EP1717352A3 - Appareil pour le revêtement électrolytique - Google Patents
Appareil pour le revêtement électrolytique Download PDFInfo
- Publication number
- EP1717352A3 EP1717352A3 EP06005414A EP06005414A EP1717352A3 EP 1717352 A3 EP1717352 A3 EP 1717352A3 EP 06005414 A EP06005414 A EP 06005414A EP 06005414 A EP06005414 A EP 06005414A EP 1717352 A3 EP1717352 A3 EP 1717352A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- plate
- solution tank
- solution
- electroplating
- electroplating apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/008—Current shielding devices
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005125538A JP2006299367A (ja) | 2005-04-22 | 2005-04-22 | 電気めっき試験器 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1717352A2 EP1717352A2 (fr) | 2006-11-02 |
EP1717352A3 true EP1717352A3 (fr) | 2007-01-17 |
Family
ID=36809576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06005414A Withdrawn EP1717352A3 (fr) | 2005-04-22 | 2006-03-16 | Appareil pour le revêtement électrolytique |
Country Status (6)
Country | Link |
---|---|
US (1) | US20060237304A1 (fr) |
EP (1) | EP1717352A3 (fr) |
JP (1) | JP2006299367A (fr) |
KR (1) | KR20060111385A (fr) |
CN (1) | CN1865519B (fr) |
TW (1) | TW200637935A (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009006282A1 (de) * | 2009-01-27 | 2010-07-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung metallisch kristalliner Oberflächenstrukturen im Wege einer galvanischen Metallabscheidung |
EP2246460A1 (fr) * | 2009-04-28 | 2010-11-03 | Golden Eagle Trading Ltd | Installation de traitement de surface de pièces |
JP6226229B2 (ja) | 2013-08-19 | 2017-11-08 | 株式会社山本鍍金試験器 | めっき装置及びこれを用いたセンサ装置 |
DE112018007274B4 (de) * | 2018-03-13 | 2021-12-02 | Yamamoto-Ms Co., Ltd. | Beschichtungsvorrichtung und Beschichtungssystem |
CN110565154A (zh) * | 2019-09-06 | 2019-12-13 | 陕西汉和新材料科技有限公司 | 一种新型铜箔防氧化电镀阳极板 |
JP7316908B2 (ja) * | 2019-10-30 | 2023-07-28 | 株式会社荏原製作所 | アノード組立体 |
CN112853445B (zh) * | 2021-01-08 | 2022-08-26 | 上海戴丰科技有限公司 | 一种阳极可侧向抽拉式晶圆水平电镀池及晶圆水平电镀装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5312532A (en) * | 1993-01-15 | 1994-05-17 | International Business Machines Corporation | Multi-compartment eletroplating system |
US6077412A (en) * | 1997-08-22 | 2000-06-20 | Cutek Research, Inc. | Rotating anode for a wafer processing chamber |
US6416647B1 (en) * | 1998-04-21 | 2002-07-09 | Applied Materials, Inc. | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
US20040037682A1 (en) * | 2002-08-13 | 2004-02-26 | Junichiro Yoshioka | Substrate holder, plating apparatus, and plating method |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE7603626L (sv) * | 1975-03-27 | 1977-01-04 | Otto Alfred Becker | Anordning for att galvanisera metallytor, serskilt vid snittkantytor hos genom stapling tillskurna platar |
US4129494A (en) * | 1977-05-04 | 1978-12-12 | Norman Telfer E | Electrolytic cell for electrowinning of metals |
US4459194A (en) * | 1983-03-10 | 1984-07-10 | At&T Technologies, Inc. | Electroplating apparatus |
US5039381A (en) * | 1989-05-25 | 1991-08-13 | Mullarkey Edward J | Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like |
US5242563A (en) * | 1992-03-12 | 1993-09-07 | The United States Of America As Represented By The Secretary Of The Navy | Molten salt reactor for potentiostatic electroplating |
DE19729893C2 (de) * | 1997-07-12 | 1999-04-29 | Mc Micro Compact Car Ag | Lenksäule in einem Kraftfahrzeug |
US6143146A (en) * | 1998-08-25 | 2000-11-07 | Strom; Doug | Filter system |
US6217727B1 (en) * | 1999-08-30 | 2001-04-17 | Micron Technology, Inc. | Electroplating apparatus and method |
US6627052B2 (en) * | 2000-12-12 | 2003-09-30 | International Business Machines Corporation | Electroplating apparatus with vertical electrical contact |
JP3588777B2 (ja) | 2002-04-12 | 2004-11-17 | 株式会社山本鍍金試験器 | 電気めっき試験器の陰極カートリッジ |
US20050189228A1 (en) * | 2004-02-27 | 2005-09-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Electroplating apparatus |
-
2005
- 2005-04-22 JP JP2005125538A patent/JP2006299367A/ja active Pending
-
2006
- 2006-03-16 TW TW095108977A patent/TW200637935A/zh unknown
- 2006-03-16 EP EP06005414A patent/EP1717352A3/fr not_active Withdrawn
- 2006-03-17 US US11/377,415 patent/US20060237304A1/en not_active Abandoned
- 2006-04-19 KR KR1020060035497A patent/KR20060111385A/ko not_active Application Discontinuation
- 2006-04-21 CN CN2006100745166A patent/CN1865519B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5312532A (en) * | 1993-01-15 | 1994-05-17 | International Business Machines Corporation | Multi-compartment eletroplating system |
US6077412A (en) * | 1997-08-22 | 2000-06-20 | Cutek Research, Inc. | Rotating anode for a wafer processing chamber |
US6416647B1 (en) * | 1998-04-21 | 2002-07-09 | Applied Materials, Inc. | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
US20040037682A1 (en) * | 2002-08-13 | 2004-02-26 | Junichiro Yoshioka | Substrate holder, plating apparatus, and plating method |
Also Published As
Publication number | Publication date |
---|---|
JP2006299367A (ja) | 2006-11-02 |
CN1865519A (zh) | 2006-11-22 |
CN1865519B (zh) | 2010-08-11 |
US20060237304A1 (en) | 2006-10-26 |
EP1717352A2 (fr) | 2006-11-02 |
TW200637935A (en) | 2006-11-01 |
KR20060111385A (ko) | 2006-10-27 |
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