EP1922426B1 - Method for producing and using a nickel-based semi-finished product having a recrystallisation cube structure - Google Patents
Method for producing and using a nickel-based semi-finished product having a recrystallisation cube structure Download PDFInfo
- Publication number
- EP1922426B1 EP1922426B1 EP06725088.6A EP06725088A EP1922426B1 EP 1922426 B1 EP1922426 B1 EP 1922426B1 EP 06725088 A EP06725088 A EP 06725088A EP 1922426 B1 EP1922426 B1 EP 1922426B1
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- Prior art keywords
- semifinished product
- nickel
- strip
- recrystallization
- texture
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/24—After-treatment of workpieces or articles
- B22F2003/248—Thermal after-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
Definitions
- the invention relates to a process for the production of nickel-based semi-finished products in strip or flat wire form with a recrystallization cube texture and the use of the semifinished product produced.
- the semifinished product can be used in particular as a substrate for physico-chemical coatings with a high degree of microstructural alignment.
- Such supports are suitable, for example, as substrates for ceramic coatings as used in the field of high temperature superconductivity. In this case, they are used in superconducting magnets, transformers, motors, tomographs or superconducting current paths.
- Ni alloys with Mo and W DE 100 05 861 C1 . It has also been proposed to add to such Ni alloys up to a maximum of 0.3 atom% Ag ( DE 103 42 965.4 ).
- the semi-finished product should have an elongated grain shape with stable cube texture, and the expanded grain should remain intact even after further thermal treatment at high temperatures for the purpose of oxide layer growth.
- the method according to the invention is characterized in that initially a starting semi-finished product is produced by fusion metallurgy or powder metallurgy involving mechanical alloying, which consists of technically pure Ni or a Ni alloy, wherein an Ag addition in the microalloying range of at least 10 atomic ppm and a maximum of 1000 atomic ppm is contained.
- This starting semifinished product is processed by means of a hot forming with subsequent cold working of> 50% thickness reduction to tape or flat wire with an intermediate dimension.
- the semi-finished product is annealed in the temperature range between 500 ° C and 850 ° C annealed, the higher temperatures are used for the higher Ag contents, and then quenched. Subsequently, this intermediate is highly> 80% cold formed. Finally, a recrystallizing annealing treatment to achieve a complete cube texture is performed.
- the final recrystallization annealing treatment is carried out at temperatures of 500 ° C to 1200 ° C, preferably at 850 ° C, depending on the alloy content in the nickel.
- the semifinished product may advantageously be heat treated after or during the recrystallizing annealing for the purpose of growing a cube-textured NiO layer having a texture content of> 90% in an oxidizing atmosphere.
- Ni alloy is used for the starting semi-finished product, which still contains Mo and / or W as alloying elements in addition to the Ag addition.
- the formation of a high-grade cube texture is favored.
- the expanded metal strip allows the growth of a highly cube textured NiO layer, which also has elongated grains.
- the semifinished product can be used as a substrate for physico-chemical coatings with a high degree of microstructural orientation, in particular for producing wire-shaped or ribbon-shaped high-temperature superconductors.
- the resulting nickel oxide layer has a structure with elongated grains, whose proportion with cube position is 97% ( Fig. 4 ). The proportion of small-angle grain boundaries is 96%. This texture is rotated 45 ° from the texture of the nickel strip.
- the resulting nickel strip is then first subjected at 850 ° C a 30-minute annealing for recrystallization in a reducing atmosphere. Thereafter, the strip is treated in a second annealing for 8 minutes at 1150 ° C in a reducing atmosphere to set a thermally highly resilient cube layer.
Description
Die Erfindung betrifft ein Verfahren zur Herstellung von Halbzeug auf Nickelbasis in Band- oder Flachdrahtform mit einer Rekristallisationswürfeltextur und die Verwendung des hergestellten Halbzeugs.The invention relates to a process for the production of nickel-based semi-finished products in strip or flat wire form with a recrystallization cube texture and the use of the semifinished product produced.
Das Halbzeug ist insbesondere einsetzbar als Unterlage für physikalisch-chemische Beschichtungen mit hochgradiger mikrostruktureller Ausrichtung. Solche Unterlagen sind zum Beispiel als Substrate für keramische Beschichtungen geeignet, wie sie auf dem Gebiet der Hochtemperatur-Supraleitung angewendet werden. Der Einsatz erfolgt in diesem Fall in supraleitenden Magneten, Transformatoren, Motoren, Tomographen oder supraleitenden Strombahnen.The semifinished product can be used in particular as a substrate for physico-chemical coatings with a high degree of microstructural alignment. Such supports are suitable, for example, as substrates for ceramic coatings as used in the field of high temperature superconductivity. In this case, they are used in superconducting magnets, transformers, motors, tomographs or superconducting current paths.
Bekannt ist, dass polykristalline Metalle mit kubisch-flächenzentriertem Gitter, wie Nickel, Kupfer und Aluminium, nach vorausgegangener starker Kaltumformung durch Walzen bei der nachfolgenden Rekristallisation eine ausgeprägte Textur mit Würfellage ausbilden können (
Es sind bereits texturierte Halbzeuge für die Herstellung von Hochtemperatur-Supraleitern bekannt, die aus Ni-Cr, Ni-Cr-V, Ni-Cu und ähnlichen Legierungen bestehen (
Bekannt sind für diese Zwecke auch Ni-Legierungen mit Mo und W (
Sämtliche derartigen bekannten Metallbänder mit einer Würfeltextur, die durch Rekristallisation entstanden ist, haben ein Gefüge mit äquiaxialen Körnern, das heißt, bezogen auf die Bandebene sind sie etwa gleich lang und breit. Aus theoretischen Überlegungen heraus sollte jedoch eine Kornstreckung in Längsrichtung für den Stromtransport bei der Supraleitung vorteilhaft sein und zu höheren übertragbaren Strömen führen (
Die bekannten Halbzeuge haben folgende Nachteile:
- Rekristallisiertes Nickel oder dessen Legierungen mit Würfeltextur weisen Körner auf, die in Längsrichtung etwa die gleiche Ausdehnung haben wie in Querrichtung,
- Nickel neigt nach Kaltumformung und Rekristallisationsglühung stark zur Ausbildung einer groben Kornstruktur, die zur Erzielung der hochgradigen Würfeltextur nachteilig ist,
- kaltumgeformte Ni-Bänder neigen bei der Rekristallisations-Wärmebehandlung, insbesondere bei höheren Temperaturen (800 bis 1150°C) stark zur Bildung von Korngrenzengräben,
- Substratmaterial mit Korngrenzengräben ist wenig geeignet als Unterlage für epitaktische Schichtabscheidungen, zum Beispiel für Pufferschichten und Supraleiterschichten.
- Recrystallized nickel or its cubic texture alloys have grains which are approximately the same lengthwise in the longitudinal direction as in the transverse direction,
- Nickel, after cold working and recrystallization annealing, has a strong tendency to form a coarse grain structure, which is detrimental to achieving the high grade cube texture.
- Cold-formed Ni strips tend to form grain boundary trenches during recrystallization heat treatment, especially at higher temperatures (800 to 1150 ° C.).
- Grain trench substrate material is poorly suited as a substrate for epitaxial layer depositions, for example, for buffer layers and superconductor layers.
Der Erfindung liegt die Aufgabe zu Grunde, ein Verfahren zur Herstellung von Halbzeug auf Nickelbasis zu entwickeln, das verbesserte Gebrauchseigenschaften für die Verwendung als Unterlage für physikalisch-chemische Beschichtungen mit hochgradiger mikrostruktureller Ausrichtung besitzt. Insbesondere soll das Halbzeug eine gestreckte Kornform bei stabiler Würfeltextur aufweisen und das Streckkorn soll auch nach weiterer thermischer Behandlung bei hohen Temperaturen zum Zwecke eines Oxidschichtwachstums erhalten bleiben.It is an object of the present invention to provide a process for producing nickel-based semifinished product which has improved performance for use as a substrate for high chemical microstructural alignment physical-chemical coatings. In particular, the semi-finished product should have an elongated grain shape with stable cube texture, and the expanded grain should remain intact even after further thermal treatment at high temperatures for the purpose of oxide layer growth.
Diese Aufgabe wird mit dem in den Patenansprüchen gekennzeichneten Merkmalen gelöst.This object is achieved with the features characterized in the claims.
Das erfindungsgemäße Verfahren ist dadurch gekennzeichnet, dass zunächst auf schmelzmetallurgischem oder pulvermetallurgischem Wege unter Einbeziehung des mechanischen Legierens ein Ausgangshalbzeug hergestellt wird, das aus technisch reinem Ni oder einer Ni-Legierung besteht, worin ein Ag-Zusatz im Mikrolegierungsbereich von mindestens 10 Atom-ppm und maximal 1000 Atom-ppm enthalten ist. Dieses Ausgangshalbzeug wird mittels einer Warmumformung mit nachfolgender Kaltumformung von >50% Dickenreduktion zu Band oder Flachdraht mit einer Zwischenabmessung verarbeitet. In dieser Zwischenabmessung wird das Halbzeug entfestigend im Temperaturbereich zwischen 500°C und 850°C geglüht, wobei die höheren Temperaturen für die höheren Ag-Gehalte angewandt werden, und daraufhin abgeschreckt. Anschließend wird dieses Zwischenprodukt hochgradig >80% kalt umgeformt. Abschließend wird eine rekristallisierende Glühbehandlung zur Erzielung einer vollständigen Würfeltextur durchgeführt.The method according to the invention is characterized in that initially a starting semi-finished product is produced by fusion metallurgy or powder metallurgy involving mechanical alloying, which consists of technically pure Ni or a Ni alloy, wherein an Ag addition in the microalloying range of at least 10 atomic ppm and a maximum of 1000 atomic ppm is contained. This starting semifinished product is processed by means of a hot forming with subsequent cold working of> 50% thickness reduction to tape or flat wire with an intermediate dimension. In this intermediate dimension, the semi-finished product is annealed in the temperature range between 500 ° C and 850 ° C annealed, the higher temperatures are used for the higher Ag contents, and then quenched. Subsequently, this intermediate is highly> 80% cold formed. Finally, a recrystallizing annealing treatment to achieve a complete cube texture is performed.
Die abschließende Rekristallisationsglühbehandlung wird in Abhängigkeit vom Legierungsgehalt im Nickel bei Temperaturen von 500°C bis 1200°C durchgeführt, und zwar vorzugsweise bei 850°C.The final recrystallization annealing treatment is carried out at temperatures of 500 ° C to 1200 ° C, preferably at 850 ° C, depending on the alloy content in the nickel.
Das Halbzeug kann vorteilhaft nach oder während der rekristallisierenden Glühung zum Zwecke des Aufwachsens einer würfeltexturierten NiO-Schicht mit einem Texturgehalt von >90% in einer oxidierenden Atmosphäre wärmebehandelt werden.The semifinished product may advantageously be heat treated after or during the recrystallizing annealing for the purpose of growing a cube-textured NiO layer having a texture content of> 90% in an oxidizing atmosphere.
Vorteilhaft ist es auch, wenn für das Ausgangshalbzeug eine Ni-Legierung verwendet wird, die neben dem Ag-Zusatz noch Mo und/oder W als Legierungselemente enthält.It is also advantageous if a Ni alloy is used for the starting semi-finished product, which still contains Mo and / or W as alloying elements in addition to the Ag addition.
Mit dem erfindungsgemäßen Ag-Zusatz wird die Formierung einer hochgradigen Würfeltextur begünstigt. Außerdem ermöglicht das Metallband mit Streckkorn das Aufwachsen einer hochgradig mit einer Würfeltextur versehenen NiO-Schicht, die ebenfalls gestreckte Körner aufweist.With the Ag addition according to the invention, the formation of a high-grade cube texture is favored. In addition, the expanded metal strip allows the growth of a highly cube textured NiO layer, which also has elongated grains.
Das Halbzeug kann erfindungsgemäß als Unterlage für physikalisch-chemische Beschichtungen mit hochgradiger mikrostruktureller Ausrichtung, insbesondere zur Herstellung draht- oder bandförmiger Hochtemperatur-Supraleiter, verwendet werden.According to the invention, the semifinished product can be used as a substrate for physico-chemical coatings with a high degree of microstructural orientation, in particular for producing wire-shaped or ribbon-shaped high-temperature superconductors.
Die Erfindung ist nachstehend an Hand von Ausführungsbeispielen näher erläutert, mit denen die erfolgreiche Erprobung der Erfindung nachgewiesen wird.The invention is explained below with reference to exemplary embodiments, with which the successful testing of the invention is demonstrated.
Die nachstehenden Erläuterungen zu den Abbildungen zeigen die positiven Ergebnisse der Anwendung der Erfindung im Rahmen der beschriebenen Ausführungsbeispiele.
- Abb. 1
- zeigt das gestrecktes Gefüge von Nickel mit 0,01 Atom-% Silber nach dem Warmwalzen bei 850°C und anschließendem Kaltwalzen mit einer Dickenreduktion von 85% und einer Anlassbehandlung mit Teilrekristallisation bei 550°C über 30 min (Längsschliff, geätzt).
- Abb. 2
- zeigt gestreckte Körner auf der Oberfläche eines 80 µm dicken Bandes von Nickel mit 0,025 Atom-% Silber, das bei 3 mm Dicke einer Zwischenglühung bei 650°C über 30 min unterzogen wurde, anschließend an 80 µm Dicke stark kalt umgeformt wurde und abschließend bei 550°C über 30 min geglüht wurde (Rasterelektronenaufnahme).
- Abb. 3
- zeigt gestreckte Körner mit Würfellage auf der Oberfläche eines 80 µm dicken Bandes von Nickel mit 0,025 Atom-% Silber nach einer Zwischenglühung bei 650°C über 30 min bei 3mm Dicke, anschließender starker Kaltumformung an 80 µm Dicke und der abschließenden Glühung bei 550°C über 30 min (Orientierungsmapping mit dem Rasterelektronenmikroskop).
- Abb. 4
- zeigt gestreckte Körner mit Würfellage des Nickeloxids auf der Oberfläche eines 80 µm dicken Bandes von Nickel mit 0,025 Atom-% Silber nach einer Zwischenglühung bei 650°C über 30 min bei 3 mm Dicke, anschließender starker Kaltumformung an 80 µm Dicke, der Texturglühung bei 550°C über 30 min und der Oxidation in Sauerstoff bei 1150°C über 2 min (Orientierungsmapping mit dem Rasterelektronenmikroskop).
- Fig. 1
- shows the stretched structure of nickel with 0.01 atom% of silver after hot rolling at 850 ° C and then cold rolling with a thickness reduction of 85% and a tempering treatment with partial recrystallization at 550 ° C for 30 minutes (longitudinal grinding, etched).
- Fig. 2
- shows elongated grains on the surface of an 80 μm thick strip of nickel with 0.025 atom% of silver, which at 3 mm thickness was subjected to an intermediate annealing at 650 ° C for 30 minutes, then was strongly cold formed at 80 microns thick and was finally annealed at 550 ° C for 30 min (scanning electron micrograph).
- Fig. 3
- shows elongated grains with a dice layer on the surface of a 80 micron thick strip of nickel with 0.025 atom% of silver after an intermediate annealing at 650 ° C for 30 min at 3mm thickness, followed by strong cold forming at 80 microns thickness and the final annealing at 550 ° C. over 30 min (orientation mapping with the scanning electron microscope).
- Fig. 4
- shows elongated grains with cube layer of nickel oxide on the surface of a 80 micron thick band of nickel with 0.025 atom% of silver after an intermediate annealing at 650 ° C for 30 min at 3 mm thickness, followed by strong cold forming at 80 microns thickness, the texture annealing at 550 ° C for 30 min and the oxidation in oxygen at 1150 ° C for 2 min (orientation mapping with the scanning electron microscope).
Technisch reines Nickel, beispielsweise mit einem Reinheitsgrad von 99,9 Atomprozent Nickel, wird unter Zulegieren von 0,025 Atomprozent Silber in eine Kokille abgegossen. Der Ingot wird bei 850°C an die Vierkantabmessung (22 x 22) mm2 gewalzt, homogenisierend geglüht und abgeschreckt. Anschließend wird das Vierkantmaterial spanabhebend überarbeitet, um eine fehlerfreie Oberfläche für die folgende Kaltumformung durch Walzen zu erhalten. Das Kaltwalzen wird zunächst mit einem Abwalzgrad von über 50 Prozent Dickenreduktion von 20 mm an 3 mm Dicke durchgeführt, in diesem Fall 85% Dickenreduktion. Die nachfolgende Anlassbehandlung bei 650°C über 30 min mit anschließender Abschreckung in Wasser bewirkt eine Rekristallisation mit einem Anteil von gestreckten Körnern.
Es wird im Weiteren durchgängig mit einer Dickenreduktion von 97,3% von 3 mm bis an 80 µm Dicke kalt umgeformt und abschließend in einer nicht oxidierenden Gasatmosphäre bei 550°C über 30 min geglüht. Das Ergebnis sind Körner an der Oberfläche des Bandes, die um ein Mehrfaches länger als breit sind, wie
Technisch reines Nickel, beispielsweise mit einem Reinheitsgrad von 99,9 Atomprozent Nickel, wird unter Zulegieren von 0,01 Atomprozent Silber in einem Vakuuminduktionsofen geschmolzen und in eine Kokille abgegossen. Der Ingot wird bei 900°C an die Vierkantabmessung (22 x 22) mm2 gewalzt, homogenisierend geglüht und abgeschreckt. Anschließend wird das Vierkantmaterial spanabhebend überarbeitet, um eine fehlerfreie Oberfläche für die folgende Kaltumformung durch Walzen zu erhalten. Das Kaltwalzen wird mit einem Abwalzgrad von über 50 Prozent Dickenreduktion durchgeführt, in diesem Fall 85%. Das resultierende Nickelband hat eine Dicke von 3 mm. Es wird nachfolgend bei 650°C über 30 min angelassen und in Wasser abgeschreckt. Die Rekristallisation erzeugt einen Anteil von gestreckten Körnern. Es wird im Weiteren durchgängig mit einer Dickenreduktion von 97,3% ausgehend von 3 mm bis an 80 µm Dicke kalt umgeformt und abschließend in einer nicht oxidierenden Gasatmosphäre bei 550°C über 30 min geglüht. Das Ergebnis ist eine nahezu vollständige Rekristallisationswürfeltextur in einem Streckkorngefüge (vergl.
Die entstandene Nickeloxidschicht weist ein Gefüge mit gestreckten Körnern auf, deren einen Anteil mit Würfellage 97% beträgt (
Technisch reines Nickelpulver wird unter Zugabe von 5,0 Atomprozent Wolframpulver und 0,1 Atom-% Silberpulver pulvermetallurgisch prozessiert. Nach dem Verpressen, Tempern und Warmumformen wird ein Stabmaterial von (22 x 22) mm2 erhalten. Die Oberfläche wird spanabhebend überarbeitet, um eine fehlerfreie Oberfläche für die folgende Kaltumformung durch Walzen zu erhalten. Das Kaltwalzen wird ausgehend von ca. (20 X 20) mm2 bis an eine Dicke von 3 mm durchgeführt.Technically pure nickel powder is powder metallurgically processed with the addition of 5.0 atomic percent tungsten powder and 0.1 atom% silver powder. After pressing, annealing and hot forming, a rod material of (22 x 22) mm 2 is obtained. The surface is machined to obtain a defect free surface for subsequent cold working by rolling. The cold rolling is carried out from about (20 X 20) mm 2 to a thickness of 3 mm.
Es wird nachfolgend bei 650°C über 30 min angelassen und in Wasser abgeschreckt. Darauf wird an die Fertigabmessung von 80 µm Dicke kalt gewalzt. Die Randbereiche des Bandes werden abgetrennt und verworfen. Das erhaltene Nickelband wird anschließend zunächst bei 850°C einer 30-minütigen Glühbehandlung zum Rekristallisieren in reduzierender Atmosphäre unterzogen. Danach wird das Band in einer zweiten Glühung über 8 Minuten bei 1150°C in reduzierender Atmosphäre behandelt, um eine thermisch hoch belastbare Würfellage einzustellen.It is subsequently tempered at 650 ° C for 30 minutes and quenched in water. Then cold rolled to the finished size of 80 microns thickness. The edge areas of the band are separated and discarded. The resulting nickel strip is then first subjected at 850 ° C a 30-minute annealing for recrystallization in a reducing atmosphere. Thereafter, the strip is treated in a second annealing for 8 minutes at 1150 ° C in a reducing atmosphere to set a thermally highly resilient cube layer.
Claims (7)
- Method for the production of a nickel-based semifinished product having a recrystallization cube texture, characterised in that firstly a starting semifinished product is produced by a melt metallurgy or powder metallurgy process, with the inclusion of mechanical alloying, said starting semifinished product consisting of technically pure Ni or an Ni alloy, in which an Ag addition is present in the microalloying range of at least 10 atom ppm and at most 1000 atom ppm, in that this starting semifinished product is processed to form strip or flat wire having an intermediate dimension by means of hot-forming with subsequent cold-forming with a thickness reduction of > 50%, this strip or flat wire is softened by annealing in the temperature range of between 500°C and 850°C, with the hither temperatures being used for the hither Ag contents, in that consequently quenching is carried out, in that subsequently this intermediate product is subjected to cold-forming to a high degree of > 80%, and in that finally a recrystallizing annealing treatment is carried out to achieve a complete cube texture.
- Method according to Claim 1, characterized in that the final recrystallization annealing treatment is carried out at temperatures of 500°C to 1200°C, depending on the alloy content in the nickel.
- Method according to Claim 2, characterized in that the final recrystallization annealing treatment as carried out at a temperature of 850°C.
- Method according to Claim 1, characterized in that the semifinished product is subjected to a heat treatment in an oxidizing atmosphere after or during the recrystallizing annealing for the purpose of growing a cube-textured NiO layer having a texture content of > 90%.
- Semifinished product according to Claim 1, characterised in that an Ni alloy containing Mo and/or W and the Ag addiction is used for the starting semifinished product.
- Use of the semifinished product produced according to Claims 1 to 5 in strip or flat wire form having a recrystallization cube texture and stretched grain shape as a substrate for physical-chemical coatings having a high degree of microstructural orientation.
- Use of the semifinished product produced according to Claims 1 to 5 in strip or flat wire form having a recrystallization cube texture and stretched grain shape as a substrate for the production of wire-like or strip-like high-temperature superconductors.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005013368A DE102005013368B3 (en) | 2005-03-16 | 2005-03-16 | Making nickel-based blank with cubic recrystallization structure for use as backing for high temperature superconductor, employs silver micro-alloying and specified thermal and mechanical treatments |
PCT/EP2006/060774 WO2006097501A1 (en) | 2005-03-16 | 2006-03-15 | Method for producing and using a nickel-based semi-finished product having a recrystallisation cube structure |
Publications (2)
Publication Number | Publication Date |
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EP1922426A1 EP1922426A1 (en) | 2008-05-21 |
EP1922426B1 true EP1922426B1 (en) | 2014-06-11 |
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EP06725088.6A Not-in-force EP1922426B1 (en) | 2005-03-16 | 2006-03-15 | Method for producing and using a nickel-based semi-finished product having a recrystallisation cube structure |
Country Status (7)
Country | Link |
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US (1) | US8465605B2 (en) |
EP (1) | EP1922426B1 (en) |
JP (1) | JP5074375B2 (en) |
KR (1) | KR20070112282A (en) |
CN (1) | CN100523239C (en) |
DE (1) | DE102005013368B3 (en) |
WO (1) | WO2006097501A1 (en) |
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CN100400700C (en) * | 2007-03-29 | 2008-07-09 | 上海大学 | Process for improving 690 alloy material corrosive-resisting performance |
JP5330725B2 (en) * | 2008-03-31 | 2013-10-30 | 古河電気工業株式会社 | Superconducting wire substrate and manufacturing method thereof |
DE102008001005B4 (en) | 2008-04-04 | 2011-06-22 | Karlsruher Institut für Technologie, 76131 | A method for producing a composite layer with epitaxially grown layers of a magnetic shape memory material and composite layer with epitaxial layers of a magnetic shape memory material and its use |
DE102010031058A1 (en) * | 2010-07-07 | 2012-01-12 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Metallic profile wire with recrystallization cube texture and process for its production |
DE102014008136B4 (en) | 2013-06-07 | 2016-08-04 | VDM Metals GmbH | Process for producing a metal foil |
DE102014008137B4 (en) | 2013-06-07 | 2016-08-04 | VDM Metals GmbH | Process for producing a metal foil |
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JPS58177434A (en) * | 1982-04-10 | 1983-10-18 | Tohoku Metal Ind Ltd | Wear resistant magnetic alloy of high magnetic permeability |
US5741377A (en) * | 1995-04-10 | 1998-04-21 | Martin Marietta Energy Systems, Inc. | Structures having enhanced biaxial texture and method of fabricating same |
US5964966A (en) * | 1997-09-19 | 1999-10-12 | Lockheed Martin Energy Research Corporation | Method of forming biaxially textured alloy substrates and devices thereon |
US6458223B1 (en) * | 1997-10-01 | 2002-10-01 | American Superconductor Corporation | Alloy materials |
CN1117879C (en) * | 1999-04-03 | 2003-08-13 | 德累斯顿固体材料研究所 | Nickel-based metallic material and method for producing same |
US6617283B2 (en) * | 2001-06-22 | 2003-09-09 | Ut-Battelle, Llc | Method of depositing an electrically conductive oxide buffer layer on a textured substrate and articles formed therefrom |
JP2005002408A (en) * | 2003-06-11 | 2005-01-06 | Hitachi Ltd | Corrosion-resistant film, equipment for seawater, and corrosion-resistant film deposition method |
DE10342965A1 (en) * | 2003-09-10 | 2005-06-02 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Nickel-based semifinished product with a recrystallization cube texture and process for its production |
JP5432863B2 (en) * | 2010-08-25 | 2014-03-05 | 住友電気工業株式会社 | Alignment substrate for film formation and superconducting wire |
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2005
- 2005-03-16 DE DE102005013368A patent/DE102005013368B3/en not_active Expired - Fee Related
-
2006
- 2006-03-15 EP EP06725088.6A patent/EP1922426B1/en not_active Not-in-force
- 2006-03-15 WO PCT/EP2006/060774 patent/WO2006097501A1/en active Application Filing
- 2006-03-15 KR KR1020077023661A patent/KR20070112282A/en not_active Application Discontinuation
- 2006-03-15 JP JP2008501312A patent/JP5074375B2/en not_active Expired - Fee Related
- 2006-03-15 US US11/886,348 patent/US8465605B2/en not_active Expired - Fee Related
- 2006-03-15 CN CNB2006800084763A patent/CN100523239C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2008533301A (en) | 2008-08-21 |
US8465605B2 (en) | 2013-06-18 |
CN100523239C (en) | 2009-08-05 |
EP1922426A1 (en) | 2008-05-21 |
KR20070112282A (en) | 2007-11-22 |
CN101142331A (en) | 2008-03-12 |
WO2006097501A1 (en) | 2006-09-21 |
JP5074375B2 (en) | 2012-11-14 |
US20090008000A1 (en) | 2009-01-08 |
DE102005013368B3 (en) | 2006-04-13 |
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