EP2197043A4 - METHOD FOR MANUFACTURING SOLAR BATTERY - Google Patents
METHOD FOR MANUFACTURING SOLAR BATTERYInfo
- Publication number
- EP2197043A4 EP2197043A4 EP08832433A EP08832433A EP2197043A4 EP 2197043 A4 EP2197043 A4 EP 2197043A4 EP 08832433 A EP08832433 A EP 08832433A EP 08832433 A EP08832433 A EP 08832433A EP 2197043 A4 EP2197043 A4 EP 2197043A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- solar battery
- battery manufacturing
- manufacturing
- solar
- battery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007242609 | 2007-09-19 | ||
PCT/JP2008/066768 WO2009038091A1 (ja) | 2007-09-19 | 2008-09-17 | 太陽電池の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2197043A1 EP2197043A1 (en) | 2010-06-16 |
EP2197043A4 true EP2197043A4 (en) | 2012-06-27 |
Family
ID=40467901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP08832433A Withdrawn EP2197043A4 (en) | 2007-09-19 | 2008-09-17 | METHOD FOR MANUFACTURING SOLAR BATTERY |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100193352A1 (ja) |
EP (1) | EP2197043A4 (ja) |
JP (1) | JPWO2009038091A1 (ja) |
KR (1) | KR20100044262A (ja) |
CN (1) | CN101790796A (ja) |
TW (1) | TW200937662A (ja) |
WO (1) | WO2009038091A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5373904B2 (ja) * | 2009-07-17 | 2013-12-18 | 株式会社アルバック | 成膜装置 |
JP5533448B2 (ja) * | 2010-08-30 | 2014-06-25 | 住友金属鉱山株式会社 | 透明導電膜積層体及びその製造方法、並びに薄膜太陽電池及びその製造方法 |
DE102011013822A1 (de) * | 2011-03-14 | 2012-09-20 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Modifizierung einer Oberfläche eines Substrats durch Ionenbeschuss |
CN103618010A (zh) * | 2013-10-21 | 2014-03-05 | 福建铂阳精工设备有限公司 | 硅基薄膜太阳能电池背电极及制造方法、硅基薄膜太阳能电池 |
EP4032114A1 (en) | 2019-09-18 | 2022-07-27 | Danmarks Tekniske Universitet | A magnetron plasma sputtering arrangement |
CN114242834B (zh) * | 2021-11-18 | 2024-07-12 | 国家电投集团科学技术研究院有限公司 | 一种铜栅线异质结太阳电池的生产集成设备及方法 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5116479A (en) * | 1989-03-03 | 1992-05-26 | Nihon Shinku Gijutsu Kabushiki Kaisha | Process for producing transparent conductive film comprising indium oxide |
US5512872A (en) * | 1993-01-08 | 1996-04-30 | Shin-Etsu Chemical Co., Ltd. | Permanent magnet arrangement for use in magnetron plasma processing |
JP2003239069A (ja) * | 2002-02-15 | 2003-08-27 | Ulvac Japan Ltd | 薄膜の製造方法及び装置 |
US20030172967A1 (en) * | 2002-03-15 | 2003-09-18 | Shinsuke Tachibana | Solar battery cell and manufacturing method thereof |
JP2004169138A (ja) * | 2002-11-21 | 2004-06-17 | Ulvac Japan Ltd | 透明導電膜の製造方法及び製造装置 |
US20040140204A1 (en) * | 2003-01-15 | 2004-07-22 | Sergiy Yakovlevich Navala | Magnetron cathode and magnetron sputtering apparatus comprising the same |
US20050034981A1 (en) * | 2003-08-08 | 2005-02-17 | Frank Fuchs | Cathodic sputtering apparatus |
US20050145972A1 (en) * | 2002-01-28 | 2005-07-07 | Susumu Fukuda | Tandem thin-film photoelectric transducer and its manufacturing method |
JP2005322707A (ja) * | 2004-05-07 | 2005-11-17 | Mitsubishi Heavy Ind Ltd | 集積型太陽電池 |
EP1612862A2 (en) * | 2004-06-29 | 2006-01-04 | Sanyo Electric Co., Ltd. | Photovoltaic cell, photovoltaic cell module, method of fabricating photovoltaic cell and method of repairing photovoltaic cell |
US20060113916A1 (en) * | 2002-03-14 | 2006-06-01 | Samsung Electronics Co., Ltd. | Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2936276B2 (ja) * | 1990-02-27 | 1999-08-23 | 日本真空技術株式会社 | 透明導電膜の製造方法およびその製造装置 |
JP2755281B2 (ja) * | 1992-12-28 | 1998-05-20 | 富士電機株式会社 | 薄膜太陽電池およびその製造方法 |
JPH0987833A (ja) * | 1995-09-26 | 1997-03-31 | Asahi Glass Co Ltd | 透明導電膜の製造方法 |
GB2382908A (en) * | 2001-12-10 | 2003-06-11 | Philip Grotsky | Postal system |
JP2004260014A (ja) * | 2003-02-26 | 2004-09-16 | Kyocera Corp | 多層型薄膜光電変換装置 |
US7955750B2 (en) | 2006-02-21 | 2011-06-07 | GM Global Technology Operations LLC | Controlled electrode overlap architecture for improved MEA durability |
-
2008
- 2008-09-17 WO PCT/JP2008/066768 patent/WO2009038091A1/ja active Application Filing
- 2008-09-17 US US12/678,578 patent/US20100193352A1/en not_active Abandoned
- 2008-09-17 CN CN200880104843A patent/CN101790796A/zh active Pending
- 2008-09-17 KR KR1020107005789A patent/KR20100044262A/ko not_active Application Discontinuation
- 2008-09-17 JP JP2009533159A patent/JPWO2009038091A1/ja active Pending
- 2008-09-17 EP EP08832433A patent/EP2197043A4/en not_active Withdrawn
- 2008-09-18 TW TW097135818A patent/TW200937662A/zh unknown
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5116479A (en) * | 1989-03-03 | 1992-05-26 | Nihon Shinku Gijutsu Kabushiki Kaisha | Process for producing transparent conductive film comprising indium oxide |
US5512872A (en) * | 1993-01-08 | 1996-04-30 | Shin-Etsu Chemical Co., Ltd. | Permanent magnet arrangement for use in magnetron plasma processing |
US20050145972A1 (en) * | 2002-01-28 | 2005-07-07 | Susumu Fukuda | Tandem thin-film photoelectric transducer and its manufacturing method |
JP2003239069A (ja) * | 2002-02-15 | 2003-08-27 | Ulvac Japan Ltd | 薄膜の製造方法及び装置 |
US20060113916A1 (en) * | 2002-03-14 | 2006-06-01 | Samsung Electronics Co., Ltd. | Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode |
US20030172967A1 (en) * | 2002-03-15 | 2003-09-18 | Shinsuke Tachibana | Solar battery cell and manufacturing method thereof |
JP2004169138A (ja) * | 2002-11-21 | 2004-06-17 | Ulvac Japan Ltd | 透明導電膜の製造方法及び製造装置 |
US20040140204A1 (en) * | 2003-01-15 | 2004-07-22 | Sergiy Yakovlevich Navala | Magnetron cathode and magnetron sputtering apparatus comprising the same |
US20050034981A1 (en) * | 2003-08-08 | 2005-02-17 | Frank Fuchs | Cathodic sputtering apparatus |
JP2005322707A (ja) * | 2004-05-07 | 2005-11-17 | Mitsubishi Heavy Ind Ltd | 集積型太陽電池 |
EP1612862A2 (en) * | 2004-06-29 | 2006-01-04 | Sanyo Electric Co., Ltd. | Photovoltaic cell, photovoltaic cell module, method of fabricating photovoltaic cell and method of repairing photovoltaic cell |
Non-Patent Citations (2)
Title |
---|
MIYAZAKI M ET AL: "Properties of Ga-doped ZnO films", JOURNAL OF NON-CRYSTALLINE SOLIDS, NORTH-HOLLAND PHYSICS PUBLISHING. AMSTERDAM, NL, vol. 218, 1 September 1997 (1997-09-01), pages 323 - 328, XP004095596, ISSN: 0022-3093, DOI: 10.1016/S0022-3093(97)00241-X * |
See also references of WO2009038091A1 * |
Also Published As
Publication number | Publication date |
---|---|
TW200937662A (en) | 2009-09-01 |
JPWO2009038091A1 (ja) | 2011-01-06 |
EP2197043A1 (en) | 2010-06-16 |
WO2009038091A1 (ja) | 2009-03-26 |
US20100193352A1 (en) | 2010-08-05 |
KR20100044262A (ko) | 2010-04-29 |
CN101790796A (zh) | 2010-07-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20100419 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL BA MK RS |
|
DAX | Request for extension of the european patent (deleted) | ||
R17P | Request for examination filed (corrected) |
Effective date: 20100325 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20120529 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C23C 14/35 20060101ALI20120522BHEP Ipc: C23C 14/08 20060101ALI20120522BHEP Ipc: H01L 31/18 20060101AFI20120522BHEP |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20130103 |