EP1649524A1 - Electroluminescent device with homogeneous brightness - Google Patents

Electroluminescent device with homogeneous brightness

Info

Publication number
EP1649524A1
EP1649524A1 EP04744483A EP04744483A EP1649524A1 EP 1649524 A1 EP1649524 A1 EP 1649524A1 EP 04744483 A EP04744483 A EP 04744483A EP 04744483 A EP04744483 A EP 04744483A EP 1649524 A1 EP1649524 A1 EP 1649524A1
Authority
EP
European Patent Office
Prior art keywords
electrode
layer
metallic structure
electroluminescent device
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04744483A
Other languages
German (de)
English (en)
French (fr)
Inventor
Hans-Helmut Philips IP & Standards GmbH BECHTEL
Dietrich Philips IP & Standards GmbH BERTRAM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Intellectual Property and Standards GmbH
Koninklijke Philips NV
Original Assignee
Philips Intellectual Property and Standards GmbH
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Intellectual Property and Standards GmbH, Koninklijke Philips Electronics NV filed Critical Philips Intellectual Property and Standards GmbH
Priority to EP04744483A priority Critical patent/EP1649524A1/en
Publication of EP1649524A1 publication Critical patent/EP1649524A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/805Electrodes
    • H10K50/81Anodes
    • H10K50/814Anodes combined with auxiliary electrodes, e.g. ITO layer combined with metal lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details

Definitions

  • the invention relates to an electroluminescent device equipped with a substrate and a layer assembly comprising at least a first electrode, an electroluminescent layer and a second electrode.
  • Electronically triggered display systems are known, and widely encountered, in various embodiments based on various principles.
  • One principle uses organic light-emitting diodes, known as OLEDs, as the light source.
  • OLEDs organic light-emitting diodes are constructed from multiple functional layers.
  • a typical structure of an OLED is described in "Philips Journal of Research, 1998, 51, 467".
  • a typical structure comprises a layer of ITO (Indium Tin Oxide) as the transparent electrode (anode), a conductive polymer layer, an electroluminescent layer, i.e.
  • a structure of this kind is normally applied to a substrate, usually glass. The generated light reaches the observer through the substrate.
  • An OLED with a light-emitting polymer in the electroluminescent layer is also designated a polyLED or PLED.
  • the curve of the brightness as a function of the applied voltage of all organic LEDs is characterized by a threshold voltage, above which luminescence is observed, and a subsequent, very steep linear increase in brightness.
  • the threshold voltage lies approximately in the range from 3 to 8 V.
  • the brightness increases by approximately a factor of 4 when the applied voltage is increased by 1 V.
  • Efficient OLEDs are characterized by a low threshold voltage, and are operated at low voltages from 2 to 8 V. In order to guarantee a uniform brightness over the emitting surface, the voltage drop over the cathode and anode must not be too great. In addition to a reduced brightness, the voltage drop also leads to a reduction in the efficiency of the OLED.
  • the voltage drop U over an electrode of an electroluminescent device is described in good approximation by the following equation:
  • F E cross-sectional area of the electrode
  • F EL area of the electroluminescent device.
  • a current density I of 2 mA-cm "2 is reached at an operating voltage of 5 V.
  • the brightness of a 10 cm wide light source thus declines by more than a factor of 5 over the width.
  • the brightness declines from the edge towards the center by more than a factor of 5.
  • the specific resistance of the electrode comprising ITO may be reduced only linearly with the increasing of the layer thickness. However, this leads to increased manufacturing costs and a reduced visual transmission of the electrode.
  • metals have a considerably smaller specific resistance than ITO, in order to achieve a sufficient visual transparency the layer thicknesses of metallic electrodes have to be so thin that no appreciable advantage is achieved as a result. It is therefore an object of the present invention to provide an electroluminescent device equipped with a homogeneous brightness over the entire electroluminescent device.
  • an electroluminescent device equipped with a substrate, a metallic structure and a layer assembly comprising at least a first electrode, an electroluminescent layer and a second electrode, wherein the metallic structure is in electrical contact with the first electrode, and the layer resistance of the metallic structure is lower than the layer resistance of the first electrode. Owing to the electrical contact of the metallic structure with the first transparent electrode, the layer resistance of the first transparent electrode, and thus the voltage drop over the first transparent electrode, is reduced.
  • the advantageous electroluminescent device may be obtained in a simple, cost-effective manner, without the manufacturing process having to be expanded with deposition and structuring steps. Furthermore, this embodiment is advantageous in the case of electroluminescent devices with thin layers.
  • the layer resistance of the first electrode may be reduced particularly effectively.
  • the proportional area of the metal is small compared with the overall area of the substrate, so reflection losses are low and the emission of the light is homogeneous.
  • the pattern of the metallic structure may be matched to existing structures within the layer assembly.
  • Fig. 1 shows, in cross-section, an electroluminescent device in accordance with the invention.
  • Fig. 2 shows, in cross-section, a further electroluminescent device in accordance with the invention.
  • an electroluminescent device is equipped with a substrate 1, preferably a transparent glass panel or a transparent plastic panel.
  • the plastic panel may comprise, for example, polyethylene terephthalate (PET).
  • Adjoining the substrate 1 is a layer assembly comprising at least a first electrode 2, an electroluminescent layer 3 and a second electrode 4.
  • the first electrode 2 acts as the anode and the second electrode 4 acts as the cathode.
  • the first electrode 2 is preferably transparent, and may, for example, comprise p-doped silicon, indium-doped tin oxide (ITO) or antimony-doped tin oxide (ATO).
  • the first electrode 2 comprises ITO.
  • the first electrode 2 is not structured, but rather is executed as a flat surface.
  • the second electrode 4 may, for example, comprise a metal such as aluminum, copper, silver or gold, an alloy or n-doped silicon. It may be preferred that the second electrode 4 is equipped with two or more conductive layers. It may, in particular, be preferred that the second electrode 4 comprises a first layer comprising an alkaline earth metal, such as calcium or barium, and a second layer comprising aluminum.
  • the second electrode 4 is preferably structured and equipped with a plurality of parallel strips comprising the conductive material or conductive materials. Alternatively, the second electrode 4 may be unstructured and executed as a flat surface.
  • the electroluminescent layer 3 may comprise a light-emitting polymer or small, organic molecules. Depending on the type of material used in the electroluminescent layer 3, the device is designated an LEP (Light Emitting Polymer) or a polyLED or smOLED (Small Molecule Organic Light Emitting Diode).
  • the electroluminescent layer 3 comprises a light-emitting polymer. Examples of materials that may be used as light-emitting polymers are poly(p-phenylvinylene) (PPV) or a substituted PPV, such as dialkoxy- substituted PPV.
  • the electrodes 2, 4 When an appropriate voltage, typically of a few volts, is applied to the electrodes 2, 4, positive and negative charge carriers are injected, and these migrate to the electroluminescent layer 3, where they recombine and thereby generate light. This light travels through the first electrode 2 and the substrate 1 to the observer. If the electroluminescent layer 3 is doped with fluorescing pigments, the light generated by an electron hole recombination excites the pigments, which in turn emit light, for instance in one of three primary colors. Alternatively, the layer assembly may be equipped with additional layers, such as a hole transporting layer and/or an electron transporting layer. A hole transporting layer is arranged between the first electrode 2 and the electroluminescent layer 3.
  • an appropriate voltage typically of a few volts
  • An electron transporting layer is located between the second electrode 4 and the electroluminescent layer 3. Both layers preferably comprise conductive polymers.
  • a hole transporting layer may, for example, comprise a mixture of polyethylene dioxythiophene (PDOT) and poly(styrene sulfonate).
  • PDOT polyethylene dioxythiophene
  • STYRENE poly(styrene sulfonate)
  • Preferably incorporated into the substrate 1 is a metallic structure 5, comprising, for example, aluminum, copper, silver or gold or an alloy.
  • the metallic structure 5 may, for example, comprise strips, in particular parallel strips. The distance between the individual strips may be, but does not have to be, constant.
  • the metallic structure 5 may be a grid comprising a plurality of strips, arranged to be perpendicular in relation to each other.
  • the metallic structure 5 may also comprise parallel wavy lines, zigzag lines, sawtooth lines or similar patterns. The pattern of the metallic structure 5 may thereby also be matched to existing patterns in the layer structure of the layer assembly.
  • a grid comprising a metallic wire may be rolled into the still liquid glass.
  • just individual metallic wires may also be rolled into the liquid glass.
  • a further option for manufacturing a metallic structure 5 in a substrate 1 comprising glass comprises the generation, using known methods, of grooves in the substrate
  • the metallic structure 5 may be applied to the substrate 1. This may be done by, for example, vapor deposition methods, screen printing of conductive metal pastes or by photolithographic methods. In both cases, it is preferred that the metallic structure covers not more than 10% of the surface of the substrate 1. In the event that the metallic structure 5 is located in the substrate 1, covering means that the surface of the substrate that adjoins the first electrode
  • the layer resistance of a metallic layer also depends on the layer thickness, so the layer resistance of a thicker layer is lower than in the case of a thinner layer comprising the same conductive material. Owing to the electrical contact of the metallic structure 5 with a lower layer resistance than the first electrode, the layer resistance of the first electrode 2 is reduced overall.
  • Embodiment Example 1 A 356 mm x 356 mm glass substrate 1 is coated with a photosensitive layer of polyurethane. The polyurethane layer was exposed and structured in such a way that the polyurethane was removed in strips over a width of 200 ⁇ m spaced at 20 mm.
  • the grooves in the substrate 1 comprising glass were filled with a conductive silver paste by multiple screen printing operations.
  • the layers of the layer assembly such as the first electrode 2 comprising ITO, a hole transporting layer comprising polyethylene dioxythiophene (PDOT) and poly(styrene sulfonate), an electroluminescent layer 3 comprising PPV and a second, unstructured electrode 4 comprising a first, 5 nm thick layer with barium and a second, 200 nm thick layer of aluminum, were then applied using known methods.
  • Embodiment Example 2 A Cu wire grid with individual wires with a layer thickness of 400 ⁇ m and a width of 200 ⁇ m was rolled into a still liquid glass substrate 1. The distance between the individual wires was 25 mm. Following cooling and solidification of the glass substrate 1, the further layers were applied by analogy with embodiment example 1. An electroluminescent device with improved homogeneity of light emission was obtained.
EP04744483A 2003-07-16 2004-07-05 Electroluminescent device with homogeneous brightness Withdrawn EP1649524A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP04744483A EP1649524A1 (en) 2003-07-16 2004-07-05 Electroluminescent device with homogeneous brightness

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03102176 2003-07-16
PCT/IB2004/051115 WO2005008800A1 (en) 2003-07-16 2004-07-05 Electroluminescent device with homogeneous brightness
EP04744483A EP1649524A1 (en) 2003-07-16 2004-07-05 Electroluminescent device with homogeneous brightness

Publications (1)

Publication Number Publication Date
EP1649524A1 true EP1649524A1 (en) 2006-04-26

Family

ID=34072635

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04744483A Withdrawn EP1649524A1 (en) 2003-07-16 2004-07-05 Electroluminescent device with homogeneous brightness

Country Status (6)

Country Link
US (1) US20060180807A1 (zh)
EP (1) EP1649524A1 (zh)
JP (1) JP2007519177A (zh)
CN (1) CN1823431A (zh)
TW (1) TW200509429A (zh)
WO (1) WO2005008800A1 (zh)

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TWI328984B (en) * 2006-08-29 2010-08-11 Ind Tech Res Inst Substrate structures and fabrication methods thereof
DE102006052029B4 (de) * 2006-09-22 2020-01-09 Osram Oled Gmbh Lichtemittierende Vorrichtung
US8884322B2 (en) 2006-09-22 2014-11-11 Osram Opto Semiconductor Gmbh Light-emitting device
CN101154643B (zh) * 2006-09-25 2010-09-29 财团法人工业技术研究院 基板结构及基板结构的制作方法
FR2924274B1 (fr) * 2007-11-22 2012-11-30 Saint Gobain Substrat porteur d'une electrode, dispositif electroluminescent organique l'incorporant, et sa fabrication
CN102929047B (zh) * 2008-02-28 2015-05-20 住友化学株式会社 透明薄膜电极
FR2938700A1 (fr) * 2008-11-25 2010-05-21 Commissariat Energie Atomique Diode organique electroluminescente avec nervures electriquement conductrices au niveau de l'electrode inferieure, procede de realisation et panneau d'eclairage.
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GB201007669D0 (en) 2010-05-07 2010-06-23 Epigem Ltd Composite electrode for molecular electronic devices and method of manufacture thereof
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DE102015100336A1 (de) 2015-01-12 2016-07-14 Osram Oled Gmbh Verfahren zur Herstellung einer Trägervorrichtung für ein organisches Licht emittierendes Bauelement und zur Herstellung eines organischen Licht emittierenden Bauelements
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Also Published As

Publication number Publication date
WO2005008800A1 (en) 2005-01-27
TW200509429A (en) 2005-03-01
CN1823431A (zh) 2006-08-23
JP2007519177A (ja) 2007-07-12
US20060180807A1 (en) 2006-08-17

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