EP1895020A4 - Sputtering target and thin film for optical information recording medium - Google Patents

Sputtering target and thin film for optical information recording medium

Info

Publication number
EP1895020A4
EP1895020A4 EP06729897A EP06729897A EP1895020A4 EP 1895020 A4 EP1895020 A4 EP 1895020A4 EP 06729897 A EP06729897 A EP 06729897A EP 06729897 A EP06729897 A EP 06729897A EP 1895020 A4 EP1895020 A4 EP 1895020A4
Authority
EP
European Patent Office
Prior art keywords
thin film
recording medium
information recording
optical information
sputtering target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06729897A
Other languages
German (de)
French (fr)
Other versions
EP1895020A1 (en
Inventor
Hideo Takami
Masataka Yahagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JX Nippon Mining and Metals Corp
Original Assignee
JX Nippon Mining and Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JX Nippon Mining and Metals Corp filed Critical JX Nippon Mining and Metals Corp
Publication of EP1895020A1 publication Critical patent/EP1895020A1/en
Publication of EP1895020A4 publication Critical patent/EP1895020A4/en
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
EP06729897A 2005-06-23 2006-03-24 Sputtering target and thin film for optical information recording medium Withdrawn EP1895020A4 (en)

Applications Claiming Priority (2)

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JP2005182788 2005-06-23
PCT/JP2006/305949 WO2006137199A1 (en) 2005-06-23 2006-03-24 Sputtering target and thin film for optical information recording medium

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EP1895020A1 EP1895020A1 (en) 2008-03-05
EP1895020A4 true EP1895020A4 (en) 2012-11-14

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EP (1) EP1895020A4 (en)
JP (1) JP4907528B2 (en)
KR (1) KR20080021111A (en)
CN (1) CN101208451B (en)
TW (1) TW200706665A (en)
WO (1) WO2006137199A1 (en)

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WO2009142238A1 (en) * 2008-05-23 2009-11-26 住友電気工業株式会社 Sintered compact, process for production thereof, and optical element
US20150170890A1 (en) * 2012-09-18 2015-06-18 Jx Nippon Mining & Metals Corporation Sputtering Target
CN103060753B (en) * 2013-01-24 2014-08-20 扬州大学 Process method for preparing hexagonal phase ZnS film at low temperature
JP6134368B2 (en) * 2015-10-19 2017-05-24 Ｊｘ金属株式会社 Sintered body, sputtering target comprising the sintered body, and thin film formed using the sputtering target
CN114890785A (en) * 2022-05-31 2022-08-12 先导薄膜材料（广东）有限公司 Zinc oxysulfide target material and preparation method thereof

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JPH11278936A (en) * 1998-03-30 1999-10-12 Sumitomo Metal Mining Co Ltd Production of sintered body for protection film for optical recording film
WO2004079037A1 (en) * 2003-03-04 2004-09-16 Nikko Materials Co., Ltd. Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same

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JP2695605B2 (en) 1992-12-15 1998-01-14 出光興産株式会社 Target and manufacturing method thereof
JP2000026119A (en) 1998-07-09 2000-01-25 Hoya Corp Article having transparent electrically conductive oxide thin film and its manufacture
JP4170454B2 (en) 1998-07-24 2008-10-22 Ｈｏｙａ株式会社 Article having transparent conductive oxide thin film and method for producing the same
JP3533333B2 (en) * 1998-08-21 2004-05-31 Ｔｄｋ株式会社 Sputtering target for interference film of optical recording medium and method of manufacturing the same
JP2003099995A (en) * 2001-09-26 2003-04-04 Ulvac Japan Ltd Dielectrics target for optical disk and method for forming film
JP4198918B2 (en) * 2002-02-14 2008-12-17 日鉱金属株式会社 Sputtering target mainly composed of zinc sulfide and method for producing the sputtering target

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JPH11278936A (en) * 1998-03-30 1999-10-12 Sumitomo Metal Mining Co Ltd Production of sintered body for protection film for optical recording film
WO2004079037A1 (en) * 2003-03-04 2004-09-16 Nikko Materials Co., Ltd. Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same
EP1602746A1 (en) * 2003-03-04 2005-12-07 Nikko Materials Company, Limited Sputtering target and process for producing the same, thin film for optical information recording medium and process for producing the same

Non-Patent Citations (1)

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Title
See also references of WO2006137199A1 *

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TWI319438B (en) 2010-01-11
CN101208451A (en) 2008-06-25
EP1895020A1 (en) 2008-03-05
WO2006137199A1 (en) 2006-12-28
TW200706665A (en) 2007-02-16
JPWO2006137199A1 (en) 2009-01-08
JP4907528B2 (en) 2012-03-28
CN101208451B (en) 2010-06-16
KR20080021111A (en) 2008-03-06

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