EP1487844A1 - Methode de preparation de monomeres de carboxylate trihydrocarbylsilyles - Google Patents
Methode de preparation de monomeres de carboxylate trihydrocarbylsilylesInfo
- Publication number
- EP1487844A1 EP1487844A1 EP03742960A EP03742960A EP1487844A1 EP 1487844 A1 EP1487844 A1 EP 1487844A1 EP 03742960 A EP03742960 A EP 03742960A EP 03742960 A EP03742960 A EP 03742960A EP 1487844 A1 EP1487844 A1 EP 1487844A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- process according
- acid
- alkyl
- substituted
- pyridine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 56
- 239000000178 monomer Substances 0.000 title claims abstract description 23
- 150000007942 carboxylates Chemical class 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title claims abstract description 6
- 239000003054 catalyst Substances 0.000 claims abstract description 17
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims abstract description 11
- -1 2,3-dimethylbutyl Chemical group 0.000 claims description 70
- 125000003118 aryl group Chemical group 0.000 claims description 21
- 239000002253 acid Substances 0.000 claims description 20
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 15
- 230000000269 nucleophilic effect Effects 0.000 claims description 15
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 15
- 125000003107 substituted aryl group Chemical group 0.000 claims description 15
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 9
- DCUFMVPCXCSVNP-UHFFFAOYSA-N methacrylic anhydride Chemical compound CC(=C)C(=O)OC(=O)C(C)=C DCUFMVPCXCSVNP-UHFFFAOYSA-N 0.000 claims description 9
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 8
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims description 8
- 125000004122 cyclic group Chemical group 0.000 claims description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 7
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 claims description 7
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 7
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 5
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 5
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 5
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 claims description 4
- HWWYDZCSSYKIAD-UHFFFAOYSA-N 3,5-dimethylpyridine Chemical compound CC1=CN=CC(C)=C1 HWWYDZCSSYKIAD-UHFFFAOYSA-N 0.000 claims description 4
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 4
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 claims description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 4
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 claims description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 4
- 229920006395 saturated elastomer Polymers 0.000 claims description 4
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 4
- FGYADSCZTQOAFK-UHFFFAOYSA-N 1-methylbenzimidazole Chemical compound C1=CC=C2N(C)C=NC2=C1 FGYADSCZTQOAFK-UHFFFAOYSA-N 0.000 claims description 3
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 claims description 3
- LDZYRENCLPUXAX-UHFFFAOYSA-N 2-methyl-1h-benzimidazole Chemical compound C1=CC=C2NC(C)=NC2=C1 LDZYRENCLPUXAX-UHFFFAOYSA-N 0.000 claims description 3
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims description 3
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 claims description 3
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 claims description 3
- 125000005917 3-methylpentyl group Chemical group 0.000 claims description 3
- FGWQRDGADJMULT-UHFFFAOYSA-N 4-(4-methylpiperidin-1-yl)pyridine Chemical compound C1CC(C)CCN1C1=CC=NC=C1 FGWQRDGADJMULT-UHFFFAOYSA-N 0.000 claims description 3
- RGUKYNXWOWSRET-UHFFFAOYSA-N 4-pyrrolidin-1-ylpyridine Chemical compound C1CCCN1C1=CC=NC=C1 RGUKYNXWOWSRET-UHFFFAOYSA-N 0.000 claims description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 3
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 claims description 3
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 claims description 3
- GIWQSPITLQVMSG-UHFFFAOYSA-N 1,2-dimethylimidazole Chemical compound CC1=NC=CN1C GIWQSPITLQVMSG-UHFFFAOYSA-N 0.000 claims description 2
- DVVGIUUJYPYENY-UHFFFAOYSA-N 1-methylpyridin-2-one Chemical compound CN1C=CC=CC1=O DVVGIUUJYPYENY-UHFFFAOYSA-N 0.000 claims description 2
- OYPBUQASUUMJKG-UHFFFAOYSA-N 1-methylpyridin-4-one Chemical compound CN1C=CC(=O)C=C1 OYPBUQASUUMJKG-UHFFFAOYSA-N 0.000 claims description 2
- MCIBIWQWRHNORM-UHFFFAOYSA-N 4,4-dimethylimidazole Chemical compound CC1(C)C=NC=N1 MCIBIWQWRHNORM-UHFFFAOYSA-N 0.000 claims description 2
- BGNGWHSBYQYVRX-UHFFFAOYSA-N 4-(dimethylamino)benzaldehyde Chemical compound CN(C)C1=CC=C(C=O)C=C1 BGNGWHSBYQYVRX-UHFFFAOYSA-N 0.000 claims description 2
- 229960000549 4-dimethylaminophenol Drugs 0.000 claims description 2
- MTPBUCCXRGSDCR-UHFFFAOYSA-N 4-piperidin-1-ylpyridine Chemical compound C1CCCCN1C1=CC=NC=C1 MTPBUCCXRGSDCR-UHFFFAOYSA-N 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- LIHLSLRANKCHLV-KQQUZDAGSA-N [(e)-2-methylbut-2-enoyl] (e)-2-methylbut-2-enoate Chemical compound C\C=C(/C)C(=O)OC(=O)C(\C)=C\C LIHLSLRANKCHLV-KQQUZDAGSA-N 0.000 claims description 2
- VJDDQSBNUHLBTD-GGWOSOGESA-N [(e)-but-2-enoyl] (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(=O)\C=C\C VJDDQSBNUHLBTD-GGWOSOGESA-N 0.000 claims description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- ADPMHRDERZTFIN-UHFFFAOYSA-N epinastine hydrobromide Chemical compound Br.C1C2=CC=CC=C2C2CN=C(N)N2C2=CC=CC=C21 ADPMHRDERZTFIN-UHFFFAOYSA-N 0.000 claims description 2
- 235000011167 hydrochloric acid Nutrition 0.000 claims description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 2
- 239000003456 ion exchange resin Substances 0.000 claims description 2
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 2
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 2
- 229910052901 montmorillonite Inorganic materials 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims description 2
- ILVXOBCQQYKLDS-UHFFFAOYSA-N pyridine N-oxide Chemical compound [O-][N+]1=CC=CC=C1 ILVXOBCQQYKLDS-UHFFFAOYSA-N 0.000 claims description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 2
- VJDDQSBNUHLBTD-UHFFFAOYSA-N trans-crotonic acid-anhydride Natural products CC=CC(=O)OC(=O)C=CC VJDDQSBNUHLBTD-UHFFFAOYSA-N 0.000 claims description 2
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 claims description 2
- 230000000063 preceeding effect Effects 0.000 claims 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 29
- 238000006243 chemical reaction Methods 0.000 description 14
- 239000002585 base Substances 0.000 description 12
- 230000003373 anti-fouling effect Effects 0.000 description 9
- 239000003973 paint Substances 0.000 description 8
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 150000003254 radicals Chemical class 0.000 description 6
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- 230000009466 transformation Effects 0.000 description 4
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 235000005074 zinc chloride Nutrition 0.000 description 3
- 239000011592 zinc chloride Substances 0.000 description 3
- FOLFSXVEULXAIV-PFONDFGASA-N (Z)-4-[tert-butyl(diphenyl)silyl]oxy-4-oxobut-2-enoic acid Chemical compound CC(C)(C)[Si](C1=CC=CC=C1)(C1=CC=CC=C1)OC(/C=C\C(O)=O)=O FOLFSXVEULXAIV-PFONDFGASA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000001072 heteroaryl group Chemical group 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- 239000012429 reaction media Substances 0.000 description 2
- KNNOZYMZRGTZQM-UHFFFAOYSA-N tri(propan-2-yl)silyl 2-methylprop-2-enoate Chemical compound CC(C)[Si](C(C)C)(C(C)C)OC(=O)C(C)=C KNNOZYMZRGTZQM-UHFFFAOYSA-N 0.000 description 2
- WEAZWKYSTGLBSQ-UHFFFAOYSA-N tributylsilyl 2-methylprop-2-enoate Chemical compound CCCC[Si](CCCC)(CCCC)OC(=O)C(C)=C WEAZWKYSTGLBSQ-UHFFFAOYSA-N 0.000 description 2
- WILBTFWIBAOWLN-UHFFFAOYSA-N triethyl(triethylsilyloxy)silane Chemical compound CC[Si](CC)(CC)O[Si](CC)(CC)CC WILBTFWIBAOWLN-UHFFFAOYSA-N 0.000 description 2
- PGQNYIRJCLTTOJ-UHFFFAOYSA-N trimethylsilyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)C PGQNYIRJCLTTOJ-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- NOGFHTGYPKWWRX-UHFFFAOYSA-N 2,2,6,6-tetramethyloxan-4-one Chemical compound CC1(C)CC(=O)CC(C)(C)O1 NOGFHTGYPKWWRX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical group NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- QJWQYVJVCXMTJP-UHFFFAOYSA-N 4-pyridin-4-ylmorpholine Chemical compound C1COCCN1C1=CC=NC=C1 QJWQYVJVCXMTJP-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 241001474374 Blennius Species 0.000 description 1
- BJXIQGZNDVXVAF-KHPPLWFESA-N CCCC[Si](CCCC)(CCCC)OC(/C=C\C(O)=O)=O Chemical compound CCCC[Si](CCCC)(CCCC)OC(/C=C\C(O)=O)=O BJXIQGZNDVXVAF-KHPPLWFESA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241001269238 Data Species 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical class OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 1
- 239000002879 Lewis base Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- VCVSJHMXCRDLKE-UHFFFAOYSA-N [butyl(dimethyl)silyl] 2-methylprop-2-enoate Chemical compound CCCC[Si](C)(C)OC(=O)C(C)=C VCVSJHMXCRDLKE-UHFFFAOYSA-N 0.000 description 1
- BUHWJGQORVVXDZ-UHFFFAOYSA-N [ethyl(dimethyl)silyl] 2-methylprop-2-enoate Chemical compound CC[Si](C)(C)OC(=O)C(C)=C BUHWJGQORVVXDZ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 229920006222 acrylic ester polymer Polymers 0.000 description 1
- 230000010933 acylation Effects 0.000 description 1
- 238000005917 acylation reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- IYEWOPPVIQNFQO-UHFFFAOYSA-N bis(trimethylsilyl) 2-methylidenebutanedioate Chemical compound C[Si](C)(C)OC(=O)CC(=C)C(=O)O[Si](C)(C)C IYEWOPPVIQNFQO-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 229960004132 diethyl ether Drugs 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical group COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000003392 indanyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 150000007527 lewis bases Chemical class 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- ILNLDQNOQQYETQ-UHFFFAOYSA-N tributyl(tributylsilyloxy)silane Chemical compound CCCC[Si](CCCC)(CCCC)O[Si](CCCC)(CCCC)CCCC ILNLDQNOQQYETQ-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 125000002306 tributylsilyl group Chemical group C(CCC)[Si](CCCC)(CCCC)* 0.000 description 1
- PIILXFBHQILWPS-UHFFFAOYSA-N tributyltin Chemical compound CCCC[Sn](CCCC)CCCC PIILXFBHQILWPS-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1896—Compounds having one or more Si-O-acyl linkages
Definitions
- the invention relates to a new method for the preparation of trihydrocarbylsilylated carboxylate monomers
- Antifouling paints are used to prevent and delay the fouling of underwater structures (e.g. ships' bottom, docks, fishnets, and buoys) by various marine organisms such as shells, seaweed, and aquatic bacteria.
- underwater structures e.g. ships' bottom, docks, fishnets, and buoys
- marine organisms such as shells, seaweed, and aquatic bacteria.
- the surface roughness of the whole ship may be increased to the point of inducing a decrease of velocity of the ship or an increase of fuel consumption.
- removal of such aquatic organisms from the ship's bottom needs much labour and a long period of working time in a costly dry dock.
- these organisms adhere and propagate on an underwater structure such as a steel structure, they deteriorate the anticorrosive coating films leading to a reducing of the lifetime of the underwater structure.
- Underwater structures are therefore coated with antifouling paint employing polymers containing various hydrolysable groups and more specifically organosilyl groups.
- antifouling paints for example, an antifouling paint of the hydrolysable self-polishing type proposed in WO 84/02915 and JP 63215780 A, which employs a (meth)acrylic ester polymer having triorganosilyl groups in the side chains.
- Some of the polymers used in the above-described antifouling paints are based on silylated carboxylate monomers.
- JP 5306290 A discloses a process to obtain a methacrylic functional group- containing organosilicon compound.
- the process comprises reacting methacrylic acid with a halogenoalkylsilane (e.g. trialkylsilylchloride) in the presence of a tertiary amine compound having a cyclic structure.
- a halogenoalkylsilane e.g. trialkylsilylchloride
- This process has disadvantages such as the reduced availability and storage stability of the silyl chloride.
- the reaction yields as a by-product a hydrogen halide (which provokes the corrosion of the production equipment) or a halide salt (which has to be removed by filtration).
- JP 10195084 A discloses the reaction of unsaturated carboxylic acids such as acrylic acid or methacrylic acid with a trialkylsilylhydride compound in the presence of a copper catalyst.
- One of the disadvantages of this method is the risk of hydrogenation of the unsaturated carboxylic anhydride due to a side reaction of the produced H 2 on the carbon-carbon double bond.
- J.Valade describes in "Compte Rendu de I'Academie des Sciences" n° 246, p. 952-953 (1958) the reaction of hexamethyldisiloxane or hexaethyldisiloxane with acetic anhydride or benzoic anhydride in the presence of zinc chloride whereas maleic anhydride or succinic anhydride do not react with hexamethyldisiloxane or hexaethyldisiloxane in the presence of zinc chloride.
- an object of the present invention is to provide a novel process capable of readily preparing trihydrocarbylsilylated unsaturated carboxylate monomers in a high yield.
- Another object of the present invention is to provide a novel process preparing said monomers from easily available starting materials.
- a further object of the present invention is to provide a novel process offering an improvement vis-a-vis of the disadvantages disclosed above.
- the present invention is based on the reaction of either linear or cyclic unsaturated carboxylic anhydrides with hexahydrocarbyldisiloxane to synthesise, in the presence of a catalyst, trihydrocarbylsilylated unsaturated carboxylate monomers.
- the present invention relates to a new process for the preparation of trihydrocarbylsilylated unsaturated carboxylate monomers of either general formula (I)
- each R independently represents an alkyl, a substituted alkyl, an aryl or a substituted aryl group
- R 1 , R 2 each independently represents a hydrogen atom or an alkyl or substituted alkyl group, an aryl or a substituted aryl group
- R 3 represents a hydrogen atom, an alkyl or substituted alkyl group, an aryl or a substituted aryl group or -COOR 6 wherein R 6 represents an alkyl, a substituted alkyl, an aryl or a substituted aryl group
- R 4 , R 5 each independently represents a hydrogen atom or an alkyl or substituted alkyl group, an aryl or substituted aryl group
- R is as already defined above either with an unsaturated carboxylic anhydride of formula (IV),
- R 1 , R 2 , R 3 are as already defined above
- R 4 , R 5 are as already defined above.
- the catalyst used in the present invention consists of a mixture of a strong acid and a nucleophilic base.
- alkyl relates to saturated hydrocarbon radicals having straight, branched, cyclic or polycyclic moieties or combinations thereof and contains 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, still more preferably 1 to 6 carbon atoms, yet more preferably 1 to 4 carbon atoms.
- Said radical may be a substituted alkyl group, i.e. optionally substituted with one or more substituents independently selected from alkyl, aryl, alkoxy, halogen, hydroxy or amino radicals.
- alkyl radicals may be independently selected from methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, 2- methylbutyl, 2, 3-d i methyl butyl, lauryl, pentyl, iso-amyl, n-amyl, n-hexyl, cyclohexyl, 3-methylpentyl, n-octyl, t-octyl, n-dodecyl and the like.
- R, R 1 , R 2 , R 3 , R 4 , R 5 and R 6 each independently represent a linear, branched, or cyclic or polycyclic alkyl, substituted alkyl, aryl or substituted aryl group, saturated or unsaturated, containing from 1 to 12 carbon atoms, preferably from 1 to 6 carbon atoms, more preferably from 1 to 4 carbon atoms, yet more preferably R is 4 carbon atoms.
- R is chosen from the group consisting of methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, sec-butyl, t-butyl, 2-methyl butyl, 2,3-dimethylbutyl, lauryl, pentyl, n- amyl, iso-amyl, n-hexyl, cyclohexyl, 3-methylpentyl, n-octyl, t-octyl, n-dodecyl, phenyl or substituted phenyl, and the like.
- R is chosen from the group consisting of methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, sec- butyl, t-butyl, 2,3-dimethylbutyl, n-amyl, n-hexyl, n-octyl, t-octyl, n-dodecyl, lauryl, phenyl or substituted phenyl wherein the substituents may be linear or branched alkyl, aryl, halogene, alkoxy, phenoxy or nitro. Yet in a more preferred embodiment R is n-butyl, or isopropyl.
- R 1 , R 2 , R 3 , R 4 and R 5 each independently represent hydrogen atom or a methyl group.
- aryl as used herein, relates to an organic radical derived from an aromatic hydrocarbon by removal of one hydrogen, and includes any monocyclic, bicyclic or polycyclic carbon ring of up to 7 members in each ring, wherein at least one ring is aromatic.
- Said radical may be a substituted aryl group ie optionally substituted with one or more substituents independently selected from alkyl, alkoxy, halogen, hydroxy or amino radicals.
- aryl includes phenyl, p-methylphenyl, stearyl, phenethyl, (2-methyl)-phenethyl, 4-methoxyphenyl, 4-(tert-butoxy)phenyl, 3-methyl-4-methoxyphenyl, 4- fluorophenyl, 4-chlorophenyl, 3-nitrophenyl, 3-aminophenyl, 3- acetamidophenyl, 4-acetamidophenyl, 2-methyl-3-acetamidophenyl, 2-methyl- 3-aminophenyl, 3-methyl-4-aminophenyl, 2-amino-3-methyIphenyl, 2,4- dimethyl-3-aminophenyl, 4-hydroxyphenyl, 3-methyl-4-hydroxyphenyl, 1- naphthyl, 2-naphthyl, 3-amino-1-naphthyl, 2-methyl-3-amino-1-naphthyl, 6- amino-2-na
- the trihydrocarbylsilylated unsaturated carboxylates of general formula (I) and the unsaturated carboxylic compound (IV) can be of either cis (maleic) or trans (fumaric) configuration.
- the trihydrocarbylsilylated unsaturated carboxylates obtained by the process of the invention are trihydrocarbylsilyl acrylates or trihydrocarbylsilyl methacrylates.
- the present invention relates to a new process for the synthesis of trihydrocarbylsilylated unsaturated carboxylates according either to the general scheme 1 :
- Unsaturated carboxylic anhydride represented by the above formula (IV) or (V) is mixed with hexahydrocarbyldisiloxane of formula (III) with or without solvent.
- solvents which can be used in the process according to the invention, include hexane, cyclohexane, toluene, xylene, pentane, heptane, benzene, mesitylene, ethylbenzene, octane, decane, decahydronaphthalene, diethylether, diisopropyl ether, diisobutyl ether, THF, Dioxane, dichloromethane or mixtures thereof.
- an inert solvent is used, more preferably, a hydrocarbon inert solvent such as hexane, cyclohexane, toluene or xylene.
- the reaction may be conducted with an added polymerisation inhibitor.
- a radical polymerisation inhibitor is used.
- a suitable polymerisation inhibitor is o-methoxyphenol.
- the reaction progress may be monitored by any suitable analytical method.
- the solvent is at least 10 wt% of the total reaction mix at the start of the reaction, more preferably, at least 20 wt%, most preferably, at least 30 wt%.
- the reaction may also be without solvent and accordingly suitable ranges of solvent are 0-99 wt% of the total reaction mix, more preferably, 20- 80 wt%, most preferably 30-70 wt%.
- unsaturated carboxylic anhydrides which can be used in the process according to the invention include acrylic anhydride, methacrylic anhydride, crotonic anhydride, angelic anhydride, tiglic anhydride, maleic anhydride, citraconic anhydride (methylmaleic anhydride).
- trihydrocarbylsilylated unsaturated carboxylate monomers prepared by the process of the invention using (meth)acrylic anhydride examples include trimethylsilyl (meth)acrylate, triethylsilyl (meth)acrylate, tri-n-propylsilyl (meth)acrylate, triisopropylsilyl (meth)acrylate, tri-n-butylsilyl (meth)acrylate, triisobutylsilyl (meth)acrylate, tri-s-butylsilyl (meth)acrylate, tri-n-amylsilyl (meth)acrylate, tri-n-hexylsilyl (meth)acrylate, tri-n-octylsilyl (meth)acrylate, tri- n-dodecylsilyl (meth)acrylate, triphenylsilyl (meth)acrylate, tri-p- methylphenylsilyl (meth)acrylate
- ethyldimethylsilyl methacrylate ethyldimethylsilyl methacrylate
- n-butyldimethylsilyl methacrylate bis(trimethylsilyl) itaconate
- t-butyl dimethylsilyl (meth)acrylate diisopropyl-n-butylsilyl (meth)acrylate
- n-octyldi-n-butylsilyl (meth)acrylate diisopropylstearylsilyl (meth)acrylate, dicyclohexylphenylsilyl (meth)acrylate, t- butyldiphenylsilyl (meth)acrylate
- phenyldimethylsilyl (meth)acrylate n- hexyldimethylsilyl (meth)acrylate
- tert-octyldimethylsilyl (meth)acrylate phenethyldi
- trihydrocarbylsilylated unsaturated carboxylate monomers prepared by the process of the invention using maleic anhydride include bis triisopropylsilyl maleate, bis tri-n-butylsilyl maleate, bis t-butyldiphenylsilyl maleate, bis t-butyldiphenylsilyl maleate or the corresponding fumarate isomers.
- the reaction is conducted in the presence of a catalyst comprising of, more preferably consisting of, a mixture of a strong acid and a nucleophilic base.
- a catalyst comprising of, more preferably consisting of, a mixture of a strong acid and a nucleophilic base.
- strong acid we mean an acid having a pKa value preferably less than 5, more preferably less than 2, and most preferably less than -5.
- the "strong acid” is stronger than acetic acid, more preferably stronger than chloroacetic acid, most preferably, stronger than trichloroacetic acid.
- nucleophilic base we mean a base having an available electron pair for donation.
- 'nucleophilic base we mean an organic Lewis base having an electron pair available for interacting in a reversible manner with the acylation agent, more preferably the base is a nitrogen containing molecule which is more basic than triethylamine, more preferably this amine is a heteroaromatic amine, more preferably an heteroaromatic mono or polyamine substituted or not with one or more amino groups, more preferably an heteroaromatic mono or polyamine substituted or not with one or more amino groups in which at least one of the nitrogen electron pairs is conjugated with the aromatic ring in such a manner that it brings an increase in negative charge on another amino function of the molecule.
- a preferred strong acid is trifluoromethanesulphonic acid.
- nucleophilic bases that can be used, one can cite pyridine, 2- (dimethylamino)pyridine, 4-(dimethylamino)pyridine, 4- piperidino pyridine, 4-(4-methylpiperidino)pyridine, 4-pyrrolidinopyridine, 4- morpholinopyridine, imidazole, 1-methylimidazole, 2-methylimidazole, 4- methylimidazole, polymer- bound dimethylaminopyridine (examples of which may be found in US 4997944 incorporated herein by reference), 1- methylbenzimidazole, 2-methylbenzimidazole, benzimidazole and, in addition, N-methyl imidazole(NMI), N,N-dimethylamino pyridine(DMAP), hexamethylphosphoric triamide(HMPA), 4,4 dimethyl imidazole, N-methyl-2- pyridone(NMP), pyridine N-oxide, triphenylphosphine oxide, pyr
- Preferred nucleophilic bases include 2- (dimethylamino)pyridine, 4- (dimethylamino)pyridine, 4-(4-methylpiperidino)pyridine, 4-pyrrolidinopyridine, imidazole, 1-methylimidazole, 2-methylimidazole, 4-methylimidazole, polymer- bound dimethylaminopyridine, 1-methylbenzimidazole, 2-methylbenzimidazole, benzimidazole.
- a more preferred nucleophilic base is 4-(dimethylamino) pyridine or derivatives thereof.
- the catalyst is present at a level of 0.2-40 mol % (mol/mol siloxane), more preferably 1-24 mol %, most preferably 2-10 mol % in the reaction medium at the start of the reaction.
- mol/mol siloxane mol/mol siloxane
- the catalyst level relative to moles of siloxane in the starting reaction medium will increase during the reaction, whereas in a continuous process the catalyst level will remain relatively constant throughout the process except towards the end of any such process when it may rise relative to the level of siloxane as feed reactants are no longer added to the process.
- the molar ratio of strong acid to nucleophilic base in the catalyst is in the range 1 :10 to 10:1 , more preferably, 1 :5 to 5:1 , most preferably 1 :2 to 2:1. Especially preferred is a range between 3:2 to 2:3, more especially preferred is a ratio of approximately 1 :1.
- the reaction is preferably carried out at a temperature between 30°C and 130°C, more preferably between 40°C and 120°C, and most preferably between 50°C and 100°C, for example at 60°C or 90°C.
- the reaction takes place in less than 24 hours, more preferably, less than 20 hours, more preferably less than 12 hours.
- the polymerisation inhibitor is present in the range 0.001-10% wt/wt of the total reaction mix, more preferably 0.001-5% wt/wt and most preferably 0.01-2% wt/wt.
- the molar ratio of siloxane:anhydride is between 1 :100 and 50:1 , more preferably between 10:1 and 1 :10, most preferably, between 2:1 and 1 :2.
- the molar ratio of siloxane:anhydride is approximately 1 :1.
- the reaction may be carried out at any convenient pressure, for instance atmospheric pressure.
- the advantage of this invention is that the process uses reactants, which can be easily handled.
- Hexahydrocarbyl disiloxanes may be considered as easily accessible since they are formed as a by-product during acidic deprotection of silyl protected reactive functional groups such as e.g. alcohols, amines or carboxylic acids (as described in "Protective Groups in Organic Synthesis” T.W.Greene and P.G.M.Wuts J.Wiley & Sons, 1999).
- Another advantage lies in the simplicity and safety of the procedure (no byproducts, hence no trapping of corrosive gaseous matter).
- the present invention is a substantial improvement over the existing methods. Moreover, due to the possibility of using numerous hexahydrocarbyldisiloxanes as reactants leading to the production of a wide range of trihydrocarbylsilylated unsaturated carboxylate monomers, the process of the present invention is a substantial improvement over the existing methods.
- the trihydrocarbylsilylated unsaturated carboxylate monomers obtained by the process of the invention can be polymerised with various other monomers such as vinyl monomers including acrylic esters, methacrylic esters, styrene, vinyl esters (e.g., vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate), vinyltoluene, alpha-methylstyrene, crotonic esters, and itaconic esters.
- vinyl monomers including acrylic esters, methacrylic esters, styrene, vinyl esters (e.g., vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate), vinyltoluene, alpha-methylstyrene, crotonic esters, and itaconic esters.
- the polymers and copolymers of said monomers are useful in coating or paint composition. More preferably they are used in antifouling coating or paint compositions.
- the antifouling coating compositions prepared using the monomers obtained by the process of the invention are tin-free coatings and provide an alternative to the present self-polishing coating technology based on hydrolysable tributyltin polymers (the use of which is due to be banned in antifouling paints by 2003).
- the trihydrocarbylsilylated unsaturated carboxylate monomers provided by the process of the invention compared to organotin monomers are less toxic, less polar, more hydrophobic and more stable.
- Example 1 (according to the invention) 285 mg of 4-(dimethylamino)pyridine and 352 mg of trifluoromethanesulfonic acid were successively added, at room temperature, to a mixture of 3.8g of hexamethyldisiloxane and 3.6g of methacrylic anhydride. The solution heated at 60°C for 16h to furnish trimethylsilyl methacrylate.
- Trimethysilyl methacrylate 13 C NMR : 167.7, 137.6, 127.1 , 18.2, -0.257 ; 29 Si NMR : 24.3; IR (film): 2963, 1703, 1335, 1256, 1178, 874, 854 crr ⁇ 1 .
- Triisopropylsilyl methacrylate 13 C NMR: 167.7, 138.0, 126.2, 18.8, 18.1 , 2.4;
- Comparative example 1 (according to J.Valade in Compte Rendu de I'Academie des Sciences n° 246, p. 952-953 (1958)) 8.4 g of zinc chloride were added, at room temperature, to a mixture of 5 g of hexamethyldisiloxane and 6.25 g of methacrylic anhydride. The solution was heated at 110°C. After 16h no transformation was observed.
- Comparative example 4 (catalyst is strong acid and weak nucleophilic base) 185 mg of pyridine and 352 mg of trifluoromethanesulfonic acid was added, at room temperature, to a mixture of 3.8 g of hexamethyldisiloxane and 3.6 g of methacrylic anhydride. The solution was heated at 60°C. After 16h no transformation was observed.
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Abstract
La présente invention concerne une méthode de préparation de monomères de carboxylate trihydrocarbylsilylés, qui consiste à mettre en réaction un hexahydrocarbyldisiloxane avec un anhydride carboxylique insaturé, en présence d'un catalyseur.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03742960A EP1487844A1 (fr) | 2002-02-26 | 2003-02-26 | Methode de preparation de monomeres de carboxylate trihydrocarbylsilyles |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02075760 | 2002-02-26 | ||
EP02075760A EP1340763A1 (fr) | 2002-02-26 | 2002-02-26 | Procédé pour la fabrication de monoméres insaturés du trihydrocarbylsilylés |
EP03742960A EP1487844A1 (fr) | 2002-02-26 | 2003-02-26 | Methode de preparation de monomeres de carboxylate trihydrocarbylsilyles |
PCT/EP2003/001990 WO2003072585A1 (fr) | 2002-02-26 | 2003-02-26 | Methode de preparation de monomeres de carboxylate trihydrocarbylsilyles |
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EP1487844A1 true EP1487844A1 (fr) | 2004-12-22 |
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EP02075760A Withdrawn EP1340763A1 (fr) | 2002-02-26 | 2002-02-26 | Procédé pour la fabrication de monoméres insaturés du trihydrocarbylsilylés |
EP03742960A Withdrawn EP1487844A1 (fr) | 2002-02-26 | 2003-02-26 | Methode de preparation de monomeres de carboxylate trihydrocarbylsilyles |
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EP02075760A Withdrawn EP1340763A1 (fr) | 2002-02-26 | 2002-02-26 | Procédé pour la fabrication de monoméres insaturés du trihydrocarbylsilylés |
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EP (2) | EP1340763A1 (fr) |
JP (1) | JP2005518450A (fr) |
KR (1) | KR20040095227A (fr) |
AU (1) | AU2003210366A1 (fr) |
WO (1) | WO2003072585A1 (fr) |
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JP7539140B2 (ja) | 2020-09-30 | 2024-08-23 | 国立研究開発法人産業技術総合研究所 | アシロキシシランの製造方法 |
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US3403169A (en) * | 1963-08-23 | 1968-09-24 | Koppers Co Inc | Addition of organometallic compounds to activated olefins |
JP3841907B2 (ja) * | 1997-01-31 | 2006-11-08 | 日東化成株式会社 | 重合性トリオルガノシリル不飽和カルボキシレートの製造法 |
-
2002
- 2002-02-26 EP EP02075760A patent/EP1340763A1/fr not_active Withdrawn
-
2003
- 2003-02-26 EP EP03742960A patent/EP1487844A1/fr not_active Withdrawn
- 2003-02-26 KR KR10-2004-7013111A patent/KR20040095227A/ko not_active Application Discontinuation
- 2003-02-26 JP JP2003571291A patent/JP2005518450A/ja active Pending
- 2003-02-26 WO PCT/EP2003/001990 patent/WO2003072585A1/fr not_active Application Discontinuation
- 2003-02-26 AU AU2003210366A patent/AU2003210366A1/en not_active Abandoned
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See references of WO03072585A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2003072585A1 (fr) | 2003-09-04 |
KR20040095227A (ko) | 2004-11-12 |
AU2003210366A1 (en) | 2003-09-09 |
JP2005518450A (ja) | 2005-06-23 |
EP1340763A1 (fr) | 2003-09-03 |
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