EP2471150A4 - Commande spectrale active d'une source optique - Google Patents

Commande spectrale active d'une source optique Download PDF

Info

Publication number
EP2471150A4
EP2471150A4 EP10814059.1A EP10814059A EP2471150A4 EP 2471150 A4 EP2471150 A4 EP 2471150A4 EP 10814059 A EP10814059 A EP 10814059A EP 2471150 A4 EP2471150 A4 EP 2471150A4
Authority
EP
European Patent Office
Prior art keywords
optical source
spectral control
active spectral
active
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP10814059.1A
Other languages
German (de)
English (en)
Other versions
EP2471150A1 (fr
EP2471150B1 (fr
Inventor
Nakgeuon Seong
Ivan B. Lalovic
Nigel R. Farrar
Robert J. Rafac
Joseph J. Bendik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer LLC
Original Assignee
Cymer LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer LLC filed Critical Cymer LLC
Publication of EP2471150A1 publication Critical patent/EP2471150A1/fr
Publication of EP2471150A4 publication Critical patent/EP2471150A4/fr
Application granted granted Critical
Publication of EP2471150B1 publication Critical patent/EP2471150B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
EP10814059.1A 2009-08-25 2010-08-24 Commande spectrale active d'une source optique Active EP2471150B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23684809P 2009-08-25 2009-08-25
US12/860,288 US8520186B2 (en) 2009-08-25 2010-08-20 Active spectral control of optical source
PCT/US2010/002320 WO2011028246A1 (fr) 2009-08-25 2010-08-24 Commande spectrale active d'une source optique

Publications (3)

Publication Number Publication Date
EP2471150A1 EP2471150A1 (fr) 2012-07-04
EP2471150A4 true EP2471150A4 (fr) 2017-12-27
EP2471150B1 EP2471150B1 (fr) 2019-01-23

Family

ID=43649552

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10814059.1A Active EP2471150B1 (fr) 2009-08-25 2010-08-24 Commande spectrale active d'une source optique

Country Status (7)

Country Link
US (1) US8520186B2 (fr)
EP (1) EP2471150B1 (fr)
JP (1) JP5395269B2 (fr)
KR (1) KR101576109B1 (fr)
CN (1) CN102484350B (fr)
TW (1) TWI427878B (fr)
WO (1) WO2011028246A1 (fr)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101486372B1 (ko) 2007-07-25 2015-01-26 엘지전자 주식회사 디지털 방송 시스템 및 데이터 처리 방법
US8624209B1 (en) * 2013-03-14 2014-01-07 Cymer, Llc Controlling spatial properties in an excimer ring amplifier
US9715180B2 (en) * 2013-06-11 2017-07-25 Cymer, Llc Wafer-based light source parameter control
JP2016122676A (ja) * 2014-12-24 2016-07-07 株式会社アドバンテスト 露光装置および露光方法
CN104658942A (zh) * 2015-03-13 2015-05-27 合肥京东方光电科技有限公司 关键尺寸测量设备的光源亮度调整系统和方法
NL2014572B1 (en) * 2015-04-01 2017-01-06 Suss Microtec Lithography Gmbh Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device.
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
CN106502055B (zh) * 2015-09-06 2019-04-19 中芯国际集成电路制造(上海)有限公司 光刻失焦的检测方法
WO2017102321A1 (fr) * 2015-12-14 2017-06-22 Cymer, Llc Optimisation de source et de largeur de bande pour dispositifs de placement de motifs existants et nouveaux
US10345714B2 (en) * 2016-07-12 2019-07-09 Cymer, Llc Lithography optics adjustment and monitoring
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US9989866B2 (en) * 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9835959B1 (en) * 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
US10451890B2 (en) * 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
US9966725B1 (en) 2017-03-24 2018-05-08 Cymer, Llc Pulsed light beam spectral feature control
DE102017115365B4 (de) 2017-07-10 2020-10-15 Carl Zeiss Smt Gmbh Inspektionsvorrichtung für Masken für die Halbleiterlithographie und Verfahren
WO2019079010A1 (fr) 2017-10-19 2019-04-25 Cymer, Llc Formation de multiples images aériennes en un seul passage d'exposition lithographique
WO2019103299A1 (fr) * 2017-11-23 2019-05-31 주식회사 프로텍 Appareil à laser pour système d'électronique imprimée et son procédé de fonctionnement
CN114997408A (zh) * 2018-06-14 2022-09-02 诺威有限公司 半导体度量方法和半导体度量系统
WO2022039898A1 (fr) * 2020-08-18 2022-02-24 Cymer, Llc Appareil et procédé de planification d'étalonnage prédictif

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030090643A1 (en) * 2001-11-13 2003-05-15 Canon Kabushiki Kaisha Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility
JP2007305611A (ja) * 2006-05-08 2007-11-22 Sony Corp 露光装置
US20070273852A1 (en) * 2005-07-01 2007-11-29 Nikon Corporation Exposure Apparatus, Exposure Method, Device Manufacturing Method, and System

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4678917A (en) 1985-02-19 1987-07-07 The Perkin-Elmer Corporation Instantaneous reading multichannel polychromatic spectrophotometer method and apparatus
US4937619A (en) * 1986-08-08 1990-06-26 Hitachi, Ltd. Projection aligner and exposure method
JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5303002A (en) * 1993-03-31 1994-04-12 Intel Corporation Method and apparatus for enhancing the focus latitude in lithography
JP3255312B2 (ja) * 1993-04-28 2002-02-12 株式会社ニコン 投影露光装置
US5627639A (en) 1995-06-06 1997-05-06 Lockheed Missiles & Space Company, Inc. Coded aperture imaging spectrometer
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US6671294B2 (en) * 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6853653B2 (en) * 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US6393037B1 (en) * 1999-02-03 2002-05-21 Lambda Physik Ag Wavelength selector for laser with adjustable angular dispersion
JP2000106463A (ja) * 1998-08-19 2000-04-11 Lambda Physik G Zur Herstellung Von Lasern Mbh エキシマレ―ザに対する波長較正方法及びシステム
US6218077B1 (en) * 1998-10-26 2001-04-17 Agere Systems Guardian Corp. Method of manufacturing an integrated circuit using a scanning system and a scanning system
EP1234358B1 (fr) * 1999-11-30 2010-01-06 Cymer, Inc. Laser a decharge gazeuse extremement puissante possedant une unite de retrecissement de ligne purgee a l'helium
US6738406B2 (en) * 2000-06-19 2004-05-18 Lambda Physik Ag Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm
EP1246014A1 (fr) * 2001-03-30 2002-10-02 ASML Netherlands B.V. Appareil lithographique
US7154928B2 (en) * 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
US7088758B2 (en) * 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US6834842B2 (en) 2002-01-09 2004-12-28 Scimed Life Systems, Inc. Fluid management valve
US6952267B2 (en) * 2003-07-07 2005-10-04 Cymer, Inc. Method and apparatus for measuring bandwidth of a laser output
US6829040B1 (en) * 2003-11-07 2004-12-07 Advanced Micro Devices, Inc. Lithography contrast enhancement technique by varying focus with wavelength modulation
US7053979B2 (en) * 2004-05-12 2006-05-30 Litel Instruments Process for amelioration of scanning synchronization error
US20060114956A1 (en) * 2004-11-30 2006-06-01 Sandstrom Richard L High power high pulse repetition rate gas discharge laser system bandwidth management
US7366219B2 (en) * 2004-11-30 2008-04-29 Cymer, Inc. Line narrowing module
US7317536B2 (en) * 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US7439001B2 (en) * 2005-08-18 2008-10-21 International Business Machines Corporation Focus blur measurement and control method
US7822084B2 (en) * 2006-02-17 2010-10-26 Cymer, Inc. Method and apparatus for stabilizing and tuning the bandwidth of laser light
US7852889B2 (en) * 2006-02-17 2010-12-14 Cymer, Inc. Active spectral control of DUV light source
US8259764B2 (en) * 2006-06-21 2012-09-04 Cymer, Inc. Bandwidth control device
US7455939B2 (en) * 2006-07-31 2008-11-25 International Business Machines Corporation Method of improving grating test pattern for lithography monitoring and controlling
JP2008166612A (ja) * 2006-12-28 2008-07-17 Nikon Corp レーザ装置、露光装置、並びに制御方法、露光方法及びデバイス製造方法
US7659529B2 (en) * 2007-04-13 2010-02-09 Cymer, Inc. Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element
US8144739B2 (en) * 2008-10-24 2012-03-27 Cymer, Inc. System method and apparatus for selecting and controlling light source bandwidth
JP2010153650A (ja) * 2008-12-25 2010-07-08 Canon Inc 露光装置およびデバイス製造方法
JP2011171521A (ja) * 2010-02-18 2011-09-01 Nikon Corp レーザ光源の評価方法、並びに露光方法及び装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030090643A1 (en) * 2001-11-13 2003-05-15 Canon Kabushiki Kaisha Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility
US20070273852A1 (en) * 2005-07-01 2007-11-29 Nikon Corporation Exposure Apparatus, Exposure Method, Device Manufacturing Method, and System
JP2007305611A (ja) * 2006-05-08 2007-11-22 Sony Corp 露光装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2011028246A1 *

Also Published As

Publication number Publication date
US8520186B2 (en) 2013-08-27
EP2471150A1 (fr) 2012-07-04
TW201129874A (en) 2011-09-01
JP5395269B2 (ja) 2014-01-22
KR101576109B1 (ko) 2015-12-09
JP2013503477A (ja) 2013-01-31
US20110205512A1 (en) 2011-08-25
EP2471150B1 (fr) 2019-01-23
KR20120080181A (ko) 2012-07-16
TWI427878B (zh) 2014-02-21
CN102484350A (zh) 2012-05-30
WO2011028246A1 (fr) 2011-03-10
CN102484350B (zh) 2014-07-23

Similar Documents

Publication Publication Date Title
EP2471150A4 (fr) Commande spectrale active d'une source optique
EP2435808B8 (fr) Source lumineuse de calibration
EP2585862B8 (fr) Structures à effets optiques
EP2443492A4 (fr) Film anti-reflet
EP2625066B8 (fr) Mécanisme de réglage
EP2624039A4 (fr) Système optique d'endoscope
EP2588916A4 (fr) Modification spatiale de l'état de polarisation de la lumière
EP2592457A4 (fr) Unité de lentille
EP2579083A4 (fr) Lentille d'objectif pour endoscope et endoscope
EP2596400A4 (fr) Optique de réfraction nano-optique
EP2593759A4 (fr) Appareil de poursuite de source lumineuse
EP2627988A4 (fr) Ensemble module de chambre optique
EP2381592A4 (fr) Emetteur optique
EP2502317A4 (fr) Commande de longueur d'onde de laser avancée
EP2615481A4 (fr) Module optique
EP2475229A4 (fr) Source de lumière plasma
EP2375228A4 (fr) Capteur optique
EP2385407A4 (fr) Système optique
EP2472239A4 (fr) Unité optique
EP2544320A4 (fr) Laser à cristal photonique
EP2406676A4 (fr) Source de lumière à base de fibre optique
EP2535745A4 (fr) Composant optique
EP2226654B8 (fr) Capteur optique
EP2530502A4 (fr) Fibre optique
EP2411798A4 (fr) Source de dispositif à temps de vol chauffée

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20120323

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

RIN1 Information on inventor provided before grant (corrected)

Inventor name: FARRAR, NIGEL, R.

Inventor name: LALOVIC, IVAN, B.

Inventor name: BENDIK, JOSEPH, J.

Inventor name: SEONG, NAKGEUON

Inventor name: RAFAC, ROBERT, J.

DAX Request for extension of the european patent (deleted)
RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: CYMER, LLC

RA4 Supplementary search report drawn up and despatched (corrected)

Effective date: 20171127

RIC1 Information provided on ipc code assigned before grant

Ipc: H01S 3/13 20060101ALI20171121BHEP

Ipc: G03F 7/20 20060101AFI20171121BHEP

REG Reference to a national code

Ref country code: DE

Ref legal event code: R079

Ref document number: 602010056766

Country of ref document: DE

Free format text: PREVIOUS MAIN CLASS: H01S0003130000

Ipc: G03F0007200000

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIC1 Information provided on ipc code assigned before grant

Ipc: G03F 7/20 20060101AFI20180702BHEP

Ipc: H01S 3/13 20060101ALI20180702BHEP

INTG Intention to grant announced

Effective date: 20180806

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 1091927

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190215

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602010056766

Country of ref document: DE

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20190123

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190423

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190523

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1091927

Country of ref document: AT

Kind code of ref document: T

Effective date: 20190123

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190424

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190523

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190423

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602010056766

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

26N No opposition filed

Effective date: 20191024

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20190824

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190831

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190824

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190831

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20190831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190824

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190824

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20190831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20100824

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20190123

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230403

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20230828

Year of fee payment: 14