EP 2790783A4
Authority
EP
European Patent Office
Prior art keywords
dropper
orientation system
generator orientation
generator
orientation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP12858121.2A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2790783A1 (en
Inventor
Peter M Baumgart
J Martin Algots
Abhiram Govindaraju
Chirag Rajyaguru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of EP2790783A1 publication Critical patent/EP2790783A1/en
Publication of EP2790783A4 publication Critical patent/EP2790783A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C11/00—Pivots; Pivotal connections
    • F16C11/04—Pivotal connections
    • F16C11/12—Pivotal connections incorporating flexible connections, e.g. leaf springs
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T403/00—Joints and connections
    • Y10T403/54—Flexible member is joint component

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP12858121.2A 2011-12-16 2012-11-20 STEERING SYSTEM FOR A DREAM GENERATOR Withdrawn EP2790783A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/328,628 US9279445B2 (en) 2011-12-16 2011-12-16 Droplet generator steering system
PCT/US2012/066121 WO2013089991A1 (en) 2011-12-16 2012-11-20 Droplet generator steering system

Publications (2)

Publication Number Publication Date
EP2790783A1 EP2790783A1 (en) 2014-10-22
EP2790783A4 true EP2790783A4 (en) 2015-08-26

Family

ID=48609180

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12858121.2A Withdrawn EP2790783A4 (en) 2011-12-16 2012-11-20 STEERING SYSTEM FOR A DREAM GENERATOR

Country Status (6)

Country Link
US (2) US9279445B2 (enrdf_load_stackoverflow)
EP (1) EP2790783A4 (enrdf_load_stackoverflow)
JP (1) JP6101704B2 (enrdf_load_stackoverflow)
KR (1) KR102036205B1 (enrdf_load_stackoverflow)
TW (1) TWI583260B (enrdf_load_stackoverflow)
WO (1) WO2013089991A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9279445B2 (en) * 2011-12-16 2016-03-08 Asml Netherlands B.V. Droplet generator steering system
WO2013117355A1 (en) * 2012-02-08 2013-08-15 Asml Netherlands B.V. Radiation source and lithograpic apparatus
JP5946649B2 (ja) * 2012-02-14 2016-07-06 ギガフォトン株式会社 ターゲット供給装置
TWI569086B (zh) * 2014-09-16 2017-02-01 Ｉｐｇ光電公司 用於照明投影機系統之紅綠藍雷射光源
US9544983B2 (en) * 2014-11-05 2017-01-10 Asml Netherlands B.V. Apparatus for and method of supplying target material
US10338475B2 (en) * 2017-11-20 2019-07-02 Taiwan Semiconductor Manufacturing Co., Ltd. Light source for lithography exposure process
FR3155039A1 (fr) * 2023-11-02 2025-05-09 Safran Electronics & Defense Dispositif de liaison mecanique a double cardan

Citations (5)

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Publication number Priority date Publication date Assignee Title
US5986827A (en) * 1998-06-17 1999-11-16 The Regents Of The University Of California Precision tip-tilt-piston actuator that provides exact constraint
US6170367B1 (en) * 1998-09-09 2001-01-09 John R. Keller Single-point flexure toric contact lens forming machine and method
US20040189969A1 (en) * 2003-03-14 2004-09-30 Makoto Mizuno Drive mechanism, exposure device, optical equipment, and device manufacturing method
US20050205810A1 (en) * 2004-03-17 2005-09-22 Akins Robert P High repetition rate laser produced plasma EUV light source
US20100294958A1 (en) * 2009-05-21 2010-11-25 Hideyuki Hayashi Apparatus and method for measuring and controlling target trajectory in chamber apparatus

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US2880950A (en) * 1956-04-09 1959-04-07 Betty R Williams Nursing bottle holder
US4535405A (en) 1982-09-29 1985-08-13 Microbot, Inc. Control and force-sensing method and apparatus for motors
GB9107207D0 (en) * 1991-04-05 1991-05-22 Tycho Technology Ltd Mechanical manipulator
US5169112A (en) * 1991-08-26 1992-12-08 Milsco Manufacturing Company Electronic suspension vehicle seat
DE59603026D1 (de) * 1995-12-20 1999-10-14 Wiegand Alexander Konrad Vorrichtung zur räumlichen gesteuerten bewegung eines körpers in drei bis sechs freiheitsgraden
US6022005A (en) * 1996-09-27 2000-02-08 Trw Inc. Semi-active vibration isolator and fine positioning mount
US6113188A (en) * 1997-12-24 2000-09-05 Stewart; Robert V. Portable seating assist device
US6194733B1 (en) * 1998-04-03 2001-02-27 Advanced Energy Systems, Inc. Method and apparatus for adjustably supporting a light source for use in photolithography
US6240799B1 (en) * 1998-05-26 2001-06-05 Hexel Corporation Triangular gimbal
US7346093B2 (en) * 2000-11-17 2008-03-18 Cymer, Inc. DUV light source optical element improvements
DE10063628B4 (de) * 2000-12-20 2006-02-16 Reichenbacher Hamuel Gmbh Anordnung zur translatorischen Positionierung einer Plattform
US6976639B2 (en) 2001-10-29 2005-12-20 Edc Biosystems, Inc. Apparatus and method for droplet steering
US6598837B1 (en) * 2001-12-06 2003-07-29 Morris J. Howard Infant nursing bottle holder and mobile support
US6792076B2 (en) 2002-05-28 2004-09-14 Northrop Grumman Corporation Target steering system for EUV droplet generators
TW546595B (en) * 2002-07-23 2003-08-11 Internet Motion Navigator Corp Six-axis translation-type dynamic simulation device
WO2005018369A1 (de) 2003-08-22 2005-03-03 Glatz Ag An einem träger verschwenkbar angeordneter ausleger für einen freiarmschirm
US20070118593A1 (en) 2004-07-26 2007-05-24 Shiraz Shivji Positioning system and method for LED display
US7275332B2 (en) * 2005-02-22 2007-10-02 Carestream Health, Inc. Multi-axis positioning apparatus
US7382861B2 (en) * 2005-06-02 2008-06-03 John M. J. Madey High efficiency monochromatic X-ray source using an optical undulator
JP5076087B2 (ja) * 2006-10-19 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びノズル保護装置
US8400721B2 (en) 2007-03-08 2013-03-19 Redstone Aerospace Corporation Leaf-cartwheel flexure, and mounting systems and methods utilizing same
JP2009063046A (ja) * 2007-09-05 2009-03-26 Psc Kk 気体圧制御アクチュエータ
JP4853836B2 (ja) * 2007-09-19 2012-01-11 株式会社安川電機 精密微動位置決め装置およびそれを備えた微動位置決めステージ
US7872245B2 (en) * 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
GB2458237A (en) * 2009-06-29 2009-09-16 Stephen Booth A twin bottle holding device for use feeding babies
US8263953B2 (en) * 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
US9020636B2 (en) * 2010-12-16 2015-04-28 Saied Tadayon Robot for solar farms
JP2012199512A (ja) * 2011-03-10 2012-10-18 Gigaphoton Inc 極端紫外光生成装置及び極端紫外光生成方法
US8731139B2 (en) * 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
US9279445B2 (en) * 2011-12-16 2016-03-08 Asml Netherlands B.V. Droplet generator steering system
WO2016079810A1 (ja) * 2014-11-18 2016-05-26 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光の生成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5986827A (en) * 1998-06-17 1999-11-16 The Regents Of The University Of California Precision tip-tilt-piston actuator that provides exact constraint
US6170367B1 (en) * 1998-09-09 2001-01-09 John R. Keller Single-point flexure toric contact lens forming machine and method
US20040189969A1 (en) * 2003-03-14 2004-09-30 Makoto Mizuno Drive mechanism, exposure device, optical equipment, and device manufacturing method
US20050205810A1 (en) * 2004-03-17 2005-09-22 Akins Robert P High repetition rate laser produced plasma EUV light source
US20100294958A1 (en) * 2009-05-21 2010-11-25 Hideyuki Hayashi Apparatus and method for measuring and controlling target trajectory in chamber apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2013089991A1 *

Also Published As

Publication number Publication date
WO2013089991A1 (en) 2013-06-20
US9279445B2 (en) 2016-03-08
JP2015506078A (ja) 2015-02-26
US10426020B2 (en) 2019-09-24
EP2790783A1 (en) 2014-10-22
US20160150626A1 (en) 2016-05-26
TW201334631A (zh) 2013-08-16
US20130153792A1 (en) 2013-06-20
KR20140107460A (ko) 2014-09-04
TWI583260B (zh) 2017-05-11
KR102036205B1 (ko) 2019-10-24
JP6101704B2 (ja) 2017-03-22

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Legal Events

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Owner name: ASML NETHERLANDS BV

RA4 Supplementary search report drawn up and despatched (corrected)

Effective date: 20150724

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