EP1797579A4 - Mikroentladegeräte mit eingeschlossenen elektroden und herstellungsverfahren dafür - Google Patents
Mikroentladegeräte mit eingeschlossenen elektroden und herstellungsverfahren dafürInfo
- Publication number
- EP1797579A4 EP1797579A4 EP05858440A EP05858440A EP1797579A4 EP 1797579 A4 EP1797579 A4 EP 1797579A4 EP 05858440 A EP05858440 A EP 05858440A EP 05858440 A EP05858440 A EP 05858440A EP 1797579 A4 EP1797579 A4 EP 1797579A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- making
- microdischarge devices
- encapsulated electrodes
- encapsulated
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/02—Details
- H01J17/04—Electrodes; Screens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Micromachines (AREA)
- Manufacturing Of Electric Cables (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/958,175 US7573202B2 (en) | 2004-10-04 | 2004-10-04 | Metal/dielectric multilayer microdischarge devices and arrays |
US10/958,174 US7297041B2 (en) | 2004-10-04 | 2004-10-04 | Method of manufacturing microdischarge devices with encapsulated electrodes |
PCT/US2005/035782 WO2007011388A2 (en) | 2004-10-04 | 2005-10-04 | Microdischarge devices with encapsulated electrodes and method of making |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1797579A2 EP1797579A2 (de) | 2007-06-20 |
EP1797579A4 true EP1797579A4 (de) | 2009-04-15 |
EP1797579B1 EP1797579B1 (de) | 2015-09-02 |
Family
ID=37669273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP05858440.0A Not-in-force EP1797579B1 (de) | 2004-10-04 | 2005-10-04 | Mikroentladegeräte mit eingeschlossenen elektroden und herstellungsverfahren dafür |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1797579B1 (de) |
JP (1) | JP5435868B2 (de) |
KR (1) | KR20070060151A (de) |
WO (1) | WO2007011388A2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1905057B1 (de) * | 2005-07-15 | 2016-03-09 | The Board Of Trustees Of The University Of Illinois | Arrays von mikrokavitäts-plasmageräten mit gekapselten dielektrischen elektroden |
JP2007250284A (ja) * | 2006-03-14 | 2007-09-27 | National Univ Corp Shizuoka Univ | プラズマ電極 |
US8456086B2 (en) * | 2007-10-25 | 2013-06-04 | The Board Of Trustees Of The University Of Illinois | Microcavity plasma devices with non-uniform cross-section microcavities |
US8689537B1 (en) * | 2008-10-20 | 2014-04-08 | Cu Aerospace, Llc | Micro-cavity discharge thruster (MCDT) |
DE102009035411B3 (de) * | 2009-07-31 | 2010-10-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Plasmastempel und Verfahren zur Plasmabehandlung einer Oberfläche |
JP6026079B2 (ja) * | 2011-03-01 | 2016-11-16 | マイクロプラズマ株式会社 | プラズマ電極 |
WO2012177762A2 (en) | 2011-06-24 | 2012-12-27 | The Board Of Trustees Of The University Of Illinois | Arrays of metal and metal oxide microplasma devices with defect free oxide |
KR101355187B1 (ko) * | 2012-03-22 | 2014-01-27 | (주)지니아텍 | 공기 청정기용 플라즈마 발생모듈 및 플라즈마 발생모듈 제조방법 |
JP6542053B2 (ja) * | 2015-07-15 | 2019-07-10 | 株式会社東芝 | プラズマ電極構造、およびプラズマ誘起流発生装置 |
CN109196741B (zh) * | 2016-06-03 | 2020-10-16 | 日本碍子株式会社 | 电荷产生元件以及微粒数检测器 |
WO2019068070A1 (en) * | 2017-10-01 | 2019-04-04 | Space Foundry Inc. | MODULAR PRINT HEAD ASSEMBLY FOR PLASMA JET PRINTING |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0931859A1 (de) * | 1996-08-26 | 1999-07-28 | Nippon Telegraph And Telephone Corporation | Verfahren zur herstellung poröser, anodisierter aluminiumfilme |
US20020153828A1 (en) * | 1997-11-14 | 2002-10-24 | Masato Yamanobe | Electron-emitting device and production method thereof |
US20030080688A1 (en) * | 2001-10-26 | 2003-05-01 | Eden J. Gary | Microdischarge devices and arrays |
US20030122466A1 (en) * | 2001-12-28 | 2003-07-03 | Ahn Seong Deok | Field emission device and method of fabricating the same |
JP2004178863A (ja) * | 2002-11-25 | 2004-06-24 | Toshiba Corp | 電子源装置および表示装置 |
WO2004079056A2 (en) * | 2003-03-06 | 2004-09-16 | C.R.F. Società Consortile Per Azioni | Process to make nano-structurated components |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5686789A (en) * | 1995-03-14 | 1997-11-11 | Osram Sylvania Inc. | Discharge device having cathode with micro hollow array |
JP3765901B2 (ja) * | 1996-02-26 | 2006-04-12 | 株式会社東芝 | プラズマディスプレイ及びプラズマ液晶ディスプレイ |
JP3714507B2 (ja) * | 1996-08-26 | 2005-11-09 | 日本電信電話株式会社 | 多孔性陽極酸化アルミナ膜の作製方法 |
US6016027A (en) * | 1997-05-19 | 2000-01-18 | The Board Of Trustees Of The University Of Illinois | Microdischarge lamp |
JP3754876B2 (ja) * | 2000-07-03 | 2006-03-15 | キヤノン株式会社 | 細孔を有する構造体の製造方法及び細孔を有する構造体 |
US20020030437A1 (en) * | 2000-09-13 | 2002-03-14 | Nobuhiro Shimizu | Light-emitting device and backlight for flat display |
JP2003100498A (ja) * | 2001-09-20 | 2003-04-04 | Japan Vilene Co Ltd | 放電用電極 |
JP2004227990A (ja) * | 2003-01-24 | 2004-08-12 | Kunihide Tachibana | プラズマ処理方法およびプラズマ処理装置 |
JP2004273315A (ja) * | 2003-03-10 | 2004-09-30 | Sharp Corp | イオン発生装置、空気調節装置および荷電装置 |
-
2005
- 2005-10-04 WO PCT/US2005/035782 patent/WO2007011388A2/en active Application Filing
- 2005-10-04 EP EP05858440.0A patent/EP1797579B1/de not_active Not-in-force
- 2005-10-04 JP JP2007534902A patent/JP5435868B2/ja not_active Expired - Fee Related
- 2005-10-04 KR KR1020077010176A patent/KR20070060151A/ko not_active Application Discontinuation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0931859A1 (de) * | 1996-08-26 | 1999-07-28 | Nippon Telegraph And Telephone Corporation | Verfahren zur herstellung poröser, anodisierter aluminiumfilme |
US20020153828A1 (en) * | 1997-11-14 | 2002-10-24 | Masato Yamanobe | Electron-emitting device and production method thereof |
US20030080688A1 (en) * | 2001-10-26 | 2003-05-01 | Eden J. Gary | Microdischarge devices and arrays |
US20030122466A1 (en) * | 2001-12-28 | 2003-07-03 | Ahn Seong Deok | Field emission device and method of fabricating the same |
JP2004178863A (ja) * | 2002-11-25 | 2004-06-24 | Toshiba Corp | 電子源装置および表示装置 |
WO2004079056A2 (en) * | 2003-03-06 | 2004-09-16 | C.R.F. Società Consortile Per Azioni | Process to make nano-structurated components |
Non-Patent Citations (1)
Title |
---|
See also references of WO2007011388A2 * |
Also Published As
Publication number | Publication date |
---|---|
JP2008516380A (ja) | 2008-05-15 |
EP1797579A2 (de) | 2007-06-20 |
JP5435868B2 (ja) | 2014-03-05 |
EP1797579B1 (de) | 2015-09-02 |
WO2007011388A3 (en) | 2007-06-14 |
WO2007011388A2 (en) | 2007-01-25 |
KR20070060151A (ko) | 2007-06-12 |
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