EP1519411A3 - Semiconductor device and method for fabricating the same - Google Patents

Semiconductor device and method for fabricating the same Download PDF

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Publication number
EP1519411A3
EP1519411A3 EP04022445A EP04022445A EP1519411A3 EP 1519411 A3 EP1519411 A3 EP 1519411A3 EP 04022445 A EP04022445 A EP 04022445A EP 04022445 A EP04022445 A EP 04022445A EP 1519411 A3 EP1519411 A3 EP 1519411A3
Authority
EP
European Patent Office
Prior art keywords
metal pattern
insulating film
semiconductor device
fabricating
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04022445A
Other languages
German (de)
French (fr)
Other versions
EP1519411A2 (en
Inventor
Shin Hashimoto
Tadaaki Mimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Panasonic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp filed Critical Panasonic Corp
Publication of EP1519411A2 publication Critical patent/EP1519411A2/en
Publication of EP1519411A3 publication Critical patent/EP1519411A3/en
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
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    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
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    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

A semiconductor device comprises a first insulating film formed on a semiconductor substrate, a first metal pattern formed on the first insulating film, a second insulating film formed on the first metal pattern, a second metal pattern formed on the second insulating film, and a third metal pattern formed in the second insulating film and connecting between the first metal pattern and the second metal pattern. The third metal pattern is a single continuous structure, and the principal orientation axes of crystals of a metal constituting the third metal pattern are parallel to the principal surface of the semiconductor substrate.
EP04022445A 2003-09-26 2004-09-21 Semiconductor device and method for fabricating the same Withdrawn EP1519411A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003335267 2003-09-26
JP2003335267 2003-09-26

Publications (2)

Publication Number Publication Date
EP1519411A2 EP1519411A2 (en) 2005-03-30
EP1519411A3 true EP1519411A3 (en) 2010-01-13

Family

ID=34191523

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04022445A Withdrawn EP1519411A3 (en) 2003-09-26 2004-09-21 Semiconductor device and method for fabricating the same

Country Status (6)

Country Link
US (2) US7312530B2 (en)
EP (1) EP1519411A3 (en)
JP (1) JP4630919B2 (en)
KR (1) KR100626923B1 (en)
CN (1) CN1601735B (en)
TW (1) TWI265581B (en)

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US7741207B2 (en) 2010-06-22
EP1519411A2 (en) 2005-03-30

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