DE59911270D1 - Method for regenerating a process solution - Google Patents
Method for regenerating a process solutionInfo
- Publication number
- DE59911270D1 DE59911270D1 DE59911270T DE59911270T DE59911270D1 DE 59911270 D1 DE59911270 D1 DE 59911270D1 DE 59911270 T DE59911270 T DE 59911270T DE 59911270 T DE59911270 T DE 59911270T DE 59911270 D1 DE59911270 D1 DE 59911270D1
- Authority
- DE
- Germany
- Prior art keywords
- chamber
- solution
- anodic
- hypophosphite
- cathodic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title abstract 3
- 230000001172 regenerating effect Effects 0.000 title 1
- 238000007747 plating Methods 0.000 abstract 6
- 150000001450 anions Chemical class 0.000 abstract 4
- 229910052751 metal Inorganic materials 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 4
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 abstract 3
- 239000002253 acid Substances 0.000 abstract 2
- 239000003011 anion exchange membrane Substances 0.000 abstract 2
- 238000005341 cation exchange Methods 0.000 abstract 2
- 239000003638 chemical reducing agent Substances 0.000 abstract 2
- 238000000909 electrodialysis Methods 0.000 abstract 2
- GQZXNSPRSGFJLY-UHFFFAOYSA-N hydroxyphosphanone Chemical compound OP=O GQZXNSPRSGFJLY-UHFFFAOYSA-N 0.000 abstract 2
- 229940005631 hypophosphite ion Drugs 0.000 abstract 2
- 230000037427 ion transport Effects 0.000 abstract 2
- 239000012528 membrane Substances 0.000 abstract 2
- 229910021645 metal ion Inorganic materials 0.000 abstract 2
- 238000006722 reduction reaction Methods 0.000 abstract 2
- 230000008929 regeneration Effects 0.000 abstract 2
- 238000011069 regeneration method Methods 0.000 abstract 2
- 229910000831 Steel Inorganic materials 0.000 abstract 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 238000007792 addition Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 abstract 1
- 239000010959 steel Substances 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Chemically Coating (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Chemical reduction metal plating solution regeneration uses a weakly basic anion exchanger (T1) for hypophosphite ion recycle to the cathodic chamber (3) of a multi-chamber electrodialysis cell. An acid mixture, formed in the second chamber (6) by entry of protons from the anodic chamber (1), is supplied to a hypophosphite-loaded weakly basic anion exchanger with its outlet connected to the cathodic chamber. A chemical reduction metal plating solution, containing hypophosphite and ortho phosphite, is regenerated in a multi-chamber electrodialysis cell having two chambers separated from one another by an anion exchange membrane and which are located between a dilute acid-containing anodic chamber and a cathodic chamber, the first chamber being separated from the cathode chamber by an anion exchange membrane and the second chamber being separated from the anodic chamber by a cation exchange membrane. The solution is delivered to the first chamber for hypophosphite and orthophosphite ion transport from the solution to the second chamber and simultaneous hypophosphite ion transport from the cathodic chamber into the solution, the resulting regenerated solution being discharged for reuse. Preferred Features: Part of the solution, leaving the weakly basic anion exchanger (T1), may be passed over a plating metal ion-loaded, weakly acidic anion exchanger within the first chamber (5) of the cell (EZ). A regeneration circuit is formed by a connection (P1) between the cathodic chamber (3) and the second chamber (6). A further chamber may be provided between the anodic chamber (1) and the second chamber and separated from the second chamber by a cation exchange membrane, this further chamber receiving plating metal ions from the anodic chamber and being supplied with part or all of the process solution (PL) which is then transferred to the first chamber. Plating metal additions are made to the first chamber or to the anodic chamber. The anode (2) may be an insoluble anode, preferably of steel or platinized expanded titanium, or a soluble anode of the plating metal.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19851180A DE19851180C1 (en) | 1998-11-06 | 1998-11-06 | Chemical reduction metal plating solution is regenerated using a weakly basic anion exchanger for hypophosphite ion recycle to the cathodic chamber of an electrodialysis cell |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59911270D1 true DE59911270D1 (en) | 2005-01-20 |
Family
ID=7886899
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19851180A Expired - Fee Related DE19851180C1 (en) | 1998-11-06 | 1998-11-06 | Chemical reduction metal plating solution is regenerated using a weakly basic anion exchanger for hypophosphite ion recycle to the cathodic chamber of an electrodialysis cell |
DE59911270T Expired - Lifetime DE59911270D1 (en) | 1998-11-06 | 1999-11-04 | Method for regenerating a process solution |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19851180A Expired - Fee Related DE19851180C1 (en) | 1998-11-06 | 1998-11-06 | Chemical reduction metal plating solution is regenerated using a weakly basic anion exchanger for hypophosphite ion recycle to the cathodic chamber of an electrodialysis cell |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1006213B1 (en) |
AT (1) | ATE284980T1 (en) |
DE (2) | DE19851180C1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10240350B4 (en) | 2002-08-28 | 2005-05-12 | Atotech Deutschland Gmbh | Apparatus and method for regenerating an electroless plating bath |
DE10322120A1 (en) * | 2003-05-12 | 2004-12-09 | Blasberg Werra Chemie Gmbh | Methods and devices for extending the service life of a process solution for chemical-reductive metal coating |
DE102004038693B4 (en) | 2004-08-10 | 2010-02-25 | Blasberg Werra Chemie Gmbh | Apparatus and method for removing foreign matter from process solutions and process for regenerating a cation exchanger |
ES2303973T3 (en) | 2005-05-25 | 2008-09-01 | Enthone Inc. | PROCEDURE AND DEVICE TO ADJUST THE CONCENTRATION OF IONS IN ELECTROLYTES. |
DE102010015361A1 (en) | 2010-04-16 | 2011-10-20 | Atotech Deutschland Gmbh | Membrane electrolysis stack, this containing electrodialysis device and method for regenerating a stromloslos working bath for metal deposition |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2726969A (en) * | 1953-12-03 | 1955-12-13 | Gen Motors Corp | Chemical reduction plating process |
DE4310366C1 (en) * | 1993-03-30 | 1994-10-13 | Fraunhofer Ges Forschung | Method for regenerating aqueous coating baths operating in an electroless manner |
US5419821A (en) * | 1993-06-04 | 1995-05-30 | Vaughan; Daniel J. | Process and equipment for reforming and maintaining electroless metal baths |
-
1998
- 1998-11-06 DE DE19851180A patent/DE19851180C1/en not_active Expired - Fee Related
-
1999
- 1999-11-04 DE DE59911270T patent/DE59911270D1/en not_active Expired - Lifetime
- 1999-11-04 AT AT99120998T patent/ATE284980T1/en not_active IP Right Cessation
- 1999-11-04 EP EP99120998A patent/EP1006213B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ATE284980T1 (en) | 2005-01-15 |
EP1006213A3 (en) | 2000-08-09 |
EP1006213B1 (en) | 2004-12-15 |
DE19851180C1 (en) | 2000-04-20 |
EP1006213A2 (en) | 2000-06-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: BLASBERG WERRA CHEMIE GMBH, 98544 ZELLA-MEHLIS, DE |
|
8364 | No opposition during term of opposition |