EP1195445B1 - Ti Al-Legierung mit Bor, Wolfram und Silizium - Google Patents
Ti Al-Legierung mit Bor, Wolfram und Silizium Download PDFInfo
- Publication number
- EP1195445B1 EP1195445B1 EP01123551A EP01123551A EP1195445B1 EP 1195445 B1 EP1195445 B1 EP 1195445B1 EP 01123551 A EP01123551 A EP 01123551A EP 01123551 A EP01123551 A EP 01123551A EP 1195445 B1 EP1195445 B1 EP 1195445B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- alloy
- rest
- alloys
- tungsten
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
Definitions
- the invention relates to a high temperature alloy for thermal Machines based on intermetallic compounds which are suitable for Investment casting and directional solidification are suitable and the conventional nickel-base superalloys complete.
- Titanium intermetallic compounds with aluminum have some interesting properties, which they use as construction materials in the middle and higher temperature range appear attractive. This includes among other things their compared to superalloys lower density. Of their technical usability in its present form but is their brittleness opposite. This can be improved by certain additives.
- the heat resistance of the known aluminides leaves much to be desired. According to the comparatively low melting point of these materials the strength, in particular the creep resistance, in the upper temperature range insufficient.
- the invention seeks to further extend this known high temperature alloy improve. It is the object of the invention, a light alloy with improved heat resistance and ductility at high temperatures (in the range from 600 to 1000 ° C) and a good oxidation and corrosion resistance which is well suited for directional solidification or investment casting and in consists essentially of a refractory intermetallic compound.
- the core of the invention is compared to the known alloys on the one hand the reduced AI content, on the other hand the possibility of a much higher B content to realize.
- the advantages of the invention are that it is due to the combination of mentioned alloying elements, but in particular by the higher B contents manages, on the one hand, a very fine grain both thin and large cross sections and thus the toughness and the Creep resistance increase, and on the other hand, a good oxidation resistance to achieve.
- the lowering of the Al content in comparison to the known state The technique increases the strength, but at the same time favors the Grain coarsening. Boron, on the other hand, stabilizes the grain boundaries, ie. H. the higher ones Boron contents reduce coarsening.
- alloys of the following composition were melted under argon as protective gas, L1, L2, L3 and L4 alloys according to the invention and V1 and V2 representing comparative alloys: alloy Ti al W Si B L1 rest 45 2 0.40 1.8 L2 rest 45 2 0.47 2.5 L2 rest 45 1.9 0.46 3.5 L4 rest 44.9 1.9 0.46 4.0 V1 rest 46 2 0.48 0.7 V2 rest 47 2 0.50 0
- the starting materials used were the individual elements with a degree of purity from 99.99%.
- the melt was in each case to a casting blank of about 50 mm Diameter and poured about 70 mm height. These blanks were under Inert gas again melted and also under inert gas to solidify in the form of rods with about 9 mm diameter and about 70 mm in length forced. These bars were given a HIP (HOT ISOSTATIC PRESSING) and Subjected to heat treatment and then processed into tensile specimens.
- the HIP treatment was carried out for 4 hours at a temperature of 1260 ° C and a pressure of 172 MPa.
- the heat treatment was carried out under protective gas following parameters: 1350 ° C / 1 h + 1000 ° C / 6 h.
- FIGS. 1 to 6 show the microstructure of the alloys L1, L2, L3, L4 as well as V1 and V2.
- the Microstructure of the Alloys L1, L2, L3 and L4 According to the Invention is considerably finer-grained than the microstructure of the comparative alloy V1 (FIG. 5), which is alloyed with lower B contents or than the comparative alloy VL2, which contains no boron.
- FIG. 7 shows a diagram of the alloys L1, L2 and L3 according to the invention and the comparative alloys V1 and V2 the hardness values as a function of Boron content.
- the alloys L1, L2 and L3 show a greater hardness than the comparative alloys. Particularly good hardness values achieved Inventive alloy L1 with 1.8 at.% boron.
- the field of application of the modified titanium aluminides advantageously extends to a temperature range between 600 and 1000 ° C.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
Description
El = B, Ge oder Si und Me = Cr, Mn, Nb, Pd, Ta, W, Y, Zr und es gilt:
- Fig. 1
- eine Gefügebild einer erfindungsgemässen Legierung L1 mit folgender Zusammensetzung: Al 45 At.%, W 2 At.%, Si 0,4 At.%, B 1,8 At.%, Rest Ti;
- Fig. 2
- eine Gefügebild einer erfindungsgemässen Legierung L2 mit folgender Zusammensetzung: Al 45 At.%, W 2 At.%, Si 0,47 At.%, B 2,5 At.%, Rest Ti;
- Fig. 3
- ein Gefügebild einer erfindungsgemässen Legierung L3 mit folgender Zusammensetzung: Al 45 At.%, W 1,9 At.%, Si 0,46 At.%, B 3,5 At.%, Rest Ti;
- Fig. 4
- ein Gefügebild einer erfindungsgemässen Legierung L4 mit folgender Zusammensetzung: Al 44,9 At.%, W 1,9 At.%, Si 0,46 At.%, B 4 At.%, Rest Ti;
- Fig. 5
- ein Gefügebild einer Vergleichslegierung V1 mit folgender Zusammensetzung: Al 46 At.%, W 2 At.%, Si 0,48 At.%, B 0,7 At.%, Rest Ti;
- Fig. 6
- ein Gefügebild einer Vergleichslegierung V2 mit folgender Zusammensetzung: Al 47 At.%, W 2 At.%, Si 0,5 At.%, Rest Ti;
- Fig. 7
- eine Darstellung der Härte in Abhängigkeit vom Bor-Gehalt.
Legierung | Ti | Al | W | Si | B |
L1 | Rest | 45 | 2 | 0,40 | 1,8 |
L2 | Rest | 45 | 2 | 0,47 | 2,5 |
L2 | Rest | 45 | 1,9 | 0,46 | 3,5 |
L4 | Rest | 44,9 | 1,9 | 0,46 | 4,0 |
V1 | Rest | 46 | 2 | 0,48 | 0,7 |
V2 | Rest | 47 | 2 | 0,50 | 0 |
Claims (2)
- Hochtemperaturlegierung für ein mechanisch hochbeanspruchtes Bauteil einer thermischen Maschine auf der Basis von dotiertem TiAl mit folgender Zusammensetzung (in Atom%):44,5 bis <46 Al1-3 W0,4-1 Si1-4 BRest Ti und herstellungsbedingte Verunreinigungen.
- Hochtemperaturlegierung nach Anspruch 1 mit folgender Zusammensetzung (in Atom%):45 Al2W0,5 Si2BRest Ti und herstellungsbedingte Verunreinigung.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10049026A DE10049026A1 (de) | 2000-10-04 | 2000-10-04 | Hochtemperaturlegierung |
DE10049026 | 2000-10-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1195445A1 EP1195445A1 (de) | 2002-04-10 |
EP1195445B1 true EP1195445B1 (de) | 2004-02-11 |
Family
ID=7658584
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01123551A Expired - Lifetime EP1195445B1 (de) | 2000-10-04 | 2001-10-01 | Ti Al-Legierung mit Bor, Wolfram und Silizium |
Country Status (3)
Country | Link |
---|---|
US (1) | US6676897B2 (de) |
EP (1) | EP1195445B1 (de) |
DE (2) | DE10049026A1 (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109280786B (zh) * | 2018-11-22 | 2020-06-02 | 河北四通新型金属材料股份有限公司 | 一种铝钨中间合金及其生产方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3203794A (en) | 1957-04-15 | 1965-08-31 | Crucible Steel Co America | Titanium-high aluminum alloys |
US4842820A (en) * | 1987-12-28 | 1989-06-27 | General Electric Company | Boron-modified titanium aluminum alloys and method of preparation |
US4983357A (en) | 1988-08-16 | 1991-01-08 | Nkk Corporation | Heat-resistant TiAl alloy excellent in room-temperature fracture toughness, high-temperature oxidation resistance and high-temperature strength |
US5045406A (en) | 1989-06-29 | 1991-09-03 | General Electric Company | Gamma titanium aluminum alloys modified by chromium and silicon and method of preparation |
DE59106459D1 (de) | 1990-05-04 | 1995-10-19 | Asea Brown Boveri | Hochtemperaturlegierung für Maschinenbauteile auf der Basis von dotiertem Titanaluminid. |
US5370839A (en) * | 1991-07-05 | 1994-12-06 | Nippon Steel Corporation | Tial-based intermetallic compound alloys having superplasticity |
US5226985A (en) * | 1992-01-22 | 1993-07-13 | The United States Of America As Represented By The Secretary Of The Air Force | Method to produce gamma titanium aluminide articles having improved properties |
US5328530A (en) * | 1993-06-07 | 1994-07-12 | The United States Of America As Represented By The Secretary Of The Air Force | Hot forging of coarse grain alloys |
USH1659H (en) * | 1995-05-08 | 1997-07-01 | The United States Of America As Represented By The Secretary Of The Air Force | Method for heat treating titanium aluminide alloys |
US5653828A (en) * | 1995-10-26 | 1997-08-05 | National Research Council Of Canada | Method to procuce fine-grained lamellar microstructures in gamma titanium aluminides |
US5908516A (en) * | 1996-08-28 | 1999-06-01 | Nguyen-Dinh; Xuan | Titanium Aluminide alloys containing Boron, Chromium, Silicon and Tungsten |
DE19756354B4 (de) * | 1997-12-18 | 2007-03-01 | Alstom | Schaufel und Verfahren zur Herstellung der Schaufel |
DE19933633A1 (de) * | 1999-07-17 | 2001-01-18 | Abb Alstom Power Ch Ag | Hochtemperaturlegierung |
-
2000
- 2000-10-04 DE DE10049026A patent/DE10049026A1/de not_active Withdrawn
-
2001
- 2001-10-01 EP EP01123551A patent/EP1195445B1/de not_active Expired - Lifetime
- 2001-10-01 DE DE50101467T patent/DE50101467D1/de not_active Expired - Lifetime
- 2001-10-03 US US09/969,026 patent/US6676897B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1195445A1 (de) | 2002-04-10 |
DE50101467D1 (de) | 2004-03-18 |
US6676897B2 (en) | 2004-01-13 |
US20030124021A1 (en) | 2003-07-03 |
DE10049026A1 (de) | 2002-04-11 |
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