EP1006213A3 - Process for regenerating a processing solution - Google Patents

Process for regenerating a processing solution Download PDF

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Publication number
EP1006213A3
EP1006213A3 EP99120998A EP99120998A EP1006213A3 EP 1006213 A3 EP1006213 A3 EP 1006213A3 EP 99120998 A EP99120998 A EP 99120998A EP 99120998 A EP99120998 A EP 99120998A EP 1006213 A3 EP1006213 A3 EP 1006213A3
Authority
EP
European Patent Office
Prior art keywords
chamber
solution
anodic
hypophosphite
cathodic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP99120998A
Other languages
German (de)
French (fr)
Other versions
EP1006213B1 (en
EP1006213A2 (en
Inventor
Reinhard Dr. Rer. Nat. Schwarz
Klaus Prof. Dr. Rer. Nat. Habil. Fischwasser
Annette Dipl.-Ing. Taubert (Fh)
Dieter Dipl.-Ing. Hahnewald
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Blasberg Werra Chemie GmbH
Original Assignee
Hahnewald GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hahnewald GmbH filed Critical Hahnewald GmbH
Publication of EP1006213A2 publication Critical patent/EP1006213A2/en
Publication of EP1006213A3 publication Critical patent/EP1006213A3/en
Application granted granted Critical
Publication of EP1006213B1 publication Critical patent/EP1006213B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1617Purification and regeneration of coating baths
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • C25D21/22Regeneration of process solutions by ion-exchange

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Chemically Coating (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)

Abstract

Chemical reduction metal plating solution regeneration uses a weakly basic anion exchanger (T1) for hypophosphite ion recycle to the cathodic chamber (3) of a multi-chamber electrodialysis cell. An acid mixture, formed in the second chamber (6) by entry of protons from the anodic chamber (1), is supplied to a hypophosphite-loaded weakly basic anion exchanger with its outlet connected to the cathodic chamber. A chemical reduction metal plating solution, containing hypophosphite and ortho phosphite, is regenerated in a multi-chamber electrodialysis cell having two chambers separated from one another by an anion exchange membrane and which are located between a dilute acid-containing anodic chamber and a cathodic chamber, the first chamber being separated from the cathode chamber by an anion exchange membrane and the second chamber being separated from the anodic chamber by a cation exchange membrane. The solution is delivered to the first chamber for hypophosphite and orthophosphite ion transport from the solution to the second chamber and simultaneous hypophosphite ion transport from the cathodic chamber into the solution, the resulting regenerated solution being discharged for reuse. Preferred Features: Part of the solution, leaving the weakly basic anion exchanger (T1), may be passed over a plating metal ion-loaded, weakly acidic anion exchanger within the first chamber (5) of the cell (EZ). A regeneration circuit is formed by a connection (P1) between the cathodic chamber (3) and the second chamber (6). A further chamber may be provided between the anodic chamber (1) and the second chamber and separated from the second chamber by a cation exchange membrane, this further chamber receiving plating metal ions from the anodic chamber and being supplied with part or all of the process solution (PL) which is then transferred to the first chamber. Plating metal additions are made to the first chamber or to the anodic chamber. The anode (2) may be an insoluble anode, preferably of steel or platinized expanded titanium, or a soluble anode of the plating metal.
EP99120998A 1998-11-06 1999-11-04 Process for regenerating a processing solution Expired - Lifetime EP1006213B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19851180 1998-11-06
DE19851180A DE19851180C1 (en) 1998-11-06 1998-11-06 Chemical reduction metal plating solution is regenerated using a weakly basic anion exchanger for hypophosphite ion recycle to the cathodic chamber of an electrodialysis cell

Publications (3)

Publication Number Publication Date
EP1006213A2 EP1006213A2 (en) 2000-06-07
EP1006213A3 true EP1006213A3 (en) 2000-08-09
EP1006213B1 EP1006213B1 (en) 2004-12-15

Family

ID=7886899

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99120998A Expired - Lifetime EP1006213B1 (en) 1998-11-06 1999-11-04 Process for regenerating a processing solution

Country Status (3)

Country Link
EP (1) EP1006213B1 (en)
AT (1) ATE284980T1 (en)
DE (2) DE19851180C1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10240350B4 (en) 2002-08-28 2005-05-12 Atotech Deutschland Gmbh Apparatus and method for regenerating an electroless plating bath
DE10322120A1 (en) * 2003-05-12 2004-12-09 Blasberg Werra Chemie Gmbh Methods and devices for extending the service life of a process solution for chemical-reductive metal coating
DE102004038693B4 (en) 2004-08-10 2010-02-25 Blasberg Werra Chemie Gmbh Apparatus and method for removing foreign matter from process solutions and process for regenerating a cation exchanger
ES2303973T3 (en) 2005-05-25 2008-09-01 Enthone Inc. PROCEDURE AND DEVICE TO ADJUST THE CONCENTRATION OF IONS IN ELECTROLYTES.
DE102010015361A1 (en) 2010-04-16 2011-10-20 Atotech Deutschland Gmbh Membrane electrolysis stack, this containing electrodialysis device and method for regenerating a stromloslos working bath for metal deposition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2726969A (en) * 1953-12-03 1955-12-13 Gen Motors Corp Chemical reduction plating process
DE4310366C1 (en) * 1993-03-30 1994-10-13 Fraunhofer Ges Forschung Method for regenerating aqueous coating baths operating in an electroless manner
US5419821A (en) * 1993-06-04 1995-05-30 Vaughan; Daniel J. Process and equipment for reforming and maintaining electroless metal baths

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2726969A (en) * 1953-12-03 1955-12-13 Gen Motors Corp Chemical reduction plating process
DE4310366C1 (en) * 1993-03-30 1994-10-13 Fraunhofer Ges Forschung Method for regenerating aqueous coating baths operating in an electroless manner
US5419821A (en) * 1993-06-04 1995-05-30 Vaughan; Daniel J. Process and equipment for reforming and maintaining electroless metal baths

Also Published As

Publication number Publication date
ATE284980T1 (en) 2005-01-15
EP1006213B1 (en) 2004-12-15
DE19851180C1 (en) 2000-04-20
EP1006213A2 (en) 2000-06-07
DE59911270D1 (en) 2005-01-20

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