EP2690200A1 - Anode d'extraction électrolytique et procédé d'extraction électrolytique l'utilisant - Google Patents
Anode d'extraction électrolytique et procédé d'extraction électrolytique l'utilisant Download PDFInfo
- Publication number
- EP2690200A1 EP2690200A1 EP12763572.0A EP12763572A EP2690200A1 EP 2690200 A1 EP2690200 A1 EP 2690200A1 EP 12763572 A EP12763572 A EP 12763572A EP 2690200 A1 EP2690200 A1 EP 2690200A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrowinning
- anode
- oxide
- amorphous
- catalytic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005363 electrowinning Methods 0.000 title claims abstract description 263
- 238000000034 method Methods 0.000 title claims description 43
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 104
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 102
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims abstract description 78
- 229910001936 tantalum oxide Inorganic materials 0.000 claims abstract description 78
- 229910052751 metal Inorganic materials 0.000 claims abstract description 76
- 239000002184 metal Substances 0.000 claims abstract description 74
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims abstract description 67
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims abstract description 61
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 230000002829 reductive effect Effects 0.000 claims abstract description 40
- 239000010936 titanium Substances 0.000 claims abstract description 37
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 34
- 150000002739 metals Chemical class 0.000 claims abstract description 14
- 230000003197 catalytic effect Effects 0.000 claims description 128
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 35
- 229910000457 iridium oxide Inorganic materials 0.000 claims description 34
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 26
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 24
- 229910052715 tantalum Inorganic materials 0.000 claims description 24
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 24
- 229910052725 zinc Inorganic materials 0.000 claims description 24
- 239000011701 zinc Substances 0.000 claims description 24
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 23
- 229910052707 ruthenium Inorganic materials 0.000 claims description 23
- 229910017052 cobalt Inorganic materials 0.000 claims description 20
- 239000010941 cobalt Substances 0.000 claims description 20
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 16
- 229910052802 copper Inorganic materials 0.000 claims description 16
- 239000010949 copper Substances 0.000 claims description 16
- 229910052697 platinum Inorganic materials 0.000 claims description 13
- 229910052741 iridium Inorganic materials 0.000 claims description 12
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 11
- 229910045601 alloy Inorganic materials 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 239000010955 niobium Substances 0.000 claims description 6
- 229910052758 niobium Inorganic materials 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 41
- 229910052760 oxygen Inorganic materials 0.000 abstract description 41
- 239000001301 oxygen Substances 0.000 abstract description 41
- 229910000978 Pb alloy Inorganic materials 0.000 abstract description 3
- 239000003054 catalyst Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 125
- 230000000052 comparative effect Effects 0.000 description 79
- 238000005979 thermal decomposition reaction Methods 0.000 description 39
- 239000000243 solution Substances 0.000 description 28
- 230000000694 effects Effects 0.000 description 23
- 238000007086 side reaction Methods 0.000 description 22
- 239000002243 precursor Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 13
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 12
- 238000005868 electrolysis reaction Methods 0.000 description 11
- -1 cobalt oxyhydroxide Chemical compound 0.000 description 10
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 10
- 229910021645 metal ion Inorganic materials 0.000 description 10
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 9
- 239000011133 lead Substances 0.000 description 9
- 238000002441 X-ray diffraction Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- RTBHLGSMKCPLCQ-UHFFFAOYSA-N [Mn].OOO Chemical compound [Mn].OOO RTBHLGSMKCPLCQ-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 4
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 230000000452 restraining effect Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 4
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 4
- 229910000368 zinc sulfate Inorganic materials 0.000 description 4
- 239000011686 zinc sulphate Substances 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 239000003575 carbonaceous material Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 229910001429 cobalt ion Inorganic materials 0.000 description 3
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 150000002697 manganese compounds Chemical class 0.000 description 3
- 229910001437 manganese ion Inorganic materials 0.000 description 3
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000002905 metal composite material Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 229910021518 metal oxyhydroxide Inorganic materials 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 229910018916 CoOOH Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- 229910019891 RuCl3 Inorganic materials 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- JODOMBGKVAIYRQ-UHFFFAOYSA-N [Nb].[Ta].[Ti] Chemical compound [Nb].[Ta].[Ti] JODOMBGKVAIYRQ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000006263 metalation reaction Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- RJSRQTFBFAJJIL-UHFFFAOYSA-N niobium titanium Chemical compound [Ti].[Nb] RJSRQTFBFAJJIL-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- BIXNGBXQRRXPLM-UHFFFAOYSA-K ruthenium(3+);trichloride;hydrate Chemical compound O.Cl[Ru](Cl)Cl BIXNGBXQRRXPLM-UHFFFAOYSA-K 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- VSSLEOGOUUKTNN-UHFFFAOYSA-N tantalum titanium Chemical compound [Ti].[Ta] VSSLEOGOUUKTNN-UHFFFAOYSA-N 0.000 description 1
- PBACCOSPRYQTNC-UHFFFAOYSA-J tetrachloroiridium hexahydrate dihydrochloride Chemical compound O.O.O.O.O.O.Cl.Cl.Cl[Ir](Cl)(Cl)Cl PBACCOSPRYQTNC-UHFFFAOYSA-J 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- ZTWIEIFKPFJRLV-UHFFFAOYSA-K trichlororuthenium;trihydrate Chemical compound O.O.O.Cl[Ru](Cl)Cl ZTWIEIFKPFJRLV-UHFFFAOYSA-K 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
- C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/16—Electrolytic production, recovery or refining of metals by electrolysis of solutions of zinc, cadmium or mercury
Definitions
- the present invention relates to an anode employed for electrowinning a desired metal by electrolysis and to a method for electrowinning using the same. More particularly, the present invention relates to an anode employed for electrowinning in a sulfuric acid based electrolytic solution with oxygen produced by anode reaction and to a method for electrowinning using the same.
- Electrowinning of a metal is performed by submerging and energizing an anode and a cathode in an aqueous solution (hereafter referred to as the electrolytic solution) which contains ions of a metal to be extracted, thereby allowing the metal to be deposited on the cathode.
- the electrolytic solution aqueous solution
- Examples of typical electrowinning may include a method for electrowinning a metal by electrolysis in an electrolytic solution.
- an ore is first crushed which contains any one or more of copper, zinc, nickel, cobalt, lead, platinum family metals (such as platinum, iridium, ruthenium, or palladium), precious metals (silver or gold), other transition metal elements, and metal elements collectively called rare metalor criticalmetal,etc.
- platinum family metals such as platinum, iridium, ruthenium, or palladium
- precious metals silver or gold
- other transition metal elements and metal elements collectively called rare metalor criticalmetal,etc.
- metal ions are dissolved in an adequate acid, etc., and a target metal ion is then extracted, thereby preparing the electrolytic solution.
- metals may also be reproduced and extracted by electrolysis in an electrolytic solution containing target metal ions.
- the electrolytic solution is prepared by crushing used metal or alloy and allowing metal ions to be dissolved therein, etc. This may be performed to recycle metal or alloy used in various applications, e.g., for primary batteries, secondary batteries, fuel cells, mobile devices such as cellular phones, other electronic devices, electrical and electronic components, plated steel plates, or plated ornaments. Furthermore, in the electrowinning, metal ions may be extracted from a plating liquid waste so as to prepare an electrolytic solution containing target metal ions, etc., so that a metal is extracted by electrolysis in the electrolytic solution.
- electrolytic solutions may include a sulfuric acid based electrolytic solution with an electrolyte component mainly composed of sulfuric acid, a chloride based electrolytic solution with an electrolyte component mainly composed of hydrochloric acid or chloride, and in addition to these solutions, various types of electrolytic solutions based on an aqueous solution with pH adjusted to acidic or basic.
- the energy consumed in electrowinning is the product of electrolytic voltage and the amount of electricity used for energization, so that the amount of metal obtained on the cathode is proportional to the amount of electricity.
- the amount of consumed electric energy required for electrowinning a metal per unit weight of the metal to be extracted decreases with decreasing electrolytic voltages.
- This electrolytic voltage is the potential difference between the anode and the cathode, and the cathode reaction may differ depending on the metal obtained on the cathode, so that the potential of the cathode may differ depending on the type of the reaction.
- the anode reaction is the occurrence of oxygen for the sulfuric acid based electrolytic solution and the occurrence of chlorine for the chloride based electrolytic solution.
- the sulfuric acid based electrolytic solution is used for electrowinning a metal such as copper, zinc, nickel, or cobalt.
- the potential of the anode when oxygen occurs varies depending on the material of the anode. For example, a comparison between materials with a high and low catalytic activity for the occurrence of oxygen shows that the higher the catalytic activity of the material, the lower the potential of the anode.
- the anode for electrowinning in the sulfuric acid based electrolytic solution is required not only to have a high catalytic activity for the occurrence of oxygen but also to have a low catalytic activity, contrary to the case of the occurrence of oxygen, for a reaction that possibly occurs on the anode (hereafter referred to as the side reaction) other than the occurrence of oxygen.
- the electrolytic solution may contain metal ions other than an essential component therein such as zinc ions, copper ions, cobalt ions, or nickel ions.
- metal ions known include, e.g., manganese ions and lead ions.
- oxidation of plus divalent manganese ions occurs so as to deposit, on the anode, a manganese compound such as manganese oxyhydroxide (MnOOH) or manganese dioxide (MnO 2 ), or oxidation of plus divalent lead ions occurs so as to deposit lead dioxide (PbO 2 ) on the anode.
- MnOOH manganese oxyhydroxide
- MnO 2 manganese dioxide
- PbO 2 lead dioxide
- the manganese compound or the lead dioxide have a low catalytic activity for the occurrence of oxygen and a lower electrical conductivity, thus inhibiting the reaction for the occurrence of oxygen on the anode. This will lead to an increase in the potential of the anode, causing the electrolytic voltage to be increased.
- cobalt ions as an additive component to the electrolytic solution are added to the electrolytic solution. In this case, not only does oxygen occur on the anode but also oxidation of plus divalent cobalt ions occur as the side reaction, causing cobalt oxyhydroxide (CoOOH) produced thereby to be deposited on the anode.
- the anode for electrowinning in the sulfuric acid based electrolytic solution is required to be made of a material which is adopted to have the following features:
- typical anodes to be used as the anode for electrowinning in the sulfuric acid based electrolytic solution may include a lead electrode, a lead alloy electrode, or an electrode (hereafter referred to as the coated titanium electrode) for which a titanium substrate is coated with a catalytic layer of a platinum family metal or a platinum family metal oxide or a mixture or a composite oxide of these metals or oxides, etc.
- the coated titanium electrode is a titanium electrode coated with a catalytic layer containing iridium oxide, and in particular, a coated titanium electrode has been used which is coated with a catalytic layer of an oxide mixture of iridium oxide and tantalum oxide or a catalytic layer of the oxide mixture further mixed with another metal or metal oxide.
- Patent Literature 1 to Patent Literature 7 are coated titanium electrodes which are used as the anode for various types of electrolytic processes in an aqueous solution, such as electroplating, manufacturing of electrolytic metal foil, common salt electrolysis, manufacturing of an electrolytic solution, or manufacturing of an electrolytic function solution.
- the anodes disclosed in Patent Literature 1 to Patent Literature 7 include those that are employed not only for producing oxygen but also those used for producing chlorine.
- disclosed in Patent Literature 8 are a precursor solution that is used when the coated titanium electrode for electrowinning is manufactured by thermal decomposition and a method for preparing the precursor solution.
- the inventor of the present application discloses, in Patent Literature 9 and Patent Literature 10, an anode for electrowinning, including a coated titanium electrode, and a method for electrowinning using the anode.
- Patent Literature 9 the inventor of the present application disclosed an anode for electrowinning zinc with a catalytic layer of amorphous iridium oxide formed on a conductive substrate and a method for electrowinning zinc using the same. It is thereby clearly shown that when compared with a conventional anode for electrowinning zinc and method for electrowinning, the anode potential and the electrolytic voltage may be reduced for the occurrence of oxygen at the time of electrowinning of zinc and that the deposition of manganese oxyhydroxide and manganese dioxide that occurs as a side reaction of the anode may be restrained, etc.
- the deposition of manganese oxyhydroxide and manganese dioxide which is a side reaction
- the catalytic layer containing amorphous iridium oxide has a high catalytic activity for the occurrence of oxygen and thus gives a higher priority to the occurrence of oxygen than to the side reaction, thus allowing the electric current at the time of energization to be consumed not for the side reaction but for the main reaction or the occurrence of oxygen. That is, the anode for electrowinning in the sulfuric acid based electrolytic solution could restrain a side reaction by increasing the catalytic activity for the occurrence of oxygen so as to allow oxygen to occur with a higher priority over the side reaction.
- Patent Literature 10 an anode for electrowinning cobalt with a catalytic layer of amorphous ruthenium oxide formed on a conductive substrate and a method for electrowinning cobalt using the same. It is thereby clearly shown that when compared with a conventional anode for electrowinning cobalt in a chloride based electrolytic solution and a method for electrowinning therein, the anode potential and the electrolytic voltage may be reduced for the occurrence of chlorine, and the deposition of cobalt oxyhydroxide that occurs as a side reaction of the anode may be restrained, etc.
- the catalytic layer containing amorphous iridium oxide selectively has a high catalytic activity for the occurrence of oxygen on the anode
- the catalytic layer containing amorphous ruthenium oxide selectively has a high catalytic activity for the occurrence of chlorine on the anode
- the electrowinning in the sulfuric acid based electrolytic solution has been required to further increase the catalytic activity for the anode reaction, thereby further reducing the anode potential and accordingly further reducing the electrolytic voltage.
- the electrowinning of a metal in the sulfuric acid based electrolytic solution that is, the electrowinning with the occurrence of oxygen as an anode reaction
- the present invention was developed to meet the aforementioned demands. It is therefore an object of the present invention to provide an anode for electrowinning in a sulfuric acid based electrolytic solution, the anode being capable of producing oxygen at a lower potential when compared with a lead electrode, a lead alloy electrode, or a coated titanium electrode, thereby allowing the electrowinning to be performed at a reduced electrolytic voltage and the electric power consumption rate of a desired metal to be reduced; being available as an anode for electrowinning of various types of metals; and at the same time, allowing the catalytic layer to be provided at a reduced cost and the electrowinning to be performed in volume with efficiency when compared with the coated titanium electrode used for electrowinning in the sulfuric acid based electrolytic solution.
- the inventor of the present application has completed the present invention by finding that the aforementioned problems could be solved by an anode for electrowinning with a catalytic layer of amorphous ruthenium oxide and amorphous tantalum oxide formed on a conductive substrate and a method for electrowinning using the same.
- the anode for electrowinning of the present invention and the method for electrowinning using the same have the following arrangements.
- the anode for electrowinning according to the first aspect of the present invention is an anode for electrowinning in a sulfuric acid based electrolytic solution, wherein a catalytic layer of amorphous ruthenium oxide and amorphous tantalum oxide is formed on a conductive substrate.
- the conductive substrate may be preferably made of a valve metal such as titanium, tantalum, zirconium, niobium, tungsten, or molybdenum; an alloy predominantly composed of a valve metal such as titanium - tantalum, titanium - niobium, titanium - palladium, or titanium - tantalum - niobium; an alloy of a valve metal and a platinum family metal and/or a transition metal; or an electrically conductive diamond (e.g., boron doped diamond), but the present invention is not limited thereto.
- a valve metal such as titanium, tantalum, zirconium, niobium, tungsten, or molybdenum
- an alloy predominantly composed of a valve metal such as titanium - tantalum, titanium - niobium, titanium - palladium, or titanium - tantalum - niobium
- an alloy of a valve metal and a platinum family metal and/or a transition metal or an electrical
- the conductive substrate may be formed in various shapes such as a three-dimensional porous structure in which bonded to each other are metal particles that are plate-shaped, net-shaped, bar-shaped, sheet-shaped, tubular, linear, porous plate shaped, porous, or spherical.
- metals other than valve metals such as iron or nickel, or electrically conductive ceramic which is coated with the aforementioned valve metals, alloys, or electrically conductive diamond, etc.
- the catalytic layer may contain other components than amorphous ruthenium oxide and amorphous tantalum oxide so long as the electrolytic voltage may be reduced in electrowinning.
- Such other components may include platinum, iridium, ruthenium, tungsten, tantalum, iridium oxide, titanium oxide, and oxidation niobium; however, the present invention is not limited thereto.
- the anode for electrowinning according to the second aspect of the present invention is an anode for electrowinning in a sulfuric acid based electrolytic solution, wherein a catalytic layer of amorphous ruthenium oxide and amorphous tantalum oxide is formed on a conductive substrate; electrowinning may be performed at an electrolytic voltage reduced by 0.02 V or greater when compared with an anode with a catalytic layer of amorphous iridium oxide and amorphous tantalum oxide formed on a conductive substrate, or electrowinning may be performed at an electrolytic voltage reduced by 0.05 V or greater when compared with an anode with a catalytic layer of crystalline ruthenium oxide and amorphous tantalum oxide formed on a conductive substrate.
- the anode for electrowinning according to the third aspect of the present invention is an anode for electrowinning in a sulfuric acid based electrolytic solution, wherein a catalytic layer of amorphous ruthenium oxide and amorphous tantalum oxide is formed on a conductive substrate.
- Patent Literature 6 disclosed is one comparative example in which the coating layer having metal components of ruthenium and tantalum obtained by thermal decomposition at 480°C had a very low durability in a sulfuric acid solution. Such a result is a problem that may occur when crystalline ruthenium oxide is involved which is obtained by thermal decomposition at a temperature of at least 350°C or greater.
- the inventor of the present application found that the anode for electrowinning with a catalytic layer of ruthenium oxide made amorphous in a mixture of amorphous tantalum oxide and the same would not cause a problem with durability to the occurrence of oxygen, like the one in Patent Literature 6, as the anode for electrowinning in the sulfuric acid based electrolytic solution.
- the anode for electrowinning of the present invention provides an outstanding durability in an electrolysis condition of a current density of 0.1 A/cm 2 or less per an electrode area, the condition being a typical electrolysis condition for the electrowinning in which the occurrence of oxygen is the anode reaction in the sulfuric acid based electrolytic solution.
- the catalytic layer of amorphous ruthenium oxide and amorphous tantalum oxide may be formed on the conductive substrate by thermal decomposition, in which a precursor solution containing ruthenium and tantalum is applied to the conductive substrate and then heated at a predetermined temperature.
- thermal decomposition it is alsopossible to employvarious types of physical vapor deposition and chemical vapor deposition methods, etc., such as sputtering and CVD.
- the method for making the anode by thermal decomposition will be described in more detail.
- a precursor solution containing ruthenium and tantalum in a variety of forms such as an inorganic compound, organic compound, ion, or complex is applied to a titanium substrate, which is then thermally decomposed at temperatures in a range lower than at least 350°C, thereby forming a catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide on the titanium substrate.
- a butanol solution in which ruthenium chloride hydrate and tantalum chloride are dissolved is employed as a precursor solution, which is then applied to the titanium substrate and thermally decomposed.
- the catalytic layer of a mixture of amorphous ruthenium oxide and amorphous tantalum oxide is formed at a thermal decomposition temperature of 280°C. Furthermore, by thermal decomposition at 260°C after the application of the aforementioned precursor solution, the catalytic layer of a mixture of amorphous ruthenium oxide and amorphous tantalum oxide may also be formed in the same manner.
- the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide is formed on a conductive substrate by thermal decomposition, it varies whether amorphous ruthenium oxide and amorphous tantalum oxide are contained in the catalytic layer, depending on the molar ratio between ruthenium and tantalum contained in the precursor solution to be applied to the titanium substrate and the thermal decomposition temperature. Furthermore, when a metal component other than ruthenium and tantalum is contained in the precursor solution, it also varies depending on the type of the metal component and the molar ratio of the metal component to all metal components contained in the precursor solution, etc.
- ruthenium and tantalum are contained as metal components
- a lower molar ratio of ruthenium in the precursor solution would tend to show a greater range of thermal decomposition temperatures in which the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide is obtained.
- the conditions for forming the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide also vary depending not only on the molar ratio between such metal components but also on the method for preparing and the material of the precursor solution, for example, raw materials of ruthenium and tantalum used to prepare the precursor solution, the type of a solvent, and the type and concentration of an additive that may be added to accelerate thermal decomposition.
- the conditions for forming, by thermal decomposition, the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide are not limited to the use of the butanol solvent in the thermal decomposition method mentioned above, the molar ratio between ruthenium and tantalum, and the range of thermal decomposition temperatures associated therewith.
- the aforementioned conditions are only an example, and the method for manufacturing the anode for electrowinning of the present invention may include any methods other than those mentioned above so long as the methods are available to forming the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide on the conductive substrate.
- such methods may include one which is disclosed in Patent Literature 8 that involves a heating step in the preparation process of the precursor solution.
- the formation of the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide may be known from the fact that by a typically employed X-ray diffraction method, the diffraction peak corresponding to ruthenium oxide is not observed and the diffraction peak corresponding to tantalum oxide is not observed.
- the invention according to the fourth aspect is the anode for electrowinning according to any one of the first to third aspects, wherein the molar ratio between ruthenium and tantalum in the catalytic layer is 30:70.
- This arrangement provides the following effect in addition to those obtained by any one of the first to third aspects.
- (1) When the same components other thanmetal components are contained in the precursor solution and only ruthenium and tantalum are contained as metal components, a lower molar ratio of ruthenium in the precursor solution would tend to show a greater range of thermal decomposition temperatures in which the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide is obtained, thus providing an outstanding mass productivity.
- the invention according to the fifth aspect is the anode for electrowinning according to any one of the first to fourth aspects, wherein an intermediate layer is formed between the catalytic layer and the conductive substrate.
- the intermediate layer has a low catalytic activity for the occurrence of oxygen when compared with the catalytic layer, but sufficiently coats the conductive substrate, thus restraining the corrosion of the conductive substrate.
- the intermediate layer may be made of, for example, metal, alloy, a carbon based material such as boron doped diamond, a metal compound such as an oxide and sulfide, or a composite compound such as a metal composite oxide.
- the intermediate layer would be formed of a metal, in the case of which a thin film of tantalum or niobium, etc., may be preferably employed.
- the intermediate layer would also be formed of an alloy, in the case of which preferably employed are, for example, tantalum, niobium, tungsten, molybdenum, titanium, or platinum. Furthermore, an intermediate layer made of a carbon based material such as boron doped diamond also has the same effects.
- the intermediate layer made of the aforementioned metal, alloy, or carbon based material may be formed by various types of physical vapor deposition or chemical vapor deposition methods such as thermal decomposition, sputtering, and CVD, etc., or by a variety of methods such as hot dipping or electroplating, etc.
- the intermediate layer made of a metal compound such as an oxide or sulfide or a metal composite oxide may be preferably an intermediate layer made of an oxide containing crystalline iridium oxide, etc.
- the catalytic layer is made by thermal decomposition, it is advantageous, from the viewpoint of simplifying the manufacturing process of the anode for electrowinning, to form the intermediate layer of an oxide or composite oxide in the same manner by thermal decomposition.
- the invention according to the sixth aspect is the anode for electrowinning according to the fifth aspect and is adopted such that the intermediate layer is made of tantalum, niobium, tungsten, molybdenum, or titanium, platinum or any one of alloys of these metals.
- This arrangement provides the following effect in addition to those obtained in the fifth aspect.
- the intermediate layer may be formed in volume with efficiency by various types of physical vapor deposition or chemical vapor deposition methods such as thermal decomposition, sputtering, and CVD or by a variety of methods such as hot dipping and electroplating.
- the invention according to the seventh aspect is the anode for electrowinning according to the fifth aspect, wherein the intermediate layer contains crystalline iridium oxide and amorphous tantalum oxide.
- This arrangement provides the following effect in addition to those obtained in the fifth aspect.
- the intermediate layer containing crystalline iridium oxide and amorphous tantalum oxide may be manufactured by thermal decomposition, in which a precursor solution containing iridium and tantalum is applied to the conductive substrate and then heated at a predetermined temperature.
- the intermediate layer may also be manufactured by, for example, various types of physical vapor deposition or chemical vapor deposition methods such as by sputtering or CVD.
- preferable is such an intermediate layer which is made of crystalline iridium oxide and amorphous tantalum oxide that are obtained by thermally decomposing the precursor solution containing iridium and tantalum at a temperature from 400°C to 550°C.
- the invention according to the eighth aspect is the anode for electrowinning according to any one of the first to seventh aspects, wherein a metal extracted by electrowinning is any one of copper, zinc, nickel, cobalt, platinum, gold, silver, indium, lead, ruthenium, rhodium, palladium, and iridium.
- This arrangement provides the following effect in addition to those obtained in any one of the first to seventh aspects.
- oxygen is produced at a lower potential, the electrolytic voltage in electrowinning may be lowered so as to reduce the electric power consumption rate of a metal.
- the anode is available as an anode for electrowinning of various types of metals, thus enabling outstanding general-purpose use.
- the method for electrowinning according to the ninth aspect of the present invention is a method for electrowinning in the sulfuric acid based electrolytic solution, wherein a desired metal is extracted using the anode for electrowinning according to any one of the first to eighth aspects.
- the invention according to the tenth aspect is the method for electrowinning according to the ninth aspect, wherein a metal extracted by electrowinning is any one of copper, zinc, nickel, cobalt, platinum, gold, silver, indium, lead, ruthenium, rhodium, palladium, and iridium.
- the present invention provides the effects listed below.
- the present invention will be described in more detail in accordance with the Examples and Comparative Examples; however, the present invention is not limited to the following Examples.
- the present invention is also applicable to electrowinning of other metals than zinc, copper, and cobalt.
- a commercially available titanium plate (5 cm in length, 1 cm in width, 1 mm in thickness) was immersed and etched in a 10% oxalic acid solution at 90°C for 60 minutes and then washed and dried.
- RuCl 3 ⁇ 3H 2 O ruthenium trichloride trihydrate
- TaCl 5 tantalum pentachloride
- This application liquid was applied to the titanium plate dried as mentioned above, dried at 120°C for 10 minutes, and then thermally decomposed for 2 0 minutes in an electric furnace that was held at 260°C. This series of application, drying, and thermal decomposition was repeated five times in total in order to prepare an anode for electrowinning according to Example 1, the anode having a catalytic layer formed on the titanium plate that was a conductive substrate.
- An X-ray diffraction analysis of the structure of the anode for electrowinning according to Example 1 shows that as shown in Fig. 1 , the diffraction peak equivalent to RuO 2 was not observed in the X-ray diffraction image, and the diffraction peak equivalent to Ta 2 O 5 was not observed, either. Note that the diffraction peak of Ti was observed; however, this was caused by the titanium plate. That is, the anode for electrowinning according to Example 1 had the catalytic layer of amorphous ruthenium oxide and amorphous tantalum oxide formed on the titanium plate.
- the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of zinc by flowing, between the anode for electrowinning and the cathode, an electrolysis current at a current density of either 10 mA/cm 2 or 50 mA/cm 2 with respect to the electrode area of the anode for electrowinning.
- the electrolytic solution was at 40°C.
- An anode for electrowinning according to Example 2 was manufactured by the same method as that of Example 1 except that the catalytic layer was formed at a thermal decomposition temperature of not 260°C but 280°C.
- An X-ray diffraction analysis of the structure of the anode for electrowinning according to Example 2 shows that as shown in Fig. 1 , the diffraction peak equivalent to RuO 2 was not observed, and the diffraction peak equivalent to Ta 2 O 5 was not observed, either. Note that the diffraction peak of Ti was observed; however, this was caused by the titanium plate. That is, the anode for electrowinning according to Example 2 had the catalytic layer of amorphous ruthenium oxide and amorphous tantalum oxide formed on the titanium plate.
- the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of zinc by flowing, between the anode for electrowinning and the cathode, an electrolysis current at a current density of either 10 mA/cm 2 or 50 mA/cm 2 with respect to the electrode area of the anode for electrowinning.
- the electrolytic solution was at 40°C.
- An anode for electrowinning according to Comparative Example 1 was manufactured by the same method as that of Example 1 except that the catalytic layer was formed at a thermal decomposition temperature of not 260°C but 360°C.
- An X-ray diffraction analysis of the structure of the anode for electrowinning according to Comparative Example 1 shows that as shown in Fig. 1 , the diffraction peak equivalent to RuO 2 was observed, but the diffraction peak equivalent to Ta 2 O 5 was not observed. Note that the diffraction peak of Ti was observed; however, this was caused by the titanium plate. That is, the anode for electrowinning according to Comparative Example 1 had the catalytic layer of crystalline ruthenium oxide and amorphous tantalum oxide formed thereon.
- the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of zinc by flowing, between the anode for electrowinning and the cathode, an electrolysis current at a current density of either 10 mA/cm 2 or 50 mA/cm 2 with respect to the electrode area of the anode for electrowinning.
- the electrolytic solution was at 40°C.
- a commercially available titanium plate (5 cm in length, 1 cm in width, 1 mm in thickness) was immersed and etched in a 10% oxalic acid solution at 90°C for 60 minutes and then washed and dried.
- prepared was an application liquid which was obtained by adding hexachloroiridic acid hexahydrate (H 2 IrCl 6 ⁇ 6H 2 O) and tantalum chloride (TaCl 5 ) to a butanol (n-C 4 H 9 OH) solution containing 6 vol% concentrated hydrochloric acid so that the molar ratio between iridium and tantalum was 80:20 and the total of iridium and tantalum was 70 g/L in terms of metal.
- This application liquid was applied to the titanium plate dried as mentioned above, dried at 120°C for 10 minutes, and then thermally decomposed for 20 minutes in the electric furnace that was held at 360°C. This series of application, drying, and thermal decomposition was repeated five times in total in order to prepare an anode for electrowinning according to Comparative Example 2, the anode having a catalytic layer formed on the titanium plate that was a conductive substrate.
- An X-ray diffraction analysis of the structure of the anode for electrowinning according to Comparative Example 2 shows that, in the X-ray diffraction image, the diffraction peak equivalent to IrO 2 was not observed, and the diffraction peak equivalent to Ta 2 O 5 was not observed, either. That is, the anode for electrowinning according to Comparative Example 2 had the catalytic layer of amorphous iridium oxide and amorphous tantalum oxide formed on the titanium plate.
- the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of zinc by flowing, between the anode for electrowinning and the cathode, an electrolysis current at a current density of either 10 mA/cm 2 or 50 mA/cm 2 with respect to the electrode area of the anode for electrowinning.
- the electrolytic solution was at 40°C.
- the electrolytic voltage was lower by 0.05 V to 0.06 V when compared with the case where the anode for electrowinning according to Comparative Example 2 was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- the electrolytic voltage was significantly reduced when compared with the case where the anode for electrowinning (Comparative Example 1) was used in which the catalytic layer containing crystalline ruthenium oxide and amorphous tantalum oxide was formed. Furthermore, the electrolytic voltage was further reduced when compared with the case where the anode for electrowinning (Comparative Example 2) was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- the electrolytic voltage was lower by 0.04 V to 0.06 V when compared with the case where the anode for electrowinning according to Comparative Example 2 was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- Example 2 when the anode for electrowinning (Example 2) was used in which the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide was formed, the electrolytic voltage was significantly reduced when compared with the case where the anode for electrowinning (Comparative Example 1) was used in which the catalytic layer containing crystalline ruthenium oxide and amorphous tantalum oxide was formed. Furthermore, the electrolytic voltage was further reduced when compared with the case where the anode for electrowinning (Comparative Example 2) was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- Example 1 The electrolytic solution of Example 1 was replaced with an electrolytic solution of 0.60 mol/L of CuSO 4 and 0.90 mol/L of sulfuric acid, and with other conditions kept the same as those of Example 1, the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of copper.
- Example 2 The electrolytic solution of Example 2 was replaced with an electrolytic solution of 0.60 mol/L of CuSO 4 and 0.90 mol/L of sulfuric acid, and with other conditions kept the same as those of Example 2, the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of copper.
- Comparative Example 1 The electrolytic solution of Comparative Example 1 was replaced with an electrolytic solution of 0.60 mol/L of CuSO 4 and 0.90 mol/L of sulfuric acid, and with other conditions kept the same as those of Comparative Example 1, the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of copper.
- the electrolytic solution of Comparative Example 2 was replaced with an electrolytic solution of 0.60 mol/L of CuSO 4 and 0.90 mol/L of sulfuric acid, and with other conditions kept the same as those of Comparative Example 2, the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of copper.
- Example 3 The inter-terminal voltages for electrowinning using the anode for electrowinning according to Example 3, Example 4, Comparative Example 3 and Comparative Example 4 above are as shown in Table 5 to Table 8.
- Table 5 Current density Electrolytic voltage Difference in electrolytic voltage (Degree of improvement)
- Example 3 Comparative Example 3 Comparative Example 3 - Example 3 10 mA/cm 2 1.17 V 1.28 V 0.11 V 50 mA/cm 2 1.30 V 1.46 V 0.16 V
- Table 6 Current density Electrolytic voltage Difference in electrolytic voltage (Degree of improvement)
- Table 7 Current density Electrolytic voltage Difference in electrolytic voltage (Degree of improvement)
- Example 4 Comparative Example 3 Comparative Example 3 - Example 4 10 mA/cm 2 1.18 V 1.28 V 0.10 V 50 mA/cm 2 1.30 V 1.46 V
- the electrolytic voltage was lower by 0.05 V to 0.07 V when compared with the case where the anode for electrowinning according to Comparative Example 4 was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- the electrolytic voltage was significantly reduced when compared with the case where the anode for electrowinning (Comparative Example 3) was used in which the catalytic layer containing crystalline ruthenium oxide and amorphous tantalum oxide was formed. Furthermore, the electrolytic voltage was further reduced when compared with the case where the anode for electrowinning (Comparative Example 4) was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- the electrolytic voltage was lower by 0.04 V to 0.07 V when compared with the case where the anode for electrowinning according to Comparative Example 4 was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- Example 4 when the anode for electrowinning (Example 4) was used in which the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide was formed, the electrolytic voltage was significantly reduced when compared with the case where the anode for electrowinning (Comparative Example 3) was used in which the catalytic layer containing crystalline ruthenium oxide and amorphous tantalum oxide was formed. Furthermore, the electrolytic voltage was further reduced when compared with the case where the anode for electrowinning (Comparative Example 4) was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- Example 1 The electrolytic solution of Example 1 was replaced with an electrolytic solution of 0.30 mol/L of CoSO 4 and 2.0 ⁇ 10 -3 mol/L of sulfuric acid, and with the conditions kept the same as those of Example 1 except for a current density of 10 mA/cm 2 , the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of cobalt.
- Example 2 The electrolytic solution of Example 2 was replaced with an electrolytic solution of 0.30 mol/L of CoSO 4 and 2.0 ⁇ 10 -3 mol/L of sulfuric acid, and with the conditions kept the same as those of Example 2 except for a current density of 10 mA/cm 2 , the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of cobalt.
- Comparative Example 1 The electrolytic solution of Comparative Example 1 was replaced with an electrolytic solution of 0.30 mol/L of CoSO 4 and 2.0 ⁇ 10 -3 mol/L of sulfuric acid, and with the conditions kept the same as those of Comparative Example 1 except for a current density of 10 mA/cm 2 , the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of cobalt.
- the electrolytic solution of Comparative Example 2 was replaced with an electrolytic solution of 0.30 mol/L of CoSO 4 and 2.0 ⁇ 10 -3 mol/L of sulfuric acid, and with the conditions kept the same as those of Comparative Example 2 except for a current density of 10 mA/cm 2 , the inter-terminal voltage (electrolytic voltage) was measured between the anode for electrowinning and the cathode while performing electrowinning of cobalt.
- the electrolytic voltage was lower by 0.02 V when compared with the case where the anode for electrowinning according to Comparative Example 6 was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed. That is, when the anode for electrowinning (Example 5) was used in which the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide was formed, the electrolytic voltage was reduced when compared with the case where the anode for electrowinning (Comparative Example 5) was used in which the catalytic layer containing crystalline ruthenium oxide and amorphous tantalum oxide was formed. Furthermore, the electrolytic voltage was further reduced when compared with the case where the anode for electrowinning (Comparative Example 6) was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
- the electrolytic voltage was lower by 0.09 V when compared with the case where the anode for electrowinning according to Comparative Example 6 was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed. That is, when the anode for electrowinning (Example 6) was used in which the catalytic layer containing amorphous ruthenium oxide and amorphous tantalum oxide was formed, the electrolytic voltage was reduced when compared with the case where the anode for electrowinning (Comparative Example 5) was used in which the catalytic layer containing crystalline ruthenium oxide and amorphous tantalum oxide was formed. Furthermore, the electrolytic voltage was further reduced when compared with the case where the anode for electrowinning (Comparative Example 6) was used in which the catalytic layer containing amorphous iridium oxide and amorphous tantalum oxide was formed.
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CN105980845A (zh) * | 2014-02-12 | 2016-09-28 | 学校法人同志社 | 离子传感器用催化剂及使用其的离子传感器以及定量法 |
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CN103974769B (zh) | 2011-09-01 | 2018-11-09 | 西蒙·特鲁德尔 | 电催化材料及其制造方法 |
JP5008043B1 (ja) * | 2011-09-13 | 2012-08-22 | 学校法人同志社 | 塩素発生用陽極 |
US9178219B2 (en) * | 2012-12-20 | 2015-11-03 | Ford Global Technologies, Llc | Electrochemical device including amorphous metal oxide |
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- 2012-03-23 US US14/007,488 patent/US20140054180A1/en not_active Abandoned
- 2012-03-23 WO PCT/JP2012/057426 patent/WO2012133136A1/fr active Application Filing
- 2012-03-23 ES ES12763572.0T patent/ES2557194T3/es active Active
- 2012-03-23 AU AU2012234150A patent/AU2012234150B2/en not_active Ceased
- 2012-03-23 CA CA2831273A patent/CA2831273C/fr not_active Expired - Fee Related
- 2012-03-23 CN CN201280016122.9A patent/CN103476970B/zh not_active Expired - Fee Related
- 2012-03-23 RU RU2013147642/02A patent/RU2568546C2/ru active
- 2012-03-23 KR KR1020137024065A patent/KR101577664B1/ko active IP Right Grant
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EP2757181A4 (fr) * | 2011-09-13 | 2015-06-17 | Doshisha | Electrode positive pour un placage électrolytique et procédé de placage électrolytique utilisant l'électrode positive |
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CN105980845A (zh) * | 2014-02-12 | 2016-09-28 | 学校法人同志社 | 离子传感器用催化剂及使用其的离子传感器以及定量法 |
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EP3312601A1 (fr) * | 2014-02-12 | 2018-04-25 | The Doshisha | Détecteur d'ions de phosphate d'hydrogène comprenant un catalyseur d'oxyde mixte d'oxyde de ruthénium et d'oxyde de tantale |
CN105980845B (zh) * | 2014-02-12 | 2018-11-06 | 学校法人同志社 | 离子传感器以及定量法 |
Also Published As
Publication number | Publication date |
---|---|
JP4916040B1 (ja) | 2012-04-11 |
JP2012201925A (ja) | 2012-10-22 |
CA2831273C (fr) | 2016-02-23 |
KR20140002749A (ko) | 2014-01-08 |
RU2013147642A (ru) | 2015-04-27 |
WO2012133136A1 (fr) | 2012-10-04 |
EP2690200A4 (fr) | 2014-03-19 |
CA2831273A1 (fr) | 2012-10-04 |
CL2013002745A1 (es) | 2014-04-25 |
AU2012234150B2 (en) | 2015-07-02 |
CN103476970A (zh) | 2013-12-25 |
AU2012234150A1 (en) | 2013-11-14 |
US20140054180A1 (en) | 2014-02-27 |
ES2557194T3 (es) | 2016-01-22 |
KR101577664B1 (ko) | 2015-12-15 |
CN103476970B (zh) | 2016-07-06 |
EP2690200B1 (fr) | 2015-10-07 |
RU2568546C2 (ru) | 2015-11-20 |
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