Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/54—Apparatus specially adapted for continuous coating
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/04—Coating on selected surface areas, e.g. using masks
  • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
  • C23C16/45563—Gas nozzles
  • C23C16/45578—Elongated nozzles, tubes with holes
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
  • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
  • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
  • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
  • H01J37/32192—Microwave generated discharge
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
  • H01J37/32—Gas-filled discharge tubes
  • H01J37/32431—Constructional details of the reactor
  • H01J37/3244—Gas supply means

Definitions

• the invention relates to a device for plasma treatment of workpieces, which has at least one evacuatable plasma chamber for receiving the workpieces and in which the plasma chamber is arranged in the region of a treatment station, and in which limits the plasma chamber of a chamber bottom, a chamber lid and a lateral chamber wall is and has a positionable gas lance.
• Such devices are used, for example, to provide plastics with surface coatings.
• such devices are already known to coat inner or outer surfaces of containers intended for the packaging of liquids.
• facilities for plasma sterilization are known.
• PCT WO 95/22413 describes a plasma chamber for internal coating of PET bottles.
• the bottles to be coated are lifted into a plasma camera through a movable floor and connected to an adapter in the area of a bottle mouth. Through the adapter, an evacuation of the bottle interior can take place.
• a hollow gas lance is inserted through the adapter into the interior of the bottles to supply process gas. Ignition of the plasma occurs using a microwave.
• EP-OS 10 10 773 a feeder is described to evacuate a bottle interior and to supply with process gas.
• PCT-WO 01/31680 a plasma chamber is described in which the bottles are introduced by a movable lid which has been previously connected to a mouth region of the bottles.
• PCT-WO 00/58631 likewise already shows the arrangement of plasma stations on a rotating wheel and, for such an arrangement, describes a group-wise assignment of vacuum pumps and plasma stations in order to assist a favorable evacuation of the chambers as well as the interior spaces of the bottles.
• the coating of several containers in a common plasma station or a common cavity is mentioned.
• a gas lance is already described, which is retractable into the interior of a preform to be coated and serves for the supply of process gases.
• the gas lance is positionable in the longitudinal direction of the container.
• plasma layers of silicon oxides having the general chemical formula SiOx produced by the plasma are used to improve the barrier properties of the thermoplastic material.
• Such barrier layers prevent the penetration of oxygen into the packaged liquids as well as leakage of carbon dioxide in CO2-containing liquids.
• the hitherto known devices are not yet sufficiently adapted to be used for mass production, in which both a low coating price per workpiece and a high production speed must be achieved.
• Object of the present invention is to improve a device of the aforementioned type such that a low-noise operation is supported with reduced maintenance.
• the gas lance is at least partially formed of a dielectric.
• the metallic tubular gas lances used according to the prior art promote the undesirable propagation of the microwaves into the interior of the bottle holders and into the area of the valve block.
• the use of the dielectric gas lance counteracts a corresponding propagation of the microwaves.
• a dielectric gas lance supports an adaptation of the coating process to different bottle geometries and different product requirements.
• the gas lance protrudes into the container to be coated to different extents.
• the size of a metallic gas lance influences the propagation of the microwaves, so that an adaptation of the generation of the microwaves is required in the prior art as a function of the respective positioning of the gas lance.
• dielectric gas lances it is found that, regardless of the specific positioning of the gas lance, no appreciable influences on the microwave propagation occur, so that the process is much easier to control.
• a high mechanical stability at the same time provided shielding against acting microwaves is achieved in that the gas lance is at least partially formed on the outside of the dielectric.
• gas lance is tube-like and at least partially formed over the entire thickness of the pipe wall of the dielectric.
• a change of resonance properties as a function of a positioning of the gas lance can be avoided by forming the gas lance from the dielectric at least in a region projecting into the plasma chamber.
• the gas lance is formed at least in a region of the dielectric, which is enclosed by a region of the workpiece holding a holding element facing the plasma chamber.
• Unwanted coatings in the region of a chambered rocket can be prevented by forming the gas lance at least in a region of the dielectric which is enclosed by a region of a chamber base facing the plasma chamber.
• the gas lance be formed at least in a region of the dielectric which is enclosed by a region of a valve block facing the plasma chamber.
• a particularly easy to manufacture construction of the gas lance is provided by the fact that the gas lance is formed entirely from the dielectric.
• gas lance is formed from at least two different dielectrics, which are arranged one above the other in a radial direction.
• the gas lance is formed of at least two different dielectrics, which are arranged one above the other in a longitudinal direction.
• the dielectric being at least partially carbon.
• a high mechanical stability is also achieved in that the dielectric consists at least partially of carbon fibers.
• a wear of the gas lance by acting process gases can be significantly reduced by the fact that the dielectric is at least partially made of ceramic.
• the dielectric is at least partially made of plastic.
• Fig. 1 is a schematic diagram of a plurality of plasma chambers, which are arranged on a rotating plasma wheel and in which the plasma wheel is coupled to input and output wheels.
• FIG. 2 shows an arrangement similar to FIG. 1, in which the plasma stations are each equipped with two plasma chambers,
• FIG. 3 is a perspective view of a plasma bath with a plurality of plasma chambers
• FIG. 4 is a perspective view of a plasma station with a cavity
• FIG. 5 is a front view of the apparatus of FIG. 4 with the plasma chamber closed
• Fig. 6 shows a cross section along section line Vl-Vl in Fig. 5 and
• Fig. 7 is an enlarged sectional view of a connecting element for holding the workpiece in the plasma chamber and a gas lance insertable into the workpiece.
• FIG. 1 shows a plasma module (1), which is provided with a rotating plasma wheel (2). Along a circumference of the plasma wheel (2) a plurality of plasma stations (3) are arranged. The plasma stations (3) are provided with cavities (4) or plasma chambers (17) for receiving workpieces (5) to be treated.
• the workpieces (5) to be treated are supplied to the plasma module (1) in the region of an input (6) and forwarded via a separating wheel (7) to a top feed wheel (8) equipped with positionable support arms (9).
• the support arms (9) are arranged pivotable relative to a base (10) of the transfer wheel (8), so that a change in the distance of the workpieces (5) relative to each other can be performed.
• the input wheel (11) transfers the workpieces (5) to be treated to the plasma wheel (2).
• the treated workpieces (5) are removed from the area of the plasma wheel (2) by an output wheel (12) and transferred to the area of an output line (13).
• the plasma stations (3) are each equipped with two cavities (4) or plasma chambers (17).
• two workpieces (5) can be treated simultaneously.
• the cavities (4) it is possible here, the cavities (4) However, in principle, it is also possible to delimit only partial areas in a common cavity space from one another in such a way that an optimum coating of all workpieces (5) is ensured. In particular, this is thought to delimit the partial cavities at least by separate Mikrowelleneinkopplept against each other.
• Fig. 3 shows a perspective view of a plasma module (1) with partially constructed plasma wheel
• the plasma stations (3) are arranged on a support ring (14), which is formed as part of a rotary joint and mounted in the region of a machine base (15).
• the plasma stations (3) each have a station frame (16) which holds plasma chambers (17).
• the plasma chambers (17) have cylindrical chamber walls (18) and microwave generators (19).
• a rotary distributor (20) is arranged, via which the plasma stations
• the workpieces (5) to be treated are shown below the cylindrical chamber walls (18). Parts of the plasma chambers (17) are not shown for simplicity.
• Fig. 4 shows a plasma station (3) in perspective
• Fig. 4 shows the carriage (24) with chamber wall (18) in a raised state, so that the workpiece (5) is released.
• the microwave generator (19) is connected via a deflection (25) and an adapter (26) to a coupling channel (27), which opens into the plasma chamber (17).
• the microwave generator (19) both directly in the region of the chamber lid (31) and via a spacer element to the chamber lid (31) coupled with a predetermined distance to the chamber lid (31) and thus in a larger surrounding area of the chamber lid (31) are arranged ,
• the adapter (26) has the function of a transition element and the coupling channel (27) is formed as a coaxial conductor. in the region of an opening of the coupling channel (27) in the chamber lid (31) a quartz glass window is arranged.
• the deflection (25) is designed as a waveguide.
• the workpiece (5) is positioned by a holding element (28), which is arranged in the region of a chamber bottom (29).
• the chamber bottom (29) is formed as part of a chamber base (30).
• Another variant is to attach the chamber base (30) directly to the station frame (16). In such an arrangement, it is also possible, for example, to make the guide rods (23) in two parts in the vertical direction.
• FIG. 5 shows a front view of the plasma station (3) according to FIG. 3 in a closed state of the plasma chamber (17).
• the carriage (24) with the cylindrical chamber wall (18) is in this case lowered relative to the positioning in Fig. 4, so that the chamber wall (18) has moved against the chamber bottom (29). In this positioning state, the plasma coating can be performed.
• the coupling channel (27) opens into a chamber lid (31) having a laterally projecting flange (32).
• a seal (33) is arranged, which is acted upon by an inner flange (34) of the chamber wall (18).
• a further seal (35) is arranged in a lower region of the chamber wall (18), in order here also a seal relative to Chamber bottom (29) to ensure.
• the chamber wall (18) surrounds the cavity (4), so that both an interior of the cavity (4) and an interior of the workpiece (5) can be evacuated.
• a hollow gas lance (36) which can be moved into the interior of the workpiece (5), is arranged in the region of the crab base (30).
• a lance carriage (37) which can be positioned along the guide rods (23).
• a process gas channel (38) Within the lance carriage (37) extends a process gas channel (38), the in the raised position shown in Fig. 6 with a gas port (39) of the chamber base (30) is coupled.
• a thrust plate (45) mounted on the gas lance (36) is guided against the outer flange (44) and pushes the retainer (28) into its upper end position.
• an interior of the workpiece (5) is insulated from the interior of the cavity (4).
• the compression spring (43) moves the holding element (28) relative to the guide sleeve (41) such that a connection between the interior of the workpiece (5) and the interior of the cavity (4) is created.
• the workpiece (5) into a plasma chamber (17) immovable relative to the associated support structure. It is also possible, as an alternative to the illustrated coating of the workpieces (5) with their mouths in the vertical direction down to perform a coating of the workpieces with their mouths in the vertical direction upwards. In particular, it is intended to perform a coating of bottle-shaped workpieces (5).
• Such bottles are also preferably formed from a thermoplastic material. Preferably, the use of PET or PP is intended. According to a further preferred embodiment, the coated bottles serve to receive drinks.
• a typical treatment process is explained below using the example of a coating operation and carried out such that first the workpiece (5) using the input wheel (11) is transported to the plasma wheel (2) and that in a pushed-up state of the sleeve-like chamber wall (18) inserting of the workpiece (5) into the plasma station (3). After completion of the ⁇ insetzvorganges the chamber wall (18) is lowered into its sealed positioning and initially carried out simultaneously an evacuation of both the cavity (4) and an interior of the workpiece (5).
• the lance (36) is retracted into the interior of the workpiece (5) and by a displacement of the holding element (28) a foreclosure of the interior of the workpiece (5) relative to the interior of the cavity ( 4). It is also possible to move the gas lance (36) into the workpiece (5) in synchronism with the beginning of the evacuation of the interior of the cavity. The pressure in the interior of the workpiece (5) is then further lowered. In addition, it is also intended to carry out the positioning movement of the gas lance (36) at least partially already parallel to the positioning of the chamber wall (18). After reaching a sufficiently low negative pressure process gas is introduced into the interior of the workpiece (5) and ignited with the aid of the microwave generator (19) the plasma.
• the intention is to deposit both an adhesion promoter on an inner surface of the workpiece (5) and the actual barrier layer of silicon oxides with the aid of the plasma.
• the gas lance (36) is again removed from the interior of the workpiece (5) and the plasma chamber (17) and the interior of the workpiece (5) are vented.
• the chamber wall (18) is raised again to perform a removal of the coated workpiece (5) and an input of a new workpiece to be coated (5).
• a positioning of the chamber wall (18), the sealing element (28) and / or the gas lance (36) can be carried out using different drive units.
• the cam control may for example be designed such that along a circumference of the plasma wheel (2) control cams are arranged along which cam rollers are guided.
• the cam rollers are coupled to the respective components to be positioned.
• the material for the gas lance (36) at least the part of the gas lance (36) projecting into the plasma chamber (17) is formed at least in regions from a dielectric.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Metallurgy (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Materials Engineering (AREA)
• Mechanical Engineering (AREA)
• General Chemical & Material Sciences (AREA)
• Organic Chemistry (AREA)
• Physics & Mathematics (AREA)
• Plasma & Fusion (AREA)
• Analytical Chemistry (AREA)
• Chemical Vapour Deposition (AREA)
• Plasma Technology (AREA)
• Treatment Of Fiber Materials (AREA)

Applications Claiming Priority (2)

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Family Cites Families (27)

• 2007
  • 2007-09-21 DE DE102007045216A patent/DE102007045216A1/de not_active Ceased
• 2008
  • 2008-08-14 WO PCT/DE2008/001351 patent/WO2009036722A2/de active Application Filing
  • 2008-08-14 CN CN2008801082158A patent/CN101855698B/zh not_active Expired - Fee Related
  • 2008-08-14 EP EP08801174A patent/EP2198447A2/de not_active Withdrawn
  • 2008-08-14 JP JP2010525189A patent/JP2010539333A/ja active Pending
  • 2008-08-14 US US12/679,291 patent/US20110023781A1/en not_active Abandoned

Non-Patent Citations (1)

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