EP0752018A4 - Techniques de traitement de surface - Google Patents

Techniques de traitement de surface

Info

Publication number
EP0752018A4
EP0752018A4 EP95927112A EP95927112A EP0752018A4 EP 0752018 A4 EP0752018 A4 EP 0752018A4 EP 95927112 A EP95927112 A EP 95927112A EP 95927112 A EP95927112 A EP 95927112A EP 0752018 A4 EP0752018 A4 EP 0752018A4
Authority
EP
European Patent Office
Prior art keywords
substrate
carbon
surface treatment
infrared
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP95927112A
Other languages
German (de)
English (en)
Other versions
EP0752018A1 (fr
Inventor
Pravin Mistry
Manuel C Turchan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
QQC Inc
Original Assignee
QQC Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/241,930 external-priority patent/US5731046A/en
Application filed by QQC Inc filed Critical QQC Inc
Publication of EP0752018A1 publication Critical patent/EP0752018A1/fr
Publication of EP0752018A4 publication Critical patent/EP0752018A4/fr
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/04—Diamond

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

De l'énergie provenant par exemple d'un laser excimère UV (712), d'un laser Nd:YAG infrarouge (714) et d'un laser CO2 infrarouge (716) est dirigée à travers un ajutage (722) au niveau de la surface d'un substrat (702) pour mobiliser et vaporiser un constituant carboné (par exemple du carbure) au sein du substrat (par exemple de l'acier). Une source secondaire supplémentaire (par exemple un gaz contenant du carbone, tel que du CO2) (720) et un gaz de protection inerte (N2) sont également délivrés à travers l'ajutage. L'énergie fait réagir le constituant vaporisé et transforme sa structure physique (par exemple de carbone en diamant) en celle d'un matériau composite qui est diffusé en retour dans le substrat sous forme de matériau composite.
EP95927112A 1994-05-12 1995-05-11 Techniques de traitement de surface Ceased EP0752018A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/241,930 US5731046A (en) 1994-01-18 1994-05-12 Fabrication of diamond and diamond-like carbon coatings
PCT/US1995/005941 WO1995031584A1 (fr) 1994-05-12 1995-05-11 Techniques de traitement de surface
US241930 1999-02-02

Publications (2)

Publication Number Publication Date
EP0752018A1 EP0752018A1 (fr) 1997-01-08
EP0752018A4 true EP0752018A4 (fr) 1998-09-02

Family

ID=22912772

Family Applications (1)

Application Number Title Priority Date Filing Date
EP95927112A Ceased EP0752018A4 (fr) 1994-05-12 1995-05-11 Techniques de traitement de surface

Country Status (3)

Country Link
EP (1) EP0752018A4 (fr)
AU (1) AU3124295A (fr)
WO (1) WO1995031584A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09320352A (ja) * 1996-05-24 1997-12-12 Nissin Electric Co Ltd 電線及びその製造方法
JP3555844B2 (ja) 1999-04-09 2004-08-18 三宅 正二郎 摺動部材およびその製造方法
US6969198B2 (en) 2002-11-06 2005-11-29 Nissan Motor Co., Ltd. Low-friction sliding mechanism
JP4863152B2 (ja) 2003-07-31 2012-01-25 日産自動車株式会社 歯車
US7771821B2 (en) 2003-08-21 2010-08-10 Nissan Motor Co., Ltd. Low-friction sliding member and low-friction sliding mechanism using same
US8814861B2 (en) 2005-05-12 2014-08-26 Innovatech, Llc Electrosurgical electrode and method of manufacturing same
GB201118698D0 (en) 2011-10-28 2011-12-14 Laser Fusion Technologies Ltd Deposition of coatings on subtrates
RU2494173C1 (ru) * 2012-01-23 2013-09-27 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Нижегородский государственный технический университет им. Р.Е. Алексеева" (НГТУ) Способ вакуумно-плазменного осаждения покрытия на режущую пластину из твердосплавного материала
US10612123B2 (en) 2015-02-04 2020-04-07 The University Of Akron Duplex surface treatment for titanium alloys
MX2018014171A (es) * 2016-05-17 2019-08-26 Commonwealth Steel Company Pty Ltd Proceso de tratamiento de superficie.
RU2674795C1 (ru) * 2017-10-05 2018-12-13 Федеральное государственное бюджетное учреждение науки Институт физики металлов имени М.Н. Михеева Уральского отделения Российской академии наук (ИФМ УрО РАН) Многослойное износостойкое покрытие на стальной подложке
CN110142409B (zh) * 2019-06-25 2024-05-14 华北理工大学 一种高压选区激光熔化制备含氮合金的方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63288991A (ja) * 1987-05-20 1988-11-25 Sumitomo Electric Ind Ltd ダイヤモンドの気相合成法
JPH03166369A (ja) * 1989-11-22 1991-07-18 Toyota Motor Corp ダイヤモンド膜の形成方法
JPH05230632A (ja) * 1991-07-12 1993-09-07 Kawasaki Heavy Ind Ltd 無機誘電体薄膜の製造方法
EP0578232A1 (fr) * 1992-07-09 1994-01-12 Sumitomo Electric Industries, Limited Procédé pour synthétiser du diamant

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4388517A (en) * 1980-09-22 1983-06-14 Texas Instruments Incorporated Sublimation patterning process
US4948629A (en) * 1989-02-10 1990-08-14 International Business Machines Corporation Deposition of diamond films
JPH07113147B2 (ja) * 1991-11-01 1995-12-06 工業技術院長 新炭素材料の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63288991A (ja) * 1987-05-20 1988-11-25 Sumitomo Electric Ind Ltd ダイヤモンドの気相合成法
JPH03166369A (ja) * 1989-11-22 1991-07-18 Toyota Motor Corp ダイヤモンド膜の形成方法
JPH05230632A (ja) * 1991-07-12 1993-09-07 Kawasaki Heavy Ind Ltd 無機誘電体薄膜の製造方法
EP0578232A1 (fr) * 1992-07-09 1994-01-12 Sumitomo Electric Industries, Limited Procédé pour synthétiser du diamant

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
"LASER-ASSISTED, CHEMICAL VAPOR DEPOSITION OF HIGH-PURITY GRAPHITE", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 33, no. 10B, 1 March 1991 (1991-03-01), pages 30, XP000109867 *
PATENT ABSTRACTS OF JAPAN vol. 013, no. 115 (C - 578) 20 March 1989 (1989-03-20) *
PATENT ABSTRACTS OF JAPAN vol. 015, no. 403 (C - 0875) 15 October 1991 (1991-10-15) *
PATENT ABSTRACTS OF JAPAN vol. 017, no. 693 (C - 1144) 17 December 1993 (1993-12-17) *
REBELLO J H D ET AL: "DIAMOND GROWTH BY LASER-DRIVEN REACTIONS IN A CO/H2 MIXTURE", APPLIED PHYSICS LETTERS, vol. 62, no. 8, 22 February 1993 (1993-02-22), pages 899 - 901, XP000338603 *
See also references of WO9531584A1 *

Also Published As

Publication number Publication date
AU3124295A (en) 1995-12-05
WO1995031584A1 (fr) 1995-11-23
EP0752018A1 (fr) 1997-01-08

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