EP0934801A3 - Method and apparatus for polishing work - Google Patents
Method and apparatus for polishing work Download PDFInfo
- Publication number
- EP0934801A3 EP0934801A3 EP99300772A EP99300772A EP0934801A3 EP 0934801 A3 EP0934801 A3 EP 0934801A3 EP 99300772 A EP99300772 A EP 99300772A EP 99300772 A EP99300772 A EP 99300772A EP 0934801 A3 EP0934801 A3 EP 0934801A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- polishing
- work
- work holding
- holding surface
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/015—Temperature control
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04131198A JP3467184B2 (en) | 1998-02-05 | 1998-02-05 | Work polishing method |
JP4131198 | 1998-02-05 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0934801A2 EP0934801A2 (en) | 1999-08-11 |
EP0934801A3 true EP0934801A3 (en) | 2002-07-10 |
EP0934801B1 EP0934801B1 (en) | 2004-01-14 |
Family
ID=12604968
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99300772A Expired - Lifetime EP0934801B1 (en) | 1998-02-05 | 1999-02-02 | Method for polishing work |
Country Status (6)
Country | Link |
---|---|
US (1) | US6399498B1 (en) |
EP (1) | EP0934801B1 (en) |
JP (1) | JP3467184B2 (en) |
DE (1) | DE69914113T2 (en) |
MY (1) | MY122322A (en) |
TW (1) | TW393374B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010024877A1 (en) | 2000-03-17 | 2001-09-27 | Krishna Vepa | Cluster tool systems and methods for processing wafers |
EP1335814A1 (en) | 2000-11-21 | 2003-08-20 | Memc Electronic Materials S.P.A. | Semiconductor wafer, polishing apparatus and method |
US6672943B2 (en) | 2001-01-26 | 2004-01-06 | Wafer Solutions, Inc. | Eccentric abrasive wheel for wafer processing |
US6712673B2 (en) | 2001-10-04 | 2004-03-30 | Memc Electronic Materials, Inc. | Polishing apparatus, polishing head and method |
DE10154050A1 (en) * | 2001-11-02 | 2003-05-15 | Schott Glas | Processing of inhomogeneous materials |
JP6180873B2 (en) * | 2013-08-30 | 2017-08-16 | 株式会社クラレ | Fiber composite sheet, polishing pad and manufacturing method thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS634937A (en) * | 1986-06-26 | 1988-01-09 | Mitsubishi Plastics Ind Ltd | Preparation of laminated plate |
EP0388972A2 (en) * | 1989-03-24 | 1990-09-26 | Sumitomo Electric Industries, Ltd. | Apparatus for grinding semiconductor wafer |
JPH04242929A (en) * | 1990-12-26 | 1992-08-31 | Shin Etsu Handotai Co Ltd | Wafer polishing method |
EP0650806A1 (en) * | 1993-10-28 | 1995-05-03 | Kabushiki Kaisha Toshiba | Polishing apparatus of semiconductor wafer |
US5643060A (en) * | 1993-08-25 | 1997-07-01 | Micron Technology, Inc. | System for real-time control of semiconductor wafer polishing including heater |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4132037A (en) * | 1977-02-28 | 1979-01-02 | Siltec Corporation | Apparatus for polishing semiconductor wafers |
JPS58180026A (en) | 1982-04-15 | 1983-10-21 | Nippon Telegr & Teleph Corp <Ntt> | Attracting board for grinding wafer |
JPS63318260A (en) | 1987-06-22 | 1988-12-27 | Kyushu Denshi Kinzoku Kk | Surface working method |
JP2655975B2 (en) * | 1992-09-18 | 1997-09-24 | 三菱マテリアル株式会社 | Wafer polishing equipment |
US5605487A (en) * | 1994-05-13 | 1997-02-25 | Memc Electric Materials, Inc. | Semiconductor wafer polishing appartus and method |
US5910041A (en) * | 1997-03-06 | 1999-06-08 | Keltech Engineering | Lapping apparatus and process with raised edge on platen |
-
1998
- 1998-02-05 JP JP04131198A patent/JP3467184B2/en not_active Expired - Fee Related
-
1999
- 1999-02-01 TW TW088101503A patent/TW393374B/en not_active IP Right Cessation
- 1999-02-02 DE DE69914113T patent/DE69914113T2/en not_active Expired - Fee Related
- 1999-02-02 EP EP99300772A patent/EP0934801B1/en not_active Expired - Lifetime
- 1999-02-04 MY MYPI99000394A patent/MY122322A/en unknown
- 1999-02-04 US US09/244,697 patent/US6399498B1/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS634937A (en) * | 1986-06-26 | 1988-01-09 | Mitsubishi Plastics Ind Ltd | Preparation of laminated plate |
EP0388972A2 (en) * | 1989-03-24 | 1990-09-26 | Sumitomo Electric Industries, Ltd. | Apparatus for grinding semiconductor wafer |
JPH04242929A (en) * | 1990-12-26 | 1992-08-31 | Shin Etsu Handotai Co Ltd | Wafer polishing method |
US5643060A (en) * | 1993-08-25 | 1997-07-01 | Micron Technology, Inc. | System for real-time control of semiconductor wafer polishing including heater |
EP0650806A1 (en) * | 1993-10-28 | 1995-05-03 | Kabushiki Kaisha Toshiba | Polishing apparatus of semiconductor wafer |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 012, no. 197 (M - 706) 8 June 1988 (1988-06-08) * |
PATENT ABSTRACTS OF JAPAN vol. 017, no. 013 (E - 1304) 11 January 1993 (1993-01-11) * |
Also Published As
Publication number | Publication date |
---|---|
DE69914113T2 (en) | 2004-11-11 |
TW393374B (en) | 2000-06-11 |
US6399498B1 (en) | 2002-06-04 |
EP0934801A2 (en) | 1999-08-11 |
EP0934801B1 (en) | 2004-01-14 |
DE69914113D1 (en) | 2004-02-19 |
JPH11221753A (en) | 1999-08-17 |
MY122322A (en) | 2006-04-29 |
JP3467184B2 (en) | 2003-11-17 |
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