EP1189492A1 - Explosive activated RF source - Google Patents

Explosive activated RF source Download PDF

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Publication number
EP1189492A1
EP1189492A1 EP01119011A EP01119011A EP1189492A1 EP 1189492 A1 EP1189492 A1 EP 1189492A1 EP 01119011 A EP01119011 A EP 01119011A EP 01119011 A EP01119011 A EP 01119011A EP 1189492 A1 EP1189492 A1 EP 1189492A1
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EP
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Prior art keywords
explosive
radiation source
powered
coil
source according
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Granted
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EP01119011A
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German (de)
French (fr)
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EP1189492B1 (en
Inventor
Markus Dr. Jung
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Rheinmetall Waffe Munition GmbH
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Rheinmetall W&M GmbH
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H13/00—Means of attack or defence not otherwise provided for
    • F41H13/0043—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target
    • F41H13/0075—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target the high-energy beam being a radiofrequency beam
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H13/00—Means of attack or defence not otherwise provided for
    • F41H13/0043—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target
    • F41H13/0068—Directed energy weapons, i.e. devices that direct a beam of high energy content toward a target for incapacitating or destroying the target the high-energy beam being of microwave type, e.g. for causing a heating effect in the target
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H13/00—Means of attack or defence not otherwise provided for
    • F41H13/0093—Devices generating an electromagnetic pulse, e.g. for disrupting or destroying electronic devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F42—AMMUNITION; BLASTING
    • F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
    • F42B12/00—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material
    • F42B12/02—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect
    • F42B12/36—Projectiles, missiles or mines characterised by the warhead, the intended effect, or the material characterised by the warhead or the intended effect for dispensing materials; for producing chemical or physical reaction; for signalling ; for transmitting information
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils

Definitions

  • the invention relates to an explosive-driven RF radiation source according to the preamble of claim 1.
  • RF radiation sources radio frequency
  • HPM High Power Microwave - for non-lethal destruction, Disturbing or dazzling targets.
  • RF radiation sources in a carrier system for example, a warhead.
  • An electrical pulse generator with saturable inductance is described in DE 41 41 516 A1.
  • a coaxial line is used for pulse shaping through magnetic compression loaded and relieved via a magnetic switch with saturable inductance, whereby Pulses are formed.
  • US 5,307,079 and US 5,216,695 disclose microwaves and amplifiers Circuits. To achieve high frequencies, transistors are in a Marx generator integrated, which delivers this to an antenna.
  • the object of the invention is now a simple, explosive-driven RF radiation source to show, which also shows an increase in high frequency.
  • the invention is based on the idea of an explosive-driven RF radiation source only to build from a pulse generator or a pulse generating device, the generated one Pulses are emitted directly to a target.
  • the pulse generator is a magnetic flow compressor extended and has a liner filled with explosive, which is in a coil located on.
  • a capacitive load is integrated in the RF radiation source Pulse generator is connected on the output side, whereby the coil with the capacitive load one forms an electrical resonant circuit and the capacitive load also functions as an antenna.
  • the frequency generated in this resonant circuit can thus be radiated directly.
  • the housing of the RF radiation source must be designed so that the frequencies generated are unhindered can get through.
  • the RF radiation source increases its performance a means in the area between the liner in the coil and the turns introduced, which increases the number of free electrons to support plasma formation and better conversion of chemical energy into high frequency energy too reach to stimulate a higher frequency.
  • Materials with low electrical are suitable means for the formation of a plasma Conductivity, low binding energy for electrons and with rough surface structures, have material peaks in the range of a few micrometers ( ⁇ m).
  • Another possibility of increasing the plasma formation is to increase the electrical Field strength in the area between the coil and the explosive-driven short-circuit device by appropriate design of the coil structure.
  • FIG. 1 shows a carrier system 1, here a floor, for installing an RF radiation source 2.
  • the RF radiation source 2 consists of a battery 3 or a similar power storage unit, which is electrically connected to an igniter 11 of a pulse generating device 4 driven with explosive 10, and a capacitive load C L.
  • the capacitive load C L is connected to the output of the pulse generating device 4.
  • the pulse generating device 4 is here a magnetic flow compressor, which has a coil 6, which consists of a coil body 6.1, on which turns 6.2 are located and in which a liner 6.3 is integrated. When connected to the battery or to the battery switch, a current flow in the turns 6.2 is initiated.
  • the explosive 10 and the detonator 11 are either housed in a short-circuit device 7 additionally integrated in the coil 6 or in the liner 6.3.
  • this RF radiation source 2 can be described as follows. With the carrier system 1, the autonomous RF radiation source 2 is brought to the target on site. There the battery 3 is switched on, for example in a time-controlled or charge-controlled manner, on the coil 6. When the current maximum in the coil 6 is reached, the igniter 11, for example a ring igniter, of the magnetic flow compressor 4 is ignited by the further energy supply, not shown. whereby the high-explosive material 10 located in the short-circuit device 7 (or in the opening liner 6.3) tears open the short-circuit device 7 and the coil former 6.1 in a conventional manner and the individual turns 6.2 are short-circuited one after the other.
  • the igniter 11 for example a ring igniter
  • the capacitive load C L forms, with the coil 6 after the circuit is closed, the opening liner 6.3 an oscillating circuit, the frequency of which changes due to the temporal change in the inductance of the coil 6 due to the shock wave in the liner 6.3.
  • This frequency or the generated pulse 8 is emitted directly by the capacitive load C L acting as an antenna.
  • FIGS. 2 and 3 now propose constructively change the magnetic plus compressor 4 to several free electrons to obtain. This causes spontaneous plasma formation with extremely fast switch-on behavior, whereby higher frequencies are generated without additional electrical components can be.
  • FIG. 2 there is a first variant between the coil body 6.1 with its turns 6.2 and the liner 6.3, a means 14 supporting the plasma formation.
  • This supporting means 14 can be a material 15 on the one hand, which is placed as a layer between the coil body 6.1 and the liner 6.3, and on the other hand a favorable background gas or a vacuum, a combination of layer and gas or vacuum also being possible.
  • a material 15 which increases the plasma formation has a low electrical conductivity, a low binding energy for electrons and / or a surface structure with material peaks in the range of a few micrometers.
  • One, all of these advantages for increasing free electron material 15 is, for example, a carbon fiber or a velvet.
  • FIG. 3 gives a further measure for increasing the electric field strength in the area 13 at, which also advantageously influences the plasma formation.
  • the coil cross section the coil 6 has been changed, the coil body 6.1 having the shape of a truncated cone and with its larger coil cross section, the first turns 6.2 Coil 6 reached.
  • the energy required for the short circuit to the short circuit device 7 and the coil former 6.1 to tear open, due to the smaller necessary path between the Short-circuit device 7 and the turns 6.2, are minimized and is therefore the Plasma training available.
  • an LC parallel resonant circuit can also be connected on the output side to the pulse generating device 4, as shown in FIG. 4. An improved radiation characteristic of the RF radiation source 2 is thereby achieved.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical & Material Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)

Abstract

An autonomous source (2) of radio frequency beams driven with a highly explosive substance (10) is controlled regarding time or impact. A battery (3) triggers an ignition device (11) in a magnetic flow compressor (4) as a pulse generator. The highly explosive substance in a liner (6.3) rips open a coil shell and individual windings (6.2) are short-circuited.

Description

Die Erfindung betrifft eine explosivstoffgetriebene RF-Strahlenquelle nach dem Oberbegriff des Patentanspruchs 1.The invention relates to an explosive-driven RF radiation source according to the preamble of claim 1.

Bekannt sind RF-Strahlenquellen (RF = Radio Frequency), auch HPM-Quellen genannt (HPM = High Power Microwave - Hochleistungsmikrowellen), zur nicht letalen Zerstörung, Störung oder Blendung von Zielen. Dazu können die RF-Strahlenquellen in einem Trägersystemen, beispielsweise einem Gefechtskopf, untergebracht sein.RF radiation sources (RF = radio frequency), also known as HPM sources, are known (HPM = High Power Microwave - for non-lethal destruction, Disturbing or dazzling targets. To do this, the RF radiation sources in a carrier system, for example, a warhead.

Eine RF-Strahlenquelle in einem Projektil beschreibt die US 5,192,827. Der zur Erzeugung einer hohen abzustrahlenden Frequenz notwendige Strom wird vor Abschuß des Projektils in einer Pulsformeinrichtung gespeichert. Die Pulsformeinrichtung wird dabei von einer Spule, einem dielektrischen Stab und einem Dielektrikum gebildet. Die Entladung der Pulsformeinrichtung erfolgt über einen Nanosekundenschalter. Über diesen wird der erzeugte Puls in eine im Projektil befindliche Antenne gegeben, die diesen Puls durch das Gehäuse des Projektils zum Ziel hin abstrahlt. In einem Ausführungsbeispiel befinden sich mehrere Pulsformeinrichtungen im Projektil. Dadurch summiert sich die erzeugbare Leistung auf ca. 12 MW.An RF radiation source in a projectile is described in US Pat. No. 5,192,827. The one for generation a high frequency to be emitted current is before the projectile is launched a pulse shaping device stored. The pulse shaping device is driven by a coil a dielectric rod and a dielectric. The discharge of the pulse shaping device takes place via a nanosecond switch. The pulse generated is converted into a given in the projectile antenna that this pulse through the housing of the projectile radiates towards the target. In one embodiment, there are several pulse shaping devices in the projectile. As a result, the power that can be generated adds up to approx. 12 MW.

Einen elektronenbeschleunigten Mikrowellenapplikator für eine Plasma-Quelle beschreibt die US 5,707,452. Hierbei wird die hohe Energie durch die Beschleunigung der erzeugten Plasma-Elektronen beim Passieren von Spalten des geschlitzten Applikators realisiert, der mit einer Antenne elektrisch verbunden ist. Auch die aus der vorgenannten US 5,707,452 hervorgegangene US 5,975,014 beschreibt einen solchen Applikator.The describes an electron-accelerated microwave applicator for a plasma source US 5,707,452. Here the high energy is generated by the acceleration of the plasma electrons when passing columns of the slotted applicator realized with an antenna is electrically connected. Also that which emerged from the aforementioned US 5,707,452 US 5,975,014 describes such an applicator.

Aus der DE 41 41 516 A1 ist ein elektrischer Impulsgenerator mit sättigbarer Induktanz beschrieben. Zur Impulsformung wird eine Koaxialleitung durch eine magnetische Kompression belastet und über einen magnetischen Schalter mit sättigbarer Induktanz entlastet, wodurch Pulse geformt werden. An electrical pulse generator with saturable inductance is described in DE 41 41 516 A1. A coaxial line is used for pulse shaping through magnetic compression loaded and relieved via a magnetic switch with saturable inductance, whereby Pulses are formed.

Die US 5,307,079 und die US 5,216,695 offenbaren Mikrowellen erzeugende und verstärkende Schaltungen. Zur Erreichung hoher Frequenzen sind Transistoren in einen Marx-Generator integriert, der diese an eine Antenne abgibt.US 5,307,079 and US 5,216,695 disclose microwaves and amplifiers Circuits. To achieve high frequencies, transistors are in a Marx generator integrated, which delivers this to an antenna.

In der nicht vorveröffentlichten DE 199 59 358 wird eine mit Explosivstoff getriebene autonome RF-Strahlenquelle offenbart. Dort wird zeit- oder aufschlaggesteuert durch eine Batterie ein Zünder eines magnetischen Flußkompressors gezündet, wodurch in herkömmlicher Art und Weise der im Liner befindliche Hochexplosivstoff den Spulenkörper aufreißt und die einzelnen Windungen nacheinander kurzgeschlossen werden. Ausgangsseitig ist der Flußkompressor mit einer Verstärkereinheit verbunden, welche die erzeugte Spannung verstärkt und diese über eine Hochdruck-Funkenstrecke an einen UWB-Pulser zur Erzeugung von Pulsen gibt. Über eine mit dem Kabelwiderstand des UWB-Pulses angepaßte Breitbandantenne werden danach die Pulse auf das Ziel abgestrahlt.DE 199 59 358, which is not prepublished, describes an autonomous explosive-driven device RF radiation source disclosed. There is time or premium controlled by a battery ignited an igniter of a magnetic flow compressor, whereby in a conventional manner and how the high explosive in the liner tears open the bobbin and the individual turns are short-circuited one after the other. The flow compressor is on the output side connected to an amplifier unit which amplifies the voltage generated and this via a high-pressure spark gap to a UWB pulser for generating pulses gives. Via a broadband antenna matched to the cable resistance of the UWB pulse the pulses are then radiated onto the target.

Der Erfindung stellt sich nun die Aufgabe, eine einfache, explosivstoffgetriebene RF-Strahlenquelle aufzuzeigen, die zudem eine Steigerung der Hochfrequenz aufweist.The object of the invention is now a simple, explosive-driven RF radiation source to show, which also shows an increase in high frequency.

Gelöst wird die Aufgabe durch die Merkmale des Patentanspruches 1.The object is achieved by the features of patent claim 1.

Der Erfindung liegt die Idee zugrunde, eine explosivstoffgetriebene RF-Strahlenquelle nur aus einem Pulsgenerator bzw. eine Pulserzeugungseinrichtung aufzubauen, dessen erzeugte Pulse direkt an ein Ziel abgestrahlt werden. Der Pulsgenerator ist als magnetischer Flußkompressor ausgerührt und weist einen mit Explosivstoff gefüllten Liner, der sich in einer Spule befindet, auf. In der RF-Strahlenquelle ist eine kapazitive Last eingebunden, die mit dem Pulsgenerator ausgangsseitig verbunden ist, wodurch die Spule mit der kapazitiven Last einen elektrischen Schwingkreis bildet und die kapazitive Last gleichzeitig als Antenne fungiert. Die in diesem Schwingkreis erzeugte Frequenz kann dadurch direkt abgestrahlt werden. Dazu muß das Gehäuse der RF-Strahlenquelle so gestaltet sein, daß die erzeugten Frequenzen ungehindert hindurch gelangen können. Weiterhin wird zur Leistungssteigerung der RF-Strahlenquelle im Bereich zwischen dem Liner in der Spule und den Windungen ein Mittel eingebracht, wodurch sich die Anzahl freier Elektronen erhöht, um die Plasmabildung zu unterstützen und eine bessere Umsetzung von chemischer Energie in hochfrequente Energie zu erreichen, um somit eine höhere Frequenz anzuregen. The invention is based on the idea of an explosive-driven RF radiation source only to build from a pulse generator or a pulse generating device, the generated one Pulses are emitted directly to a target. The pulse generator is a magnetic flow compressor extended and has a liner filled with explosive, which is in a coil located on. A capacitive load is integrated in the RF radiation source Pulse generator is connected on the output side, whereby the coil with the capacitive load one forms an electrical resonant circuit and the capacitive load also functions as an antenna. The frequency generated in this resonant circuit can thus be radiated directly. To The housing of the RF radiation source must be designed so that the frequencies generated are unhindered can get through. Furthermore, the RF radiation source increases its performance a means in the area between the liner in the coil and the turns introduced, which increases the number of free electrons to support plasma formation and better conversion of chemical energy into high frequency energy too reach to stimulate a higher frequency.

Als geeignete Mittel für die Ausbildung eines Plasmas sind Materialien mit geringer elektrischer Leitfähigkeit, geringer Bindungsenergie für Elektronen sowie mit rauhen Oberflächenstrukturen, die Materialspitzen im Bereich von wenigen Mikrometern (µm) aufweisen.Materials with low electrical are suitable means for the formation of a plasma Conductivity, low binding energy for electrons and with rough surface structures, have material peaks in the range of a few micrometers (µm).

Eine weitere Möglichkeit der Erhöhung der Plasmaausbildung ist die Erhöhung der elektrischen Feldstärke im Bereich zwischen der Spule und der explosivstoffgetriebenen Kurzschlußvorrichtung durch eine entsprechende Gestaltung der Spulenstruktur.Another possibility of increasing the plasma formation is to increase the electrical Field strength in the area between the coil and the explosive-driven short-circuit device by appropriate design of the coil structure.

Die Verringerung des Umgebungsdrucks im Bereich zwischen der Spule und der explosivstoffgetriebenen Kurzschlußvorrichtung sich öffnender Liner durch Erzeugung eines Unterdrucks (Vakuums) wirkt sich gleichfalls positiv auf die Bildung von freien Elektronen aus.The reduction in the ambient pressure in the area between the coil and the explosive-powered Short-circuit opening liner by generating a negative pressure (Vacuum) also has a positive effect on the formation of free electrons.

Außerdem kann ein günstiges Hintergrundgas für die Plasmabildung im Bereich zwischen der Spule und der explosivstoffgetriebenen Kurzschlußvorrichtung eingebracht werden.In addition, a favorable background gas for plasma formation in the area between the Coil and the explosive-powered short-circuit device are introduced.

Anhand von Ausführungsbeispielen soll die Erfindung näher erläutert werden.The invention will be explained in more detail with the aid of exemplary embodiments.

Es zeigen:

Figur 1
eine RF-Strahlenquelle in einem Trägersystem
Figur 2
eine erste Ausführungsform der RF-Strahlenquelle
Figur 3
eine weitere Ausführungsform der RF-Strahlenquelle
Figur 4
ein Parallelschwingkreis als Last.
Show it:
Figure 1
an RF radiation source in a carrier system
Figure 2
a first embodiment of the RF radiation source
Figure 3
a further embodiment of the RF radiation source
Figure 4
a parallel resonant circuit as a load.

In Figur 1 ist ein Trägersystem 1, hier ein Geschoß, zum Verbringen einer RF-Strahlenquelle 2 dargestellt. Die RF-Strahlenquelle 2 besteht dabei aus einer Batterie 3 oder einer ähnlichen Stromspeichereinheit, die mit einem Zünder 11 einer mit Explosivstoff 10 getriebenen Pulserzeugungseinrichtung 4 elektrisch in Verbindung steht, sowie einer kapazitive Last CL. Die kapazitive Last CL ist mit dem Ausgang der Pulserzeugungseinrichtung 4 verbunden. Die Pulserzeugungseinrichtung 4 ist hier ein magnetischer Flußkompressor, der eine Spule 6 besitzt, die aus einem Spulenkörper 6.1 besteht, auf dem sich Windungen 6.2 befinden und in dem ein Liner 6.3 intergriert ist. Mit Anschluß an die Batterie bzw. an den Zuschalter der Batterie wird ein Stromfluß in den Windungen 6.2 initiiert. Der Explosivstoff 10 und der Zünder 11 sind entweder in einer eine zusätzlich in der Spule 6 integrietren Kurzschlußvorrichtung 7 oder im Liner 6.3 untergebracht.FIG. 1 shows a carrier system 1, here a floor, for installing an RF radiation source 2. The RF radiation source 2 consists of a battery 3 or a similar power storage unit, which is electrically connected to an igniter 11 of a pulse generating device 4 driven with explosive 10, and a capacitive load C L. The capacitive load C L is connected to the output of the pulse generating device 4. The pulse generating device 4 is here a magnetic flow compressor, which has a coil 6, which consists of a coil body 6.1, on which turns 6.2 are located and in which a liner 6.3 is integrated. When connected to the battery or to the battery switch, a current flow in the turns 6.2 is initiated. The explosive 10 and the detonator 11 are either housed in a short-circuit device 7 additionally integrated in the coil 6 or in the liner 6.3.

Das allgemeine Wirkprinzip dieser RF-Strahlenquelle 2 läßt sich wie folgt beschreiben. Mit dem Trägersystem 1 wird die autonome RF-Strahlenquelle 2 zum Ziel vor Ort gebracht. Dort erfolgt die Zuschaltung der Batterie 3, beispielsweise zeit- oder aufschlaggesteuert auf die Spule 6. Beim Erreichen des Strommaximums in der Spule 6, durch die weitere, nicht näher dargestellte Energieversorgung wird der Zünder 11, beispielsweise ein Ringzünder, des magnetischen Flußkompressors 4 gezündet, wodurch in herkömmlicher Art und Weise der in der Kurzschlußvorrichtung 7 ( oder im sich öffnenden Liner 6.3) befindliche Hochexplosivstoff 10 die Kurzschlußvorrichtung 7 und den Spulenkörper 6.1 aufreißt und die einzelnen Windungen 6.2 nacheinander kurzgeschlossen werden. Bei einer anfänglich kleinen Anfangsinduktivität und einem konstanten magnetischen Fluß wird bei nur noch einer Windung 6.2 eine fast 100-fache oder höhere Verstärkung erzeugt. Dabei wird chemische Energie in eine elektrische Energie umgewandelt, wobei die Endenergie W abhängig ist von der Anfangsinduktivität L0 / Endinduktivität Ln x Anfangsenergie W0 ist.The general principle of operation of this RF radiation source 2 can be described as follows. With the carrier system 1, the autonomous RF radiation source 2 is brought to the target on site. There the battery 3 is switched on, for example in a time-controlled or charge-controlled manner, on the coil 6. When the current maximum in the coil 6 is reached, the igniter 11, for example a ring igniter, of the magnetic flow compressor 4 is ignited by the further energy supply, not shown. whereby the high-explosive material 10 located in the short-circuit device 7 (or in the opening liner 6.3) tears open the short-circuit device 7 and the coil former 6.1 in a conventional manner and the individual turns 6.2 are short-circuited one after the other. With an initially small initial inductance and a constant magnetic flux, with only one turn 6.2 an almost 100-fold or higher gain is generated. Chemical energy is converted into electrical energy, the final energy W being dependent on the initial inductance L 0 / final inductance L n x initial energy W 0 .

Die kapazitive Last CL bildet mit der Spule 6 nach dem Schließen des Stromkreises den sich öffnenden Liner 6.3 einen Schwingkreis, dessen Frequenz sich durch die zeitliche Änderung der Induktivität der Spule 6 aufgrund der Schockwelle im Liner 6.3 verändert. Diese Frequenz bzw. der erzeugte Puls 8 wird direkt von der als Antenne füngierenden kapazitiven Last CL abgestrahlt.The capacitive load C L forms, with the coil 6 after the circuit is closed, the opening liner 6.3 an oscillating circuit, the frequency of which changes due to the temporal change in the inductance of the coil 6 due to the shock wave in the liner 6.3. This frequency or the generated pulse 8 is emitted directly by the capacitive load C L acting as an antenna.

Zur Erhöhung der abstrahlbaren Frequenzen wird in Figur 2 und Figur 3 nun vorgeschlagen, den magnetischen Pluskompressor 4 konstruktiv zu verändern, um mehrere freie Elektronen zu erhalten. Dies bewirkt eine spontane Plasmaausbildung mit extrem schnellem Einschaltverhalten, wodurch höhere Frequenzen ohne zusätzliche elektrische Bauelemente erzeugt werden können.In order to increase the frequencies that can be emitted, FIGS. 2 and 3 now propose constructively change the magnetic plus compressor 4 to several free electrons to obtain. This causes spontaneous plasma formation with extremely fast switch-on behavior, whereby higher frequencies are generated without additional electrical components can be.

In Figur 2 wird dazu in einer ersten Variante zwischen dem Spulenkörper 6.1 mit seinen Windungen 6.2 und dem Liner 6.3 ein die Plasmaausbildung unterstützendes Mittel 14 eingebracht. In FIG. 2 there is a first variant between the coil body 6.1 with its turns 6.2 and the liner 6.3, a means 14 supporting the plasma formation.

Dieses unterstützende Mittel 14 kann einerseits ein Material 15 sein, das als Schicht zwischen dem Spulenkörper 6.1 und dem Liner 6.3 aufgesetzt ist, andererseits ein günstiges Hintergrundgas oder ein Vakuum, wobei auch eine Kombination von Schicht und Gas bzw. Vakuum möglich ist.
Ein solches die Plasmaausbildung erhöhendes Material 15 weist eine geringe elektrische Leitfähigkeit, eine geringe Bindungsenergie für Elektronen und / oder eine Oberflächenstruktur mit Materialspitzen im Bereich von wenigen Mikrometern auf. Ein, alle diese Vorzüge für die Erhöhung freier Elektronen besitzendes Material 15 ist beispielsweise eine Kohlenstoff-Faser oder ein Samt.This supporting means 14 can be a material 15 on the one hand, which is placed as a layer between the coil body 6.1 and the liner 6.3, and on the other hand a favorable background gas or a vacuum, a combination of layer and gas or vacuum also being possible.
Such a material 15 which increases the plasma formation has a low electrical conductivity, a low binding energy for electrons and / or a surface structure with material peaks in the range of a few micrometers. One, all of these advantages for increasing free electron material 15 is, for example, a carbon fiber or a velvet.

Figur 3 gibt eine weitere Maßnahme zur Erhöhung der elektrischen Feldstärke im Bereich 13 an, was gleichfalls die Plasmaausbildung vorteilhaft beeinflußt. Dabei ist der Spulenquerschnitt der Spule 6 verändert worden, wobei der Spulenkörper 6.1 kegelstumpfartig ausgeführt ist und mit seinem größeren Spulenquerschnitt bereits die ersten Windungen 6.2 der Spule 6 erreicht. Dabei kommt es zu einer scharfen Kantenbildung zwischen der Kurzschlußvorrichtung 7 bzw. dem Liner 6.3 und dem Spulenkörper 6.1 mit der ersten Windung 6.2 . Die für den Kurzschluß notwendige Energie , um die Kurzschlußvorrichtung 7 und den Spulenkörper 6.1 aufzureißen, kann, bedingt durch den geringeren notwendigen Weg zwischen der Kurzschlußvorrichtung 7 und den Windungen 6.2, minimiert werden und steht damit der Plasmaausbildung zur Verfügung.FIG. 3 gives a further measure for increasing the electric field strength in the area 13 at, which also advantageously influences the plasma formation. Here is the coil cross section the coil 6 has been changed, the coil body 6.1 having the shape of a truncated cone and with its larger coil cross section, the first turns 6.2 Coil 6 reached. This leads to a sharp formation of edges between the short-circuiting device 7 or the liner 6.3 and the coil former 6.1 with the first turn 6.2. The energy required for the short circuit to the short circuit device 7 and the coil former 6.1 to tear open, due to the smaller necessary path between the Short-circuit device 7 and the turns 6.2, are minimized and is therefore the Plasma training available.

Als eine Variante der kapazitiven Last CL kann auch ein LC-Parallelschwingkreis ausgangsseitig an die Pulserzeugungseinrichtung 4 angeschlossen werden, wie in Fig. 4 dargestellt. Dadurch wird eine verbesserte Abstrahlcharakteristik der RF-Strahlenquelle 2 erreicht.As a variant of the capacitive load C L , an LC parallel resonant circuit can also be connected on the output side to the pulse generating device 4, as shown in FIG. 4. An improved radiation characteristic of the RF radiation source 2 is thereby achieved.

Es versteht sich, daß im Rahmen des Erfindungsgedankens Änderungen möglich sind. So kann die vorgenannte und beschriebene RF-Strahlenquelle 2 auch mit herkömmlichen Verstärkungseinrichtungen und Antennen kombiniert werden.It goes without saying that changes are possible within the scope of the inventive concept. So can also use the aforementioned and described RF radiation source 2 with conventional amplification devices and antennas can be combined.

Claims (9)

Explosivstoffgetriebene RF-Strahlenquelle, aufweisend eine Pulserzeugungseinrichtung mit einer Spule, die einen Spulenkörper, einen Liner und Windungen besitzt, wobei sich in dem Liner ein Explosivstoff befindet, welcher durch einen Zünder gezündet wird, dadurch gekennzeichnet, daß zwischen dem Spulenkörper (6.1) und dem Liner (6.3) in einem Bereich (13) ein die Plasmabildung unterstützendes Mittel (14) eingebracht ist und die Pulserzeugungseinrichtung (4) ausgangsseitig mit einer als Antenne fungierenden kapazitiven Last ( CL) und/oder induktiven Last verbunden ist . Explosive-powered RF radiation source, comprising a pulse generating device with a coil, which has a coil body, a liner and turns, wherein there is an explosive in the liner, which is ignited by an igniter, characterized in that between the coil former (6.1) and the liner (6.3) in a region (13) an agent (14) is added which supports the plasma formation and the pulse generating device (4) is connected on the output side to a capacitive load (C L ) and / or inductive load acting as an antenna. Explosivstoffgetriebene RF-Strahlenquelle nach Anspruch 1, dadurch gekennzeichnet, daß das unterstützende Mittel (14) Materialien (15) sind, die auf der Oberfläche des Spulenkörpers (6.1) aufgebracht sind und eine geringe elektrische Leitfähigkeit aufweisen, eine geringe Bindungsenergie für Elektronen besitzen und eine rauhige Oberflächenstruktur aufweisen.Explosive-powered RF radiation source according to Claim 1, characterized in that the supporting means (14) are materials (15) which are applied to the surface of the coil former (6.1) and have low electrical conductivity, have a low binding energy for electrons and a have a rough surface structure. Explosivstoffgetriebene RF-Strahlenquelle nach Anspruch 2, dadurch gekennzeichnet, daß es sich bei dem eingebundenem Material (15) um Kohlenstoff-Fasern handelt.Explosive-powered RF radiation source according to claim 2, characterized in that the embedded material (15) is carbon fibers. Explosivstoffgetriebene RF-Strahlenquelle nach Anspruch 2, dadurch gekennzeichnet, daß es sich bei dem eingebundenen Material (15) um Samt handelt.Explosive-powered RF radiation source according to Claim 2, characterized in that the embedded material (15) is velvet. Explosivstoffgetriebene RF-Strahlenquelle nach Anspruch 1, dadurch gekennzeichnet, daß als unterstützendes Mittel (14) der Spulenquerschnitt kegelförmig ist.Explosive-powered RF radiation source according to Claim 1, characterized in that the coil cross section is conical as a supporting means (14). Explosivstoffgetriebene RF-Strahlenquelle nach einem oder mehreren der Ansprüche 1 bis 5, dadurch gekennzeichnet, daß das unterstützendes Mittel (14 ) ein Hintergrundgas ist.Explosive-powered RF radiation source according to one or more of Claims 1 to 5, characterized in that the supporting means (14) is a background gas. Explosivstoffgetriebene RF-Strahlenquelle nach Anspruch 6, dadurch gekennzeichnet, daß das Hintergrundgas Helium oder Argon ist. Explosive-powered RF radiation source according to claim 6, characterized in that the background gas is helium or argon. Explosivstoffgetriebene RF-Strahlenquelle nach einem oder mehreren der Ansprüche 1 bis 5, dadurch gekennzeichnet, daß das unterstützendes Mittel ( 14 ) Vakuum ist.Explosive-powered RF radiation source according to one or more of claims 1 to 5, characterized in that the supporting means (14) is vacuum. Explosivstoffgetriebene RF-Strahlenquelle nach einem der vorgenannten Ansprüche 1 bis 8, dadurch gekennzeichnet, daß der Kondensator (CL) mit einer Spule (LL) als Parallelschwingkreis ausgangsseitig mit der Pulserzeugungseinrichtung (4) elektrisch verbunden ist.Explosive-powered RF radiation source according to one of the preceding claims 1 to 8, characterized in that the capacitor (C L ) is electrically connected on the output side to the pulse generating device (4) with a coil (L L ) as a parallel resonant circuit.
EP01119011A 2000-09-12 2001-08-07 Explosive activated RF source Expired - Lifetime EP1189492B1 (en)

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US6477932B2 (en) 2002-11-12
DE50113812D1 (en) 2008-05-15

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