EP1427678A1 - Substrate coated with a composite film, method for making same and uses thereof - Google Patents
Substrate coated with a composite film, method for making same and uses thereofInfo
- Publication number
- EP1427678A1 EP1427678A1 EP02774836A EP02774836A EP1427678A1 EP 1427678 A1 EP1427678 A1 EP 1427678A1 EP 02774836 A EP02774836 A EP 02774836A EP 02774836 A EP02774836 A EP 02774836A EP 1427678 A1 EP1427678 A1 EP 1427678A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- precursor
- layer
- mesoporous
- coated substrate
- pores
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 62
- 239000002131 composite material Substances 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims description 27
- 239000011148 porous material Substances 0.000 claims abstract description 61
- 239000002243 precursor Substances 0.000 claims abstract description 57
- 239000002245 particle Substances 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims abstract description 34
- 239000002105 nanoparticle Substances 0.000 claims abstract description 32
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 28
- 239000011707 mineral Substances 0.000 claims abstract description 28
- 230000000737 periodic effect Effects 0.000 claims abstract description 27
- 239000011159 matrix material Substances 0.000 claims abstract description 18
- 238000009826 distribution Methods 0.000 claims abstract description 9
- 238000011065 in-situ storage Methods 0.000 claims abstract description 3
- 230000005389 magnetism Effects 0.000 claims abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 67
- 239000000377 silicon dioxide Substances 0.000 claims description 33
- 239000003795 chemical substances by application Substances 0.000 claims description 29
- 239000000203 mixture Substances 0.000 claims description 28
- 239000007788 liquid Substances 0.000 claims description 27
- 238000005470 impregnation Methods 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- 239000002689 soil Substances 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229920001577 copolymer Polymers 0.000 claims description 8
- 238000001556 precipitation Methods 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 239000003153 chemical reaction reagent Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000003093 cationic surfactant Substances 0.000 claims description 6
- 230000003993 interaction Effects 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 6
- 150000004820 halides Chemical class 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 5
- -1 oxides Chemical class 0.000 claims description 5
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 5
- 230000009471 action Effects 0.000 claims description 4
- 230000008030 elimination Effects 0.000 claims description 4
- 238000003379 elimination reaction Methods 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 238000002156 mixing Methods 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 150000004703 alkoxides Chemical class 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 229910052798 chalcogen Inorganic materials 0.000 claims description 2
- 150000004770 chalcogenides Chemical class 0.000 claims description 2
- 150000001787 chalcogens Chemical class 0.000 claims description 2
- 239000011246 composite particle Substances 0.000 claims description 2
- 239000007791 liquid phase Substances 0.000 claims description 2
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- 230000001590 oxidative effect Effects 0.000 claims description 2
- 229920000233 poly(alkylene oxides) Polymers 0.000 claims description 2
- 238000006068 polycondensation reaction Methods 0.000 claims description 2
- 239000002096 quantum dot Substances 0.000 claims description 2
- 230000009257 reactivity Effects 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 230000008021 deposition Effects 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 67
- 238000011282 treatment Methods 0.000 description 13
- 239000000243 solution Substances 0.000 description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 10
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 9
- 238000009792 diffusion process Methods 0.000 description 8
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical group [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 5
- 239000005977 Ethylene Substances 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 5
- 239000013335 mesoporous material Substances 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 4
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- XIEPJMXMMWZAAV-UHFFFAOYSA-N cadmium nitrate Inorganic materials [Cd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XIEPJMXMMWZAAV-UHFFFAOYSA-N 0.000 description 4
- 238000001354 calcination Methods 0.000 description 4
- 239000000693 micelle Substances 0.000 description 4
- 230000035515 penetration Effects 0.000 description 4
- NMHMNPHRMNGLLB-UHFFFAOYSA-N phloretic acid Chemical compound OC(=O)CCC1=CC=C(O)C=C1 NMHMNPHRMNGLLB-UHFFFAOYSA-N 0.000 description 4
- 239000005297 pyrex Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000001451 molecular beam epitaxy Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- 238000004627 transmission electron microscopy Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000536 complexating effect Effects 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 239000003446 ligand Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000005424 photoluminescence Methods 0.000 description 2
- 229920001983 poloxamer Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 2
- 239000001509 sodium citrate Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 229920006305 unsaturated polyester Polymers 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 238000000333 X-ray scattering Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- SFFFIHNOEGSAIH-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene;ethene Chemical compound C=C.C1C2CCC1C=C2 SFFFIHNOEGSAIH-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- PLLZRTNVEXYBNA-UHFFFAOYSA-L cadmium hydroxide Chemical compound [OH-].[OH-].[Cd+2] PLLZRTNVEXYBNA-UHFFFAOYSA-L 0.000 description 1
- WLZRMCYVCSSEQC-UHFFFAOYSA-N cadmium(2+) Chemical compound [Cd+2] WLZRMCYVCSSEQC-UHFFFAOYSA-N 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
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- 229910052801 chlorine Inorganic materials 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
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- 238000010586 diagram Methods 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005949 ozonolysis reaction Methods 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
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- 230000008092 positive effect Effects 0.000 description 1
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- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- 229910052604 silicate mineral Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229940071575 silver citrate Drugs 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- XQMTUIZTZJXUFM-UHFFFAOYSA-N tetraethoxy silicate Chemical compound CCOO[Si](OOCC)(OOCC)OOCC XQMTUIZTZJXUFM-UHFFFAOYSA-N 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229920000428 triblock copolymer Polymers 0.000 description 1
- QUTYHQJYVDNJJA-UHFFFAOYSA-K trisilver;2-hydroxypropane-1,2,3-tricarboxylate Chemical compound [Ag+].[Ag+].[Ag+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QUTYHQJYVDNJJA-UHFFFAOYSA-K 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/425—Coatings comprising at least one inhomogeneous layer consisting of a porous layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/45—Inorganic continuous phases
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/811—Of specified metal oxide composition, e.g. conducting or semiconducting compositions such as ITO, ZnOx
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
- Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
- Y10T428/24997—Of metal-containing material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249987—With nonvoid component of specified composition
- Y10T428/24999—Inorganic
Definitions
- the present invention relates to the field of thin layer materials capable of being applied to substrates to give them various functions or properties, in particular optical, electrical, magnetic, physical, chemical.
- It relates more particularly to a substrate coated with a composite film based on a mesoporous mineral layer containing nanoparticles.
- nanoparticles designates solid particles of nanometric dimensions, that is to say of the order of a few nanometers or a few tens of nanometers. These particles are of particular interest insofar as they may have specific properties, in particular optical and electronic, which differ significantly from those of solid material. Thus, particular physical properties are observed for particles of nanometric size, such as increased field effects for metals, quantum confinement for semiconductors and superparamagnetism for magnetic compounds. Obtaining particles of defined size capable of being distributed in space according to a desired arrangement represents a capital challenge in the fields in particular of optoelectronics, nonlinear optics, ...
- mesoporous a porous material whose pores have dimensions between 2 and 50 nm. Below 2 nm, the pores are qualified as micropores; beyond 50 nm, we speak of macropores.
- powdered mesoporous materials such as the family of M41s: these are (alumino) silicates materials very close to zeolites and, like the latter, characterized by a periodic network of pores, most often hexagonal or cubic bi-continuous, where the pores have a perfectly defined size of 2 to 10 nm.
- the structuring of the porous material into a periodic network of pores is linked to the synthesis technique, which consists in condensing the silicate mineral matter in the presence of organic structuring agents which are organized into micelles and crystalline phases. After treatment for removing the structuring agents, a porous material is obtained, the pores of which are the perfect replica of the organic species.
- the tortuosity of the porous network is low and the developed surface very accessible. This makes it possible to envisage these materials as support hosts for particles.
- the synthesized particles are generally distributed randomly in the porous matrix and their size is not well controlled.
- a layer of SiGe or Ge is deposited and grown on the surface of the mesoporous silica film over a thickness of 6 to 70 nm at a growth rate of 0.1 ⁇ / s which is supposed to allow diffusion of the atoms in the openings of the mesopores.
- Photoluminescence measurements make it possible to identify the presence of particles which would be localized in the mesoporous layer and whose dimensions correspond to those of the pores of the silica matrix. However, the thickness penetration into the layer is not characterized.
- the method used is based on the diffusion of metal atoms in the mesoporous silica layer from the surface layer of SiGe or Ge towards the silica / substrate interface, diffusion which is no longer allowed (despite suitably chosen growth rate) as soon as the pores close to the silica / Ge or SiGe interface are filled.
- the presence of the surface layer, which contains particles of different sizes, is a drawback.
- the object of the present invention is to remedy this drawback and to provide a layered material containing nanoparticles of regular structure.
- This object was achieved with a substrate coated with a composite film based on a mesoporous mineral layer containing nanoparticles formed in situ inside the layer, characterized in that the composite film has a periodic lattice structure in most of the thickness where the nanoparticles are present, structure in which the nanoparticles are arranged periodically on the scale of domains of at least 4 periods in the thickness of the film.
- the periodic lattice is at least two-dimensional, that is to say that the geometric repeating pattern is two or three dimensions.
- the periodic network of the film is three-dimensional, in particular of the hexagonal, cubic or quadratic type.
- This repetition can be oriented identically throughout the volume of the material, with a structure that can be compared to that of single crystals, or can be oriented identically at the domain scale of at least 4 periods. (in general at least about 20 nm) with an overall structure which can be compared to that of polycrystals.
- the particles are arranged periodically with at least 5, preferably at least 10 periods per domain.
- the extent of the periodic structure domains can be more or less vast.
- these domains can have a dimension of at least 20 nm in at least one direction.
- this periodic structure of the composite film is obtained from a mesoporous mineral layer of periodic structure on the scale of domains of at least 4 pore periods (in general at least about 20 nm) forming a matrix on the substrate, by:
- a key element consists in generating the particles inside the pores from a precursor which undergoes a chemical modification in place in order to transform into the constituent material of the particle.
- the problems of occlusion of the pores near the diffusion source are avoided, which limit the penetration of the particles at the heart of the thickness of the mesoporous layer.
- a mesoporous layer of periodic structure can be the seat of an ordered growth of particles and limited by the size of the pores, and they have accessed unexpected to a periodically structured composite film.
- the periodic structure of the composite film is obtained by impregnating the matrix layer with a liquid composition containing at least one precursor and a liquid vehicle, and controlled growth of particles derived from the precursor.
- the liquid route indeed seems to be the best method for depositing the precursor (s) inside the pores, by having homogeneous access to all the desired volume and in particular the thickness of the basic mesoporous layer, which allows in the next stage a harmonious and regular growth of the particles.
- the substrate carrying the coating can be made of various materials of the mineral type such as glass, silica, ceramics or vitroceramics, metal, or of the organic type such as plastics.
- the transparency of the substrate may be desirable.
- plastics include (poly (methyl methacrylate) (PMMA), polyvinyl butyral (PVB), polycarbonate (PC) or polyurethane (PU), thermoplastic ethylene / vinyl acetate (EVA) copolymer, poly (ethylene terephthalate) (PET), poly (butylene terephthalate) (PBT), polycarbonate / polyester copolymers, cycloolefinic copolymer of the ethylene / norbornene or ethylene / cyclopentadiene type, ionomer resins, for example an ethylene / acid copolymer ( meth) acrylic neutralized by a polyamine, thermosetting or thermoscrosslinkable such as polyurethane, unsaturated polyester (UPE), ethylene / vinyl acetate copoly
- PMMA poly (methyl methacrylate)
- PVB polyvinyl butyral
- PC polycarbonate
- PU polyurethane
- EVA thermoplastic ethylene / vinyl acetate
- the substrate generally affects an essentially planar or two-dimensional shape with a variable contour, such as for example a plate or a wafer, but can also affect a volume or three-dimensional shape consisting of the assembly of essentially planar surfaces, for example in the form of a cube or a parallelepiped, or not, for example in the form of fibers.
- It can be coated with composite film on one or more sides.
- the composite film according to the invention has a thickness advantageously between 10 nm and 10 ⁇ m (these limit values being included), in particular 50 nm and 5 ⁇ m. High quality film structures are produced for film thicknesses from 100 to 500 nm.
- the mesoporous mineral layer forming the base of the composite film has a periodic structure at the domain scale of at least 4 periods.
- the characteristic dimension of these domains (in general at least about 20 nm) corresponds to a dimension of coherent diffraction domains and can be deduced in a known manner by the Scherrer formula from the width of the main peak of the X-ray diffraction diagram.
- the advantage of the relatively large-scale periodicity of the mesoporous basic network lies in the possibility of distributing the particles in an orderly manner with a distance from each other (from center to center) corresponding to the pitch of the repeating pattern with a preferential orientation , for example perpendicular or parallel to the surface of the substrate.
- Preferred layers are organized with a periodic structure on the scale of domains of the order of 100 nm, advantageously 200 to 300 nm.
- the base of the mesoporous film comprises as essential constituent material at least one compound of at least one of the elements: Si, W, Sb, Ti, Zr, Ta, V, Pb, Mg, Al, Mn, Co, Ni, Sn, Zn, Ce.
- the mesoporous mineral layer is preferably based on at least one oxide such as silicon oxide, titanium oxide, etc.
- the material constituting the layer may be chosen so that it is transparent at certain wavelengths, in particular in the visible range.
- the mesoporous mineral layer is obtained by: • bringing the substrate into contact with a liquid composition comprising at least one oxide precursor and at least one organic agent; and
- the metal oxides are capable of being deposited in film by sol-gel route as above, with the possibility of controlling the porosity according to various structures generally monodisperse in size, that is to say in which the size of the pores ( diameter or equivalent diameter) is calibrated to a determined value in the mesoporous domain: we can note in particular a pore network structure of two-dimensional hexagonal symmetry (2D) with porous channels in the form of straight tubes stacked in the hexagonal mode, of t ⁇ ' -dimensional hexagonal symmetry (3D) with substantially spherical pores stacked in the hexagonal mode, of three-dimensional cubic symmetry possibly deformed.
- 2D two-dimensional hexagonal symmetry
- 3D t ⁇ ' -dimensional hexagonal symmetry
- substantially spherical pores stacked in the hexagonal mode of three-dimensional cubic symmetry possibly deformed.
- Three-dimensional structures can be useful for establishing isotropic properties of the composite film, while two-dimensional structures give access to anisotropic properties with in particular applications in the field of nonlinear optics or optical filters.
- the resulting composite film has a periodic lattice structure which retains the same symmetries.
- nanoparticles capable of being included in the composite film of the substrate according to the invention can in particular comprise compounds chosen from:
- metals for example silver, gold, copper, cobalt, nickel ... the optical or magnetic properties of which can be exploited;
- chalcogenides in particular sulfides or selenides, of one or more metals, for example derivatives of zinc, lead, cadmium, manganese, in particular ZnS, PbS, (CdMn) S, (CdZn) S, CdSe, ZnSe, the photoluminescence or semiconductor properties of which can be exploited;
- oxides of one or more elements for example derived from silicon, zinc, zirconium, cerium which can confer improved mechanical properties on the surface layer;
- halides in particular chlorides, of one or more metals, in particular silver chloride with photochromic properties, or copper chloride which absorbs UV rays;
- the particles may consist of a single material, obtained from a single precursor or of several precursors which react with one another to form a new chemical compound, or of a combination of materials obtained from several precursors which react or not between them to form composite particles.
- the nanoparticles consist of a core at the periphery of which is a second material in the form of discrete particles such as crystallites or of a continuous envelope, where the periphery material grows on the core at the inside the pores of the mesoporous material from a corresponding material precursor.
- the material of the core can be of any organic or mineral type, and the material of the periphery is advantageously chosen from the compounds mentioned above.
- the invention also makes it possible to optimize the quantity of particles deposited on the substrate, more particularly to maximize this quantity without aggregation of the particles.
- the volume fraction occupied by the nanoparticles in the composite film can be of the order of 10 to 70% of the volume of the organized domains, in particular around 50%.
- the invention also relates to a method of manufacturing a substrate as described above, which comprises the steps consisting in:
- step (1) of depositing the mesoporous layer successively comprises:
- the preparation of the liquid composition advantageously comprises:
- the ripening of the soil allows a preliminary condensation of the oxide precursor which promotes the structuring of the oxide layer condensed on the substrate into large domains.
- Advantageous conditions for curing include maintaining the soil at a temperature of 40 to 60 ° C for a period of 30 min to 24 hours, the curing time being shorter the higher the temperature.
- the oxide precursor is advantageously a hydrolyzable compound, such as a halide or an alkoxide
- the structuring agent is advantageously chosen from cationic surfactants, preferably of the quaternary ammonium type, or nonionic, including the copolymers , preferably based on polyalkylene oxide, in particular di-block or tri-block copolymers based for example on ethylene or propylene oxide.
- a particularly favorable embodiment of the process of the invention for the synthesis of a mesoporous layer of silica consists in that the organic structuring agents consist of micelles of cationic surfactant molecules, the precursor of the mesoporous material is a silicon alkoxide, and they are in solution and, optionally, in hydrolyzed form.
- the cationic surfactant is cetyltrimethylammonium bromide, the precursor of the mesoporous material is a silicon alkoxide in partially or fully hydrolyzed form.
- the molar ratio of the organic structuring agent to silicon can be of the order of 10 "4 to 0.5, preferably of 10 " 3 to 0.5, advantageously of 0.01 to 0.1 .
- the molar ratio of the structuring agent to silicon is preferably of the order of 0.1; with a nonionic structuring agent of the copolymer type, the molar ratio of the structuring agent to silicon is preferably of the order of 0.01.
- This soil can be applied in a variable thickness, in particular by diluting the concentration of the soil.
- a diluent preferably an alcohol
- the mixture is diluted with an alcohol in a volume ratio of 1: 1 to 1: 30, preferably from 1: 1 to 1: 5, in particular from 1: 1 to 1 : 3 for application of a thin layer of the order of 100 to 400 nm.
- the substrate After deposition of the soil, the substrate is generally subjected to drying in the open air or in nitrogen during which the polymerization of the oxide network around the structuring agents continues.
- Step (2) of the method according to the invention consists in impregnating the mesoporous base layer with a liquid composition containing at least one precursor of nanoparticles.
- the nanoparticle precursor is a metal salt or complex soluble in the liquid vehicle: the metal ions penetrate inside the pores of the base layer and can be fixed there by different types of interaction, by example of polar type or by ion exchange with the surface of the pores.
- the liquid composition may contain complexing agents to avoid precipitation of the metal, in particular in the form of hydroxides in the medium aqueous.
- the impregnation composition is adapted so as not to degrade the mesoporous mineral matrix.
- an important parameter may be the pH of the impregnating composition.
- the liquid impregnation composition has a pH less than or equal to 10.
- the pH of the composition can be adjusted to optimize the interaction of the precursor with the mesoporous layer, in particular it can be adjusted within a range which promotes the adsorption of the precursor species on the walls of the pores.
- the counterions or ligands are chosen to obtain species which are soluble in the preferred pH range.
- the impregnation can be carried out by immersion or dipping of the substrate in the liquid composition or by any other method of applying liquid to a solid.
- the method can comprise an intermediate step (1 ′) in which the mineral layer is treated mesoporous to increase the reactivity of the pores with respect to the precursor (s), in particular by grafting reactive groups on the surface of the pores which interact with the precursor (s) chemically or electrostatically.
- complexing groups for the precursors can be grafted onto the surface of the pores.
- Such treatment can be carried out by liquid or gas.
- the treatment may consist in reacting the layer with an alkoxide, in particular of silicon, functionalized by a reactive group, or with an alumina precursor functionalized by a reactive group.
- the impregnation step (2) can be followed by a rinsing step (2 ') to remove excess material, in particular to avoid the accumulation of precursor at the film-air interface which would be susceptible to '' completely block the surface pores.
- the interactions between the functional groups on the walls of the pores and the precursors, in particular metal cations are strong enough to retain the precursor in the pore despite rinsing.
- Step (3) which consists in reacting the precursor in place in the pores, can use an input of thermal energy or the action of radiation such as ultraviolet rays, or a liquid or gaseous reagent.
- a gaseous reagent is preferable because it generally guarantees instant penetration into all the pores of the material, allowing a transformation of the precursor and a growth of the particles simultaneously throughout the volume of the mesoporous matrix, which avoids the problems of diffusion. species and clogging of pores.
- the gaseous reagent can be chosen from a chalcogen-based gas, for example based on sulfur, selenium, tellurium, for example H 2 S, H 2 Se, based on halide, in particular based on chlorine, for example HCl, Cl 2 , a reducing gas, for example H 2 , and an oxidizing gas, for example O 2 , in particular as a mixture of O 2 , N 2 .
- a chalcogen-based gas for example based on sulfur, selenium, tellurium, for example H 2 S, H 2 Se
- halide in particular based on chlorine, for example HCl, Cl 2
- a reducing gas for example H 2
- an oxidizing gas for example O 2 , in particular as a mixture of O 2 , N 2 .
- the impregnated layer is treated at a temperature less than or equal to 300 ° C., in particular to 200 ° C., in particular to 150 ° C.
- a moderate temperature prevents diffusion and aggregation of particles and guarantees the stability of the mesoporous structure during the reactive treatment. Reactive treatments at room temperature are preferred.
- the chemical species formed does not generally have the same interaction with the surface of the pore, and the site of attachment of the precursor in the pore is released and is accessible to receive a new precursor molecule as long as the particle does not occupy the entire volume of the pore.
- impregnation (2) and reaction (3) steps can be repeated to reach the desired degree of filling, if necessary until the mesoporous mineral layer is saturated.
- the evolution of the filling of the mesoporous layer can be followed by different methods including spectrophotomét ⁇ e or X-ray diffraction
- the growth of the particles is controlled by the mesoporosity of the base layer and that the particles formed have dimensions limited by the dimensions of the pores, that is to say that the particles grow with each cycle until a maximum size corresponding to the dimensions of the pores.
- the substrate according to the invention can have several applications.
- the invention also relates to the application of a substrate as described above to the production of solar concentrators in particular for photovoltaic cells, to quantum dots, materials for non-linear optics or magnetism.
- the material can be treated or coated with an additional protective or functional layer (s).
- EXAMPLE 1 This example describes the manufacture of a layer of silica charged with nanoparticles of cadmium sulfide on a Pyrex glass substrate.
- Si (OH) 4 which is the hydrolysis product of TEOS and low molecular weight oligomers (SiO) n .
- the surfactant chosen is cetyltrimethylammonium bromide (CTAB) introduced in an amount such that the CTAB: Si molar ratio is equal to 0.1.
- CTAB cetyltrimethylammonium bromide
- the surfactant forms micellar supramolecular structures.
- the CTAB Si molar ratio of 0.1 is optimal for obtaining micellar structures arranged so as to form a periodic structure.
- the solution obtained is diluted with ethanol in a volume ratio 1: 1.
- the solution is deposited on Pyrex slides of 2.5 cm by 2.5 cm by centrifugation or "spin coating": according to this technique, the sample is rapidly rotating during deposition; this spin coating operation is characterized by a speed of 3000 rpm and a rotation time of the order of 100 s.
- the CTAB is then extracted from the film of each sample by calcination in a tubular oven at 450 ° C in air with a rise of 10 ° C / h.
- the film thus formed is transparent, mesoporous and its thickness, determined with the profilometer, is approximately 300 nm.
- the thickness of the mesoporous silica film can be varied.
- a volume ratio of 2: 1 to 1: 4 it is possible to obtain layer thicknesses of the order of 400 to 100 nm.
- the porous network corresponds to the volume left vacant by the elimination of the CTAB micelles, taking into account the contractions likely to occur during the heating / calcination operations, among others.
- the pore volume of this layer is 55% relative to the total volume of the film.
- the characteristics of the porous network are determined by X-ray diffraction, X-ray scattering in grazing incidence and transmission electron microscopy. These analyzes reveal a three-dimensional hexagonal structure (space group P6 3 / mmc with the hexagonal axis of symmetry perpendicular to the plane of the substrate). The pores are substantially spherical with a uniform diameter of the order of 3.5 nm.
- Figures 1 and 2 are electron microscopy images in transmission respectively in transverse and flat section.
- the mesoporous layer 2 has a periodic network structure throughout its thickness from the interface with the substrate 1 to the interface with the air 3.
- the pores 4 are aligned parallel to the substrate surface.
- FIG. 2 reveals the existence of domains 5, 6, 7 of large extent, of dimension greater than 200 nm in all the directions of the plane.
- the pores are arranged according to the repeating pattern of the hexagonal network over several tens of periods, but the orientation of the repeating axis in the plane of the substrate (a) varies by domain 5 to a neighboring domain 6 or 7. From one domain to another the orientation of the hexagonal axis of symmetry (c) is unchanged, always perpendicular to the surface of the substrate.
- This structure is similar to that of a polycrystalline material where all the grains have a common orientation relative to the substrate.
- the mesoporous layer is structured in a periodic network, on the scale of 200 nm domains, and is monodisperse in size.
- This structure can also be obtained by immersion and drawing from the silica sol (or "dipcoating").
- An impregnation solution based on cadmium nitrate is prepared.
- an aqueous solution of 0.1 M cadmium nitrate one equivalent of ammonia and one equivalent of sodium citrate are added, and the pH is adjusted to 9.5 by addition of ammonia.
- NH 3 and citrate act as ligands which complex cadmium nitrate and prevent precipitation of cadmium hydroxide.
- the pH of 9.5 is optimal, because the adsorption of cadmium ions on silica is optimal above pH 9 while the dissolution of the silica walls becomes critical above pH 10.
- the Pyrex substrate coated with the mesoporous silica layer is immersed in the impregnation solution for approximately one minute, then extracted and washed with deionized water to remove the excess cations, in particular near the surface.
- the metal cations attach to the surface of the silica pores by complexing with SiO " groups of the silanols on the surface of the silica.
- the SiO / Cd interaction resists the operation of wash with water.
- the sample is then placed in a primary vacuum enclosure into which hydrogen sulfide gas H 2 S is slowly injected up to atmospheric pressure at room temperature.
- H 2 S hydrogen sulfide gas
- the precipitation of CdS sulfide particles by reaction of sulfur with the complexed Cd is instantaneous and takes place locally in the heart of the porous cavity simultaneously in all the pores.
- the precipitation of the sulfide leads to the regeneration of the SiO " sites.
- the progress of the filling of the layer is followed by absorption spectrophotometry, illustrated by the spectra of FIG. 3: the absorbance increases with the number of cycles up to a ceiling reached in the eighth cycle, (the curve a shows the spectrum obtained after the first soaking in the cadmium solution, curve b presents the spectrum obtained after the first treatment H 2 S; curves c, d, e, f, g, present the spectra obtained respectively after 2, 3, 4 , 5, 7 cycles, and the curve h shows the spectra obtained after the gem e and e em C y C ⁇ are ⁇ yj overlap).
- the absorbance no longer changes, proving that there is no more CdS in the layer than in the previous cycle.
- the mesoporous layer is therefore saturated with CdS.
- the size of the aggregates can be determined by the energy of the energy transition. It is concluded that the particle size distribution is very narrow centered on 3.5 nm.
- the characterization by X-ray diffraction confirms that the three-dimensional hexagonal structure is preserved.
- Example 1 A similar structure of ZnS nanoparticles is produced in a layer of silica on a substrate, by modifying Example 1 as follows.
- the same layer of mesoporous silica is deposited on a substrate.
- the impregnation solution this time consists of an aqueous solution of zinc nitrate of 0.1 M concentration to which 1 molar equivalent of sodium citrate is added.
- the pH is then adjusted to 7.5 by adding ammonia.
- the adsorption of zinc ions is optimal in a pH range above pH 7. It is advantageously placed in a range of the order of 7 to 10, preferably close to neutrality between 7 and 8 , so that the silica does not suffer from a dissolving effect on the walls of the pores.
- the composite film obtained after 7 impregnation / treatment cycles has the same periodic lattice structure of particles stacked in the hexagonal mode throughout the thickness of the silica layer.
- EXAMPLE 3 This example describes the growth of CdS aggregates in another mesoporous layer of silica.
- a silica sol is prepared as in Example 1 by mixing TEOS with acidified water and ethanol in a molar ratio 1: 5: 3.8. The mixture is subjected to maturing for 1 hour at 60 ° C.
- the structuring agent is a nonionic surfactant consisting of a triblock copolymer of the polyoxyethylene-polyoxypropylene-polyoxyethylene type.
- the deposition and calcination steps are the same as in Example 1.
- a layer of mesoporous silica 200 nm thick is obtained.
- this structuring agent it is possible to choose a dilution volume ratio of 1: 1 to 1: 2 in order to obtain layers of silica of the order of 400 to 200 nm in thickness.
- the porous network which corresponds to the volume left vacant by the elimination of the Pluronic micelles, also has a three-dimensional structure of monodisperse pores in size.
- FIG. 5 is a transmission electron microscopy image in cross section which illustrates the periodic distribution of the pores.
- This example describes the growth of silver nanoparticles in a mesoporous layer of silica with a three-dimensional hexagonal structure.
- HMDS hexamethyldisilazane
- the impregnated substrate is placed in a cell containing 200 ⁇ l of HMDS and the cell is placed under vacuum and hermetically closed, then heated to a temperature of approximately 70 ° C. for approximately 5 minutes. The cell is then purged to remove excess HMDS. Finally, the Ag + ions are reduced, which can be carried out under an atmosphere of argon and hydrogen at 100 ° C for 4 hours or under an atmosphere of pure hydrogen for one hour.
- the final product is characterized by transmission electron microscopy, where the cross-sectional image reveals a film filled with nanoparticles.
- This image shows that the particles have a narrow size distribution, and have particle alignments.
- the size distribution is narrow with an average of 3.4 nm and a standard deviation of 0.64.
- the diffraction of the image shows that the particles are distributed according to the 3D hexagonal structure of the space group P6 3 / mmc.
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Abstract
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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FR0109901A FR2827854B1 (en) | 2001-07-25 | 2001-07-25 | SUBSTRATE COATED WITH A COMPOSITE FILM, MANUFACTURING METHOD AND APPLICATIONS |
FR0109901 | 2001-07-25 | ||
PCT/FR2002/002673 WO2003010103A1 (en) | 2001-07-25 | 2002-07-25 | Substrate coated with a composite film, method for making same and uses thereof |
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EP1427678A1 true EP1427678A1 (en) | 2004-06-16 |
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EP02774836A Withdrawn EP1427678A1 (en) | 2001-07-25 | 2002-07-25 | Substrate coated with a composite film, method for making same and uses thereof |
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US (1) | US7348054B2 (en) |
EP (1) | EP1427678A1 (en) |
JP (1) | JP4184958B2 (en) |
KR (1) | KR100870711B1 (en) |
CN (1) | CN1297505C (en) |
BR (1) | BR0211413B1 (en) |
FR (1) | FR2827854B1 (en) |
MX (1) | MXPA04000722A (en) |
PL (1) | PL368602A1 (en) |
RU (1) | RU2288167C2 (en) |
WO (1) | WO2003010103A1 (en) |
ZA (1) | ZA200400522B (en) |
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2001
- 2001-07-25 FR FR0109901A patent/FR2827854B1/en not_active Expired - Fee Related
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2002
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- 2002-07-25 EP EP02774836A patent/EP1427678A1/en not_active Withdrawn
- 2002-07-25 WO PCT/FR2002/002673 patent/WO2003010103A1/en active Application Filing
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- 2002-07-25 PL PL02368602A patent/PL368602A1/en not_active Application Discontinuation
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CN1297505C (en) | 2007-01-31 |
BR0211413B1 (en) | 2011-02-22 |
KR100870711B1 (en) | 2008-11-27 |
KR20040024590A (en) | 2004-03-20 |
US7348054B2 (en) | 2008-03-25 |
MXPA04000722A (en) | 2004-04-20 |
JP4184958B2 (en) | 2008-11-19 |
RU2004105271A (en) | 2005-03-27 |
BR0211413A (en) | 2004-11-09 |
PL368602A1 (en) | 2005-04-04 |
RU2288167C2 (en) | 2006-11-27 |
WO2003010103A1 (en) | 2003-02-06 |
CN1558877A (en) | 2004-12-29 |
ZA200400522B (en) | 2004-05-20 |
FR2827854B1 (en) | 2003-09-19 |
US20040219348A1 (en) | 2004-11-04 |
JP2004535925A (en) | 2004-12-02 |
FR2827854A1 (en) | 2003-01-31 |
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