EP0877099A1 - Elektrisch leitende ZnO enthaltende Schichten auf Substrate und Verfahren zu deren Herstellung - Google Patents
Elektrisch leitende ZnO enthaltende Schichten auf Substrate und Verfahren zu deren Herstellung Download PDFInfo
- Publication number
- EP0877099A1 EP0877099A1 EP98105597A EP98105597A EP0877099A1 EP 0877099 A1 EP0877099 A1 EP 0877099A1 EP 98105597 A EP98105597 A EP 98105597A EP 98105597 A EP98105597 A EP 98105597A EP 0877099 A1 EP0877099 A1 EP 0877099A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- zno
- layer
- infiltration
- sol
- ωcm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
- C23C18/127—Preformed particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1275—Process of deposition of the inorganic material performed under inert atmosphere
Definitions
- the invention relates to electrically conductive ZnO containing transparent layers on substrates that in the electronics industry or for various Sensors can be used and a process for their manufacture.
- the layer thicknesses are between 200 and 1000 nm and the electrical properties are achieved by doping, high manufacturing temperatures or tempering in a vacuum or in a hydrogen atmosphere.
- nanocrystalline ZnO layers with desired optical and electrical properties could not be produced so far.
- this object is related to the ZnO layer by the features of claim 1, and in terms of the manufacturing process by the Features of claim 7 solved.
- optically transparent, nanoporous and electrically conductive ZnO or aluminum-doped ZnO layers are thus proposed for the first time.
- the great advantage of the layers according to the invention is that they can be produced in a relatively large thickness (from 0.4 to 3 ⁇ m) and that the electrical and optical properties can be influenced favorably by the doping and subsequent infiltration, so that the Layers according to the invention can be used in sensor technology.
- the layers according to the invention are optically transparent under controlled conditions (T> 90%, 450 nm - 1200 nm) and have specific resistances in the range from ... to ....
- the invention further relates to a method for Production of layers containing ZnO.
- the method according to the invention is characterized in that that wet chemical, with a known Sol-Geltechnik made a concentrated ZnO-Sol and with at least one coating step Layer thickness of the dry layer of at least 0.4 ⁇ m is applied.
- the method according to the invention can be further developed in which Al-doped ZnO layers on various Substrates can be applied.
- a Zinc alkoxide precursor by base catalyzed hydrolysis synthesized a ZnO sol containing nanoparticles this is preferred by condensation in its concentration is increased.
- the zinc alkoxide precursor can, for example, by Refluxing zinc acetate can be obtained in alcohol and hydrolysis can be done, for example, with TMAH (Tetramethyl ammonium hydroxide), LiOH, NaOH or KOH be performed.
- TMAH Tetramethyl ammonium hydroxide
- Al-doped ZnO layers can be applied in the same way if Al-containing zinc alkoxide precursors are used to synthesize the ZnO sol or if Al (sek-BuO) 3 is added to the ZnO sol. The synthesis takes place until 2-molar ZnO or Al-containing ZnO sols containing nanoparticles are obtained.
- Additional infiltration can reduce the nanoporosity of the layers produced and thus both the electrical, as well as the optical properties targeted be influenced, so that the possible area of application and in particular expanded that for sensors can be.
- the procedure is now such that a Zinc alkoxide precursor by refluxing zinc acetate or zinc acetate with some at% aluminum alkoxide in Alcohols, e.g. Ethanol, 1-propanol, 2-propanol, 1-butanol i.a. done in air.
- Alcohols e.g. Ethanol, 1-propanol, 2-propanol, 1-butanol i.a. done in air.
- the still wet layer is Temperatures between 200 and 500 ° C, preferably at 300 ° C annealed in air and a transparent Received layer.
- an aftertreatment can be carried out, the layers being subjected to a thermal treatment in the temperature range between 200 and 500 ° C. in air, in an inert atmosphere (argon) and preferably in reducing atmosphere (H 2 / N 2 mixture).
- argon inert atmosphere
- H 2 / N 2 mixture reducing atmosphere
- the result is optically transparent layers, the smallest specific resistance of which is 4 x 10 -3 ⁇ cm, measured with a 2-point or 4-point DC measurement. It is only through this aftertreatment of the coated substrates, preferably in the reducing atmosphere already described, in combination with the relatively high layer thickness that the unexpectedly large increase in conductivity of the layer or layers produced is achieved.
- the surface resistance can thus be reduced from above 20 M ⁇ / ⁇ before this thermal post-treatment to values far below 50 ⁇ / ⁇ after the thermal treatment.
- optical transparent layers T> 90% in the wavelength range between 450 nm to 1200 nm for layer thicknesses to 2 microns can be achieved, as in the in the figure 1 shown diagram for a 1.5 ⁇ m thick Al-doped ZnO layer made after double infiltration and has a sheet resistance of 27 ⁇ / ⁇ , is shown.
- a 0.65 M zinc alkoxide precursor is synthesized by refluxing Zn (Ac) 2 x 2H 2 O in 1-propanol. With simultaneous heating, hydrolysis takes place with TMAH.
- the ZnO / Al sol obtained in this way is then cleaned Glass substrate applied with a dip coating, drawing speeds from 20 to 30 cm / min have been observed.
- the Al-doped ZnO layer obtained in this way is nanoporous and optically transparent and has a layer thickness between 0.8 ⁇ m to 2 ⁇ m.
- the coated substrate is subsequently immersed over a period of about 5 minutes in a hot 0.1 M zinc alkoxide precursor which contains 2 at% Al (sec-BuO) 3 in order to carry out a first infiltration. Furthermore, taking into account the stoichiometric equilibrium TMAH, the zinc alkoxide precursor was added and after a further approx. 5 min immersion time the substrate was removed from this infiltration solution at a speed of approx. 2.5 cm / min and immediately afterwards over a period of 15 min at a Temperature annealed to 300 ° C in air.
- TMAH stoichiometric equilibrium
- the applied optically transparent Al-doped Layer structure showed a sheet resistance above 20 M ⁇ / ⁇ on.
- a thermal aftertreatment was carried out at 400 ° C. in a reducing forming gas atmosphere (10% H 2 , 90% N 2 ) over a period of approx. 4 h and a specific resistance between 6 ⁇ 10 for the layers treated accordingly -3 ⁇ cm and 4 x 10 -3 ⁇ cm reached.
- the Al-free ZnO layers have specific resistances of 2 x 10 -1 - 8 x 10 -2 ⁇ cm.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Dispersion Chemistry (AREA)
- Nanotechnology (AREA)
- Chemically Coating (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
20 Ω/□ erreicht werden.
Claims (21)
- Auf ein Substrat aufgebrachte ZnO-Elektronenleiterschicht,
dadurch gekennzeichnet,
daß sie aus transparentem, nanokristallinem ZnO gebildet ist. - ZnO-Elektronenleiterschicht nach Anspruch 1,
dadurch gekennzeichnet, daß sie eine Schichtdicke von 0,4 µm bis 3 µm und einen spezifischen Widerstand von 9 x 10-1 Ωcm bis 1 x 10-3 Ωcm aufweist. - ZnO-Elektronenleiterschicht nach Anspruch 1 oder 2,
dadurch gekennzeichnet, daß die Schicht dotiert ist. - ZnO-Elektronenleiterschicht nach Anspruch 3,
dadurch gekennzeichnet, daß sie mit Aluminium dotiert ist. - ZnO-Elektronenleiterschicht nach Anspruch 1 oder 2,
dadurch gekennzeichnet, daß sie einen spezifischen Widerstand von 6 x 10-1 bis 8 x 10-2 Ωcm aufweist. - ZnO-Elektronenleiterschicht nach Anspruch 3 oder 4,
dadurch gekennzeichnet, daß sie einen spezifischen Widerstand von 1 x 10-2 bis 4 x 10-3 Ωcm aufweist. - Verfahren zur Herstellung einer elektrisch leitenden ZnO enthaltenden Schicht auf einem Substrat,
dadurch gekennzeichnet,
daß naßchemisch ein Nanopartikel enthaltendes ZnO-Sol hergestellt und in mindestens einem Beschichtungsschritt mit einer Schichtdicke der trockenen Schicht von mindestens 0,4 µm aufgebracht und zur Schichtbildung thermisch behandelt wird. - Verfahren nach Anspruch 7,
dadurch gekennzeichnet, daß das ZnO-Sol aus einer Zinkalkoxidvorstufe durch basenkatalysierte Hydrolyse synthetisiert wird. - Verfahren nach Anspruch 7 oder 8,
dadurch gekennzeichnet, daß die Zinkalkoxidvorstufe durch Refluxieren eines Zinksalzes in Alkohol erhalten wird. - Verfahren nach Anspruch 9,
dadurch gekennzeichnet, daß als Zinksalz Zinkacetat verwendet wird. - Verfahren nach einem der Ansprüche 7 bis 10,
dadurch gekennzeichnet, daß eine Al-haltige Zinkalkoxidvorstufen zur Synthese des ZnO-Sols verwendet wird. - Verfahren nach Anspruch 11,
dadurch gekennzeichnet, daß dem ZnO-Sol Al (sek BuO)3 zugegeben wird. - Verfahren nach einem der Ansprüche 7 bis 12,
dadurch gekennzeichnet, daß die Beschichtung durch Tauchen, Besprühen, Bepinseln, Rakeln, Bedrucken oder mit einem spin-on-Verfahren durchgeführt wird. - Verfahren nach einem der Ansprüche 7 bis 13,
dadurch gekennzeichnet, daß die aufgebrachte Schicht bei Temperaturen zwischen 200 und 500 °C getempert wird. - Verfahren nach einem der Ansprüche 7 bis 14,
dadurch gekennzeichnet, daß die trockene Schicht nachfolgend mindestens einer Infiltration unterzogen wird. - Verfahren nach Anspruch 15,
dadurch gekennzeichnet, daß die Infiltration mit einer Zinkalkoxidvorstufe bei erhöhter Temperatur durchgeführt wird. - Verfahren nach Anspruch 15,
dadurch gekennzeichnet, daß der Infiltrationslösung Al(sek-BuO)3 zugegeben wird. - Verfahren nach Anspruch 15 bis 17,
dadurch gekennzeichnet, daß die Infiltration durch Tauchen in die Infiltrationslösung durchgeführt wird. - Verfahren nach einem der Ansprüche 15 bis 18,
dadurch gekennzeichnet, daß nach der/den Infiltrationen eine thermische Nachbehandlung bei Temperaturen oberhalb 300 °C durchgeführt wird. - Verfahren nach Anspruch 19,
dadurch gekennzeichnet, daß die thermische Behandlung in reduzierender oder inerter Atmosphäre durchgeführt wird. - Verfahren nach Anspruch 20,
dadurch gekennzeichnet, daß als reduzierende Atmosphäre ein H2/N2-Gemisch verwendet wird.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19719162A DE19719162C2 (de) | 1997-05-06 | 1997-05-06 | Verfahren zur Herstellung einer elektrisch leitenden ZnO enthaltenden Schicht auf einem Substrat |
DE19719162 | 1997-05-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0877099A1 true EP0877099A1 (de) | 1998-11-11 |
EP0877099B1 EP0877099B1 (de) | 2003-07-09 |
Family
ID=7828804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98105597A Expired - Lifetime EP0877099B1 (de) | 1997-05-06 | 1998-03-27 | Verfahren zur Herstellung einer elektrisch leitenden ZnO enthaltende Schichten auf einem Substrat |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0877099B1 (de) |
DE (2) | DE19719162C2 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000026923A1 (de) * | 1998-10-29 | 2000-05-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Elektrisch leitfähiges und optisch transparentes material, verfahren zu dessen herstellung und verwendung desselben |
DE102005046450A1 (de) * | 2005-09-28 | 2007-04-05 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip, Verfahren zu dessen Herstellung und optoelektronisches Bauteil |
DE102005047168A1 (de) * | 2005-09-30 | 2007-04-12 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006023685A1 (de) | 2005-09-29 | 2007-04-05 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
DE102015118417A1 (de) * | 2015-10-28 | 2017-05-04 | Osram Oled Gmbh | Optoelektronisches Bauelement und Verfahren zum Herstellen eines optoelektronischen Bauelements |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0336574A1 (de) * | 1988-04-06 | 1989-10-11 | Imperial Chemical Industries Plc | Herstellung einer durchsichtigen leitenden Zinkoxidschicht |
US5252356A (en) * | 1991-02-22 | 1993-10-12 | The Honjo Chemical Corporation | Method of producing transparent zinc oxide films |
-
1997
- 1997-05-06 DE DE19719162A patent/DE19719162C2/de not_active Expired - Fee Related
-
1998
- 1998-03-27 EP EP98105597A patent/EP0877099B1/de not_active Expired - Lifetime
- 1998-03-27 DE DE59808946T patent/DE59808946D1/de not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0336574A1 (de) * | 1988-04-06 | 1989-10-11 | Imperial Chemical Industries Plc | Herstellung einer durchsichtigen leitenden Zinkoxidschicht |
US5252356A (en) * | 1991-02-22 | 1993-10-12 | The Honjo Chemical Corporation | Method of producing transparent zinc oxide films |
Non-Patent Citations (3)
Title |
---|
DATABASE INSPEC INSTITUTE OF ELECTRICAL ENGINEERS, STEVENAGE, GB; KAMAT P V: "Nanocrystalline semiconductor thin films for microelectronic and optoelectronic applications", XP002071586 * |
KAMALASANAN M N ET AL: "SOL-GEL SYNTHESIS OF ZNO THIN FILMS", THIN SOLID FILMS, vol. 288, no. 1/02, 15 November 1996 (1996-11-15), pages 112 - 115, XP000691282 * |
MATERIALS TECHNOLOGY, JULY-AUG. 1994, USA, vol. 9, no. 7-8, ISSN 1066-7857, pages 147 - 149 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000026923A1 (de) * | 1998-10-29 | 2000-05-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Elektrisch leitfähiges und optisch transparentes material, verfahren zu dessen herstellung und verwendung desselben |
DE102005046450A1 (de) * | 2005-09-28 | 2007-04-05 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip, Verfahren zu dessen Herstellung und optoelektronisches Bauteil |
EP1770794A3 (de) * | 2005-09-28 | 2008-07-09 | OSRAM Opto Semiconductors GmbH | Optoelektronische Halbleiterchip, Verfahren zu dessen Herstellung und optoelektronisches Bauteil |
US7838876B2 (en) | 2005-09-28 | 2010-11-23 | Osram Opto Semiconductors Gmbh | Optoelectronic semiconductor device in which current spreading layer of sol gel material mixed with nanoparticles is mixed with wavelength conversion dyes |
DE102005047168A1 (de) * | 2005-09-30 | 2007-04-12 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
Also Published As
Publication number | Publication date |
---|---|
DE59808946D1 (de) | 2003-08-14 |
DE19719162C2 (de) | 2001-02-08 |
DE19719162A1 (de) | 1998-11-12 |
EP0877099B1 (de) | 2003-07-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3490007C2 (de) | ||
DE102013111267B4 (de) | Kochfeld mit einem transparenten elektrischen Leiter und Verfahren zur Herstellung | |
EP1092689B1 (de) | Leitende transparente Schichten und Verfahren zu ihrer Herstellung | |
US8372472B2 (en) | Forming photovoltaic conductive features from multiple inks | |
WO2000064830A1 (de) | VORGESPANNTES, MIT EINER WISCHFESTEN, PORÖSEN SiO2-ANTIREFLEX-SCHICHT VERSEHENES SICHERHEITSGLAS UND VERFAHREN ZU DESSEN HERSTELLUNG | |
WO1999049521A1 (de) | Verfahren zur einseitigen dotierung eines halbleiterkörpers | |
EP2561557B1 (de) | Verfahren zur herstellung einer solarzelle | |
DE19620645C2 (de) | Verfahren zur Herstellung selektiver Absorber | |
DE1956964A1 (de) | Halbleiter und deren Herstellungsmethode | |
US4201453A (en) | Liquid crystal cell having an insulating layer of a silicon oxide base | |
EP0877099B1 (de) | Verfahren zur Herstellung einer elektrisch leitenden ZnO enthaltende Schichten auf einem Substrat | |
EP2970698B1 (de) | Beschichtung, verfahren zu deren herstellung und ihre verwendung | |
WO2007096084A1 (de) | Halbleiterbauelement und verfahren zu dessen herstellung sowie dessen verwendung | |
EP0830324B1 (de) | Verfahren zur herstellung von glasschichten zum zwecke des anodischen bondens | |
DE60015710T2 (de) | Lösung zur Herstellung einer aus Nickel bestehenden Metall-Dünnschicht und Verfahren zur Herstellung | |
EP2504862B1 (de) | Substrat mit einer metallfolie zur herstellung von photovoltaik-zellen | |
DE19505449C2 (de) | Verfahren zur Herstellung eines Schichtsystems auf Substraten und das mit diesem Verfahren hergestellte Schichtsystem | |
DE102008029385B4 (de) | Verfahren zur Herstellung von Seltenerdmetalloxidschichten und Übergangsmetalloxidschichten, Verwendung einer Vorrichtung zur Herstellung von Seltenerdmetalloxidschichten und Übergangsmetalloxidschichten sowie Verwendung eines Metallnitrats | |
DE10162443A1 (de) | Verfahren zur Herstellung von dielektrischen Schichten unter Verwendung multifunktioneller Carbosilane | |
EP1074526A2 (de) | Verfahren zur Herstellung einer antireflektiven und ausgleichenden Schicht auf Glas/TLO-Substraten | |
DE2148120B2 (de) | Verfahren zum Niederschlagen von Glasfilmen | |
DE102007007755A1 (de) | Verfahren zur Herstellung einer niedrigemittierenden Metalloxid-Beschichtung | |
Rajabi et al. | A comparative study of dip coating and spray pyrolysis methods for synthesizing ITO nanolayers by using Ag colloidal sol | |
DE2453227C2 (de) | Verfahren zur metallisierung von keramischen oder glaesernen traegerkoerpern | |
DE2750805A1 (de) | Verfahren zur herstellung metallhaltiger schichten auf oberflaechen von halbleiterbauelementen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19980327 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE FR GB IT NL |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
AKX | Designation fees paid |
Free format text: DE FR GB IT NL |
|
17Q | First examination report despatched |
Effective date: 20000515 |
|
RTI1 | Title (correction) |
Free format text: PROCESS FOR MANUFACTURE ELECTRICALLY CONDUCTVIE ZNO COMPRISING LAYERS ON SUBSTRATES |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
RTI1 | Title (correction) |
Free format text: PROCESS FOR MANUFACTURE AN ELECTRICALLY CONDUCTVIE ZNO COMPRISING LAYER ON A SUBSTRATE |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Designated state(s): DE FR GB IT NL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED. Effective date: 20030709 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REF | Corresponds to: |
Ref document number: 59808946 Country of ref document: DE Date of ref document: 20030814 Kind code of ref document: P |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20031008 |
|
RAP2 | Party data changed (patent owner data changed or rights of a patent transferred) |
Owner name: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DERANGEWAND |
|
NLT2 | Nl: modifications (of names), taken from the european patent patent bulletin |
Owner name: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER |
|
ET | Fr: translation filed | ||
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20040414 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20060320 Year of fee payment: 9 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20060322 Year of fee payment: 9 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20060524 Year of fee payment: 9 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20070327 |
|
NLV4 | Nl: lapsed or anulled due to non-payment of the annual fee |
Effective date: 20071001 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20071130 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20071001 Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20071002 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070327 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070402 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20060323 Year of fee payment: 9 |