EP1215309A4 - Silicon wafer and method for manufacture thereof, and method for evaluation of silicon wafer - Google Patents
Silicon wafer and method for manufacture thereof, and method for evaluation of silicon waferInfo
- Publication number
- EP1215309A4 EP1215309A4 EP00955019A EP00955019A EP1215309A4 EP 1215309 A4 EP1215309 A4 EP 1215309A4 EP 00955019 A EP00955019 A EP 00955019A EP 00955019 A EP00955019 A EP 00955019A EP 1215309 A4 EP1215309 A4 EP 1215309A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- silicon wafer
- evaluation
- manufacture
- wafer
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24118699 | 1999-08-27 | ||
JP24118699 | 1999-08-27 | ||
PCT/JP2000/005738 WO2001016409A1 (en) | 1999-08-27 | 2000-08-25 | Silicon wafer and method for manufacture thereof, and method for evaluation of silicon wafer |
Publications (4)
Publication Number | Publication Date |
---|---|
EP1215309A1 EP1215309A1 (en) | 2002-06-19 |
EP1215309A4 true EP1215309A4 (en) | 2003-05-02 |
EP1215309B1 EP1215309B1 (en) | 2010-01-06 |
EP1215309B8 EP1215309B8 (en) | 2010-05-19 |
Family
ID=17070515
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP00955019A Expired - Lifetime EP1215309B8 (en) | 1999-08-27 | 2000-08-25 | Silicon wafer and method for manufacture thereof, and method for evaluation of silicon wafer |
Country Status (5)
Country | Link |
---|---|
US (1) | US6800132B1 (en) |
EP (1) | EP1215309B8 (en) |
KR (2) | KR100720659B1 (en) |
DE (1) | DE60043661D1 (en) |
WO (1) | WO2001016409A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4549589B2 (en) * | 2001-09-14 | 2010-09-22 | シルトロニック・ジャパン株式会社 | Silicon semiconductor substrate and manufacturing method thereof |
KR20030043387A (en) * | 2001-11-28 | 2003-06-02 | 주식회사 실트론 | Manufacturing method of single crystal silicon wafer |
JP4257080B2 (en) * | 2002-07-30 | 2009-04-22 | Sumco Techxiv株式会社 | Defect detection method for silicon wafer |
JP2006315869A (en) * | 2005-05-10 | 2006-11-24 | Sumco Corp | Method for manufacturing nitrogen-doped silicon single crystal |
JP4693188B2 (en) * | 2008-07-11 | 2011-06-01 | Sumco Techxiv株式会社 | Silicon wafer etching method |
JP5346744B2 (en) * | 2008-12-26 | 2013-11-20 | ジルトロニック アクチエンゲゼルシャフト | Silicon wafer and manufacturing method thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0942078A1 (en) * | 1998-03-09 | 1999-09-15 | Shin-Etsu Handotai Company Limited | Method for producing silicon single crystal wafer and silicon single crystal wafer |
EP0962556A1 (en) * | 1998-06-04 | 1999-12-08 | Shin-Etsu Handotai Company Limited | Nitrogen doped single crystal silicon wafer with few defects and method for its production |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61193456A (en) | 1985-02-21 | 1986-08-27 | Toshiba Corp | Manufacture of semiconductor element |
JP3080338B2 (en) * | 1992-06-22 | 2000-08-28 | 株式会社コプロス | Pit excavator with variable machine width |
DE19637182A1 (en) * | 1996-09-12 | 1998-03-19 | Wacker Siltronic Halbleitermat | Process for the production of silicon wafers with low defect density |
JP4041182B2 (en) | 1997-01-27 | 2008-01-30 | Sumco Techxiv株式会社 | Silicon wafer for heat treatment and manufacturing method thereof |
JP3346249B2 (en) | 1997-10-30 | 2002-11-18 | 信越半導体株式会社 | Heat treatment method for silicon wafer and silicon wafer |
-
2000
- 2000-08-25 US US10/049,875 patent/US6800132B1/en not_active Expired - Lifetime
- 2000-08-25 KR KR1020027001983A patent/KR100720659B1/en active IP Right Grant
- 2000-08-25 KR KR1020077006261A patent/KR20070036804A/en not_active Application Discontinuation
- 2000-08-25 DE DE60043661T patent/DE60043661D1/en not_active Expired - Lifetime
- 2000-08-25 WO PCT/JP2000/005738 patent/WO2001016409A1/en not_active Application Discontinuation
- 2000-08-25 EP EP00955019A patent/EP1215309B8/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0942078A1 (en) * | 1998-03-09 | 1999-09-15 | Shin-Etsu Handotai Company Limited | Method for producing silicon single crystal wafer and silicon single crystal wafer |
EP0962556A1 (en) * | 1998-06-04 | 1999-12-08 | Shin-Etsu Handotai Company Limited | Nitrogen doped single crystal silicon wafer with few defects and method for its production |
Non-Patent Citations (4)
Title |
---|
CHEN Y Y ET AL: "PERFORMANCE AND RELIABILITY ASSESSMENT OF DUAL-GATE CMOS DEVICES WITH GATE OXIDE GROWN ON NITROGEN IMPLANTED SI SUBSTRATES", INTERNATIONAL ELECTRON DEVICES MEETING 1997. IEDM TECHNICAL DIGEST. WASHINGTON, DC, DEC. 7 - 10, 1997, NEW YORK, NY: IEEE, US, 7 December 1997 (1997-12-07), pages 639 - 642, XP000855877, ISBN: 0-7803-4101-5 * |
CISZEK T F ET AL: "EFFECT OF NITROGEN DOPING ON MICRODEFECTS AND MINORITY CHARGE CARRIER LIFETIME OF HIGH-PURITY, DISLOCATION-FREE AND MULTICRYSTALLINE SILICON", SOLAR ENERGY MATERIALS AND SOLAR CELLS, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, NL, vol. 41/42, 1 June 1996 (1996-06-01), pages 61 - 70, XP000614222, ISSN: 0927-0248 * |
See also references of WO0116409A1 * |
SHIMURA ET AL: "Nitrogen effect on oxygen precipitation in Czochralski silicon", APPLIED PHYSICS LETTERS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 48, no. 3, January 1986 (1986-01-01), pages 224 - 226, XP002105443, ISSN: 0003-6951 * |
Also Published As
Publication number | Publication date |
---|---|
US6800132B1 (en) | 2004-10-05 |
EP1215309A1 (en) | 2002-06-19 |
EP1215309B1 (en) | 2010-01-06 |
KR20020026575A (en) | 2002-04-10 |
WO2001016409A1 (en) | 2001-03-08 |
DE60043661D1 (en) | 2010-02-25 |
KR100720659B1 (en) | 2007-05-21 |
KR20070036804A (en) | 2007-04-03 |
EP1215309B8 (en) | 2010-05-19 |
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