EP1837721A1 - Pièce de micro-mécanique en matériau isolant et son procédé de fabrication - Google Patents
Pièce de micro-mécanique en matériau isolant et son procédé de fabrication Download PDFInfo
- Publication number
- EP1837721A1 EP1837721A1 EP06111727A EP06111727A EP1837721A1 EP 1837721 A1 EP1837721 A1 EP 1837721A1 EP 06111727 A EP06111727 A EP 06111727A EP 06111727 A EP06111727 A EP 06111727A EP 1837721 A1 EP1837721 A1 EP 1837721A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- micro
- insulating material
- mechanical part
- silicon
- part according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011810 insulating material Substances 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 5
- 238000000034 method Methods 0.000 title claims description 10
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 12
- 239000010703 silicon Substances 0.000 claims abstract description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000000919 ceramic Substances 0.000 claims abstract description 4
- 239000010432 diamond Substances 0.000 claims abstract description 4
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 4
- 239000011521 glass Substances 0.000 claims abstract description 4
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 4
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000001465 metallisation Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000005468 ion implantation Methods 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 238000005240 physical vapour deposition Methods 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 239000010948 rhodium Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000003754 machining Methods 0.000 claims description 2
- 239000002131 composite material Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G04—HOROLOGY
- G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
- G04B17/00—Mechanisms for stabilising frequency
- G04B17/04—Oscillators acting by spring tension
- G04B17/06—Oscillators with hairsprings, e.g. balance
- G04B17/066—Manufacture of the spiral spring
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0069—Watchmakers' or watch-repairers' machines or tools for working materials for working with non-mechanical means, e.g. chemical, electrochemical, metallising, vapourising; with electron beams, laser beams
-
- G—PHYSICS
- G04—HOROLOGY
- G04D—APPARATUS OR TOOLS SPECIALLY DESIGNED FOR MAKING OR MAINTAINING CLOCKS OR WATCHES
- G04D3/00—Watchmakers' or watch-repairers' machines or tools for working materials
- G04D3/0074—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment
- G04D3/0087—Watchmakers' or watch-repairers' machines or tools for working materials for treatment of the material, e.g. surface treatment for components of the escapement mechanism, e.g. lever escapement, escape wheel
Definitions
- the present invention relates to a micro-mechanical part made of an insulating material, and more particularly to a fixed or mobile part of a watch movement whose proximity to other parts does not disturb the operation of a moving part, directly, or indirectly by the attraction of particles.
- Insulating materials such as silicon and its compounds, quartz, diamond, glass, ceramics or others are increasingly used to make micro-mechanical parts, whether fixed parts , such as plates or bridges, or moving parts for example part of the drive train, or the control system such as the balance spring, balance or exhaust.
- the present invention therefore aims to provide a solution to the problem mentioned above by providing a fixed or mobile micro-mechanical part made of an insulating material whose surface treatment avoids the risk of bonding.
- the invention relates to a micro-mechanical part made of an insulating material, such as silicon, and its compounds, diamond, glass, ceramic or other, all or part of its surface is coated with a thin metal deposit preferably less than 50 nm.
- a thin metal deposit preferably less than 50 nm.
- This deposit may be performed on a piece of insulating material monoblock or composite, that is to say, at least the outer surface is of insulating material.
- the stainless and amagnetic metals such as gold, platinum, rhodium and palladium are preferably chosen. These metals can be deposited by known methods making it possible to control the thickness by adjusting the operating conditions, for example by sputtering, PVD, doping, ion implantation or by an electrolytic process.
- said micro-mechanical part is a part of the kinematic chain of a watch movement, such as a hairspring, an anchor, an escape wheel or a toothed wheel, or any which other fixed part may for example be the bearing of the axis of a mobile.
- a hairspring which is the most sensitive part of a watch movement.
- the invention also relates to a timepiece incorporating such a micro-mechanical part.
- the invention will be more particularly illustrated by a sprung-balance adjusting device represented in FIG. 1, in which the spiral 1 is produced, for example, in silicon, by adapting the micro-machining processes used in the manufacture of integrated circuits or accelerometers from a silicon wafer or other amorphous or crystalline insulating material.
- wet chemical etching, plasma dry machining or reactive ion etching (RIE) can be carried out using masks appropriate to the desired contour for the hairspring.
- the same silicon wafer makes it possible to manufacture a batch of spirals whose characteristics are determined by the thickness of the wafer and the shape of the masks, said characteristics being calculated for operation of the spiral in a plane.
- FIG. 2 whose cross-sectional representation is limited to the hairspring 1 and to the cock 9, the behavior of the turns 11 is shown in the left-hand part after a certain operating time when the hairspring 1 n has undergone no treatment.
- the turns 11 deviate from their normal position shown in dotted lines by being attracted by the cock 9 and can even stick to it, which obviously disturbs the normal walking, that is to say to say a march having only movements of extension / contraction in a plane.
- the metal used is preferably a stainless and amagnetic metal such as gold, platinum, rhodium, palladium.
- This deposition can be carried out by means of various known methods, such as sputtering, PVD deposition, ion implantation or electroplating.
- a gold deposit of 15 nm has been carried out by "sputtering", that is to say by performing a cathodic sputtering under vacuum, with a gold target, by applying a voltage of 60 mA for 15 seconds.
- a silicon spiral has just been described, but other non-conductive amorphous or crystalline materials may also be used, as indicated above, and be treated with a surface metallization avoiding the risk of attraction or sticking.
- a composite material to produce, for example, a hairspring having a silicon core and a thick coating of silicon dioxide on which the very low metal deposition will be performed.
- a “composite material” may also include a metal core embedded in an insulating material.
- the invention is not limited to a hairspring and can be applied to other moving parts such as an anchor, an escape wheel or a toothed wheel, as well as to fixed parts.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06111727A EP1837721A1 (fr) | 2006-03-24 | 2006-03-24 | Pièce de micro-mécanique en matériau isolant et son procédé de fabrication |
EP07104385.5A EP1837722B1 (fr) | 2006-03-24 | 2007-03-19 | Pièce de micro-mécanique en matériau isolant et son procédé de fabrication |
TW096109746A TWI438588B (zh) | 2006-03-24 | 2007-03-21 | 由絕緣材料製成的微機械零件及其製造方法 |
KR1020070027483A KR20070096834A (ko) | 2006-03-24 | 2007-03-21 | 절연성 물질로 만들어지는 미세-기계 부분 및 상기 부분을제조하기 위한 방법 |
JP2007076624A JP5378654B2 (ja) | 2006-03-24 | 2007-03-23 | 絶縁材でできた微小機械部品及びそれを製造する方法 |
CN2007100893622A CN101042570B (zh) | 2006-03-24 | 2007-03-23 | 由绝缘材料制成的微型机械部件及其制造方法 |
US11/691,063 US7824097B2 (en) | 2006-03-24 | 2007-03-26 | Micro-mechanical part made of insulating material and method of manufacturing the same |
HK08103103.0A HK1113948A1 (en) | 2006-03-24 | 2008-03-18 | Micro-mechanical part made of insulating material and method of manufacturing the same |
JP2013118770A JP5599917B2 (ja) | 2006-03-24 | 2013-06-05 | 時計仕掛けの機構に組み入れられる微小機械部品 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06111727A EP1837721A1 (fr) | 2006-03-24 | 2006-03-24 | Pièce de micro-mécanique en matériau isolant et son procédé de fabrication |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1837721A1 true EP1837721A1 (fr) | 2007-09-26 |
Family
ID=37625990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06111727A Withdrawn EP1837721A1 (fr) | 2006-03-24 | 2006-03-24 | Pièce de micro-mécanique en matériau isolant et son procédé de fabrication |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1837721A1 (zh) |
CN (1) | CN101042570B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2589568A1 (fr) * | 2011-11-03 | 2013-05-08 | Sigatec SA | Pièce de micromécanique permettant une décharge électrique |
WO2014023584A1 (fr) * | 2012-08-07 | 2014-02-13 | Eta Sa Manufacture Horlogere Suisse | Système oscillant pour mouvement d'horlogerie |
EP2804054A1 (fr) * | 2013-05-17 | 2014-11-19 | ETA SA Manufacture Horlogère Suisse | Dispositif anti-adhésion d'un spiral sur un pont |
US10274897B2 (en) | 2015-06-15 | 2019-04-30 | Citizen Watch Co., Ltd. | Speed governor for timepiece |
EP3667433A1 (fr) | 2018-12-12 | 2020-06-17 | Nivarox-FAR S.A. | Spiral et son procede de fabrication |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH699494B1 (fr) * | 2007-11-28 | 2010-09-30 | Manuf Et Fabrique De Montres E | Oscillateur mécanique présentant un coefficient thermoélastique optimisé et procédé de fabrication d'un tel oscillateur. |
EP2104008A1 (fr) * | 2008-03-20 | 2009-09-23 | Nivarox-FAR S.A. | Organe régulateur monobloc et son procédé de fabrication |
EP2264553B1 (fr) * | 2009-06-19 | 2016-10-26 | Nivarox-FAR S.A. | Ressort thermocompensé et son procédé de fabrication |
EP2706416B1 (fr) * | 2012-09-07 | 2015-11-18 | The Swatch Group Research and Development Ltd | Ancre flexible à force constante |
EP2781968A1 (fr) * | 2013-03-19 | 2014-09-24 | Nivarox-FAR S.A. | Résonateur moins sensible aux variations climatiques |
CH713151B1 (fr) * | 2016-11-23 | 2020-09-30 | Swatch Group Res & Dev Ltd | Lame flexible pour l'horlogerie, et procédé de fabrication. |
EP3502289B1 (fr) * | 2017-12-21 | 2022-11-09 | Nivarox-FAR S.A. | Procédé de fabrication d'un ressort spiral pour mouvement d'horlogerie |
EP3742237B1 (fr) | 2019-05-23 | 2024-10-16 | Nivarox-FAR S.A. | Composant notamment horloger avec une topologie de surface et son procede de fabrication |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0732635A1 (fr) * | 1995-03-17 | 1996-09-18 | C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa | Pièce de micro-mécanique et procédé de réalisation |
WO1999036941A2 (en) * | 1998-01-15 | 1999-07-22 | Cornell Research Foundation, Inc. | Trench isolation for micromechanical devices |
US20020171150A1 (en) * | 2000-11-09 | 2002-11-21 | Joachim Rudhard | Method for producing a micromechanical structure and a micromechanical structure |
WO2004020329A1 (en) * | 2002-08-30 | 2004-03-11 | Samsung Electronics Co., Ltd. | Microelectromechanical system comb actuator and manufacturing method thereof |
WO2004029733A2 (fr) * | 2002-09-25 | 2004-04-08 | Fore Eagle Co Ltd | Pieces mecaniques |
EP1422436A1 (fr) * | 2002-11-25 | 2004-05-26 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Ressort spiral de montre et son procédé de fabrication |
-
2006
- 2006-03-24 EP EP06111727A patent/EP1837721A1/fr not_active Withdrawn
-
2007
- 2007-03-23 CN CN2007100893622A patent/CN101042570B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0732635A1 (fr) * | 1995-03-17 | 1996-09-18 | C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa | Pièce de micro-mécanique et procédé de réalisation |
WO1999036941A2 (en) * | 1998-01-15 | 1999-07-22 | Cornell Research Foundation, Inc. | Trench isolation for micromechanical devices |
US20020171150A1 (en) * | 2000-11-09 | 2002-11-21 | Joachim Rudhard | Method for producing a micromechanical structure and a micromechanical structure |
WO2004020329A1 (en) * | 2002-08-30 | 2004-03-11 | Samsung Electronics Co., Ltd. | Microelectromechanical system comb actuator and manufacturing method thereof |
WO2004029733A2 (fr) * | 2002-09-25 | 2004-04-08 | Fore Eagle Co Ltd | Pieces mecaniques |
EP1422436A1 (fr) * | 2002-11-25 | 2004-05-26 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Ressort spiral de montre et son procédé de fabrication |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2589568A1 (fr) * | 2011-11-03 | 2013-05-08 | Sigatec SA | Pièce de micromécanique permettant une décharge électrique |
CH705724A1 (fr) * | 2011-11-03 | 2013-05-15 | Sigatec Sa | Pièce de micromécanique, notamment pour l'horlogerie. |
WO2014023584A1 (fr) * | 2012-08-07 | 2014-02-13 | Eta Sa Manufacture Horlogere Suisse | Système oscillant pour mouvement d'horlogerie |
EP2804054A1 (fr) * | 2013-05-17 | 2014-11-19 | ETA SA Manufacture Horlogère Suisse | Dispositif anti-adhésion d'un spiral sur un pont |
US9348313B2 (en) | 2013-05-17 | 2016-05-24 | ETA SA Manufacture Horlogére Suisse | Anti-adhesion device for a balance spring on a bar |
US10274897B2 (en) | 2015-06-15 | 2019-04-30 | Citizen Watch Co., Ltd. | Speed governor for timepiece |
EP3667433A1 (fr) | 2018-12-12 | 2020-06-17 | Nivarox-FAR S.A. | Spiral et son procede de fabrication |
Also Published As
Publication number | Publication date |
---|---|
CN101042570A (zh) | 2007-09-26 |
CN101042570B (zh) | 2011-09-14 |
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