EP2548261A2 - Reflector array antenna with crossed polarization compensation and method for producing such an antenna - Google Patents

Reflector array antenna with crossed polarization compensation and method for producing such an antenna

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Publication number
EP2548261A2
EP2548261A2 EP11702668A EP11702668A EP2548261A2 EP 2548261 A2 EP2548261 A2 EP 2548261A2 EP 11702668 A EP11702668 A EP 11702668A EP 11702668 A EP11702668 A EP 11702668A EP 2548261 A2 EP2548261 A2 EP 2548261A2
Authority
EP
European Patent Office
Prior art keywords
radiating element
plane
reflector
pattern
radiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP11702668A
Other languages
German (de)
French (fr)
Other versions
EP2548261B1 (en
Inventor
Danièle Bresciani
Hervé Legay
Gérard Caille
Eric Labiole
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thales SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thales SA filed Critical Thales SA
Publication of EP2548261A2 publication Critical patent/EP2548261A2/en
Application granted granted Critical
Publication of EP2548261B1 publication Critical patent/EP2548261B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/0006Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
    • H01Q15/006Selective devices having photonic band gap materials or materials of which the material properties are frequency dependent, e.g. perforated substrates, high-impedance surfaces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/02Refracting or diffracting devices, e.g. lens, prism
    • H01Q15/12Refracting or diffracting devices, e.g. lens, prism functioning also as polarisation filter
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/14Reflecting surfaces; Equivalent structures
    • H01Q15/141Apparatus or processes specially adapted for manufacturing reflecting surfaces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/24Polarising devices; Polarisation filters 
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q19/00Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic
    • H01Q19/10Combinations of primary active antenna elements and units with secondary devices, e.g. with quasi-optical devices, for giving the antenna a desired directional characteristic using reflecting surfaces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q3/00Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system
    • H01Q3/44Arrangements for changing or varying the orientation or the shape of the directional pattern of the waves radiated from an antenna or antenna system varying the electric or magnetic characteristics of reflecting, refracting, or diffracting devices associated with the radiating element
    • H01Q3/46Active lenses or reflecting arrays
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49016Antenna or wave energy "plumbing" making

Definitions

  • the present invention relates to a reflector array antenna with cross polarization compensation and a method for producing such an antenna. It applies in particular to antennas mounted on a spacecraft such as a telecommunications satellite or antennas terrestrial terminals for telecommunications or satellite broadcasting systems.
  • Offset antenna configurations having a geometrically formed reflector (offset shaped reflector antenna) and a primary source offset from the normal axis to the reflector, generate radiation in a cross polarization induced by the geometric curvature of the antenna.
  • reflector and whose level depends directly on the focal ratio of the reflector, the focal ratio being defined by the ratio between the focal length and the reflector diameter. The higher the focal ratio, the lower the level of cross polarization.
  • the antenna structure when the antenna is implanted on a face of a satellite facing the Earth, the antenna structure must be compact and the focal ratios are low, which induces a high level of cross polarization.
  • the level of cross polarization is impaired in the direction normal to the antenna but there may be axisymmetric cross polarization lobes due to the curvature of the lines of fields at the ends of the reflector.
  • the primary source used may, when it has low performance, itself generate cross-polarized field components.
  • satellite-mounted antennas pointing to its Earth often have a dual reflector structure mounted in a Gregorian configuration.
  • the use of two reflectors makes it possible to define the geometry of the auxiliary reflector with respect to the geometry of the main reflector so that the cross polarization induced by the curvature of the auxiliary reflector cancels the cross polarization induced by the curvature of the reflector.
  • main reflector the presence of the auxiliary reflector and its support structure causes an increase in the mass, volume and cost of the antenna relative to a single reflector antenna.
  • a reflecting array antenna in English: reflectarray antenna
  • a primary source illuminates a reflector network at an oblique incidence.
  • the reflector comprises a set of elementary radiating elements assembled in a network of one or two dimensions and forming a reflecting surface which can be flat.
  • the reflector network then acts as a mirror and the radiation reflected by the reflector network does not comprise a cross-polarization component. it is illuminated by a primary source without cross polarization placed in its axis of symmetry.
  • the radiating elements of a reflector array generally have geometric differences so as to precisely control the phase shift that each radiating element produces on an incident wave.
  • the arrangement of the elementary radiating elements with respect to one another on the surface of the reflector is generally synthesized and optimized so as to obtain a given radiation pattern in a chosen pointing direction with a chosen phase law. Therefore, it has been found that although the reflector is plane and therefore there is no cross polarization induced by the curvature of the reflector, because of the illumination of the reflector by a source in offset configuration, the The reflector array behaves operationally as a geometrically shaped surface reflector which also induces cross-polarized radiation having the same level of magnitude as an equivalent shaped surface reflector.
  • the object of the invention is to provide a reflective array antenna having a given phase diagram and in which the cross polarization generated by a primary source is canceled.
  • the invention relates to a cross-polarization compensation reflector grating antenna comprising a reflector grating consisting of a plurality of evenly distributed elementary radiating elements forming a reflective surface and a primary source for illuminating the reflector array, the reflector array having a radiation pattern according to two orthogonal main polarizations in a propagation direction chosen with a law selected phase, each elementary radiating element being made in planar technology and comprising an etched pattern consisting of at least one metal patch and / or at least one radiating slot, the metal patch comprising, in a symmetrical configuration, at least four opposite sides two by two with respect to a center of the etched pattern and arranged parallel to two X, Y directions of the XY plane of the radiating element, the radiating slot comprising, in a symmetrical configuration of the radiating element, at least two branches; diametrically opposite to the center of the gravity pattern and disposed parallel to at least one of X and / or Y of the radiating element.
  • At least one radiating element of the reflector network comprises an etched pattern having an asymmetric geometric shape with respect to at least one of the X and / or Y directions of the XY plane of the radiating element, the dissymmetry of the pattern etched radiating element consisting of an angular inclination of at least one side, respectively at least one branch, of the geometric shape of the etched pattern relative to the X and / or Y directions of the plane of the radiating element.
  • the dissymmetry of the etched pattern is calculated individually for each radiating element from a symmetrical radiating element of the same pattern and consists of an angular inclination of at least one direction of the pattern.
  • the angular value of the angle of inclination is determined so that the radiating element generates a reflected wave having a controlled depolarization which opposes a depolarization generated in the normal plane to the direction of propagation by the reflector grating illuminated by the primary source.
  • the controlled depolarization of the radiating element corresponds to an individual reflection matrix having principal reflection coefficients of amplitude similar to those of the radiating element of the same pattern and of symmetrical geometric shape along the two X directions and Y, and non-zero amplitude cross-reflection coefficients greater than that of said radiating element of the same symmetrical pattern.
  • the angular dissymmetries consist of angular rotations of the four main branches of the slots, around the center of the engraved pattern, in the XY plane.
  • the angular dissymmetries consist of an angular inclination of at least two opposite sides of the metallic patch of the radiating elements in the same direction or in opposite directions so as to transform the square shape respectively into trapezoid or parallelogram.
  • several adjacent radiating elements of the reflector array comprise an etched pattern having an asymmetrical geometric shape with respect to at least one X and / or Y direction of the XY plane of each of said radiating elements, the angular inclinations of the side or branch of the geometric shape of the etched pattern of each of said radiating elements forming a continuously progressive value angle of a radiating element to another radiating element adjacent to the reflecting surface.
  • the reflector network comprises several plane facets oriented in different planes, each plane facet comprising a plurality of elementary radiating elements, and at least one radiating element of each plane facet of the reflector network comprises an engraved pattern having an asymmetrical geometric shape with respect to at least one X and / or Y direction of the XY plane of the facet to which the corresponding radiating element belongs.
  • the invention also relates to a method of producing such a reflector grating antenna with offset configuration and cross polarization compensation consisting in producing a reflector array consisting of a plurality of elementary radiating elements regularly distributed and forming a reflective and illuminating surface. the reflective network by a primary source.
  • the method consists in developing a reflector array in which each elementary radiating element is made in planar technology and comprises an etched pattern having a geometric shape symmetrical with respect to two X and Y directions of the XY plane of the radiating element, the etched pattern being consisting of at least one metal patch and / or at least one radiating slot, then introducing an asymmetry, with respect to at least one of the X and / or Y directions, into the geometric shape of the etched pattern of at least one radiating element of the reflector array, the asymmetry being calculated from the radiation pattern of the desired far-field electromagnetic field in which the cross-polarization is zero and from the corresponding radiated electric field in the plane of the reflector array.
  • FIG. 1 a diagram of an example of a reflector array antenna, according to the invention
  • FIG. 2 a diagram of an example of elementary radiating element, according to the invention.
  • FIG. 3 a diagram of an example of arrangement of the radiating elements of a reflector array antenna, according to the invention.
  • FIG. 4a a diagram illustrating the path of an oblique incident wave on a reflector array, according to the invention
  • FIG. 4b a diagram illustrating the orientation of the field components in different planes on the path of an incident wave and a reflected wave, according to the invention
  • FIGS. 5a and 5b two diagrams illustrating the distribution of the electric field in the plane of the radiating aperture in the case where the radiation comprises a cross-polarization component and, respectively, in the case where the radiation is perfectly polarized without a cross-component, according to the invention;
  • FIG. 6a an example of a symmetrical radiating element comprising a metal patch and slots etched in the metal patch, the corresponding reflection matrix and the desired reflection matrix, according to the invention
  • FIGS. 6b to 6e the radiating element of FIG. 6a in which different types of rotations are introduced and the diagrams relating to the evolutions of the amplitude and of the phase of the corresponding crossed coefficients, according to the invention
  • FIG. 7 an example of a set of symmetrical successive radiating elements comprising a continuously evolutive phase between two consecutive radiating elements, each radiating element comprising a pattern consisting of a square-shaped metal patch and a radiating opening made in the metal patch, according to the invention;
  • FIGS. 8a, 8b, 9a, 9b a radiating element of FIG. 7 in which different types of rotations are introduced and the diagrams relating to the evolutions of the amplitude and the phase of the corresponding crossed coefficients, according to the invention.
  • a reflector array antenna 10 as shown for example in FIG. 1, comprises a set of elementary radiating elements 20 assembled in a reflector array 11 in one or two dimensions and forming a reflecting surface 14 making it possible to increase the directivity and the gain of the antenna 0.
  • the reflector network 11 is illuminated by a primary source 13.
  • the elementary radiating elements 20, also called elementary cells, of the reflector network 11 comprise engraved patterns such as metal patches and / or slits.
  • the etched patterns have variable parameters, such as for example the geometric dimensions of the etched patterns (length and width of the "patches" or slots), which are adjusted to obtain a chosen radiation pattern. As represented for example in FIG.
  • the elementary radiating elements 20 may consist of metal patches loaded with radiating slots and separated from a metal mass plane of a typical distance between ⁇ 9 and Xgl 4, where ⁇ g is the Guided wavelength in the spacer medium.
  • This spacer medium may be a dielectric, but also a composite sandwich made by a symmetrical arrangement of a honeycomb type separator and dielectric skins thin thicknesses.
  • the elementary radiating element 20 is of square shape having sides of length m, comprising a metal patch 15 printed on an upper face of a dielectric substrate 16 provided with a metal ground plane 17 on its face. lower.
  • the metal patch 15 has a square shape having sides of dimension p and has two slots 18 of length b and width k practiced at its center, the slots being arranged in the form of a cross.
  • the plane of the reflecting surface of the radiating element is the XY plane.
  • the shape of the elementary radiating elements 20 is not limited to a square, it may also be rectangular, triangular, circular, hexagonal, cross-shaped, or any other geometric shape.
  • the slots can also be made in a different number of two and their arrangement can be different from a cross.
  • the radiating element could also include a pattern consisting of a central patch-shaped cross and one or more peripheral slots.
  • the radiating element could comprise a pattern consisting of several concentric annular metal patches and several annular or non-annular slots.
  • the arrangement (lay-out) of the elementary radiating elements with respect to one another to form a reflector network is synthesized so as to obtain a given radiation pattern in a chosen pointing direction and with a predetermined phase law.
  • Figure 3 shows an example of arrangement of the radiating elements of a reflector array antenna, to obtain a directional beam pointed in a lateral direction relative to the antenna. Due to the pianetry of the reflector network and the differences in path lengths of a wave emitted by a primary source 13 to each radiating element 7, 8 of the grating, the illumination of the reflector network by an incident wave coming from the primary source 13 causes a phase distribution of the electromagnetic field above the reflecting surface 14.
  • the etched patterns of each radiating element 7, 8 therefore have geometric dimensions defined so that the incident wave is reflected by the network 11 with a phase shift that compensates for the relative phase of the incident wave.
  • each radiating element is usually chosen symmetrical with respect to the two orthogonal axes X and Y of the plane of each radiating element.
  • An isolated symmetrical radiating element does not substantially deprive an incident wave normal to its plane and the associated reflection matrix therefore has very low cross-reflection coefficients, generally less than 30 dB. These levels may increase for an oblique incidence, particularly greater than 40 ° compared to normal.
  • the radiating elements are arranged on the surface of the reflector so as to achieve a specific phase law over the entire surface, in a main polarization corresponding to the polarization emitted by the primary source.
  • the phenomena of depolarization are phenomena considered as parasites which deteriorate the performance of the antenna but they are generally not taken into account when carrying out the arrangement of the reflector network.
  • the reflector array 11 When the reflector array 11 is illuminated by an oblique incident wave in a linear polarization, it generates a reflected wave having two field components along two orthogonal X and Y directions.
  • the surface of the reflector array 11 is partially schematized by dotted lines and four radiating elements 20 are shown, each radiating element 20 having a square-shaped metal patch.
  • a primary source 13 placed in offset configuration illuminates the reflector network 11 in an oblique direction at an angle ⁇ with respect to the normal direction n to the reflector network 11.
  • the incident electromagnetic field Einc emitted by the primary source can be polarized linearly by example in a vertical direction in an orthonormal reference linked to the source. Due to its oblique incidence, the incident field Einc, linearly polarized in the plane bound to the source, induces, in an XY coordinate system bound to the plane of the radiating element, an incident field Ei comprising two Eix and Eiy field components according to the two directions X and Y of the plane of the radiating element, the two components Eix and Eiy corresponding to the projection of the oblique incident field Einc in the plane of the reflective network.
  • the reflector network then radiates, according to a main propagation direction, a reflected electromagnetic field Er having two Erx and Ery field components.
  • the incident field Einc polarized linearly in the reference frame linked to the primary source 13 thus generates in XY plane parallel to the plane of the reflector network 11, a cross-polarized field component.
  • the cross polarization components induced at the level of the radiating elements compensate each other.
  • the normal direction n at the plane of the reflector network is generally different from the normal plane 44 to the propagation direction 45.
  • Cross-polarization components are then summed with phase weighting and no longer offset each other.
  • the invention therefore consists in synthesizing a reflector array according to the prior art, that is to say, only concerned with the radiation patterns required in the two principal poiarizations orthogonal and therefore only interested in the main reflection coefficients Rxx and Ryy.
  • the invention then consists in weakly disturbing the polarization induced by at least one radiating element of the grating. reflector so as to compensate for the cross-polarization components induced by the reflector array.
  • the disturbance to be introduced into the radiating elements is determined individually for each of the radiating elements of the reflector network.
  • the slight depolarization of the waves reflected by each radiating element corresponds to the appearance, in the plane of the reflector array, of low amplitude cross polarization radiation at the level of the individual radiating elements.
  • the slight depolarization is such that it makes it possible to obtain, in the normal plane 44 at the direction of propagation 45, waves reflected by the reflector network 11, called the plane of opening of the reflector network or radiating aperture plane, a distribution of electric field without cross component.
  • the depolarization introduced must be weak and not disturb the fundamental mode of radiation of the radiating element, nor its phase.
  • the cross-reflection coefficients introduced by each elementary radiating element will preferably be less than -15 dB.
  • the invention consists, in a first step, in defining the desired radiation pattern of the far-field electromagnetic field 46 and imposing as a starting condition that the polarization components cross are nil for this far field.
  • This far-field electromagnetic field 46 is associated a single distribution of a near electromagnetic field on an infinite radiating aperture defined by a normal plane 44 to the direction of propagation 45 of the waves reflected by the reflector network 11.
  • the polarization components crossed being zero in the far field, they are also zero in a plane normal to the direction of propagation of the waves reflected by the reflector network and are therefore zero in the opening plane 44 of the reflector array 11.
  • From the radiation pattern of the field distant electromagnetic 46 desired it is possible to deduce therefrom, by means of a Fourier transform, the main polarization components of the corresponding radiated near-field, in the opening plane 44 of the reflector network,
  • the invention in a second step, in the general case where the aperture plane 44 is different from the plane of the reflector array 11, the invention then consists in calculating, by a backpropagation technique, for each radiating element of the reflector network, the components of the radiated electric field corresponding in the plane of the reflector network.
  • the backpropagation technique consists of a change of reference from the plane of aperture 44 to the plane of the reflector network 11.
  • the components of the electric field radiated in the plane of the reflector array are the Erx and Ery components reflected by the corresponding radiating element according to the respective directions X and Y.
  • the Ery component is weak but nonzero if the plane of the reflector array is different from the aperture plane.
  • the invention consists in calculating the components of the incident electric field Eix and Eiy induced by the primary source 13 on each radiating element of the reflector network.
  • the horn is defined by a set of modal coefficients of spherical waves with which it is possible to calculate the near or far radiated field as described for example in the book by G. Franceschetti, "Campi Elettromagnetici ", Boilati Boringhieri editore sri, Torino 1988 (li ediée), incorporated by reference.
  • the invention consists, for each radiating element, in deducing therefrom the principal reflection coefficients Rxx and Ryy. and the corresponding cross reflection coefficients Rxy and Ryx.
  • the Erx and Ery components of the reflected field Er generated by the reflector network according to the respective directions X and Y are expressed as a function of the components Eix and Eiy of the incident field Ei induced by the source by the following equations:
  • the reflection matrix of each radiating element of the reflector network therefore comprises reflection coefficients Rxx in the X direction, Ryy in the Y direction and two cross-reflection coefficients Rxy and Ryx corresponding to a cross polarization.
  • the invention consists first of all in synthesizing a reflector network by only worrying about the radiation diagrams required in the two orthogonal main polarizations along the X and Y directions and therefore only by being interested in to the main reflection coefficients Rxx and Ryy, then to weakly disturb the polarization of at least one radiating element so as to compensate for the cross polarization induced by the reflector array in the direction of propagation of the reflected waves.
  • the Erx and Ery components of Radiated field Er must be determined for each radiating element in the XY plane of the facet to which this radiating element belongs.
  • Different XY references are to be considered according to the radiating element considered and the facet in which it is.
  • the method for estimating the amount of depolarization required to be performed on each individual radiating element must therefore be applied facet by facet so as to reconstruct, according to the method presented above, the Erx and Ery components of the radiated field in the XY plane. corresponding to the radiating element considered.
  • the invention then consists in introducing, into the individual radiating elements 20 of the reflector network 11, a depolarization controlled, different from a radiating element to another radiating element, to obtain all the reflection coefficients corresponding to the desired values.
  • This depolarization introduced individually into the radiating elements is such that it then compensates for the depolarization induced by an oblique incident wave on the final reflector grating.
  • FIG. 5a illustrates the distribution of the electric field in the plane of the radiating aperture in the case where the reflector grating has been synthesized without taking into account parasitic phenomena related to the cross polarization and where the radiation comprises a cross-polarization component
  • FIG. 5b illustrates the case where the reflector array has been synthesized so as to cancel the cross-polarization component and the radiation is perfectly polarized without cross-component.
  • the depolarization introduced into at least one individual radiating element of the reflector network consists in breaking the symmetry of the pattern of this radiating element while maintaining the same phase of the principal reflection coefficients induced by this radiating element, in order not to disrupt its radiation in the main polarization. This affects the amplitude and phase of the cross-reflection coefficients.
  • angular dissymmetries are introduced into the patterns of the radiating elements that generate cross polarization, some radiating elements do not generate cross polarization, for example those located in the axis of symmetry of the reflector network may remain symmetrical.
  • These angular dissymmetries consist of angular inclinations of at least one main direction of the pattern or angular rotations of the four principal directions X, X ', Y, Y' of the patterns, around the center 50 of the pattern, in the XY plane.
  • the angular rotations are made with angles that may be different or identical for all directions and in directions that may be the same or different.
  • the dissymmetry of the pattern of each of said radiating elements is continuously progressive. a radiating element to another radiating element adjacent to the reflecting surface.
  • a first example shown in Figures 6a to 6d relates to the case of a radiating element 20 whose geometric pattern comprises a metal patch and slots engraved in the patch.
  • the slots form a central symmetrical cross in two orthogonal directions XX 'and YY', called Jerusalem Cross.
  • the cross comprises four main branches 62, 63, 64, 65, opposite in pairs, respectively oriented along the directions X, X ', Y, Y', each main branch having an end provided with a perpendicular extension.
  • the reflection matrix 60 of this symmetrical radiating element is such that the main reflection coefficients are of equal amplitudes and close to the maximum value 1, corresponding to OdB, and the crossed reflection coefficients have very small amplitudes, typically order of -29dB.
  • the desired reflection matrix 61 has main reflection coefficients that are very slightly modified with respect to those of the symmetrical element and slightly degraded cross reflection coefficients, having an amplitude of the order of -21 dB, this degraded amplitude being, however, always located at a level corresponding to noise.
  • each main branch of the central cross has undergone different types of angular rotations relative to the center 50 of the radiating element.
  • the angular rotations consist in modifying the inclination of each of the main branches, independently of one another, by a different angle and in a positive or negative direction.
  • the four main branches of the cross are inclined independently of each other at the same angle, the branches located in directions diametrically opposed being inclined in opposite directions but two successive branches being inclined in the same direction.
  • the amplitude and phase diagrams of the corresponding cross-reflection coefficients show that this configuration has little impact on the amplitude of the cross-reflection coefficients when the angle of inclination of the main branches of the cross varies between -4 ° and + 4 ° while their phase evolves a lot.
  • FIG. 6e shows an example of an optimized radiating element 20i whose reflection matrix is very close to the desired matrix 61 indicated in FIG. 6a.
  • This radiating element 20i has two branches forming an angle of 9.35 ° respectively in a negative direction of rotation and in a direction of positive rotation with respect to the directions Y and X, and two branches forming an angle of 6.65 ° respectively in a negative direction of rotation and in a direction of positive rotation with respect to the directions X 'and Y'.
  • FIGS. 6a to 6e thus show that it is possible by adjusting the angle of inclination of the four branches of a cross oriented along principal directions of the radiating element, to control the amplitude and the phase of the cross-reflection coefficients and thus the depolarization of this radiating element.
  • FIG. 7 relates to a set of successive symmetrical radiating elements comprising a continuously evolutive phase between two consecutive radiating elements, each radiating element comprising a pattern consisting of a square-shaped metal patch and a radiating opening made in the metal patch. .
  • the respective dimensions of the metal patch with respect to the radiating aperture are continuously evolving from one radiating element to another adjacent radiating element, which makes it possible to have a large number of different phases between 0 ° and 360 °, modulo 360 ° to be distributed on a reflector network according to the radiated phase law desired.
  • the different successive phases are obtained without abrupt rupture of the dimensions of the patch relative to the radiating aperture due to the appearance of the radiating aperture in the center of the metal patch and the gradual increase in the dimensions of the radiating aperture to the disappearance of said metal patch and the appearance in the center of the radiating opening of a new metal patch whose dimensions gradually increase until the disappearance of the radiating opening.
  • FIGS. 8a and 8b show the evolution diagrams of the phase and the amplitude of the cross-reflection coefficients for a radiating element subjected to an oblique incident wave and comprising two inclined sides 81, 82 or 83, 84 in opposite directions.
  • FIGS. 10a and 10b show other diagrams of evolution of the phase and the amplitude of the crossed reflection coefficients when two opposite sides are inclined at the same angle in the same direction so as to obtain a parallelogram.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • Aerials With Secondary Devices (AREA)

Abstract

The invention relates to a reflector array antenna with crossed polarization compensation comprising at least one radiating member (20) having an engraved pattern that is dissymmetrical relative to at least one direction X and/or Y of the plane XY of the radiating member, the dissymmetry of the pattern of the radiating member being calculated individually from a radiating member having the same symmetrical pattern in the two directions X and Y so as to generate a reflected wave having a controlled depolarization opposite to a depolarization generated in a plane normal to a propagation direction by the reflector array (11) illuminated by a primary source (13).

Description

Antenne réseau réflecteur à compensation de polarisation croisée et procédé de réalisation d'une telle antenne La présente invention concerne une antenne réseau réflecteur à compensation de polarisation croisée et un procédé de réalisation d'une telle antenne. Elle s'applique notamment aux antennes montées sur un engin spatial tel qu'un satellite de télécommunication ou aux antennes des terminaux terrestres pour les systèmes de télécommunications ou de diffusion par satellite.  The present invention relates to a reflector array antenna with cross polarization compensation and a method for producing such an antenna. It applies in particular to antennas mounted on a spacecraft such as a telecommunications satellite or antennas terrestrial terminals for telecommunications or satellite broadcasting systems.
Les configurations d'antenne offset comportant un réflecteur à surface formée géométriquement {en anglais : offset shaped reflector antenna) et une source primaire décalée par rapport à l'axe normal au réflecteur, engendrent des rayonnements dans une polarisation croisée induite par la courbure géométrique du réflecteur et dont le niveau dépend directement du rapport focai du réflecteur, le rapport focal étant défini par le rapport entre la focale et le diamètre du réflecteur. Plus le rapport focal est grand, plus le niveau de polarisation croisée est faible. Cependant, lorsque l'antenne est implantée sur une face d'un satellite orientée vers la Terre, la structure de l'antenne doit être compacte et les rapports focaux sont faibles, ce qui induit un niveau de polarisation croisé élevé.  Offset antenna configurations having a geometrically formed reflector (offset shaped reflector antenna) and a primary source offset from the normal axis to the reflector, generate radiation in a cross polarization induced by the geometric curvature of the antenna. reflector and whose level depends directly on the focal ratio of the reflector, the focal ratio being defined by the ratio between the focal length and the reflector diameter. The higher the focal ratio, the lower the level of cross polarization. However, when the antenna is implanted on a face of a satellite facing the Earth, the antenna structure must be compact and the focal ratios are low, which induces a high level of cross polarization.
Dans le cas d'une antenne comportant un réflecteur illuminé par une source primaire centrée, le niveau de polarisation croisée est nui dans la direction normale à l'antenne mais il peut y avoir des lobes de polarisation croisée axisymétriques dus à la courbure des lignes de champs aux extrémités du réflecteur.  In the case of an antenna having a reflector illuminated by a primary source centered, the level of cross polarization is impaired in the direction normal to the antenna but there may be axisymmetric cross polarization lobes due to the curvature of the lines of fields at the ends of the reflector.
Par ailleurs, la source primaire utilisée peut, lorsqu'elle comporte des faibles performances, engendrer elle-même des composantes de champ comportant une polarisation croisée.  Moreover, the primary source used may, when it has low performance, itself generate cross-polarized field components.
Pour répondre à des spécifications de faible niveau de polarisation croisée, les antennes montées sur les satellites et pointant en direction de Sa Terre ont souvent une structure à double réflecteur montés dans une configuration Grégorienne. L'utilisation de deux réflecteurs permet de définir la géométrie du réflecteur auxiliaire par rapport à la géométrie du réflecteur principal de façon que la polarisation croisée induite par la courbure du réflecteur auxiliaire annule la polarisation croisée induite par la courbure du réflecteur principal. Cependant la présence du réflecteur auxiliaire et de sa structure de support entraîne une augmentation de la masse, du volume et du coût de l'antenne par rapport à une antenne à un seul réflecteur. To meet low cross-polarization specifications, satellite-mounted antennas pointing to its Earth often have a dual reflector structure mounted in a Gregorian configuration. The use of two reflectors makes it possible to define the geometry of the auxiliary reflector with respect to the geometry of the main reflector so that the cross polarization induced by the curvature of the auxiliary reflector cancels the cross polarization induced by the curvature of the reflector. main reflector. However, the presence of the auxiliary reflector and its support structure causes an increase in the mass, volume and cost of the antenna relative to a single reflector antenna.
Une autre solution pour diminuer le niveau de polarisation croisée est d'utiliser une antenne réseau réflecteur (en anglais : reflectarray antenna) en configuration offset. Dans ce type d'antenne, une source primaire illumine un réseau réflecteur sous une incidence oblique. Le réflecteur comporte un ensemble d'éléments rayonnants élémentaires assemblés en réseau à une ou deux dimensions et formant une surface réfléchissante qui peut être plane. En considérant le cas où les éléments rayonnants de l'antenne sont tous identiques et n'induisent pas individuellement de polarisation croisée, le réseau réflecteur agit alors comme un miroir et le rayonnement réfléchi par le réseau réflecteur ne comporte pas de composante en polarisation croisée s'il est illuminé par une source primaire sans polarisation croisée placée dans son axe de symétrie. Cependant, les éléments rayonnants d'un réseau réflecteur comportent généralement des différences géométriques de façon à contrôler précisément le déphasage que chaque élément rayonnant produit sur une onde incidente. En outre, l'agencement des éléments rayonnants élémentaires les uns par rapport aux autres sur la surface du réflecteur est généralement synthétisé et optimisé de façon à obtenir un diagramme de rayonnement donné dans une direction de pointage choisie avec une loi de phase choisie. Par conséquent, il a été constaté que bien que le réflecteur soit plan et qu'il n'y ait donc pas de polarisation croisée induite par la courbure du réflecteur, du fait de l'illumination du réflecteur par une source en configuration offset, le réseau réflecteur se comporte en fonctionnement comme un réflecteur à surface formée géométriquement qui induit aussi un rayonnement en polarisation croisée dont le niveau est du même ordre de grandeur qu'un réflecteur à surface formée équivalent. Le but de l'invention est de réaliser une antenne réseau réflecteur ayant un diagramme de phase donné et dans laquelle la polarisation croisée engendrée par une source primaire est annulée.  Another solution to reduce the level of cross polarization is to use a reflecting array antenna (in English: reflectarray antenna) in offset configuration. In this type of antenna, a primary source illuminates a reflector network at an oblique incidence. The reflector comprises a set of elementary radiating elements assembled in a network of one or two dimensions and forming a reflecting surface which can be flat. Considering the case where the radiating elements of the antenna are all identical and do not individually induce cross-polarization, the reflector network then acts as a mirror and the radiation reflected by the reflector network does not comprise a cross-polarization component. it is illuminated by a primary source without cross polarization placed in its axis of symmetry. However, the radiating elements of a reflector array generally have geometric differences so as to precisely control the phase shift that each radiating element produces on an incident wave. In addition, the arrangement of the elementary radiating elements with respect to one another on the surface of the reflector is generally synthesized and optimized so as to obtain a given radiation pattern in a chosen pointing direction with a chosen phase law. Therefore, it has been found that although the reflector is plane and therefore there is no cross polarization induced by the curvature of the reflector, because of the illumination of the reflector by a source in offset configuration, the The reflector array behaves operationally as a geometrically shaped surface reflector which also induces cross-polarized radiation having the same level of magnitude as an equivalent shaped surface reflector. The object of the invention is to provide a reflective array antenna having a given phase diagram and in which the cross polarization generated by a primary source is canceled.
Pour cela, l'invention concerne une antenne réseau réflecteur à compensation de polarisation croisée comportant un réseau réflecteur constitué d'une pluralité d'éléments rayonnants élémentaires régulièrement répartis et formant une surface réfléchissante et une source primaire destinée à illuminer le réseau réflecteur, le réseau réflecteur ayant un diagramme de rayonnement selon deux polarisations principales orthogonales dans une direction de propagation choisie avec une loi de phase choisie, chaque élément rayonnant élémentaire étant réalisé en technologie planaire et comportant un motif gravé constitué d'au moins un patch métallique et/ou d'au moins une fente rayonnante, le patch métallique comportant, dans une configuration symétrique, au moins quatre côtés opposés deux à deux par rapport à un centre du motif gravé et disposés parallèlement à deux directions X, Y du plan XY de l'élément rayonnant, la fente rayonnante comportant, dans une configuration symétrique de l'élément rayonnant, au moins deux branches diamétralement opposées par rapport au centre du motif gravé et disposées parallèlement à au moins l'une des directions X et/ou Y de l'élément rayonnant. Selon l'invention, au moins un élément rayonnant du réseau réflecteur comporte un motif gravé ayant une forme géométrique dissymétrique par rapport à au moins l'une des directions X et/ou Y du plan XY de l'élément rayonnant, la dissymétrie du motif gravé de l'élément rayonnant consistant en une inclinaison angulaire d'au moins un côté, respectivement d'au moins une branche, de la forme géométrique du motif gravé par rapport aux directions X et/ou Y du plan de l'élément rayonnant. For this purpose, the invention relates to a cross-polarization compensation reflector grating antenna comprising a reflector grating consisting of a plurality of evenly distributed elementary radiating elements forming a reflective surface and a primary source for illuminating the reflector array, the reflector array having a radiation pattern according to two orthogonal main polarizations in a propagation direction chosen with a law selected phase, each elementary radiating element being made in planar technology and comprising an etched pattern consisting of at least one metal patch and / or at least one radiating slot, the metal patch comprising, in a symmetrical configuration, at least four opposite sides two by two with respect to a center of the etched pattern and arranged parallel to two X, Y directions of the XY plane of the radiating element, the radiating slot comprising, in a symmetrical configuration of the radiating element, at least two branches; diametrically opposite to the center of the gravity pattern and disposed parallel to at least one of X and / or Y of the radiating element. According to the invention, at least one radiating element of the reflector network comprises an etched pattern having an asymmetric geometric shape with respect to at least one of the X and / or Y directions of the XY plane of the radiating element, the dissymmetry of the pattern etched radiating element consisting of an angular inclination of at least one side, respectively at least one branch, of the geometric shape of the etched pattern relative to the X and / or Y directions of the plane of the radiating element.
Ainsi, pour chaque élément rayonnant du réseau réflecteur, la dissymétrie du motif gravé est calculée individuellement pour chaque élément rayonnant à partir d'un élément rayonnant symétrique de même motif et consiste en une inclinaison angulaire d'au moins une direction du motif. La valeur angulaire de l'angle d'inclinaison est déterminée de manière que l'élément rayonnant engendre une onde réfléchie ayant une dépolarisation contrôlée qui s'oppose à une dépolarisation engendrée dans le plan normal à la direction de propagation par le réseau réflecteur illuminé par la source primaire. La dépolarisation contrôlée de l'élément rayonnant correspond à une matrice de réflexion individuelle ayant des coefficients de réflexion principaux d'amplitude similaire à ceux de l'élément rayonnant de même motif et de forme géométrique symétrique selon les deux directions X et Y, et des coefficients de réflexion croisés d'amplitude non nulle supérieure à celle dudit élément rayonnant de même motif symétrique. Thus, for each radiating element of the reflector network, the dissymmetry of the etched pattern is calculated individually for each radiating element from a symmetrical radiating element of the same pattern and consists of an angular inclination of at least one direction of the pattern. The angular value of the angle of inclination is determined so that the radiating element generates a reflected wave having a controlled depolarization which opposes a depolarization generated in the normal plane to the direction of propagation by the reflector grating illuminated by the primary source. The controlled depolarization of the radiating element corresponds to an individual reflection matrix having principal reflection coefficients of amplitude similar to those of the radiating element of the same pattern and of symmetrical geometric shape along the two X directions and Y, and non-zero amplitude cross-reflection coefficients greater than that of said radiating element of the same symmetrical pattern.
Avantageusement, dans le cas d'un motif gravé comportant un patch métallique et au moins deux fentes gravées dans le patch métallique dans lequel les fentes forment au moins quatre branches principales orientées respectivement, deux à deux, parallèlement aux directions X et Y dans une configuration symétrique de l'élément rayonnant, les dissymétries angulaires consistent en des rotations angulaires des quatre branches principales des fentes, autour du centre du motif gravé, dans le plan XY. Advantageously, in the case of an etched pattern comprising a metal patch and at least two slots etched in the metal patch in which the slots form at least four main branches oriented respectively, two by two, parallel to the X and Y directions in a configuration symmetrical to the radiating element, the angular dissymmetries consist of angular rotations of the four main branches of the slots, around the center of the engraved pattern, in the XY plane.
Avantageusement, dans le cas d'un motif gravé comportant, dans une configuration symétrique, un patch métallique ayant une forme géométrique carrée, les dissymétries angulaires consistent en une inclinaison angulaire d'au moins deux côtés opposés du patch métallique des éléments rayonnants dans un même sens ou dans des sens opposés de façon à transformer la forme carrée respectivement en trapèze ou en parallélogramme. Avantageusement, plusieurs éléments rayonnants adjacents du réseau réflecteur comportent un motif gravé ayant une forme géométrique dissymétrique par rapport à au moins une direction X et/ou Y du plan XY de chacun desdits éléments rayonnants, les inclinaisons angulaires du côté ou de la branche de la forme géométrique du motif gravé de chacun desdits éléments rayonnants formant un angle de valeur continûment progressive d'un élément rayonnant à un autre élément rayonnant adjacent sur la surface réfléchissante. Advantageously, in the case of an engraved pattern comprising, in a symmetrical configuration, a metal patch having a square geometrical shape, the angular dissymmetries consist of an angular inclination of at least two opposite sides of the metallic patch of the radiating elements in the same direction or in opposite directions so as to transform the square shape respectively into trapezoid or parallelogram. Advantageously, several adjacent radiating elements of the reflector array comprise an etched pattern having an asymmetrical geometric shape with respect to at least one X and / or Y direction of the XY plane of each of said radiating elements, the angular inclinations of the side or branch of the geometric shape of the etched pattern of each of said radiating elements forming a continuously progressive value angle of a radiating element to another radiating element adjacent to the reflecting surface.
Selon un mode de réalisation particulier de l'invention, le réseau réflecteur comporte plusieurs facettes planes orientées selon des plans différents, chaque facette plane comportant une pluralité d'éiéments rayonnants élémentaires, et au moins un élément rayonnant de chaque facette plane du réseau réflecteur comporte un motif gravé ayant une forme géométrique dissymétrique par rapport à au moins une direction X et/ou Y du plan XY de îa facette à laquelle appartient l'élément rayonnant correspondant. According to a particular embodiment of the invention, the reflector network comprises several plane facets oriented in different planes, each plane facet comprising a plurality of elementary radiating elements, and at least one radiating element of each plane facet of the reflector network comprises an engraved pattern having an asymmetrical geometric shape with respect to at least one X and / or Y direction of the XY plane of the facet to which the corresponding radiating element belongs.
L'invention concerne également un procédé de réalisation d'une telle antenne réseau réflecteur à configuration offset et compensation de polarisation croisée consistant à réaliser un réseau réflecteur constitué d'une pluralité d'éléments rayonnants élémentaires régulièrement répartis et formant une surface réfléchissante et à illuminer le réseau réflecteur par une source primaire. Le procédé consiste à élaborer un réseau réflecteur dans lequel chaque élément rayonnant élémentaire est réalisé en technologie planaire et comporte un motif gravé ayant une forme géométrique symétrique par rapport à deux directions X et Y du plan XY de l'élément rayonnant, le motif gravé étant constitué d'au moins un patch métallique et/ou d'au moins une fente rayonnante, puis à introduire une dissymétrie, par rapport à au moins l'une des directions X et/ou Y, dans la forme géométrique du motif gravé d'au moins un élément rayonnant du réseau réflecteur, la dissymétrie étant calculée à partir du diagramme de rayonnement du champ électromagnétique lointain désiré dans lequel la polarisation croisée est nulle et à partir du champ électrique rayonné correspondant dans le plan du réseau réflecteur. The invention also relates to a method of producing such a reflector grating antenna with offset configuration and cross polarization compensation consisting in producing a reflector array consisting of a plurality of elementary radiating elements regularly distributed and forming a reflective and illuminating surface. the reflective network by a primary source. The method consists in developing a reflector array in which each elementary radiating element is made in planar technology and comprises an etched pattern having a geometric shape symmetrical with respect to two X and Y directions of the XY plane of the radiating element, the etched pattern being consisting of at least one metal patch and / or at least one radiating slot, then introducing an asymmetry, with respect to at least one of the X and / or Y directions, into the geometric shape of the etched pattern of at least one radiating element of the reflector array, the asymmetry being calculated from the radiation pattern of the desired far-field electromagnetic field in which the cross-polarization is zero and from the corresponding radiated electric field in the plane of the reflector array.
D'autres particularités et avantages de l'invention apparaîtront clairement dans la suite de la description donnée à titre d'exemple purement illustratif et non limitatif, en référence aux dessins schématiques annexés qui représentent : Other features and advantages of the invention will become clear in the following description given by way of purely illustrative and non-limiting example, with reference to the attached schematic drawings which represent:
figure 1 : un schéma d'un exemple d'une antenne réseau réflecteur, selon l'invention ;  FIG. 1: a diagram of an example of a reflector array antenna, according to the invention;
figure 2 : un schéma d'un exemple d'élément rayonnant élémentaire, selon l'invention ;  FIG. 2: a diagram of an example of elementary radiating element, according to the invention;
- figure 3 : un schéma d'un exemple d'arrangement des éléments rayonnants d'une antenne réseau réflecteur, selon l'invention ;  - Figure 3: a diagram of an example of arrangement of the radiating elements of a reflector array antenna, according to the invention;
figure 4a : un schéma illustrant le trajet d'une onde incidente oblique sur un réseau réflecteur, selon l'invention ; figure 4b : un schéma illustrant l'orientation des composantes de champ dans différents plans sur le trajet d'une onde incidente et d'une onde réfléchie, selon l'invention ; FIG. 4a: a diagram illustrating the path of an oblique incident wave on a reflector array, according to the invention; FIG. 4b: a diagram illustrating the orientation of the field components in different planes on the path of an incident wave and a reflected wave, according to the invention;
figures 5a et 5b : deux schémas illustrant la distribution du champ électrique dans le plan de l'ouverture rayonnante dans le cas où le rayonnement comporte une composante en polarisation croisée et respectivement, dans le cas où le rayonnement est parfaitement polarisé sans composante croisée, selon l'invention ;  FIGS. 5a and 5b: two diagrams illustrating the distribution of the electric field in the plane of the radiating aperture in the case where the radiation comprises a cross-polarization component and, respectively, in the case where the radiation is perfectly polarized without a cross-component, according to the invention;
figure 6a: un exemple d'élément rayonnant symétrique comportant un patch métallique et des fentes gravées dans ie patch métallique, la matrice de réflexion correspondante et la matrice de réflexion souhaitée, selon l'invention ; figures 6b à 6e : l'élément rayonnant de la figure 6a dans lequel différents types de rotations sont introduits et les diagrammes relatifs aux évolutions de l'amplitude et de la phase des coefficients croisés correspondants, selon l'invention ;  FIG. 6a: an example of a symmetrical radiating element comprising a metal patch and slots etched in the metal patch, the corresponding reflection matrix and the desired reflection matrix, according to the invention; FIGS. 6b to 6e: the radiating element of FIG. 6a in which different types of rotations are introduced and the diagrams relating to the evolutions of the amplitude and of the phase of the corresponding crossed coefficients, according to the invention;
figure 7 : un exemple d'un ensemble d'éléments rayonnants successifs symétriques comportant une phase continûment évolutive entre deux éléments rayonnants consécutifs, chaque élément rayonnant comportant un motif constitué d'un patch métallique de forme carrée et d'une ouverture rayonnante pratiquée dans le patch métallique, selon l'invention ;  FIG. 7: an example of a set of symmetrical successive radiating elements comprising a continuously evolutive phase between two consecutive radiating elements, each radiating element comprising a pattern consisting of a square-shaped metal patch and a radiating opening made in the metal patch, according to the invention;
figures 8a, 8b, 9a, 9b : un élément rayonnant de la figure 7 dans lequel différents types de rotations sont introduits et les diagrammes relatifs aux évolutions de l'amplitude et de la phase des coefficients croisés correspondants, selon l'invention.  FIGS. 8a, 8b, 9a, 9b: a radiating element of FIG. 7 in which different types of rotations are introduced and the diagrams relating to the evolutions of the amplitude and the phase of the corresponding crossed coefficients, according to the invention.
Une antenne réseau réflecteur 10 telle que représentée par exemple sur la figure 1 , comporte un ensemble d'éléments rayonnants élémentaires 20 assemblés en réseau réflecteur 11 à une ou deux dimensions et formant une surface réfléchissante 14 permettant d'augmenter la directivité et ie gain de i'antenne 0. Le réseau réflecteur 1 1 est illuminé par une source primaire 13. Les éléments rayonnants élémentaires 20, appelés aussi cellules élémentaires, du réseau réflecteur 1 1 , comportent des motifs gravés de type patchs métalliques et/ou fentes. Les motifs gravés ont des paramètres variables, tels que par exemple les dimensions géométriques des motifs gravés (longueur et largeur des « patchs » ou des fentes), qui sont réglés de façon à obtenir un diagramme de rayonnement choisi. Comme représenté par exemple sur la figure 2, les éléments rayonnants élémentaires 20 peuvent être constitués par des patchs métalliques chargés de fentes rayonnantes et séparés d'un plan de masse métallique d'une distance typique comprise entre λ9 10 et Xgl4, où λg est la longueur d'onde guidée dans le milieu espaceur. Ce milieu espaceur peut être un diélectrique, mais aussi un sandwich composite réalisé par un agencement symétrique d'un séparateur de type Nid d'abeille et de peaux diélectriques de fines épaisseurs. A reflector array antenna 10 as shown for example in FIG. 1, comprises a set of elementary radiating elements 20 assembled in a reflector array 11 in one or two dimensions and forming a reflecting surface 14 making it possible to increase the directivity and the gain of the antenna 0. The reflector network 11 is illuminated by a primary source 13. The elementary radiating elements 20, also called elementary cells, of the reflector network 11 comprise engraved patterns such as metal patches and / or slits. The etched patterns have variable parameters, such as for example the geometric dimensions of the etched patterns (length and width of the "patches" or slots), which are adjusted to obtain a chosen radiation pattern. As represented for example in FIG. 2, the elementary radiating elements 20 may consist of metal patches loaded with radiating slots and separated from a metal mass plane of a typical distance between λ 9 and Xgl 4, where λg is the Guided wavelength in the spacer medium. This spacer medium may be a dielectric, but also a composite sandwich made by a symmetrical arrangement of a honeycomb type separator and dielectric skins thin thicknesses.
Sur la figure 2, l'élément rayonnant élémentaire 20 est de forme carré ayant des côtés de longueur m, comportant un patch métallique 15 imprimé sur une face supérieure d'un substrat diélectrique 16 muni d'un plan de masse métallique 17 sur sa face inférieure. Le patch métallique 15 a une forme de carré ayant des côtés de dimension p et comporte deux fentes 18 de longueur b et de largeur k pratiquées en son centre, les fentes étant disposées en forme de croix. Dans un repère à trois dimensions XYZ, ie plan de la surface réfléchissante de l'élément rayonnant est le pian XY. La forme des éléments rayonnants élémentaires 20 n'est pas limitée à un carré, elle peut également être rectangulaire, triangulaire, circulaire, hexagonale, en forme de croix, ou toute autre forme géométrique. Les fentes peuvent également être réalisées en un nombre différent de deux et leur disposition peut être différente d'une croix. Au lieu de fentes centrales, l'élément rayonnant pourrait également comporter un motif constitué d'un patch central en forme de croix et d'une ou plusieurs fentes périphériques. Alternativement, i'élément rayonnant pourrait comporter un motif constitué de plusieurs patchs métalliques annuiaires concentriques et de plusieurs fentes annulaires ou non. Pour que l'antenne 10 soit performante, il faut que la cellule élémentaire puisse contrôler précisément le déphasage qu'elle produit sur une onde incidente, pour les différentes fréquences de la bande passante. In FIG. 2, the elementary radiating element 20 is of square shape having sides of length m, comprising a metal patch 15 printed on an upper face of a dielectric substrate 16 provided with a metal ground plane 17 on its face. lower. The metal patch 15 has a square shape having sides of dimension p and has two slots 18 of length b and width k practiced at its center, the slots being arranged in the form of a cross. In a three-dimensional XYZ coordinate system, the plane of the reflecting surface of the radiating element is the XY plane. The shape of the elementary radiating elements 20 is not limited to a square, it may also be rectangular, triangular, circular, hexagonal, cross-shaped, or any other geometric shape. The slots can also be made in a different number of two and their arrangement can be different from a cross. Instead of central slots, the radiating element could also include a pattern consisting of a central patch-shaped cross and one or more peripheral slots. Alternatively, the radiating element could comprise a pattern consisting of several concentric annular metal patches and several annular or non-annular slots. For the antenna 10 to be efficient, the elementary cell must be able to precisely control the phase shift it produces on an incident wave, for the different frequencies of the bandwidth.
L'agencement (en anglais : lay-out) des éléments rayonnants élémentaires les uns par rapport aux autres pour constituer un réseau réflecteur est synthétisé de façon à obtenir un diagramme de rayonnement donné dans une direction de pointage choisie et avec une loi de phase prédéterminée. La figure 3 montre un exemple d'arrangement des éléments rayonnants d'une antenne réseau réflecteur, permettant d'obtenir un faisceau directif pointé dans une direction latérale par rapport à l'antenne. En raison de la pianéité du réseau réflecteur et des différences de longueurs de trajet d'une onde émise par une source primaire 13 jusqu'à chaque élément rayonnant 7, 8 du réseau, l'illumination du réseau réflecteur par une onde incidente provenant de la source primaire 13 provoque une distribution de phase du champ électromagnétique au-dessus de la surface réfléchissante 14. Les motifs gravés de chaque élément rayonnant 7, 8 ont donc des dimensions géométriques définies de façon que l'onde incidente soit réfléchie par le réseau 11 avec un décalage de phase qui compense la phase relative de l'onde incidente.  The arrangement (lay-out) of the elementary radiating elements with respect to one another to form a reflector network is synthesized so as to obtain a given radiation pattern in a chosen pointing direction and with a predetermined phase law. . Figure 3 shows an example of arrangement of the radiating elements of a reflector array antenna, to obtain a directional beam pointed in a lateral direction relative to the antenna. Due to the pianetry of the reflector network and the differences in path lengths of a wave emitted by a primary source 13 to each radiating element 7, 8 of the grating, the illumination of the reflector network by an incident wave coming from the primary source 13 causes a phase distribution of the electromagnetic field above the reflecting surface 14. The etched patterns of each radiating element 7, 8 therefore have geometric dimensions defined so that the incident wave is reflected by the network 11 with a phase shift that compensates for the relative phase of the incident wave.
La forme géométrique du motif gravé de chaque élément rayonnant est habituellement choisie symétrique par rapport aux deux axes orthogonaux X et Y du plan de chaque élément rayonnant. Un élément rayonnant symétrique isolé ne dépoiarise quasiment pas une onde incidente normale à son plan et la matrice de réflexion associée comporte donc des coefficients de réflexion croisés très faibles, généralement inférieurs à 30dB. Ces niveaux peuvent augmenter pour une incidence oblique, particulièrement supérieure à 40° par rapport à la normale. Les éléments rayonnants sont agencés sur la surface du réflecteur de façon à réaliser une loi de phase spécifique sur l'ensemble de la surface, dans une polarisation principale correspondant à la polarisation émise par la source primaire. Les phénomènes de dépolarisation sont des phénomènes considérés comme des parasites qui détériorent les performances de l'antenne mais ils ne sont généralement pas pris en compte lors de la réalisation de l'agencement du réseau réflecteur. Lorsque le réseau réflecteur 11 est illuminé par une onde incidente oblique dans une polarisation linéaire, il engendre une onde réfléchie comportant deux composantes de champ selon deux directions X et Y orthogonales. Sur la figure 4a, la surface du réseau réflecteur 11 est partiellement schématisée par des lignes pointillées et quatre éléments rayonnants 20 sont représentés, chaque élément rayonnant 20 comportant un patch métallique de forme carrée. Une source primaire 13 placée en configuration offset, illumine le réseau réflecteur 11 selon une direction oblique faisant un angle Θ par rapport à la direction normale n au réseau réflecteur 11. Le champ électromagnétique incident Einc émis par la source primaire peut être polarisé linéairement, par exemple selon une direction verticale dans un repère orthonormé lié à la source. Du fait de son incidence oblique, le champ incident Einc, polarisé linéairement dans le plan lié à la source, induit, dans un repère XY lié au plan de l'élément rayonnant, un champ incident Ei comportant deux composantes de champ Eix et Eiy selon les deux directions X et Y du plan de l'élément rayonnant, les deux composantes Eix et Eiy correspondant à la projection du champ incident oblique Einc dans le plan du réseau réflecteur. Le réseau réflecteur rayonne alors, selon une direction de propagation principale, un champ électromagnétique réfléchi Er comportant deux composantes de champ Erx et Ery. Le champ incident Einc polarisé linéairement dans le repère lié à la source primaire 13 engendre donc dans un plan XY parallèle au plan du réseau réflecteur 11 , une composante de champ en polarisation croisée. The geometric shape of the etched pattern of each radiating element is usually chosen symmetrical with respect to the two orthogonal axes X and Y of the plane of each radiating element. An isolated symmetrical radiating element does not substantially deprive an incident wave normal to its plane and the associated reflection matrix therefore has very low cross-reflection coefficients, generally less than 30 dB. These levels may increase for an oblique incidence, particularly greater than 40 ° compared to normal. The radiating elements are arranged on the surface of the reflector so as to achieve a specific phase law over the entire surface, in a main polarization corresponding to the polarization emitted by the primary source. The phenomena of depolarization are phenomena considered as parasites which deteriorate the performance of the antenna but they are generally not taken into account when carrying out the arrangement of the reflector network. When the reflector array 11 is illuminated by an oblique incident wave in a linear polarization, it generates a reflected wave having two field components along two orthogonal X and Y directions. In Figure 4a, the surface of the reflector array 11 is partially schematized by dotted lines and four radiating elements 20 are shown, each radiating element 20 having a square-shaped metal patch. A primary source 13 placed in offset configuration, illuminates the reflector network 11 in an oblique direction at an angle Θ with respect to the normal direction n to the reflector network 11. The incident electromagnetic field Einc emitted by the primary source can be polarized linearly by example in a vertical direction in an orthonormal reference linked to the source. Due to its oblique incidence, the incident field Einc, linearly polarized in the plane bound to the source, induces, in an XY coordinate system bound to the plane of the radiating element, an incident field Ei comprising two Eix and Eiy field components according to the two directions X and Y of the plane of the radiating element, the two components Eix and Eiy corresponding to the projection of the oblique incident field Einc in the plane of the reflective network. The reflector network then radiates, according to a main propagation direction, a reflected electromagnetic field Er having two Erx and Ery field components. The incident field Einc polarized linearly in the reference frame linked to the primary source 13 thus generates in XY plane parallel to the plane of the reflector network 11, a cross-polarized field component.
Pour un réseau réflecteur plan et dans la direction normale n au plan du réseau réflecteur, les composantes de polarisation croisées induites au niveau des éléments rayonnants se compensent. Pour une loi de phase imposée pour réaliser un faisceau dans une direction donnée ou une couverture spécifique, comme illustré sur la figure 4b, la direction normale n au plan du réseau réflecteur est généralement différente du plan normal 44 à la direction de propagation 45. Les composantes de polarisation croisées sont alors sommées avec une pondération en phase et ne se compensent plus.  For a plane reflective network and in the normal direction n to the plane of the reflector network, the cross polarization components induced at the level of the radiating elements compensate each other. For a phase law imposed to produce a beam in a given direction or coverage, as illustrated in FIG. 4b, the normal direction n at the plane of the reflector network is generally different from the normal plane 44 to the propagation direction 45. Cross-polarization components are then summed with phase weighting and no longer offset each other.
L'invention consiste donc à synthétiser un réseau réflecteur conformément à l'art antérieur, c'est-à-dire en ne se préoccupant que des diagrammes de rayonnement requis dans les deux poiarisations principales orthogonales et donc en ne s'intéressant qu'aux coefficients de réflexion principaux Rxx et Ryy. Pour que le diagramme de rayonnement du réseau réflecteur soit performant, il est important que les coefficients de réflexion principaux Rxx et Ryy aient des amplitudes proches de 1. L'invention consiste ensuite à perturber faiblement la polarisation induite par au moins un élément rayonnant du réseau réflecteur de manière à compenser les composantes de polarisation croisée induites par le réseau réflecteur. La perturbation à introduire dans les éléments rayonnants est déterminée individuellement, pour chacun des éléments rayonnants du réseau réflecteur. La légère dépolarisation des ondes réfléchies par chaque élément rayonnant correspond à l'apparition, dans le plan du réseau réflecteur, d'un rayonnement en polarisation croisée, à faible amplitude, au niveau des éléments rayonnants individuels. La légère dépolarisation est telle qu'elle permet d'obtenir, dans le plan normal 44 à la direction de propagation 45 des ondes réfléchies par le réseau réflecteur 11 , appelé plan d'ouverture du réseau réflecteur ou plan d'ouverture rayonnante, une distribution de champ électrique sans composante croisée. La dépolarisation introduite doit être faible et ne pas perturber le mode fondamental de rayonnement de l'élément rayonnant, ni sa phase. Par exemple, les coefficients de réflexion croisés introduits par chaque élément rayonnant élémentaire seront préférentiellement inférieurs à -15dB. The invention therefore consists in synthesizing a reflector array according to the prior art, that is to say, only concerned with the radiation patterns required in the two principal poiarizations orthogonal and therefore only interested in the main reflection coefficients Rxx and Ryy. For the radiation pattern of the reflector network to be efficient, it is important for the main reflection coefficients Rxx and Ryy to have amplitudes close to 1. The invention then consists in weakly disturbing the polarization induced by at least one radiating element of the grating. reflector so as to compensate for the cross-polarization components induced by the reflector array. The disturbance to be introduced into the radiating elements is determined individually for each of the radiating elements of the reflector network. The slight depolarization of the waves reflected by each radiating element corresponds to the appearance, in the plane of the reflector array, of low amplitude cross polarization radiation at the level of the individual radiating elements. The slight depolarization is such that it makes it possible to obtain, in the normal plane 44 at the direction of propagation 45, waves reflected by the reflector network 11, called the plane of opening of the reflector network or radiating aperture plane, a distribution of electric field without cross component. The depolarization introduced must be weak and not disturb the fundamental mode of radiation of the radiating element, nor its phase. For example, the cross-reflection coefficients introduced by each elementary radiating element will preferably be less than -15 dB.
Pour estimer la quantité de dépolarisation nécessaire à réaliser sur chaque élément rayonnant individuel, l'invention consiste, dans une première étape, à définir le diagramme de rayonnement du champ électromagnétique lointain 46 désiré et à imposer comme condition de départ, que les composantes de polarisation croisée sont nulles pour ce champ lointain. A ce champ électromagnétique lointain 46 est associé une unique distribution d'un champ électromagnétique proche sur une ouverture rayonnante infinie définie par un plan normal 44 à la direction de propagation 45 des ondes réfléchies par le réseau réflecteur 11. Automatiquement, les composantes de polarisation croisées étant nulles en champ lointain, elles sont également nulles dans un plan normal à la direction de propagation des ondes réfléchies par le réseau réflecteur et sont donc nulles dans le plan d'ouverture 44 du réseau réflecteur 11. A partir du diagramme de rayonnement du champ électromagnétique lointain 46 désiré, il est possible d'en déduire, au moyen d'une transformée de Fourier, les composantes de polarisation principale du champ proche rayonné correspondant, dans le plan d'ouverture 44 du réseau réflecteur, In order to estimate the amount of depolarization required to be performed on each individual radiating element, the invention consists, in a first step, in defining the desired radiation pattern of the far-field electromagnetic field 46 and imposing as a starting condition that the polarization components cross are nil for this far field. To this far-field electromagnetic field 46 is associated a single distribution of a near electromagnetic field on an infinite radiating aperture defined by a normal plane 44 to the direction of propagation 45 of the waves reflected by the reflector network 11. Automatically, the polarization components crossed being zero in the far field, they are also zero in a plane normal to the direction of propagation of the waves reflected by the reflector network and are therefore zero in the opening plane 44 of the reflector array 11. From the radiation pattern of the field distant electromagnetic 46 desired it is possible to deduce therefrom, by means of a Fourier transform, the main polarization components of the corresponding radiated near-field, in the opening plane 44 of the reflector network,
Il est également possible de reconstruire le champ proche rayonné sur une surface limitée correspondant au réseau réflecteur. Pour qu'il y ait équivalence entre le champ proche reconstruit et le champ lointain désiré, il est nécessaire que ie champ proche soit confiné à l'intérieur de la surface du réseau réflecteur.  It is also possible to reconstruct the radiated near field on a limited area corresponding to the reflector network. For there to be equivalence between the reconstructed near field and the desired far field, it is necessary that the near field be confined within the surface of the reflector array.
Dans une deuxième étape, dans le cas général où le pian d'ouverture 44 est différent du plan du réseau réflecteur 11 , l'invention consiste ensuite à calculer, par une technique de rétropropagation, pour chaque élément rayonnant du réseau réflecteur, les composantes du champ électrique rayonné correspondant dans le plan du réseau réflecteur. La technique de rétropropagation consiste en un changement de repère du plan d'ouverture 44 au plan du réseau réflecteur 11. Les composantes du champ électrique rayonné dans le plan du réseau réflecteur sont les composantes Erx et Ery réfléchies par l'élément rayonnant correspondant selon les directions respectives X et Y. La composante Ery est faible mais non nulle si le plan du réseau réflecteur est différent du plan d'ouverture.  In a second step, in the general case where the aperture plane 44 is different from the plane of the reflector array 11, the invention then consists in calculating, by a backpropagation technique, for each radiating element of the reflector network, the components of the radiated electric field corresponding in the plane of the reflector network. The backpropagation technique consists of a change of reference from the plane of aperture 44 to the plane of the reflector network 11. The components of the electric field radiated in the plane of the reflector array are the Erx and Ery components reflected by the corresponding radiating element according to the respective directions X and Y. The Ery component is weak but nonzero if the plane of the reflector array is different from the aperture plane.
Dans une troisième étape, l'invention consiste, à calculer les composantes du champ électrique incident Eix et Eiy induit par la source primaire 13 sur chaque élément rayonnant du réseau réflecteur. Pour une source primaire de type cornet rayonnant, le cornet est défini par un ensemble de coefficients modaux d'ondes sphériques avec lesquels il est possible de calculer le champ rayonné proche ou lointain comme décrit par exemple dans le livre de G. Franceschetti, « Campi Elettromagnetici », Boilati Boringhieri editore s.r.i., Torino 1988 (li edizione), incorporé par référence.  In a third step, the invention consists in calculating the components of the incident electric field Eix and Eiy induced by the primary source 13 on each radiating element of the reflector network. For a primary source of radiating horn type, the horn is defined by a set of modal coefficients of spherical waves with which it is possible to calculate the near or far radiated field as described for example in the book by G. Franceschetti, "Campi Elettromagnetici ", Boilati Boringhieri editore sri, Torino 1988 (li edizione), incorporated by reference.
Dans une quatrième étape, à partir des composantes Erx et Ery déterminées à la deuxième étape et des composantes Eix et Eiy déterminées à la troisième étape, l'invention consiste, pour chaque élément rayonnant, à en déduire les coefficients de réflexion principaux Rxx et Ryy et les coefficients de réflexion croisés Rxy et Ryx correspondants. En effet, les composantes Erx et Ery du champ réfléchi Er engendrées par le réseau réflecteur selon les directions respectives X et Y s'expriment en fonction des composantes Eix et Eiy du champ incident Ei induit par la source par les équations suivantes : In a fourth step, from the Erx and Ery components determined in the second step and the Eix and Eiy components determined in the third step, the invention consists, for each radiating element, in deducing therefrom the principal reflection coefficients Rxx and Ryy. and the corresponding cross reflection coefficients Rxy and Ryx. Indeed, the Erx and Ery components of the reflected field Er generated by the reflector network according to the respective directions X and Y are expressed as a function of the components Eix and Eiy of the incident field Ei induced by the source by the following equations:
Erx = Rxx Eix + Rxy Eiy Ery = Ryx Eix + Ryy Eiy Si l'onde incidente oblique Einc est polarisée selon deux directions principales orthogonales X et Y, les composantes du champ réfléchi engendrées selon les directions X et Y sont reliées au champ incident par deux équations pour la polarisation selon la direction X et deux équations additionnelles pour la polarisation selon la direction Y. Erx = Rxx Eix + Rxy Ery Ery = Ryx Eix + Ryy Eiy If the oblique incident wave Einc is polarized along two orthogonal principal directions X and Y, the reflected field components generated along the X and Y directions are connected to the incident field by two equations for polarization in the X direction and two additional equations for the polarization in the Y direction.
l matrice de réflexion de chaque élément rayonnant du réseau réflecteur comporte donc des coefficients de réflexion Rxx dans la direction X, Ryy dans la direction Y et deux coefficients de réflexion croisés Rxy et Ryx correspondant à une polarisation croisée.  the reflection matrix of each radiating element of the reflector network therefore comprises reflection coefficients Rxx in the X direction, Ryy in the Y direction and two cross-reflection coefficients Rxy and Ryx corresponding to a cross polarization.
Pour que les coefficients de réflexion principaux Rxx et Ryy aient des amplitudes proches de 1 , il est nécessaire que le champ rayonné lointain soit très fortement corrélé au champ rayonné proche reconstruit dans le plan virtuel de l'ouverture rayonnante. C'est la raison pour laquelle l'invention consiste d'abord à synthétiser un réseau réflecteur en ne se préoccupant que des diagrammes de rayonnement requis dans les deux polarisations principales orthogonales selon les directions X et Y et donc en ne s' intéressant qu'aux coefficients de réflexion principaux Rxx et Ryy, puis à perturber faiblement la polarisation d'au moins un élément rayonnant de manière à compenser la polarisation croisée induite par le réseau réflecteur dans la direction de propagation des ondes réfléchies.  For the main reflection coefficients Rxx and Ryy to have amplitudes close to 1, it is necessary for the far-field radiated to be very strongly correlated with the reconstructed near-field in the virtual plane of the radiating aperture. This is the reason why the invention consists first of all in synthesizing a reflector network by only worrying about the radiation diagrams required in the two orthogonal main polarizations along the X and Y directions and therefore only by being interested in to the main reflection coefficients Rxx and Ryy, then to weakly disturb the polarization of at least one radiating element so as to compensate for the cross polarization induced by the reflector array in the direction of propagation of the reflected waves.
En appliquant cette méthode permettant d'estimer la quantité de dépolarisation nécessaire à réaliser sur chaque élément rayonnant individuel, éiément rayonnant par élément rayonnant, des valeurs de coefficients de réflexion principaux et croisés sont déduits pour chacun des éléments rayonnants correspondants. Suivant la position de l'élément rayonnant 20 sur la surface réfléchissante, l'angle d'incidence de l'onde émise par rapport à cet élément rayonnant varie et les coefficients de réflexion croisés varient également. La dépolarisation est d'autant plus importante que l'angle Θ de l'onde incidente par rapport à la direction normale n au réseau réflecteur augmente. By applying this method to estimate the amount of depolarization required to be performed on each individual radiating element, radiating element by radiating element, values of principal and crossed reflection coefficients are deduced for each of the corresponding radiating elements. Depending on the position of the radiating element 20 on the reflecting surface, the angle of incidence of the wave emitted with respect to this radiating element varies and the cross reflection coefficients also vary. The depolarization is all the more important as the angle Θ of the incident wave with respect to the normal direction n to the reflector network increases.
Ainsi, par exemple, dans le cas d'un réseau réflecteur 11 constitué de plusieurs facettes planes, comme représenté sur la figure 4b où le réflecteur comporte trois facettes planes 41 , 42, 43 orientées selon trois plans différents, les composantes Erx et Ery du champ rayonné Er doivent être déterminés pour chaque élément rayonnant, dans le plan XY de la facette à laquelle appartient cet élément rayonnant. Différents repères XY sont donc à considérer selon l'élément rayonnant considéré et la facette dans laquelle il se trouve. La méthode permettant d'estimer la quantité de dépolarisation nécessaire à réaliser sur chaque élément rayonnant individuel doit donc être appliquée facette par facette de façon à reconstruire, selon la méthode présentée ci-dessus, les composantes Erx et Ery du champ rayonné dans le plan XY correspondant à l'élément rayonnant considéré. Un réseau réflecteur synthétisé, conformément à l'art antérieur, en ne s'intéressant qu'aux coefficients de réflexion principaux Rxx et Ryy, comporte généralement, pour des raisons de simplicité de réalisation, des éléments rayonnants ayant un motif gravé symétrique selon leurs axes principaux dans les directions orthogonales X et Y du plan du réseau réflecteur. Dans le cas où les mêmes rayonnements sont requis pour les deux polarisations orthogonales, les éléments rayonnants ont de plus des dimensions identiques selon les directions X et Y.  Thus, for example, in the case of a reflector network 11 consisting of several plane facets, as shown in FIG. 4b, where the reflector comprises three plane facets 41, 42, 43 oriented in three different planes, the Erx and Ery components of Radiated field Er must be determined for each radiating element in the XY plane of the facet to which this radiating element belongs. Different XY references are to be considered according to the radiating element considered and the facet in which it is. The method for estimating the amount of depolarization required to be performed on each individual radiating element must therefore be applied facet by facet so as to reconstruct, according to the method presented above, the Erx and Ery components of the radiated field in the XY plane. corresponding to the radiating element considered. A reflector grating synthesized according to the prior art, focusing only on the main reflection coefficients Rxx and Ryy, generally comprises, for reasons of simplicity of embodiment, radiating elements having a symmetrical etched pattern along their axes. in the orthogonal directions X and Y of the plane of the reflector network. In the case where the same radiation is required for the two orthogonal polarizations, the radiating elements also have identical dimensions along the X and Y directions.
Les dimensions précises des motifs gravés de chaque élément rayonnant sont donc déduites des coefficients principaux Rxx et Ryy. La polarisation croisée est dans l'art antérieur considérée comme subite, même si des artifices ont été proposés pour limiter les effets .  The precise dimensions of the etched patterns of each radiating element are deduced from the main coefficients Rxx and Ryy. Cross polarization is in the prior art considered as sudden, although artifices have been proposed to limit the effects.
Lorsque les composantes Erx et Ery permettant d'éliminer la polarisation croisée ont été déterminées pour tous les éléments rayonnants du réseau réflecteur, l'invention consiste alors à introduire, dans les éléments rayonnants individuels 20 du réseau réflecteur 11 , une dépolarisation contrôlée, différente d'un élément rayonnant à un autre élément rayonnant, permettant d'obtenir la totalité des coefficients de réflexion correspondant aux valeurs souhaitées. Cette dépolarisation introduite individuellement dans les éléments rayonnants est telle qu'elle compense alors ia dépolarisation induite par une onde incidente oblique sur le réseau réflecteur final. When the Erx and Ery components for eliminating cross polarization have been determined for all the radiating elements of the reflector network, the invention then consists in introducing, into the individual radiating elements 20 of the reflector network 11, a depolarization controlled, different from a radiating element to another radiating element, to obtain all the reflection coefficients corresponding to the desired values. This depolarization introduced individually into the radiating elements is such that it then compensates for the depolarization induced by an oblique incident wave on the final reflector grating.
La figure 5a illustre la distribution du champ électrique dans le plan de l'ouverture rayonnante dans le cas où le réseau réflecteur a été synthétisé sans tenir compte des phénomènes parasites liés à la polarisation croisée et où le rayonnement comporte une composante en polarisation croisée, et la figure 5b illustre le cas où le réseau réflecteur a été synthétisé de façon à annuler la composante de polarisation croisée et où le rayonnement est parfaitement polarisé sans composante croisée.  FIG. 5a illustrates the distribution of the electric field in the plane of the radiating aperture in the case where the reflector grating has been synthesized without taking into account parasitic phenomena related to the cross polarization and where the radiation comprises a cross-polarization component, and FIG. 5b illustrates the case where the reflector array has been synthesized so as to cancel the cross-polarization component and the radiation is perfectly polarized without cross-component.
Selon l'invention, la dépolarisation introduite dans au moins un élément rayonnant individuel du réseau réflecteur consiste à briser la symétrie du motif de cet élément rayonnant tout en conservant la même phase des coefficients de réflexions principaux induits par cet élément rayonnant, afin de ne pas perturber son rayonnement dans la polarisation principale. On agit ainsi sur l'amplitude et la phase des coefficients de réflexion croisés. Pour cela, des dissymétries angulaires sont introduites dans les motifs des éléments rayonnants qui engendrent de la polarisation croisée, certains éléments rayonnants n'engendrant pas de polarisation croisée, par exemple ceux situés dans l'axe de symétrie du réseau réflecteur, pouvant rester symétriques. Ces dissymétries angulaires consistent en des inclinaisons angulaires d'au moins une direction principale du motif ou des rotations angulaires des quatre directions principales X, X', Y, Y' des motifs, autour du centre 50 du motif, dans le plan XY. Les rotations angulaires sont réalisées avec des angles qui peuvent être différents ou identiques pour toutes les directions et dans des sens qui peuvent être identiques ou différents. Lorsque plusieurs éléments rayonnants adjacents du réseau réflecteur comportent un motif ayant une forme géométrique dissymétrique par rapport à au moins une direction X et/ou Y du plan XY de ces éléments rayonnants, la dissymétrie du motif de chacun desdits éléments rayonnants est continûment progressive d'un élément rayonnant à un autre élément rayonnant adjacent sur la surface réfléchissante. Un premier exemple représenté sur les figures 6a à 6d concerne le cas d'un élément rayonnant 20 dont le motif géométrique comporte un patch métallique et des fentes gravées dans le patch. Sur la figure 6a, les fentes forment une croix centrale symétrique selon deux directions orthogonales XX' et YY', appelée croix de Jérusalem. La croix comporte quatre branches principales 62, 63, 64, 65, opposées deux à deux, orientées respectivement selon les directions X, X', Y, Y', chaque branche principale comportant une extrémité pourvue d'une extension perpendiculaire. La matrice de réflexion 60 de cet élément rayonnant symétrique est telle que les coefficients de réflexion principaux sont d'amplitudes égales et proches de la valeur maximum 1 , correspondant à OdB, et les coefficients de réflexion croisés ont des amplitudes très faibles, typiquement de l'ordre de -29dB. La matrice de réflexion souhaitée 61 comporte des coefficients de réflexion principaux très peu modifiés par rapport à ceux de l'élément symétrique et des coefficients de réflexion croisés légèrement dégradés, ayant une amplitude de l'ordre de -21dB, cette amplitude dégradée étant cependant toujours située à un niveau correspondant à du bruit. Sur les figures 6b, 6c, 6d, chaque branche principale de la croix centrale a subi différents types de rotations angulaires par rapport au centre 50 de l'élément rayonnant. Les rotations angulaires consistent à modifier l'inclinaison de chacune des branches principales, indépendamment l'une de l'autre, d'un angle différent et dans un sens positif ou négatif. According to the invention, the depolarization introduced into at least one individual radiating element of the reflector network consists in breaking the symmetry of the pattern of this radiating element while maintaining the same phase of the principal reflection coefficients induced by this radiating element, in order not to disrupt its radiation in the main polarization. This affects the amplitude and phase of the cross-reflection coefficients. For this, angular dissymmetries are introduced into the patterns of the radiating elements that generate cross polarization, some radiating elements do not generate cross polarization, for example those located in the axis of symmetry of the reflector network may remain symmetrical. These angular dissymmetries consist of angular inclinations of at least one main direction of the pattern or angular rotations of the four principal directions X, X ', Y, Y' of the patterns, around the center 50 of the pattern, in the XY plane. The angular rotations are made with angles that may be different or identical for all directions and in directions that may be the same or different. When several adjacent radiating elements of the reflector array comprise a pattern having an asymmetric geometric shape with respect to at least one X and / or Y direction of the XY plane of these radiating elements, the dissymmetry of the pattern of each of said radiating elements is continuously progressive. a radiating element to another radiating element adjacent to the reflecting surface. A first example shown in Figures 6a to 6d relates to the case of a radiating element 20 whose geometric pattern comprises a metal patch and slots engraved in the patch. In Figure 6a, the slots form a central symmetrical cross in two orthogonal directions XX 'and YY', called Jerusalem Cross. The cross comprises four main branches 62, 63, 64, 65, opposite in pairs, respectively oriented along the directions X, X ', Y, Y', each main branch having an end provided with a perpendicular extension. The reflection matrix 60 of this symmetrical radiating element is such that the main reflection coefficients are of equal amplitudes and close to the maximum value 1, corresponding to OdB, and the crossed reflection coefficients have very small amplitudes, typically order of -29dB. The desired reflection matrix 61 has main reflection coefficients that are very slightly modified with respect to those of the symmetrical element and slightly degraded cross reflection coefficients, having an amplitude of the order of -21 dB, this degraded amplitude being, however, always located at a level corresponding to noise. In FIGS. 6b, 6c, 6d, each main branch of the central cross has undergone different types of angular rotations relative to the center 50 of the radiating element. The angular rotations consist in modifying the inclination of each of the main branches, independently of one another, by a different angle and in a positive or negative direction.
Dans les deux configurations 20a, 20b de la figure 6b, les branches principales de la croix situées selon des directions diamétralement opposées XX', YY' ont été inclinées simultanément, d'un même angle, l'inclinaison étant dans un sens positif pour deux branches opposées et dans un sens négatif pour les deux autres branches. Les diagrammes d'amplitude et de phase des coefficients de réflexion croisés correspondants montrent que cette configuration a un fort impact sur l'amplitude des coefficients de réflexion croisés alors que leur phase, modulo 180°, n'évolue pas lorsque l'angle d'inclinaison des branches principales de la croix varie entre -10° et +10°.  In the two configurations 20a, 20b of FIG. 6b, the main branches of the cross situated in diametrically opposite directions XX ', YY' have been inclined simultaneously, at the same angle, the inclination being in a positive direction for two opposite branches and in a negative direction for the other two branches. The amplitude and phase diagrams of the corresponding cross-reflection coefficients show that this configuration has a strong impact on the amplitude of the cross-reflection coefficients whereas their phase, modulo 180 °, does not change when the angle of Tilt of the main branches of the cross varies between -10 ° and + 10 °.
Dans les deux configurations 20c, 20d de la figure 6c, les quatre branches principales de la croix sont inclinées indépendamment les unes des autres d'un même angle, les branches situées selon des directions diamétralement opposées étant inclinées dans des sens opposés mais deux branches successives étant inclinées dans un même sens. Les diagrammes d'amplitude et de phase des coefficients de réflexion croisés correspondants montrent que cette configuration a peu d'impact sur l'amplitude des coefficients de réflexion croisés lorsque l'angle d'inclinaison des branches principales de la croix varie entre -4° et +4° alors que leur phase évolue beaucoup. In the two configurations 20c, 20d of FIG. 6c, the four main branches of the cross are inclined independently of each other at the same angle, the branches located in directions diametrically opposed being inclined in opposite directions but two successive branches being inclined in the same direction. The amplitude and phase diagrams of the corresponding cross-reflection coefficients show that this configuration has little impact on the amplitude of the cross-reflection coefficients when the angle of inclination of the main branches of the cross varies between -4 ° and + 4 ° while their phase evolves a lot.
Les deux configurations 20f, 20g de la figure 6d, les quatre branches principales de la croix sont inclinées indépendamment les unes des autres d'un même angle, les branches situées selon des directions diamétralement opposées étant inclinées dans des sens opposés comme sur la figure 6c mais le sens d'inclinaison de deux branches opposées est inversé. Les diagrammes d'amplitude et de phase des coefficients de réflexion croisés correspondants montrent que cette configuration a beaucoup d'impact sur l'amplitude des coefficients de réflexion croisés lorsque l'angle d'inclinaison des branches principales de la croix varie entre -10° et +10° alors que leur phase n'évolue pas.  The two configurations 20f, 20g of Figure 6d, the four main branches of the cross are inclined independently of each other at the same angle, the branches located in diametrically opposite directions being inclined in opposite directions as in Figure 6c but the direction of inclination of two opposite branches is reversed. The amplitude and phase diagrams of the corresponding cross-reflection coefficients show that this configuration has a great impact on the amplitude of the cross-reflection coefficients when the angle of inclination of the main branches of the cross varies between -10 °. and + 10 ° whereas their phase does not evolve.
La figure 6e montre un exemple d'élément rayonnant 20i optimisé dont la matrice de réflexion est très proche de la matrice souhaitée 61 indiquée sur la figure 6a. Cet élément rayonnant 20i comporte deux branches formant un angle de 9,35° respectivement dans un sens de rotation négatif et dans un sens de rotation positif par rapport aux directions Y et X, et deux branches formant un angle de 6,65° respectivement dans un sens de rotation négatif et dans un sens de rotation positif par rapport aux directions X' et Y'.  FIG. 6e shows an example of an optimized radiating element 20i whose reflection matrix is very close to the desired matrix 61 indicated in FIG. 6a. This radiating element 20i has two branches forming an angle of 9.35 ° respectively in a negative direction of rotation and in a direction of positive rotation with respect to the directions Y and X, and two branches forming an angle of 6.65 ° respectively in a negative direction of rotation and in a direction of positive rotation with respect to the directions X 'and Y'.
Les différents exemples de rotation des figures 6a à 6e montrent donc qu'il est possible en réglant l'angle d'inclinaison des quatre branches d'une croix orientées selon des directions principales de l'élément rayonnant, de contrôler l'amplitude et la phase des coefficients de réflexion croisés et donc la dépolarisation de cet élément rayonnant.  The different examples of rotation of FIGS. 6a to 6e thus show that it is possible by adjusting the angle of inclination of the four branches of a cross oriented along principal directions of the radiating element, to control the amplitude and the phase of the cross-reflection coefficients and thus the depolarization of this radiating element.
La figure 7 concerne un ensemble d'éléments rayonnants symétriques successifs comportant une phase continûment évolutive entre deux éléments rayonnants consécutifs, chaque élément rayonnant 20 comportant un motif constitué d'un patch métallique de forme carrée et d'une ouverture rayonnante pratiquée dans le patch métallique. Les dimensions respectives du patch métallique par rapport à l'ouverture rayonnante sont continûment évolutives d'un élément rayonnant à un autre élément rayonnant adjacent ce qui permet de disposer d'un grand nombre de phases différentes entre 0° et 360°, modulo 360° à répartir sur un réseau réflecteur en fonction de la loi de phase rayonnée désirée. Les différentes phases successives sont obtenues sans rupture brusque des dimensions du patch par rapport à l'ouverture rayonnante grâce à l'apparition de l'ouverture rayonnante au centre du patch métallique et à l'augmentation progressive des dimensions de l'ouverture rayonnante jusqu'à la disparition dudit patch métallique puis à l'apparition au centre de l'ouverture rayonnante d'un nouveau patch métallique dont les dimensions augmentent progressivement jusqu'à la disparition de l'ouverture rayonnante. FIG. 7 relates to a set of successive symmetrical radiating elements comprising a continuously evolutive phase between two consecutive radiating elements, each radiating element comprising a pattern consisting of a square-shaped metal patch and a radiating opening made in the metal patch. . The respective dimensions of the metal patch with respect to the radiating aperture are continuously evolving from one radiating element to another adjacent radiating element, which makes it possible to have a large number of different phases between 0 ° and 360 °, modulo 360 ° to be distributed on a reflector network according to the radiated phase law desired. The different successive phases are obtained without abrupt rupture of the dimensions of the patch relative to the radiating aperture due to the appearance of the radiating aperture in the center of the metal patch and the gradual increase in the dimensions of the radiating aperture to the disappearance of said metal patch and the appearance in the center of the radiating opening of a new metal patch whose dimensions gradually increase until the disappearance of the radiating opening.
En modifiant l'angle d'inclinaison de deux côtés opposés du patch métallique de chacun de ces éléments rayonnants de façon à transformer la forme carrée en trapèze, il est possible de contrôler la phase des coefficients de réflexion croisés de ces éléments rayonnants sans modifier sensiblement les coefficients de réflexion principaux. Les figures 8a et 8b montrent les diagrammes d'évolution de la phase et de l'amplitude des coefficients de réflexion croisés pour un élément rayonnant soumis à une onde incidente oblique et comportant deux côtés inclinés 81 , 82 ou 83, 84 selon des directions opposées de manière à former un trapèze, l'angle d'inclinaison des côtés variant entre -10° et +10° par rapport à la direction YY' pour la figure 8a ou par rapport à la direction XX' pour la figure 8b. Dans ces deux figures, l'amplitude des coefficients de réflexion croisés varie très faiblement alors que la phase évolue beaucoup.  By modifying the angle of inclination of two opposite sides of the metal patch of each of these radiating elements so as to transform the square shape into a trapezoid, it is possible to control the phase of the cross-reflection coefficients of these radiating elements without substantially modifying the main reflection coefficients. FIGS. 8a and 8b show the evolution diagrams of the phase and the amplitude of the cross-reflection coefficients for a radiating element subjected to an oblique incident wave and comprising two inclined sides 81, 82 or 83, 84 in opposite directions. so as to form a trapezium, the angle of inclination of the sides varying between -10 ° and + 10 ° with respect to the direction YY 'for Figure 8a or with respect to the direction XX' for Figure 8b. In these two figures, the amplitude of the crossed reflection coefficients varies very little while the phase evolves a lot.
Les figures 10a et 10b montrent d'autres diagrammes d'évolution de la phase et de l'amplitude des coefficients de réflexion croisés lorsque deux côtés opposés sont inclinés d'un même angle selon une même direction de façon à obtenir un parallélogramme. Bien que l'invention ait été décrite en liaison avec des modes de réalisation particuliers, il est bien évident qu'elle n'y est nullement limitée et qu'elle comprend tous les équivalents techniques des moyens décrits ainsi que leurs combinaisons si celles-ci entrent dans le cadre de l'invention.  FIGS. 10a and 10b show other diagrams of evolution of the phase and the amplitude of the crossed reflection coefficients when two opposite sides are inclined at the same angle in the same direction so as to obtain a parallelogram. Although the invention has been described in connection with particular embodiments, it is obvious that it is not limited thereto and that it includes all the technical equivalents of the means described and their combinations if they are within the scope of the invention.

Claims

REVENDICATIONS
Antenne réseau réflecteur à compensation de polarisation croisée comportant un réseau réflecteur (11 ) constitué d'une pluralité d'éléments rayonnants élémentaires (20) régulièrement répartis et formant une surface réfléchissante et une source primaire (13) destinée à illuminer le réseau réflecteur (11), le réseau réflecteur (11) ayant un diagramme de rayonnement selon deux polarisations principales orthogonales dans une direction de propagation choisie (45) avec une loi de phase choisie, chaque élément rayonnant élémentaire (20) étant réalisé en technologie planaire et comportant un motif gravé constitué d'au moins un patch métallique (15) et/ou d'au moins une fente rayonnante (18), le patch métallique comportant, dans une configuration symétrique, au moins quatre côtés opposés deux à deux par rapport à un centre (50) du motif gravé et disposés parallèlement à deux directions X, Y du plan XY de l'élément rayonnant (20), la fente rayonnante comportant, dans une configuration symétrique de l'élément rayonnant, au moins deux branches diamétralement opposées par rapport au centre (50) du motif gravé et disposées parallèlement à au moins l'une des directions X et/ou Y de l'élément rayonnant (20) caractérisée en ce qu'au moins un élément rayonnant (20) du réseau réflecteur (11 ) comporte un motif gravé ayant une forme géométrique dissymétrique par rapport à au moins l'une des directions X et/ou Y du plan XY de l'élément rayonnant (20), la dissymétrie du motif gravé de l'élément rayonnant (20) consistant en une inclinaison angulaire d'au moins un côté, respectivement d'au moins une branche, de la forme géométrique du motif gravé par rapport aux directions X et/ou Y du plan de l'élément rayonnant. A cross-polarization compensating reflector array antenna having a reflector array (11) consisting of a plurality of evenly distributed elementary radiating elements (20) forming a reflecting surface and a primary source (13) for illuminating the reflector array (11). ), the reflector array (11) having a radiation pattern according to two orthogonal main polarizations in a chosen propagation direction (45) with a chosen phase law, each elementary radiating element (20) being made in planar technology and having a pattern engraved consisting of at least one metal patch (15) and / or at least one radiating slot (18), the metal patch comprising, in a symmetrical configuration, at least four opposite sides two by two with respect to a center ( 50) of the engraved pattern and arranged parallel to two X, Y directions of the XY plane of the radiating element (20), the radiating slot comprising, in a symmetrical configuration of the radiating element, at least two diametrically opposite branches with respect to the center (50) of the etched pattern and arranged parallel to at least one of the X and / or Y directions of the radiating element ( 20) characterized in that at least one radiating element (20) of the reflector array (11) comprises an engraved pattern having an asymmetrical geometric shape with respect to at least one of the X and / or Y directions of the XY plane of the radiating element (20), the asymmetry of the etched pattern of the radiating element (20) consisting of an angular inclination of at least one side, or at least one branch, of the geometric shape of the etched pattern with respect to X and / or Y directions of the plane of the radiating element.
Antenne selon la revendication 1 , caractérisée en ce que, dans le cas d'un motif gravé comportant un patch métallique et au moins deux fentes gravées dans le patch métallique, les fentes formant au moins quatre branches principales (62, 63, 64, 65) orientées respectivement, deux à deux, parallèlement aux directions X et Y dans une configuration symétrique de l'élément rayonnant, les dissymétries angulaires consistent en des rotations angulaires des quatre branches principales des fentes, autour du centre (50) du motif gravé, dans le plan XY. Antenna according to claim 1, characterized in that, in the case of an engraved pattern comprising a metal patch and at least two slots etched in the metal patch, the slots forming at least four main branches (62, 63, 64, 65 ) oriented respectively, two by two, parallel to the X and Y directions in a configuration symmetrical to the radiating element, the angular dissymmetries consist of angular rotations of the four main branches of the slots, around the center (50) of the engraved pattern, in the XY plane.
Antenne selon la revendication 1 , caractérisée en ce que dans le cas d'un motif gravé comportant, dans une configuration symétrique, un patch métallique ayant une forme géométrique carrée, les dissymétries angulaires consistent en une inclinaison angulaire d'au moins deux côtés opposés (81 , 82), (83, 84) du patch métallique des éléments rayonnants dans un même sens ou dans des sens opposés de façon à transformer la forme carrée respectivement en trapèze ou en parallélogramme. Antenna according to claim 1, characterized in that in the case of an engraved pattern comprising, in a symmetrical configuration, a metallic patch having a square geometrical shape, the angular dissymmetries consist of an angular inclination of at least two opposite sides ( 81, 82), (83, 84) of the metal patch of the radiating elements in the same direction or in opposite directions so as to transform the square shape respectively trapezoidal or parallelogram.
Antenne selon l'une des revendications précédentes, caractérisée en ce que plusieurs éléments rayonnants adjacents du réseau réflecteur (11 ) comportent un motif gravé ayant une forme géométrique dissymétrique par rapport à au moins une direction X et/ou Y du plan XY de chacun desdits éléments rayonnants, les inclinaisons angulaires du côté ou de la branche de la forme géométrique du motif gravé de chacun desdits éléments rayonnants formant un angle de valeur continûment progressive d'un élément rayonnant à un autre élément rayonnant adjacent sur la surface réfléchissante. Antenna according to one of the preceding claims, characterized in that a plurality of adjacent radiating elements of the reflector array (11) comprise an engraved pattern having an asymmetrical geometric shape with respect to at least one X and / or Y direction of the XY plane of each of said radiating elements, the angular inclinations of the side or branch of the geometric shape of the etched pattern of each of said radiating elements forming a continuously progressive value angle of a radiating element to another radiating element adjacent to the reflecting surface.
Antenne selon l'une des revendications précédentes, caractérisée en ce que le réseau réflecteur (11 ) comporte plusieurs facettes planes (41 , 42, 43) orientées selon des plans différents, chaque facette plane comportant une pluralité d'éléments rayonnants élémentaires, et en ce qu'au moins un élément rayonnant de chaque facette plane du réseau réflecteur comporte un motif gravé ayant une forme géométrique dissymétrique par rapport à au moins une direction X et/ou Y du plan XY de la facette à laquelle appartient l'élément rayonnant correspondant. Antenna according to one of the preceding claims, characterized in that the reflector array (11) comprises a plurality of plane facets (41, 42, 43) oriented in different planes, each plane facet comprising a plurality of elementary radiating elements, and at least one radiating element of each plane facet of the reflector array comprises an engraved pattern having an asymmetric geometric shape with respect to at least one X and / or Y direction of the XY plane of the facet to which the corresponding radiating element belongs; .
Procédé de réalisation d'une antenne réseau réflecteur à compensation de polarisation croisée consistant à réaliser un réseau réflecteur (11 ) constitué d'une pluralité d'éléments rayonnants élémentaires (20) régulièrement répartis et formant une surface réfléchissante et à illuminer le réseau réflecteur (11 ) par une source primaire (13), caractérisé en ce qu'il consiste à élaborer un réseau réflecteur dans lequel chaque élément rayonnant élémentaire est réalisé en technologie planaire et comporte un motif gravé ayant une forme géométrique symétrique par rapport à deux directions X et Y du plan XY de l'élément rayonnant, le motif gravé étant constitué d'au moins un patch métallique (15) et/ou d'au moins une fente rayonnante (18), puis en ce qu'il consiste à introduire une dissymétrie, par rapport à au moins l'une des directions X et/ou Y, dans la forme géométrique du motif gravé d'au moins un élément rayonnant (20) du réseau réflecteur (11 ), la dissymétrie étant calculée à partir du diagramme de rayonnement du champ électromagnétique lointain désiré dans lequel la polarisation croisée est nulle et à partir du champ électrique rayonné correspondant dans le plan du réseau réflecteur (11 ). Method for producing a cross-polarization compensation reflector array antenna comprising providing a reflector array (11) consisting of a plurality of elementary radiating elements (20) regularly distributed and forming a reflective surface and illuminating the reflector network (11) by a primary source (13), characterized in that it consists in developing a reflector network in wherein each elementary radiating element is made of planar technology and comprises an etched pattern having a symmetrical geometric shape with respect to two X and Y directions of the XY plane of the radiating element, the etched pattern consisting of at least one metal patch ( 15) and / or at least one radiating slot (18), then in that it consists in introducing an asymmetry, with respect to at least one of the directions X and / or Y, in the geometric shape of the pattern engraved with at least one radiating element (20) of the reflector array (11), the asymmetry being calculated from the radiation pattern of the desired far-field electromagnetic field in which the polar cross isation is zero and from the corresponding radiated electric field in the plane of the reflector network (11).
7. Procédé selon la revendication 6, caractérisé en ce que le calcul de la dissymétrie à introduire dans l'élément rayonnant consiste: 7. Method according to claim 6, characterized in that the calculation of the asymmetry to be introduced into the radiating element consists of:
dans une première étape, à partir du diagramme de rayonnement du champ électromagnétique lointain désiré dans lequel la polarisation croisée est nulle, à déduire les composantes de polarisation principale et croisées du champ électrique rayonné Er dans le plan normal (44) à la direction de propagation (45) des ondes réfléchies par le réseau réflecteur (11 ),  in a first step, from the radiation pattern of the desired far-field electromagnetic field in which the cross polarization is zero, to deduce the main and cross-polarization components of the radiated electric field Er in the normal plane (44) to the direction of propagation (45) waves reflected by the reflector array (11),
dans une deuxième étape, à calculer, pour chaque élément rayonnant (20) du réseau réflecteur (11 ), les composantes Erx et Ery du champ électrique rayonné correspondant dans le plan du réseau réflecteur (11),  in a second step, calculating, for each radiating element (20) of the reflector array (11), the Erx and Ery components of the corresponding radiated electric field in the plane of the reflector array (11),
dans une troisième étape, à calculer les composantes Eix et Eiy du champ électrique incident Ei induit par la source primaire sur chaque élément rayonnant (20) du réseau réflecteur (11 ), dans une quatrième étape, à partir des composantes Erx, Ery, Eix et Eiy déterminées à la deuxième et à la troisième étape, à en déduire des valeurs des coefficients de réflexion principaux Rxx, Ryy et croisés Rxy, Ryx souhaités qui doivent être induits par l'élément rayonnant (20) dissymétrique correspondant. in a third step, calculating the components Eix and Eiy of the incident electric field Ei induced by the primary source on each radiating element (20) of the reflector array (11), in a fourth step, from the Erx, Ery, Eix and Eiy components determined in the second and third steps, to deduce values of the main reflection coefficients Rxx, Ryy and crossed Rxy, Ryx desired that must be induced by the corresponding dissymmetrical radiating element (20).
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JP6057380B2 (en) 2017-01-11
FR2957719A1 (en) 2011-09-23
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US20130099990A1 (en) 2013-04-25
WO2011113650A2 (en) 2011-09-22
ES2795045T3 (en) 2020-11-20
KR101780842B1 (en) 2017-10-10
EP2548261B1 (en) 2020-03-25
CA2793126C (en) 2019-11-12
US9112281B2 (en) 2015-08-18
RU2012144440A (en) 2014-04-27
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JP2013543283A (en) 2013-11-28
FR2957719B1 (en) 2013-05-10

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