EP2649217A4 - ARTICLE AND METHOD FOR ITS MANUFACTURE AND USE - Google Patents

ARTICLE AND METHOD FOR ITS MANUFACTURE AND USE

Info

Publication number
EP2649217A4
EP2649217A4 EP11846563.2A EP11846563A EP2649217A4 EP 2649217 A4 EP2649217 A4 EP 2649217A4 EP 11846563 A EP11846563 A EP 11846563A EP 2649217 A4 EP2649217 A4 EP 2649217A4
Authority
EP
European Patent Office
Prior art keywords
article
making
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP11846563.2A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP2649217A2 (en
Inventor
Arokiaraj Jesudoss
Ranjith Divigalpitiya
Gary A Korba
Boon Kiat Lim
Melvin Zin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of EP2649217A2 publication Critical patent/EP2649217A2/en
Publication of EP2649217A4 publication Critical patent/EP2649217A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/0057—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material where an intermediate transfer member receives the ink before transferring it on the printing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/194—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/305—Sulfides, selenides, or tellurides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Composite Materials (AREA)
  • Plasma & Fusion (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Carbon And Carbon Compounds (AREA)
EP11846563.2A 2010-12-08 2011-12-02 ARTICLE AND METHOD FOR ITS MANUFACTURE AND USE Withdrawn EP2649217A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42101710P 2010-12-08 2010-12-08
PCT/US2011/063064 WO2012078464A2 (en) 2010-12-08 2011-12-02 Article and method of making and using the same

Publications (2)

Publication Number Publication Date
EP2649217A2 EP2649217A2 (en) 2013-10-16
EP2649217A4 true EP2649217A4 (en) 2014-11-26

Family

ID=46207657

Family Applications (1)

Application Number Title Priority Date Filing Date
EP11846563.2A Withdrawn EP2649217A4 (en) 2010-12-08 2011-12-02 ARTICLE AND METHOD FOR ITS MANUFACTURE AND USE

Country Status (5)

Country Link
US (2) US9321254B2 (fi)
EP (1) EP2649217A4 (fi)
JP (1) JP6124797B2 (fi)
CN (2) CN103314133B (fi)
WO (1) WO2012078464A2 (fi)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104321830B (zh) 2011-12-22 2017-09-22 3M创新有限公司 具有高透光率的导电制品
CN103779576B (zh) * 2012-10-24 2015-12-02 清华大学 电化学电池集流体的制备方法及电化学电池电极的制备方法
GB2508226B (en) * 2012-11-26 2015-08-19 Selex Es Ltd Protective housing
ITTO20150243A1 (it) * 2015-05-07 2016-11-07 Itt Italia Srl Materiale di attrito, in particolare per la fabbricazione di una pastiglia freno, e metodo di preparazione associato
EP3468763B1 (en) * 2016-06-10 2023-08-16 Michael A. Pope Method and apparatus for producing large-area monolayer films of solution dispersed nanomaterials

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100000441A1 (en) * 2008-07-01 2010-01-07 Jang Bor Z Nano graphene platelet-based conductive inks

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US5389195A (en) 1991-03-07 1995-02-14 Minnesota Mining And Manufacturing Company Surface modification by accelerated plasma or ions
US6203898B1 (en) 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
US5972176A (en) 1997-10-03 1999-10-26 3M Innovative Properties Company Corona treatment of polymers
MXPA02009852A (es) 2000-04-06 2003-05-27 3M Innovative Properties Co Metodo y aparato de revestimiento electrostaticamente asistido con campo de electrodo enfocado.
US20030129305A1 (en) 2002-01-08 2003-07-10 Yihong Wu Two-dimensional nano-sized structures and apparatus and methods for their preparation
US6874699B2 (en) 2002-10-15 2005-04-05 Wisconsin Alumni Research Foundation Methods and apparata for precisely dispensing microvolumes of fluids
US20050250052A1 (en) 2004-05-10 2005-11-10 Nguyen Khe C Maskless lithography using UV absorbing nano particle
US20070138405A1 (en) 2005-12-16 2007-06-21 3M Innovative Properties Company Corona etching
JP4756548B2 (ja) * 2006-04-20 2011-08-24 株式会社リコー 潤滑剤供給装置、クリーニング装置、プロセスカートリッジ、及び、画像形成装置
GB0622150D0 (en) * 2006-11-06 2006-12-20 Kontrakt Technology Ltd Anisotropic semiconductor film and method of production thereof
JP4933287B2 (ja) * 2007-01-29 2012-05-16 株式会社リコー 画像形成装置用潤滑剤塗布装置及びこれを用いたプロセスカートリッジ並びに画像形成装置
US7885595B2 (en) * 2007-09-04 2011-02-08 Ricoh Company Limited Lubricant applicator, process cartridge including same, and image forming apparatus including same
EP2195648B1 (en) * 2007-09-12 2019-05-08 President and Fellows of Harvard College High-resolution molecular graphene sensor comprising an aperture in the graphene layer
US8715610B2 (en) 2007-10-19 2014-05-06 University Of Wollongong Process for the preparation of graphene
KR100923304B1 (ko) * 2007-10-29 2009-10-23 삼성전자주식회사 그라펜 시트 및 그의 제조방법
CN101442105B (zh) * 2007-11-21 2010-06-09 中国科学院化学研究所 一种有机场效应晶体管及其专用源漏电极与制备方法
KR101344493B1 (ko) 2007-12-17 2013-12-24 삼성전자주식회사 단결정 그라펜 시트 및 그의 제조방법
WO2009099707A1 (en) 2008-02-05 2009-08-13 Crain, John, M. Printed electronics
FI20085113A0 (fi) * 2008-02-08 2008-02-08 Valtion Teknillinen Menetelmä grafiinirakenteiden valmistamiseksi alustoille
WO2009119641A1 (ja) 2008-03-26 2009-10-01 学校法人早稲田大学 単原子膜の製造方法
CN101285175B (zh) * 2008-05-29 2010-07-21 中国科学院化学研究所 化学气相沉积法制备石墨烯的方法
US8487296B2 (en) 2008-11-26 2013-07-16 New Jersey Institute Of Technology Graphene deposition and graphenated substrates
US8057863B2 (en) * 2008-12-05 2011-11-15 The Regents Of The University Of California Electrostatic force assisted deposition of graphene
CN101503174B (zh) * 2009-03-18 2011-01-05 北京大学 二氧化钛光催化切割石墨烯的方法
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CN101648182B (zh) * 2009-09-07 2012-01-11 中国科学院化学研究所 一种溶液态石墨烯图案化排布方法

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US20100000441A1 (en) * 2008-07-01 2010-01-07 Jang Bor Z Nano graphene platelet-based conductive inks

Non-Patent Citations (2)

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K. S. NOVOSELOV ET AL: "Two-dimensional atomic crystals", PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, vol. 102, no. 30, 26 July 2005 (2005-07-26), pages 10451 - 10453, XP055056814, DOI: 10.1073/pnas.0502848102 *

Also Published As

Publication number Publication date
CN107419241A (zh) 2017-12-01
JP6124797B2 (ja) 2017-05-10
WO2012078464A9 (en) 2013-04-25
US20130244009A1 (en) 2013-09-19
JP2014508663A (ja) 2014-04-10
CN103314133B (zh) 2017-08-01
CN103314133A (zh) 2013-09-18
US20160200098A1 (en) 2016-07-14
EP2649217A2 (en) 2013-10-16
US9321254B2 (en) 2016-04-26
WO2012078464A2 (en) 2012-06-14
WO2012078464A3 (en) 2012-08-16

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