EP1305984A1 - Method and apparatus for generating x-ray or euv radiation - Google Patents
Method and apparatus for generating x-ray or euv radiationInfo
- Publication number
- EP1305984A1 EP1305984A1 EP01952078A EP01952078A EP1305984A1 EP 1305984 A1 EP1305984 A1 EP 1305984A1 EP 01952078 A EP01952078 A EP 01952078A EP 01952078 A EP01952078 A EP 01952078A EP 1305984 A1 EP1305984 A1 EP 1305984A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- jet
- electron beam
- ray
- interaction
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/112—Non-rotating anodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2235/00—X-ray tubes
- H01J2235/08—Targets (anodes) and X-ray converters
- H01J2235/081—Target material
- H01J2235/082—Fluids, e.g. liquids, gases
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
Definitions
- the present invention generally relates to a method and an apparatus for generating X-ray or extreme ultraviolet (EUV) radiation, especially with high brilliance.
- the generated radiation can for example be used in medical diagnosis, non-destructive testing, lithography, microscopy, materials science, or in some other X-ray or EUV application.
- X-ray sources of high power and brilliance are applied in many fields, for instance medical diagnosis, non-destructive testing, crystal structural analysis, surface physics, lithography, X-ray fluorescence, and microscopy.
- X-rays are used for imaging the interior of objects that are opaque to visible light, for example in medical diagnostics and material inspection, where 10-1000 keV X-ray radiation is utilized, i.e. hard X-ray radiation.
- Conventional hard X-ray sources in which an electron beam is accelerated towards a solid anode, generate X-ray radiation of relatively low brilliance.
- the resolution of the obtained image basically depends on the distance to the X-ray source and the size of the source.
- the exposure time depends on the distance to the source and the power of the source. In practice, this makes X-ray imaging a trade-off between resolution and exposure time.
- the challenge has always been to extract as much X-ray power as possible from as small a source as possible, i.e. to achieve high brilliance.
- X-rays are emitted both as continuous Bremsstrahlung and characteristic line emission, wherein the specific emission characteristics depend on the target material used.
- the energy that is not converted into X- ray radiation is primarily deposited as heat in the solid target.
- the primary factor limiting the power, and the brilliance, of the X-ray radiation emitted from a conventional X-ray tube is the heating of the anode. More specifically, the electron-beam power must be limited to the extent that the anode material does not melt.
- Several different schemes have been introduced to increase the power limit.
- One such scheme includes cooling and rotating the anode, see for example Chapters 3 and 7 in "Imaging Systems for Medical Diagnostics", E. Krestel, Siemens Aktiengesellschaft, Berlin and Kunststoff, 1990.
- the cooled rotating anode can sustain a higher electron-beam power, its brilliance is still limited by the localized heating of the electron-beam focal spot. Also the average power load is limited since the same target material is used on every revolution.
- very high intensity sources for medical diagnosis operate at 100 kW/mm 2
- state of the art low-power micro-focus devices operate at 150 kW/mm 2 .
- the invention aims at providing a method and an apparatus for generation of X-ray or EUV radiation with very high brilliance in combination with relatively high average power.
- the inventive technique should also provide for stable and uncomplicated generation of X-ray or EUV radiation, with minimum production of debris.
- a further objective is to provide a method and an apparatus generating radiation suitable for medical diagnosis and material inspection.
- Still another object of the invention is to provide a method and an apparatus suitable for use in lithography, non-destructive testing, microscopy, crystal analysis, surface physics, materials science, X-ray photo spectroscopy (XPS) , X-ray fluorescence, protein structure determination by X-ray diffraction, and other X-ray application .
- the invention provides a method for generating X-ray or EUV radiation, comprising the steps of forming a target jet by urging a liquid substance under pressure through an outlet opening, which target jet propagates through an area of interaction; and directing at least one electron beam onto the target jet in the area of interaction such that the electron beam interacts with the target jet to generate X-ray or EUV radiation.
- the inventive method and apparatus allows for operation in either of two modes.
- a first mode of operation hard X-ray radiation is generated by direct conversion of the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature.
- soft X-ray or EUV radiation is generated by heating the jet to a plasma-forming tempera- ture.
- the invention provides significant improvements over prior-art technology.
- the jet target provides several advantages over the solid anode conventionally used in generation of hard X-ray radiation.
- the liquid jet has a density high enough to allow for high brilliance and power of the generated radiation.
- the jet is regenerative to its nature so there is no need to cool the target material.
- the target material can be destroyed, i.e. heated to a temperature above its melting temperature, due to the regenerative nature of the jet target.
- the electron-beam power density at the target may be increased significantly compared to non- regenerative targets.
- the jet can be given a very high propagation speed through the area of interaction. Compared to conventional stationary or rotating anodes, more energy can be deposited in such a fast propagating jet due to the correspondingly high rate of material transport into the area of interaction.
- the electron beam should preferably be properly focused thereon.
- the acceleration voltage used for generating the electron beam will be in the order of 5-500 kV, but might be higher.
- the beam current will typically be in the order of 10-1000 mA, but might be higher.
- the second mode of operation emanates from the basic insight that at least one electron beam can be used instead of a laser beam to form a plasma emitting soft X- ray or EUV radiation.
- the inventive method and apparatus allows for a significant increase in wall-plug conversion efficiency, as well as lower cost and complexity.
- Other attractive features include low emission of debris, essentially no limitation on repetition rate, and uninterrupted usage.
- the electron source should typically deliver in the order of 10 10 -10 13 /cm 2 to the area of interaction in order to establish the desired plasma temperature.
- the electron source can be pulsed or continuous in either of the first and second modes .
- the beam is preferably focused on the jet to essentially match the size of the beam to the size of the jet.
- the transverse dimensions of the line focus being essentially matched to the transverse dimensions of the jet.
- the jet is preferably generated with a diameter of about 1-100 ⁇ m but may be as large as millimeters. Thereby, the radiation will be emitted with high brilliance from a small area of interaction.
- the inventive apparatus and method may naturally be used in conjunction with X-ray optics, such as polycapillary lenses, compound refractive lenses or X-ray mirrors.
- the target jet is generated by urging a liquid substance through an outlet opening, such as a nozzle or an orifice, typically by means of a pump and/or a pressurized reservoir yielding a pressure typically in the range of 0.5-500 MPa to bring about a jet propagation ⁇ to to ⁇ >
- action 9 between the beam 4 and the jet 5 is located on a spatially continuous portion of the jet 5, i.e. a portion having a length that significantly exceeds the diameter.
- the apparatus can be continuously or semi- continuously operated to generate X-ray or EUV radiation, as will be described below.
- this approach results in sufficient spatial stability of the jet 5 to permit the focal spot of the electron beam 4 on the jet 5 to be of approximately the same size as the diameter of the jet 5.
- this approach also alleviates the need for any temporal synchronization of the electron source 2 with the target generator 3.
- similar advantages can be obtained with jets consisting of separate, spatially continuous portions.
- any formation of condensed matter emanating from a liquid jet can be used as target for the electron-beam within the scope of the invention, be it liquid or solid, spatially continuous, droplets, or a spray of droplets or clusters.
- the interaction of the beam 4 with the jet 5 results, in a first mode of operation, in that radiation is emitted from the area of interaction 9 by direct conversion, essentially without heating the jet 5 to a plasma-forming temperature.
- these characteristics are adapted such that the jet 5 is heated to a suitable plasma-forming temperature.
- the choice of mode depends on the desired wavelength range of the generated radiation.
- a plasma-based operation is most effective for generating soft X-ray and EUV radiation, i.e.
- the electron source 2 is controlled in such a manner, in relation to the characteristics of the target 5, that essentially no plasma is formed at the area of interaction 9.
- the distance from the outlet opening 8 to the area of interaction 9 is sufficiently long, typically 0.5-10 mm, so that the beam-jet-interaction does not damage the outlet.
- a jet 5 of liquid metal having a diameter of about 30 ⁇ m and a propagation speed of about 600 m/s, the jet 5 being irradiated about 10 mm away from the outlet opening 8 by means of an electron beam 4 of about 100 mA and 100 keV, the beam 4 being focused on the jet 5 to obtain a power density of about 10 MW/mm 2 in the area of interaction 9.
- the jet 5 is preferably formed from metals heated to a liquid state.
- tin (Sn) should be easy to use, although other metals or alloys may be used for generation of radiation in a desired wavelength range.
- gases cooled to a liquid state or material dissolved in a carrier liquid can include a window (not shown) transparent to X-rays for extracting the generated radiation from the chamber 1 to LO ⁇ CO CO H H
- the jet 5 is preferably formed from a noble gas cooled to a liquid state, to avoid coating of sensitive components within the apparatus.
- a noble gas cooled to a liquid state
- liquefied noble gases it is conceivable to use completely different substances for generating the jet, such as material dissolved in a carrier liquid or liquefied metals.
- An apparatus operating in the second mode and being designed for use in lithography or microscopy can include a collector system of multi-layer mirrors (not shown) that collects a large portion of the created EUV or soft x-ray radiation and transports it to illumination optics and the rest of the lithography/microscopy system.
- a collector system of multi-layer mirrors (not shown) that collects a large portion of the created EUV or soft x-ray radiation and transports it to illumination optics and the rest of the lithography/microscopy system.
- a microscopic target in the form of a jet 5 generated from a liquid substance, the production of debris will be very low.
- the inventive apparatus operating in the second mode has the potential of providing the same performance as an LPP system but at a lower price since multi kilowatt lasers are very complicated and expensive.
- the wall-plug conversion efficiency is much higher for electron sources than for lasers.
- inventive method and apparatus can be used to provide radiation for medical diagnosis, non-destructive testing, lithography, crystal analysis, microscopy, materials science, microscopy- surface physics, protein structure determination by X-ray diffraction, X-ray photo spectroscopy (XPS) , X-ray fluorescence, or in some other X-ray or EUV application.
- XPS X-ray photo spectroscopy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
Claims
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0002785A SE0002785D0 (en) | 2000-07-28 | 2000-07-28 | Method and apparatus for generating x-ray or EUV radiation as well as use thereof |
SE0002785 | 2000-07-28 | ||
SE0003073A SE522150C2 (en) | 2000-08-31 | 2000-08-31 | Generating X=ray or extreme UV radiation by directing electron beams onto liquid metal or liquefied noble gas to generate soft radiation |
SE0003073 | 2000-08-31 | ||
PCT/SE2001/001646 WO2002011499A1 (en) | 2000-07-28 | 2001-07-18 | Method and apparatus for generating x-ray or euv radiation |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1305984A1 true EP1305984A1 (en) | 2003-05-02 |
EP1305984B1 EP1305984B1 (en) | 2010-11-24 |
Family
ID=26655193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01952078A Expired - Lifetime EP1305984B1 (en) | 2000-07-28 | 2001-07-18 | Method and apparatus for generating x-ray radiation |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1305984B1 (en) |
JP (1) | JP5073146B2 (en) |
CN (1) | CN1272989C (en) |
AT (1) | ATE489838T1 (en) |
AU (1) | AU2001272873A1 (en) |
DE (1) | DE60143527D1 (en) |
WO (1) | WO2002011499A1 (en) |
Cited By (3)
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---|---|---|---|---|
DE102013220189A1 (en) | 2013-10-07 | 2015-04-23 | Siemens Aktiengesellschaft | X-ray source and method for generating X-ray radiation |
US10586673B2 (en) | 2014-12-22 | 2020-03-10 | Siemens Healthcare Gmbh | Metal jet x-ray tube |
WO2023128856A1 (en) | 2021-12-29 | 2023-07-06 | Innovicum Technology Ab | Particle based x-ray source |
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DE10113064B4 (en) * | 2001-03-15 | 2004-05-19 | Lzh Laserzentrum Hannover E.V. | Method and device for generating UV radiation, in particular EUV radiation |
DE10339495B4 (en) * | 2002-10-08 | 2007-10-04 | Xtreme Technologies Gmbh | Arrangement for the optical detection of a moving target current for pulsed energy-jet-pumped radiation generation |
US6933515B2 (en) * | 2003-06-26 | 2005-08-23 | University Of Central Florida Research Foundation | Laser-produced plasma EUV light source with isolated plasma |
DE102004003854A1 (en) * | 2004-01-26 | 2005-08-18 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Methods and apparatus for producing solid filaments in a vacuum chamber |
JP4337648B2 (en) * | 2004-06-24 | 2009-09-30 | 株式会社ニコン | EUV LIGHT SOURCE, EUV EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
US7557366B2 (en) * | 2006-05-04 | 2009-07-07 | Asml Netherlands B.V. | Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
SE530094C2 (en) * | 2006-05-11 | 2008-02-26 | Jettec Ab | Method for generating X-rays by electron irradiation of a liquid substance |
KR101437583B1 (en) * | 2007-07-03 | 2014-09-12 | 삼성전자주식회사 | Lithography apparatus and lithography method |
DE102008026938A1 (en) | 2008-06-05 | 2009-12-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Radiation source and method for generating X-radiation |
CN102369587B (en) * | 2009-04-03 | 2015-02-11 | 伊克斯拉姆公司 | Supply of a liquid-metal target in x-ray generation |
CN104681378B (en) * | 2009-04-03 | 2017-04-12 | 伊克斯拉姆公司 | Liquid metal target supply during x-ray production |
JP2011054376A (en) * | 2009-09-01 | 2011-03-17 | Ihi Corp | Lpp type euv light source and generation method of the same |
CN102972099B (en) * | 2010-07-09 | 2016-03-23 | Bsr股份有限公司 | X-ray generator and electron beam discharging device |
JP5167475B2 (en) * | 2010-12-27 | 2013-03-21 | 双葉電子工業株式会社 | Photodisinfection device and ultraviolet X-ray generator |
JP5347138B2 (en) * | 2010-12-27 | 2013-11-20 | 双葉電子工業株式会社 | Photodisinfection device and ultraviolet X-ray generator |
US20140161233A1 (en) | 2012-12-06 | 2014-06-12 | Bruker Axs Gmbh | X-ray apparatus with deflectable electron beam |
CN103079327B (en) * | 2013-01-05 | 2015-09-09 | 中国科学院微电子研究所 | Target source pre-shaping enhanced extreme ultraviolet light generating device |
US9767982B2 (en) * | 2013-02-13 | 2017-09-19 | Koninklijke Philips N.V. | Multiple X-ray beam tube |
CN103209536A (en) * | 2013-03-22 | 2013-07-17 | 中国科学院上海光学精密机械研究所 | Method for producing soft X ray |
DE102013209447A1 (en) * | 2013-05-22 | 2014-11-27 | Siemens Aktiengesellschaft | X-ray source and method for generating X-ray radiation |
WO2015104225A1 (en) * | 2014-01-07 | 2015-07-16 | Jettec Ab | X-ray micro imaging |
CN103871832B (en) * | 2014-03-21 | 2016-08-24 | 中国科学院空间科学与应用研究中心 | A kind of extreme ultraviolet pulse generation manipulator |
JP2017522697A (en) * | 2014-07-17 | 2017-08-10 | シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft | Fluid injector for x-ray tube and method for providing a liquid anode by liquid metal jet |
US9301381B1 (en) * | 2014-09-12 | 2016-03-29 | International Business Machines Corporation | Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas |
DE102014226814B4 (en) * | 2014-12-22 | 2023-05-11 | Siemens Healthcare Gmbh | metal beam x-ray tube |
EP3214635A1 (en) * | 2016-03-01 | 2017-09-06 | Excillum AB | Liquid target x-ray source with jet mixing tool |
RU2670273C2 (en) * | 2017-11-24 | 2018-10-22 | Общество с ограниченной ответственностью "РнД-ИСАН" | Device and method for emission generation from laser plasma |
RU2709183C1 (en) * | 2019-04-26 | 2019-12-17 | Общество С Ограниченной Ответственностью "Эуф Лабс" | X-ray source with liquid metal target and method of radiation generation |
EP3493239A1 (en) * | 2017-12-01 | 2019-06-05 | Excillum AB | X-ray source and method for generating x-ray radiation |
KR102447685B1 (en) * | 2020-07-22 | 2022-09-27 | 포항공과대학교 산학협력단 | Apparatus and method for generating light source with range of specific wavelength |
US11882642B2 (en) | 2021-12-29 | 2024-01-23 | Innovicum Technology Ab | Particle based X-ray source |
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JPS61153935A (en) * | 1984-12-26 | 1986-07-12 | Toshiba Corp | Plasma x-ray generator |
US4953191A (en) * | 1989-07-24 | 1990-08-28 | The United States Of America As Represented By The United States Department Of Energy | High intensity x-ray source using liquid gallium target |
US5052034A (en) * | 1989-10-30 | 1991-09-24 | Siemens Aktiengesellschaft | X-ray generator |
JPH03283398A (en) * | 1990-03-30 | 1991-12-13 | Shimadzu Corp | X-ray generator |
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JP2552433B2 (en) * | 1994-06-30 | 1996-11-13 | 関西電力株式会社 | Method and apparatus for removing debris from laser plasma X-ray source |
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US6031241A (en) * | 1997-03-11 | 2000-02-29 | University Of Central Florida | Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications |
US5763930A (en) * | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
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JP3602356B2 (en) * | 1998-12-02 | 2004-12-15 | 三菱電機株式会社 | Electromagnetic wave generator |
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2001
- 2001-07-18 AU AU2001272873A patent/AU2001272873A1/en not_active Abandoned
- 2001-07-18 WO PCT/SE2001/001646 patent/WO2002011499A1/en active Application Filing
- 2001-07-18 DE DE60143527T patent/DE60143527D1/en not_active Expired - Lifetime
- 2001-07-18 CN CNB018163963A patent/CN1272989C/en not_active Expired - Lifetime
- 2001-07-18 AT AT01952078T patent/ATE489838T1/en not_active IP Right Cessation
- 2001-07-18 EP EP01952078A patent/EP1305984B1/en not_active Expired - Lifetime
- 2001-07-18 JP JP2002515466A patent/JP5073146B2/en not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
---|
See references of WO0211499A1 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013220189A1 (en) | 2013-10-07 | 2015-04-23 | Siemens Aktiengesellschaft | X-ray source and method for generating X-ray radiation |
US10586673B2 (en) | 2014-12-22 | 2020-03-10 | Siemens Healthcare Gmbh | Metal jet x-ray tube |
WO2023128856A1 (en) | 2021-12-29 | 2023-07-06 | Innovicum Technology Ab | Particle based x-ray source |
Also Published As
Publication number | Publication date |
---|---|
AU2001272873A1 (en) | 2002-02-13 |
DE60143527D1 (en) | 2011-01-05 |
WO2002011499A1 (en) | 2002-02-07 |
CN1466860A (en) | 2004-01-07 |
JP2004505421A (en) | 2004-02-19 |
CN1272989C (en) | 2006-08-30 |
ATE489838T1 (en) | 2010-12-15 |
JP5073146B2 (en) | 2012-11-14 |
EP1305984B1 (en) | 2010-11-24 |
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