EP1811544A4 - OPTICAL LIGHTING DEVICE, EXPOSURE SYSTEM, AND EXPOSURE METHOD - Google Patents

OPTICAL LIGHTING DEVICE, EXPOSURE SYSTEM, AND EXPOSURE METHOD

Info

Publication number
EP1811544A4
EP1811544A4 EP05793150A EP05793150A EP1811544A4 EP 1811544 A4 EP1811544 A4 EP 1811544A4 EP 05793150 A EP05793150 A EP 05793150A EP 05793150 A EP05793150 A EP 05793150A EP 1811544 A4 EP1811544 A4 EP 1811544A4
Authority
EP
European Patent Office
Prior art keywords
exposure
optical device
lighting optical
exposure method
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05793150A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1811544A1 (en
Inventor
Koji Shigematsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of EP1811544A1 publication Critical patent/EP1811544A1/en
Publication of EP1811544A4 publication Critical patent/EP1811544A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46—Systems using spatial filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/001—Axicons, waxicons, reflaxicons
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
EP05793150A 2004-10-19 2005-10-12 OPTICAL LIGHTING DEVICE, EXPOSURE SYSTEM, AND EXPOSURE METHOD Withdrawn EP1811544A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004303902A JP4535260B2 (ja) 2004-10-19 2004-10-19 照明光学装置、露光装置、および露光方法
PCT/JP2005/018809 WO2006043458A1 (ja) 2004-10-19 2005-10-12 照明光学装置、露光装置、および露光方法

Publications (2)

Publication Number Publication Date
EP1811544A1 EP1811544A1 (en) 2007-07-25
EP1811544A4 true EP1811544A4 (en) 2009-11-11

Family

ID=36202874

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05793150A Withdrawn EP1811544A4 (en) 2004-10-19 2005-10-12 OPTICAL LIGHTING DEVICE, EXPOSURE SYSTEM, AND EXPOSURE METHOD

Country Status (6)

Country Link
US (1) US8004658B2 (enrdf_load_stackoverflow)
EP (1) EP1811544A4 (enrdf_load_stackoverflow)
JP (1) JP4535260B2 (enrdf_load_stackoverflow)
KR (1) KR101391384B1 (enrdf_load_stackoverflow)
CN (1) CN100536071C (enrdf_load_stackoverflow)
WO (1) WO2006043458A1 (enrdf_load_stackoverflow)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101320216B (zh) * 2008-06-18 2010-06-09 上海微电子装备有限公司 一种微光刻照明光瞳的整形结构
JP2010109242A (ja) * 2008-10-31 2010-05-13 Canon Inc 照明光学系及び露光装置
CN102495536B (zh) * 2011-12-30 2015-08-05 上海集成电路研发中心有限公司 光刻机
CN103293863B (zh) * 2012-02-24 2015-11-18 上海微电子装备有限公司 一种光刻照明系统
CN102937778B (zh) * 2012-11-20 2015-04-22 北京理工大学 一种确定光刻照明系统中各元件之间匹配关系的方法
JP2014145982A (ja) * 2013-01-30 2014-08-14 Toshiba Corp 光学装置、固体撮像装置及び光学装置の製造方法
JP6168822B2 (ja) * 2013-04-04 2017-07-26 オリンパス株式会社 パターン照射装置
CN103399414B (zh) * 2013-07-22 2016-04-13 中国科学院上海光学精密机械研究所 消除衍射光学元件零级衍射光斑的方法
CN104154495B (zh) * 2014-05-20 2017-12-15 广州市浩洋电子股份有限公司 混合型光学积分器组件及其光学系统
JP6840540B2 (ja) * 2014-11-14 2021-03-10 株式会社ニコン 造形装置
CN111687416A (zh) 2014-11-14 2020-09-22 株式会社尼康 造型装置及造型方法
JP7393944B2 (ja) 2017-03-31 2023-12-07 株式会社ニコン 処理方法及び処理システム
CN110709195B (zh) 2017-03-31 2022-05-03 株式会社尼康 造型系统及造型方法
JP7538016B2 (ja) * 2020-11-30 2024-08-21 株式会社Ｓｃｒｅｅｎホールディングス 光学装置および３次元造形装置
US11300524B1 (en) * 2021-01-06 2022-04-12 Kla Corporation Pupil-plane beam scanning for metrology

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4301574A1 (de) * 1993-01-21 1994-07-28 Bernhard Prof Dr Lau Vorrichtung zur Beobachtung des Augenhintergrundes, insbesondere Ophthalmoskop
EP0967524A2 (en) * 1990-11-15 1999-12-29 Nikon Corporation Projection exposure method and apparatus
US20010043318A1 (en) * 2000-04-03 2001-11-22 Kenichiro Mori Illumination optical system for use in projection exposure apparatus
JP2002158157A (ja) * 2000-11-17 2002-05-31 Nikon Corp 照明光学装置および露光装置並びにマイクロデバイスの製造方法
US6741394B1 (en) * 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
EP1434092A1 (en) * 2002-12-23 2004-06-30 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
WO2006021540A2 (de) * 2004-08-20 2006-03-02 Carl Zeiss Ag Optisches system, nämlich objektiv oder beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3200894B2 (ja) * 1991-03-05 2001-08-20 株式会社日立製作所 露光方法及びその装置
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
JPH08203801A (ja) * 1995-01-23 1996-08-09 Nikon Corp 投影露光装置
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JP2001338861A (ja) * 2000-05-26 2001-12-07 Nikon Corp 照明光学装置並びに露光装置及び方法
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
JP2001176766A (ja) * 1998-10-29 2001-06-29 Nikon Corp 照明装置及び投影露光装置
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
DE10062579A1 (de) * 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung
WO2005071474A2 (en) * 2004-01-20 2005-08-04 Sharp Kabushiki Kaisha Directional backlight and multiple view display device
JP2005243904A (ja) * 2004-02-26 2005-09-08 Nikon Corp 照明光学装置、露光装置及び露光方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0967524A2 (en) * 1990-11-15 1999-12-29 Nikon Corporation Projection exposure method and apparatus
DE4301574A1 (de) * 1993-01-21 1994-07-28 Bernhard Prof Dr Lau Vorrichtung zur Beobachtung des Augenhintergrundes, insbesondere Ophthalmoskop
US6741394B1 (en) * 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
US20010043318A1 (en) * 2000-04-03 2001-11-22 Kenichiro Mori Illumination optical system for use in projection exposure apparatus
JP2002158157A (ja) * 2000-11-17 2002-05-31 Nikon Corp 照明光学装置および露光装置並びにマイクロデバイスの製造方法
EP1434092A1 (en) * 2002-12-23 2004-06-30 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
WO2006021540A2 (de) * 2004-08-20 2006-03-02 Carl Zeiss Ag Optisches system, nämlich objektiv oder beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2006043458A1 *

Also Published As

Publication number Publication date
KR20070057141A (ko) 2007-06-04
EP1811544A1 (en) 2007-07-25
CN100536071C (zh) 2009-09-02
KR101391384B1 (ko) 2014-05-07
HK1101221A1 (zh) 2007-10-12
US20080030852A1 (en) 2008-02-07
WO2006043458A1 (ja) 2006-04-27
US8004658B2 (en) 2011-08-23
JP4535260B2 (ja) 2010-09-01
CN101006556A (zh) 2007-07-25
JP2006120675A (ja) 2006-05-11

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