EP1409772B2 - Method for selectively electroplating a strip-shaped, metal support material - Google Patents
Method for selectively electroplating a strip-shaped, metal support material Download PDFInfo
- Publication number
- EP1409772B2 EP1409772B2 EP02754718A EP02754718A EP1409772B2 EP 1409772 B2 EP1409772 B2 EP 1409772B2 EP 02754718 A EP02754718 A EP 02754718A EP 02754718 A EP02754718 A EP 02754718A EP 1409772 B2 EP1409772 B2 EP 1409772B2
- Authority
- EP
- European Patent Office
- Prior art keywords
- paint
- strip
- base material
- strips
- electroplating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 32
- 239000000463 material Substances 0.000 title claims abstract description 24
- 238000009713 electroplating Methods 0.000 title claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 5
- 239000002184 metal Substances 0.000 title claims abstract description 5
- 238000000576 coating method Methods 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 19
- 230000008569 process Effects 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 239000003973 paint Substances 0.000 claims description 77
- 230000008021 deposition Effects 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 230000004913 activation Effects 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
- 238000007598 dipping method Methods 0.000 claims description 2
- 239000003792 electrolyte Substances 0.000 claims description 2
- 238000010422 painting Methods 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 22
- 239000008199 coating composition Substances 0.000 abstract 1
- 239000004922 lacquer Substances 0.000 description 30
- 239000012876 carrier material Substances 0.000 description 25
- 239000010410 layer Substances 0.000 description 19
- 238000005246 galvanizing Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000013532 laser treatment Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 TeflonĀ® Polymers 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000035508 accumulation Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000003562 lightweight material Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/22—Servicing or operating apparatus or multistep processes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/022—Electroplating of selected surface areas using masking means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
- Y10S205/917—Treatment of workpiece between coating steps
Definitions
- the invention relates to a method for the selective galvanization of a strip-like, metallic carrier material in a continuous pass, in particular for the galvanization of a carrier strip with pre-punched contact elements.
- the support material is first completely coated with lacquer by either sprayed with lacquer or dipped in lacquer. Then, by means of a laser, those areas are freed from the paint on which contact material is to be galvanized.
- An object of the present invention is to develop the known method so that a faster passage of the strip-like carrier material is achieved by the galvanization with significantly lower paint requirement.
- the inventive method has the advantage that in the electrophoretic lacquer coating even at much lower paint thicknesses, a closed lacquer layer can be achieved, which has a very constant paint thickness. As a result, damage to the substrate can be effectively prevented when removing the paint layer by laser treatment. In addition, the very thin paint layer can be removed faster and with less power, which allows a higher throughput speed of the substrate. The deposition of the electrophoretic paint on the substrate is very fast, which in turn allows higher throughput speeds of the substrate. These advantages are further enhanced by the fact that only a selective lacquer layer is applied, for example a lacquer strip or several lacquer strips. These paint strips are applied only in the areas in which a galvanizing layer is applied. In addition to the saving of expensive paint material thus faster removal of the paint at the end of the treatment is possible.
- the electrophoretic lacquer coating leads to uniform thin lacquer layers even with three-dimensional support materials, so that a selective electroplating is possible in these. Since the paint removal by laser action is virtually arbitrarily controllable, punctiform galvanizations can be achieved in addition to strip-like electroplating.
- the strip-like carrier material expires before the coating expediently a cleaning and / or activation and / or rinsing process to create optimal initial conditions.
- paint strips can be applied in the same or different width on the same side or on both sides of the belt-like carrier material.
- the width of these strips is precisely adjustable by the electrophoretic lacquer coating process, so that by optimizing the strip width, a minimization of the required lacquer material can be achieved.
- the lacquer layer thickness can be adjusted as a function of the applied voltage, the lacquer composition and the speed of the support material, in particular cataphoretic or anaphoretic lacquer deposition. By thus precisely adjustable coating thickness can be completely removed at the required locations by appropriate adjustment of the laser beam, this paint layer, while still avoiding damage to the substrate is avoided.
- a housing of the paint coating device expediently compared to the carrier material by a slot-like dimming, depending on the slot width and the distance between dimming and substrate, the paint strip width can be adjusted.
- dimming with multiple slots can accordingly several paint strips are formed.
- the support material is expediently rinsed and dried, in particular in an oven or by UV light. Furthermore, the carrier material is expediently rinsed after laser removal.
- the laser-stripped areas can now be electroplated by one or more of the following selective plating methods: selective dipping in a plating bath, covering the areas outside of the at least one paint strip by means of mechanical mask masks, in particular belt tools, applying the electrolyte agent by means of wheel technology, spotter or brush technique.
- Fig. 1 illustrated galvanizing plant for selective galvanization of a carrier strip is designed as a so-called reel-to-reel system, wherein the metallic carrier strip 10 unwound continuously from a first roll or spool 11, passed through the system and behind again on a second roll or coil 12 as Finished tape is wound up.
- Belt speeds of 20 m / min or even higher speeds are possible.
- the substrate tape 10 passes through a preparation station 13, where it is cleaned, activated and rinsed.
- the substrate strip 10 is passed through a Belakkungsstation 14, where a selective electrophoretic coating takes place.
- the lacquering station 14 may have one or more lacquer cells 15, as shown in FIG Fig. 2 are shown schematically.
- Such a Belackungszelle consists in principle of an example encapsulated housing which is shielded so that an uncontrolled paint deposition is avoided at undesirable areas.
- shields 17, 18, which, like the other housing areas, consist for example of Teflon or another non-conductive plastic, are arranged such that they cover the regions of the carrier material strip 10 which are not to be coated with respect to a flat anode 19.
- the anode 19 is made of stainless steel, but may also be platinum plated from titanium.
- the illustrated coating cell 15 is designed for anaphoretic paint deposition, for which purpose an anaphoretic paint is used.
- a lacquer layer is resistant to acidic media, such as a nickel, gold or tin bath, and can be removed in an alkaline medium.
- the anode 19 is connected to the positive pole of a galvanizing voltage, while a contacting unit 21 is arranged in front of the cell by supplying current to the carrier material band 10.
- a cataphoretic lacquer deposition with cataphoretic lacquer is possible.
- the cataphoretic lacquer is resistant to alkaline media and can be removed in an acidic environment.
- the polarity is reversed, that is, instead of the anode 19, a cathode occurs.
- the varnish cell 15 is designed so that the paint strip formed or the varnish-coated areas are no longer damaged after the coating process. This is achieved for example by guide rollers, not shown, which are mounted in front of and behind the coating cell 15 and which position the carrier material in both vertical and horizontal directions exactly so that the area coated with the paint strip 22 is not in contact with areas of the housing 16 arrives.
- the distance between the substrate tape 10 and the dimming 17, 18 is chosen so that on the one hand a sufficient dimming effect is present, but that no points of contact arise.
- the paint located in a storage tank, not shown, is supplied via nozzles of the coating cell 15.
- a pump located in the storage tank is connected via a pipe to the paint cell, wherein the amount of the supplied paint can be set or controlled via a likewise not shown intermediate throttle valve.
- a filter arrangement may also be provided.
- the Paint Conveyor Pump is designed to prevent electrical charges by using light-weight materials on all moving parts surrounded by paint, otherwise the paint will come into contact with moving parts that can become electrically charged and into contact with the paint come, can take place.
- FIGS. 3 to 10 various carrier material bands are shown as examples, which are provided with differently arranged paint strips.
- carrier strip three paint strips 24 - 26 of different width on the front and back are applied. This can be carried out either with successively arranged coating cells 15 or with coating cells which has a plurality of slits 20 and dips and anodes or cathodes arranged on both sides of the carrier material band 23.
- carrier strip 27 is pre-punched so that already individual contacts are formed, which can be canceled or cut off after completion.
- substrate strip 30 is also pre-punched to form individual contacts, said contacts on one side of a holding strip 31, which holds them together, semi-circular formations 32, so that the carrier material strip 30 is formed three-dimensionally.
- a paint strip 33 is applied to the outside of the formations 32.
- carrier material strip 34 is also formed three-dimensional, wherein retaining strips 35 connect the individual contact elements 36 at their ends.
- These contact elements 36 are box-shaped in the central region, wherein a paint strip 37 extends over the central region of the box-like formations.
- the selective paint strip (or more) is applied over the entire spatial depth in 3D carrier material bands, as in the Fig. 7 to 10 is recognizable.
- the substrate tape 10 according to Fig. 1 passed through a drying station 38.
- the drying and thus a partial polymerization is carried out in an oven of the drying station 38, in which a uniform temperature distribution is present.
- the paint strips can also be dried with UV light and partially polymerized.
- the substrate tape 10 is passed through a selective de-paint laser station 39.
- a selective de-paint laser station 39 By means of the laser beam of a laser 40 those lacquer areas are removed from the paint strip or stripes, which are to be galvanized later.
- both a strip-like Entlakkung and the Entlackung on singular surfaces is possible, for example, by the laser oscillating processed these surfaces.
- a plurality of strip-shaped paint erosions can be made by means of the laser within a paint strip.
- the tolerances of Lackabtrags and the subsequent electroplating are low and amount to about 50 ā m.
- the substrate is not damaged by the laser beam and paint removal is complete. This is ensured by the exact setting of the laser energy, wavelength, strength and duration of the pulses.
- FIGS. 11 and 12 It is shown that a strip-shaped region 42 in the laser station 39 has been stripped of the paint strip 22 applied to the substrate tape 10.
- the substrate strip 10 is then passed through a galvanizing station 43, in which galvanization of the area 42 stripped by the laser takes place.
- a galvanizing station 43 in which galvanization of the area 42 stripped by the laser takes place.
- This is achieved by a selective electroplating process known per se.
- Fig. 12 In this case, the regions of the carrier material strip 10 outside the paint strip 20 are covered by means of two continuously circulating belts 44.
- the speed of the belt 44 is adapted to the passage speed of the carrier material strip 10, so that the belt 44 run along accordingly.
- the released area between the two belts 44 is then wetted by means of a cloth, a brush or the like with galvanizing solution and thereby galvanized. This can be done in several stages depending on the desired layer thickness.
- the selective galvanization can also take place by selective immersion in a plating bath.
- other mechanical Abdeckmasken can be used, which may be mentioned as further known methods for selective galvanization, the mocking technique and brushing.
- the substrate tape 10 is completely stripped in a Entlackungsstation 45 by being passed through a corresponding aqueous solution.
- the aqueous solution is acidic or alkaline.
- the carrier strip 10 which is usually made of brass, copper or a copper alloy.
- Different plating layers can also be superimposed, for which purpose the necessary steps take place one after the other.
- the substrate tape 10 may also already have a plating layer applied in a classical manner, for example selective galvanization without paint coverage.
- the method according to the invention can be carried out, as described, with carrier material tapes which, in accordance with FIGS Fig. 5 to 10 already pre-punched contacts or other elements or which are still full-surface, for example according to the Fig. 3, 4 . 11 and 12 , In the latter case, stamping operations can still be carried out after the galvanization, but this requires a larger amount of lacquer and galvanization metals.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Abstract
Description
Die Erfindung betrifft ein Verfahren zur selektiven Galvanisierung eines bandartigen, metallischen TrƤgermaterials im kontinuierlichen Durchlauf, insbesondere zur Galvanisierung eines TrƤgermaterialbands mit vorgestanzten Kontaktelementen.The invention relates to a method for the selective galvanization of a strip-like, metallic carrier material in a continuous pass, in particular for the galvanization of a carrier strip with pre-punched contact elements.
Bei einem derartigen, aus der
Bei dem bekannten Verfahren kann sowohl durch das BesprĆ¼hen mit Lack als auch durch Eintauchen in Lack in nachteiliger Weise nur eine Lackschicht mit ungleichmƤĆiger Dicke erzielt werden. Diese Problematik verschƤrft sich bei einem drei-dimensionalen TrƤgermaterial, da der Lack sich dann insbesondere in Ecken und Kanten in extremer Dicke festsetzt. Weiterhin kann sich eine fĆ¼r das Verfahren zwingend erforderliche geschlossene Lackschicht nur dann erzielen lassen, wenn sie relativ dick ist. Beim Laserabtrag an den zu galvanisierenden Stellen fĆ¼hrt dies dann entweder zu einer zeitaufwendigen Bearbeitung, oder es mĆ¼ssen Laser mit groĆer Leistung verwendet werden. Da die Lackschicht an den zu galvanisierenden Stellen vollstƤndig abgetragen sein muss, ist es erforderlich, den Laserstrahl so einzustellen, dass die Lackschicht auch an Stellen grƶĆter Dicke entfernt wird. Dies wiederum fĆ¼hrt dazu, dass an Stellen mit geringer Schichtdicke das TrƤgermaterial durch den Laserstrahl beschƤdigt wird. Ein weiterer Nachteil des bekannten Verfahrens besteht darin, dass selbst dann, wenn nur sehr geringe FlƤchen galvanisiert werden mĆ¼ssen, sehr groĆe Lackmengen fĆ¼r das vollstƤndige Ćberziehen des TrƤgermaterials mit einer Lackschicht benƶtigt werden.
Die erforderliche relativ groĆe Dicke der Lackschicht zur Erzielung einer geschlossenen Lackschicht und insbesondere die extremen Lackansammlungen bei drei-dimensionalen TrƤgermaterialien kommen noch erschwerend hinzu. Dabei ist zu berĆ¼cksichtigen, dass die fĆ¼r ein solches Erfahren erforderlichen Lackmaterialien relativ teuer sind.In the known method can be achieved by spraying with paint as well as by immersion in paint disadvantageously only a paint layer with uneven thickness. This problem is exacerbated in a three-dimensional substrate, since the paint then sets in particular in corners and edges in extreme thickness. Furthermore, a mandatory mandatory for the process closed paint layer can only be achieved if it is relatively thick. Laser ablation at the points to be electroplated either leads to time-consuming machining or requires the use of high power lasers. Since the lacquer layer must be completely removed at the points to be electroplated, it is necessary to adjust the laser beam so that the lacquer layer is removed even in places of greatest thickness. This in turn means that at locations with a small layer thickness, the carrier material is damaged by the laser beam. Another disadvantage of the known method is that even if only very small areas must be galvanized, very large amounts of paint are required for the complete coating of the carrier material with a coating layer.
The required relatively large thickness of the lacquer layer to achieve a closed lacquer layer and in particular the extreme paint accumulations in three-dimensional support materials are made even more aggravating. It should be noted that the paint materials required for such an experience are relatively expensive.
Eine Aufgabe der vorliegenden Erfindung besteht darin, das bekannte Verfahren so weiterzubilden, dass ein schnellerer Durchlauf des bandartigen TrƤgermaterials durch die Galvanisierungsstrecke bei wesentlich geringerem Lackbedarf erzielt wird.An object of the present invention is to develop the known method so that a faster passage of the strip-like carrier material is achieved by the galvanization with significantly lower paint requirement.
Diese Aufgabe wird erfindungsgemĆ¤Ć durch die Verfahrensschritte des Anspruchs 1 gelƶst.This object is achieved by the method steps of claim 1.
Das erfindungsgemƤĆe Verfahren hat den Vorteil, dass bei der elektrophoretischen Lackbeschichtung schon bei wesentlich geringeren Lackdicken eine geschlossene Lackschicht erzielt werden kann, wobei diese eine sehr konstante Lackdicke besitzt. Hierdurch kƶnnen beim Entfernen der Lackschicht durch Laserbehandlung BeschƤdigungen des TrƤgermaterials wirksam verhindert werden. DarĆ¼ber hinaus kann die sehr dĆ¼nne Lackschicht schneller und mit geringerer Leistung entfernt werden, was eine hƶhere Durchlaufgeschwindigkeit des TrƤgermaterials ermƶglicht. Das Abscheiden des elektrophoretischen Lacks auf dem TrƤgermaterial erfolgt sehr schnell, was wiederum hƶhere Durchlaufgeschwindigkeiten des TrƤgermaterials ermƶglicht. VerstƤrkt werden diese Vorteile noch dadurch, dass nur eine selektive Lackschicht aufgebracht wird, beispielsweise ein Lackstreifen oder mehrere Lackstreifen. Diese Lackstreifen werden nur in den Bereichen aufgebracht, in denen eine Galvanisierschicht aufzubringen ist. Neben der Einsparung an teurem Lackmaterial ist somit auch ein schnelleres Entfernen des Lacks am Ende der Behandlung mƶglich.The inventive method has the advantage that in the electrophoretic lacquer coating even at much lower paint thicknesses, a closed lacquer layer can be achieved, which has a very constant paint thickness. As a result, damage to the substrate can be effectively prevented when removing the paint layer by laser treatment. In addition, the very thin paint layer can be removed faster and with less power, which allows a higher throughput speed of the substrate. The deposition of the electrophoretic paint on the substrate is very fast, which in turn allows higher throughput speeds of the substrate. These advantages are further enhanced by the fact that only a selective lacquer layer is applied, for example a lacquer strip or several lacquer strips. These paint strips are applied only in the areas in which a galvanizing layer is applied. In addition to the saving of expensive paint material thus faster removal of the paint at the end of the treatment is possible.
Die elektrophoretische Lackbeschichtung fĆ¼hrt auch bei drei-dimensionalen TrƤgermaterialien zu gleichmƤĆigen dĆ¼nnen Lackschichten, so dass auch eine selektive Galvanisierung bei diesen mƶglich ist. Da der Lackabtrag durch Lasereinwirkung praktisch beliebig steuerbar ist, kƶnnen neben streifenartigen Galvanisierungen auch punktuelle Galvanisierungen erreicht werden.The electrophoretic lacquer coating leads to uniform thin lacquer layers even with three-dimensional support materials, so that a selective electroplating is possible in these. Since the paint removal by laser action is virtually arbitrarily controllable, punctiform galvanizations can be achieved in addition to strip-like electroplating.
Durch die in den UnteransprĆ¼chen aufgefĆ¼hrten MaĆnahmen sind vorteilhafte Weiterbildungen und Verbesserungen des im Anspruch 1 angegebenen Verfahrens mƶglich.The measures listed in the dependent claims advantageous refinements and improvements of claim 1 method are possible.
Das bandartige TrƤgermaterial durchlƤuft vor dem Belacken zweckmƤĆigerweise einen Reinigungs- und/oder Aktivierungs- und/oder SpĆ¼lvorgang, um optimale Anfangsbedingungen zu schaffen.The strip-like carrier material expires before the coating expediently a cleaning and / or activation and / or rinsing process to create optimal initial conditions.
In vorteilhafter Weise kƶnnen mehrere Lackstreifen in gleicher oder unterschiedlicher Breite auf derselben Seite oder auf beiden Seiten des bandartigen TrƤgermaterials aufgebracht werden. Die Breite dieser Streifen ist dabei durch das elektrophoretische Lackbeschichtungsverfahren genau einstellbar, so dass durch Optimierung der Streifenbreite eine Minimierung des benƶtigten Lackmaterials erreicht werden kann.Advantageously, several paint strips can be applied in the same or different width on the same side or on both sides of the belt-like carrier material. The width of these strips is precisely adjustable by the electrophoretic lacquer coating process, so that by optimizing the strip width, a minimization of the required lacquer material can be achieved.
Die Lackschichtdicke kann in AbhƤngigkeit der angelegten Spannung, der Lackzusammensetzung und der Geschwindigkeit des TrƤgermaterials eingestellt werden, wobei insbesondere eine kataphoretische oder anaphoretische Lackabscheidung erfolgt. Durch die somit exakt einstellbare Lackschichtdicke kann auch durch entsprechende Einstellung des Laserstrahls diese Lackschicht vollstƤndig an den erforderlichen Stellen abgetragen werden, wobei dennoch eine BeschƤdigung des TrƤgermaterials vermieden wird.The lacquer layer thickness can be adjusted as a function of the applied voltage, the lacquer composition and the speed of the support material, in particular cataphoretic or anaphoretic lacquer deposition. By thus precisely adjustable coating thickness can be completely removed at the required locations by appropriate adjustment of the laser beam, this paint layer, while still avoiding damage to the substrate is avoided.
Zur elektrophoretischen Lackbeschichtung werden Kathoden in einem GehƤuse der Lackbeschichtungseinrichtung zweckmƤĆigerweise gegenĆ¼ber dem TrƤgermaterial durch eine schlitzartige Abblendung abgedeckt, wobei in AbhƤngigkeit der Schlitzbreite und des Abstands zwischen Abblendung und TrƤgermaterial die Lackstreifenbreite eingestellt werden kann. Durch Abblendungen mit mehreren Schlitzen kƶnnen entsprechend mehrere Lackstreifen gebildet werden.For electrophoretic lacquer coating cathodes are covered in a housing of the paint coating device expediently compared to the carrier material by a slot-like dimming, depending on the slot width and the distance between dimming and substrate, the paint strip width can be adjusted. By dimming with multiple slots can accordingly several paint strips are formed.
Nach der Belackung wird das TrƤgermaterial zweckmƤĆigerweise gespĆ¼lt und getrocknet, insbesondere in einem Ofen oder durch UV-Licht. Weiterhin wird das TrƤgermaterial zweckmƤĆigerweise nach der Laserentlackung gespĆ¼lt.After the coating, the support material is expediently rinsed and dried, in particular in an oven or by UV light. Furthermore, the carrier material is expediently rinsed after laser removal.
Die durch Laser entlackten Stellen kƶnnen nun durch eines oder mehrere der folgenden selektiven Galvanisierungsverfahren galvanisiert werden: Selektivtauchen in einem Galvanisierungsbad, Abdeckung der Bereiche auĆerhalb des wenigstens einen Lackstreifens mittels mechanischer Abdeckmasken, insbesondere Riemenwerkzeugen, Aufbringen des Elektrolytmittels mittels Radtechnik, Spotter oder Brushtechnik.The laser-stripped areas can now be electroplated by one or more of the following selective plating methods: selective dipping in a plating bath, covering the areas outside of the at least one paint strip by means of mechanical mask masks, in particular belt tools, applying the electrolyte agent by means of wheel technology, spotter or brush technique.
AusfĆ¼hrungsbeispiele der Erfindung sind in der Zeichnung dargestellt und in der nachfolgenden Beschreibung nƤher erlƤutert. Es zeigen:
- Fig. 1
- eine schematische Darstellung der einzelnen Stationen einer Anlage zur selektiven Galvanisierung zur DurchfĆ¼hrung des erfindungsgemƤĆen Verfahrens,
- Fig. 2
- eine schematische Darstellung einer Lackbeschichtungszelle zur Aufbringung eines Lackstreifens gewĆ¼nschter Breite,
- Fig. 3
- eine Stirnansicht eines TrƤgermaterialbands mit drei Lackstreifen an Vorder- und RĆ¼ckseite,
- Fig. 4
- eine perspektivische Darstellung des in
Fig. 3 dargestellten TrƤgermaterialbands, - Fig. 5
- eine Stirnansicht eines gestanzten TrƤgermaterialbands mit zwei Lackstreifen,
- Fig. 6
- eine perspektivische Darstellung des in
Fig. 4 dargestellten TrƤgermaterialbands, - Fig. 7
- eine Stirnansicht eines drei-dimensionalen TrƤgermaterialbands mit einem Lackstreifen am ausgeformten Bereich,
- Fig. 8
- eine perspektivische Darstellung des in
Fig. 7 dargestellten TrƤgermaterialbands, - Fig. 9
- eine Stirnansicht eines weiteren drei-dimensionalen TrƤgermaterialbands mit einem Lackstreifen,
- Fig. 10
- eine perspektivische Darstellung des in
Fig. 9 dargestellten TrƤgermaterialbands, - Fig. 11
- eine Stirnansicht eines TrƤgermaterialbands mit einem Lackstreifen, in dem durch Laserbehandlung ein streifenfƶrmiger Bereich entlackt ist, und mit einer Abdeckung zur selektiven Galvanisierung und
- Fig. 12
- eine perspektivische Darstellung des in
Fig. 11 dargestellten TrƤgermaterialbands.
- Fig. 1
- a schematic representation of the individual stations of a selective electroplating plant for carrying out the method according to the invention,
- Fig. 2
- a schematic representation of a paint coating cell for applying a paint strip desired width,
- Fig. 3
- an end view of a carrier tape with three paint strips on the front and back,
- Fig. 4
- a perspective view of the in
Fig. 3 illustrated carrier material bands, - Fig. 5
- an end view of a stamped carrier tape with two paint strips,
- Fig. 6
- a perspective view of the in
Fig. 4 illustrated carrier material bands, - Fig. 7
- an end view of a three-dimensional carrier strip with a paint strip on the formed area,
- Fig. 8
- a perspective view of the in
Fig. 7 illustrated carrier material bands, - Fig. 9
- an end view of another three-dimensional carrier strip with a paint strip,
- Fig. 10
- a perspective view of the in
Fig. 9 illustrated carrier material bands, - Fig. 11
- an end view of a carrier strip with a paint strip in which a strip-shaped area is stripped by laser treatment, and with a cover for selective galvanization and
- Fig. 12
- a perspective view of the in
Fig. 11 illustrated carrier material bands.
Die in
ZunƤchst durchlƤuft das TrƤgermaterialband 10 eine Vorbereitungsstation 13, in der es gereinigt, aktiviert und gespĆ¼lt wird.First, the
AnschlieĆend wird das TrƤgermaterialband 10 durch eine Belakkungsstation 14 gefĆ¼hrt, wo eine selektive elektrophoretische Belackung erfolgt. Die Belackungsstation 14 kann eine oder mehrere Belackungszellen 15 besitzen, wie sie in
Die dargestellte Belackungszelle 15 ist zur anaphoretischen Lackabscheidung ausgebildet, wozu ein anaphoretischer Lack verwendet wird. Eine solche Lackschicht ist bestƤndig gegen saure Medien, wie ein Nickel-, Gold- oder Zinnbad, und lƤsst sich im alkalischen Milieu ablƶsen. Zur anaphoretischen Lackabscheidung ist die Anode 19 mit dem positiven Pol einer Galvanisierspannung verbunden, wƤhrend durch StromzufĆ¼hrung zum TrƤgermaterialband 10 vor der Zelle eine Kontaktierungseinheit 21 angeordnet ist. Alternativ hierzu ist auch eine kataphoretische Lackabscheidung mit kataphoretischem Lack mƶglich. Der kataphoretische Lack ist bestƤndig gegenĆ¼ber alkalischen Medien und lƤsst sich im sauren Milieu ablƶsen. Die Polung ist umgekehrt, das heiĆt, anstelle der Anode 19 tritt eine Kathode.The illustrated coating cell 15 is designed for anaphoretic paint deposition, for which purpose an anaphoretic paint is used. Such a lacquer layer is resistant to acidic media, such as a nickel, gold or tin bath, and can be removed in an alkaline medium. For anaphoretic lacquer deposition, the
Die Belackungszelle 15 ist so ausgebildet, dass der gebildete Lackstreifen beziehungsweise die mit Lack beschichteten Bereiche nach dem Beschichtungsvorgang nicht mehr beschƤdigt werden. Dies wird beispielsweise durch nicht dargestellte FĆ¼hrungsrollen erzielt, die vor und hinter der Belackungszelle 15 angebracht sind und die das TrƤgermaterial sowohl in vertikaler als auch in horizontaler Richtung exakt so positionieren, dass der mit dem Lackstreifen 22 beschichtete Bereich nicht in Kontakt mit Bereichen des GehƤuses 16 gelangt. Der Abstand zwischen dem TrƤgermaterialband 10 und den Abblendungen 17, 18 ist dabei so gewƤhlt, dass zum einen eine genĆ¼gende Abblendwirkung vorhanden ist, dass aber keine BerĆ¼hrungspunkte entstehen.The varnish cell 15 is designed so that the paint strip formed or the varnish-coated areas are no longer damaged after the coating process. This is achieved for example by guide rollers, not shown, which are mounted in front of and behind the coating cell 15 and which position the carrier material in both vertical and horizontal directions exactly so that the area coated with the
Der in einem nicht dargestellten Vorratstank befindliche Lack wird Ć¼ber DĆ¼sen der Belackungszelle 15 zugefĆ¼hrt. Eine im Vorratstank befindliche Pumpe ist Ć¼ber eine Rohrleitung mit der Lackzelle verbunden, wobei Ć¼ber ein ebenfalls nicht dargestelltes zwischengeschaltetes Drosselventil die Menge des zugefĆ¼hrten Lackes eingestellt beziehungsweise gesteuert werden kann. Eine Filteranordnung kann ebenfalls vorgesehen sein. Die Lackfƶrderpumpe ist so konstruiert, dass durch Verwendung von leicht gleitenden Materialien an allen bewegten Teilen, die mit Lack umgeben sind, elektrische Aufladungen verhindert werden, da sonst eine Abscheidung des Lackes auf bewegten Teilen, die sich elektrisch aufladen kƶnnen und mit dem Lack in BerĆ¼hrung kommen, stattfinden kann.The paint located in a storage tank, not shown, is supplied via nozzles of the coating cell 15. A pump located in the storage tank is connected via a pipe to the paint cell, wherein the amount of the supplied paint can be set or controlled via a likewise not shown intermediate throttle valve. A filter arrangement may also be provided. The Paint Conveyor Pump is designed to prevent electrical charges by using light-weight materials on all moving parts surrounded by paint, otherwise the paint will come into contact with moving parts that can become electrically charged and into contact with the paint come, can take place.
In den
Bei dem in den
Das in den
Das in den
Das in den
Nach der Aufbringung eines oder mehrerer Lackstreifen wird das TrƤgermaterialband 10 gemƤĆ
Als NƤchstes wird das TrƤgermaterialband 10 durch eine Laserstation 39 zur selektiven Entlackung gefĆ¼hrt. Mittels des Laserstrahls eines Lasers 40 werden aus dem oder den Lackstreifen diejenigen Lackbereiche entfernt, die spƤter galvanisiert werden sollen. Dabei ist sowohl eine streifenfƶrmige Entlakkung als auch die Entlackung an singulƤren FlƤchen mƶglich, indem beispielsweise der Laser oszillierend diese FlƤchen bearbeitet. SelbstverstƤndlich kƶnnen auch innerhalb eines Lackstreifens mehrere streifenfƶrmige Lackabtragungen mittels des Lasers vorgenommen werden. Die Toleranzen des Lackabtrags und damit der anschlieĆenden Galvanisierung sind gering und betragen ca. 50 Āµm. Das Substrat wird durch den Laserstrahl nicht beschƤdigt, und der Lackabtrag ist vollstƤndig. Dies wird durch die exakte Einstellung des Lasers Ć¼ber Energie, WellenlƤnge, StƤrke und Dauer der Pulse sichergestellt. In den
Das TrƤgermaterialband 10 wird nun durch eine Galvanisierstation 43 hindurchgefĆ¼hrt, in der eine Galvanisierung des durch den Laser entlackten Bereichs 42 erfolgt. Dies wird durch ein an sich bekanntes selektives Galvanisierungsverfahren erreicht. GemƤĆ
Als letzter Schritt wird das TrƤgermaterialband 10 in einer Entlackungsstation 45 vollstƤndig entlackt, indem es durch eine entsprechende wƤssrige Lƶsung gefĆ¼hrt wird. Je nachdem, ob kataphoretische oder anaphoretische Lackabscheidung eingesetzt wurde, ist die wƤssrige Lƶsung sauer oder alkalisch.As a last step, the
SelbstverstƤndlich kƶnnen auf das Ć¼blicherweise aus Messing, Kupfer oder einer Kupferlegierung bestehende TrƤgermaterialband 10 auch verschiedene Materialien, wie Gold, Palladium, Silber und Zink, aufgalvanisiert werden. Verschiedene Galvanisierschichten kƶnnen auch Ć¼bereinanderliegen, wobei hierzu die erforderlichen Schritte nacheinander ablaufen. Das TrƤgermaterialband 10 kann beispielsweise auch bereits eine Galvanisierschicht besitzen, die auf klassische Weise aufgebracht wurde, zum Beispiel selektive Galvanisierung ohne Lackabdeckung.Of course, various materials, such as gold, palladium, silver and zinc, can also be electroplated on the
Das erfindungsgemƤĆe Verfahren kann - wie beschrieben - mit TrƤgermaterialbƤndern durchgefĆ¼hrt werden, die gemĆ¤Ć den
Claims (9)
- Method for the selective electroplating of a strip-like, metal base material in a continuous run, in particular a base material strip with pre-stamped contact elements, whereina) the base material (10, 23, 27, 30, 34) is coated selectively in an electrophoretic paint coating unit (14, 15) with an electrophoretic paint in one or more paint strips (22, 24-26, 28, 29, 33, 37),b) the paint strip or strips (22, 24-26, 28, 29, 33, 37) is or are removed by means of a laser (40) at those points (42) which are to be electroplated,c) electrodes (19) in a housing (16) of the paint coating unit (14, 15) are covered from the base material (10) by a slit-like screen (17, 18), with the paint strip width being adjusted depending on the slit width (20) and the distance between the screen (17, 18) and the base material (10),d) in an electroplating process a metal layer is applied to the decoated points (42) in the paint strip or strips (22, 24-26, 28, 29, 33, 37) by selective electroplating, ande) the paint strip or strips (22, 24-26, 28, 29, 33, 37) are then removed.
- Method according to claim 1, characterised in that the strip-like base material (10, 23, 27, 30, 34) passes through a cleaning and/or activation and/or rinsing process before painting.
- Method according to claim 1 or 2, characterised in that several paint strips (24-26, 28, 29) are applied at the same or varying width to the same side or to both sides of the strip-like base material (23, 27).
- Method according to any of the preceding claims, characterised in that the paint coating thickness is adjusted depending on the voltage applied, the paint composition and the speed of movement of the base material, wherein in particular cataphoretic or anaphoretic paint deposition takes place.
- Method according to any of the preceding claims, characterised in that the base material (10, 23, 27, 30, 34) is rinsed and dried after painting, in particular in a stove (28) or by UV light.
- Method according to any of the preceding claims, characterised in that strips and/or singular electroplating points (42) are formed by the laser paintstripping.
- Method according to any of the preceding claims, characterised in that the base material (10, 23, 27, 30, 34) is rinsed after laser paint-stripping.
- Method according to any of the preceding claims, characterised in that the points (42) stripped of paint by laser (40) are electroplated by one or more of the following selective electroplating processes: selective dipping in an electroplating bath, covering of the areas outside the paint strip or strips by means of mechanical resist masks (44), in particular belt tools, application of the electrolyte by means of wheel, spotter or brush systems.
- Method according to any of the preceding claims, characterised in that the paint strip or strips (22, 24-26, 28, 29, 33, 37) is or are completely removed after electroplating in an alkaline or acid aqueous solution.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10135349A DE10135349A1 (en) | 2001-07-20 | 2001-07-20 | Process for selectively galvanizing strip-like metallic carrier material in continuous pass involves selectively coating carrier material with electrophoretic lacquer in electrophoretic lacquer coating device forming strips |
DE10135349 | 2001-07-20 | ||
PCT/EP2002/006824 WO2003012175A2 (en) | 2001-07-20 | 2002-06-20 | Method for selectively electroplating a strip-shaped, metal support material |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1409772A2 EP1409772A2 (en) | 2004-04-21 |
EP1409772B1 EP1409772B1 (en) | 2005-03-16 |
EP1409772B2 true EP1409772B2 (en) | 2008-08-13 |
Family
ID=7692468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02754718A Expired - Lifetime EP1409772B2 (en) | 2001-07-20 | 2002-06-20 | Method for selectively electroplating a strip-shaped, metal support material |
Country Status (8)
Country | Link |
---|---|
US (1) | US6972082B2 (en) |
EP (1) | EP1409772B2 (en) |
JP (1) | JP2004536971A (en) |
CN (1) | CN1250777C (en) |
AT (1) | ATE291110T1 (en) |
DE (2) | DE10135349A1 (en) |
HK (1) | HK1069607A1 (en) |
WO (1) | WO2003012175A2 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4660231B2 (en) * | 2005-03-10 | 2011-03-30 | ę Ŗå¼ä¼ē¤¾ć·ććŗ | Surface treatment method and method of manufacturing electronic component using the same |
US20130334055A1 (en) * | 2010-12-23 | 2013-12-19 | Fci | Plating Method and Apparatus, and Strip Obtained by this Method |
CN102888632B (en) * | 2012-09-14 | 2014-12-03 | č¾čēęÆļ¼čå·ļ¼åéøēµåęęÆęéå ¬åø | Protection tool and method for selective electroplating |
CN103173839B (en) * | 2013-03-22 | 2015-11-18 | ę¹åę°øēę°ęęč”份ęéå ¬åø | A kind of method of sheet metal strip one side continuous electrophoresis deposition and device |
CN105239118B (en) * | 2014-06-17 | 2017-10-31 | äŗéæå¼ | Electroplate jig |
CN107059078B (en) * | 2017-04-21 | 2020-02-18 | äøčé¢ēē²¾åÆå¶é ē§ęęéå ¬åø | Local precise tin plating processing technology for metal parts |
JP7221003B2 (en) * | 2017-08-31 | 2023-02-13 | ļ¼¤ļ½ļ½ļ½ć”ćæć«ćććÆę Ŗå¼ä¼ē¤¾ | Partial plating method |
CN110923783B (en) * | 2019-11-20 | 2021-05-25 | åØåŗåøå®å°äŗęÆēµåé¶ē·ęéå ¬åø | Manufacturing method of hub-type electroplated ultrathin diamond cutting blade |
CN112934582B (en) * | 2021-02-08 | 2022-04-26 | ęµę±äøå°¼ēµåč”份ęéå ¬åø | Felt painting device and enameled wire |
CN113089063A (en) * | 2021-04-14 | 2021-07-09 | ēę¼ę¼ | Continuous plating apparatus and continuous plating method |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0106977A2 (en) ā | 1982-09-30 | 1984-05-02 | International Business Machines Corporation | Method and apparatus for electrochemically treating a substrate |
DD246575A1 (en) ā | 1986-03-14 | 1987-06-10 | Seghers A Mikroelektronik Veb | METHOD FOR THE CONTINUOUS PARTIAL COATING OF METAL CHANNELS |
EP0337658A1 (en) ā | 1988-04-12 | 1989-10-18 | The Whitaker Corporation | Selective plating by laser ablation |
DE69403926T2 (en) ā | 1993-01-28 | 1998-01-02 | Meco Equip Eng | Method and device for the selective electroplating of perforated metal or metallized objects |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5035918A (en) | 1989-04-26 | 1991-07-30 | Amp Incorporated | Non-flammable and strippable plating resist and method of using same |
US6143145A (en) * | 1997-10-02 | 2000-11-07 | Precious Plate Inc. | Apparatus for continuous masking for selective electroplating and method |
SG76591A1 (en) * | 1999-02-27 | 2000-11-21 | Aem Tech Engineers Pte Ltd | Method for selective plating of a metal substrate using laser developed masking layer and apparatus for carrying out the method |
DE19934584A1 (en) * | 1999-07-23 | 2001-01-25 | Inovan Stroebe | Production of contacts comprises completely covering the substrate with lacquer and then selectively removing the lacquer layer using a laser |
-
2001
- 2001-07-20 DE DE10135349A patent/DE10135349A1/en not_active Withdrawn
-
2002
- 2002-06-20 US US10/484,205 patent/US6972082B2/en not_active Expired - Fee Related
- 2002-06-20 EP EP02754718A patent/EP1409772B2/en not_active Expired - Lifetime
- 2002-06-20 JP JP2003517344A patent/JP2004536971A/en active Pending
- 2002-06-20 DE DE50202493T patent/DE50202493D1/en not_active Expired - Lifetime
- 2002-06-20 AT AT02754718T patent/ATE291110T1/en active
- 2002-06-20 WO PCT/EP2002/006824 patent/WO2003012175A2/en active IP Right Grant
- 2002-06-20 CN CNB02814614XA patent/CN1250777C/en not_active Expired - Fee Related
-
2005
- 2005-03-10 HK HK05102087A patent/HK1069607A1/en not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0106977A2 (en) ā | 1982-09-30 | 1984-05-02 | International Business Machines Corporation | Method and apparatus for electrochemically treating a substrate |
DD246575A1 (en) ā | 1986-03-14 | 1987-06-10 | Seghers A Mikroelektronik Veb | METHOD FOR THE CONTINUOUS PARTIAL COATING OF METAL CHANNELS |
EP0337658A1 (en) ā | 1988-04-12 | 1989-10-18 | The Whitaker Corporation | Selective plating by laser ablation |
DE68910864T2 (en) ā | 1988-04-12 | 1994-06-01 | Whitaker Corp | Selective plating by laser ablation. |
DE69403926T2 (en) ā | 1993-01-28 | 1998-01-02 | Meco Equip Eng | Method and device for the selective electroplating of perforated metal or metallized objects |
Also Published As
Publication number | Publication date |
---|---|
DE50202493D1 (en) | 2005-04-21 |
CN1533449A (en) | 2004-09-29 |
WO2003012175A2 (en) | 2003-02-13 |
EP1409772B1 (en) | 2005-03-16 |
WO2003012175A3 (en) | 2003-10-30 |
US6972082B2 (en) | 2005-12-06 |
ATE291110T1 (en) | 2005-04-15 |
US20040206629A1 (en) | 2004-10-21 |
EP1409772A2 (en) | 2004-04-21 |
HK1069607A1 (en) | 2005-05-27 |
JP2004536971A (en) | 2004-12-09 |
DE10135349A1 (en) | 2003-02-06 |
CN1250777C (en) | 2006-04-12 |
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