EP1767068B1 - Dispositif pour traiter un substrat au moyen d'au moins un jet de plasma - Google Patents

Dispositif pour traiter un substrat au moyen d'au moins un jet de plasma Download PDF

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Publication number
EP1767068B1
EP1767068B1 EP05753782A EP05753782A EP1767068B1 EP 1767068 B1 EP1767068 B1 EP 1767068B1 EP 05753782 A EP05753782 A EP 05753782A EP 05753782 A EP05753782 A EP 05753782A EP 1767068 B1 EP1767068 B1 EP 1767068B1
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EP
European Patent Office
Prior art keywords
electrode
accordance
electrodes
carrier gas
plasma jet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
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EP05753782A
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German (de)
English (en)
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EP1767068A2 (fr
Inventor
Jürgen ENGEMANN
Darius Korzec
Markus Teschke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maschinenfabrik Reinhausen GmbH
Original Assignee
Maschinenfabrik Reinhausen GmbH
Maschinenfabrik Reinhausen Gebrueder Scheubeck GmbH and Co KG
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/246—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using external electrodes

Definitions

  • the invention relates to a device for processing a substrate by means of at least one plasma jet according to the preamble of the first claim.
  • Such a device is from the US-A1-2002 / 187066 known.
  • the known device comprises a container through which a carrier gas flows along a flow direction. It further includes a first and a second electrode, wherein the two electrodes are separated by a dielectric barrier. An alternating voltage is applied between the electrodes to produce an atmospheric pressure glow discharge plasma; the first electrode is axially and radially spaced from the second electrode with respect to the flow direction of the carrier gas.
  • a helium gas mixture is typically passed through a coaxial region between the axially positioned inner electrode and the electrically insulating outer tube and the outer electrode and converted into a primary discharge with the electromagnetic field established there between the inner electrode and the outer electrode by means of a voltage generator and then in shape a chemically and physically activated plasma jet expelled in the direction of the substrate.
  • the plasma jet causes the desired surface modification, layer deposition, cleaning or other plasma processes.
  • the EP 0 921 713 A2 describes a reverse arrangement of the coaxial electrodes and the dielectric barrier. In this case, the working gas is guided in the coaxial zone between the outer electrode and the dielectric sheath of the inner electrode in the axial direction.
  • the present invention seeks to provide a device of the type mentioned above, which efficiently generates plasma jets at working pressures in the range of atmospheric pressure, which allow a large processing depth.
  • At least one electrode is designed in such a ring-shaped or sleeve-like manner that at least one electrode has an active edge facing the other electrode.
  • the electrodes according to the invention with their mutually facing active edges deviate from the circular shape and are formed by marginal edges of the electrodes. Shortest connecting lines between the two electrodes are in this case those which are perpendicular to the two active edges.
  • the effective edge of an electrode is the outermost boundary edge which is closest to the other electrode.
  • the active edges of the electrodes are the directly adjoining outermost edges of the electrodes.
  • both electrodes are formed substantially annular or sleeve-like.
  • the two electrodes are axially spaced from each other and have different diameters, so that an inner and an outer electrode is formed, thus resulting in a radial spacing of the electrodes from each other
  • an infinite variety of shortest connecting lines between the two electrodes is conceivable.
  • the two electrodes according to the invention have mutually facing active edges, which are of circular edges of the two electrodes. Shortest connecting lines between the two electrodes are in this case those which are perpendicular to the two active edges.
  • the effective edge of an electrode is the one most extreme boundary edge which is closest to the other electrode. If it is, for example, as in FIGS FIGS. 7 and 8 shown in this patent application to substantially plate-shaped, mutually parallel, electrodes 17 and 18, so are the effective edges of the mutually parallel, immediately adjacent or opposing marginal edges 25a, 25b referred to.
  • the circular, radially outer, the second electrode 18 facing the peripheral edge 25a of the inner electrode 17 and the radially inner, the inner electrode 17 facing the peripheral edge 25b of the outer electrode 18 act as active edges.
  • the active edges of the electrodes are thus the mutually adjacent outermost edges or edge regions of the electrodes.
  • At least one electrode has an active edge facing the other electrode, which deviates from a circular shape.
  • projections can be provided on the active edges, which shorten the shortest connecting line between the electrodes. It thus comes to a predetermined number of well-defined and geometrically defined shortest connecting lines.
  • shortest connecting lines between the two electrodes mainly the discharge channels are formed.
  • the shortest connecting line between two active edges of the two electrodes is curved.
  • the shortest connecting line between two effective edges of the two electrodes is that geometric vector which connects the two electrodes with each other by the shortest route.
  • a shortest connecting line in the sense of the present patent application also cuts through the dielectric barrier.
  • a curved shortest connecting line in the case of a concentric arrangement of inner tube and outer tube does not intersect the dielectric inner tube, but clings, for example helically, to the inner tube. This definition of a shortest connecting line takes into account the electromagnetic fields actually generated
  • a curved shortest connecting line between two active edges of the electrodes can also be formed thereby in that a radially outer electrode is formed by segmentation such that a shortest connecting line consists of different sections of different directions and thus forms, as a whole, a connecting line which approximates to a curved connecting line.
  • a curved shortest connecting line allows a further improved interaction between the plasma and the carrier gas.
  • the shortest connecting line between the two active edges may be formed helically and thus helically, at least in sections, to wind around the inner tube.
  • At least one electrode is segmented in a special way.
  • at least one electrode consists of at least two electrically conductive Elektoroden beautiful sculpture, for example, electrode surfaces which are separated from each other. A voltage is thereby applied only to a first electrode segment. In the second electrode segment, a voltage is induced.
  • the shortest connecting line between the two electrodes advantageously extends overall substantially between the first electrode segment and the other electrode. In fact, a first portion of a shortest connecting line between the second electrode segment and an inner electrode and another portion of the shortest connecting line between the second electrode segment and the first electrode segment.
  • the shortest connecting line between the two electrodes therefore comprises a total of two sections of different directions or has a basic shape approximating the two sections.
  • Segmentation of an electrode can be used to influence the discharge channel and, for example, give it a predetermined and predicted spatial form. In this way, the interaction between plasma and carrier gas can be further optimized.
  • the first electrode is disposed on an outer circumferential surface of the inner container and with its electrically conductive, in particular metallic outer circumferential surface facing the carrier gas.
  • This embodiment of the invention enables a particularly simple contacting of the first electrode for connection to a voltage generator.
  • the carrier gas may flow past the metallic outer surface of the first electrode before it is supplied to the plasma. The electrode geometry can therefore be achieved with comparatively little design effort.
  • Fig. 7 shows a device 10 according to the invention for processing a substrate 11 or in particular for processing a surface 12 of the substrate 11 very schematically.
  • a plasma jet 13 can be extracted from the device 10 through an outlet 14 of the device 10 and can be brought up to the substrate 11. There he can make a processing of the surface 12, for example, coat the surface 12, structure, modify od. Like.
  • the substrate to be processed is arranged at a distance from the device 10.
  • the electrodes 17, 18 described below are thus arranged on the same side of the substrate 11.
  • the surface 12 is conductive or insulating.
  • the substrate 11 brought to the device 10 does not affect the electrode potentials
  • the device 10 comprises a cylindrical container 15, which in the embodiment of an insulating, that is dielectric, material Fig. 8 indicates that the container 15 has a substantially square cross-section, which is formed by four side walls 16a, 16b, 16c, 16d.
  • a carrier gas in particular helium, flows through the container 15 substantially along the flow direction of the arrow x.
  • the flow direction x corresponds essentially to the direction of a longitudinal central axis of the container 15.
  • a first, substantially plate-shaped electrode 17 is arranged It faces with its bare upper side, ie with its metallic outer surface 19, the inner space 24 of the container 15.
  • a second, substantially plate-shaped electrode 18 is with respect to the FIGS. 7 and 8 disposed above the upper side wall 16c of the container 15.
  • the second electrode 18 is provided with an insulating sheath 20.
  • the first electrode 17 will be referred to as the upstream electrode and the second electrode 18 as the downstream electrode, which takes into account the direction x of the flow of the carrier gas.
  • the upstream electrode 17 is spaced from the downstream electrode 18 by the distance L in the axial direction, that is, in the direction of the flow direction x of the carrier gas. At the same time, the upstream electrode 17 is spaced from the downstream electrode 18 by an amount R in the radial direction, ie transversely to the flow direction x of the carrier gas.
  • the two electrodes 17, 18 are therefore axially and radially spaced from each other
  • the shortest connecting line between the two electrodes 17, 18 is designated by 21. This is the line which connects an outer edge 25a of the first electrode 17 to an outer edge 25b of the second electrode 18 in the shortest path.
  • the electrodes 17, 18 are in the embodiment of the FIGS. 7 and 8 Accordingly, the two mutually facing edge edges 25a, 25b of the two electrodes 17, 18, which are referred to below as the active edges, each aligned along a straight line and parallel to each other.
  • an AC voltage of a suitable frequency and a suitable amplitude which is one in the FIGS. 7 and 8 Voltage generator is not shown, so forms a main discharge channel 22 in the region of the shortest connecting line 21, and that substantially along the shortest connecting line 21.
  • the main channel 22 of the discharge is in the FIGS. 1 . 7 and 8 schematically dargesteilt in cross section in the manner of a narrow, elongated cloud. Such an image also results for a viewer when a suitable image is taken of the device during operation by suitable means.
  • a plasma 23 By interaction of the discharge main channel with the carrier gas, a plasma 23, a so-called primary discharge, forms in the manner of a plasma cloud which opens toward the substrate 11 in a plasma jet 13. With a suitable choice of the flow of the carrier gas, the substrate 11 can be processed by means of the plasma jet.
  • the main discharge channel 22 substantially along the shortest connecting line 21 a particular spatial position and length, with respect to the direction x of the stream of the carrier gas takes a particularly long and intense plasma jet 13 can be formed.
  • the predeterminable spatial arrangement of the main discharge channel 22 causes maximization of power coupling into the chemically and physically excited species in the carrier gas.
  • the main discharge channel 22 is inclined at an acute angle ⁇ to the flow direction x of the carrier gas, the carrier gas can cooperate with a large volume with the main discharge channel 22 and is guided in this way spatially and temporally particularly well. Due to a longer and more intense plasma jet 13, the substrate can be treated more efficiently.
  • the container 15 is formed as a circular cylindrical hollow tube 15 within the outer tube 15 is concentrically aligned with a second inner tube 26 arranged through the inner tube 26 can pass along the flow direction y, ie substantially parallel to the flow direction x of the carrier gas, a process gas flow.
  • the inner tube 26 is made of dielectric material.
  • the first electrode 17 is substantially sleeve-like, that is formed in the manner of an axially elongated ring and applied to the outer circumferential surface 33 of the inner tube 26. With its outer side 19, it faces the annular space 24 of the container 15
  • the second, downstream electrode 18 is mounted on the outer circumferential surface 34 of the outer tube 15. It is also substantially annular or sleeve-like and surrounds the outer tube 15 in the circumferential direction. On its outer circumferential surface 35 is the downstream electrode 18 surrounded by an insulating sheath 20. The annular end face directed toward the substrate 11, including the peripheral edge 36 of the second electrode 18, is also surrounded by a region 20 a of the insulating jacket 20.
  • the first electrode 17 is connected via a connecting line 28a and the second electrode 18 is connected to a AC line voltage generator 27 via a connecting line 28b.
  • a main discharge channel 22 is formed substantially along a shortest connecting line 21 between an active edge 25a and the first electrode 17 and an active edge 25b second electrode 18.
  • Fig. 1 shows schematically a close-to-reality pictorial snapshot of the device in operation, from which it is clear that the main discharge channel 22 from the shortest connecting line 21 actually deviates only slightly. This is due inter alia to the flow velocity of the carrier gas along the flow direction x.
  • Fig. 1 represents a picture shot at a given time. If you change the state of the device according to Fig. 1 a few microseconds later or later, it is found that main discharge channels 22 are formed at another area between the two electrodes 17 and 18.
  • the first electrode 17 and the second electrode 18 each have a circular active edge 25a, 25b.
  • the shortest connecting lines 21 between The two active edges 25a, 25b are therefore distributed rotationally symmetrically about the central longitudinal axis M of the device 10 around. Since the main discharge channels 22 each remain only a few microseconds, which will be described in more detail below, each form different main discharge channels in succession within a short time.
  • a plasma cloud 23 is formed which discharges into a plasma jet 13 which is extracted from the plasma jet opening 14 from the device 10.
  • the process gas passes through a process gas outlet 32, ie the respect Fig. 1 left end of the inner tube 26, into the plasma jet 13 and there forms a core zone 29 of process gas, which extends to the substrate surface 12 of the plasma jet 13 forms a kind of mantle zone 30, which surrounds the core zone 29.
  • a core zone 29a and a jacket zone 30a can also be seen in the region of the foot 31.
  • This formation of core zone 29 and jacket zone 30 enables a particularly homogeneous processing of the substrate 11 with a particularly large machining depth.
  • the outer cladding region 30 has a higher concentration of metastable excited species, thereby achieving higher electron concentration in this region and transfer of electromagnetic power to a greater distance along the plasma jets 13 and over a larger area of the substrate 11 in the foot region 31 of the plasma jet 13 is possible.
  • the carrier gas mix with the Process gas only at the surface 12 of the substrate, whereby it comes there only for intense energy transfer by quenching and Penning shocks from the particles of the cladding region 30a with the particles from the core region 29b.
  • the cladding region 30a are not only the metastable excited helium atoms and molecules. Part of the metastable excitation energy is transferred to the nitrogen molecules contained in the surrounding air. This results in the generation of very long-lived metastable excited nitrogen molecules, which contribute both to the transfer of chemical and electromagnetic energy to the substrate 11.
  • the inner tube 26 and the outer tube 15 are formed of an electrical insulator. In the region of the second electrode 18, the outer tube 15 therefore directly forms the dielectric barrier.
  • a second dielectric barrier may be arranged between the first electrode 17 and the second electrode 18 arranged.
  • a further Isoller wrapper can be attached on the outer peripheral surface 19 of the first electrode 17, a further Isoller wrapper can be attached.
  • the first electrode 17 is spaced from the second electrode 18 by an axial distance L.
  • the radial distance R between the first electrode 17 and the second electrode 18 is constant in the circumferential direction about the central longitudinal axis M.
  • the second electrode 18 is closer to the substrate 11 than the first electrode 17. This allows a particularly advantageous construction.
  • the length I of the plasma jet 13 is maximum. If the distance L is too short, the length of the discharge channels 22 between the electrode edges 25a and 25b will not sufficiently interact with the carrier gas, decreasing the concentration of the excited species in the plasma jet 13. If the distance L is too long, the alternating electric field generated between the electrodes 17, 18 decreases along the shortest connecting line 21, whereby the intensity of the primary discharge decreases. This also reduces the concentration of excited species in the plasma jet 13. As the concentration of the metastable excited species in the plasma jet 13 increases, the energy necessary to achieve a given degree of ionization of the plasma jet decreases. This leads to higher electron concentration and a larger volume, above all a longer length I, of the plasma jet, while the power remains constant.
  • the most efficient method of powering is a resonant circuit.
  • the voltage signal has the form of a sine function.
  • the discharge can in principle also be supplied with voltage signals of other shapes.
  • the use of a resonant circuit as a voltage generator for the plasma jet 13 allows the highest efficiency of power injection and the absence of a tuning unit.
  • the longest plasma jet 13 with grounded inner electrode 17 and polarized outer electrode 18 can be achieved.
  • the device also works with a grounded outer electrode 18 or with a ground point lying between the electrode potentials.
  • By the electrical displacement of the electrode potentials with respect to ground point for example by the application of a voltage divider, can be control the length I of the jet 13, which can be used for targeted adjustment of the treatment depth of the plasma jet 13.
  • the outer electrode 18 is provided with an insulating seal 20, 20a, which prevents the spread of corona discharges starting from the edge 36 of the outer electrode 18, over the annular end face 37 of the outer tube 15 around.
  • Such parasitic discharges lead to the generation of ozone and nitrogen oxides in the ambient air with concentrations that far exceed the permissible limits. They also cause the formation of a "virtual" outer electrode whose area is increased by the area of the corona discharges. A large part of the electrical energy is also coupled into these parasitic corona discharges. For these reasons, the constructive avoidance of this undesirable effect is very important.
  • the exit velocities of the carrier gas and the process gas are similar to avoid turbulence. This is satisfied when the ratio of the Querichnitts simulation the coaxial portion 24 (annulus) between the outer tube 15 and the inner tube 26 and the Cross-sectional area of the opening of the inner tube 26 is approximately equal to the ratio of the carrier gas flow to the process gas flow
  • Fig. 1 shows an embodiment in which the outlet 32 of the process gas is closer to the substrate 11 than the outlet 14 of the plasma jets 13 and the carrier gas outlet 14.
  • the distance d may be about up to twice the inner diameter 38 of the outer tube 15 ,
  • the outlet 14 of the container 15 for the carrier gas is closer to the substrate 11 than the outlet 32 of the process gas.
  • the distance between the outlet 14 and the outlet 32 may be up to ten times the inner diameter 38 of the outer tube 15 in this case.
  • the choice of the distance d depends on the process gas and on the process conditions.
  • the embodiment of Fig. 2 shows a device 40 in a representation according to Fig. 1 in which several of the in Fig. 1 illustrated devices 10 are arranged in a row.
  • the embodiment of Fig. 2 Figure 4 shows four devices 10 in series, each generating a plasma jet 13a, 13b, 13c, 13d.
  • the machining width B is thus approximately four times the machining width of the device 10 according to FIG Fig. 1 ,
  • the main charge port 22 and the core zone 29 are as shown in FIG Fig. 1 in the embodiment of the Fig. 2 not shown.
  • Muiti-jet plasma source 40 is provided with an insulating case 39 to which the outer tubes 15a, 15b, 15c, 15d are fixed in parallel alignment with each other.
  • the inner tubes 26 a, 26 b, 26 c, 26 d are attached to a mounting plate 43.
  • the mounting plate 43 also provides for an electrical connection of the four internal electrodes 17a, 17b, 17c, 17d with each other, which are connected together with a grounding pole 45 and via the connecting line 28a to the power supply 27.
  • the outer electrodes 18a, 18b, 18c, 18d are connected to each other via line sections 44a, 44b, 44c and to the voltage source 27 via a line section 28b. All external electrodes 18a, 18b, 18c, 18d are thus at the same potential. All internal electrodes 17a, 17b, 17c, 17d are also at the same potential.
  • a first gas distribution space 41 for the process gas supplies the four inner tubes 26a, 26b, 26c, 26d with process gas via a common process gas inlet opening 46.
  • a second gas distribution space 42 supplies the four containers 15a, 15b, 15c, 15d with carrier gas via a common carrier gas inlet opening 47.
  • the discharge consists of partial discharges, the discharge channels 22 extending between the edge 25a of the inner electrode and the inner surface 48 (FIG. Fig. 1 ) of the outer tube 15 form radially inside the outer electrode 18.
  • the dielectric inner surface 48 of the outer tube 15 has only a certain capacity for receiving the electric charge. Because this charge on the Outer tube surface 48 lingers longer than a period of the power supply, the next discharge takes place at another area of the inner surface 48 of the outer tube 15.
  • Fig. 3 shows in a cylindrical projection, the geometric shape of the outer electrode 18 and the inner electrode 17.
  • this cylindrical projection which is also referred to as cylindrical development or as Azlmuthal projection, the two electrodes 17, 18 in a cut, flat lying state represents.
  • the azimuthal angle on the coordinate of the diagram thus gives, relative to the longitudinal axis M of the device 10 in FIG Fig. 1 , the circumferential angle, wherein on the abscissa of the coordinate system of Fig. 3 the axial course of the two electrodes 17, 18 is shown.
  • the protrusions 49a, 49b of the first electrode 17 are circumferentially offset from the protrusions 49c, 49d of the second electrode 18.
  • the shortest connecting line 21a, 21b is also in the illustration of FIG Fig. 3 is not formed parallel to the flow direction x of the carrier gas, but extends obliquely to this at an acute angle.
  • the shortest connecting line 21a, 21b may not be imagined running along a straight line, but taking into account the geometric arrangement of inner tube 26 and outer tube 15, such that the shortest connecting line 21a, 21b is a section of a helix.
  • the shortest connecting line 21a, 21b is thus curved, since by definition it can not intersect the inner tube 26.
  • the arrangement of the projections 49a, 49b, 49c, 49d leads to the formation of a gas discharge direction x obliquely extending main discharge channel 22, which is the shortest connecting line 21a, 21b is substantially approximated.
  • main discharge channels 22 which In a representation according to Fig. 3 parallel to the gas flow x and may occur only in a narrow range of the azimuthal position.
  • most of the carrier gas can flow through the primary discharge zone 22 without interacting with the main discharge channels 22.
  • the volume in which the interaction between the carrier gas and the main discharge channel 22 takes place is substantially increased. This produces the metastable excited species in a much larger amount and in a much larger volume. This leads to the formation of a longer and more intensive plasma jet.
  • main discharge channels 22 are formed, which are substantially similar to the shortest connecting lines 21a, 21b. Also, the Hauptendadungskanvontechnik 22 thus run along a portion of a coil.
  • the number of projections 49a, 49b, 49c, 49d on the two electrodes 17, 18 is only to be understood as an example and depends on the type of application of the device 10.
  • Fig. 4 shows a further Ausfohrungsbeispiet an electrode assembly in a representation according to Fig. 3 , Out Fig. 4 It can be seen that the outer electrode 18 has two spiral-like arms 50a and 50b.
  • the two electrode blades 50a, 50b are formed in the manner of elongate projections and extend helically around the in Fig. 4 not shown inner tube 26 according to Fig. 1 around.
  • Fig. 4 is the shortest connecting line between the two electrodes 17, 18, the distance between the free end 51 of a spiral arm 50a, 50b and the Active edge 25a of the electrode 17. Since the radial distance between the inner electrode 17 and the outer electrode 18 is constant, and since a Hauptentfadungskanal 22 can not develop through the dielectric barrier of the wall of the container 15, but exclusively in the traversed by the carrier gas Area is formed, leads the electrode geometry according to Fig. 4 to a main discharge channel 22b composed of two sections 22'b and 22'b which is bent. Similarly, the main discharge channel 22a is composed of a first channel section 22'a and a second channel section 22 "a angled therefrom.
  • the total discharge channel 22a (or 22b) is formed substantially helically, that is curved, and extends around the inner tube 26 according to Fig. 1 around.
  • Fig. 5 shows a further embodiment of an electrode arrangement according to the invention, in which the outer electrode 18 five Etektrodensegmente 52a, 52b, 52c, 52d, 52e has.
  • the electrode segments 52a, 52b, 52c, 52d, 52e are not electrically connected to each other.
  • the electrode segment 52a is formed substantially annular and is with the in Fig. 5 not shown voltage source 27 connected.
  • An electrode segment 52b and an electrode segment 52c are arranged in series, circumferentially offset from one another.
  • Another electrode segment 52d and a further electrode segment 52e are also arranged circumferentially offset
  • the active edge 25a and the active edge 25b of the second electrode 18 are directly connected to each other via shortest connecting lines, not shown, which are substantially perpendicular to the two active edges 25a and 25b.
  • the arrangement of the electrode segments 52b, 52c, 52d, 52e leads to the potential applied to the active edge 25a of the first electrode 17 "seeing" a potential applied to the electrode segments 52c and 52d.
  • the potential applied to the electrode segments 52c and 52e "sees” the potential applied to the adjacent electrode segments 52b and 52d.
  • main discharge channels 22a and 22b are formed, which are composed of main discharge sections 22 "b and 22'b and 22" a and 22'a, respectively.
  • the channel sections 22'b and 22 "b and 22'a and 22" a are arranged at an angle to each other.
  • the total resulting due to the electrode geometry main discharge channels 22a and 22b are again formed substantially helically.
  • the outer electrode 18 is generally helical, that is helical. This leads to several main discharge channels 22a, 22b, 22c.
  • 22a denotes the shortest possible main discharge channel, with 22b the main discharge channel moving azimuthally in the coaxial space of the primary discharge 23 and the reference 22c the longest possible main charge channel.
  • FIGS. 1 to 6 are illustrated with circular cylindrical outer tubes 15 and inner tubes 26 and with annular or sleeve-shaped electrodes 17 and 18.
  • a plasma jet 13 at the outlet 14 of the outer tube 15 and the outlet 32 of the inner tube 26 formed by the inner tube 26 flowing Process gas is required for certain kinds of processing of the substrate;
  • the invention also includes those devices in which a plasma jet 13 is generated without a process gas being additionally supplied.
  • the distance L between the two electrodes 17, 18 is advantageously adapted so that the formation of axially elongated and intense Kleinendadungskanälen 22 causes or favors.
  • the Entiadungskanäle 22 have at least one directional component, which is aligned transversely to the gas flow direction x.
  • the inner electrode 17 in the embodiments of the FIGS. 1 to 6 grounded.
  • a segment of the outer electrode, in the case of a segmented outer electrode 18, in particular the segment 52a furthest away from the inner electrode 17, can also be earthed.
  • neither of the two electrodes 17, 18 is grounded, but the ground potential between the two electrode potentials is.
  • both electrodes 10, 11, the container 15 and the containers 15, 26 are assigned.
  • the substrate 11 is located in a process space into which the plasma jets 13 are extracted from the device 10. The process space is thus outside of the device 17, 18 having device 10th

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Fluid Mechanics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatment Of Fiber Materials (AREA)

Claims (15)

  1. Dispositif (10) servant à traiter un substrat (11) par projection d'au moins un jet de plasma (13), comprenant une chambre (15) parcourue par un gaz porteur le long d'une direction du flux (x), et comprenant une première électrode (17) et une deuxième électrode (18), les deux électrodes (17, 18) étant séparées l'une de l'autre par au moins une barrière diélectrique,
    une tension alternative étant appliquée entre les électrodes (17, 18) pour générer du plasma de décharge d'arc à la pression atmosphérique,
    et la première électrode (17) étant écartée de la deuxième électrode (18) axialement (L) et radialement (R) par rapport à la direction du flux (x) de gaz porteur,
    caractérisé en ce que
    au moins une électrode (17) présente un bord actif (25a, 25b) qui s'écarte de la forme circulaire, dirigé vers l'autre électrode (18).
  2. Dispositif de la revendication 1,
    caractérisé en ce que
    le bord actif (25a, 25b) d'une électrode (17, 18) englobe au moins une protubérance (49a, 49b, 49c, 49d) dirigée vers l'autre électrode (18, 17).
  3. Dispositif de la revendication 1 ou 2,
    caractérisé en ce que
    le bord actif (25a, 25b) d'une électrode (17, 18) englobe plusieurs protubérances (49a, 49b, 49c, 49d) dirigées vers l'autre électrode (18, 17).
  4. Dispositif selon l'une des revendications 1 à 3,
    caractérisé en ce que
    les bords actifs (25a, 25b) des deux électrodes (17, 18) englobent des protubérances (49a, 49b, 49c, 49d) dirigées les unes vers les autres.
  5. Dispositif selon l'une des revendications 2 à 4,
    caractérisé en ce que
    une protubérance est mise à disposition par une extrémité libre (51) d'un bras d'électrode hélicoïdal (50a, 50b).
  6. Dispositif selon l'une des revendications 1 à 5,
    caractérisé en ce que
    la ligne de jonction la plus courte (21, 21a, 21b) entre les deux bords actifs (25a, 25b) des deux électrodes (17,18) présente une composante directionnelle transversale par rapport à la direction du flux (x) de gaz porteur.
  7. Dispositif selon l'une des revendications 1 à 6,
    caractérisé en ce que
    la ligne de jonction la plus courte (21, 21a, 2 1 b) entre les deux bords actifs (25b, 26b) est curviligne.
  8. Dispositif selon l'une des revendications 1 à 7,
    caractérisé en ce que
    la ligne de jonction la plus courte (21, 21a, 21b) entre deux bords actifs (25a, 25b) est essentiellement hélicoïdale ou bien comporte une section hélicoïdale.
  9. Dispositif selon l'une des revendications 1 à 8,
    caractérisé en ce que
    au moins une électrode (18) est segmentée et au moins un segment d'électrode (52b, 52c, 52d, 52e) met à disposition en même temps que les deux électrodes (52a, 17) une ligne de jonction la plus courte essentiellement curviligne (21a, 21b) entre les deux bords actifs (25a, 25b).
  10. Dispositif selon l'une des revendications 1 à 9,
    caractérisé en ce que
    la première électrode (17) est agencée sur une surface d'enveloppe extérieure (33) de la chambre intérieure (26).
  11. Dispositif selon l'une des revendications 1 à 10,
    caractérisé en ce que
    la première électrode (17) avec sa surface d'enveloppe extérieure conductible à l'électricité, notamment métallique (19) est dirigée vers le gaz porteur.
  12. Dispositif selon l'une des revendications 1 à 11,
    caractérisé en ce que
    les électrodes (17,18) sont appliquées galvaniquement par évaporation cathodique ou par pulvérisation.
  13. Dispositif selon l'une des revendications 1 à 12,
    caractérisé en ce que
    la deuxième électrode (18) est revêtue sur sa surface d'enveloppe extérieure (35) par une gaine isolante (20, 20a).
  14. Dispositif de la revendication 13,
    caractérisé en ce que
    la gaine isolante (20, 20a) est formée d'une couche de céramique oxydée ou de verre ou de polymère aux faibles pertes diélectriques.
  15. Dispositif de la revendication 13 ou 14,
    caractérisé en ce que
    la gaine isolante (20, 20a) présente une épaisseur comprise entre quelques 10 µm et quelques mm.
EP05753782A 2004-06-16 2005-06-08 Dispositif pour traiter un substrat au moyen d'au moins un jet de plasma Not-in-force EP1767068B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004029081A DE102004029081A1 (de) 2004-06-16 2004-06-16 Vorrichtung zur Bearbeitung eines Substrates mittels mindestens eines Plasma-Jets
PCT/DE2005/001015 WO2005125286A2 (fr) 2004-06-16 2005-06-08 Dispositif pour traiter un substrat au moyen d'au moins un jet de plasma

Publications (2)

Publication Number Publication Date
EP1767068A2 EP1767068A2 (fr) 2007-03-28
EP1767068B1 true EP1767068B1 (fr) 2009-08-26

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EP (1) EP1767068B1 (fr)
DE (2) DE102004029081A1 (fr)
WO (1) WO2005125286A2 (fr)

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DE102007012882A1 (de) 2007-03-17 2008-09-18 Je Plasmaconsult Gmbh Verfahren und Vorrichtung zur Plasmabehandlung
DE102007043291A1 (de) 2007-09-11 2009-04-02 Maschinenfabrik Reinhausen Gmbh Verfahren und Vorrichtung zur Behandlung oder Beschichtung von Oberflächen
DE102008009171B4 (de) * 2008-02-14 2014-07-17 Maschinenfabrik Reinhausen Gmbh Verfahren zum Verkleben von Silikon- und Elastomerbauteilen
WO2012005132A1 (fr) 2010-07-07 2012-01-12 独立行政法人産業技術総合研究所 Dispositif de traitement par irradiation plasma
TWI432228B (zh) * 2010-09-07 2014-04-01 Univ Nat Cheng Kung 微電漿產生裝置及其滅菌系統
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DE102013106315B4 (de) 2013-06-18 2016-09-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen eines physikalischen Plasmas
US9155184B2 (en) * 2013-11-18 2015-10-06 Applied Materials, Inc. Plasma generation source employing dielectric conduit assemblies having removable interfaces and related assemblies and methods
DE102014100385A1 (de) * 2014-01-15 2015-07-16 Plasma Innovations GmbH Plasmabeschichtungsverfahren zum Abscheiden einer Funktionsschicht und Abscheidevorrichtung
EP3289993A1 (fr) * 2016-09-02 2018-03-07 Leibniz-Institut für Plasmaforschung und Technologie e.V. Dispositif et procédé de génération d'un jet de plasma
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DE102017118652A1 (de) * 2017-08-16 2019-02-21 Hochschule Für Angewandte Wissenschaft Und Kunst Hildesheim/Holzminden/Göttingen Plasmageneratormodul und dessen Verwendung
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Also Published As

Publication number Publication date
EP1767068A2 (fr) 2007-03-28
WO2005125286A3 (fr) 2006-08-03
DE502005007992D1 (de) 2009-10-08
WO2005125286A2 (fr) 2005-12-29
DE102004029081A1 (de) 2006-01-05

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