EP2502317A4 - Erweiterte laserwellenlängensteuerung - Google Patents
Erweiterte laserwellenlängensteuerung Download PDFInfo
- Publication number
- EP2502317A4 EP2502317A4 EP10831986.4A EP10831986A EP2502317A4 EP 2502317 A4 EP2502317 A4 EP 2502317A4 EP 10831986 A EP10831986 A EP 10831986A EP 2502317 A4 EP2502317 A4 EP 2502317A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- laser wavelength
- wavelength control
- advanced laser
- advanced
- control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Lasers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/620,967 US8254420B2 (en) | 2009-11-18 | 2009-11-18 | Advanced laser wavelength control |
PCT/US2010/055372 WO2011062772A1 (en) | 2009-11-18 | 2010-11-04 | Advanced laser wavelength control |
Publications (3)
Publication Number | Publication Date |
---|---|
EP2502317A1 EP2502317A1 (de) | 2012-09-26 |
EP2502317A4 true EP2502317A4 (de) | 2017-01-04 |
EP2502317B1 EP2502317B1 (de) | 2019-10-16 |
Family
ID=44011262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP10831986.4A Not-in-force EP2502317B1 (de) | 2009-11-18 | 2010-11-04 | Erweiterte laserwellenlängensteuerung |
Country Status (7)
Country | Link |
---|---|
US (1) | US8254420B2 (de) |
EP (1) | EP2502317B1 (de) |
JP (1) | JP5986927B2 (de) |
KR (1) | KR101772608B1 (de) |
CN (1) | CN102576974B (de) |
TW (1) | TWI440269B (de) |
WO (1) | WO2011062772A1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9261794B1 (en) | 2014-12-09 | 2016-02-16 | Cymer, Llc | Compensation for a disturbance in an optical source |
US10816905B2 (en) * | 2015-04-08 | 2020-10-27 | Cymer, Llc | Wavelength stabilization for an optical source |
US9785050B2 (en) | 2015-06-26 | 2017-10-10 | Cymer, Llc | Pulsed light beam spectral feature control |
US9762023B2 (en) * | 2015-12-21 | 2017-09-12 | Cymer, Llc | Online calibration for repetition rate dependent performance variables |
US10727642B2 (en) | 2015-12-21 | 2020-07-28 | Cymer, Llc | Online calibration for repetition rate dependent performance variables |
US10036963B2 (en) | 2016-09-12 | 2018-07-31 | Cymer, Llc | Estimating a gain relationship of an optical source |
US10096967B2 (en) * | 2016-12-07 | 2018-10-09 | Cymer, Llc | Wavelength control system for pulse-by-pulse wavelength target tracking in DUV light source |
JP7325452B2 (ja) * | 2019-01-29 | 2023-08-14 | ギガフォトン株式会社 | レーザ装置の波長制御方法及び電子デバイスの製造方法 |
US12008478B2 (en) | 2019-10-18 | 2024-06-11 | Unlearn.AI, Inc. | Systems and methods for training generative models using summary statistics and other constraints |
US12020789B1 (en) * | 2023-02-17 | 2024-06-25 | Unlearn.AI, Inc. | Systems and methods enabling baseline prediction correction |
US11868900B1 (en) | 2023-02-22 | 2024-01-09 | Unlearn.AI, Inc. | Systems and methods for training predictive models that ignore missing features |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
JP2008098282A (ja) * | 2006-10-10 | 2008-04-24 | Komatsu Ltd | 狭帯域化レーザのスペクトル幅調整装置 |
US20080232408A1 (en) * | 2006-02-17 | 2008-09-25 | Cymer, Inc. | Method and apparatus for stabilizing and tuning the bandwidth of laser light |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5856991A (en) * | 1997-06-04 | 1999-01-05 | Cymer, Inc. | Very narrow band laser |
US6393037B1 (en) * | 1999-02-03 | 2002-05-21 | Lambda Physik Ag | Wavelength selector for laser with adjustable angular dispersion |
US6493374B1 (en) * | 1999-09-03 | 2002-12-10 | Cymer, Inc. | Smart laser with fast deformable grating |
US6882674B2 (en) * | 1999-12-27 | 2005-04-19 | Cymer, Inc. | Four KHz gas discharge laser system |
US6563128B2 (en) * | 2001-03-09 | 2003-05-13 | Cymer, Inc. | Base stabilization system |
US6914919B2 (en) * | 2000-06-19 | 2005-07-05 | Cymer, Inc. | Six to ten KHz, or greater gas discharge laser system |
US6704340B2 (en) * | 2001-01-29 | 2004-03-09 | Cymer, Inc. | Lithography laser system with in-place alignment tool |
US7366219B2 (en) * | 2004-11-30 | 2008-04-29 | Cymer, Inc. | Line narrowing module |
US7450623B2 (en) * | 2005-04-12 | 2008-11-11 | Eric G. Johnson | Wavelength locked laser including integrated wavelength selecting total internal reflection (TIR) structure |
US7778302B2 (en) * | 2005-11-01 | 2010-08-17 | Cymer, Inc. | Laser system |
US7885309B2 (en) * | 2005-11-01 | 2011-02-08 | Cymer, Inc. | Laser system |
US7852889B2 (en) * | 2006-02-17 | 2010-12-14 | Cymer, Inc. | Active spectral control of DUV light source |
JP2008171961A (ja) | 2007-01-10 | 2008-07-24 | Nikon Corp | レーザ装置、露光方法及び装置、並びにデバイス製造方法 |
JP4972427B2 (ja) * | 2007-02-15 | 2012-07-11 | 株式会社小松製作所 | 高繰返し動作が可能で狭帯域化効率の高いエキシマレーザ装置 |
-
2009
- 2009-11-18 US US12/620,967 patent/US8254420B2/en active Active
-
2010
- 2010-11-04 KR KR1020127008231A patent/KR101772608B1/ko active IP Right Grant
- 2010-11-04 EP EP10831986.4A patent/EP2502317B1/de not_active Not-in-force
- 2010-11-04 WO PCT/US2010/055372 patent/WO2011062772A1/en active Application Filing
- 2010-11-04 CN CN201080044947.2A patent/CN102576974B/zh active Active
- 2010-11-04 JP JP2012539934A patent/JP5986927B2/ja active Active
- 2010-11-15 TW TW099139188A patent/TWI440269B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6192064B1 (en) * | 1997-07-01 | 2001-02-20 | Cymer, Inc. | Narrow band laser with fine wavelength control |
US20080232408A1 (en) * | 2006-02-17 | 2008-09-25 | Cymer, Inc. | Method and apparatus for stabilizing and tuning the bandwidth of laser light |
JP2008098282A (ja) * | 2006-10-10 | 2008-04-24 | Komatsu Ltd | 狭帯域化レーザのスペクトル幅調整装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2013511842A (ja) | 2013-04-04 |
TW201140968A (en) | 2011-11-16 |
WO2011062772A1 (en) | 2011-05-26 |
TWI440269B (zh) | 2014-06-01 |
EP2502317A1 (de) | 2012-09-26 |
CN102576974B (zh) | 2014-12-03 |
JP5986927B2 (ja) | 2016-09-06 |
EP2502317B1 (de) | 2019-10-16 |
CN102576974A (zh) | 2012-07-11 |
US20110116522A1 (en) | 2011-05-19 |
KR20120092581A (ko) | 2012-08-21 |
US8254420B2 (en) | 2012-08-28 |
KR101772608B1 (ko) | 2017-08-29 |
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Owner name: CYMER, LLC |
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