EP1997358A1 - Dispositif de traitement au plasma sous pression atmospherique - Google Patents

Dispositif de traitement au plasma sous pression atmospherique

Info

Publication number
EP1997358A1
EP1997358A1 EP07723189A EP07723189A EP1997358A1 EP 1997358 A1 EP1997358 A1 EP 1997358A1 EP 07723189 A EP07723189 A EP 07723189A EP 07723189 A EP07723189 A EP 07723189A EP 1997358 A1 EP1997358 A1 EP 1997358A1
Authority
EP
European Patent Office
Prior art keywords
high voltage
electrode
voltage source
dielectric shield
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP07723189A
Other languages
German (de)
English (en)
Other versions
EP1997358B1 (fr
Inventor
Wolfgang Viöl
Stefan Born
Andy Kaemling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fachhochschule Hildesheim Holzminden Gottingen
Original Assignee
Fachhochschule Hildesheim Holzminden Gottingen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fachhochschule Hildesheim Holzminden Gottingen filed Critical Fachhochschule Hildesheim Holzminden Gottingen
Publication of EP1997358A1 publication Critical patent/EP1997358A1/fr
Application granted granted Critical
Publication of EP1997358B1 publication Critical patent/EP1997358B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes

Definitions

  • the invention relates to a device for plasma treatment under atmospheric pressure having the features of the preamble of independent claim 1.
  • a device for plasma treatment is known, is plasma treated with the wood, wherein the wood is grounded to serve as a counter electrode to the electrode with the dielectric shield is applied to the AC high voltage.
  • WO 2004/105810 A1 it is known to treat living cells containing biological materials with plasma.
  • the gas discharge between the electrode provided with the dielectric shield and the biological material is ignited by the alternating high voltage applied to the electrode, the biological material serving as a capacitive counter electrode to the electrode with the dielectric shield.
  • the electrode including the dielectric shielding covering it, is tapered.
  • the device known from WO 2004/105810 A1 is provided as a battery-powered or accumulator-operated hand-held device, its alternating high-voltage source being based on semiconductor technology. When a plasma for a surface treatment by a dielectrically hindered discharge at atmospheric pressure is generated so far, this is always done between an electrode with a dielectric shield and a counter electrode.
  • WO 87/07248 A1 a device for the treatment of objects using electrical high-voltage discharges in a gaseous medium is known.
  • a rectified AC high voltage is applied to an electrode having a series of needle-shaped extensions that run parallel to each other and including their
  • Tips are embedded in a dielectric. Run parallel to the needle-shaped extensions
  • a device for plasma treatment at atmospheric pressure which has two opposing electrode.
  • One of the two electrodes is earthed and provided with a full-surface dielectric shield.
  • a dielectric in front of the other electrode which is connected to an AC high voltage source to apply AC high voltage, has discharge gaps into which lead electrodes protrude from the other electrode, which are provided with tips facing the grounded electrode. Due to the concentration of the field strength of the electric field between the two electrodes at the tips of the conductor electrons, a gas discharge is ignited in a gas located between the two electrodes. This gas discharge is dielectrically impeded only by the dielectric in front of the grounded electrode, since the dielectric has the discharge gap in front of the electrode connected to the alternating high voltage source.
  • the known device is provided only for introducing gas into the space between the two electrodes. With the plasma formed in the space between the electrodes, surfaces arranged outside of this space can be treated.
  • a device for cleaning or activating electrical conductors and board surfaces comprises a pair of opposing electrodes, at least one of which has a full-area dielectric shield.
  • emission peaks are formed on the outer surface of one of the electrodes or their dielectric shield, the ignition of a gas discharge facilitate between the electrodes and homogenize the gas discharge.
  • the objects to be treated are introduced in the known device between the electrodes, wherein they can rest on one of the electrodes or their dielectric shield.
  • the emission tips may be formed by etching the corresponding surface of a dielectric material. It will be achieved radii of curvature of the tips of about 1 micron.
  • the radii of curvature of the emission peaks are between 10 nm and 0.5 mm. Needle or nail-shaped emission peaks can be present in a surface density between 1 and 100 per cm 2 . Moving the objects to be treated into the space between the electrodes involves the risk of contact between the objects and the sharp-edged emission peaks directed into this space. As a result of this contact, the objects to be treated and / or the emission spikes may be damaged.
  • the devices described above are very poor or not at all suitable because these materials are not effective as a counter electrode to the electrode can serve with the dielectric shield.
  • a plasma jet which is also referred to as a plasma jet, plasma beam or plasma blaster
  • Such devices are based on a different operation than that of a dielectrically impeded discharge. As a rule, you need a mains connection, or at least a gas connection. To which such systems are very expensive.
  • the invention has for its object to provide a device for plasma treatment at atmospheric pressure with the features of the preamble of claim 1, which is inexpensive to provide, has no sharp-edged tips on an outer surface and yet a plasma treatment itself of only very weak or not electrically conductive Materials allowed. SOLUTION
  • the object is achieved by a device for plasma treatment at atmospheric pressure with the features of claim 1.
  • Preferred embodiments of the new device are described in the dependent claims 2 to 10.
  • a dielectrically impeded discharge can also be caused without a counterelectrode. Accordingly, in the new plasma pressure treatment apparatus at atmospheric pressure, the AC high voltage applied to the electrode from the AC high voltage source can ignite the plasma over any object to be treated without relying on its electrical characteristics. Thus, with the new device it is possible that the alternating high voltage applied to the electrode by the alternating high voltage source ignites the plasma even in a volume limited only by gas in relation to the dielectric shield. That is, with the new device, a dielectrically impeded gas discharge is also caused in a clean gas environment, the gas itself serving as a counter electrode, if one wishes to speak of a counter electrode in this context.
  • a dark discharge occurs on the surface of the dielectric shield, from which, when the new device is brought to any surface, becomes a self-sustaining discharge which provides the plasma to, for example, enhance the adhesion of the coating to a coating to treat.
  • the electrode of the new device is a surface electrode, wherein the alternating high voltage applied to the electrode by the AC high voltage source maintains the plasma across the surface of the surface electrode.
  • the corresponding area of the surface electrode can be at least 2 cm 2 .
  • it is at least 4 cm 2 , more preferably at least 8 cm 2 in size. Nevertheless, the energy consumption of the device is kept within reasonable limits due to the dielectric hindrance of the gas discharge.
  • the electrode of the new device is preferably a surface electrode is not inconsistent with having the peaks that precede the dielectric of the gas Shield facing. Rather, these tips, ie small areas of the surface electrode with a small radius of curvature, used to ignite or maintain the plasma without counter electrode.
  • the outer surface of the dielectric shield of the spiked electrode is rather smooth. This eliminates both the risk of damage to surfaces to be treated as well as the risk of a change in electrical properties of the device due to damage to the tips themselves.
  • tips of the surface electrode having a radius of curvature of less than 100 microns, preferably less than 10.0 microns.
  • the height of the tips can be comparatively small and less than 2 mm, preferably less than 1 mm or even less than 0.5 mm. That is, the tips may be formed as a sharp-edged roughened surface of the electrode.
  • the tips in a two-dimensional distribution are thus not only provided as a single row of juxtaposed needles.
  • the areal density of the peaks may be on the order of 1 to 100,000 per cm 2 .
  • the electrode It is particularly simple to form the electrode from an electrically conductive powder which is arranged in a ceramic solid which forms the dielectric shield.
  • the powder provides a large number of suitable tips.
  • the AC high voltage applied to the electrode by the AC high voltage source causes a steep voltage rise of at least 5,000 volts / ⁇ s, preferably at least 10,000 volts / ⁇ s has. Good results are obtained with a voltage increase of about 12,000 V / ⁇ s.
  • the AC high voltage applied to the electrode by the AC high voltage source has voltage pulses with a rise time of up to 5 ⁇ s, preferably less than 3 ⁇ s, a pulse duration of less than 10 ⁇ s, preferably less than 6 ⁇ s, and an amplitude of 5,000 V to 60,000 V, preferably from 5,000 to about 40,000 V, on.
  • These voltage pulses can have alternating signs, ie be bipolar. This is very beneficial, but not mandatory.
  • the repetition frequency of the voltage pulses of the AC high voltage source may be less than 10,000 Hz. Preferably, it is even less than 5,000 Hz 1, more preferably in the range of 500 to 2,000 Hz. That is, the repetition frequency of the voltage pulses is much lower than the reciprocal of the duration of the voltage pulses. In other words, the voltage pulses or at least bipolar pulse pairs or groups of voltage pulse pairs are spaced apart by pauses.
  • An alternating high voltage source which can generate the alternating high voltage sketched here can be produced on the basis of semiconductor technology with standard components in compact dimensions.
  • the entire new device may even be battery or accumulator operated.
  • the new device may have the size of a commercial cordless screwdriver. This provides a very compact and mobile handheld device.
  • the regulation of the alternating high voltage source can keep the output power of the alternating high voltage source constant by varying the output voltage of the alternating high voltage source and / or the pulse repetition rate of the voltage pulses of the alternating high voltage.
  • Fig. 1 shows schematically the structure of a first embodiment of the new
  • Apparatus for plasma treatment at atmospheric pressure with its electrode in cross-section.
  • Fig. 2 shows the application of an ignited with the apparatus of FIG. 1
  • Plasmas on a poorly electrically conductive surface Plasmas on a poorly electrically conductive surface.
  • Fig. 3 shows a cross section through the front region of an electrode of a modified embodiment of the device.
  • Fig. 4 outlines the formation of the new device as accumulator operated handset.
  • Fig. 6 shows the basic structure of a scheme for the voltage applied to the electrode of the handset of FIG. 4 alternating high voltage. DESCRIPTION OF THE FIGURES
  • the device 1 shown in Fig. 1 is used for plasma treatment of surfaces not shown here.
  • the device 1 has an electrode 2, which is provided with a dielectric shield 3 made of a suitable closed dielectric material, such as a dense ceramic.
  • a high voltage supply leads 4 with a transition into the dielectric shield 3 electrical insulation 5.
  • a high voltage alternating current source 6 a high voltage alternating.
  • the AC high voltage source 6 is based on semiconductor components and is supplied from a power supply 7 with electrical energy, which may be one or more batteries or one or more accumulators or a power supply unit.
  • the gas discharge 9 is dielectrically impeded by the dielectric shield 3, whereby the energy output of the device 1 is limited by the gas discharge in a meaningful way.
  • the gas discharge 9 results in a plasma 11 of reactive components, such as radicals of the gas 10, with which a surface can be activated, for example, for a subsequent coating in order to improve its adhesion properties. Since the gas discharge 9 can be ignited with the device 1 even when there is no counter electrode in the electrically relevant environment of the electrode 2, the plasma 11 can be generated with the device 1 quite independently of the electrical conductivity of a surface to be treated and for treatment the surface can be used.
  • Fig. 2 outlines the treatment of a surface 12 of a body 13 with the plasma 11, wherein the gas discharge due to the presence of the surface 12 in the vicinity of the electrode 2 even at low electrical conductivity of the material of the body 13th to the effect that the gas discharge 9 and accordingly the plasma 11 concentrates on the gap between the electrode 2 and the surface 12.
  • FIG. 3 illustrates a practical embodiment of the electrode 2 and its microscopically pointed surface 14.
  • the material of the electrode 2 here is powdered sintered bronze 21, which is also referred to as bronze powder.
  • the sintered bronze is simply poured into the ceramic shield 23 formed as a dielectric shield 3, wherein at the same time the high voltage supply 4 forming metal pin 24 is pressed in the middle. To the rear, the area of the sintered bronze 21 is closed with a sealant 22 to the rear. It depends on the new device to produce high FeId- strengths, so that a gas discharge ignites on the dielectric shield 3.
  • the sintered bronze provides enough suitable tips for this purpose.
  • the electrical conductivity of a powder forming the electrode 2 with the tips on the surface 14 need not be particularly high.
  • the new device 1 may be provided as a mobile handset 16, as sketched in FIG.
  • the power supply 7 is an accumulator block
  • the AC high voltage power source 6 is disposed within a housing 17 with a trigger-like operation switch 18.
  • the operation switch 18 Upon actuation of the operation switch 18, the AC high voltage is applied to the electrode 2 and regardless of whether a counter electrode is present or not, ignited a plasma in front of the outer surface 15 of the dielectric shield 3 of the electrode 2 and maintained as long as the operation switch 18 remains actuated.
  • the alternating high voltage can consist of the voltage pulses 19 and 20 sketched in FIG. 5, wherein a positive voltage pulse 19, which rises to a voltage of 40,000 to 50,000 V in a few microseconds, is followed directly by a negative voltage pulse 20, has approximately the same time-voltage curve as the voltage pulse 19, but a different sign. This is followed by a pause until a next pair of voltage pulses 19 and 20 is applied to the electrode 2.
  • the rapid increase in voltage makes it possible to ignite the gas discharge 9 independently of a counter electrode, and then very quickly allows reversed polarity of the voltage a subsequent reignition of the gas discharge, wherein the previously separate charges of the gas quasi serve as a counter electrode.
  • the spacings of the bipolar voltage pulse pairs 19, 20 can reach on the order of 1 millisecond, without all the free electrons of the plasma recombining in the meantime, until the plasma is rebuilt by the following voltage pulse pair from this Restionisation.
  • Fig. 6 shows the basic structure of a currently preferred control for the voltage applied to the electrode of the handset 16 of FIG. 4 alternating high voltage.
  • an output-side load of an ignition transformer 25 is registered retroactively on its input side, d. H. measured. This information is used as an input to control the output voltage.
  • the mutual inductance of the secondary winding of the ignition transformer 25 is opposite to the self-induction of the primary winding.
  • the mutual induction from the secondary winding to the primary winding increases with the load of the secondary circuit.
  • the amount of voltage across the primary winding of the ignition transformer 25 thus decreases with increasing load on the output. This voltage across the primary winding thus behaves exactly opposite to the output side load. This is used for the control of the ignition voltage.
  • the voltage amplitude is adjusted by a potentiometer.
  • the potentiometer can now be replaced by a transistor, ie a current-controlled resistor in the power supply circuit 26.
  • This transistor is supplied via a correspondingly matched amplifier circuit with a rectifier 27, a filter 28 and a controller 29, the rectified and filtered self-induction voltage across the primary winding. This results in a control loop. Strictly speaking, not the output voltage, but the output power is regulated. If the output power is to be kept essentially constant, the output voltage and / or the pulse repetition rate of the voltage pulses 19 and 20 outlined in FIG. 5 must be adapted for a variable load capacitance. Variable load capacitances occur through different objects in front of the surface 15 of the dielectric shield 3. There is a quadratic relationship between the output power and the output voltage or the ignition voltage:
  • a concrete embodiment of the designed as a handset 16 new device 1 may have the following technical data:
  • the output voltage is controlled as a function of the load of the output between 5 and 35 kV.
  • the load depends on an object disposed opposite to the surface 15 of the dielectric shield.
  • the pulse repetition rate changes opposite to the height of the pulse amplitude; It lies in the range of 500 to 2000 Hz.
  • the pulse repetition rate has the minimum value of approximately 500 Hz.
  • the maximum value of the pulse repetition rate of approximately 2000 Hz is achieved at the smallest output amplitude of approximately 5 kV.
  • a much lower ignition voltage is required than, for example, over wood.
  • the ignition voltage can be treated as in devices 1 without regulation only objects from a material to which the device 1 is set.
  • the ignition voltage is automatically adapted to the material of the object to be treated.
  • the ignition voltage can z. B. using an LED on the back of the housing 17 are read. If the LED is lit, the output voltage is approx. 20 to 35 kV, which corresponds approximately to the voltage required for the treatment of wood surfaces. If the LED is off or another LED is lit, the output voltage is approximately 5 to 20 kV, which is the voltage required to treat metallic surfaces.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

La présente invention concerne un dispositif (1) de traitement au plasma, présentant une électrode (2) en amont de laquelle se trouve un écran diélectrique (3), et une source de haute tension alternative (6) qui sert à appliquer une haute tension alternative à l'électrode (2), afin de provoquer une décharge de gaz (11) limitée par l'écran diélectrique, dans un gaz (10) sous pression atmosphérique qui se trouve en amont de l'écran diélectrique (3), de façon à produire un plasma (9). A cet effet, la surface (14) de l'électrode (2) présente une répartition plane des pointes orientées vers le gaz (10) en amont de l'écran diélectrique (3), l'écran diélectrique (3) de l'électrode (2) présentant lui-même une surface extérieure plane (15) orientée vers le gaz (10) en amont de l'écran diélectrique (3).
EP07723189.2A 2006-03-11 2007-03-12 Dispositif de traitement au plasma sous pression atmospherique Not-in-force EP1997358B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006011312A DE102006011312B4 (de) 2006-03-11 2006-03-11 Vorrichtung zur Plasmabehandlung unter Atmosphärendruck
PCT/EP2007/002143 WO2007104512A1 (fr) 2006-03-11 2007-03-12 Dispositif de traitement au plasma sous pression atmosphérique

Publications (2)

Publication Number Publication Date
EP1997358A1 true EP1997358A1 (fr) 2008-12-03
EP1997358B1 EP1997358B1 (fr) 2014-01-01

Family

ID=38222666

Family Applications (1)

Application Number Title Priority Date Filing Date
EP07723189.2A Not-in-force EP1997358B1 (fr) 2006-03-11 2007-03-12 Dispositif de traitement au plasma sous pression atmospherique

Country Status (4)

Country Link
US (1) US8136481B2 (fr)
EP (1) EP1997358B1 (fr)
DE (1) DE102006011312B4 (fr)
WO (1) WO2007104512A1 (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102204414B (zh) 2008-08-20 2014-10-22 视觉动力控股有限公司 产生用于对衬底表面进行构图的等离子体放电的设备
EP2180768A1 (fr) * 2008-10-23 2010-04-28 TNO Nederlandse Organisatie voor Toegepast Wetenschappelijk Onderzoek Appareil et procédé pour traiter un objet
DE102009020163B4 (de) * 2009-05-07 2012-07-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum zwischenschichtfreien Verbinden von Substraten, Vorrichtung zur Durchführung einer Plasmabehandlung sowie deren Verwendung
GB0920124D0 (en) 2009-11-17 2009-12-30 Linde Ag Device for generating gaseous species
DE102009060627B4 (de) * 2009-12-24 2014-06-05 Cinogy Gmbh Elektrodenanordnung für eine dielektrisch behinderte Plasmabehandlung
US9078540B2 (en) * 2010-08-24 2015-07-14 Steve Hoffman Process and device for forming a low adhesion cooking surface
DE102011000261A1 (de) * 2011-01-21 2012-07-26 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Dielektrische Koplanarentladungsquelle für eine Oberflächenbehandlung unter Atmosphärendruck
CN102573259A (zh) * 2012-01-13 2012-07-11 北京交通大学 一种抑制丝状放电的方法以及电极结构
DE102012103470A1 (de) 2012-04-20 2013-10-24 Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen Plasmaroller
DE102012015482A1 (de) 2012-08-07 2014-02-13 Cinogy Gmbh Elektrodenanordnung für ein behindertes Plasma
DE102013100617B4 (de) * 2013-01-22 2016-08-25 Epcos Ag Vorrichtung zur Erzeugung eines Plasmas und Handgerät mit der Vorrichtung
DE102013107448B4 (de) * 2013-07-15 2016-11-24 Relyon Plasma Gmbh Anordnung zur Keimreduktion mittels Plasma
US9498637B2 (en) * 2014-05-30 2016-11-22 Plasmology4, Inc. Wearable cold plasma system
DE112015004795T5 (de) 2014-10-23 2017-10-12 Sumitomo Electric Industries Ltd. Siliziumkarbidsubstrat und Verfahren zur Herstellung desselben
WO2018145201A1 (fr) * 2017-02-08 2018-08-16 Upstream Data Inc. Mine à chaîne de blocs dans une installation pétrolière ou gazière
CN107911931A (zh) * 2017-12-01 2018-04-13 南京苏曼等离子科技有限公司 常压低温等离子体处理种子设备和操作方法
US20220047880A1 (en) * 2018-09-26 2022-02-17 L'oreal Device for generating cold plasma comprising electrodes and dielectrics
CN111298295B (zh) * 2020-04-01 2021-11-16 珠海格力电器股份有限公司 空气等离子体发生装置及具有其的医疗设备
DE102021124377A1 (de) 2021-09-21 2023-03-23 Cinogy Gmbh Elektrodenanordnung für eine Plasmaentladung
US20230102328A1 (en) * 2021-09-29 2023-03-30 Essentium, Inc. Three-Dimensional Printer Head Including a Dielectric Barrier Discharge (DBD) Disk and a Transformer Assembly
DE102021128964B3 (de) 2021-11-08 2023-03-09 Hochschule für angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen, Körperschaft des öffentlichen Rechts Verfahren und Vorrichtung zur Erzeugung von Plasmen mit erhöhter Pulsenergie durch dielektrisch behinderte elektrische Entladungen

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3618412A1 (de) * 1986-05-31 1987-12-03 Oliver Sieke Verfahren und vorrichtung zur behandlung von objekten unter erzeugung chemischer oder physikalischer veraenderungen von gasen, fluessigkeiten, pasten oder feststoffen
US5603893A (en) 1995-08-08 1997-02-18 University Of Southern California Pollution treatment cells energized by short pulses
DE19717698A1 (de) * 1997-04-26 1998-10-29 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Reinigung von Aktivierung von elektrischen Leiterbahnen und Platinenoberflächen
SE516722C2 (sv) 1999-04-28 2002-02-19 Hana Barankova Förfarande och apparat för plasmabehandling av gas
US20020092616A1 (en) 1999-06-23 2002-07-18 Seong I. Kim Apparatus for plasma treatment using capillary electrode discharge plasma shower
EP1073091A3 (fr) * 1999-07-27 2004-10-06 Matsushita Electric Works, Ltd. Electrode pour la production de plasma, appareil de traitement par plasma utilisant une telle électrode, et traitement par plasma à l'aide de cet appareil
DE19957775C1 (de) * 1999-12-01 2000-07-13 Wolfgang Vioel Verfahren zur Modifizierung von Holzoberflächen durch elektrische Entladung unter Atmosphärendruck
KR100464902B1 (ko) * 2001-02-12 2005-01-05 (주)에스이 플라즈마 대기압에서 저온 플라즈마를 발생시키는 장치
JP3782708B2 (ja) * 2001-10-26 2006-06-07 積水化学工業株式会社 放電プラズマ処理装置及びそれを用いる放電プラズマ処理方法
EP1568077B1 (fr) * 2002-12-04 2018-07-11 Suss MicroTec Lithography GmbH Procede de pretraitement des surfaces de substrats a assembler
DE10324926B3 (de) * 2003-06-03 2005-02-03 Fachhochschule Hildesheim/Holzminden/Göttingen Vorrichtung zur Behandlung eines lebende Zellen enthaltenden biologischen Materials mit einem durch eine Gasentladung erzeugten Plasma
US20060239873A1 (en) * 2004-08-23 2006-10-26 Echnologoes Ltd. Double dielectric barrier discharge electrode device and system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2007104512A1 *

Also Published As

Publication number Publication date
US8136481B2 (en) 2012-03-20
US20090009090A1 (en) 2009-01-08
DE102006011312B4 (de) 2010-04-15
WO2007104512A1 (fr) 2007-09-20
DE102006011312A1 (de) 2007-10-04
EP1997358B1 (fr) 2014-01-01

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