EP1794523A1 - Uv irradiation unit - Google Patents

Uv irradiation unit

Info

Publication number
EP1794523A1
EP1794523A1 EP05797763A EP05797763A EP1794523A1 EP 1794523 A1 EP1794523 A1 EP 1794523A1 EP 05797763 A EP05797763 A EP 05797763A EP 05797763 A EP05797763 A EP 05797763A EP 1794523 A1 EP1794523 A1 EP 1794523A1
Authority
EP
European Patent Office
Prior art keywords
lamp
irradiation unit
unit according
reflector
channel system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP05797763A
Other languages
German (de)
French (fr)
Other versions
EP1794523B1 (en
Inventor
Joachim Jung
Klaus Ebinger
Oliver Treichel
Günter Fuchs
Urs GÜMBEL
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IST Metz GmbH
Original Assignee
IST Metz GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IST Metz GmbH filed Critical IST Metz GmbH
Publication of EP1794523A1 publication Critical patent/EP1794523A1/en
Application granted granted Critical
Publication of EP1794523B1 publication Critical patent/EP1794523B1/en
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/60—Cooling arrangements characterised by the use of a forced flow of gas, e.g. air
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V15/00—Protecting lighting devices from damage
    • F21V15/01—Housings, e.g. material or assembling of housing parts
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/502—Cooling arrangements characterised by the adaptation for cooling of specific components
    • F21V29/505—Cooling arrangements characterised by the adaptation for cooling of specific components of reflectors
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V29/00—Protecting lighting devices from thermal damage; Cooling or heating arrangements specially adapted for lighting devices or systems
    • F21V29/50—Cooling arrangements
    • F21V29/70—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks
    • F21V29/83—Cooling arrangements characterised by passive heat-dissipating elements, e.g. heat-sinks the elements having apertures, ducts or channels, e.g. heat radiation holes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun

Definitions

  • the invention relates to an irradiation unit for UV irradiation of particular sheet-like substrates, comprising a housing, a rod-shaped UV lamp arranged therein, a reflector extending along the UV lamp, which has a lamp space surrounding the UV lamp limited to a housing interior, and a channel system for passage of the reflector cooling, preferably gaseous coolant.
  • the present invention seeks to avoid the disadvantages encountered in the prior art and an aggregate of Initially specified type to improve that with simple means an irradiation optimization is achieved.
  • the invention proposes that the channel, system is arranged for the coolant supply outside the lamp chamber, so that the lamp chamber remains free of the cooling gas flow, wherein the reflector is formed by the inside acted upon with cooling gas hollow sections as part of the channel system.
  • the lamp space enclosed by the reflector and the object is not continuously exposed to oxygen, a continuous optical absorption process by ozone formation to the outside can be prevented.
  • the production power can be considerably increased, or else the same drying results are obtained with lower specific power as with units with lamp space cooling.
  • a clean separation of the device functionalities is possible, wherein it is possible to dispense with a regulation of the air cooling in the case of different power states of the lamp.
  • the preferably extruded hollow profiles a particularly simple structure with low space requirements and effective cooling is possible.
  • the reflector is preferably permeable over its entire length transversely to the longitudinal direction of the UV lamp, so that Tempe ⁇ raturgradienten in the lamp longitudinal direction are largely avoided.
  • a further advantageous embodiment provides that the channel system has a limited by a double-walled housing shell inflow chamber.
  • the channel system is connected in parallel with the UV lamp.
  • Lamp has extending, preferably an absorber downstream Ab ⁇ air chamber, and when the flow cross-section of the exhaust chamber is preferably greater by a multiple than the largest Strömungsquer ⁇ cut the inflow-side channel system.
  • a housing insert is arranged as part of the channel system in the housing.
  • the channel system is designed exclusively for the passage of a gaseous coolant.
  • a further improvement is achieved by arranging an absorber acted upon by the lamp, at least in standby mode, with radiation in the housing interior, and that the absorber can be cooled by the cooling gas flow.
  • the absorber delimits a region of the channel system, preferably in the form of a labyrinth which deflects the flow of cooling gas.
  • the reflector has two reflector halves pivotable relative to one another between an operating position aligned with the substrate and a standby position directed towards an absorber in the housing interior, the reflector halves being in the standby position with the absorber keeping the lamp space free be engaged by the cooling gas flow.
  • the ratio of continuous operation power to length of the UV lamp is greater than 20W / cm, preferably greater than 100W / cm.
  • the cooling gas flow it is possible for the cooling gas flow to be predetermined irrespective of the lamp power during the irradiation operation.
  • a further improvement provides that the lamp space is separated from the substrate by a radiation-permeable separating disk, in particular a quartz disk. To keep deposits free, it is possible to heat the cutting disk in the irradiation operation by the UV lamp to a temperature of more than 300 0 C.
  • the reflector can be acted upon with cooling gas via longitudinal openings at a longitudinal side extending in the lamp longitudinal direction.
  • a flow line and possibly a valve function in the case of a hinged reflector can advantageously be achieved in that the reflector for passing the cooling gas through can be brought into engagement with housing seals on a longitudinal side running in the longitudinal direction of the lamp.
  • FIG. 2 the irradiation unit of FIG. 1 in the standby state.
  • the irradiation unit shown in the drawing is used for UV drying and crosslinking of paints, inks, adhesives and similar coatings on, in particular, web-like substrates or products. It consists essentially of a box-shaped housing 10, a rod-shaped UV lamp 12 arranged in the housing, a reflector 14 for reflecting the emitted UV light onto a bottom-side irradiation opening 16, a housing-internal radiation absorber 18 for standby operation and a duct system 20 for passing cooling air.
  • the UV lamp 12 is arranged as a double-ended medium-pressure gas discharge lamp in the central longitudinal plane of the housing 10 and emits its radiation via the housing opening 16 to the substrate web guided underneath or to the object to be irradiated.
  • the duct system 20 of the cooling system is arranged completely outside the lamp chamber 22 surrounding the lamp 12 so that it remains free of the cooling air flow (arrows 24).
  • the UV lamp 12 in the operating state is surrounded by the reflector 14 over its sector facing away from the housing opening 16, so that the reflected light is radiated through the housing opening 16 and the adjacent housing interior 26 with respect to the lamp chamber 22 is shielded.
  • the resulting heat loss can be absorbed via the cooling air flow 24 guided past the reflector surface 28 at the rear and removed from the housing 10.
  • the channel system 20 which is symmetrical with respect to the longitudinal center plane of the housing 10, comprises an inflow channel 30, a reflector channel 32, an absorber channel 34 and an exhaust air chamber 36.
  • the air flow in the channels 30, 32, 34 takes place over the length of the housing 10 transversely to the longitudinal axis, while the exhaust air flow in the exhaust air chamber 36 takes place mainly in the longitudinal direction to a suction opening, not shown.
  • a housing insert 38 is arranged in the housing 10, which extends longitudinally between the Gesimousestirn ⁇ pages.
  • the adjoining reflector channel 32 consists of profile cavities which are formed in the reflector 14 composed of extruded profile pieces 42.
  • the profile pieces 42 have a double wall with intermediate webs 44 which are pierced through to form longitudinal passages and are pivotable relative to each other about an axis of rotation 46. The turning function for the stand-by mode will be explained in greater detail below.
  • the cooling gas emerging from the reflector 14 is deflected by the absorber 18, which is likewise designed as a profile section, wherein guide vanes 48 projecting inwardly on the housing 38 form a flow labyrinth 50. Due to the much larger volume or flow cross-section of the exhaust air chamber 36, it is ensured that uniform air velocities and thus cooling conditions exist over the entire length of the housing.
  • the reflector 14 In the operating position according to FIG. 1, the reflector 14 is aligned with the object to be irradiated, while heat-resistant housing seals 52 ensure a direct introduction of cooling air.
  • the reflector halves 42 are pivoted about the axes of rotation 46 until the lower reflector edges close to one another and the upper reflector edges engage the absorber 18.
  • the lamp space 22 remains free of the cooling air flow 24, while the reflector 14 and absorber 18 continue to be cooled while the flow is deflected. In this way, it is possible to keep the lamp 12 burning even in standby mode, with the absorber 18 holding the (reducing te) absorbs radiation. From this operating state, it is possible to travel without loss of time by opening the reflector 14 in the production mode corresponding to the respective presetting.
  • the short-wave UV-C radiation in the range of 200 to 240 nm wavelength in the lamp space generates ozone in the presence of atmospheric oxygen. Due to the separated cooling air flow, however, it is possible to work in ozone saturation without continuous ozone formation, so that the short-wave radiation yield for the polymerization process at the substrate surface is considerably improved.
  • the faster curing of a thin surface layer can also reduce the oxygen influencing (inhibition) of the polymerization in the depth of the coating.
  • UV lamps with a specific power of 200 W / cm up to a Lam ⁇ penil of about 50 cm without air flow in the lamp compartment can be operated up to several 1000 hours.
  • the cooling can be realized by a pure air cooling. If such aggregates are used, the same drying results are obtained with lower specific lamp power as with devices having lamp space cooling, or the production output can be drastically increased.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Coating Apparatus (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)

Abstract

The invention relates to a UV irradiation unit comprising a housing (10), a rod-shaped lamp (12) which is arranged therein, a reflector (14) which extends along the UV-lamp (12) and which defines a lamp chamber (22) which surrounds the UV-lamp (12), in addition to a channel system (20) for guiding a cooling coolant through the reflector (14). According to the invention, the channel system (20) is arranged on the outside of the lamp chamber (22) such that it remains void of the coolant flow (24) for operating the lamp in an optimum manner.

Description

UV-BestrahlungsaggregatUV irradiation unit
Beschreibungdescription
Die Erfindung betrifft ein Bestrahlungsaggregat zur UV-Bestrahlung von ins¬ besondere bahnförmigen Substraten, mit einem Gehäuse, einer darin ange¬ ordneten stabförmigen UV-Lampe, einem längs der UV-Lampe sich erstre¬ ckenden Reflektor, welcher einen die UV-Lampe umgebenden Lampenraum gegenüber einem Gehäuseinnenraum begrenzt, und einem Kanalsystem zur Durchleitung eines den Reflektor kühlenden, vorzugsweise gasförmigen Kühlmittels.The invention relates to an irradiation unit for UV irradiation of particular sheet-like substrates, comprising a housing, a rod-shaped UV lamp arranged therein, a reflector extending along the UV lamp, which has a lamp space surrounding the UV lamp limited to a housing interior, and a channel system for passage of the reflector cooling, preferably gaseous coolant.
Bei Aggregaten dieser Art, wie sie zur Polymerisation von Oberflächenbe- schichtungen mit hoher Lampenleistung betrieben werden, sind Lampe und Reflektor durch einen Gasstrom aus dem Bereich des Bestrahlungsobjekts hin zu einem Abluftgehäuse gekühlt. Die zur Kühlung erforderliche Gasmen¬ ge wird durch die Strom/Spannungscharakteristik der UV-Lampe und die noch zulässigen Temperaturen des Reflektors bestimmt. Durch aufwändige Abluftregelungen ist zu vermeiden, dass bei reduzierter Lampenleistung oder im Stand by-Betrieb die Lampe zu stark gekühlt wird und dabei die Gasentla¬ dung abbricht, weil sonst die Lampe zum Wiederzünden zeitraubend abge¬ kühlt werden muss. Im Betrieb wird vor allem durch das kurzwellige UV-Licht im Lampenraum Ozon erzeugt. Dieser Prozess erfolgt kontinuierlich, da zur Aggregatkühlung laufend ozonhaltige Kühlluft abgesaugt wird. Dadurch steht aber ein Teil des energiereichen UV-Lichts für den Polymerisationsprozess an der Objektoberfläche nicht mehr zur Verfügung. Zudem können sich durch den Kühlgasstrom Spaltprodukte aus dem Objektbereich auf dem Re¬ flektor niederschlagen, und die Abluft wird mit Spaltprodukten und Ozon ver¬ unreinigt.In units of this type, as they are operated for the polymerization of surface coatings with high lamp power, lamp and reflector are cooled by a gas flow from the area of the object to be irradiated towards an exhaust air housing. The gas quantity required for cooling is determined by the current / voltage characteristic of the UV lamp and the still permissible temperatures of the reflector. By consuming exhaust air controls is to avoid that with reduced lamp power or in stand-by mode, the lamp is cooled too strong and thereby stops the Gasentla¬ tion, because otherwise the lamp has to be abge¬ time-consuming abge¬ cooled. In operation, ozone is generated mainly by the short-wave UV light in the lamp chamber. This process takes place continuously, because cooling of the cooling of the unit is continuously sucked off with ozone-containing cooling air. As a result, however, part of the high-energy UV light is no longer available for the polymerization process on the object surface. In addition, by the cooling gas flow fission products from the object area can precipitate on the reflector, and the exhaust air is contaminated with fission products and ozone.
Ausgehend hiervon liegt der Erfindung die Aufgabe zugrunde, die im Stand der Technik aufgetretenen Nachteile zu vermeiden und ein Aggregat der eingangs angegebenen Art dahingehend zu verbessern, dass mit einfachen Mitteln eine Bestrahlungsoptimierung erreicht wird.Based on this, the present invention seeks to avoid the disadvantages encountered in the prior art and an aggregate of Initially specified type to improve that with simple means an irradiation optimization is achieved.
Zur Lösung dieser Aufgabe wird die im Patentanspruch 1 angegebene Merkmalskombination vorgeschlagen. Vorteilhafte Ausgestaltungen und Weiterbildungen der Erfindung ergeben sich aus den abhängigen Ansprü¬ chen.To solve this problem, the feature combination specified in claim 1 is proposed. Advantageous embodiments and developments of the invention will become apparent from the dependent Ansprü¬ surfaces.
Dementsprechend wird erfindungsgemäß vorgeschlagen, dass das Kanal- , System für die Kühlmittelführung außerhalb des Lampenraums angeordnet ist, so dass der Lampenraum frei von der Kühlgasströmung bleibt, wobei der Reflektor durch innenseitig mit Kühlgas beaufschlagbare Hohlprofile als Teil des Kanalsystems gebildet ist. Da somit der vom Reflektor und Objekt um¬ schlossene Lampenraum nicht kontinuierlich mit Sauerstoff beaufschlagt wird, kann ein andauernder optischer Absorptionsprozess durch Ozonbil¬ dung nach außen verhindert werden. Dadurch kann entweder die Produkti¬ onsleistung erheblich erhöht werden, oder aber man erhält mit niedrigerer spezifischer Leistung die gleichen Trocknungsergebnisse wie bei Aggregaten mit Lampenraumkühlung. Weiterhin ist eine saubere Trennung der Geräte- funktionalitäten möglich, wobei auf eine Regelung der Luftkühlung bei ver¬ schiedenen Leistungszuständen der Lampe verzichtet werden kann. Durch die vorzugsweise extrudierten Hohlprofile ist ein besonders einfacher Aufbau mit geringem Raumbedarf und effektiver Kühlung möglich.Accordingly, the invention proposes that the channel, system is arranged for the coolant supply outside the lamp chamber, so that the lamp chamber remains free of the cooling gas flow, wherein the reflector is formed by the inside acted upon with cooling gas hollow sections as part of the channel system. Thus, since the lamp space enclosed by the reflector and the object is not continuously exposed to oxygen, a continuous optical absorption process by ozone formation to the outside can be prevented. As a result, either the production power can be considerably increased, or else the same drying results are obtained with lower specific power as with units with lamp space cooling. Furthermore, a clean separation of the device functionalities is possible, wherein it is possible to dispense with a regulation of the air cooling in the case of different power states of the lamp. The preferably extruded hollow profiles a particularly simple structure with low space requirements and effective cooling is possible.
Vorteilhafterweise ist der Reflektor vorzugsweise über seine gesamte Länge quer zur Längsrichtung der UV-Lampe durchströmbar, so dass auch Tempe¬ raturgradienten in Lampenlängsrichtung weitgehend vermieden werden.Advantageously, the reflector is preferably permeable over its entire length transversely to the longitudinal direction of the UV lamp, so that Tempe¬ raturgradienten in the lamp longitudinal direction are largely avoided.
Eine weitere vorteilhafte Ausführung sieht vor, dass das Kanalsystem eine durch einen doppelwandigen Gehäusemantel begrenzte Einströmkammer aufweist. Zur Schaffung gleichmäßiger Kühlbedingungen über die Lampen¬ länge ist es auch von Vorteil, wenn das Kanalsystem eine parallel zu der UV- Lampe sich erstreckende, vorzugsweise einem Absorber nachgeordnete Ab¬ luftkammer aufweist, und wenn der Strömungsquerschnitt der Abluftkammer vorzugsweise um ein Mehrfaches größer als der größte Strömungsquer¬ schnitt des einströmseitigen Kanalsystems ist.A further advantageous embodiment provides that the channel system has a limited by a double-walled housing shell inflow chamber. In order to provide uniform cooling conditions over the lamp length, it is also advantageous if the channel system is connected in parallel with the UV lamp. Lamp has extending, preferably an absorber downstream Ab¬ air chamber, and when the flow cross-section of the exhaust chamber is preferably greater by a multiple than the largest Strömungsquer¬ cut the inflow-side channel system.
In baulich vorteilhafter Ausgestaltung ist in dem Gehäuse ein Gehäuseein¬ satz als Teil des Kanalsystems angeordnet.In structurally advantageous embodiment, a housing insert is arranged as part of the channel system in the housing.
Zur Minimierung des Herstellungs- und Betriebsaufwands ist das Kanalsys- tem ausschließlich zur Durchleitung eines gasförmigen Kühlmittels ausgebil¬ det.To minimize the production and operating costs, the channel system is designed exclusively for the passage of a gaseous coolant.
Eine weitere Verbesserung wird dadurch erreicht, dass in dem Gehäusein¬ nenraum ein von der Lampe zumindest im Standby-Betrieb mit Strahlung beaufschlagter Absorber angeordnet ist, und dass der Absorber durch die Kühlgasströmung kühlbar ist. Hierbei ist es vorteilhaft, wenn der Absorber einen Bereich des Kanalsystems vorzugsweise in Form eines die Kühlgas¬ strömung umlenkenden Labyrinths begrenzt.A further improvement is achieved by arranging an absorber acted upon by the lamp, at least in standby mode, with radiation in the housing interior, and that the absorber can be cooled by the cooling gas flow. In this case, it is advantageous if the absorber delimits a region of the channel system, preferably in the form of a labyrinth which deflects the flow of cooling gas.
Gemäß einer weiteren bevorzugten Ausgestaltung der Erfindung besitzt der Reflektor zwei zwischen einer auf das Substrat ausgerichteten Betriebsstel¬ lung und einer auf einen Absorber im Gehäuseinnenraum gerichteten Standby-Stellung gegeneinander schwenkbare Reflektorhälften, wobei die Reflektorhälften in der Standby-Stellung mit dem Absorber unter Freihaltung des Lampenraums von der Kühlgasströmung in Eingriff stehen.In accordance with a further preferred embodiment of the invention, the reflector has two reflector halves pivotable relative to one another between an operating position aligned with the substrate and a standby position directed towards an absorber in the housing interior, the reflector halves being in the standby position with the absorber keeping the lamp space free be engaged by the cooling gas flow.
Vorteilhafterweise ist das Verhältnis von Dauerbetriebsleistung zu Länge der UV-Lampe größer als 20W/cm, vorzugsweise größer als 100W/cm. Auch dabei ist es möglich, dass die Kühlgasströmung unabhängig von der Lam- penleistung im Bestrahlungsbetrieb vorgegeben ist. Durch Abschirmung des Lampenraums gegen Ozonausleitung (wobei der Reflektor und ggf. das Substrat Barrieren bilden) ist es möglich, den Lam¬ penraum im Bestrahlungsbetrieb unter Ozonsättigung zu halten, so dass nur wenig UV-Strahlung für die Ozonbildung verloren geht.Advantageously, the ratio of continuous operation power to length of the UV lamp is greater than 20W / cm, preferably greater than 100W / cm. Here, too, it is possible for the cooling gas flow to be predetermined irrespective of the lamp power during the irradiation operation. By shielding the lamp chamber against ozone leakage (wherein the reflector and possibly the substrate form barriers), it is possible to keep the lamp space in the irradiation mode under ozone saturation, so that only a small amount of UV radiation is lost for ozone formation.
Eine weitere Verbesserung sieht vor, dass der Lampenraum durch eine strahlungsdurchlässige Trennscheibe, insbesondere eine Quarzscheibe von dem Substrat getrennt ist. Zur Freihaltung von Ablagerungen ist es möglich, die Trennscheibe im Bestrahlungsbetrieb durch die UV-Lampe auf eine Temperatur von mehr als 3000C aufzuheizen.A further improvement provides that the lamp space is separated from the substrate by a radiation-permeable separating disk, in particular a quartz disk. To keep deposits free, it is possible to heat the cutting disk in the irradiation operation by the UV lamp to a temperature of more than 300 0 C.
Um einen möglichst homogenen Gasstrom zu ermöglichen, ist es vorteilhaft, wenn der Reflektor über längsseitige Öffnungen an einer in Lampenlängs¬ richtung verlaufenden Längsseite mit Kühlgas beaufschlagbar ist.In order to allow the most homogeneous possible gas flow, it is advantageous if the reflector can be acted upon with cooling gas via longitudinal openings at a longitudinal side extending in the lamp longitudinal direction.
Eine Strömungsleitung und ggf. eine Ventilfunktion bei einem Klappreflektor lässt sich vorteilhafterweise dadurch erreichen, dass der Reflektor zur Kühl- gasdurchleitung an einer in Lampenlängsrichtung verlaufenden Längsseite mit Gehäusedichtungen in Eingriff bringbar ist.A flow line and possibly a valve function in the case of a hinged reflector can advantageously be achieved in that the reflector for passing the cooling gas through can be brought into engagement with housing seals on a longitudinal side running in the longitudinal direction of the lamp.
Im Folgenden wird die Erfindung anhand eines in der Zeichnung schema¬ tisch dargestellten Ausführungsbeispiels näher erläutert. Es zeigenIn the following the invention will be explained in more detail with reference to an embodiment schematically illustrated in the drawing. Show it
Fig. 1 ein UV-Bestrahlungsaggregat im Betriebszustand vereinfacht im Querschnitt; und1 shows a UV irradiation unit in the operating state simplified in cross section. and
Fig. 2 das Bestrahlungsaggregat nach Fig. 1 im Standby-Zustand.Fig. 2, the irradiation unit of FIG. 1 in the standby state.
Das in der Zeichnung dargestellte Bestrahlungsaggregat dient zur UV- Trocknung und Vernetzung von Lacken, Farben, Klebstoffen und derglei¬ chen Beschichtungen auf insbesondere bahnförmigen Substraten bzw. Pro¬ dukten. Es besteht im Wesentlichen aus einem kastenförmigen Gehäuse 10, einer in dem Gehäuse angeordneten stabförmigen UV-Lampe 12, einem Reflektor 14 zur Reflexion des abgestrahlten UV-Lichts auf eine bodenseiti- ge Bestrahlungsöffnung 16, einem gehäuseinternen Strahlungsabsorber 18 für den Standby-Betrieb und einem Kanalsystem 20 zur Durchleitung von Kühlluft.The irradiation unit shown in the drawing is used for UV drying and crosslinking of paints, inks, adhesives and similar coatings on, in particular, web-like substrates or products. It consists essentially of a box-shaped housing 10, a rod-shaped UV lamp 12 arranged in the housing, a reflector 14 for reflecting the emitted UV light onto a bottom-side irradiation opening 16, a housing-internal radiation absorber 18 for standby operation and a duct system 20 for passing cooling air.
Die UV-Lampe 12 ist als zweiendige Mitteldruck-Gasentladungslampe in der Mittellängsebene des Gehäuses 10 angeordnet und gibt ihre Strahlung über die Gehäuseöffnung 16 auf die darunter vorbeigeführte Substratbahn bzw. das zu bestrahlende Objekt ab. Das Kanalsystem 20 der Kühlung ist voll¬ ständig außerhalb des die Lampe 12 umgebenden Lampenraums 22 ange¬ ordnet, so dass dieser frei von der Kühlluftströmung (Pfeile 24) bleibt.The UV lamp 12 is arranged as a double-ended medium-pressure gas discharge lamp in the central longitudinal plane of the housing 10 and emits its radiation via the housing opening 16 to the substrate web guided underneath or to the object to be irradiated. The duct system 20 of the cooling system is arranged completely outside the lamp chamber 22 surrounding the lamp 12 so that it remains free of the cooling air flow (arrows 24).
Wie in Fig. 1 gezeigt, ist die UV-Lampe 12 im Betriebszustand über ihren von der Gehäuseöffnung 16 abgewandten Sektor von dem Reflektor 14 um¬ geben, so dass das reflektierte Licht durch die Gehäuseöffnung 16 hindurch abgestrahlt und der angrenzende Gehäuseinnenraum 26 gegenüber dem Lampenraum 22 abgeschirmt wird. Die anfallende Verlustwärme kann dabei über die rückseitig an der Reflektorfläche 28 vorbei geführte Kühlluftströ- mung 24 aufgenommen und aus dem Gehäuse 10 abgeführt werden.As shown in FIG. 1, the UV lamp 12 in the operating state is surrounded by the reflector 14 over its sector facing away from the housing opening 16, so that the reflected light is radiated through the housing opening 16 and the adjacent housing interior 26 with respect to the lamp chamber 22 is shielded. In this case, the resulting heat loss can be absorbed via the cooling air flow 24 guided past the reflector surface 28 at the rear and removed from the housing 10.
Zu diesem Zweck umfasst das bezüglich der Längsmittelebene des Gehäu¬ ses 10 symmetrische Kanalsystem 20 einen Einströmkanal 30, einen Reflek¬ torkanal 32, einen Absorberkanal 34 und eine Abluftkammer 36. Die Luft- Strömung in den Kanälen 30,32,34 erfolgt über die Länge des Gehäuses 10 quer zur Längsachse, während die Abluftströmung in der Abluftkammer 36 hauptsächlich in Längsrichtung zu einer nicht gezeigten Absaugöffnung hin erfolgt.For this purpose, the channel system 20, which is symmetrical with respect to the longitudinal center plane of the housing 10, comprises an inflow channel 30, a reflector channel 32, an absorber channel 34 and an exhaust air chamber 36. The air flow in the channels 30, 32, 34 takes place over the length of the housing 10 transversely to the longitudinal axis, while the exhaust air flow in the exhaust air chamber 36 takes place mainly in the longitudinal direction to a suction opening, not shown.
Zur Abgrenzung der verschiedenen Strömungsbereiche ist in dem Gehäuse 10 ein Gehäuseeinsatz 38 angeordnet, der sich zwischen den Gehäusestirn¬ seiten längs durchgehend erstreckt. Auf diese Weise wird stromab von ei- nem Einströmschlitz 40 ein doppelwandiger Gehäusemantel als Einströmka¬ nal 30 gebildet. Der daran anschließende Reflektorkanal 32 besteht aus Pro¬ filhohlräumen, die in dem aus extrudierten Profilstücken 42 zusammenge¬ setzten Reflektor 14 ausgebildet sind. Die Profilstücke 42 besitzen eine Doppelwandung mit zur Bildung von längsseitigen Durchlässen durchbro¬ chenen Zwischenstegen 44 und sind um jeweils eine Drehachse 46 gegen¬ einander verschwenkbar. Die Drehfunktion für den Stand by-Betrieb wird wei¬ ter unten näher erläutert.To delimit the various flow areas, a housing insert 38 is arranged in the housing 10, which extends longitudinally between the Gehäusestirn¬ pages. In this way, downstream from an A double-walled housing jacket is formed as an inflow channel 30 in the inflow slot 40. The adjoining reflector channel 32 consists of profile cavities which are formed in the reflector 14 composed of extruded profile pieces 42. The profile pieces 42 have a double wall with intermediate webs 44 which are pierced through to form longitudinal passages and are pivotable relative to each other about an axis of rotation 46. The turning function for the stand-by mode will be explained in greater detail below.
Das aus dem Reflektor 14 austretende Kühlgas wird durch den ebenfalls als Profilabschnitt ausgebildeten Absorber 18 umgelenkt, wobei an dem Gehäu¬ seeinsatz 38 nach innen abstehende Leitbleche 48 ein Strömungslabyrinth 50 bilden. Aufgrund des sehr viel größeren Volumens bzw. Strömungsquer¬ schnitts der Abluftkammer 36 ist gewährleistet, dass über die gesamte Ge- häuselänge gleichmäßige Luftgeschwindigkeiten und damit Kühlbedingun¬ gen bestehen.The cooling gas emerging from the reflector 14 is deflected by the absorber 18, which is likewise designed as a profile section, wherein guide vanes 48 projecting inwardly on the housing 38 form a flow labyrinth 50. Due to the much larger volume or flow cross-section of the exhaust air chamber 36, it is ensured that uniform air velocities and thus cooling conditions exist over the entire length of the housing.
In der Betriebsstellung gemäß Fig. 1 ist der Reflektor 14 auf das zu bestrah¬ lende Objekt ausgerichtet, während wärmefeste Gehäusedichtungen 52 für eine direkte Kühllufteinleitung sorgen. Beim Anfahren oder bei Betriebsun¬ terbrechungen wird das Aggregat in einen Standby-Betrieb gefahren, bei dem der Reflektor 14 zu der Gehäuseöffnung 16 hin geschlossen und zu dem gehäuseinternen Absorber 18 hin geöffnet ist.In the operating position according to FIG. 1, the reflector 14 is aligned with the object to be irradiated, while heat-resistant housing seals 52 ensure a direct introduction of cooling air. When starting or Betriebsun¬ terbrechungen the unit is driven into a standby mode in which the reflector 14 is closed to the housing opening 16 and opened to the housing-internal absorber 18 out.
Die Standby-Stellung lässt sich gemäß Fig. 2 dadurch einnehmen, dass die Reflektorhälften 42 um die Drehachsen 46 verschwenkt werden, bis die un¬ teren Reflektorkanten gegeneinander schließen und die oberen Reflektor¬ kanten mit dem Absorber 18 in Eingriff gelangen. Auch in diesem Betriebs¬ zustand bleibt der Lampenraum 22 frei von der Kühlluftströmung 24, wäh- rend der Reflektor 14 und Absorber 18 weiterhin unter Strömungsumlenkung gekühlt werden. Auf diese Weise ist es möglich, die Lampe 12 auch im Standby-Betrieb am Brennen zu halten, wobei der Absorber 18 die (reduzier- te) Strahlung aufnimmt. Aus diesem Betriebszustand kann ohne Zeitverlust durch Öffnen des Reflektors 14 in den der jeweiligen Voreinstellung entspre¬ chenden Produktionsmodus gefahren werden.2, the reflector halves 42 are pivoted about the axes of rotation 46 until the lower reflector edges close to one another and the upper reflector edges engage the absorber 18. In this operating state, too, the lamp space 22 remains free of the cooling air flow 24, while the reflector 14 and absorber 18 continue to be cooled while the flow is deflected. In this way, it is possible to keep the lamp 12 burning even in standby mode, with the absorber 18 holding the (reducing te) absorbs radiation. From this operating state, it is possible to travel without loss of time by opening the reflector 14 in the production mode corresponding to the respective presetting.
In diesem Zusammenhang ist von besonderer Bedeutung, dass die kurzwel¬ lige UV-C-Strahlung im Bereich von 200 bis 240 nm Wellenlänge im Lam¬ penraum bei Vorhandensein von Luftsauerstoff Ozon erzeugt. Aufgrund der abgetrennten Kühlluftströmung kann jedoch in Ozonsättigung ohne kontinu¬ ierliche Ozonbildung gearbeitet werden, so dass die kurzwellige Strahlungs- ausbeute für den Polymerisationsprozess an der Substratoberfläche erheb¬ lich verbessert wird. Durch die raschere Härtung einer dünnen Oberflächen¬ schicht kann auch die Sauerstoffbeeinflussung (Inhibierung) der Polymerisa¬ tion in der Tiefe der Beschichtung verringert werden.In this connection, it is of particular importance that the short-wave UV-C radiation in the range of 200 to 240 nm wavelength in the lamp space generates ozone in the presence of atmospheric oxygen. Due to the separated cooling air flow, however, it is possible to work in ozone saturation without continuous ozone formation, so that the short-wave radiation yield for the polymerization process at the substrate surface is considerably improved. The faster curing of a thin surface layer can also reduce the oxygen influencing (inhibition) of the polymerization in the depth of the coating.
Bei Versuchen mit der erfindungsgemäßen Vorrichtung wurde gezeigt, dass UV-Lampen mit einer spezifischen Leistung von 200W/cm bis zu einer Lam¬ penlänge von ca. 50 cm ohne Luftströmung im Lampenraum bis zu mehre¬ ren 1000 Stunden betrieben werden können. Dies gilt für Reflektoren mit Aluminiumbeschichtung genauso wie für Reflektoren mit dichroitischer Be- Schichtung auf massiven Trägern (so genannte Kaltlichtspiegel). Die Kühlung lässt sich dabei durch eine reine Luftkühlung realisieren. Werden solche Ag¬ gregate eingesetzt, erhält man mit niedrigerer spezifischer Lampenleistung die gleichen Trocknungsergebnisse wie bei Geräten mit Lampenraumküh- lung, oder aber die Produktionsleistung kann drastisch erhöht werden.In experiments with the device according to the invention it was shown that UV lamps with a specific power of 200 W / cm up to a Lam¬ penlänge of about 50 cm without air flow in the lamp compartment can be operated up to several 1000 hours. This applies to reflectors with aluminum coating as well as to reflectors with dichroic coating on solid supports (so-called cold light mirrors). The cooling can be realized by a pure air cooling. If such aggregates are used, the same drying results are obtained with lower specific lamp power as with devices having lamp space cooling, or the production output can be drastically increased.
Durch die Trennung von Lampenraum 22 und Kanalsystem 20 kann auch auf eine Regelung der Kühlmittelströmung bei verschiedenen Be- triebs/Leistungszuständen von Lampe und Reflektor verzichtet werden.By separating the lamp chamber 22 and the channel system 20, it is also possible to dispense with a regulation of the coolant flow in the case of different operating / power states of the lamp and the reflector.
Grundsätzlich ist es möglich, den Lampenraum durch eine UV-durchlässige Quarzscheibe von dem Substrat zu trennen (nicht gezeigt). Dabei kann die Quarzscheibe durch die Emission der UV-Lampe auf Temperaturen über 300°C aufgeheizt werden, so dass sich auf der Objektseite der Scheibe kei¬ ne Ablagerungen bilden. Zur Schaffung einer weiter sauerstoffreduzierten Atmosphäre im Belichtungsraum ist es vorteilhaft, wenn am Einlauf der Ma¬ terialbahn vorzugsweise durch eine Laminardüse mit einer Gasgeschwindig- keit kleiner als die Bahngeschwindigkeit Stickstoffgas injiziert wird. In principle, it is possible to separate the lamp space from the substrate by a UV-transparent quartz disk (not shown). In this case, the quartz disc through the emission of the UV lamp to temperatures above 300 ° C are heated, so that no deposits form on the object side of the disc. Establishing a further oxygen-reduced atmosphere in the exposure space, it is advantageous if at the inlet of terialbahn Ma ¬ is preferably injected by a Laminardüse with a gas velocity less than the web speed nitrogen gas.

Claims

Patentansprüche claims
1. Bestrahlungsaggregat zur UV-Bestrahlung von insbesondere bahnför- migen Substraten, mit einem Gehäuse (10), einer darin angeordneten stabförmigen UV-Lampe (12), einem längs der UV-Lampe (12) sich erstreckenden Reflektor (14), welcher einen die UV-Lampe (12) umge¬ benden Lampenraum (22) gegenüber einem Gehäuseinnenraum (26) begrenzt, und einem Kanalsystem (20) zur Durchleitung eines den Re¬ flektor (14) kühlenden Kühlgases, dadurch gekennzeichnet, dass das Kanalsystem (20) außerhalb des Lampenraums (22) angeordnet ist, so dass der Lampenraum (22) frei von der Kühlgasströmung (24) bleibt, wobei der Reflektor (14) durch innenseitig mit Kühlgas beaufschlagbare Hohlprofile (42) als Teil des Kanalsystems (20) gebildet ist.1. Irradiation unit for UV irradiation of particular web-shaped substrates, comprising a housing (10), a rod-shaped UV lamp (12) disposed therein, a reflector (14) extending along the UV lamp (12), which has a the UV lamp (12) umge¬ bulging lamp chamber (22) relative to a housing interior (26) limited, and a channel system (20) for passing a re¬ reflector (14) cooling the cooling gas, characterized in that the channel system (20) is arranged outside of the lamp chamber (22), so that the lamp chamber (22) remains free of the cooling gas flow (24), wherein the reflector (14) is formed by inside with cooling gas acted upon hollow sections (42) as part of the channel system (20).
2. Bestrahlungsaggregat nach Anspruch 1, dadurch gekennzeichnet, dass der Reflektor (14) vorzugsweise über seine gesamte Länge quer zur Längsrichtung der UV-Lampe (12) durchströmbar ist.2. Irradiation unit according to claim 1, characterized in that the reflector (14) preferably over its entire length transversely to the longitudinal direction of the UV lamp (12) can be flowed through.
3. Bestrahlungsaggregat nach Anspruch 1 oder 2, dadurch gekenn- zeichnet, dass der Reflektor (14) durch in Längsrichtung der UV- Lampe (12) verlaufende, extrudierte Hohlprofile (42) gebildet ist.3. Irradiation unit according to claim 1 or 2, characterized in that the reflector (14) by in the longitudinal direction of the UV lamp (12) extending, extruded hollow sections (42) is formed.
4. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 3, dadurch ge¬ kennzeichnet, dass das Kanalsystem (20) eine durch einen doppel- wandigen Gehäusemantel begrenzte Einströmkammer (30) aufweist.4. Irradiation unit according to one of claims 1 to 3, characterized ge indicates that the channel system (20) has a limited by a double-walled housing jacket inflow chamber (30).
5. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 4, dadurch ge¬ kennzeichnet, dass das Kanalsystem (20) eine parallel zu der UV- Lampe (12) sich erstreckende, vorzugsweise einem Absorber (18) nachgeordnete Abluftkammer (36) aufweist.5. Irradiation unit according to one of claims 1 to 4, characterized ge indicates that the channel system (20) has a parallel to the UV lamp (12) extending, preferably an absorber (18) downstream exhaust chamber (36).
6. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 5, dadurch ge¬ kennzeichnet, dass der Strömungsquerschnitt der Abluftkammer (36) vorzugsweise um ein Mehrfaches größer als der größte Strömungs¬ querschnitt des einströmseitigen Kanalsystems (30,32,34) ist.6. irradiation unit according to one of claims 1 to 5, characterized ge indicates that the flow cross-section of the exhaust chamber (36) preferably by a multiple larger than the largest Strömungs¬ cross-section of the inflow-side channel system (30,32,34).
7. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 6, dadurch ge- kennzeichnet, dass in dem Gehäuse (10) ein Gehäuseeinsatz (38) als7. Irradiation unit according to one of claims 1 to 6, character- ized in that in the housing (10) has a housing insert (38) as
Teil des Kanalsystems (20) angeordnet ist.Part of the channel system (20) is arranged.
8. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 7, dadurch ge¬ kennzeichnet, dass der Reflektor (14) ausschließlich durch Kühlgas und nicht durch flüssiges Kühlmedium gekühlt ist.8. irradiation unit according to one of claims 1 to 7, characterized ge indicates that the reflector (14) is cooled exclusively by cooling gas and not by liquid cooling medium.
9. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 8, dadurch ge¬ kennzeichnet, dass in dem Gehäuseinnenraum (26) ein von der UV- Lampe (12) zumindest im Standby-Betrieb mit Strahlung beaufschlagter Absorber (18) angeordnet ist, und dass der Absorber (18) durch die9. Irradiation unit according to one of claims 1 to 8, characterized ge indicates that in the housing interior (26) of the UV lamp (12) at least in standby mode acted upon with radiation absorber (18) is arranged, and that of Absorber (18) through the
Kühlgasströmung (24) kühlbar ist.Cooling gas flow (24) is coolable.
10. Bestrahlungsaggregat nach Anspruch 9, dadurch gekennzeichnet, dass der Absorber (18) einen Bereich des Kanalsystems (20) vorzugs- weise in Form eines die Kühlgasströmung (24) umlenkenden Labyrinths10. Irradiation unit according to claim 9, characterized in that the absorber (18) an area of the channel system (20) preferably in the form of a cooling gas flow (24) deflecting labyrinth
(50) begrenzt.(50) limited.
11. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 10, dadurch gekennzeichnet, dass der Reflektor (14) zwei zwischen einer auf das Substrat ausgerichteten Betriebsstellung und einer auf einen Absorber11. Irradiation unit according to one of claims 1 to 10, characterized in that the reflector (14) two between an aligned on the substrate operating position and one on an absorber
(18) im Gehäuseinnenraum (26) gerichteten Standby-Stellung gegen¬ einander schwenkbare Reflektorhälften (42) aufweist, wobei die Reflek¬ torhälften (42) in der Standby-Stellung mit dem Absorber (18) unter Freihaltung des Lampenraums (22) von der Kühlgasströmung (24) in Eingriff stehen.(18) in the housing interior (26) directed standby position gegen¬ each other pivotable reflector halves (42), the Reflek¬ torhälften (42) in the standby position with the absorber (18) while keeping the lamp chamber (22) of the Cooling gas flow (24) are engaged.
12. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 11 , dadurch gekennzeichnet, dass das Verhältnis von Dauerbetriebsleistung zu Länge der UV-Lampe (12) größer als 20W/cm, vorzugsweise größer als 100W/cm ist.12. Irradiation unit according to one of claims 1 to 11, characterized in that the ratio of continuous operation power to Length of the UV lamp (12) is greater than 20W / cm, preferably greater than 100W / cm.
13. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 12, dadurch gekennzeichnet, dass die Kϋhlgasströmung (24) unabhängig von der13. Irradiation unit according to one of claims 1 to 12, characterized in that the Kϋhlgasströmung (24) regardless of the
Lampenleistung im Bestrahlungsbetrieb vorgegeben ist.Lamp power is specified in the irradiation mode.
14. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 13, dadurch gekennzeichnet, dass der Lampenraum (22) gegen Ozonausleitung abgeschirmt ist, wobei der Lampenraum (22) im Bestrahlungsbetrieb unter Ozonsättigung steht.14. Irradiation unit according to one of claims 1 to 13, characterized in that the lamp chamber (22) is shielded against ozone leakage, wherein the lamp chamber (22) is in the irradiation operation under ozone saturation.
15. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 14, dadurch gekennzeichnet, dass der Lampenraum (22) durch eine strahlungs- durchlässige Trennscheibe, insbesondere eine Quarzscheibe von dem15. Irradiation unit according to one of claims 1 to 14, characterized in that the lamp chamber (22) by a radiation-permeable separating disk, in particular a quartz glass of the
Substrat getrennt ist.Substrate is separated.
16. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 15, dadurch gekennzeichnet, dass die Trennscheibe im Bestrahlungsbetrieb durch die UV-Lampe (12) auf eine Temperatur von mehr als 3000C aufgeheizt wird.16. Irradiation unit according to one of claims 1 to 15, characterized in that the cutting disc is heated in the irradiation operation by the UV lamp (12) to a temperature of more than 300 0 C.
17. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 16, dadurch gekennzeichnet, dass der Reflektor (14) über längsseitige Öffnungen an einer in Lampenlängsrichtung verlaufenden Längsseite mit Kühlgas beaufschlagbar ist.17. Irradiation unit according to one of claims 1 to 16, characterized in that the reflector (14) is acted upon by longitudinal openings on a longitudinal direction extending in the lamp longitudinal side with cooling gas.
18. Bestrahlungsaggregat nach einem der Ansprüche 1 bis 17, dadurch gekennzeichnet, dass der Reflektor (14) zur Kühlgasdurchleitung an einer in Lampenlängsrichtung verlaufenden Längsseite mit Gehäuse¬ dichtungen (52) in Eingriff bringbar ist. 18. Irradiation unit according to one of claims 1 to 17, characterized in that the reflector (14) for cooling gas passage at a longitudinal direction extending in the lamp longitudinal side with Gehäus¬ seals (52) is engageable.
EP05797763A 2004-10-01 2005-09-28 Uv irradiation unit Not-in-force EP1794523B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004047868 2004-10-01
PCT/EP2005/010454 WO2006037525A1 (en) 2004-10-01 2005-09-28 Uv irradiation unit

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AT (1) ATE391891T1 (en)
DE (1) DE502005003678D1 (en)
DK (1) DK1794523T3 (en)
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EP1794523B1 (en) 2008-04-09
ATE391891T1 (en) 2008-04-15
WO2006037525A1 (en) 2006-04-13
DE502005003678D1 (en) 2008-05-21
DK1794523T3 (en) 2008-07-28
US20080315133A1 (en) 2008-12-25
ES2303689T3 (en) 2008-08-16

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