EP1133668B1 - Optical impact generator capable of being incorporated - Google Patents
Optical impact generator capable of being incorporated Download PDFInfo
- Publication number
- EP1133668B1 EP1133668B1 EP99956104A EP99956104A EP1133668B1 EP 1133668 B1 EP1133668 B1 EP 1133668B1 EP 99956104 A EP99956104 A EP 99956104A EP 99956104 A EP99956104 A EP 99956104A EP 1133668 B1 EP1133668 B1 EP 1133668B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- target
- projectile
- laser
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F42—AMMUNITION; BLASTING
- F42B—EXPLOSIVE CHARGES, e.g. FOR BLASTING, FIREWORKS, AMMUNITION
- F42B3/00—Blasting cartridges, i.e. case and explosive
- F42B3/10—Initiators therefor
- F42B3/113—Initiators therefor activated by optical means, e.g. laser, flashlight
Definitions
- the invention relates to an optical generator onboard impact, with miniaturized laser source and three-layer target.
- This invention finds applications in the areas requiring the generation of a shock in an energetic or non-energetic material.
- optical generators impacts also called opto-detonating initiators to protected element (IODEP) when it comes to explosives.
- IODEP protected element
- These initiators generally include a laser source that emits a laser beam in the direction of a target.
- This target is usually deposited on a substrate transparent to the laser beam.
- This substrate can be, for example, a silica window or the end of an optical fiber.
- the target is classically deposited on the end of the substrate by sputtering. This deposit is usually metallic.
- Such a device is represented on the Figures 1A and 1B.
- FIG. 1A a generator is shown impact during the laser / material interaction phase, that is, when the laser beam vaporizes the first atomic layers of the target, thereby generating a plasma 2 at the substrate / target interface.
- the thickness of the first two layers is a few tenths of a micron, while that of the projectile is 2 to 10 ⁇ m.
- a three-layer target such as described in this document can generate a shock calibrated, that is to say it allows to control the induced shock in the impacted material, for a thickness of the projectile fixed in advance.
- This document concerns targets with a second alumina layer and first and third alumnium layers.
- the performance of such a target tricouche is not optimized; more specifically, the kinetic energy ratio of the projectile on the laser energy is less than 30%. This requires the use of a fairly powerful laser (no embeddable) to generate a projectile of an energy sufficient kinetics for the intended application.
- the purpose of the invention is precisely to solve the problems of the impact generators described previously. To this end, it proposes a generator of impact with good performance that can work with a miniaturized laser source whose power is fixed and low.
- the material of the first layer of the target is a semiconductor.
- the material from the first layer of the target is from indium arsenide, less than 0.5 ⁇ m thick.
- the material of the first layer of the target is germanium, less than 0.5 ⁇ m.
- the invention relates to an optical generator impactable board; for that, it has a miniaturized laser source, fixed wavelength, as described in the patent application French patent filed on 19/03/1998 under the number 98 11558.
- Miniaturized laser sources have a relatively lower power than a laser source classic.
- the target must therefore be chosen so that what impact generator has a good performance so to be able to eject the projectile, whatever the amount of energy available at the source.
- the Target configuration needs to be optimized.
- the ablative material quickly turns into plasma.
- This plasma is the engine of the generator impact: it generates the mechanical effects in the projectile, in particular its speeding up.
- the invention proposes to use a target tricouche whose nature and thickness of the first layer (or ablative material) depend on the length wave emitted by the laser source as well as nature and / or the thickness of the second and third layers.
- FIG 2 there is shown schematically the impact generator according to the invention, in which the target is of the type triple layer. More precisely, this figure 2 shows the substrate 1 transparent to the laser beam and the target consisting of the ablative material layer 5, the insulating layer 4 and projectile 3.
- the impact generator of the invention achieves a yield of the order of 50% for a wavelength of 1.06 ⁇ m.
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Lasers (AREA)
- Physical Vapour Deposition (AREA)
Description
L'invention concerne un générateur optique d'impact embarquable, avec source laser miniaturisée et cible tricouche.The invention relates to an optical generator onboard impact, with miniaturized laser source and three-layer target.
Cette invention trouve des applications dans les domaines nécessitant la génération d'un choc dans un matériau énergétique ou non-énergétique.This invention finds applications in the areas requiring the generation of a shock in an energetic or non-energetic material.
En particulier, elle trouve des applications dans les domaines de la démolition de bâtiments, des carrières ainsi que dans l'industrie spatiale pour initier des matériaux explosifs ; elle trouve aussi des applications pour les études de matériaux non-énergétiques sous sollicitation dynamique élevée ou pour la simulation d'impacts de micrométéorites et de débris de l'espace.In particular, it finds applications in the areas of demolition of buildings, careers as well as in the space industry for initiate explosive materials; she also finds applications for studies of non-energetic materials under high dynamic stress or for the simulation of the impacts of micrometeorites and debris from space.
Pour générer des impacts dans des matériaux, il est possible d'utiliser des générateurs optiques d'impacts, appelés aussi initiateurs opto-détonants à élément protégé (IODEP) lorsqu'il s'agit des matériaux explosifs. Ces initiateurs comportent généralement une source laser qui émet un faisceau laser en direction d'une cible. Cette cible est généralement déposée sur un substrat transparent au faisceau laser. Ce substrat peut être, par exemple, une fenêtre en silice ou bien l'extrémité d'une fibre optique. To generate impacts in materials, it is possible to use optical generators impacts, also called opto-detonating initiators to protected element (IODEP) when it comes to explosives. These initiators generally include a laser source that emits a laser beam in the direction of a target. This target is usually deposited on a substrate transparent to the laser beam. This substrate can be, for example, a silica window or the end of an optical fiber.
La cible est classiquement déposée sur l'extrémité du substrat par pulvérisation cathodique. Ce dépôt est généralement métallique.The target is classically deposited on the end of the substrate by sputtering. This deposit is usually metallic.
Un tel dispositif est représenté sur les figures 1A et 1B. Sur ces figures, on a référencé 1, le substrat transparent, 2 le plasma et 3 le projectile, avec 2 et 3 qui forment la cible.Such a device is represented on the Figures 1A and 1B. In these figures, reference is made to 1, the transparent substrate, 2 the plasma and 3 the projectile, with 2 and 3 forming the target.
Sur la figure 1A, on a représenté un générateur
d'impact lors de la phase d'interaction laser/matière,
c'est-à-dire lorsque le faisceau laser vaporise les
premières couches atomiques de la cible, générant ainsi
un plasma 2, à l'interface substrat/cible.In FIG. 1A, a generator is shown
impact during the laser / material interaction phase,
that is, when the laser beam vaporizes the
first atomic layers of the target, thereby generating
a
Sur la figure 1B, on a représenté ce même
générateur d'impact lors de la phase de mise en vitesse
du projectile. En effet, le plasma généré sous
l'interaction du faisceau laser se détend après un
temps très court et met en vitesse la partie solide de
la cible, à savoir le projectile 3. Le projectile 3
peut alors atteindre une vitesse V de plusieurs
kilomètres par seconde ; cette vitesse V dépend de la
nature et de l'épaisseur du projectile.In FIG. 1B, this same
impact generator during the speed-up phase
of the projectile. Indeed, the plasma generated under
the interaction of the laser beam relaxes after a
very short time and speeds up the solid part of
the target, namely the
Il existe par ailleurs des générateurs d'impacts à cible tricouche, comme celui décrit dans la demande de brevet américaine US-A-5 046 423.There are also generators three-layer target impacts, as described in the U.S. Patent Application US-A-5,046,423.
La cible décrite dans ce document comporte trois couches :
- une première couche en métal, apte à générer un plasma, sous l'effet du faisceau laser,
- une troisième couche, métallique, qui constitue le projectile,
- une seconde couche, intermédiaire, en matériau isolant qui assure l'isolation entre la première et la troisième couche.
- a first metal layer, capable of generating a plasma, under the effect of the laser beam,
- a third layer, metallic, which constitutes the projectile,
- a second layer, intermediate, of insulating material which provides insulation between the first and third layer.
L'épaisseur des deux premières couches est de quelques dixièmes de micron, tandis que celle du projectile est de 2 à 10 µm.The thickness of the first two layers is a few tenths of a micron, while that of the projectile is 2 to 10 μm.
L'utilisation d'une cible tricouche, telle que décrite dans ce document permet de générer un choc calibré, c'est-à-dire qu'elle permet de maítriser le choc induit dans le matériau impacté, pour une épaisseur du projectile fixée à l'avance.The use of a three-layer target, such as described in this document can generate a shock calibrated, that is to say it allows to control the induced shock in the impacted material, for a thickness of the projectile fixed in advance.
Ce document concerne des cibles ayant une seconde couche en alumine et des première et troisième couches en alumnium.This document concerns targets with a second alumina layer and first and third alumnium layers.
Cependant, le rendement d'une telle cible tricouche n'est pas optimisé ; plus précisément, le rapport de l'énergie cinétique du projectile sur l'énergie laser est inférieur à 30 %. Cela nécessite l'utilisation d'un laser assez puissant (non embarquable) pour générer un projectile d'une énergie cinétique suffisante pour l'application envisagée.However, the performance of such a target tricouche is not optimized; more specifically, the kinetic energy ratio of the projectile on the laser energy is less than 30%. This requires the use of a fairly powerful laser (no embeddable) to generate a projectile of an energy sufficient kinetics for the intended application.
L'invention a justement pour but de résoudre les problèmes des générateurs d'impacts décrits précédemment. A cette fin, elle propose ùn générateur d'impact à bon rendement pouvant fonctionner avec une source laser miniaturisée dont la puissance est fixe et peu élevée.The purpose of the invention is precisely to solve the problems of the impact generators described previously. To this end, it proposes a generator of impact with good performance that can work with a miniaturized laser source whose power is fixed and low.
De façon plus précise, l'invention concerne un générateur optique d'impact comportant une source laser émettant un faisceau laser et une fenêtre de confinement transparente au faisceau laser, à l'extrémité de laquelle est déposée une cible tricouche comprenant :
- une première couche assurant la génération d'un plasma,
- une troisième couche constituant un projectile, et
- une seconde couche assurant l'isolation de la troisième couche vis-à-vis du plasma,
- une faible réflexion à la longueur d'onde du faisceau laser émis par la source laser miniaturisée ; et
- une épaisseur inférieure à 1 µm, déterminée en fonction de la densité dudit matériau, comparée à la densité du matériau constituant la seconde couche de la cible.
- a first layer ensuring the generation of a plasma,
- a third layer constituting a projectile, and
- a second layer ensuring the isolation of the third layer vis-à-vis the plasma,
- a low reflection at the wavelength of the laser beam emitted by the miniaturized laser source; and
- a thickness of less than 1 μm, determined according to the density of said material, compared to the density of the material constituting the second layer of the target.
Avantageusement, le matériau de la première couche de la cible est un semi-conducteur.Advantageously, the material of the first layer of the target is a semiconductor.
Selon un mode de réalisation de l'invention, le matériau de la première couche de la cible est de l'arséniure d'indium, d'épaisseur inférieure à 0,5µm.According to one embodiment of the invention, the material from the first layer of the target is from indium arsenide, less than 0.5 μm thick.
Selon un autre mode de réalisation de l'invention, le matériau de la première couche de la cible est du germanium, d'épaisseur inférieure à 0,5 µm. According to another embodiment of the invention, the material of the first layer of the target is germanium, less than 0.5 μm.
- Les figures 1A et 1B, déjà décrites, montrent le principe de fonctionnement d'un générateur optique d'impact classique, etFIGS. 1A and 1B, already described, show the operating principle of an optical generator classic impact, and
- la figure 2 représente schématiquement le générateur optique d'impact conforme à l'invention.FIG. 2 schematically represents the optical impact generator according to the invention.
L'invention concerne un générateur optique d'impact embarquable ; pour cela, il comporte une source laser miniaturisée, à longueur d'onde fixe, telle que celle décrite dans la demande de brevet française déposée le 19/09/1998 sous le n°98 11558.The invention relates to an optical generator impactable board; for that, it has a miniaturized laser source, fixed wavelength, as described in the patent application French patent filed on 19/09/1998 under the number 98 11558.
Les sources laser miniaturisées ont une puissance relativement moins élevée qu'une source laser classique. La cible doit donc être choisie de façon à ce que le générateur d'impact ait un bon rendement afin de pouvoir éjecter le projectile, quelle que soit la quantité d'énergie disponible à la source. La configuration de la cible doit donc être optimisée.Miniaturized laser sources have a relatively lower power than a laser source classic. The target must therefore be chosen so that what impact generator has a good performance so to be able to eject the projectile, whatever the amount of energy available at the source. The Target configuration needs to be optimized.
En effet, sous l'irradiation du faisceau laser, le matériau ablateur se transforme rapidement en plasma. Ce plasma est le moteur du générateur d'impact : il génère les effets mécaniques dans le projectile, en particulier sa mise en vitesse. Les pertes d'énergie au cours de la phase transitoire précédant sa formation (états solide et liquide), ainsi que l'état énergétique atteint par le plasma, conditionnent fortement le rendement global de l'interaction. Indeed, under the irradiation of the laser beam, the ablative material quickly turns into plasma. This plasma is the engine of the generator impact: it generates the mechanical effects in the projectile, in particular its speeding up. The energy losses during the transitional phase preceding its formation (solid and liquid states), as well as that the energy state reached by the plasma, strongly affect the overall performance of interaction.
L'invention propose d'utiliser une cible tricouche dont la nature et l'épaisseur de la première couche (ou matériau ablateur) dépendent de la longueur d'onde émise par la source laser ainsi que de la nature et/ou de l'épaisseur des seconde et troisième couches.The invention proposes to use a target tricouche whose nature and thickness of the first layer (or ablative material) depend on the length wave emitted by the laser source as well as nature and / or the thickness of the second and third layers.
Plus précisément, selon l'invention, le matériau constituant la première couche de la cible présente :
- une faible réflexion à la longueur d'onde du faisceau laser, c'est-à-dire de faibles pertes optiques ; autrement dit, le matériau ablateur doit présenter une très grande absorption, à la longueur d'onde du faisceau laser, lorsqu'il est utilisé à basse température, c'est-à-dire au début de l'interaction, avant que le plasma ne commence à se former. D'une façon générale, les semiconducteurs répondent bien à cette condition, en particulier pour une longueur d'onde de 1,06 µm ;
- une épaisseur déterminée en fonction de la densité du matériau lui-même, comparée avec la densité du matériau isolant constituant la seconde couche de la cible. Autrement dit, si le matériau ablateur 5 a une densité très forte par rapport à la densité du matériau isolant 4, l'épaisseur de ce matériau ablateur doit être faible ; au contraire, si le matériau ablateur 5 est peu dense par rapport à la densité du matériau isolant 4, alors l'épaisseur de ce matériau ablateur est relativement importante. Mais, de toute façon, l'épaisseur du matériau ablateur doit être inférieure à 1 µm.
- low reflection at the wavelength of the laser beam, that is to say, low optical losses; in other words, the ablative material must have a very high absorption, at the wavelength of the laser beam, when it is used at a low temperature, that is to say at the beginning of the interaction, before the plasma does not begin to form. In general, the semiconductors respond well to this condition, in particular for a wavelength of 1.06 microns;
- a thickness determined according to the density of the material itself, compared with the density of the insulating material constituting the second layer of the target. In other words, if the ablative material 5 has a very high density relative to the density of the insulating
material 4, the thickness of the ablative material must be low; on the contrary, if the ablative material 5 is not very dense relative to the density of the insulatingmaterial 4, then the thickness of this ablative material is relatively large. But, in any case, the thickness of the ablative material must be less than 1 micron.
Sur la figure 2, on a représenté
schématiquement le générateur d'impact conforme à
l'invention, dans lequel la cible est de type
tricouche. Plus précisément, cette figure 2 montre le
substrat 1 transparent au faisceau laser et la cible
constituée de la couche de matériau ablateur 5, de la
couche isolante 4 et du projectile 3.In Figure 2, there is shown
schematically the impact generator according to
the invention, in which the target is of the type
triple layer. More precisely, this figure 2 shows the
substrate 1 transparent to the laser beam and the target
consisting of the ablative material layer 5, the
insulating
Dans le cas de la micro-source laser décrite
dans la demande enregistrée sous le n°98 11558, qui
délivre 300 mJ à une longueur d'onde de 1,06 µm, la
cible peut être avantageusement constituée des couches
suivantes :
Avec une telle cible, le générateur d'impact de l'invention atteint un rendement de l'ordre de 50% pour une longueur d'onde de 1,06 µm.With such a target, the impact generator of the invention achieves a yield of the order of 50% for a wavelength of 1.06 μm.
Claims (3)
- Optical impact generator incorporating a laser source emitting a laser beam and a confinement window transparent to the laser beam, at the end of which is deposited a three-layer target comprising:characterized in that it is embarkable, the laser source being miniaturized and in that the first layer of the target is made from a semiconductor material having:a first layer (5) ensuring the generation of a plasma,a third layer (3) constituting a projectile anda second layer (4) insulating the third layer from the plasma,a limited reflection at the wavelength of the laser beam from the miniaturized laser source anda thickness below 1 µm, determined as a function of the density of said material, compared with the density of the material constituting the second layer of the target.
- Optical impact generator according to claim 1, characterized in that the material of the first target layer is indium arsenide with a thickness below 0.5 µm.
- Optical impact generator according to claim 1 or 2, characterized in that the material of the first target layer is germanium with a thickness below 0.5 µm.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9814718 | 1998-11-23 | ||
| FR9814718A FR2786324B1 (en) | 1998-11-23 | 1998-11-23 | ON-BOARD IMPACT OPTICAL GENERATOR |
| PCT/FR1999/002862 WO2000031496A1 (en) | 1998-11-23 | 1999-11-22 | Optical impact generator capable of being incorporated |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1133668A1 EP1133668A1 (en) | 2001-09-19 |
| EP1133668B1 true EP1133668B1 (en) | 2003-07-23 |
Family
ID=9533063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99956104A Expired - Lifetime EP1133668B1 (en) | 1998-11-23 | 1999-11-22 | Optical impact generator capable of being incorporated |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1133668B1 (en) |
| DE (1) | DE69909825T2 (en) |
| ES (1) | ES2204172T3 (en) |
| FR (1) | FR2786324B1 (en) |
| WO (1) | WO2000031496A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105223170A (en) * | 2014-05-30 | 2016-01-06 | 中国科学院空间科学与应用研究中心 | A kind of device and method of simulating micro space debris shock induced discharge |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4708060A (en) * | 1985-02-19 | 1987-11-24 | The United States Of America As Represented By The United States Department Of Energy | Semiconductor bridge (SCB) igniter |
| US5029528A (en) * | 1990-04-02 | 1991-07-09 | The United States Of America As Represented By The United States Department Of Energy | Fiber optic mounted laser driven flyer plates |
| US5046423A (en) * | 1990-04-02 | 1991-09-10 | The United States Of America As Represented By The Department Of Energy | Laser-driven flyer plate |
| FR2690239A1 (en) * | 1992-04-17 | 1993-10-22 | Davey Bickford | Optical primer for plasma pyrotechnic generator - having readily vaporised metallic coating on end of fibre=optic |
| US5301612A (en) * | 1993-05-28 | 1994-04-12 | The United States Of America As Represented By The United States Department Of Energy | Carbon-assisted flyer plates |
-
1998
- 1998-11-23 FR FR9814718A patent/FR2786324B1/en not_active Expired - Fee Related
-
1999
- 1999-11-22 ES ES99956104T patent/ES2204172T3/en not_active Expired - Lifetime
- 1999-11-22 WO PCT/FR1999/002862 patent/WO2000031496A1/en active IP Right Grant
- 1999-11-22 EP EP99956104A patent/EP1133668B1/en not_active Expired - Lifetime
- 1999-11-22 DE DE69909825T patent/DE69909825T2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105223170A (en) * | 2014-05-30 | 2016-01-06 | 中国科学院空间科学与应用研究中心 | A kind of device and method of simulating micro space debris shock induced discharge |
| CN105223170B (en) * | 2014-05-30 | 2017-12-12 | 中国科学院空间科学与应用研究中心 | A kind of device and method simulated micro space debris and hit induced discharge |
Also Published As
| Publication number | Publication date |
|---|---|
| DE69909825T2 (en) | 2004-04-15 |
| FR2786324B1 (en) | 2000-12-15 |
| FR2786324A1 (en) | 2000-05-26 |
| DE69909825D1 (en) | 2003-08-28 |
| EP1133668A1 (en) | 2001-09-19 |
| WO2000031496A1 (en) | 2000-06-02 |
| ES2204172T3 (en) | 2004-04-16 |
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