EP2414108A2 - Procédé pour modifier l'énergie de surface d'un solide - Google Patents
Procédé pour modifier l'énergie de surface d'un solideInfo
- Publication number
- EP2414108A2 EP2414108A2 EP10713182A EP10713182A EP2414108A2 EP 2414108 A2 EP2414108 A2 EP 2414108A2 EP 10713182 A EP10713182 A EP 10713182A EP 10713182 A EP10713182 A EP 10713182A EP 2414108 A2 EP2414108 A2 EP 2414108A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- fluorinated
- group
- grafting
- aryl
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- 239000007787 solid Substances 0.000 title claims abstract description 13
- 125000003118 aryl group Chemical group 0.000 claims abstract description 44
- 229920000642 polymer Polymers 0.000 claims abstract description 18
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 16
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 15
- 229920000578 graft copolymer Polymers 0.000 claims abstract description 4
- 239000011521 glass Substances 0.000 claims description 63
- -1 aryl diazonium salts Chemical class 0.000 claims description 51
- 239000000126 substance Substances 0.000 claims description 47
- 150000001875 compounds Chemical class 0.000 claims description 29
- 230000008569 process Effects 0.000 claims description 21
- 230000015572 biosynthetic process Effects 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 125000001153 fluoro group Chemical group F* 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 11
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 10
- 229920002554 vinyl polymer Polymers 0.000 claims description 10
- 239000012954 diazonium Substances 0.000 claims description 9
- 229910052731 fluorine Inorganic materials 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052698 phosphorus Inorganic materials 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 5
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
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- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 125000004001 thioalkyl group Chemical group 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- 238000007789 sealing Methods 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
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- 125000001072 heteroaryl group Chemical group 0.000 claims description 2
- 239000005304 optical glass Substances 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 239000003505 polymerization initiator Substances 0.000 claims 1
- 150000003254 radicals Chemical class 0.000 claims 1
- 229920000620 organic polymer Polymers 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 52
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- 239000004205 dimethyl polysiloxane Substances 0.000 description 20
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
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- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
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- 238000011282 treatment Methods 0.000 description 9
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 8
- 239000003153 chemical reaction reagent Substances 0.000 description 8
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- 239000002019 doping agent Substances 0.000 description 7
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- 238000004566 IR spectroscopy Methods 0.000 description 6
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- 239000002243 precursor Substances 0.000 description 6
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- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
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- 239000000010 aprotic solvent Substances 0.000 description 4
- 229960005070 ascorbic acid Drugs 0.000 description 4
- 235000010323 ascorbic acid Nutrition 0.000 description 4
- 239000011668 ascorbic acid Substances 0.000 description 4
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 4
- 238000009736 wetting Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910017214 AsGa Inorganic materials 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910018557 Si O Inorganic materials 0.000 description 3
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- 238000010894 electron beam technology Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
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- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000007348 radical reaction Methods 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
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- 239000011701 zinc Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
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- 241000252506 Characiformes Species 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
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- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
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- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 2
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- 238000002474 experimental method Methods 0.000 description 2
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- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
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- LCPUCXXYIYXLJY-UHFFFAOYSA-N 1,1,2,4,4,4-hexafluorobutyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)C(F)CC(F)(F)F LCPUCXXYIYXLJY-UHFFFAOYSA-N 0.000 description 1
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- 150000004760 silicates Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010902 straw Substances 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000003115 supporting electrolyte Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 150000003512 tertiary amines Chemical group 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/34—Applying different liquids or other fluent materials simultaneously
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
- B05D5/083—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface involving the use of fluoropolymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2203/00—Other substrates
- B05D2203/30—Other inorganic substrates, e.g. ceramics, silicon
- B05D2203/35—Glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/104—Pretreatment of other substrates
Definitions
- the invention belongs to the field of surface treatments.
- the present invention aims to provide a method for treating, in a durable manner, a material for modifying the surface energy or interfacial tension of at least one of its surfaces and in particular for modifying the wettability of this surface.
- the invention notably makes it possible to modify the interface properties between a solid body and a liquid.
- the present invention provides a method for increasing the contact angle of said surface by grafting a coating and also provides a kit for carrying out such a method.
- a surface is generally defined as the external part or limit of a body, the surface is often considered as an interface between the solid body and its environment, such as solid, liquid or gaseous.
- the wetting is considered “good” (0 ⁇ ⁇ 90 °), - the wetting is said to be “bad” (90 ° ⁇
- the modification of the wettability of a surface can be carried out by impregnation of a compound which penetrates more or less deeply into the material composing the structure.
- This type of treatment requires that there is an affinity between the treated surface and the impregnating compound.
- the surface obtained is rarely homogeneous.
- the impregnating compound remaining labile, it is necessary to repeat the treatment regularly to ensure its sustainability.
- the application of wax on wood corresponds to this type of treatment.
- the application of a coating also leads to the modification of the surface properties. Generally this type of treatment is applied to reduce the wettability of the surface with respect to water and increase the contact angle.
- the coating typically corresponds to a resin.
- the basic products used may be epoxy resins, polyurethanes, polyesters, or vinyls with which specific properties are associated.
- the application of these compounds does not lead to the formation of strong bonds at the interface of the surface and the coating, thus reducing the life of this type of coating according to the environment.
- it is generally films which have a large thickness, especially greater than one micron, and in particular, when the coating is applied to large areas of the order of several m 2 . Such a thickness results in properties different optics between the untreated material and the coated material of the coating.
- Glass is a material for which surface treatments are used extensively.
- the control of the surface tensions of the glass is achieved only by the grafting of alkyl siloxanes of which there is a large choice.
- the problem of this type of grafting lies in the stability of the bond between the glass and the silane (-Si-O-Si- bond), which hydrolyses quite rapidly over time, especially in a humid medium. This bond is fragile depending on the environment and particularly in a basic environment.
- the present invention solves technical problems and disadvantages previously listed. Indeed, the present inventors have been interested in the grafting of an organic coating on the surface of a material to modify its properties such as the surface energy also called “surface tension”, “surface tension”, “energy interface “or” interfacial tension ".
- the grafting of such an organic coating allows the formation of stable covalent bonds between the surface of the material and said coating organic and is applicable to all types of materials, including glass.
- the establishment of covalent bonds between the material and the coating ensures the stability of the couple and contributes to the durability of the treatment.
- the thickness of the organic coating obtained by this grafting is, moreover, easily controllable.
- the coating may be in the form of very thin films that do not modify the optical properties of the material.
- the surface to be coated may be an insulating material, conductive or semiconductor, especially when the grafting process used is a chemical or radical grafting. Similarly, said grafting can be carried out in an aqueous medium as in an organic medium. For these reasons, the method according to the invention is applicable to any type of surface.
- the present invention relates to a method for modifying the surface energy of at least one surface of a solid comprising a step of grafting onto said surface a polymeric organic film whose first pattern is derived from a primer. adhesion and at least one other reason is derived from an element selected from the group consisting of a primary fluorinated adhesion, a fluorinated (meth) acrylate and a vinyl-terminated siloxane.
- the present invention relates to a method for modifying the surface energy of at least one surface of a solid comprising a step of grafting onto said surface a polymeric organic film of graft polymers, each polymer having a first pattern directly bound to said surface derived from a cleavable aryl salt and at least one other unit of the polymeric chain derived from a member selected from the group consisting of a fluorinated cleavable aryl salt, a
- modifying the surface energy is meant in the context of the present invention both increase and decrease the surface energy (or “interfacial energy”) especially with respect to a given liquid that is hydrophilic or hydrophobic .
- the method according to the present invention makes it possible to modify
- the process according to the present invention is a process which makes it possible to modify (i.e. increase or decrease) the wettability of said surface.
- adhesion primer is meant, in the context of the present invention, any molecule organic capable, under certain non-electrochemical or electrochemical conditions, of forming either radicals or ions, and particularly cations, and thus to participate in chemical reactions. Such chemical reactions may in particular be chemisorption and in particular chemical grafting or electrografting. Thus, such an adhesion primer is capable, under non-electrochemical or electrochemical conditions, of chemisorbing on the surface, in particular by radical reaction, and of presenting another reactive function with respect to another radical after this chemisorption.
- the adhesion primer is a cleavable aryl salt.
- the cleavable aryl salt is advantageously selected from the group consisting of aryl diazonium salts, ammonium aryl salts, aryl phosphonium salts, aryl iodonium salts and aryl sulfonium salts.
- the aryl group is an aryl group which may be represented by R as defined below.
- - A represents a monovalent anion and - R represents an aryl group.
- aryl group of the cleavable aryl salts and in particular the compounds of formula (I) above mention may advantageously be made of aromatic or heteroaromatic carbonaceous structures, optionally mono- or polysubstituted, consisting of one or more aromatic rings or heteroaromatic compounds each having from 3 to 8 atoms, the heteroatom (s) possibly being N, O, P or S.
- the substituent (s) may contain one or more heteroatoms, such as N, O, F, Cl, P, Si, Br or S, as well as C1-C6 alkyl groups or C4-C12 thioalkyl groups in particular.
- R is preferably chosen from aryl groups substituted with electron-withdrawing groups such as NO 2, ketones, CN, CO2H, and esters.
- Particularly preferred aryl groups R are the optionally substituted benzene and nitrobenzene radicals.
- A may especially be chosen from inorganic anions such as halides such as I ⁇ , Br “ and Cl " , haloborates such as tetrafluoroborate, perchlorates and sulfonates and organic anions such as alcoholates and carboxylates.
- inorganic anions such as halides such as I ⁇ , Br “ and Cl "
- haloborates such as tetrafluoroborate, perchlorates and sulfonates
- organic anions such as alcoholates and carboxylates.
- fluorinated adhesion primer means an adhesion primer as previously described comprising at least one fluorine atom, especially comprising between 1 and 40 fluorine atoms, in particular between 5 and 30 fluorine atoms and, more particularly, between 10 and 20 fluorine atoms.
- the fluorinated adhesion primer is a cleavable and fluorinated aryl salt.
- said fluorinated cleavable aryl salt is selected from the group consisting of fluorinated aryl diazonium salts, fluorinated ammonium aryl salts, fluorinated aryl phosphonium salts, fluorinated aryl iodonium salts and fluorinated aryl sulphonium salts.
- the fluorinated aryl group is a fluorinated aryl group which may be represented by R 'as defined below.
- - A represents a monovalent anion as defined above and - R 'represents a fluorinated aryl group.
- fluorinated aryl group cleavable and fluorinated aryl salts and in particular compounds of formula (II) previously described, mention may be made of aromatic or heteroaromatic carbon structures, optionally mono- or polysubstituted, consisting of one or more aromatic rings. or heteroaromatic compounds each having from 3 to 8 atoms, the heteroatom (s) possibly being N, O, P or S and the substituent (s) being (C 1 to C 18) alkyl groups, and more particularly C 5 to C (12) groups, or (C 4) thioalkyl groups; at C12, alkyl and thioalkyl groups comprising one or more fluorine atoms.
- the alkyl or thioalkyl substituent (s) may comprise between 1 and 40 fluorine atoms, especially between 5 and 30 fluorine atoms and, in particular, between 10 and 20 fluorine atoms.
- fluorinated (meth) acrylate is meant, in the context of the present invention, a compound of formula (III):
- CH 2 C (R 1) -C (O) OR 2 (III) wherein R 1 represents a hydrogen atom or a methyl group and R 2 represents an alkyl group, the methyl group and / or R 2 comprising at least one fluorine atom.
- This alkyl group is a linear, branched or cyclic alkyl group, preferably substituted by at least one fluorine atom, and comprising from 1 to 20 carbon atoms, in particular from 2 to 15 carbon atoms and, in particular, from 3 to 12 carbon atoms.
- Said alkyl group can comprise between 1 and 40 fluorine atoms, in particular between 2 and 30 fluorine atoms and, more particularly, between 5 and 20 fluorine atoms.
- vinyl-terminated siloxane is meant, in the context of the present invention, a saturated hydride of silicon and oxygen formed of straight or branched chains of alternating silicon and oxygen atoms, comprising vinyl patterns. More particularly, in the context of the present invention, a vinyl-terminated siloxane is a compound of formula (IV): R 3 - [OSi (R 4 ) (R 5 ) J n -R 6 (IV) in which - n represents an integer between 2 and 200, especially between 5 and 150 and, in particular, between 10 and 100;
- - R3 and Re are groups having at least one ethylenic unsaturation and - R 4 and R 5 , identical or different, represent a linear, branched alkyl group or cyclic, comprising from 1 to 6 carbon atoms and in particular from 1 to 3 carbon atoms.
- R3 represents a grouping
- -C (O) -R 7 and / or Re represents a group -O-C (O) -Rs in which R 7 and Rs, which are identical or different, represent a group comprising from 2 to 12 carbon atoms and having at least ethylenic unsaturation. More particularly, R 7 and Rs, which are identical or different, correspond to groups of formula (V):
- the organic film used in the context of the present invention may be prepared from:
- the organic film used in the context of the present invention is essentially a polymer or copolymer, derived from several monomeric units of identical or different chemical species and / or adhesion primer molecules.
- the films obtained by the process of the present invention are "essentially" of the polymer type insofar as the film also incorporates species derived from the adhesion primer and not only monomers present.
- the organic film in the context of the invention and, more particularly, the polymers which constitute it have a sequence in monomeric units (or units) in which the first unit
- first unit is constituted by a derivative of the adhesion primer or derived from an adhesion primer, the other units (or units) being indifferently derived from or derived from s fluorinated or non-fluorinated adhesion primers and / or polymerizable monomers and especially fluorinated (meth) acrylates and vinyl-terminated siloxanes as previously defined.
- the patterns of the organic film from the second pattern are therefore derived from the polymerization, in particular radical, of the elements present and chosen from fluorinated or non-fluorinated adhesion primers, fluorinated (meth) acrylates, vinyl-terminated siloxanes and polymerizable monomers such as that the polymerizable monomers of formula (II) as defined in the patent application FR 2 921 516.
- the fluoro or non-fluorinated adhesion primer molecules can be qualified as polymerizable insofar as, by radical reaction, they can lead to the formation of relatively high molecular weight molecules whose structure is formed. essentially units with multiple repetitions derived, de facto or conceptually, from adhesion primer molecules.
- the organic film used in the context of the present invention may consist solely of units derived from identical or different adhesion primers. More particularly, the polymers constituting the organic film may consist solely of units derived from or derived from identical or different adhesion primers.
- the grafting used in the process is a chemical grafting.
- chemical grafting refers in particular to the use of highly reactive (typically radical) molecular entities capable of forming covalent bond bonds with a surface of interest, said molecular entities being generated independently of the surface on which they are intended to be grafted.
- the grafting reaction leads to the formation of covalent bonds between the area of the surface to be coated with an organic film and the derivative of the adhesion primer.
- adheresion primer derivative is meant, in the context of the present invention, a chemical unit resulting from the adhesion primer, after the latter has reacted with the surface, by chemical grafting, and optionally with another chemical compound, by radical reaction, said other chemical compound giving the second pattern of the organic film.
- the first organic film pattern i.e., the constituent polymers thereof
- the first organic film pattern is a derivative of the adhesion primer that has reacted with the surface and with another chemical compound.
- this first variant comprises the steps of: a) bringing said surface into contact with a solution Si comprising at least one adhesion primer (ie at least one cleavable aryl salt) and at least one element selected from the group consisting of a fluorinated adhesion primer (ie at least one fluorinated cleavable aryl salt), a fluorinated (meth) acrylate and a vinyl terminated siloxane; bi) subjecting said Si solution to non-electrochemical conditions permitting the formation of radical entities from said adhesion primer (ie from said cleavable aryl salt).
- a solution Si comprising at least one adhesion primer (ie at least one cleavable aryl salt) and at least one element selected from the group consisting of a fluorinated adhesion primer (ie at least one fluorinated cleavable aryl salt), a fluorinated (meth) acrylate and a vinyl terminated siloxane; bi
- the surfaces of inorganic nature can be chosen in particular from conducting materials such as metals, noble metals, oxidized metals, transition metals, metal alloys and for example Ni, Zn, Au, Pt, Ti or steel. It can also be semiconductor materials such as Si, SiC, AsGa, Ga, etc. It is also possible to apply the process to non-conductive surfaces such as non-conductive oxides such as SiO 2, Al 2 O 3 and MgO. More generally, an inorganic surface may consist of, for example, an amorphous material, such as a glass generally containing silicates or a ceramic, as well as a crystalline one such as diamond, graphite which may be more or less organized, like graphene, highly oriented graphite (HOPG), or carbon nanotubes.
- conducting materials such as metals, noble metals, oxidized metals, transition metals, metal alloys and for example Ni, Zn, Au, Pt, Ti or steel. It can also be semiconductor materials such as Si, SiC, AsGa, Ga, etc
- polymers such as latex or rubber, or artificial such as polyamide or polyethylene derivatives, and especially polymers having ⁇ -type bonds such as polymers bearing ethylenic bonds, carbonyl groups, imine.
- the surface of which it is desired to modify the surface energy is a glass surface such as a flat glass particularly used in the building, architecture, automotive, glazing and mirrors, an aquarium glass , eyeglass or optical glass.
- the solution Si may further comprise a solvent.
- the latter may be a protic solvent or an aprotic solvent. It is preferred that the adhesion primer which is employed be soluble in the solvent of the Si solution.
- protic solvent is meant, in the context of the present invention, a solvent which comprises at least one hydrogen atom capable of being released in the form of a proton.
- the protic solvent is advantageously chosen from the group consisting of water, deionized water, distilled water, acidified or not, acetic acid, hydroxylated solvents such as methanol and ethanol, and low glycols. molecular weights such as ethylene glycol, and mixtures thereof.
- the protic solvent used in the context of the present invention consists only of a protic solvent or a mixture of different protic solvents.
- the protic solvent or the mixture of protic solvents may be used in admixture with at least one aprotic solvent, it being understood that the resulting mixture has the characteristics of a protic solvent.
- aprotic solvent is meant, in the context of the present invention, a solvent which is not considered as protic. Such solvents are not likely to release a proton or accept one under non-extreme conditions.
- the aprotic solvent is advantageously chosen from dimethylformamide (DMF), acetone, tetrahydrofuran (THF), dichloromethane, acetonitrile, dimethyl sulfoxide (DMSO) and mixtures thereof.
- the solution Si comprising an adhesion primer and an element as defined above may also contain at least one surfactant and this, in particular to improve the solubility of this element.
- a precise description of the surfactants that can be used in the context of the invention is given in patent application FR 2 897 876 to which the person skilled in the art can refer. A single surfactant or a mixture of several surfactants can be used.
- adhesion primer be soluble in the solvent of the Si solution.
- an adhesion primer is considered to be soluble in a given solvent if it remains soluble up to a concentration of 0.5 M, ie its solubility is at least 0.5 M under normal temperature and pressure conditions
- Solubility is defined as the analytical composition of a saturated solution as a function of the proportion of a given solute in a given solvent; it can in particular express itself in molarity. A solvent containing a given concentration of a compound will be considered saturated, when the concentration will be equal to the solubility of the compound in this solvent. Solubility can be finite as infinite. In the latter case, the compound is soluble in any proportion in the solvent.
- the amount of adhesion primer present in the solution Si used in accordance with the process according to the invention may vary according to the wishes of the experimenter. This amount is particularly related to the desired organic film thickness and the amount of adhesion primer it is possible and possible to integrate in the film. Thus to obtain a grafted film on the entire surface in contact with the solution, it is necessary to employ a minimum amount of adhesion primer that can be estimated by molecular size calculations. According to a particularly advantageous embodiment of the invention, the concentration of adhesion primer in the liquid solution is between 10 ⁇ 6 and 5 M approximately, preferably between 10 "3 and 10 " 1 M.
- the pH of the solution is typically less than 7. It is recommended to work at a pH of between 0.degree. and 3 when the preparation of the adhesion primer is carried out in the same medium as that of the grafting. If necessary, the pH of the solution can be adjusted to the desired value using one or more acidifying agents well known to those skilled in the art, for example using inorganic or organic acids such as hydrochloric acid, sulfuric acid, etc.
- the adhesion primer can either be introduced in the state in the solution Si as defined above, or be prepared in situ in the latter.
- the process according to the present invention comprises a step for preparing the adhesion primer, especially when the latter is an aryl diazonium salt.
- Such compounds are generally prepared from arylamine, which may comprise several amino substituents, by reaction with NaNO 2 in an acidic medium.
- those skilled in the art can refer to the article by Bélanger et al., 2006 (Chem Mater 18, pages 4755-4763).
- the grafting will then be carried out directly in the solution for preparing the aryl diazonium salt.
- the elements selected from the group consisting of a fluorinated adhesion primer, a
- fluorinated (meth) acrylate and a vinyl-terminated siloxane and in particular fluorinated (meth) acrylates and vinyl-terminated siloxanes can be soluble to a certain proportion in the solvent of the Si solution, ie the value of their solubility in this solution. solvent is finished.
- the solution S1 could also contain such as the polymerizable monomers of formula (II) as defined in the patent application FR 2 921 516.
- These elements fluorinated adhesion primers, (meth) acrylates fluorinated, vinyl-terminated siloxanes and others
- the invention also applies to a mixture of two, three, four or more elements chosen from the elements previously described, the quantity of these elements in the solution Si may vary according to the desire of the experimenter. This quantity may be greater than the solubility of the element in question in the solvent of the Si solution used and may represent, for example, from 18 to 40 times the solubility of said element in the solution at a given temperature, generally the ambient temperature or that of reaction.
- the solution Si comprising an adhesion primer and a member selected from the group consisting of a fluorinated adhesion primer, a
- a fluorinated (meth) acrylate, a vinyl-terminated siloxane and optionally a polymerizable monomer of formula (II) as defined in patent application FR 2 921 516, can additionally contain at least one surfactant and this, in particular to improve the solubility said element.
- a precise description of the surfactants that can be used in the context of the invention is given in patent application FR 2 897 876 to which the person skilled in the art can refer.
- a single surfactant or a mixture of several surfactants can be used.
- the solution Si may also be in the form of an emulsion.
- non-electrochemical conditions implemented in step (bi) of the process according to the invention is meant in the context of the present invention in the absence of electrical voltage.
- the non-electrochemical conditions implemented in step (bi) of the process according to the invention are conditions which allow the formation of radical entities from the adhesion primer, in the absence of the application of any electrical voltage to the surface on which the organic film is grafted. These conditions involve parameters such as, for example, the temperature, the nature of the solvent, the presence of a particular additive, stirring, the pressure while the electric current does not occur during the formation of radical entities.
- the non-electrochemical conditions allowing the formation of radical entities are numerous and this type of reaction is known and studied in detail in the prior art (Rempp & Merrill, Polymer Synthesis, 1991, 65-86, Huthig & Wepf).
- non-electrochemical conditions allowing the formation of radical entities are typically selected from the group consisting of thermal, kinetic, chemical, photochemical, radiochemical conditions and combinations thereof.
- the non-electrochemical conditions are chosen from the group consisting of thermal, chemical, photochemical and radiochemical conditions and their combinations with each other and / or with the kinetic conditions.
- the Non-electrochemical conditions used in the context of the present invention are more particularly chemical conditions.
- the thermal environment is a function of the temperature. Its control is easy with the heating means usually employed by those skilled in the art.
- the use of a thermostated environment is of particular interest since it allows precise control of the reaction conditions.
- the kinetic environment essentially corresponds to the agitation of the system and the friction forces. It is not a question here of the agitation of the molecules in itself (elongation of bonds, etc.), but of the global movement of the molecules.
- the application of a pressure makes it possible in particular to supply energy to the system so that the adhesion primer is destabilized and can form reactive species, in particular radicals.
- the action of various radiations such as electromagnetic radiation, ⁇ radiation, UV rays, electron or ion beams may also sufficiently destabilize the adhesion primer to form radicals and / or ions.
- the wavelength used will be chosen according to the primary used. For example, a wavelength of about 306 nm will be used for 4-hexylbenzenediazonium.
- one or more chemical initiator is used in the reaction medium.
- the presence of chemical initiators is often coupled with conditions environmental non-chemical, as outlined above.
- a chemical initiator will act on the adhesion primer and will generate the formation of radical entities from the latter.
- chemical initiators whose action is not essentially related to environmental conditions and which can act over wide ranges of thermal or kinetic conditions.
- the initiator will preferably be adapted to the environment of the reaction, for example to the solvent.
- thermal initiators There are many chemical initiators. There are generally three types depending on the environmental conditions used: thermal initiators, the most common of which are peroxides or azo compounds. Under the action of heat, these compounds dissociate into free radicals. In this case, the reaction is carried out at a minimum temperature corresponding to that required for formation of radicals from the initiator.
- This type of chemical initiator is generally used specifically in a certain temperature range, depending on their kinetics of decomposition; the photochemical or radiochemical initiators which are excited by radiation triggered by irradiation (most often by UV, but also by ⁇ radiation or by electron beams) allow the production of radicals by more or less complex mechanisms.
- BusSnH and I 2 belong to photochemical or radiochemical initiators; essentially chemical initiators, this type of initiators acting rapidly and under normal conditions of temperature and pressure on the adhesion primer to enable it to form radicals and / or ions.
- Such initiators generally have a redox potential which is lower than the reduction potential of the adhesion primer used in the reaction conditions.
- it may thus be for example a reducing metal, such as iron, zinc, nickel; a metallocene such as ferrocene; an organic reducing agent such as hypophosphorous acid (H3PO2) or ascorbic acid; of an organic or inorganic base in proportions sufficient to allow destabilization of the adhesion primer.
- the reducing metal used as chemical initiator is in finely divided form, such as wool (also called more commonly "straw") metal or metal filings.
- a pH of greater than or equal to 4 is generally sufficient.
- Radical reservoir-type structures such as polymer matrices previously irradiated with an electron beam or with a heavy ion beam and / or with all the irradiation means mentioned above, can also be used as chemical initiators to destabilize the adhesion primer and lead in particular to the formation of radical entities from the latter. It is useful to refer to the article by Mevellec et al., 2007 (Chem Mater, vol 19, pages 6323-6330) for the formation of active species.
- the grafting implemented in the process is electrografting.
- electro-initiated and localized grafting of an adhesion primer capable of being electrically activated, on a composite surface comprising conductive portions and / or semiconducting electricity, by contacting said adhesion primers with said composite surface.
- the grafting is carried out electrochemically in a single step on selected, defined areas of said conductive and / or semiconducting portions. Said zones are brought to a potential greater than or equal to a threshold electric potential determined with respect to a reference electrode, said threshold electrical potential being the potential beyond which grafting of said adhesion primers occurs.
- this second variant comprises the steps of: a 2 ) bringing said conductive or semiconducting surface into contact with an S2 solution comprising at least one adhesion primer (ie at least one cleavable aryl salt) and at least one member selected from the group consisting of a fluorinated adhesion primer (ie at least one fluorinated cleavable aryl salt), a fluorinated (meth) acrylate and a vinyl terminated siloxane; b 2 ) polarizing said surface to an electric potential that is more cathodic than the reduction potential of the adhesion primer (ie at least one cleavable aryl salt) implemented in step (a 2 ), the order of the steps (a 2 ) and (b 2 ) being any.
- the term "semiconductor” is understood to mean an organic or inorganic material having an electrical conductivity intermediate between the metals and the insulators.
- the conductivity properties of a semiconductor are influenced mainly by the charge carriers (electrons or holes) that the semiconductor exhibits. These properties are determined by two particular energy bands called the valence band (corresponding to the electrons involved in the covalent bonds) and the conduction band (corresponding to the electrons in an excited state and able to move in the semiconductor) .
- the gap represents the difference in energy between the valence band and the conduction band.
- a semiconductor also corresponds, unlike insulators or metals, to a material whose electrical conductivity can be controlled, in a broadly, by adding doping agents that correspond to foreign elements inserted into the semiconductor.
- the surface used in the context of the process according to the invention may be any surface usually used in electrografting and advantageously an inorganic surface.
- Such an inorganic surface may especially be chosen from conductive materials such as metals, noble metals, oxidized metals, transition metals, metal alloys and, for example, Ni, Zn, Au, Ag, Cu, Pt, Ti and the like. 'steel.
- the inorganic surface may also be chosen from semiconductor materials such as Si, SiC, AsGa, Ga, etc.
- said inorganic surface used in the process according to the invention generally consists of a material chosen from the metals, noble metals, oxidized metals, transition metals, metal alloys and semiconductor materials, photosensitive or not.
- the term "photosensitive semiconductor” is understood to mean a semiconductor material whose conductivity can be modulated by variations in magnetic field, temperature or illumination, which influence the electron-electron pairs. holes and the density of charge carriers. These properties are due to the existence of the gap as defined above. This gap generally does not exceed 3.5 eV for semiconductors, against 5 eV in materials considered insulators. It is therefore possible to populate the band of conduction by excitation of carriers through the gap, especially under illumination.
- the elements of group IV of the periodic table such as carbon (in diamond form), silicon, germanium have such properties.
- Semiconductor materials may be formed from several elements, both Group IV, such as SiGe or SiC, Group III and V, such as GaAs, InP or GaN, or Group II and VI, such as CdTe or ZnSe.
- Group IV such as SiGe or SiC
- Group III and V such as GaAs, InP or GaN
- Group II and VI such as CdTe or ZnSe.
- the photosensitive semiconductor substrate is of inorganic nature.
- the photosensitive semiconductor used in the context of the present invention is chosen from the group consisting of Group IV elements (more particularly, silicon and germanium); alloys of group IV elements (more particularly, SiGe and SiC alloys); alloys of group III and group V elements (referred to as "III-V” compounds, such as AsGa, InP, GaN) and alloys of group II and group VI elements (referred to as "II-VI” compounds , such as CdSe, CdTe, CU2S, ZnS or ZnSe).
- the preferred photosensitive semiconductor is silicon.
- the photosensitive semiconductor it is possible for the photosensitive semiconductor to be doped with one or more doping agents.
- the doping agent is chosen according to the semiconductor, and the doping is of the p or n type.
- the choice of the doping agent and the doping technologies are routine techniques for those skilled in the art.
- the doping agent is selected from the group consisting of boron, nitrogen, phosphorus, nickel, sulfur, antimony, arsenic and mixtures thereof.
- the doping agent is selected from the group consisting of boron, nitrogen, phosphorus, nickel, sulfur, antimony, arsenic and mixtures thereof.
- the doping agent is selected from the group consisting of boron, nitrogen, phosphorus, nickel, sulfur, antimony, arsenic and mixtures thereof.
- the method further comprises a step (C2) of exposing said surface to a light radiation whose energy is at least equal to that of gap of said semiconductor.
- the solvent of the solution S2 is advantageously a protic solvent as defined above.
- the electric potential employed in step (b2) of the method according to the present invention is close to the potential of reduction of the adhesion primer used and which reacts on the surface.
- the value of the electric potential applied can be up to 50% higher than the reduction potential of the adhesion primer, more typically it will not be greater than 30%.
- This variant of the present invention can be implemented in an electrolysis cell comprising different electrodes: a first working electrode constituting the surface intended to receive the film, a counter electrode, and possibly a reference electrode.
- the polarization of said surface may be carried out by any technique known to those skilled in the art and especially under linear or cyclic voltammetric conditions, in potentiostatic, potentiodynamic, intensiostatic, galvanostatic, galvanodynamic or by simple or pulsed chronoamperometry.
- the process according to the present invention is carried out under conditions of static or pulsed chronoamperometry.
- static mode the electrode is polarized for a duration generally less than 2 h, typically less than 1 h and for example less than 20 min.
- pulsed mode the number of pulses will be included, preferably between 1 and 1000 and, even more preferably, between 1 and 100, their duration generally being between 100 ms and 5 s, typically 1 s.
- the thickness of the organic film is easily controllable, irrespective of the variant of the method of the present invention implemented, as previously explained.
- the skilled person will be able to iteratively determine the optimum conditions for obtaining a film, d. given thickness, not modifying the optical properties of the surface.
- the method according to the present invention comprises an additional step, prior to chemical grafting or electrografting, of cleaning the surface on which it is desired to form the organic film, in particular by sanding and / or polishing. Additional ultrasonic treatment with an organic solvent such as ethanol, acetone or dimethylformamide (DMF) is even recommended.
- an organic solvent such as ethanol, acetone or dimethylformamide (DMF) is even recommended.
- the method according to the present invention comprises an additional step, following chemical grafting or electrografting, of subjecting the grafted organic film to a heat treatment.
- said heat treatment consists in subjecting said grafted film to a temperature of between 60 and 180 ° C., in particular between 90 and 150 ° C. and, in particular, of the order of 120 ° C.
- the present invention also relates to the use of a method as previously defined to modify the wettability of a surface, to improve the sealing of a surface or to protect said surface from corrosion.
- the present invention relates to a method for modifying the wettability of a surface, for improving the sealing of a surface and / or for protecting a surface from corrosion, said method of modifying the surface energy of said surface by a method as previously defined.
- the present invention finally relates to the use of a kit of elements for modifying the surface energy of a surface, said kit comprising:
- adhesion primer in a first compartment, at least one adhesion primer and in particular as previously defined; optionally, in a second compartment, an element selected from the group consisting of a fluorinated adhesion primer, a
- the adhesion primer of the first compartment and the element of the second compartment may be in solution.
- Said solutions are more particularly solutions Si and S2 as previously defined.
- the chemical initiator of the third compartment may also be in solution.
- an identical or different solvent is contained in each of the solutions of the first and second compartments and optionally in the solution of the third compartment.
- the first compartment contains not an adhesion primer advantageously in solution but at least one precursor of an adhesion primer advantageously in solution.
- adhesion primer precursor it is necessary to understand a molecule separated from the primary by a single operating step and easy to implement.
- the kit will possibly include at least one other compartment in which there will be at least one element necessary to develop the primary from its precursor.
- the kit may for example contain an arylamine precursor of the adhesion primer, advantageously in solution, and also a solution of NaNO 2 to allow by addition the formation of an aryl diazonium salt, primary adhesion.
- the solutions of the different compartments may of course contain different other identical or different agents such as stabilizing agents or surfactants.
- the use of the kit proves to be simple since it suffices to place the sample whose surface is to be treated in contact with the mixture of solutions prepared extemporaneously by mixing the solutions of the different compartments, preferably with stirring and in particular under ultrasound .
- the solution containing the monomer, ie the second compartment is placed under ultrasound before being mixed with the solution containing the adhesion primer prepared extemporaneously from a precursor or present in the first compartment.
- FIG. 1 shows the IR spectrometry analysis of gold slides on which was grafted, by radical chemical grafting, for 30 min or 60 min, a film starting from 4-nitrobenzene diazonium tetrafluoroborate (4-NBDT) and hexafluorobutylmethacrylate (HFBM) using as a chemical initiator of ferrocene, a gold slide immersed in a solution of HFBM serving as a control (pure HFBM).
- 4-nitrobenzene diazonium tetrafluoroborate (4-NBDT) and hexafluorobutylmethacrylate (HFBM) using as a chemical initiator of ferrocene
- HFBM hexafluorobutylmethacrylate
- Figure 2 shows the contact angle measured (7 independent measurements) for a drop of water on glass slides on which was grafted, by radical chemical grafting, for 30 min or 60 min, a film from 4 -NBDT and HFBM in using as a chemical initiator of ferrocene, a blank glass slide serving as a control.
- FIG. 3 shows the photograph of a drop of water on a glass slide on which was grafted, by radical chemical grafting, a film from 4-NBDT and HFBM (FIG. 3A) and that of a drop of water on a blank glass slide (Figure 3B).
- FIG. 4 shows the IR spectrometry analysis of gold slides on which was grafted, by radical chemical grafting, for 30 min or 60 min, a film from tridecylfluorooctylsulfamylbenzene diazonium tetrafluoroborate (MB83) using as initiator ferrocene.
- Figure 5 shows the contact angle measured (11 independent measurements) for a drop of water on glass slides on which was grafted, by radical chemical grafting, for 30 min or 60 min, a film from MB83 using as a chemical initiator of ferrocene, a blank glass slide serving as a control.
- Figure 6 shows the photograph of a drop of water on a glass slide on which was grafted, by radical chemical grafting, a film from MB83 (Figure 6A) and that of a drop of water on a blank glass slide ( Figure 6B).
- FIG. 7 shows the IR spectrometric analysis of gold slides on which was grafted, by radical chemical grafting, for 30 min or 60 min, a film starting from 4-NBDT and Vinyl-terminated polydimethylsiloxane (PDMS) using ferrocene as a chemical initiator.
- PDMS Vinyl-terminated polydimethylsiloxane
- Figure 8 shows the contact angle measured (10 independent measurements) for a drop of water on glass slides on which was grafted, by radical chemical grafting, for 30 min or 60 min, a film from 4 -NBDT and PDMS using as a chemical initiator of ferrocene, a blank glass slide serving as a control.
- Figure 9 shows the photograph of a drop of water on a glass slide on which has been grafted, by radical chemical grafting, a film from 4-NBDT and PDMS ( Figure 9A) and that of a droplet. of water on a blank glass slide ( Figure 9B).
- FIG. 10 shows the IR spectrometric analysis of glass and gold plates on which a film from NBDT and vinylpolydimethylsiloxane (vinylPDMS) has been grafted by radical chemical emulsion graft, a blank glass slide serving control.
- Figure 11 shows the analysis by IR spectrometry of a PDMS film grafted onto a gold plate by radical chemical grafting applied to the vinyl-PDMS in emulsion.
- Figure 12 shows the IR spectrometric analysis of a PDMS film grafted onto a glass slide compared to that of a PDMS film grafted onto a gold slide.
- Example I Grafting of the 4-NBDT / PHFBM pair on gold and glass with ferrocene
- the glass slides were rinsed beforehand with water, ethanol and acetone with ultrasound.
- Example II Grafting a fluorinated ⁇ azon ⁇ um on gold and glass with ferrocene
- Example II The reagents used in Example II are
- FIG. 5 show the values of the contact angle obtained for a drop of water placed on a blank glass slide or on a glass slide on which grafted an organic film obtained from MB83 for 30 min or 60 min (11 independent measurements).
- Figure 6 is a photograph of this drop on such a grafted glass slide ( Figure 6A) or on a blank glass slide ( Figure 6B).
- Example III Grafting of the pair 4- NBDT / PDMS on gold and glass with ferrocene III.1. Reagents.
- Example III The reagents used in Example III are:
- FIG. 8 show the values of the contact angle obtained for a drop of water placed on a blank glass slide or on a glass slide on which has been grafted an organic film obtained from of 4-NBDT and PDMS for 30 min or 60 min (10 independent measurements).
- Figure 9 is a photograph of this drop on such a grafted glass slide ( Figure 9A) or on a blank glass slide ( Figure 9B).
- the glass samples treated for 60 minutes were annealed in an oven at 120 ° C. for 18 h. This treatment makes it possible to increase the value of the contact angle by an average of 10 °.
- SDBS sodium dodecylbenzene sulfonate
- the values of the contact angles of a blank glass slide, a glass slide treated according to the protocol described above and a gold slide which has undergone the same treatment are respectively 28.7 ⁇ 4.4; 100 ⁇ 4.6 and 96.8 ⁇ 3.8.
- Example V grafting of vinylPDMS in emulsion in the presence of SDS or SDBS on gold and glass slides.
- 20 ml of deionized water, 0.050 g (ie 1.3 ⁇ 10 -2 M) of SDS were poured in.
- 1.4 ml of vinyl was added.
- PDMS (Mw ⁇ 25000) are introduced and the stirring is continued for 10 min
- 0.075 g of NBDT (1.48 ⁇ 10 -2 M) were added to the reaction medium.
- the gold or glass slides to be treated are then immersed in the solution for a period of 60 minutes.
- the values of the contact angles of a blank glass slide, a glass slide treated according to the protocol described above and a gold slide which has undergone the same treatment are 28.7 ⁇ 4.4; 100 ⁇ 4.6 and 96.8 ⁇ 3.8 respectively.
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
- Paints Or Removers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0952147A FR2943930B1 (fr) | 2009-04-02 | 2009-04-02 | Procede pour modifier l'energie de surface d'un solide |
| PCT/EP2010/054473 WO2010112610A2 (fr) | 2009-04-02 | 2010-04-02 | Procédé pour modifier l'énergie de surface d'un solide |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP2414108A2 true EP2414108A2 (fr) | 2012-02-08 |
| EP2414108B1 EP2414108B1 (fr) | 2017-09-27 |
Family
ID=41459179
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP10713182.3A Not-in-force EP2414108B1 (fr) | 2009-04-02 | 2010-04-02 | Procédé pour modifier l'énergie de surface d'un solide |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9381541B2 (fr) |
| EP (1) | EP2414108B1 (fr) |
| JP (1) | JP5889180B2 (fr) |
| FR (1) | FR2943930B1 (fr) |
| WO (1) | WO2010112610A2 (fr) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2954326B1 (fr) * | 2009-12-23 | 2013-01-18 | Valois Sas | Procede de traitement de surface d'un dispositif de distribution de produit fluide. |
| FR2954330B1 (fr) * | 2009-12-23 | 2013-01-04 | Valois Sas | Procede de traitement de surface d'un dispositif de distribution de produit fluide. |
| FR2954328B1 (fr) * | 2009-12-23 | 2013-01-18 | Valois Sas | Procede de traitement de surface d'un dispositif de distribution de produit fluide. |
| FR2954329B1 (fr) * | 2009-12-23 | 2013-01-18 | Valois Sas | Procede de traitement de surface elastomere d'un dispositif de distribution de produit fluide. |
| FR2969628B1 (fr) * | 2010-12-22 | 2013-09-27 | Pegastech | Procede de revetement par greffage chimique electrocatalyse d'une surface d'un substrat par une couche polymere. |
| FR2980982B1 (fr) | 2011-10-07 | 2014-10-24 | Commissariat Energie Atomique | Dispositif comprenant un materiau composite presentant des nanotubes soumis a un champ electrique et ses utilisations |
| FR3003482B1 (fr) | 2013-03-19 | 2016-06-24 | Aptar France Sas | Procede de traitement de surface d'une valve doseuse. |
| CN106206252B (zh) * | 2016-06-30 | 2019-06-21 | 上海交通大学 | 在半导体基材表面一步法化学接枝有机膜的方法 |
| FR3083618B1 (fr) | 2018-07-09 | 2021-03-12 | Commissariat Energie Atomique | Dispositif portable de microscopie electrochimique, kits le comprenant et leurs utilisations |
| BE1029387B1 (nl) * | 2021-05-05 | 2022-12-06 | Flooring Ind Ltd Sarl | Werkwijze voor het vervaardigen van panelen; en panelen hiermee bekomen |
| US20240254779A1 (en) * | 2021-05-05 | 2024-08-01 | Unilin, Bv | Method for the manufacture of panels and panels obtained thereby |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2837842B1 (fr) * | 2002-03-26 | 2004-06-18 | Commissariat Energie Atomique | Procede de fixation de macro-objets sur une surface conductrice ou semi-conductrice de l'electricite par electro-greffage, surfaces obtenues et applications |
| FR2871162B1 (fr) * | 2004-06-02 | 2007-06-29 | Univ Paris 7 Denis Diderot | Materiau de surface modifiee, son procede de preparation et ses utilisations |
| FR2892325B1 (fr) * | 2005-10-26 | 2008-01-18 | Alchimer Sa | Procede de modification de surfaces isolantes, semi-conductrices ou metalliques, et produits tels qu'obtenus |
| FR2897876B1 (fr) * | 2006-02-28 | 2008-04-18 | Commissariat Energie Atomique | Procede de formation de films organiques sur des surfaces conductrices ou semi-conductrices de l'electricite a partir de solutions aqueuses |
| US8405217B2 (en) * | 2006-03-06 | 2013-03-26 | Alchimer | Coating method and solutions for enhanced electromigration resistance |
| FR2910010B1 (fr) * | 2006-12-19 | 2009-03-06 | Commissariat Energie Atomique | Procede de preparation d'un film organique a la surface d'un support solide dans des conditions non-electrochimiques, support solide ainsi obtenu et kit de preparation |
| FR2921516B1 (fr) | 2007-09-20 | 2010-03-12 | Commissariat Energie Atomique | Procede d'electrogreffage localise sur des substrats semi-conducteurs photosensibles |
-
2009
- 2009-04-02 FR FR0952147A patent/FR2943930B1/fr not_active Expired - Fee Related
-
2010
- 2010-04-02 EP EP10713182.3A patent/EP2414108B1/fr not_active Not-in-force
- 2010-04-02 US US13/262,559 patent/US9381541B2/en not_active Expired - Fee Related
- 2010-04-02 WO PCT/EP2010/054473 patent/WO2010112610A2/fr not_active Ceased
- 2010-04-02 JP JP2012502707A patent/JP5889180B2/ja not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2010112610A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2943930A1 (fr) | 2010-10-08 |
| WO2010112610A3 (fr) | 2010-12-09 |
| JP5889180B2 (ja) | 2016-03-22 |
| JP2012522663A (ja) | 2012-09-27 |
| WO2010112610A2 (fr) | 2010-10-07 |
| EP2414108B1 (fr) | 2017-09-27 |
| FR2943930B1 (fr) | 2011-09-30 |
| US9381541B2 (en) | 2016-07-05 |
| US20120196035A1 (en) | 2012-08-02 |
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