EP1806773A4 - Belichtungseinrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren - Google Patents

Belichtungseinrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren

Info

Publication number
EP1806773A4
EP1806773A4 EP05793182A EP05793182A EP1806773A4 EP 1806773 A4 EP1806773 A4 EP 1806773A4 EP 05793182 A EP05793182 A EP 05793182A EP 05793182 A EP05793182 A EP 05793182A EP 1806773 A4 EP1806773 A4 EP 1806773A4
Authority
EP
European Patent Office
Prior art keywords
exposure
liquid
optical system
device manufacturing
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05793182A
Other languages
English (en)
French (fr)
Japanese (ja)
Other versions
EP1806773A1 (de
Inventor
Hiroyuki Nagasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of EP1806773A1 publication Critical patent/EP1806773A1/de
Publication of EP1806773A4 publication Critical patent/EP1806773A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
EP05793182A 2004-10-13 2005-10-12 Belichtungseinrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren Withdrawn EP1806773A4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004298972 2004-10-13
JP2004358606 2004-12-10
PCT/JP2005/018783 WO2006041086A1 (ja) 2004-10-13 2005-10-12 露光装置、露光方法及びデバイス製造方法

Publications (2)

Publication Number Publication Date
EP1806773A1 EP1806773A1 (de) 2007-07-11
EP1806773A4 true EP1806773A4 (de) 2008-12-31

Family

ID=36148374

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05793182A Withdrawn EP1806773A4 (de) 2004-10-13 2005-10-12 Belichtungseinrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren

Country Status (5)

Country Link
US (1) US20090021709A1 (de)
EP (1) EP1806773A4 (de)
KR (1) KR20070068340A (de)
TW (1) TW200628995A (de)
WO (1) WO2006041086A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2261741A3 (de) 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7385670B2 (en) 2004-10-05 2008-06-10 Asml Netherlands B.V. Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4596191B2 (ja) 2005-05-24 2010-12-08 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
FR2890742B1 (fr) * 2005-09-12 2007-11-30 Production Et De Rech S Appliq Equipement et procede de surveillance d'un dispositif lithographique a immersion.
WO2007034838A1 (ja) * 2005-09-21 2007-03-29 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8125610B2 (en) 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US8045135B2 (en) * 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
KR100830586B1 (ko) 2006-12-12 2008-05-21 삼성전자주식회사 기판을 노광하는 장치 및 방법
JP4366407B2 (ja) * 2007-02-16 2009-11-18 キヤノン株式会社 露光装置及びデバイス製造方法
US20080198347A1 (en) * 2007-02-16 2008-08-21 Canon Kabushiki Kaisha Immersion exposure apparatus and method of manufacturing device
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7900641B2 (en) 2007-05-04 2011-03-08 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US7916269B2 (en) 2007-07-24 2011-03-29 Asml Netherlands B.V. Lithographic apparatus and contamination removal or prevention method
US20090025753A1 (en) 2007-07-24 2009-01-29 Asml Netherlands B.V. Lithographic Apparatus And Contamination Removal Or Prevention Method
NL1035942A1 (nl) 2007-09-27 2009-03-30 Asml Netherlands Bv Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
SG151198A1 (en) 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
NL1036273A1 (nl) 2007-12-18 2009-06-19 Asml Netherlands Bv Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus.
NL1036306A1 (nl) 2007-12-20 2009-06-23 Asml Netherlands Bv Lithographic apparatus and in-line cleaning apparatus.
US8339572B2 (en) 2008-01-25 2012-12-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL2005009A (en) * 2009-07-27 2011-01-31 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (ja) * 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JPH10340846A (ja) * 1997-06-10 1998-12-22 Nikon Corp 露光装置及びその製造方法並びに露光方法及びデバイス製造方法
JP2002341249A (ja) * 2001-05-11 2002-11-27 Nikon Corp 液浸系顕微鏡対物レンズ

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US4346164A (en) * 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
US4666273A (en) * 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JP3555230B2 (ja) * 1994-05-18 2004-08-18 株式会社ニコン 投影露光装置
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JPH08316124A (ja) * 1995-05-19 1996-11-29 Hitachi Ltd 投影露光方法及び露光装置
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
AU5067898A (en) * 1996-11-28 1998-06-22 Nikon Corporation Aligner and method for exposure
EP0890136B9 (de) * 1996-12-24 2003-12-10 ASML Netherlands B.V. In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
US6235438B1 (en) * 1997-10-07 2001-05-22 Nikon Corporation Projection exposure method and apparatus
US6208407B1 (en) * 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
CN101382738B (zh) * 2002-11-12 2011-01-12 Asml荷兰有限公司 光刻投射装置
AU2003289272A1 (en) * 2002-12-10 2004-06-30 Nikon Corporation Surface position detection apparatus, exposure method, and device porducing method
US7242455B2 (en) * 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
US7006209B2 (en) * 2003-07-25 2006-02-28 Advanced Micro Devices, Inc. Method and apparatus for monitoring and controlling imaging in immersion lithography systems
US6844206B1 (en) * 2003-08-21 2005-01-18 Advanced Micro Devices, Llp Refractive index system monitor and control for immersion lithography
US7214476B2 (en) * 2003-09-29 2007-05-08 Fujifilm Corporation Image forming method using photothermographic material
JP2005136374A (ja) * 2003-10-06 2005-05-26 Matsushita Electric Ind Co Ltd 半導体製造装置及びそれを用いたパターン形成方法
EP1524558A1 (de) * 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
JP2005236047A (ja) * 2004-02-19 2005-09-02 Canon Inc 露光装置及び方法
CN103605262B (zh) * 2004-06-09 2016-06-29 株式会社尼康 曝光装置及其维护方法、以及元件制造方法
US7324185B2 (en) * 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006319064A (ja) * 2005-05-11 2006-11-24 Canon Inc 測定装置、露光方法及び装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (ja) * 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JPH10340846A (ja) * 1997-06-10 1998-12-22 Nikon Corp 露光装置及びその製造方法並びに露光方法及びデバイス製造方法
JP2002341249A (ja) * 2001-05-11 2002-11-27 Nikon Corp 液浸系顕微鏡対物レンズ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2006041086A1 *

Also Published As

Publication number Publication date
WO2006041086A1 (ja) 2006-04-20
EP1806773A1 (de) 2007-07-11
US20090021709A1 (en) 2009-01-22
TW200628995A (en) 2006-08-16
KR20070068340A (ko) 2007-06-29

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