EP1189492B1 - Explosive activated RF source - Google Patents

Explosive activated RF source Download PDF

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Publication number
EP1189492B1
EP1189492B1 EP01119011A EP01119011A EP1189492B1 EP 1189492 B1 EP1189492 B1 EP 1189492B1 EP 01119011 A EP01119011 A EP 01119011A EP 01119011 A EP01119011 A EP 01119011A EP 1189492 B1 EP1189492 B1 EP 1189492B1
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EP
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Prior art keywords
explosive
powered
beam source
source according
coil
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EP01119011A
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German (de)
French (fr)
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EP1189492A1 (en
Inventor
Markus Dr. Jung
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Rheinmetall Waffe Munition GmbH
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Rheinmetall Waffe Munition GmbH
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H13/00—Means of attack or defence not otherwise provided for
    • F41H13/0043—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target
    • F41H13/0075—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target the high-energy beam being a radiofrequency beam
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H13/00—Means of attack or defence not otherwise provided for
    • F41H13/0043—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target
    • F41H13/0068—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target the high-energy beam being of microwave type, e.g. for causing a heating effect in the target
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H13/00—Means of attack or defence not otherwise provided for
    • F41H13/0093—Devices generating an electromagnetic pulse, e.g. for disrupting or destroying electronic devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F42—AMMUNITION; BLASTING
    • F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
    • F42B12/00—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material
    • F42B12/02—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect
    • F42B12/36—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect for dispensing materials; for producing chemical or physical reaction; for signalling ; for transmitting information
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils

Definitions

  • the invention relates to an explosive-driven RF radiation source according to the preamble of patent claim 1.
  • RF radiation sources Radio Frequency
  • HPM sources High Power Microwave
  • RF radiation sources can be accommodated in a carrier system, for example a warhead.
  • An RF radiation source in a projectile describes the US 5,192,827 ,
  • the current required to generate a high frequency to be radiated is stored in a pulse shaping device before the projectile is fired.
  • the pulse shaping device is formed by a coil, a dielectric rod and a dielectric.
  • the discharge of the pulse shaping device takes place over a nanosecond switch.
  • the generated pulse is placed in an antenna located in the projectile, which radiates this pulse through the housing of the projectile towards the target.
  • multiple pulse shaping devices are in the projectile. As a result, the producible power adds up to approximately 12 MW.
  • the US 5,307,079 and the US 5,216,695 disclose microwave generating and amplifying circuits. To achieve high frequencies, transistors are integrated into a Marx generator, which emits them to an antenna.
  • the invention now has the task of demonstrating a simple, explosive-driven RF radiation source, which also has an increase in the high frequency.
  • the invention is based on the idea of constructing an explosive-driven RF radiation source only from a pulse generator or a pulse generating device, whose generated pulses are emitted directly to a target.
  • the pulse generator is stirred as a magnetic flux compressor and has an explosive-filled liner which is located in a coil on.
  • a capacitive load is connected, which is connected to the output side of the pulse generator, whereby the coil with the capacitive load forms an electrical resonant circuit and the capacitive load simultaneously acts as an antenna.
  • the frequency generated in this resonant circuit can thereby be emitted directly.
  • the housing of the RF radiation source must be designed so that the frequencies generated can pass through unhindered.
  • an agent is introduced, thereby increasing the number of free electrons to support the plasma formation and to achieve better conversion of chemical energy into high frequency energy thus to stimulate a higher frequency.
  • Suitable materials for the formation of a plasma are materials with low electrical conductivity, low binding energy for electrons and with rough surface structures having material peaks in the range of a few micrometers ( ⁇ m).
  • Another possibility of increasing the plasma formation is the increase in the electric field strength in the region between the coil and the explosive-driven short-circuiting device by a corresponding design of the coil structure.
  • Reducing the ambient pressure in the region between the coil and the explosive-driven shorting device of opening liners by creating a negative pressure (vacuum) also has a positive effect on the formation of free electrons.
  • a favorable background gas for the plasma formation in the region between the coil and the explosive-driven short-circuiting device can be introduced.
  • a carrier system 1, here a projectile, for the purpose of transporting an RF radiation source 2 is shown.
  • the RF radiation source 2 consists of a battery 3 or a similar current storage unit, which is electrically connected to an igniter 11 of an explosive 10 driven pulse generating device 4, as well as a capacitive load C L.
  • the capacitive load C L is connected to the output of the pulse generating device 4.
  • the pulse generating device 4 is here a magnetic flux compressor having a coil 6, which consists of a bobbin 6.1, on which turns are 6.2 and in which a liner 6.3 is integrated. With connection to the battery or to the switch of the Battery, a current flow in the turns 6.2 is initiated.
  • the explosive 10 and the igniter 11 are housed either in an additional in the coil 6 integrietren shorting device 7 or in the liner 6.3.
  • this RF radiation source 2 can be described as follows. With the carrier system 1, the autonomous RF radiation source 2 is brought to the destination on site. There, the connection of the battery 3, for example, time or impact controlled on the coil 6. When reaching the maximum current in the coil 6, by the other, not shown energy supply of the igniter 11, such as a detonator, the magnetic flux compressor 4 ignited, whereby in a conventional manner the high explosive 10 located in the short-circuiting device 7 (or in the opening liner 6.3) ruptures the short-circuiting device 7 and the bobbin 6.1 and the individual turns 6.2 are sequentially short-circuited. With an initial small initial inductance and a constant magnetic flux, only one winding 6.2 produces nearly 100 times or more gain. Here, chemical energy is converted into an electrical energy, the final energy W is dependent on the initial inductance L 0 / end inductance L n x initial energy where.
  • the capacitive load C L forms with the coil 6 after closing the circuit the opening liner 6.3 a resonant circuit whose frequency is changed by the time change of the inductance of the coil 6 due to the shock wave in the liner 6.3.
  • This frequency or the generated pulse 8 is emitted directly from the acting as an antenna capacitive load C L.
  • FIG. 2 and FIG. 3 now proposed to constructively modify the magnetic positive compressor 4 to obtain a plurality of free electrons. This causes a spontaneous plasma formation with extremely fast turn-on, whereby higher frequencies can be generated without additional electrical components.
  • a plasma-assisting agent 14 is introduced in a first variant between the bobbin 6.1 with its turns 6.2 and the liner 6.3.
  • This supporting means 14 may on the one hand be a material 15, which is placed as a layer between the bobbin 6.1 and the liner 6.3, on the other hand, a favorable background gas or a vacuum, whereby a combination of layer and gas or vacuum is possible.
  • a plasma formation enhancing material 15 has low electrical conductivity, low binding energy for electrons, and / or a surface structure with material spikes in the order of a few microns.
  • a material 15 having all of these advantages for increasing free electrons is a carbon fiber or a velvet.
  • FIG. 3 is another measure to increase the electric field strength in the range 13, which also affects the plasma education advantageous.
  • the coil cross section of the coil 6 has been changed, wherein the bobbin 6.1 is designed truncated cone and already reaches the first turns 6.2 of the coil 6 with its larger coil cross section. This results in a sharp edge formation between the short-circuiting device 7 and the liner 6.3 and the bobbin 6.1 with the first winding 6.2.
  • the energy required for the short circuit to rupture the shorting device 7 and the bobbin 6.1 can be minimized due to the smaller necessary path between the shorting device 7 and the turns 6.2, and thus is the plasma education available.
  • an LC parallel resonant circuit can also be connected on the output side to the pulse generating device 4, as in FIG Fig. 4 shown. As a result, an improved emission characteristic of the RF radiation source 2 is achieved.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical & Material Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)

Description

Die Erfindung betrifft eine explosivstoffgetriebene RF-Strahlenquelle nach dem Oberbegriff des Patentanspruchs 1.The invention relates to an explosive-driven RF radiation source according to the preamble of patent claim 1.

Bekannt sind RF-Strahlenquellen (RF = Radio Frequency), auch HPM-Quellen genannt (HPM = High Power Microwave - Hochleistungsmikrowellen), zur nicht letalen Zerstörung, Störung oder Blendung von Zielen. Dazu können die RF-Strahlenquellen in einem Trägersystemen, beispielsweise einem Gefechtskopf, untergebracht sein.RF radiation sources (RF = Radio Frequency), also called HPM sources (HPM = High Power Microwave), are known for non-lethal destruction, interference or glare of targets. For this purpose, the RF radiation sources can be accommodated in a carrier system, for example a warhead.

Eine RF-Strahlenquelle in einem Projektil beschreibt die US 5,192,827 . Der zur Erzeugung einer hohen abzustrahlenden Frequenz notwendige Strom wird vor Abschuß des Projektils in einer Pulsformeinrichtung gespeichert. Die Pulsformeinrichtung wird dabei von einer Spule, einem dielektrischen Stab und einem Dielektrikum gebildet. Die Entladung der Pulsformeinrichtung erfolgt über einen Nanosekundenschalter. Über diesen wird der erzeugte Puls in eine im Projektil befindliche Antenne gegeben, die diesen Puls durch das Gehäuse des Projektils zum Ziel hin abstrahlt. In einem Ausführungsbeispiel befinden sich mehrere Pulsformeinrichtungen im Projektil. Dadurch summiert sich die erzeugbare Leistung auf ca. 12 MW.An RF radiation source in a projectile describes the US 5,192,827 , The current required to generate a high frequency to be radiated is stored in a pulse shaping device before the projectile is fired. The pulse shaping device is formed by a coil, a dielectric rod and a dielectric. The discharge of the pulse shaping device takes place over a nanosecond switch. About this, the generated pulse is placed in an antenna located in the projectile, which radiates this pulse through the housing of the projectile towards the target. In one embodiment, multiple pulse shaping devices are in the projectile. As a result, the producible power adds up to approximately 12 MW.

Einen elektronenbeschleunigten Mikrowellenapplikator für eine Plasma-Quelle beschreibt die US 5,707,452 . Hierbei wird die hohe Energie durch die Beschleunigung der erzeugten Plasma-Elektronen beim Passieren von Spalten des geschlitzten Applikators realisiert, der mit einer Antenne elektrisch verbunden ist. Auch die aus der vorgenannten US 5,707,452 hervorgegangene US 5,975,014 beschreibt einen solchen Applikator.An electronically accelerated microwave applicator for a plasma source describes the US 5,707,452 , In this case, the high energy is realized by the acceleration of the generated plasma electrons when passing through gaps of the slotted applicator, which is electrically connected to an antenna. Also from the aforementioned US 5,707,452 emerged US 5,975,014 describes such an applicator.

Aus der DE 41 41 516 A1 ist ein elektrischer Impulsgenerator mit sättigbarer Induktanz beschrieben. Zur Impulsformung wird eine Koaxialleitung durch eine magnetische Kompression belastet und über einen magnetischen Schalter mit sättigbarer Induktanz entlastet, wodurch Pulse geformt werden.From the DE 41 41 516 A1 is described an electrical pulse generator with saturable inductance. For pulse shaping, a coaxial line is loaded by a magnetic compression and relieved via a magnetic switch with saturable inductance, whereby pulses are formed.

Die US 5,307,079 und die US 5,216,695 offenbaren Mikrowellen erzeugende und verstärkende Schaltungen. Zur Erreichung hoher Frequenzen sind Transistoren in einen Marx-Generator integriert, der diese an eine Antenne abgibt.The US 5,307,079 and the US 5,216,695 disclose microwave generating and amplifying circuits. To achieve high frequencies, transistors are integrated into a Marx generator, which emits them to an antenna.

In der nicht vorveröffentlichten DE 199 59 358 wird eine mit Explosivstoff getriebene autonome RF-Strahlenquelle offenbart. Dort wird zeit- oder aufschlaggesteuert durch eine Batterie ein Zünder eines magnetischen Flußkompressors gezündet, wodurch in herkömmlicher Art und Weise der im Liner befindliche Hochexplosivstoff den Spulenkörper aufreißt und die einzelnen Windungen nacheinander kurzgeschlossen werden. Ausgangsseitig ist der Flußkompressor mit einer Verstärkereinheit verbunden, welche die erzeugte Spannung verstärkt und diese über eine Hochdruck-Funkenstrecke an einen UWB-Pulser zur Erzeugung von Pulsen gibt. Über eine mit dem Kabelwiderstand des UWB-Pulses angepaßte Breitbandantenne werden danach die Pulse auf das Ziel abgestrahlt.In the not pre-published DE 199 59 358 discloses an explosive driven autonomous RF radiation source. There, a detonator of a magnetic flux compressor is triggered by a battery, which in a conventional manner, the high explosive located in the liner ruptures the bobbin and the individual turns are short-circuited in a time-or impact-controlled by a battery. On the output side, the flow compressor is connected to an amplifier unit, which amplifies the voltage generated and outputs it via a high-pressure spark gap to a UWB pulse generator for generating pulses. The pulses are then emitted to the target via a broadband antenna adapted to the cable resistance of the UWB pulse.

Lindemuth et al.: "US/Russion collaboration in high-energy-density physics using high-explosive pulsed power" - IEEE Transactions on Plasma Science, Dec. 1997, Bd. 25, N.6, Seiten 1357-1372 , offenbart eine explosivstoffgetriebene Röntgenstrahlungsquelle. Lindemuth et al .: "US / Russion collaboration in high-energy density physics using high-explosive pulsed power" - IEEE Transactions on Plasma Science, Dec. 1997, Vol. 25, N.6, pages 1357-1372 discloses an explosive-driven X-ray source.

Der Erfindung stellt sich nun die Aufgabe, eine einfache, explosivstoffgetriebene RF-Strahlenquelle aufzuzeigen, die zudem eine Steigerung der Hochfrequenz aufweist.The invention now has the task of demonstrating a simple, explosive-driven RF radiation source, which also has an increase in the high frequency.

Gelöst wird die Aufgabe durch die Merkmale des Patentanspruches 1.The problem is solved by the features of claim 1.

Der Erfindung liegt die Idee zugrunde, eine explosivstoffgetriebene RF-Strahlenquelle nur aus einem Pulsgenerator bzw. eine Pulserzeugungseinrichtung aufzubauen, dessen erzeugte Pulse direkt an ein Ziel abgestrahlt werden. Der Pulsgenerator ist als magnetischer Flußkompressor ausgerührt und weist einen mit Explosivstoff gefüllten Liner, der sich in einer Spule befindet, auf. In der RF-Strahlenquelle ist eine kapazitive Last eingebunden, die mit dem Pulsgenerator ausgangsseitig verbunden ist, wodurch die Spule mit der kapazitiven Last einen elektrischen Schwingkreis bildet und die kapazitive Last gleichzeitig als Antenne fungiert. Die in diesem Schwingkreis erzeugte Frequenz kann dadurch direkt abgestrahlt werden. Dazu muß das Gehäuse der RF-Strahlenquelle so gestaltet sein, daß die erzeugten Frequenzen ungehindert hindurch gelangen können. Weiterhin wird zur Leistungssteigerung der RF-Strahlenquelle im Bereich zwischen dem Liner in der Spule und den Windungen ein Mittel eingebracht, wodurch sich die Anzahl freier Elektronen erhöht, um die Plasmabildung zu unterstützen und eine bessere Umsetzung von chemischer Energie in hochfrequente Energie zu erreichen, um somit eine höhere Frequenz anzuregen.The invention is based on the idea of constructing an explosive-driven RF radiation source only from a pulse generator or a pulse generating device, whose generated pulses are emitted directly to a target. The pulse generator is stirred as a magnetic flux compressor and has an explosive-filled liner which is located in a coil on. In the RF radiation source, a capacitive load is connected, which is connected to the output side of the pulse generator, whereby the coil with the capacitive load forms an electrical resonant circuit and the capacitive load simultaneously acts as an antenna. The frequency generated in this resonant circuit can thereby be emitted directly. For this purpose, the housing of the RF radiation source must be designed so that the frequencies generated can pass through unhindered. Furthermore, to increase the power of the RF radiation source in the region between the liner in the coil and the windings, an agent is introduced, thereby increasing the number of free electrons to support the plasma formation and to achieve better conversion of chemical energy into high frequency energy thus to stimulate a higher frequency.

Als geeignete Mittel für die Ausbildung eines Plasmas sind Materialien mit geringer elektrischer Leitfähigkeit, geringer Bindungsenergie für Elektronen sowie mit rauhen Oberflächenstrukturen, die Materialspitzen im Bereich von wenigen Mikrometern (µm) aufweisen.Suitable materials for the formation of a plasma are materials with low electrical conductivity, low binding energy for electrons and with rough surface structures having material peaks in the range of a few micrometers (μm).

Eine weitere Möglichkeit der Erhöhung der Plasmaausbildung ist die Erhöhung der elektrischen Feldstärke im Bereich zwischen der Spule und der explosivstoffgetriebenen Kurzschlußvorrichtung durch eine entsprechende Gestaltung der Spulenstruktur.Another possibility of increasing the plasma formation is the increase in the electric field strength in the region between the coil and the explosive-driven short-circuiting device by a corresponding design of the coil structure.

Die Verringerung des Umgebungsdrucks im Bereich zwischen der Spule und der explosivstoffgetriebenen Kurzschlußvorrichtung sich öffnender Liner durch Erzeugung eines Unterdrucks (Vakuums) wirkt sich gleichfalls positiv auf die Bildung von freien Elektronen aus.Reducing the ambient pressure in the region between the coil and the explosive-driven shorting device of opening liners by creating a negative pressure (vacuum) also has a positive effect on the formation of free electrons.

Außerdem kann ein günstiges Hintergrundgas für die Plasmabildung im Bereich zwischen der Spule und der explosivstoffgetriebenen Kurzschlußvorrichtung eingebracht werden.In addition, a favorable background gas for the plasma formation in the region between the coil and the explosive-driven short-circuiting device can be introduced.

Anhand von Ausführungsbeispielen soll die Erfindung näher erläutert werden.Based on embodiments, the invention will be explained in more detail.

Es zeigen:

Figur 1
eine RF-Strahlenquelle in einem Trägersystem
Figur 2
eine erste Ausführungsform der RF-Strahlenquelle
Figur 3
eine weitere Ausführungsform der RF-Strahlenquelle
Figur 4
ein Parallelschwingkreis als Last.
Show it:
FIG. 1
an RF radiation source in a carrier system
FIG. 2
a first embodiment of the RF radiation source
FIG. 3
another embodiment of the RF radiation source
FIG. 4
a parallel resonant circuit as a load.

In Figur 1 ist ein Trägersystem 1, hier ein Geschoß, zum Verbringen einer RF-Strahlenquelle 2 dargestellt. Die RF-Strahlenquelle 2 besteht dabei aus einer Batterie 3 oder einer ähnlichen Stromspeichereinheit, die mit einem Zünder 11 einer mit Explosivstoff 10 getriebenen Pulserzeugungseinrichtung 4 elektrisch in Verbindung steht, sowie einer kapazitive Last CL. Die kapazitive Last CL ist mit dem Ausgang der Pulserzeugungseinrichtung 4 verbunden. Die Pulserzeugungseinrichtung 4 ist hier ein magnetischer Flußkompressor, der eine Spule 6 besitzt, die aus einem Spulenkörper 6.1 besteht, auf dem sich Windungen 6.2 befinden und in dem ein Liner 6.3 intergriert ist. Mit Anschluß an die Batterie bzw. an den Zuschalter der Batterie wird ein Stromfluß in den Windungen 6.2 initiiert. Der Explosivstoff 10 und der Zünder 11 sind entweder in einer eine zusätzlich in der Spule 6 integrietren Kurzschlußvorrichtung 7 oder im Liner 6.3 untergebracht.In FIG. 1 a carrier system 1, here a projectile, for the purpose of transporting an RF radiation source 2 is shown. In this case, the RF radiation source 2 consists of a battery 3 or a similar current storage unit, which is electrically connected to an igniter 11 of an explosive 10 driven pulse generating device 4, as well as a capacitive load C L. The capacitive load C L is connected to the output of the pulse generating device 4. The pulse generating device 4 is here a magnetic flux compressor having a coil 6, which consists of a bobbin 6.1, on which turns are 6.2 and in which a liner 6.3 is integrated. With connection to the battery or to the switch of the Battery, a current flow in the turns 6.2 is initiated. The explosive 10 and the igniter 11 are housed either in an additional in the coil 6 integrietren shorting device 7 or in the liner 6.3.

Das allgemeine Wirkprinzip dieser RF-Strahlenquelle 2 läßt sich wie folgt beschreiben. Mit dem Trägersystem 1 wird die autonome RF-Strahlenquelle 2 zum Ziel vor Ort gebracht. Dort erfolgt die Zuschaltung der Batterie 3, beispielsweise zeit- oder aufschlaggesteuert auf die Spule 6. Beim Erreichen des Strommaximums in der Spule 6, durch die weitere, nicht näher dargestellte Energieversorgung wird der Zünder 11, beispielsweise ein Ringzünder, des magnetischen Flußkompressors 4 gezündet, wodurch in herkömmlicher Art und Weise der in der Kurzschlußvorrichtung 7 (oder im sich öffnenden Liner 6.3) befindliche Hochexplosivstoff 10 die Kurzschlußvorrichtung 7 und den Spulenkörper 6.1 aufreißt und die einzelnen Windungen 6.2 nacheinander kurzgeschlossen werden. Bei einer anfänglich kleinen Anfangsinduktivität und einem konstanten magnetischen Fluß wird bei nur noch einer Windung 6.2 eine fast 100-fache oder höhere Verstärkung erzeugt. Dabei wird chemische Energie in eine elektrische Energie umgewandelt, wobei die Endenergie W abhängig ist von der Anfangsinduktivität L0 / Endinduktivität Ln x Anfangsenergie Wo ist.The general mode of action of this RF radiation source 2 can be described as follows. With the carrier system 1, the autonomous RF radiation source 2 is brought to the destination on site. There, the connection of the battery 3, for example, time or impact controlled on the coil 6. When reaching the maximum current in the coil 6, by the other, not shown energy supply of the igniter 11, such as a detonator, the magnetic flux compressor 4 ignited, whereby in a conventional manner the high explosive 10 located in the short-circuiting device 7 (or in the opening liner 6.3) ruptures the short-circuiting device 7 and the bobbin 6.1 and the individual turns 6.2 are sequentially short-circuited. With an initial small initial inductance and a constant magnetic flux, only one winding 6.2 produces nearly 100 times or more gain. Here, chemical energy is converted into an electrical energy, the final energy W is dependent on the initial inductance L 0 / end inductance L n x initial energy where.

Die kapazitive Last CL bildet mit der Spule 6 nach dem Schließen des Stromkreises den sich öffnenden Liner 6.3 einen Schwingkreis, dessen Frequenz sich durch die zeitliche Änderung der Induktivität der Spule 6 aufgrund der Schockwelle im Liner 6.3 verändert. Diese Frequenz bzw. der erzeugte Puls 8 wird direkt von der als Antenne fungierenden kapazitiven Last CL abgestrahlt.The capacitive load C L forms with the coil 6 after closing the circuit the opening liner 6.3 a resonant circuit whose frequency is changed by the time change of the inductance of the coil 6 due to the shock wave in the liner 6.3. This frequency or the generated pulse 8 is emitted directly from the acting as an antenna capacitive load C L.

Zur Erhöhung der abstrahlbaren Frequenzen wird in Figur 2 und Figur 3 nun vorgeschlagen, den magnetischen Pluskompressor 4 konstruktiv zu verändern, um mehrere freie Elektronen zu erhalten. Dies bewirkt eine spontane Plasmaausbildung mit extrem schnellem Einschaltverhalten, wodurch höhere Frequenzen ohne zusätzliche elektrische Bauelemente erzeugt werden können.To increase the radiant frequencies is in FIG. 2 and FIG. 3 now proposed to constructively modify the magnetic positive compressor 4 to obtain a plurality of free electrons. This causes a spontaneous plasma formation with extremely fast turn-on, whereby higher frequencies can be generated without additional electrical components.

In Figur 2 wird dazu in einer ersten Variante zwischen dem Spulenkörper 6.1 mit seinen Windungen 6.2 und dem Liner 6.3 ein die Plasmaausbildung unterstützendes Mittel 14 eingebracht.In FIG. 2 For this purpose, a plasma-assisting agent 14 is introduced in a first variant between the bobbin 6.1 with its turns 6.2 and the liner 6.3.

Dieses unterstützende Mittel 14 kann einerseits ein Material 15 sein, das als Schicht zwischen dem Spulenkörper 6.1 und dem Liner 6.3 aufgesetzt ist, andererseits ein günstiges Hintergrundgas oder ein Vakuum, wobei auch eine Kombination von Schicht und Gas bzw. Vakuum möglich ist.
Ein solches die Plasmaausbildung erhöhendes Material 15 weist eine geringe elektrische Leitfähigkeit, eine geringe Bindungsenergie für Elektronen und / oder eine Oberflächenstruktur mit Materialspitzen im Bereich von wenigen Mikrometern auf. Ein, alle diese Vorzüge für die Erhöhung freier Elektronen besitzendes Material 15 ist beispielsweise eine Kohlenstoff-Faser oder ein Samt.This supporting means 14 may on the one hand be a material 15, which is placed as a layer between the bobbin 6.1 and the liner 6.3, on the other hand, a favorable background gas or a vacuum, whereby a combination of layer and gas or vacuum is possible.
Such a plasma formation enhancing material 15 has low electrical conductivity, low binding energy for electrons, and / or a surface structure with material spikes in the order of a few microns. For example, a material 15 having all of these advantages for increasing free electrons is a carbon fiber or a velvet.

Figur 3 gibt eine weitere Maßnahme zur Erhöhung der elektrischen Feldstärke im Bereich 13 an, was gleichfalls die Plasmaausbildung vorteilhaft beeinflußt. Dabei ist der Spulenquerschnitt der Spule 6 verändert worden, wobei der Spulenkörper 6.1 kegelstumpfartig ausgeführt ist und mit seinem größeren Spulenquerschnitt bereits die ersten Windungen 6.2 der Spule 6 erreicht. Dabei kommt es zu einer scharfen Kantenbildung zwischen der Kurzschlußvorrichtung 7 bzw. dem Liner 6.3 und dem Spulenkörper 6.1 mit der ersten Windung 6.2. Die für den Kurzschluß notwendige Energie, um die Kurzschlußvorrichtung 7 und den Spulenkörper 6.1 aufzureißen, kann, bedingt durch den geringeren notwendigen Weg zwischen der Kurzschlußvorrichtung 7 und den Windungen 6.2, minimiert werden und steht damit der Plasmaausbildung zur Verfügung. FIG. 3 is another measure to increase the electric field strength in the range 13, which also affects the plasma education advantageous. In this case, the coil cross section of the coil 6 has been changed, wherein the bobbin 6.1 is designed truncated cone and already reaches the first turns 6.2 of the coil 6 with its larger coil cross section. This results in a sharp edge formation between the short-circuiting device 7 and the liner 6.3 and the bobbin 6.1 with the first winding 6.2. The energy required for the short circuit to rupture the shorting device 7 and the bobbin 6.1, can be minimized due to the smaller necessary path between the shorting device 7 and the turns 6.2, and thus is the plasma education available.

Als eine Variante der kapazitiven Last CL kann auch ein LC-Parallelschwingkreis ausgangsseitig an die Pulserzeugungseinrichtung 4 angeschlossen werden, wie in Fig. 4 dargestellt. Dadurch wird eine verbesserte Abstrahlcharakteristik der RF-Strahlenquelle 2 erreicht.As a variant of the capacitive load C L , an LC parallel resonant circuit can also be connected on the output side to the pulse generating device 4, as in FIG Fig. 4 shown. As a result, an improved emission characteristic of the RF radiation source 2 is achieved.

Es versteht sich, daß im Rahmen des Erfindungsgedankens Änderungen möglich sind. So kann die vorgenannte und beschriebene RF-Strahlenquelle 2 auch mit herkömmlichen Verstärkungseinrichtungen und Antennen kombiniert werden.It is understood that changes are possible within the scope of the inventive concept. Thus, the aforementioned and described RF radiation source 2 can also be combined with conventional amplification devices and antennas.

Claims (9)

  1. Explosive-powered RF beam source, having a pulse generating device with a coil which has a coil former, a liner and turns, with the liner containing an explosive which is detonated by means of a fuze, characterized in that
    - a means (14) which assists plasma formation is incorporated between the coil former (6.1) and the liner (6.3) in an area (13), and
    - the pulse generator device (4) is connected on the output side to a capacitive load (CL) and/or inductive load which acts as an antenna.
  2. Explosive-powered RF beam source according to Claim 1, characterized in that the supported means (14) are materials (15) which are applied to the surface of the coil former (6.1) and have poor electrical conductivity, have a low binding energy for electrodes, and have a workup surface structure.
  3. Explosive-powered RF beam source according to Claim 2, characterized in that the bonded-in material (15) comprises carbon fibres.
  4. Explosive-powered RF beam source according to Claim 2, characterized in that the bonded-in material (15) comprises velour.
  5. Explosive-powered RF beam source according to Claim 1, characterized in that the coil cross section is conical as the supporting means (14).
  6. Explosive-powered RF beam source according to one or more of Claims 1 to 5, characterized in that the supporting means (14) is a background gas.
  7. Explosive-powered RF beam source according to Claim 6, characterized in that the background gas is helium or argon.
  8. Explosive-powered RF beam source according to one or more of Claims 1 to 5, characterized in that the supporting means (14) is a vacuum.
  9. Explosive-powered RF beam source according to one of the abovementioned Claims 1 to 8, characterized in that the capacitor (CL), together with the coil (LL) as parallel resonance circuit, is electrically connected on the output side to the pulse generating device (4).
EP01119011A 2000-09-12 2001-08-07 Explosive activated RF source Expired - Lifetime EP1189492B1 (en)

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DE10044867A DE10044867A1 (en) 2000-09-12 2000-09-12 Explosive-powered RF radiation source
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DE10044867A1 (en) 2002-03-21
US6477932B2 (en) 2002-11-12
US20020035918A1 (en) 2002-03-28
EP1189492A1 (en) 2002-03-20

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