EP1747905A2 - Dispositif de sécurité et méthode de fabrication - Google Patents
Dispositif de sécurité et méthode de fabrication Download PDFInfo
- Publication number
- EP1747905A2 EP1747905A2 EP06014552A EP06014552A EP1747905A2 EP 1747905 A2 EP1747905 A2 EP 1747905A2 EP 06014552 A EP06014552 A EP 06014552A EP 06014552 A EP06014552 A EP 06014552A EP 1747905 A2 EP1747905 A2 EP 1747905A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- mask
- carrier film
- cover layer
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/41—Marking using electromagnetic radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/355—Security threads
Definitions
- the invention relates to a security element for security papers, documents of value and the like having a carrier film with a cover layer, which in particular has visible in transmitted light coating-free areas in the form of patterns, characters or codes.
- the invention further relates to a method for producing such security elements.
- Security documents are often provided with security elements for the purpose of security, which allow verification of the authenticity of the value document and at the same time serve as protection against unauthorized reproduction.
- Value documents within the meaning of the present invention are, in particular, bank notes, shares, bonds, certificates, vouchers, checks, high-quality admission tickets, but also other papers which are subject to counterfeiting, such as passports and other identification documents, as well as product security elements such as labels, seals, packaging and the like.
- value document in the following includes all such documents and product assurance means.
- the security elements are often provided with a so-called negative writing.
- This negative writing is formed for example by metal-free areas in an otherwise continuous metallic coating of the carrier material of the security element.
- WO 99/13157 describes a washing method in which a translucent carrier sheet is printed with a desired pattern using a high pigment ink. Due to the high pigment content, the ink forms a porous, sublime color after drying. On the printed carrier film is then a thin Coating formed, which only partially covers the color body in the field of paint because of its large surface and the porous structure. The application of paint and the overlying covering layer can then be removed by washing with a suitable solvent, so that recesses are produced in the covering layer in the originally printed regions of the carrier film. By the achievable sharp contours can be introduced by printing a logo, for example, a legible negative writing in the cover layer.
- the present invention seeks to propose a method for producing a generic security element, which avoids the disadvantages of the prior art.
- the method should combine a fast production suitable for production conditions with high quality and high security against forgery of the generated security elements.
- the carrier film is transparent for the predetermined laser wavelength and the mask is applied to the second main surface of the carrier film, that is to say on the main surface opposite the absorbent covering layer.
- the mask can then be applied directly after a hologram embossing, so that an excellent registration to the hologram design can be achieved.
- the process steps do not have to be carried out in the stated order. Rather, it may be advantageous if first the mask is applied to the second main surface of the carrier film, and only then the absorbent cover layer is applied to the first main surface of the carrier film.
- the mask is printed on the first or second major surface of the carrier film.
- the printing layer of the mask can be formed in both process variants by a thin ink layer, in particular a thin opaque white layer.
- the mask is applied directly after a step of embossing a diffraction structure in the carrier film.
- the mask is thereby positioned to the diffraction structure, so that the information formed by the openings of the mask in the register is an information formed by the diffraction structure.
- the mask is applied as a negative mask whose areas transparent to the laser radiation of the defined wavelength define the shape of the desired coating-free areas.
- the mask must not be completely impermeable in the non-transparent areas, it is sufficient if there is such a large part the laser radiation absorbs that the remaining residual radiation no longer has the intensity required to remove the cover layer.
- the negative mask has openings in the form of the desired coating-free areas.
- an opaque cover layer or a color layer can be applied as the absorbent cover layer. It is self-evident that not only a single layer but also a layer sequence with a plurality of superimposed layers can be applied as cover layer, such as the color shift effect thin-layer element mentioned below.
- a metal layer or a layer sequence containing a metal layer is applied as cover layer, wherein the metal layer preferably consists of aluminum, copper, gold, iron, chromium, nickel, silver, platinum, palladium, titanium, another non-ferrous metal, or an alloy of these metals consists.
- the cover layer forms the metallization layer of a diffractive diffraction structure. The metal layer is locally removed by the action of the laser radiation or converted into a transparent modification. Both cases are referred to in this description as ablation of the cover layer.
- the method according to the invention is suitable not only for the local removal of thin cover layers (about 10 nm or more), but in particular also for the local removal of comparatively thick layers or layer sequences.
- a layer sequence with a total thickness of more than 400 nm, in particular more than 800 nm, can be applied as cover layer.
- a thin-film element with a color-shift effect is applied as the cover layer.
- a thin-film element expediently has a reflection layer, an absorber layer and a dielectric spacer layer arranged between the reflection layer and the absorber layer.
- Such a thin-film element can be applied with a layer thickness of up to about 1 .mu.m and according to the invention provided with coating-free regions.
- thin-film elements having a plurality of successive dielectric layers with different refractive indices even several ⁇ m of layer thickness are possible.
- These extremely thick layers can also be locally removed by the method according to the invention in order to produce desired patterns, characters or codes in the cover layer.
- the mask may represent an auxiliary layer which is removed after the laser application.
- the mask can also be formed by a layer which itself becomes part of the finished security element, and therefore does not have to be removed after laser application.
- the mask may be formed in particular by a metal layer.
- the mask is advantageously structured by a washing process or an etching process.
- the security element contains a thin-film element with a color-shift effect, the absorber layer of the thin-film element assuming the role of the cover layer and the reflection layer of the thin-film element assuming the role of the mask.
- the absorber layer is then removed by means of laser application through the reflection-layer mask.
- a color layer is applied as the cover layer and a reflection layer is applied as the mask. Again, the top layer is removed after the structuring of the reflection layer by the mask thus formed.
- a further advantageous embodiment is obtained when a color layer or a colored hologram embossing lacquer is used as the cover layer, and the metallization layer of a diffractive diffraction structure is used as the mask. In this way, attractive color effects can be produced in hologram films.
- the loading of the carrier film with the laser radiation advantageously takes place over a large area in order to simultaneously detect a plurality of mask openings or transparent regions of the mask.
- a laser spot is advantageously generated in the plane of the carrier film with a laser source and the carrier film is guided past the laser spot along a web running direction.
- the laser spot is smaller than the relevant width of the carrier foil or a benefit of the carrier foil, so that the laser spot is moved over a deflection device at high speed along the width direction of the running carrier foil.
- the laser spot is produced with such an extent in the plane of the carrier film that it covers substantially all the width of at least one benefit of the carrier film extending perpendicular to the web running direction without beam deflection. It is understood that the laser spot has peripheral areas in which the mask contains no openings, no longer needs to capture.
- the carrier film advantageously passes the laser spot at a high web speed of about 50 m / min or more, preferably even about 100 m / min or more. If several benefits are arranged side by side on the carrier foil, a plurality of laser sources can be used, each of which detects one of the benefits.
- Nd YAG lasers at 1.064 ⁇ m
- frequency doubled Nd YAG lasers at 532 nm or diode lasers in the near infrared, at about 808 nm or 940 nm can be used.
- the cover layer is permeable or reflective in this variant of the invention for the fixed laser wavelength, so that it is not removed by the laser radiation.
- the absorbent areas of the positive mask on the other hand, strongly absorb the laser radiation and heat up until the underlying cover layer is dissolved or converted by the resulting heating or chemical reaction.
- the invention also includes a security element for security papers, documents of value and the like having a carrier film with a cover layer, which has coatable regions in the form of patterns, characters or codes which can be produced in particular by transmitted light, which can be produced according to one of the method variants described above.
- the security element may in particular be a security thread or a wide security band.
- the security element is preferably equipped with an optically variable effect, preferably with a diffractive diffraction structure, in particular in the form of an embossed relief structure, and / or a Farbkipp concise harsh.
- a transparent carrier foil 20 which has opposing main faces 22 and 24.
- a mask 28 is printed on the second main surface 24 of the carrier film, which has openings 30 in the form of the desired negative writing.
- the mask 28 is formed by a thin opaque white layer.
- a full-surface opaque cover layer 26 is then applied.
- a 30 nm thick aluminum layer is vapor-deposited on the carrier film 20 as cover layer 26.
- FIG. 2 shows the carrier film after the mask 28 has been printed and the aluminum layer 26 has been vapor-deposited.
- the cover layer 26 may in particular be the metallization layer of a diffractive diffraction structure, which is subsequently impressed into the carrier film, such as a hologram.
- the cover layer 26 may also be formed by a more complex layer sequence, for example, by a thin-film element in other embodiments Color-shifting effect comprising a metallic reflection layer, a dielectric spacer layer and a semi-transparent absorber layer. Even such comparatively thick outer layers can be completely removed locally by the procedure described below and thus provided with a high-contrast negative information.
- the laser radiation 32 is incident through the openings 30 of the mask and the transparent support film 20 on the aluminum layer 26, which is locally removed by the action of the laser radiation in the exposed areas or converted into a transparent modification.
- coating-free regions 34 are formed in the otherwise opaque cover layer 26, as best seen in the plan view of FIG. 4.
- the introduced information appears as negative writing 34 in light of the dark metallic background of the cover layer 26. It is understood that other characters, patterns or codes can be introduced into the cover layer in the manner described.
- the generation of negative information by masking and laser ablation offers two major advantages: Firstly, a color with fine pigments can be used for the printing of the mask, so that when using laser radiation in the near infrared line widths down to 5 microns can be achieved. With shorter wavelength laser radiation, the resolution may even be increased even further. On the other hand, the demetalization with the laser with a suitable choice of Beam parameters and beam guidance done very quickly, so that a high throughput is achieved.
- the method according to the invention can advantageously also be combined with conventional demetallization methods, as explained below with reference to FIGS. 5 to 9.
- FIG. 5 shows a security element 60 with a transparent carrier foil 62, an optional hologram embossing lacquer layer 64 and a color shift effect thin-layer element 66 which comprises an absorber layer 68, for example an 8 nm thick chromium layer, a dielectric spacer layer 70, for example a 450 nm thick layer of SiO 2 or MgF 2 , and a reflector layer 72, for example, a 40 nm thick aluminum layer consists.
- an absorber layer 68 for example an 8 nm thick chromium layer
- a dielectric spacer layer 70 for example a 450 nm thick layer of SiO 2 or MgF 2
- a reflector layer 72 for example, a 40 nm thick aluminum layer consists.
- the reflector layer 72 is already provided with recesses 74 in the form of the desired negative writing, which were produced in an upstream process step, for example by a washing process of the type mentioned above or by an etching process.
- the structured reflector layer 72 acts as a mask for the subsequent laser demetallization, wherein FIG. 5 shows a situation in which the layer structure of the right image part 76 has already been exposed to laser radiation 80, while the security element in the left image part 78 has not yet been processed.
- the thin chromium layer 68 can already be removed with such a low irradiation energy that the reflector layer 72 substantially remains intact, so that the laser creates a structured thin-film element with recesses 74 in the reflector layer 72 and congruent uncoated regions 82 in the absorber layer 68.
- the dielectric spacer layer 70 is still present in the exemplary embodiment after laser application, but this does not affect the visual impression of the negative information, since the spacer layer 70 is transparent.
- the described two-stage approach has the advantage that the removal of the thin absorber layer requires a significantly lower laser energy than the removal of the entire thin-film element.
- the structured reflector layer itself is not removed and can therefore serve as a mask, so that it is possible to dispense with the application of a separate mask.
- existing devices and process steps for a washing process or an etching step can be used further.
- the layer structure of the thin-film element 66 may also be applied in reverse order to the carrier foil 62, as shown in FIG.
- the laser application 80 then takes place from the opposite side of the security element through the transparent carrier film 62.
- the reflector layer 72 structured by a washing process acts as a mask for the laser ablation of the thin absorber layer 68.
- a laser application 80 from the rear side of the carrier film 62 also lends itself to other designs.
- an aluminum layer 84 is first applied to a carrier film 62 and with a washing process in the form of the desired negative information be structured.
- a color layer 86 is then printed to produce an example copper or gold-colored color impression of the security element.
- the layer sequence of aluminum layer 84 and color layer 86 is subsequently exposed to laser radiation 80 from the rear side of the carrier film 62, wherein the structured aluminum layer 84 acts as a mask for the removal of the color layer 86.
- the structured aluminum layer 84 acts as a mask for the removal of the color layer 86.
- FIG. 8 shows a hologram foil 90 in which a color layer 92 is printed on a transparent carrier foil 62. Over the color layer 92, a hologram embossing lacquer layer 94 and a metal layer 96 of aluminum are deposited. Recesses 98 in the form of the desired negative information were introduced into the metal layer 96 by means of an etching process. In order to remove the ink layer 92 in the region of the recesses 98, the structure formed in this way is exposed to laser radiation 80, the structured metal layer 96 acting as a mask. The resulting hologram sheet 90 shows an example copper or gold hologram with transparent negative information.
- FIG. 8 The design of FIG. 8 is used when the laser energy needed to remove the color layer 92 is small enough not to significantly affect the metal layer 96. If a higher energy is required, then, for example, after the etching process, the resist layer 100 applied to the metal layer 96 can initially be retained, as shown in FIG. 9. The resist 100 then protects the metal layer 96 from undesired damage during the laser application and is removed only after the laser has been applied.
- FIGS. 8 and 9 can, of course, also be carried out with reverse layer construction.
- the sequence of the mask and the layer to be removed is then reversed and the laser application takes place from the back of the film.
- FIGS. 10 and 11 show the principle of laser demetallization with mask technology on a moving film web.
- the running film web 40 of which only one section is shown schematically in FIGS. 10 and 11, has the same structure as the security thread of FIG. 2, thus containing a carrier film 20, on one major surface of which an opaque cover layer 26 and on the latter other major surface a mask 28 is applied.
- the running direction of the film web 40 is indicated by the arrow 42.
- a possible high value compatible with the reliable introduction of the laser markings is selected for the web speed of the film web 40.
- the film web 40 generally has a plurality of adjacent benefits, of which only one is shown in FIGS. 10 and 11 for the sake of clarity.
- the side-by-side benefits can be achieved either by deflecting the laser beam or by using multiple, For example, the width of a benefit detecting laser sources are covered.
- the infrared radiation 44 of a diode laser 46 is deflected via an optical device 48 and thrown in the form of a laser spot 50 in the plane of the running film web 40.
- the mask openings 30 of the mask 28 are shown exaggerated in FIG. 10 for the sake of clarity compared to the laser spot 50.
- mask apertures 30 are typically designed to produce microfonts or other micropatterns and thus significantly smaller than the extent of the laser spot, which may be a few millimeters or even a few tens of mm.
- the extent of the laser spot 50 is smaller than the relevant width of the film web 40.
- the laser beam is therefore reciprocated to be inscribed in a direction 52 perpendicular to the direction 42 of the web to move all along the width of the film web To reach mask openings. This can be achieved for example in a conventional manner by a movable mirror or a mirrored polygon in the optical device 48.
- a sufficiently strong laser source 46 it is also possible to dispense with scanning the width of the film web 40, as shown in the illustration of FIG.
- the laser spot is generated in this variant by a suitable optics of the optical device 48 with such an extent in the plane of the film web 40 that it covers substantially the entire width of the film web or a benefit on the film web.
- the local removal of the cover layer 26 can thus be done without deflection of the laser beam and thus at the highest possible speed.
- a 13 mm wide film web 40 is driven at a web speed 42 of 100 m / min.
- the laser source used is a continuous-wave diode laser 46 with an output power P of 2.8 kW.
- an approximately rectangular laser spot 54 with a size of 13 ⁇ 8 mm 2 can be set on the film web, so that the entire width of the film web is covered by the laser spot.
- an energy density of 130 kJ / m 2 which is sufficient for demetallizing a 30 nm thick aluminum layer 26 in the region of the mask openings 30, is obtained for each surface element applied.
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- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Credit Cards Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005034671A DE102005034671A1 (de) | 2005-07-25 | 2005-07-25 | Sicherheitselement und Verfahren zu seiner Herstellung |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1747905A2 true EP1747905A2 (fr) | 2007-01-31 |
EP1747905A3 EP1747905A3 (fr) | 2014-07-09 |
EP1747905B1 EP1747905B1 (fr) | 2016-05-04 |
Family
ID=37036990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06014552.1A Not-in-force EP1747905B1 (fr) | 2005-07-25 | 2006-07-13 | Dispositif de sécurité et méthode de fabrication |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP1747905B1 (fr) |
DE (1) | DE102005034671A1 (fr) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009109343A3 (fr) * | 2008-03-06 | 2009-11-19 | Leonhard Kurz Stiftung & Co. Kg | Procédé de fabrication d'un élément en feuille |
US20090315316A1 (en) * | 2006-07-25 | 2009-12-24 | Ovd Kinegram Ag | Method of generating a laser mark in a security document, and security document of this kind |
US8534709B2 (en) | 2008-02-12 | 2013-09-17 | Giesecke & Devrient Gmbh | Security element and method for producing the same |
WO2014177267A1 (fr) * | 2013-04-29 | 2014-11-06 | Giesecke & Devrient Gmbh | Élément de sécurité optiquement variable |
WO2014207165A1 (fr) * | 2013-06-28 | 2014-12-31 | Leonhard Kurz Stiftung & Co. Kg | Procédé de fabrication d'un corps multicouche et corps multicouche |
WO2017157516A1 (fr) * | 2016-03-15 | 2017-09-21 | Giesecke+Devrient Mobile Security Gmbh | Support de données en forme de carte |
CN107531081A (zh) * | 2015-05-04 | 2018-01-02 | 费德欧尼公司 | 双面安全元件 |
EP3074239B1 (fr) | 2013-11-29 | 2018-12-19 | Leonhard Kurz Stiftung & Co. KG | Corps multicouche comme élément de sécurité et procédé pour sa production |
WO2019058091A1 (fr) * | 2017-09-21 | 2019-03-28 | De La Rue International Limited | Procédé de fabrication d'une feuille de sécurité |
EP3486092A1 (fr) * | 2017-11-21 | 2019-05-22 | Giesecke+Devrient Currency Technology GmbH | Procédé de fabrication d'un élément de sécurité |
WO2019219234A1 (fr) * | 2018-05-18 | 2019-11-21 | Giesecke+Devrient Currency Technology Gmbh | Procédé de production d'un élément de sécurité |
EP3881943A1 (fr) * | 2020-03-20 | 2021-09-22 | Karl Wörwag Lack- und Farbenfabrik GmbH & Co. KG | Feuille de laque de transfert destiné à laquer une pièce |
US20230331024A1 (en) * | 2022-04-15 | 2023-10-19 | Precision Converting Technologies, LLC | Optical security feature with embossed appearance |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012103758A1 (de) * | 2012-04-27 | 2013-10-31 | Schreiner Group Gmbh & Co. Kg | Manipulationsgeschützte Folie |
DE102017004784A1 (de) * | 2017-05-18 | 2018-11-22 | Giesecke+Devrient Currency Technology Gmbh | Verfahren zum Herstellen eines Sicherheitselements mit einem metallisierten Reliefbereich und zugehöriges Sicherheitselement |
CN110774795B (zh) * | 2019-10-12 | 2021-06-08 | 中钞印制技术研究院有限公司 | 防伪元件和防伪元件的加工方法 |
Citations (2)
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EP0181770A2 (fr) * | 1984-11-09 | 1986-05-21 | Canadian Patents and Development Limited Société Canadienne des Brevets et d'Exploitation Limitée | Méthode de fabrication d'un élément d'authentification à interférence optique |
WO2005053968A1 (fr) * | 2003-12-02 | 2005-06-16 | Giesecke & Devrient Gmbh | Support de donnees et procede pour le produire |
-
2005
- 2005-07-25 DE DE102005034671A patent/DE102005034671A1/de not_active Withdrawn
-
2006
- 2006-07-13 EP EP06014552.1A patent/EP1747905B1/fr not_active Not-in-force
Patent Citations (2)
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EP0181770A2 (fr) * | 1984-11-09 | 1986-05-21 | Canadian Patents and Development Limited Société Canadienne des Brevets et d'Exploitation Limitée | Méthode de fabrication d'un élément d'authentification à interférence optique |
WO2005053968A1 (fr) * | 2003-12-02 | 2005-06-16 | Giesecke & Devrient Gmbh | Support de donnees et procede pour le produire |
Cited By (33)
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EP2043877B1 (fr) | 2006-07-25 | 2015-03-04 | OVD Kinegram AG | Procédé de production d'un marquage laser dans un document de sécurité et document de sécurité associé |
US20090315316A1 (en) * | 2006-07-25 | 2009-12-24 | Ovd Kinegram Ag | Method of generating a laser mark in a security document, and security document of this kind |
US8298753B2 (en) * | 2006-07-25 | 2012-10-30 | Ovd Kinegram Ag | Method of generating a laser mark in a security document, and security document of this kind |
US8534709B2 (en) | 2008-02-12 | 2013-09-17 | Giesecke & Devrient Gmbh | Security element and method for producing the same |
US8720951B2 (en) | 2008-03-06 | 2014-05-13 | Leonhard Kurz Stiftung & Co. Kg | Method for producing a film element |
US20140205852A1 (en) * | 2008-03-06 | 2014-07-24 | Leonhard Kurz Stiftung & Co. Kg | Method for Producing a Film Element |
CN101959697B (zh) * | 2008-03-06 | 2014-07-30 | 雷恩哈德库兹基金两合公司 | 薄膜元件的制造方法以及薄膜元件 |
US10179472B2 (en) | 2008-03-06 | 2019-01-15 | Leonhard Kurz Stiftung & Co. Kg | Method for producing a film element |
WO2009109343A3 (fr) * | 2008-03-06 | 2009-11-19 | Leonhard Kurz Stiftung & Co. Kg | Procédé de fabrication d'un élément en feuille |
US9463659B2 (en) | 2008-03-06 | 2016-10-11 | Leonhard Kurz Stiftung & Co. Kg | Method for producing a film element |
WO2014177267A1 (fr) * | 2013-04-29 | 2014-11-06 | Giesecke & Devrient Gmbh | Élément de sécurité optiquement variable |
US9697456B2 (en) | 2013-04-29 | 2017-07-04 | Giesecke & Devrient Gmbh | Optically variable security element |
CN105228836A (zh) * | 2013-04-29 | 2016-01-06 | 德国捷德有限公司 | 光学可变防伪元件 |
AU2014301007B2 (en) * | 2013-06-28 | 2017-11-30 | Leonhard Kurz Stiftung & Co. Kg | Method for producing a multilayer element, and multilayer element |
US10926571B2 (en) | 2013-06-28 | 2021-02-23 | Leonhard Kurz Stiftung & Co. Kg | Method for producing a multilayer element, and multilayer element |
CN105431302A (zh) * | 2013-06-28 | 2016-03-23 | 雷恩哈德库兹基金两合公司 | 制备多层体的方法以及多层体 |
US10029505B2 (en) | 2013-06-28 | 2018-07-24 | Leonhard Kurz Stiftung & Co. Kg | Method for producing a multilayer element, and multilayer element |
RU2664356C2 (ru) * | 2013-06-28 | 2018-08-16 | Леонхард Курц Штифтунг Унд Ко. Кг | Способ изготовления многослойного элемента, а также многослойный элемент |
WO2014207165A1 (fr) * | 2013-06-28 | 2014-12-31 | Leonhard Kurz Stiftung & Co. Kg | Procédé de fabrication d'un corps multicouche et corps multicouche |
CN105431302B (zh) * | 2013-06-28 | 2017-08-08 | 雷恩哈德库兹基金两合公司 | 制备多层体的方法以及多层体 |
EP3074239B2 (fr) † | 2013-11-29 | 2022-04-13 | Leonhard Kurz Stiftung & Co. KG | Corps multicouche comme élément de sécurité et procédé pour sa production |
US10850551B2 (en) | 2013-11-29 | 2020-12-01 | Leonhard Kurz Stiftung & Co. Kg | Multi-layer body and method for the production thereof |
EP3074239B1 (fr) | 2013-11-29 | 2018-12-19 | Leonhard Kurz Stiftung & Co. KG | Corps multicouche comme élément de sécurité et procédé pour sa production |
CN107531081A (zh) * | 2015-05-04 | 2018-01-02 | 费德欧尼公司 | 双面安全元件 |
US10286717B2 (en) | 2015-05-04 | 2019-05-14 | Fedrigoni Spa | Double-sided security element |
CN107531081B (zh) * | 2015-05-04 | 2019-06-25 | 费德欧尼公司 | 双面安全元件 |
WO2017157516A1 (fr) * | 2016-03-15 | 2017-09-21 | Giesecke+Devrient Mobile Security Gmbh | Support de données en forme de carte |
WO2019058091A1 (fr) * | 2017-09-21 | 2019-03-28 | De La Rue International Limited | Procédé de fabrication d'une feuille de sécurité |
GB2566706B (en) * | 2017-09-21 | 2020-08-26 | De La Rue Int Ltd | A method of manufacturing a security sheet |
EP3486092A1 (fr) * | 2017-11-21 | 2019-05-22 | Giesecke+Devrient Currency Technology GmbH | Procédé de fabrication d'un élément de sécurité |
WO2019219234A1 (fr) * | 2018-05-18 | 2019-11-21 | Giesecke+Devrient Currency Technology Gmbh | Procédé de production d'un élément de sécurité |
EP3881943A1 (fr) * | 2020-03-20 | 2021-09-22 | Karl Wörwag Lack- und Farbenfabrik GmbH & Co. KG | Feuille de laque de transfert destiné à laquer une pièce |
US20230331024A1 (en) * | 2022-04-15 | 2023-10-19 | Precision Converting Technologies, LLC | Optical security feature with embossed appearance |
Also Published As
Publication number | Publication date |
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EP1747905B1 (fr) | 2016-05-04 |
EP1747905A3 (fr) | 2014-07-09 |
DE102005034671A1 (de) | 2007-02-01 |
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