EP2297380A2 - Revêtements mésostructurés comprenant un agent texturant particulier, pour application en aéronautique et aérospatiale - Google Patents
Revêtements mésostructurés comprenant un agent texturant particulier, pour application en aéronautique et aérospatialeInfo
- Publication number
- EP2297380A2 EP2297380A2 EP09742242A EP09742242A EP2297380A2 EP 2297380 A2 EP2297380 A2 EP 2297380A2 EP 09742242 A EP09742242 A EP 09742242A EP 09742242 A EP09742242 A EP 09742242A EP 2297380 A2 EP2297380 A2 EP 2297380A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- groups
- metal
- structure according
- group
- alkylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000003795 chemical substances by application Substances 0.000 title claims abstract description 38
- 238000000576 coating method Methods 0.000 title claims description 16
- 239000011248 coating agent Substances 0.000 title claims description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 54
- 239000002184 metal Substances 0.000 claims abstract description 54
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 239000002243 precursor Substances 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 16
- -1 methacryloxy Chemical group 0.000 claims description 61
- 239000004094 surface-active agent Substances 0.000 claims description 35
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 31
- 125000000217 alkyl group Chemical group 0.000 claims description 25
- 125000002947 alkylene group Chemical group 0.000 claims description 19
- 150000004703 alkoxides Chemical class 0.000 claims description 17
- 125000004429 atom Chemical group 0.000 claims description 16
- 238000005260 corrosion Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 14
- 238000007306 functionalization reaction Methods 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 230000000536 complexating effect Effects 0.000 claims description 13
- 239000011159 matrix material Substances 0.000 claims description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 12
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 12
- 239000003446 ligand Substances 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- 230000007797 corrosion Effects 0.000 claims description 11
- 238000005507 spraying Methods 0.000 claims description 11
- 239000010936 titanium Substances 0.000 claims description 11
- 125000003342 alkenyl group Chemical group 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 10
- 229910001507 metal halide Inorganic materials 0.000 claims description 10
- 150000005309 metal halides Chemical class 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 239000002105 nanoparticle Substances 0.000 claims description 9
- 238000002360 preparation method Methods 0.000 claims description 9
- 239000000523 sample Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 125000000129 anionic group Chemical group 0.000 claims description 8
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- 125000002091 cationic group Chemical group 0.000 claims description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 7
- 230000002209 hydrophobic effect Effects 0.000 claims description 7
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 7
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 7
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 7
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- 125000000304 alkynyl group Chemical group 0.000 claims description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 6
- 230000033444 hydroxylation Effects 0.000 claims description 6
- 238000005805 hydroxylation reaction Methods 0.000 claims description 6
- 239000004816 latex Substances 0.000 claims description 6
- 229920000126 latex Polymers 0.000 claims description 6
- 229910021645 metal ion Inorganic materials 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 125000005641 methacryl group Chemical group 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 6
- 229920002554 vinyl polymer Polymers 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 5
- 125000006681 (C2-C10) alkylene group Chemical group 0.000 claims description 5
- 125000006017 1-propenyl group Chemical group 0.000 claims description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 5
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 claims description 5
- 150000001768 cations Chemical class 0.000 claims description 5
- 239000008139 complexing agent Substances 0.000 claims description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 5
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 claims description 5
- QQVDJLLNRSOCEL-UHFFFAOYSA-N (2-aminoethyl)phosphonic acid Chemical compound [NH3+]CCP(O)([O-])=O QQVDJLLNRSOCEL-UHFFFAOYSA-N 0.000 claims description 4
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 4
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052684 Cerium Inorganic materials 0.000 claims description 4
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 4
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 claims description 4
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 claims description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 150000001450 anions Chemical class 0.000 claims description 4
- 125000000732 arylene group Chemical group 0.000 claims description 4
- 150000001277 beta hydroxy acids Chemical class 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 4
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000001624 naphthyl group Chemical group 0.000 claims description 4
- 150000001282 organosilanes Chemical class 0.000 claims description 4
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 238000011282 treatment Methods 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 125000004450 alkenylene group Chemical group 0.000 claims description 3
- 125000004419 alkynylene group Chemical group 0.000 claims description 3
- 239000012736 aqueous medium Substances 0.000 claims description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 3
- 239000012964 benzotriazole Substances 0.000 claims description 3
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims description 3
- 150000003983 crown ethers Chemical class 0.000 claims description 3
- 150000002170 ethers Chemical class 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 238000006068 polycondensation reaction Methods 0.000 claims description 3
- 229920001021 polysulfide Polymers 0.000 claims description 3
- 239000005077 polysulfide Substances 0.000 claims description 3
- 150000008117 polysulfides Polymers 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 150000003568 thioethers Chemical class 0.000 claims description 3
- 150000004798 β-ketoamides Chemical class 0.000 claims description 3
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 claims description 2
- BFCFYVKQTRLZHA-UHFFFAOYSA-N 1-chloro-2-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1Cl BFCFYVKQTRLZHA-UHFFFAOYSA-N 0.000 claims description 2
- HZONRRHNQILCNO-UHFFFAOYSA-N 1-methyl-2h-pyridine Chemical compound CN1CC=CC=C1 HZONRRHNQILCNO-UHFFFAOYSA-N 0.000 claims description 2
- CJNRGSHEMCMUOE-UHFFFAOYSA-N 2-piperidin-1-ylethanamine Chemical compound NCCN1CCCCC1 CJNRGSHEMCMUOE-UHFFFAOYSA-N 0.000 claims description 2
- PGBVLOMZZHYJFP-UHFFFAOYSA-N 3-methyldithietane Chemical compound CC1CSS1 PGBVLOMZZHYJFP-UHFFFAOYSA-N 0.000 claims description 2
- DOWDGYOGXLYYQU-OWOJBTEDSA-N 4-[(e)-8-pyridin-4-yloct-4-enyl]pyridine Chemical compound C=1C=NC=CC=1CCC\C=C\CCCC1=CC=NC=C1 DOWDGYOGXLYYQU-OWOJBTEDSA-N 0.000 claims description 2
- SLXKOJJOQWFEFD-UHFFFAOYSA-N 6-aminohexanoic acid Chemical group NCCCCCC(O)=O SLXKOJJOQWFEFD-UHFFFAOYSA-N 0.000 claims description 2
- 239000005725 8-Hydroxyquinoline Substances 0.000 claims description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
- 229910000861 Mg alloy Inorganic materials 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 125000004103 aminoalkyl group Chemical group 0.000 claims description 2
- 229960002684 aminocaproic acid Drugs 0.000 claims description 2
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 238000009833 condensation Methods 0.000 claims description 2
- 238000000280 densification Methods 0.000 claims description 2
- 125000001188 haloalkyl group Chemical group 0.000 claims description 2
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229960003540 oxyquinoline Drugs 0.000 claims description 2
- 125000005009 perfluoropropyl group Chemical group FC(C(C(F)(F)F)(F)F)(F)* 0.000 claims description 2
- RIZGKEIRSQLIBK-UHFFFAOYSA-N prop-1-ene-1-thiol Chemical compound CC=CS RIZGKEIRSQLIBK-UHFFFAOYSA-N 0.000 claims description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 2
- 150000002910 rare earth metals Chemical class 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 claims description 2
- 238000006748 scratching Methods 0.000 claims description 2
- 230000002393 scratching effect Effects 0.000 claims description 2
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 2
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims 4
- 125000006650 (C2-C4) alkynyl group Chemical group 0.000 claims 3
- 229930192474 thiophene Natural products 0.000 claims 2
- QGJVYXRCWILZPX-UHFFFAOYSA-N 1-(3-methyloctyl)pyridin-1-ium Chemical compound CCCCCC(C)CC[N+]1=CC=CC=C1 QGJVYXRCWILZPX-UHFFFAOYSA-N 0.000 claims 1
- DCLKMMFVIGOXQN-UHFFFAOYSA-N 1-hexadecyl-3-methylimidazol-3-ium Chemical compound CCCCCCCCCCCCCCCCN1C=C[N+](C)=C1 DCLKMMFVIGOXQN-UHFFFAOYSA-N 0.000 claims 1
- BQPSIHGSNDPNIR-UHFFFAOYSA-N 4-pent-4-enylpyridine Chemical compound C=CCCCC1=CC=NC=C1 BQPSIHGSNDPNIR-UHFFFAOYSA-N 0.000 claims 1
- MUHSSCIXCFPQHS-UHFFFAOYSA-N 5-methyltetrathiane Chemical compound CC1CSSSS1 MUHSSCIXCFPQHS-UHFFFAOYSA-N 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000002883 imidazolyl group Chemical group 0.000 claims 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 46
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 9
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 5
- 235000001014 amino acid Nutrition 0.000 description 5
- 150000001413 amino acids Chemical class 0.000 description 5
- 229920001400 block copolymer Polymers 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000003945 anionic surfactant Substances 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 230000003301 hydrolyzing effect Effects 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 239000002609 medium Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000003093 cationic surfactant Substances 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000007850 fluorescent dye Substances 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 239000002563 ionic surfactant Substances 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 238000009987 spinning Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 2
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 235000004279 alanine Nutrition 0.000 description 2
- 150000001280 alpha hydroxy acids Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012456 homogeneous solution Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 229920000592 inorganic polymer Polymers 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 2
- 229960000907 methylthioninium chloride Drugs 0.000 description 2
- 239000000693 micelle Substances 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 229920001983 poloxamer Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 238000003908 quality control method Methods 0.000 description 2
- GUEIZVNYDFNHJU-UHFFFAOYSA-N quinizarin Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C(O)=CC=C2O GUEIZVNYDFNHJU-UHFFFAOYSA-N 0.000 description 2
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 2
- 229960004889 salicylic acid Drugs 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000002336 sorption--desorption measurement Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- CRSBERNSMYQZNG-UHFFFAOYSA-N 1-dodecene Chemical group CCCCCCCCCCC=C CRSBERNSMYQZNG-UHFFFAOYSA-N 0.000 description 1
- WJYAJBDKANFOID-UHFFFAOYSA-N 2-(dodecylamino)propanoic acid Chemical compound CCCCCCCCCCCCNC(C)C(O)=O WJYAJBDKANFOID-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- DWMSYQDOPYSCJR-UHFFFAOYSA-M 2-ethenyl-1-methylpyridin-1-ium;iodide Chemical compound [I-].C[N+]1=CC=CC=C1C=C DWMSYQDOPYSCJR-UHFFFAOYSA-M 0.000 description 1
- KXYAVSFOJVUIHT-UHFFFAOYSA-N 2-vinylnaphthalene Chemical compound C1=CC=CC2=CC(C=C)=CC=C21 KXYAVSFOJVUIHT-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- GUOVBFFLXKJFEE-UHFFFAOYSA-N 2h-benzotriazole-5-carboxylic acid Chemical compound C1=C(C(=O)O)C=CC2=NNN=C21 GUOVBFFLXKJFEE-UHFFFAOYSA-N 0.000 description 1
- AVFZRVATGMEQNJ-UHFFFAOYSA-N 3-methyl-1-octylpyridin-1-ium Chemical compound CCCCCCCC[N+]1=CC=CC(C)=C1 AVFZRVATGMEQNJ-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- HJFRTVLPBMFXIB-UHFFFAOYSA-N CCCC.CC#C[Sn](C#CC)C#CC.CC#C[Sn](C#CC)C#CC Chemical compound CCCC.CC#C[Sn](C#CC)C#CC.CC#C[Sn](C#CC)C#CC HJFRTVLPBMFXIB-UHFFFAOYSA-N 0.000 description 1
- YWFWFKWESUBRPV-UHFFFAOYSA-N C[Sn].C1(=CC=CC=C1)C#C.C1(=CC=CC=C1)C#C.C1(=CC=CC=C1)C#C Chemical compound C[Sn].C1(=CC=CC=C1)C#C.C1(=CC=CC=C1)C#C.C1(=CC=CC=C1)C#C YWFWFKWESUBRPV-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- ATWLCPHWYPSRBQ-UHFFFAOYSA-N N-Methylacetoacetamide Chemical compound CNC(=O)CC(C)=O ATWLCPHWYPSRBQ-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 229920002367 Polyisobutene Polymers 0.000 description 1
- 108010039918 Polylysine Proteins 0.000 description 1
- 229920001213 Polysorbate 20 Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910020813 Sn-C Inorganic materials 0.000 description 1
- 229910018732 Sn—C Inorganic materials 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910003087 TiOx Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000000333 X-ray scattering Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- HMMGRNJKYXECPZ-UHFFFAOYSA-K aluminum;4,4-di(butan-2-yloxy)-3-oxohexanoate Chemical compound [Al+3].CCC(C)OC(CC)(OC(C)CC)C(=O)CC([O-])=O.CCC(C)OC(CC)(OC(C)CC)C(=O)CC([O-])=O.CCC(C)OC(CC)(OC(C)CC)C(=O)CC([O-])=O HMMGRNJKYXECPZ-UHFFFAOYSA-K 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229920000469 amphiphilic block copolymer Polymers 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000003842 bromide salts Chemical class 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- VEGRTTZOXYUSTI-UHFFFAOYSA-N butyl-tri(propan-2-yloxy)stannane Chemical compound CCCC[Sn](OC(C)C)(OC(C)C)OC(C)C VEGRTTZOXYUSTI-UHFFFAOYSA-N 0.000 description 1
- HBFVJHBSIGNCPC-UHFFFAOYSA-N butyl-tris(prop-1-ynyl)stannane Chemical compound CCCC[Sn](C#CC)(C#CC)C#CC HBFVJHBSIGNCPC-UHFFFAOYSA-N 0.000 description 1
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical compound CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- HSJPMRKMPBAUAU-UHFFFAOYSA-N cerium(3+);trinitrate Chemical compound [Ce+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O HSJPMRKMPBAUAU-UHFFFAOYSA-N 0.000 description 1
- RLGQACBPNDBWTB-UHFFFAOYSA-N cetyltrimethylammonium ion Chemical compound CCCCCCCCCCCCCCCC[N+](C)(C)C RLGQACBPNDBWTB-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- OGQYPPBGSLZBEG-UHFFFAOYSA-N dimethyl(dioctadecyl)azanium Chemical compound CCCCCCCCCCCCCCCCCC[N+](C)(C)CCCCCCCCCCCCCCCCCC OGQYPPBGSLZBEG-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- UCYFZDNMZYZSPN-UHFFFAOYSA-N docosyl(trimethyl)azanium Chemical compound CCCCCCCCCCCCCCCCCCCCCC[N+](C)(C)C UCYFZDNMZYZSPN-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- JVICFMRAVNKDOE-UHFFFAOYSA-M ethyl violet Chemical compound [Cl-].C1=CC(N(CC)CC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 JVICFMRAVNKDOE-UHFFFAOYSA-M 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- STZCRXQWRGQSJD-GEEYTBSJSA-M methyl orange Chemical compound [Na+].C1=CC(N(C)C)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-GEEYTBSJSA-M 0.000 description 1
- 229940012189 methyl orange Drugs 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- IPMWIVQWGGRTLD-UHFFFAOYSA-N n'-[2-(propylamino)ethyl]ethane-1,2-diamine Chemical compound CCCNCCNCCN IPMWIVQWGGRTLD-UHFFFAOYSA-N 0.000 description 1
- 239000002114 nanocomposite Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 229920001992 poloxamer 407 Polymers 0.000 description 1
- 229920001308 poly(aminoacid) Polymers 0.000 description 1
- 229920000656 polylysine Polymers 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000136 polysorbate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000004299 sodium benzoate Substances 0.000 description 1
- 235000010234 sodium benzoate Nutrition 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000012703 sol-gel precursor Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 150000003512 tertiary amines Chemical group 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229920000428 triblock copolymer Polymers 0.000 description 1
- YSCVYRUCAPMZFG-UHFFFAOYSA-K trichlorotin Chemical compound Cl[Sn](Cl)Cl YSCVYRUCAPMZFG-UHFFFAOYSA-K 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- VPGLGRNSAYHXPY-UHFFFAOYSA-L zirconium(2+);dichloride Chemical compound Cl[Zr]Cl VPGLGRNSAYHXPY-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/06—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Definitions
- Mesostructured coatings comprising a particular texturizing agent for aeronautical and aerospace application
- the present invention relates to a structure comprising a mesostructured coating which comprises a particular texturing agent for use in aeronautical and aerospace applications.
- chromium VI surface treatments for example, by means of a chromic anodic oxidation process, or a conversion layer.
- chromium VI is toxic, carcinogenic and dangerous for the environment. In the long run its use should be prohibited.
- US 2003/024432 discloses a coating having anti-corrosion properties, prepared sol-gel from an organometallic compound such as an alkoxyzirconium, an organosilane, and one or more compounds carrying a borate, zinc or phosphate function, in the presence of an organic catalyst such as acetic acid.
- an organometallic compound such as an alkoxyzirconium, an organosilane, and one or more compounds carrying a borate, zinc or phosphate function
- an organic catalyst such as acetic acid.
- US Pat. Nos. 6,261,638 and 1,097,259 disclose methods for preventing the corrosion of metals, comprising the application of a treatment solution based on polyfunctional silanes and on difunctional silanes comprising in their chain several atoms. sulfur, respectively.
- these materials have the disadvantage of not being micro- or nanostructured, that is to say that the distribution of organic and inorganic domains in the material can not be controlled at the micrometer or nanometer scale. This random distribution can lead to non-reproducible properties from one material to another.
- An advantage of the sol-gel process consists in constructing a three-dimensional network from starting precursors under so-called mild conditions, that is to say at a temperature below 200 ° C., and in a water or water / solvent medium. less harmful to the environment than those used for conventional surface treatments.
- the starting precursors generally used in said sol-gel process are metal alkoxides comprising one or more hydrolyzable groups.
- Other types of so - called mesostructured coatings with anti - corrosion properties have been recently described in the article "TiOx self - assembled networks prepared by templating approach as nanostructured tanks for self - healing anticorrosion pre - treatments", by SV Lamaka et al. , Electrochemistry Communications 5, 2006, 421-428.
- these coatings are prepared from a titanium alkoxide, leading to a photocatalyst material that degrades rapidly when exposed to the sun.
- This control is achieved by means of structures comprising at least one particular mesostructured layer and a metal substrate.
- the hybrid and inorganic mesostructured layers are in particular known and described in the article "mesostructured hybrid organic-inorganic thin films", by L. Nicole et al., J. Mater. Chem. , 2005, 15, 3598-3627.
- These mesostructured layers have a controlled porosity, that is to say a pore size of between 2 and 50 nm, measured, for example, by adsorption-desorption of gas, and are structured at the nanoscale.
- These mesostructured layers may comprise various functionalities that make it possible to confer on a metal substrate (or surface), in particular an alloy of aluminum, titanium or magnesium, or a steel, for example, a protection against corrosion, a resistance to scratches and rubbing, good mechanical strength and / or color and / or constitute a probe for quality control while having good adhesion to the metal substrate.
- these layers can allow the coexistence of several different functionalities and can be deposited by any conventional technique such as, for example, by dip-coating, deposit on spinning substrate (or spin-coating) , spraying, spraying, laminar coating and brush.
- the individual components may be designed to have a life time compatible with industrial cycles, for example, greater than or equal to 12 months, and to be mixed just prior to their application. Their formulation has the additional advantage of using components that are compatible with environmental regulations, and in particular to be mainly in an aqueous medium.
- the subject of the present invention is therefore a structure comprising: a metal substrate, at least one mesostructured layer as defined below, and optionally at least one dense layer.
- Said mesostructured layer (s) is (are) prepared by sol-gel from at least one metal molecular precursor comprising one or more hydrolysable groups of formula (1), (2), (3) or (4) defined below, in the presence of at least one particular texturing agent as defined below.
- the texturizing agent is preserved in the final material and gives it at least one macroscopic property, and possibly a latex.
- This preparation by sol-gel route is generally carried out in the presence of water and optionally at least one volatile solvent such as an alcohol such as ethanol and propanol, tetrahydrofuran, acetone, dioxane, a di- ether, chloroform or acetonitrile.
- a volatile solvent such as an alcohol such as ethanol and propanol, tetrahydrofuran, acetone, dioxane, a di- ether, chloroform or acetonitrile.
- hydrolyzable group is meant a group capable of reacting with water to give a group -OH, which will undergo itself a polycondensation.
- Said metal precursor (s) containing one or more hydrolyzable groups are of alkoxide or metal halide type, preferably metal alkoxide, or alkynylmetal type of formula:
- M represents Al (III), Ce (III), Ce (IV), Si (IV), Zr (IV), Sn (IV), Hf (IV), Nb (V), V (V) or Ta (V) ), preferably Al (III), Ce (III), Ce (IV), Si (IV),
- each Z represents, independently of one another, a halogen atom or a group -OR, and preferably a group -OR; in the case where M or M 'denotes Sn, each Z represents, independently of one another, a halogen atom or a group -OR, and preferably a group -OR, or alternatively an alkynyl group -C ⁇ C-R '"whereinR'" represents a hydrogen atom, an alkyl group, preferably C - I 0, such as methyl or butyl group, an aryl group having 6 I 0, such that a phenyl group, a C 7 -C 18 alkylaryl or arylalkyl group such as a benzyl group; R represents an alkyl group preferably comprising 1 to 4 carbon atoms, such as
- L represents a monodentate or polydentate complexing ligand, preferably polydentate, for example a carboxylic acid, preferably a C 1 - I 8 carboxylic acid, such as acetic acid, a C 5-20 ⁇ -diketone, for example acetylacetone; a ⁇ -ketoester preferably C 5-20 , such as methyl acetoacetate, a ⁇ -ketoamide preferably C 5-20 , such as N-methylacetoacetamide, a ⁇ -or ⁇ -hydroxyacid preferably C 3 -20 , such as lactic acid or salicylic acid, an amino acid such as alanine, a polyamine such as diethylenetriamine (or DETA), or phosphonic acid or a phosphonate; m represents the hydroxylation number of ligand L; and R "represents a non-hydrolysable functional group chosen from alkylene groups, preferably C - 12, for example, methylene, ethylene, propylene,
- M is different from Si for formula (2).
- exemplary compounds of formula (1) there may be mentioned tetra (alkoxy C i -4) silanes and the zirconium n-propoxide Zr (OCH 2 CH 2 CH 3) 4.
- organoalkoxysilane of formula (3) there may be mentioned 3-aminopropyltrialkoxysilane (RO) 3 Si- (CH 2 ) 3 -
- bis-alkoxysilane of formula (4) As examples of bis-alkoxysilane of formula (4), a bis- [trialkoxysilyl] methane (RO) 3 Si-CH 2 -Si (OR) 3 , a bis- [trialkoxysilyl] ethane (RO) 3 Si is preferably used. - (CH 2 ) 2 -Si (OR) 3 , a bis-
- compound of formula (4) there may also be mentioned bis (trichloro-tin) phenyl Cl 3 Sn-C 6 H 4 -SnCl 3 or bis (tripropynyltin) butane (CH 3 -C 5) 3 -Sn- ( CH 2 ) 4 -Sn- (C ⁇ C-CH 3 ) 3 .
- Said at least one texturizing agent (s) used in the present invention is or are chosen from:
- Ionic amphiphilic surfactants such as anionic and cationic, in which the counterion is chosen from Nd 3+ , Pr 3+ , Co 3+ , Ce 3+ and Ce 4+ when the surfactant is anionic, and from the anions vanadates, molybdates and permanganates when the surfactant is cationic, and
- Amphiphilic surfactants additionally bearing: one or more active organic anti-corrosion functions, and / or one or more metal ion complexing groups.
- the elemental nanoblocks that can be used as structuring agents are well-known materials and described in particular in the article "Designed hybrid organic-inorganic nanocomposites from functional nanobuilding blocks" by C. Sanchez et al., Chem. Mater.,
- the elementary nanoblocks used in the present invention are in the form of clusters or nanoparticles, preferably nanoparticles of size ranging from 2 to 100 nm, better still from 2 to 50 nm, more preferably from 2 to 20 nm, more preferably from 2 to 10 nm and even more preferably 2 to 5 nm, the diameter of these nanoparticles being measurable by transmission microscopy (or TEM), X-ray diffraction and X-ray scattering at small angles or light scattering.
- the nanoparticles have a size having a low dispersion.
- These elementary nanoblocks are essentially based on at least one metal oxide, the metal oxide being chosen for example from aluminum oxides, cerium III and IV, silicon, zirconium, titanium and tin, more preferably among the oxides of zirconium and cerium IV.
- metal oxide being chosen for example from aluminum oxides, cerium III and IV, silicon, zirconium, titanium and tin, more preferably among the oxides of zirconium and cerium IV.
- a first method consists of synthesizing them from metal salts by precipitation.
- Complexing agents may be introduced into the reaction medium to control the size of the elementary nanoblocks formed and ensure their dispersion in the solvent by functionalization of the surface of the nanoblocks with monodentate or polydentate complexing agents, such as, for example, carboxylic acid, ⁇ - diketone, ⁇ -ketoester, ⁇ - or ⁇ -hydroxyacid, phosphonate, polyamine and amino acid.
- monodentate or polydentate complexing agents such as, for example, carboxylic acid, ⁇ - diketone, ⁇ -ketoester, ⁇ - or ⁇ -hydroxyacid, phosphonate, polyamine and amino acid.
- the weight ratio between the mineral and organic components is in particular between 20 and 95%.
- Elemental nanoblocks can also be obtained from at least one metal alkoxide or metal halide, preferably metal alkoxide, via hydrolytic or non-hydrolytic processes.
- a hydrolytic process the controlled hydrolysis of at least one metal alkoxide precursor or metal halide of the general formula: M 1 (ZO n , (5),
- M 1 represents Al (III), Ce (III), Ce (IV), Si (IV), Zr (IV), Ti (IV) or Sn (IV), preferably Zr (IV) or Ce (IV), the number in parenthesis being the valence of the metal atom, M 1 'is Si (IV) or Sn (IV), nj is the valence of the atom Mi, Xi is an integer from 1 to nj - 1, X 1 'is an integer ranging from 1 to 3,
- Z 1 represents a halogen atom or -OR 1, preferably -OR 1;
- R 1 represents an alkyl group. preferably comprising 1 to 4 carbon atoms, such as a methyl, ethyl, n-propyl, i-propyl or butyl group, preferably methyl or ethyl;
- R 1 ' represents a non-hydrolyzable group selected from alkyl groups including C 1 -4 , for example, methyl, ethyl, propyl or butyl; alkenyl groups, especially C 2-4 alkenyl, such as vinyl, 1-propenyl, 2-propenyl and butenyl; alkynyl groups, especially C 2-4 , such as acetylenyl and propargyl; aryl groups, in particular C 6-10 , such as phenyl and naphthyl; methacryl or methacryloxy (C 1 -C 10 ) alkyl groups such as methacryloxypropyl; and epoxyalkyl or epoxyalkoxyalkyl in which the alkyl groups is linear, branched or cyclic Ci - I 0, and the alkoxy group contains from 1 to 10 carbon atoms, such as glycidyl and glycidyloxy (C i - I 0 ); Li is a monoden
- Controlled hydrolysis is understood to mean a limitation of the growth of the species formed by controlling the amount of water introduced into the medium and possibly by introducing a complexing agent of the metallic central atom, in order to reduce the reactivity of the precursors .
- the elementary nanoblocks used in the present invention are preferably in the form of amorphous nanoparticles or crystallized, and may be surface functionalized with a functionalizing agent for NBB.
- the post-functionalization can be carried out chemically, by choosing a difunctional molecule as functionalizing agent for NBB, one of whose functions has a high affinity for the surface of the elementary nanoblock and the other function will be able to interact with the matrix but will not exhibit no or very little affinity for the surface of the elementary nanoblock.
- the chemical functionalization thus makes it possible to modify the surface of the nanoblocks, in particular by simply mixing a solution containing the elementary nanoblocks with a solution containing the functionalization agent for NBB.
- Examples of functional groups having an affinity for the surface of the nanoblock include, for example, a carboxylic acid function, a diketone function or a phosphate or phosphonate function.
- functions that can interact with the matrix include primary, secondary or tertiary amine groups such as C 1 -C 8 alkylamino, and polymerizable functions such as vinyl, acrylate or methacrylate.
- di-functional molecules used as functionalizing agent for NBB there may be mentioned 6-aminocaproic acid and 2-aminoethylphosphonic acid.
- the degree of functionalization is greater than or equal to 20%.
- the elementary nanoblocks can be further functionalized by complexing agents comprising one or more metal complexing groups as defined below, linked to a C 1 -C 20 alkyl group. These complexing molecules becoming preferentially around these nanoblocks according to a monolayer.
- a second layer will consist of preferably ionic amphiphilic surfactants.
- the counter ion of the ionic surfactants will preferably be Nd 3+ , Pr 3+ , Co 3+ , Ce 3+ , Ce 4+ cations for anionic surfactant or vanadate, molybdate, permanganate anions for a cationic surfactant.
- amphiphilic surfactant which may be used in the invention as texturizing agents, are ionic amphiphilic surfactants such as anionic or cationic, amphoteric or zwitterionic, or nonionic, and which can be further photo- or thermo-polymerizable.
- This surfactant can be an amphiphilic molecule or a macromolecule (or polymer) having an amphiphilic structure.
- a Examples of cationic amphiphilic surfactants that may be mentioned include quaternary ammonium salts such as those of formula (I) below, or imidazolium or pyridinium or phosphonium salts.
- radicals R 8 to R n which may be the same or different, represent a linear or branched alkyl group having 1 to 30 carbon atoms, and X represents a halogen atom such as a chlorine or bromine atom, or a sulfate.
- tetraalkylammonium halides such as, for example, dialkyldimethylammonium or alkyltrimethylammonium halides in which the alkyl radical comprises approximately
- amphoteric or zwitterionic amphiphilic surfactants examples include amino acids such as propionic amino acids of formula (R 1 ) 3 N + -CH 2 -CH 2 -COO " in which each R 12 , which is identical or different, , represents a hydrogen atom or a C 1 -C 20 alkyl group such as dodecyl, and more particularly dodecylamino propionic acid.
- Nonionic amphiphilic surfactants used in the present invention are preferably ethoxylated linear alcohols Cj 2-22, comprising from 2 to 30 ethylene oxide units, or esters of fatty acids having 12 to 22 carbon carbon, and sorbitan. It may especially be mentioned as examples those sold under the trademarks Brij ®, Span ® and Tween ® by Aldrich, for example, Brij ® 56 and 78, Tween 20 and Span ® ® 80.
- the amphiphilic surfactants not polymeric ionic are any amphiphilic polymer having both a hydrophilic character and a hydrophobic character. As examples of such copolymers, mention may in particular be made of:
- fluorinated copolymers CH 3 - [CH 2 -CH 2 -CH 2 -CH 2 -O] n -CO-Ri with R 1 C 4 F 9 or C 8 F 17 , biological copolymers such as polyamino acids, for example , polylysine and alginates, dendrimers such as those described in GJAA Soler-Illia, L. Rozes, MK Boggiano, C. Sanchez, CO. Turrin, AM Caminade, JP Majorai, Angew. Chem. Int. Ed.
- an amphiphilic block copolymer of the following type is preferably used: copolymer based on poly (meth) acrylic acid, polydiene-based copolymer, hydrogenated diene-based copolymer, poly-based copolymer (propylene oxide), copolymers based on poly (ethylene oxide), polyisobutylene copolymer, polystyrene copolymer, polysiloxane copolymer, poly (2-vinyl-naphthalene) copolymer, copolymer based on poly (vinyl pyridine and N-methyl vinyl pyridinium iodide), copolymer based on poly (vinyl pyrrolidone).
- a block copolymer consisting of poly (alkylene oxide) chains is preferably used, each block consisting of a poly (alkylene oxide) chain, the alkylene having a different number of carbon atoms depending on each chain. .
- one of the two blocks consists of a poly (alkylene oxide) chain of hydrophilic nature and the other block consists of a poly (oxide) chain. alkylene) of hydrophobic nature.
- two of the blocks are hydrophilic in nature while the other block, located between the two hydrophilic blocks, is hydrophobic in nature.
- the hydrophilic poly (alkylene oxide) chains are poly (ethylene oxide) chains noted (POE) 1 , and (POE) W and the poly chains (alkylene oxide) of a hydrophobic nature are chains of poly (propylene oxide), (POP) or chains V "poly (butylene oxide) or mixed chains in which each chain is a Mixing of several alkylene oxide monomers
- a compound of the formula (POE) u - (POP) v - (POE) W with 5 ⁇ u ⁇ 106 can be used, 33 ⁇ v ⁇ 70 and 5 ⁇ w ⁇ 106.
- the counterion may be chosen from Nd + , Pr 3+ , Co 3+ , Ce 3+ and Ce 4+ when the surfactant is anionic, and among the vanadate anions , molybdates and permanganates when the surfactant is cationic.
- the texturizing agent that may be used in the invention may also be an amphiphilic surfactant that also carries: one or more active organic anti-corrosion functions, and / or one or more metal ion complexing groups.
- active organic anti-corrosion functions examples include benzotriazole, 2-mercaptobenzothiazole, mercaptobenzimidazole, sodium benzoate, nitrochlorobenzene, chloranyl, 8-hydroxyquinoline, N-methylpyridine, piperidine, piperazine, 1,2-aminoethylpiperidine, N-2-aminoethylpiperazine, N-methylphenotiazine, imidazole or pyridine. These functions are linked directly or indirectly via a group comprising from 2 to 30 ethylene oxide units to a C 1 -C 20 alkyl group.
- the counter-ion of the surfactant will preferably be at least one of the Nd 3+ , Pr 3+ , Co 3+ , Ce 3+ , Ce 4+ cations for an anionic surfactant or at least one of the vanadate anions. , molybdates, permanganates for a cationic surfactant.
- the against-ion of the surfactant is preferably at least one Nd 3+ , Pr 3+ , Co 3+ , Ce 3+ , Ce 4+ cations for anionic surfactant or at least one vanadate, molybdate, permanganate anion for a cationic surfactant.
- surfactants that may be used in the present invention, there may be mentioned in particular benzotriazole-5-carboxylic acid esterified with polyoxyethylene cetyl ether which has the formula CH 3 - (CH 2 ) I 5 -O (CH 2 - CH 2 O) 20 -C (O) -C 6 H 3 N 3 H, vanadate of -hexadécyl-3-methylimidazolium or molybdate of 3-methyl-l - octylpyridinium.
- the texturizing agent (s) are preferably used in an amount ranging from 0.001 to 2 mol% relative to the total number of moles of the molecular metal precursor (s).
- the total number of moles of the molecular metal precursor (s) comprises the total number of moles of the molecular metallic precursor (s) of formulas (1) to (4).
- ingredients such as a latex may be further added during the preparation of the mesostructured layer.
- the mesostructured layer may further have at least one other functionality different from the corrosion resistance, that is, it may further comprise moieties imparting macroscopic properties to the substrate, such as scratch and friction, mechanical strength and hydrophobicity modularly desired, and / or groups constituting a probe for quality control.
- probe is meant by way of example an optical probe, a pH-sensitive probe, a dye or a selective fluorescent probe with specific cations or anions.
- This functionalization results either from the presence in at least one starting molecular metal precursor of formula (2), (3) or (4), a group R ', L and / or R "representing a group which confers a functional group (or group which confers a function on the mesostructured layer), or the addition of at least one functionalizing agent during the preparation of the mesostructured layer or the treatment of the mesostructured layer after it has been obtained, with at least one agent functionalising agent, or a combination of these three possibilities.
- Functionalising agent is understood in the sense of the present invention to mean an agent conferring a function on the mesostructured layer, such as a scratch and friction resistance or an mechanical, or constituting a fluorescent probe for capturing halogenated compounds, a pH sensitive probe, or conferring a color.
- a titanium or aluminum alkoxide, or silica or alumina nanoparticles can be used as a scorch- and friction-resistant agent.
- agent conferring a mechanical strength mention may be made especially of zirconia oxide.
- the agent constituting a fluorescent probe for capturing halogenated compounds may consist of an anthracene molecule carrying imidazolium groups.
- a pH-sensitive probe, methyl orange or phenolphthalein may be used as the constituting agent.
- a dye-giving agent there may be mentioned rhodamine, fluorescein, quinizarin, methylene blue and ethylvinol.
- the starting components are added in the following order, during the preparation of the mesostructured layer:
- a volatile solvent preferably an alcohol such as ethanol
- the structure can comprise several mesostructured layers, for example from 2 to 10 layers, presenting, if necessary, different mesostructures.
- mesostructured layers for example, from 2 to 10 layers, presenting, if necessary, different mesostructures.
- P l, P2, P3 and P4 respectively, the latter are between 2 and 50 nm,
- the structure comprises in a single mesostructured layer, a porosity gradient.
- the metal substrate which can be used in the present invention is preferably titanium, aluminum or one of their respective alloys, such as, for example, TA6V titanium, aluminum of the 2000 family, more particularly the plated or unplated Ai 2024 , the aluminum of the 7000 family, more particularly the Ai
- the mesostructured layer is deposited by means of simple techniques to be carried out on the metal substrates, for example by soaking-shrinking, deposition on spinning substrate (or spin-coating), spraying, spraying, laminar coating or brush coating, and preferably by spraying. In addition, these techniques use products that are compatible with the environment.
- the structures thus obtained exhibit, in particular, corrosion resistance, scratch and friction resistance, coloration and / or hydrophobicity which can be modulated as desired, good adhesion being observed between the mesostructured layer (s) and the metal substrate.
- One embodiment of the invention consists in that the structure further comprises at least one dense layer prepared by sol-gel, such as a layer described in French Patent Application No. 2,899,906.
- dense layer is meant a layer having no porosity at the micrometer and mesoscopic scale visible electron microscopic, and more particularly having a porosity of less than 1 nm, measured by gas adsorption-desorption.
- the dense layer is in particular prepared by sol-gel from at least one alkoxide or metal halide, preferably at least one metal alkoxide, as defined above using formulas (5). at (7).
- Said additional dense layer preferably comprises elementary nanoblocks (or nanobuilding blocks (NBB)) as defined above, and an organic or inorganic polymer or hybrid matrix.
- elementary nanoblocks or nanobuilding blocks (NBB)
- NNB nanobuilding blocks
- the elementary nanoblocks are introduced into an inorganic / organic polymer or hybrid matrix, preferably a hybrid of the sol / gel type, better still based on silica, and even more preferably consisting of silica or silica / zirconium oxide.
- This matrix will serve as connector through which the elementary nanoblocks will form a three-dimensional network.
- the inorganic / organic hybrid matrices are especially obtained by polycondensation of one or more metal alkoxides or metal halides, preferably one or more metal alkoxides, in the presence of a solvent, and optionally a catalyst.
- the metal alkoxides or metal halides employed are chosen especially from those having the general formulas: M 2 (Z 2 ) n 2 (8)
- n 2 represents the valence of the metal atom M 2, preferably 3, 4 or 5;
- X 2 is an integer ranging from 1 to n 2 - 1;
- M 2 represents a metal atom of valence III such as Al; a metal atom of valence IV such as Si, Ce, Zr and Ti; or a metal atom of valence V such as Nb.
- M 2 ' represents a silicon atom
- Z 2 represents a hydrolyzable group selected from halogen atoms; alkoxy groups preferably of C 1 -4 , such as methoxy, ethoxy, n-propoxy, i-propoxy and butoxy; aryloxy groups, in particular C 6 I 0, such as phenoxy; alkylcarbonyl and Ci - I 0 as acetyl.
- Z 2 represents a C 1-4 alkoxy group, and more particularly a methoxy, ethoxy, i-propoxy, n-butoxy, s-butoxy, i-butoxy or t-butoxy group;
- R 2 represents a monovalent non-hydrolyzable group selected from alkyl groups preferably C 1-4 , for example, methyl, ethyl, propyl and butyl; alkenyl groups, especially C 2-4 alkenyl groups, such as vinyl, 1-propenyl, 2-propenyl and butenyl; the alkynyl groups, especially C 2-4 such as acetylenyl and propargyl; aryl groups, in particular C 6- io, such as phenyl and naphthyl; methacryl and methacryloxy (C 1 -C 10 ) alkyl groups such as methacryloxypropyl; and epoxyalkyl groups or epoxyalkoxyalkyl wherein the alkyl group is linear, branched or cyclic C1-I 0, and the alkoxy group contains from 1 to 10 carbon atoms, such as glycidyl and glycidyloxy (C] - I 0 ).
- R 2 is
- L 2 represents a complexing ligand such as that described for Li above, and m 2 represents the hydroxylation index of ligand L 2 .
- the solvent used in the preparation of the matrix consists mainly of water. Preferably, it comprises 80 to 100% by weight of water relative to the total weight of the solvent, and optionally a C 1-4 alcohol, preferably ethanol or isopropanol.
- the catalyst is preferably an acid, more preferably acetic acid, or CO 2 .
- At least one additive may optionally be added, either during the preparation of the elementary nanoblocks, or during the mixing of the functionalized elementary nanoblocks and the matrix, or during these two steps.
- an additive is added during the preparation of the elementary nanoblocks, it is possible to form an end material of core / shell type, the core being constituted by the additive and the envelope being constituted by an elementary nanoblock.
- the additives that can be used in the invention include surfactants for improving the wettability of the soil on the functional mesoporous layer (s) already present, or the metal substrate, such as polymers.
- fluorinated nonionic surfactants sold under the trademarks FC 4432 and FC4430 by the company 3M; colorants, for example rhodamine, fluorescein, methylene blue and ethyl-violet; crosslinking agents such as diethylenetriamine (or DETA); coupling agents such as aminopropyltriethoxysilane (APTS); nanopigments, or mixtures thereof
- Said dense layer preferably comprising elementary nanoblocks and an organic / inorganic hybrid matrix, is obtained in particular, on the one hand: by preparing the elementary nanoblocks, in particular by a hydrolytic process or . not as described above, and optionally functionalizing them, on the other hand by preparing the matrix, then - by mixing the elementary nanoblocks possibly functionalized and the matrix.
- the mesostructured layer is preferably in direct contact with the substrate and thus acts as nanoresist of active compounds.
- a layer such as a dense layer or a native layer or of another type, may be between the substrate and a first mesostructured layer as defined in the invention.
- the structure comprises a multilayer coating comprising at least one mesostructured layer as described above, more particularly at least two layers which comprise at least one mesostructured layer and optionally at least one dense layer as described above, preferably from 2 to 10, more preferably from 2 to 5 layers.
- the total thickness of this multilayer coating preferably varies from 1 to 10 ⁇ m.
- Another object of the present invention is a method for preparing a structure as defined above, comprising the steps of:
- step (b) depositing the material obtained in step (a) on a metal substrate, coated or uncoated, for example by soaking-shrink, deposition on spinning substrate (or spin-coating), spraying, spraying, laminar coating or deposit with a brush,
- the volatile solvent may be an alcohol such as ethanol or propanol, tetrahydrofuran, acetone, dioxane, di-ether, chloroform or acetonitrile.
- the preparation of the sol-gel material in step (a) is accomplished by adding the starting components in the following order:
- a volatile solvent preferably an alcohol such as ethanol
- the solution thus obtained can be kept cool for several weeks, preferably 4 weeks.
- the texturizing agent (s) are preferably used in an amount ranging from 0.001 to 2 mol% relative to the total number of moles of the molecular metal precursor (s).
- the method may further comprise steps of depositing a dense layer as defined above from a composition comprising the mixture of elementally functionalized nanoblocks and a matrix, according to a well known technique such as dipping. shrinkage, deposition on rotating substrate (or spin-coating), spraying, spraying, laminar coating or brush coating.
- the subject of the invention is also the use of the mesostructured layer as defined in the invention to improve the resistance to corrosion, scratching and friction, the mechanical strength, the probe, the coloration and / or the character hydrophobic metal substrate in the aeronautical or aerospace field.
- an uncladged Al 2024 T3 alloy substrate having a size of 80 * 40 * 1, 6 mm was prepared according to a methodology known to those skilled in the art, such as alkaline degreasing followed by acidic etching, formulation compatible with environmental regulations.
- an uncladged Al 2024 T3 alloy substrate having a size of 80 * 40 * 1, 6 mm was prepared according to a methodology known to those skilled in the art, such as alkaline degreasing followed by acidic etching, formulation compatible with environmental regulations.
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| FR0852269A FR2929622B1 (fr) | 2008-04-04 | 2008-04-04 | Revetements mesostructures comprenant un agent texturant particulier, pour application en aeronautique et aerospatiale |
| PCT/FR2009/050576 WO2009136044A2 (fr) | 2008-04-04 | 2009-04-03 | Revêtements mésostructurés comprenant un agent texturant particulier, pour application en aéronautique et aérospatiale |
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| FR2981366B1 (fr) * | 2011-10-14 | 2014-10-17 | Univ Toulouse 3 Paul Sabatier | Procede de traitement anticorrosion d'un substrat metallique solide et substrat metallique solide traite susceptible d'etre obtenu par un tel procede |
| US9605162B2 (en) | 2013-03-15 | 2017-03-28 | Honda Motor Co., Ltd. | Corrosion inhibiting compositions and methods of making and using |
| US9816189B2 (en) | 2013-03-15 | 2017-11-14 | Honda Motor Co., Ltd. | Corrosion inhibiting compositions and coatings including the same |
| US9771483B2 (en) | 2013-04-19 | 2017-09-26 | The Boeing Company | Systems, compositions, and methods for corrosion inhibition |
| CN104419237A (zh) * | 2013-08-22 | 2015-03-18 | 3M创新有限公司 | 防腐液、防腐件及其制备方法 |
| US10167394B2 (en) * | 2014-11-26 | 2019-01-01 | The Boeing Company | Corrosion-inhibiting sol-gel coating systems and methods |
| EP3181644B1 (fr) * | 2015-12-17 | 2018-06-20 | Airbus (Sas) | Revêtement de contrôle de l'intégrité interne d'une structure véhicule le comportant |
| CN109881195B (zh) * | 2019-03-13 | 2021-11-16 | 江苏理工学院 | 一种镁合金微纳超疏水耐蚀性膜的制备方法 |
| US12146233B2 (en) | 2020-08-21 | 2024-11-19 | Battelle Energy Alliance, Llc | Methods of hydrogenating carbon dioxide using electrochemical cells comprising tunable catalysts |
| US12226835B2 (en) | 2020-12-11 | 2025-02-18 | Battelle Energy Alliance, Llc | Methods of forming metal nanomaterials |
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| US3555041A (en) * | 1966-03-09 | 1971-01-12 | Jacob Katz | Imidazoline surfactant having amphoteric properties |
| DE69610771T2 (de) * | 1995-06-27 | 2001-02-22 | Hitachi Chemical Co., Ltd. | Epoxidharzzusammensetzung für gedrückte leiterplatten und damit hergestellte schichtstoffplatten |
| CN100480205C (zh) * | 2002-09-17 | 2009-04-22 | 3M创新有限公司 | 表面活性剂介导的多孔金属氧化物膜 |
| US7439272B2 (en) * | 2004-12-20 | 2008-10-21 | Varian, Inc. | Ultraporous sol gel monoliths |
| FR2899906B1 (fr) * | 2006-04-13 | 2008-06-27 | Eads Ccr Groupement D Interet | Utilisation d'un materiau nanostructure, comme revetement protecteur de surfaces metalliques |
| FR2906539B1 (fr) * | 2006-10-02 | 2009-01-09 | Eads Ccr Groupement D Interet | Revetements mesostructures pour application en aeronautique et aerospatiale |
| US8043418B2 (en) * | 2006-12-08 | 2011-10-25 | General Electric Company | Gas separator apparatus |
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2008
- 2008-04-04 FR FR0852269A patent/FR2929622B1/fr not_active Expired - Fee Related
-
2009
- 2009-04-03 JP JP2011502427A patent/JP5595375B2/ja not_active Expired - Fee Related
- 2009-04-03 US US12/936,272 patent/US20110135945A1/en not_active Abandoned
- 2009-04-03 EP EP09742242A patent/EP2297380A2/fr not_active Withdrawn
- 2009-04-03 WO PCT/FR2009/050576 patent/WO2009136044A2/fr not_active Ceased
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| LIONEL NICOLE ET AL: "Mesostructured hybrid organic-inorganic thin films", JOURNAL OF MATERIALS CHEMISTRY, vol. 15, no. 35-36, 1 January 2005 (2005-01-01), pages 3598, XP055159611, ISSN: 0959-9428, DOI: 10.1039/b506072a * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5595375B2 (ja) | 2014-09-24 |
| FR2929622B1 (fr) | 2011-03-04 |
| FR2929622A1 (fr) | 2009-10-09 |
| WO2009136044A2 (fr) | 2009-11-12 |
| US20110135945A1 (en) | 2011-06-09 |
| JP2011516727A (ja) | 2011-05-26 |
| WO2009136044A3 (fr) | 2010-05-27 |
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