EP1929597A1 - Hochfrequenz-modulierter oberflächenemittierender halbleiterlaser - Google Patents
Hochfrequenz-modulierter oberflächenemittierender halbleiterlaserInfo
- Publication number
- EP1929597A1 EP1929597A1 EP06775931A EP06775931A EP1929597A1 EP 1929597 A1 EP1929597 A1 EP 1929597A1 EP 06775931 A EP06775931 A EP 06775931A EP 06775931 A EP06775931 A EP 06775931A EP 1929597 A1 EP1929597 A1 EP 1929597A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- semiconductor laser
- laser
- emitting semiconductor
- pump
- resonator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 110
- 230000005855 radiation Effects 0.000 claims abstract description 28
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 11
- 238000005086 pumping Methods 0.000 claims description 5
- 239000013078 crystal Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
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- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 238000013139 quantization Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
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- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/041—Optical pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/14—External cavity lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02407—Active cooling, e.g. the laser temperature is controlled by a thermo-electric cooler or water cooling
- H01S5/02423—Liquid cooling, e.g. a liquid cools a mount of the laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0608—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
Definitions
- the invention relates to a surface-emitting semiconductor laser according to the preamble of patent claim 1.
- Solid state lasers are generally used in the green and blue spectral range as modulatable lasers. Although these have a high output power, but due to the long life of the laser-active states in the solid state material, the modulation frequency is usually limited to less than 100 kHz. Such solid state lasers are often amplitude modulated with external, comparatively large and expensive electro or acoustooptic modulators.
- An application of lasers in displays based on "flying spot" methods requires the availability of the three primary colors red, green and blue, a comparatively high output power as well as a high-frequency modulation of the laser For example, it is desirable to modulate the output power at a frequency of, for example, more than 1 MHz.
- Surface-emitting semiconductor lasers with an external resonator mirror which are also known under the designation disk laser or VECSEL (Vertical External Cavity Surface Emitting Laser), are characterized by a high output power with high beam quality.
- US Pat. No. 6,798,804 B2 discloses a surface-emitting semiconductor laser in which a high-frequency modulation of the emitted laser radiation is provided by modulation of a voltage which is applied to a pn junction of the surface-emitting semiconductor laser.
- a modulation unit arranged outside the semiconductor laser is used.
- the invention has for its object to provide an improved surface emitting semiconductor laser, in which there is a high-frequency modulation of the emitted laser radiation with relatively little effort.
- a surface emitting semiconductor laser comprising a semiconductor chip, a first resonator mirror and at least one further resonator mirror, which is arranged outside the semiconductor chip and forms with the first resonator mirror a laser resonator with a resonator length L, and a pump laser
- the pump radiation for optical pumping of the semiconductor laser With a pump power P P radiates into the semiconductor chip, the pump power P p with a modulation frequency f p modulated.
- the resonator length L of the laser resonator is advantageously adapted to the modulation frequency f P.
- the surface-emitting semiconductor laser advantageously has an output power which is modulated with the modulation frequency f P of the pump power. It has been found that in the case of such an optically pumped semiconductor laser an adaptation of the resonator length L of the laser resonator to the modulation frequency f P of the pump radiation source is expedient.
- the shorter the resonator length L the higher the modulation frequency f P.
- the laser resonator may have a resonator length L which is 30 mm or less.
- the length L of the laser resonator is 20 mm or less, more preferably 10 mm or less.
- the length L of the resonator is advantageously 25 mm or less.
- the length of the resonator is advantageously not more than 10 mm.
- the pump laser does not necessarily have a fixed modulation frequency, but may also have a variable modulation frequency.
- the modulation frequency is to be understood as the maximum modulation frequency with which the pump laser can be modulated.
- the adaptation of the resonator length to the modulation frequency is thus in this case to the maximum modulation frequency, which is provided for the modulation of the pump power.
- Inequality L [mm] ⁇ 250 / f P [MHz] in this case also be satisfied for the maximum modulation frequency of the pump laser.
- the modulation frequency f P is 1 MHz or more, preferably 10 MHz or more and particularly preferably even 50 MHz or more. This is particularly advantageous for use of the surface-emitting semiconductor laser in a laser display.
- the pump power of the pump laser is preferably modulated by a modulation of a current with which the pump laser is operated.
- the pump laser is preferably modulated such that the laser threshold of the pump laser is not undershot during the modulated operation.
- the operating current of the pump laser can be varied with the frequency f P , wherein the operating current is greater in the minima of the time course than a SchwelIstromrack required for stimulation of stimulated emission in the pump laser.
- the pump laser may be an external pump laser, ie a pump laser arranged outside the semiconductor chip.
- the pump laser is a semiconductor laser diode.
- the pump laser is a monolithic pump laser integrated in the semiconductor chip of the surface-emitting semiconductor laser.
- the monolithic integration of one or more pump lasers and the surface emitting semiconductor laser on a common substrate is known in principle from the document DE 10026734, the content of which is hereby incorporated by reference.
- an element for frequency conversion of the radiation emitted by the semiconductor laser is preferably arranged.
- the frequency conversion can in particular be a frequency multiplication, for example a frequency doubling.
- the surface-emitting semiconductor laser can have an active zone provided for the emission of infrared radiation, the infrared radiation inside the laser resonator being converted into visible light, particularly preferably into green or blue visible light.
- the element provided for frequency conversion contained in the laser resonator may be, for example, an optically non-linear crystal.
- the resonator includes a wavelength filter for stabilizing the emission wavelength, for example an etalon, a birefringent filter or a bandpass filter.
- the surface emitting semiconductor laser preferably has a time averaged output of 10 mW or more.
- FIG. 1 shows a schematic representation of a cross section through a surface emitting semiconductor laser according to an embodiment of the invention
- FIG. 2 shows a schematic diagram of the operating current intensity I of the pump laser as a function of the time t in an exemplary embodiment of the invention
- Figure 3 is a schematic diagram of the optical output power P out of the surface emitting semiconductor laser as a function of the time t in an embodiment of the invention.
- Figure 4 is a schematic representation of a cross section through a surface emitting semiconductor laser according to another embodiment of the invention.
- the surface-emitting semiconductor laser according to a first exemplary embodiment of the invention shown schematically in cross section in FIG. 1 contains a semiconductor chip 1 which contains a radiation-emitting active layer 2.
- the active layer 2 is arranged in the semiconductor chip 1 between further semiconductor layers 3, which function, for example, as cladding or confinement layers.
- the structure of a semiconductor chip of a surface emitting semiconductor laser is known in the art in principle and is therefore not explained in detail here.
- a reflector 4 which represents a first resonator mirror for the laser radiation 7 emitted by the surface-emitting semiconductor laser, is contained in the semiconductor chip 1.
- the first resonator mirror 4 is preferably a Bragg reflector, which is formed from a plurality of alternating layer pairs.
- the semiconductor layers 2, 3, 4 of the semiconductor chip 1 are grown, for example, on a growth substrate 5.
- the semiconductor chip 1 is preferably connected to a heat sink 6, for example on a rear side of the growth substrate 5 facing away from the semiconductor layers 2, 3, 4.
- the heat sink 6 is preferably made of a metal with a high heat sink
- Thermal conductivity in particular copper, formed.
- an actively cooled heat sink may be provided which has microchannels through which a liquid or a gas flows.
- the surface-emitting semiconductor laser contains at least one further resonator mirror 8, which forms a laser resonator with the first resonator mirror 4.
- the second resonator mirror 8 is an external resonator mirror which is arranged outside the semiconductor chip 1 and has, for example, a concave curvature on a side facing the semiconductor chip 1.
- the surface emitting semiconductor laser could also have one or more further resonator mirrors, which together form a folded resonator (not shown).
- the excitation of the active layer 2 for the stimulated emission of laser radiation 7 takes place by optical pumping with a pump laser.
- the pump laser 10 is, for example, a semiconductor laser arranged outside the semiconductor chip 1, which radiates pump radiation 14 into the active layer 2 of the semiconductor chip 1.
- the pump power of the pump radiation 14 emitted by the pump laser 10 is modulated with a frequency f P , which is, for example, 1 MHz or more.
- the modulation frequency fp is more than 10 MHz.
- a modulation frequency of 50 MHz or more may be provided.
- the length L of the laser resonator is adapted to the modulation frequency of the pump power.
- the length L of the laser resonator is advantageously 30 mm or less.
- the length L of the laser resonator is preferably 20 mm or less, particularly preferably 10 mm or less.
- the length L of the laser resonator at a given modulation frequency f P does not exceed a value for which the following applies: L [mm] ⁇ 250 mm / f P [MHz].
- the active layer 2 is preferably formed as a quantum well structure.
- quantum well structure encompasses any structure in which charge carriers undergo quantization of their energy states by confinement.
- quantum well structure does not specify the dimensionality of the quantization. It thus includes quantum wells, quantum wires and quantum dots and any combination of these structures.
- the active layer 2 of the surface emitting semiconductor laser is preferably based on a phosphide compound semiconductor or arsenide compound semiconductor.
- the active layer 2 is preferably In x Al y Ga x - y P or Al x In y Ga 1 - X-7 includes As, where 0 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 1 and x + y ⁇ 1 applies.
- the active layer 2 may have a quantum well structure suitable for emission of infrared radiation.
- the active layer is provided for emission of visible or ultraviolet radiation.
- the active layer In x Al y Gai- x . y N, where 0 ⁇ x ⁇ 1, o ⁇ y ⁇ l and x + y ⁇ 1.
- the semiconductor material of the active layer 2 does not necessarily have to have a mathematically exact composition according to one of the abovementioned formulas. Rather, it may include one or more dopants as well as additional ingredients that do not substantially alter the physical properties of the material.
- the above formulas contain only the essential constituents of the crystal lattice (Al, Ga, In, P or As or N), even if these may be partially replaced by small amounts of other substances.
- an element 9 suitable for frequency conversion of the radiation 7 emitted by the semiconductor laser is contained in the laser resonator.
- the frequency conversion element 9 is preferably a nonlinear optical crystal. Frequency conversion, in particular frequency doubling, of the emitted laser radiation 7 is advantageously achieved by means of the frequency conversion element 9.
- the active layer 2 is an infrared radiation emitting layer, wherein the emitted laser radiation 7 by means of the frequency conversion element 9 in visible light, in particular in green visible light, is converted.
- the pump radiation 14 is advantageously focused by an optical element 11 into the active layer 2 of the semiconductor chip 1.
- the optical element 11 may be a diffractive optical element or a refractive optical element, such as a lens act.
- the high-frequency modulation of the pump power Pp is preferably carried out by a correspondingly high-frequency modulation of the operating current of the pump laser 10.
- the pump laser 10 is thus a high-frequency modulated electrically pumped semiconductor laser.
- FIGS. 2 and 3 an exemplary time profile of the operating current intensity I of the pump laser 10 and the output power P out of the surface-emitting semiconductor laser is shown schematically diagrammatically.
- the output power P out of the laser radiation 7 emitted by the surface emitting semiconductor laser is also modulated with the modulation frequency f P of the operating current I of the pump laser.
- the operating current of the pump laser 10 is modulated in such a way that a threshold current intensity I 3 required for exciting the laser emission of the pump laser is not undershot. Furthermore, it is advantageous if the output power of the surface-emitting semiconductor laser does not fall below a threshold power P 3 , below which otherwise would suspend the emission of laser radiation. This is the case, for example, in the time profiles of the operating current I 8 and I shown in FIGS. 2 and 3 the output power P out in the area to the left of the dashed line 15 of the case.
- a further preferred embodiment of the surface emitting semiconductor laser according to the invention is shown schematically in cross section in FIG.
- the surface-emitting semiconductor laser of this embodiment differs from the embodiment shown in FIG. 1 in that it does not have a pump laser arranged outside the semiconductor chip 1.
- the surface-emitting semiconductor laser illustrated in FIG. 4 contains a pump laser 12 monolithically integrated into the semiconductor chip 1.
- the pump laser 12 is an edge-emitting semiconductor laser which irradiates the pump radiation 14 in the lateral direction into the active layer 2 of the surface-emitting semiconductor laser.
- the active layer 2 of the surface-emitting semiconductor laser is preferably surrounded on both sides by the pump laser 12 in the lateral direction. In the vertical direction of the pump laser 12 is surrounded by further semiconductor layers 3, which act in particular as a waveguide for the pump radiation 14 and are provided for current injection into the active layer of the pump laser 12.
- the monolithic integration of the pump laser 12 in the semiconductor chip 1 of the surface emitting semiconductor laser has the particular advantage that the cost of adjusting an external pump laser is eliminated. Furthermore, due to the lateral irradiation of the pumping radiation 14 in the active layer 2 of the surface emitting semiconductor laser is an effective and ensures homogeneous optical pumping of the active layer 2.
- the monolithic integrated pump laser 12 is an electrically pumped semiconductor laser, in which by means of electrical contacts 13 an operating current I is impressed.
- the high-frequency modulation of the output power P out of the surface-emitting semiconductor laser takes place analogously to the semiconductor laser described above in connection with FIG.
- the operating current I of the monolithically integrated pump laser 12 is thus modulated with a modulation frequency f P , which is preferably 1 MHz or more, in order to high-frequency modulate in this way, the output power P out of the surface emitting semiconductor laser with the modulation frequency f P of the pump laser 12.
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005046695 | 2005-09-29 | ||
| DE102005055159A DE102005055159B4 (de) | 2005-09-29 | 2005-11-18 | Hochfrequenz-modulierter oberflächenemittierender Halbleiterlaser |
| PCT/DE2006/001570 WO2007036192A1 (de) | 2005-09-29 | 2006-09-08 | Hochfrequenz-modulierter oberflächenemittierender halbleiterlaser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1929597A1 true EP1929597A1 (de) | 2008-06-11 |
Family
ID=37491732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP06775931A Withdrawn EP1929597A1 (de) | 2005-09-29 | 2006-09-08 | Hochfrequenz-modulierter oberflächenemittierender halbleiterlaser |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20090219957A1 (de) |
| EP (1) | EP1929597A1 (de) |
| JP (1) | JP2009510734A (de) |
| KR (1) | KR20080065998A (de) |
| DE (1) | DE102005055159B4 (de) |
| TW (1) | TWI317194B (de) |
| WO (1) | WO2007036192A1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008030254A1 (de) * | 2008-06-25 | 2009-12-31 | Osram Opto Semiconductors Gmbh | Halbleiterlasermodul |
| KR101022568B1 (ko) * | 2008-12-24 | 2011-03-16 | 경희대학교 산학협력단 | 양자점을 이용한 레이저 디스플레이용 녹색광원 |
| DE102019133797A1 (de) * | 2019-12-10 | 2021-06-10 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Laser-lichtquelle und lidar-system mit der laser-lichtquelle |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5311526A (en) * | 1993-02-25 | 1994-05-10 | At&T Bell Laboratories | Article that comprises a semiconductor laser, and method of operating the article |
| US20020048301A1 (en) * | 1999-07-30 | 2002-04-25 | Peidong Wang | Single mode operation of microelectromechanically tunable, half-symmetric, vertical cavity surface emitting lasers |
| US6795477B1 (en) * | 1999-08-12 | 2004-09-21 | Cortek Inc. | Method for modulating an optically pumped, tunable vertical cavity surface emitting laser (VCSEL) |
| DE10026734A1 (de) * | 2000-05-30 | 2001-12-13 | Osram Opto Semiconductors Gmbh | Optisch gepumpte oberflächenemittierende Halbleiterlaservorrichtung und Verfahren zu deren Herstellung |
| DE10108079A1 (de) * | 2000-05-30 | 2002-09-12 | Osram Opto Semiconductors Gmbh | Optisch gepumpte oberflächenemittierende Halbleiterlaservorrichtung und Verfahren zu deren Herstellung |
| DE10214120B4 (de) * | 2002-03-28 | 2007-06-06 | Osram Opto Semiconductors Gmbh | Optisch pumpbare oberflächenemittierende Halbleiterlaservorrichtung |
| GB2399942A (en) * | 2003-03-24 | 2004-09-29 | Univ Strathclyde | Vertical cavity semiconductor optical devices |
| GB0311563D0 (en) * | 2003-05-20 | 2003-06-25 | Nokia Corp | Optical data transmission system |
| EP1560306B1 (de) * | 2004-01-30 | 2014-11-19 | OSRAM Opto Semiconductors GmbH | Oberflächenemittierender Halbleiterlaser mit einem Interferenzfilter |
| KR100668329B1 (ko) * | 2005-02-16 | 2007-01-12 | 삼성전자주식회사 | 변조기 내장형 광펌핑 반도체 레이저 장치 |
-
2005
- 2005-11-18 DE DE102005055159A patent/DE102005055159B4/de not_active Expired - Fee Related
-
2006
- 2006-09-08 JP JP2008532580A patent/JP2009510734A/ja active Pending
- 2006-09-08 EP EP06775931A patent/EP1929597A1/de not_active Withdrawn
- 2006-09-08 KR KR1020087010328A patent/KR20080065998A/ko not_active Ceased
- 2006-09-08 US US11/992,681 patent/US20090219957A1/en not_active Abandoned
- 2006-09-08 WO PCT/DE2006/001570 patent/WO2007036192A1/de not_active Ceased
- 2006-09-25 TW TW095135299A patent/TWI317194B/zh active
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2007036192A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007036192A1 (de) | 2007-04-05 |
| KR20080065998A (ko) | 2008-07-15 |
| TW200715678A (en) | 2007-04-16 |
| US20090219957A1 (en) | 2009-09-03 |
| JP2009510734A (ja) | 2009-03-12 |
| DE102005055159A1 (de) | 2007-04-05 |
| TWI317194B (en) | 2009-11-11 |
| DE102005055159B4 (de) | 2013-02-21 |
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