EP0640610A2 - Liquid indium source - Google Patents

Liquid indium source Download PDF

Info

Publication number
EP0640610A2
EP0640610A2 EP94303593A EP94303593A EP0640610A2 EP 0640610 A2 EP0640610 A2 EP 0640610A2 EP 94303593 A EP94303593 A EP 94303593A EP 94303593 A EP94303593 A EP 94303593A EP 0640610 A2 EP0640610 A2 EP 0640610A2
Authority
EP
European Patent Office
Prior art keywords
trimethylindium
bubbler
solution
source
dissolved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP94303593A
Other languages
German (de)
French (fr)
Other versions
EP0640610A3 (en
EP0640610B1 (en
Inventor
Ravindra K. Kanjolia
Benjamin C. Hui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Morton International LLC
Original Assignee
CVD Inc
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CVD Inc, Morton International LLC filed Critical CVD Inc
Publication of EP0640610A2 publication Critical patent/EP0640610A2/en
Publication of EP0640610A3 publication Critical patent/EP0640610A3/en
Application granted granted Critical
Publication of EP0640610B1 publication Critical patent/EP0640610B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/301AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi

Definitions

  • the present invention is directed to a method of providing a uniform dosimetry of vapor phase trimethylindium for epitaxial growth processes, such as metalorganic chemical vapor deposition (MOCVD).
  • MOCVD metalorganic chemical vapor deposition
  • the most commonly used indium compound for MOCVD or other epitaxial deposition processes is trimethylindium.
  • Materials produced by epitaxial growth using trimethylindium as an indium source include, for example InP, InGaAs, InGaAlP, InGaAsP, InGaAs/GaAs/AlGaAs, InAs, InSb and InAsBi.
  • a well-known inherent disadvantage of trimethylindium as an indium source is the fact that it is a solid at room temperature.
  • Liquid sources of organometallic vapors are preferred to solid sources because a gas stream having a substantially constant partial pressure of organometallic vapors can be produced merely by bubbling carrier gas through the liquid at a constant rate.
  • the surface area is constantly changing as the organometallic source is vaporized.
  • solids, such as trimethylindium tend to recondense on surfaces of the gas pathway, further increasing the difficulty of providing a uniform partial pressure of the organometallic compound.
  • Trimethylindium being a solid, is an anomaly relative to other trialkylindiums, as C2-C5 alkylindiums are liquids at room temperature. This anomaly is the result of trimethylindium existing as a tetramer at room temperature, whereas other trialkylindiums are monomers.
  • trimethylindium having a relatively high vapor pressure, tends to be preferred.
  • trimethylindium may be dissolved in amine, its solubility is low, typically about 20%, requiring a large volume of trimethylindium source.
  • Amines complex with trimethylindium advantageously breaking up the tetramer, but disadvantageously tying up trimethylindium.
  • amine solvents are used which are highly purified, particularly with respect to volatile impurities. Nevertheless, if impurities are present, they may react with the trimethylindium, producing new, more volatile impurities.
  • even high boiling amines are entrained in the gas stream to some extent and may undesirably introduce nitrogen into the material which is being produced.
  • U.S. Patent No. 4,720,560 approaches the problem by mixing two moles of trimethylindium with a mole of triethylindium to produce ethyldimethylindium by the reversible reaction: 2 Me3In + Et3In ⁇ 3 EtMe2In.
  • the desired indium source in this approach is not trimethylindium, but ethyldimethylindium. Because the equilibrium is temperature-dependent with the equilibrium shifting to the right at lower temperatures, it is advised to maintain the mixture at a temperature below room temperature, e.g., at about 10°C. Such a lowered temperature may be disadvantageous if high vapor pressures are required for the crystal growth. Increasing the temperature may potentially cause the above equilibrium to shift to the left, and cause the ethyldimethylindium to dispreportionate.
  • a liquid source of indium comprises trimethylindium dissolved in a C3-C5 trialkylindium or mixture of C3-C5 trialkylindiums. Gas, such as hydrogen or helium, bubbled through this source entrains trimethylindium in monomeric form.
  • FIG. 1 is a diagrammatic illustration of apparatus used to deliver vaporized trimethylindium in the Example below.
  • FIG 2 is a graph, showing grams of trimethyl indium delivered charged against hours of delivery in the Example below.
  • tripropylindiums may be used as solvents, butylindiums, such, a tri n-butylindium (b.p. 85-6°C/0.1 mm Hg) and triisobutylindium (b.p. 71-2°C/0.05 mm Hg) (or mixtures of these isometric tributylindiums) are preferred because of their higher boiling point.
  • the solvents are preferably highly purified, e.g., to five 9's purity.
  • trialkylindiums as solvents for trimethylindium, relative to amines or hydrocarbons, are that any trace impurities, which in the case of the amine or hydrocarbon might react with trimethylindium to produce volatile impurities, would have already reacted with the higher trialkylindium to produce either a non-volatile impurity or a volatile impurity which would be removed in the purification process. Also, unlike amines which might introduce nitrogen into the material being deposited, the higher trialkylindiums introduce no element in addition to those present in trimethylindium. Like amine solvents, trialkylindium solvents break the tetrameric trimethylindium into monomeric form, which is the form that is vaporized.
  • Suitable carrier gases are those which are non-reactive with the trimethylindium or with the trialkylindium solvent. Hydrogen is the preferred carrier gas, but other gases, such as helium or argon may be used.
  • FIG. 1 The apparatus used in the experiment to determine the flow behavior of this solution is shown in Figure 1.
  • the inlet 9 of a stainless steel (SS) bubbler (source) 10 containing Bu3In/Me3In solution was connected through line 12 to a tank 14 of semiconductor grade N2 via a mass flow controller 16.
  • the outlet 17 of the bubbler 10 was connected through line 18 to the outlet 19 of another stainless steel bubbler (receiver) 20.
  • the second bubbler 20 is used in reverse orientation from normal for this experiment; thus flow from outlet 17 of bubbler 10 to outlet 19 of bubbler 20.
  • the receiver bubbler 20 was cooled by a coil condenser 22 maintained at -15 to -20°C.
  • the inlet 24 of this receiver was connected through line 26 to a dry ice-cooled trap 28 to condense the fugitive vapors from the receiver 20.
  • the trap 28 was connected through line 29 to a mineral oil bubbler 30 to maintain a by-pass of N2 gas.
  • Additional features of the apparatus include a three-way valve in line 12 used to evacuate the space between the inlet valve 34a of the nitrogen bubbler 10, several valves 34a, 34b, 34c, 34d, 34e throughout the line for set-up, and a vacuum connected to line 29 to evacuate the trap 30 and the space up to the receiver valve 34e after connections are made.
  • the source bubbler 10 was maintained at about 20°C while the carrier gas was passed through it at a rate of 500 SCCM. Such a high flow rate was chosen to deplete the contents of the bubbler 10 in a relatively less amount of time. It was observed that the saturation of the carrier gas with TMIn was approximately 40%. This is perhaps due to the high flow rate and somewhat lower source temperature. The saturation of the carrier gas can easily be increased to >80% by lowering the flow rate and increasing the source temperature to 30-40°C.
  • the amount of trimethylindium carried was monitored by the weight loss in the source bubbler. NMR spectra were obtained periodically to identify the material in the source bubbler and receiver bubbler. The data indicated that trimethylindium alone was carried through until toward the end. This has been confirmed by the gradual reduction of methyl peaks in the source bubbler.
  • the receiver contained a white solid-trimethylindium-as evidenced by its NMR.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

A uniform dosimetry of vapor phase trimethylindium is provided by dissolving trimethylindium in a C₃-C₅ trialkylindium and bubbling an inert carrier gas through the solution.

Description

  • The present invention is directed to a method of providing a uniform dosimetry of vapor phase trimethylindium for epitaxial growth processes, such as metalorganic chemical vapor deposition (MOCVD).
  • BACKGROUND OF THE INVENTION
  • The most commonly used indium compound for MOCVD or other epitaxial deposition processes is trimethylindium. Materials produced by epitaxial growth using trimethylindium as an indium source include, for example InP, InGaAs, InGaAlP, InGaAsP, InGaAs/GaAs/AlGaAs, InAs, InSb and InAsBi.
  • A well-known inherent disadvantage of trimethylindium as an indium source is the fact that it is a solid at room temperature. Liquid sources of organometallic vapors are preferred to solid sources because a gas stream having a substantially constant partial pressure of organometallic vapors can be produced merely by bubbling carrier gas through the liquid at a constant rate. With solids, on the other hand, the surface area is constantly changing as the organometallic source is vaporized. Furthermore, solids, such as trimethylindium, tend to recondense on surfaces of the gas pathway, further increasing the difficulty of providing a uniform partial pressure of the organometallic compound.
  • Trimethylindium, being a solid, is an anomaly relative to other trialkylindiums, as C₂-C₅ alkylindiums are liquids at room temperature. This anomaly is the result of trimethylindium existing as a tetramer at room temperature, whereas other trialkylindiums are monomers. However, from the standpoint of providing a sufficiently high vapor pressure for epitaxial growth applications, trimethylindium, having a relatively high vapor pressure, tends to be preferred.
  • Several approaches have been taken to eliminate complications due to uneven mass flow when using trimethylindium. Some of these include reverse flow of carrier gas through the bubbler; packing the trimethylindium in inert material, such as Teflon beads, in the bubbler; use of two or more trimethylindium bubblers in series; and "solution trimethylindium" where the trimethylindium is dissolved and/or suspended in a high boiling amine or high boiling hydrocarbon.
  • Those approaches in which the trimethylindium remains in solid phase, reduce, but do not eliminate, uneven mass flow.
  • While trimethylindium may be dissolved in amine, its solubility is low, typically about 20%, requiring a large volume of trimethylindium source. Amines complex with trimethylindium, advantageously breaking up the tetramer, but disadvantageously tying up trimethylindium. Because epitaxial growth applications require a source with very minimal high vapor pressure impurities, amine solvents are used which are highly purified, particularly with respect to volatile impurities. Nevertheless, if impurities are present, they may react with the trimethylindium, producing new, more volatile impurities. Also, even high boiling amines are entrained in the gas stream to some extent and may undesirably introduce nitrogen into the material which is being produced.
  • High boiling hydrocarbons avoid the problem of nitrogen. However, trimethylindium is even less soluble in hydrocarbons than amines, and the trimethylindium is more dispersed than dissolved in hydrocarbon media. Because hydrocarbons do not break up the tetramer, problems with deposition of trimethylindium in the gas pathway remain. Also, as with amines, there is the possibility that impurities will react with trimethylindium to produce volatile impurities.
  • U.S. Patent No. 4,720,560 approaches the problem by mixing two moles of trimethylindium with a mole of triethylindium to produce ethyldimethylindium by the reversible reaction:



            2 Me₃In + Et₃In → 3 EtMe₂In.



    The desired indium source in this approach is not trimethylindium, but ethyldimethylindium. Because the equilibrium is temperature-dependent with the equilibrium shifting to the right at lower temperatures, it is advised to maintain the mixture at a temperature below room temperature, e.g., at about 10°C. Such a lowered temperature may be disadvantageous if high vapor pressures are required for the crystal growth. Increasing the temperature may potentially cause the above equilibrium to shift to the left, and cause the ethyldimethylindium to dispreportionate.
  • SUMMARY OF THE INVENTION
  • In accordance with the invention, a liquid source of indium comprises trimethylindium dissolved in a C₃-C₅ trialkylindium or mixture of C₃-C₅ trialkylindiums. Gas, such as hydrogen or helium, bubbled through this source entrains trimethylindium in monomeric form.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a diagrammatic illustration of apparatus used to deliver vaporized trimethylindium in the Example below.
  • FIG 2 is a graph, showing grams of trimethyl indium delivered charged against hours of delivery in the Example below.
  • DETAILED DESCRIPTION OF CERTAIN PREFERRED EMBODIMENTS
  • Trimethylindium is highly soluble in high-boiling trialkylindiums, such as C₃-C₅ trialkylindiums. As is the case with the trimethylindium/triethylindium system, it is believed that a reversible reaction occurs when trimethylindium is introduced into a higher trialkylindium:
       Me₃In + (C₃-C₅alkyl)₃In → Mex(C₃-C₅alkyl)(3-x)In; where x = 1 or 2. Thus, up to two moles of trimethylindium can be dissolved into 1 mole of C₃-C₅ trialkylindium. For example, 320 grams of trimethylindium may be dissolved into 286 grams of tributylindium.
  • Although tripropylindiums may be used as solvents, butylindiums, such, a tri n-butylindium (b.p. 85-6°C/0.1 mm Hg) and triisobutylindium (b.p. 71-2°C/0.05 mm Hg) (or mixtures of these isometric tributylindiums) are preferred because of their higher boiling point. The solvents are preferably highly purified, e.g., to five 9's purity. An advantage of trialkylindiums as solvents for trimethylindium, relative to amines or hydrocarbons, are that any trace impurities, which in the case of the amine or hydrocarbon might react with trimethylindium to produce volatile impurities, would have already reacted with the higher trialkylindium to produce either a non-volatile impurity or a volatile impurity which would be removed in the purification process. Also, unlike amines which might introduce nitrogen into the material being deposited, the higher trialkylindiums introduce no element in addition to those present in trimethylindium. Like amine solvents, trialkylindium solvents break the tetrameric trimethylindium into monomeric form, which is the form that is vaporized.
  • Unlike the trimethylindium/triethylindium system described in U.S. Patent No. 4,720,560, essentially the only volatile species is trimethylindium. Also, at higher temperatures, where a higher vapor pressure of trimethylindium is achieved, the equilibrium shifts to the left, enhancing the amount of trimethylindium available for entrainment by the carrier gas. As a result, the bubbler may be maintained at higher temperatures, 17-40°C being a typical temperature for the bubbler. As a consequence of there being a single volatile species which is constantly replenished by the equilibrium of the reaction, the amount of trimethylindium entrained by a carrier gas tends to be very constant over time, until trimethylindium is substantially depleted, whereupon a rather sharp drop-off may occur. By depositing in the trimethylindium concentration range where the mass flow of trimethylindium is constant, more uniform epitaxial growth may be achieved.
  • To provide the most constant mass flow of trimethylindium, it is advantageous to initially provide a saturated or nearly saturated solution of trimethyl indium.
  • Suitable carrier gases are those which are non-reactive with the trimethylindium or with the trialkylindium solvent. Hydrogen is the preferred carrier gas, but other gases, such as helium or argon may be used.
  • Example
  • To illustrate the invention, the following experiment was conducted. Inside a nitrogen filled glove box, 18 grams of trimethylindium (0.11 mol) was dissolved in 15 grams of tri n-butylindium (0.05 mol) in a stainless steel bubbler. A clear colorless solution resulted which by NMR showed the formulation of BuMe₂In. Further dissolution of trimethylindium (TMI) was not possible as it started to settle down. The density of this solution was approximately 2 g/mL at room temperature.
  • The apparatus used in the experiment to determine the flow behavior of this solution is shown in Figure 1. The inlet 9 of a stainless steel (SS) bubbler (source) 10 containing Bu₃In/Me₃In solution was connected through line 12 to a tank 14 of semiconductor grade N₂ via a mass flow controller 16. The outlet 17 of the bubbler 10 was connected through line 18 to the outlet 19 of another stainless steel bubbler (receiver) 20. (The second bubbler 20 is used in reverse orientation from normal for this experiment; thus flow from outlet 17 of bubbler 10 to outlet 19 of bubbler 20.) The receiver bubbler 20 was cooled by a coil condenser 22 maintained at -15 to -20°C. The inlet 24 of this receiver was connected through line 26 to a dry ice-cooled trap 28 to condense the fugitive vapors from the receiver 20. The trap 28 was connected through line 29 to a mineral oil bubbler 30 to maintain a by-pass of N₂ gas.
  • Additional features of the apparatus include a three-way valve in line 12 used to evacuate the space between the inlet valve 34a of the nitrogen bubbler 10, several valves 34a, 34b, 34c, 34d, 34e throughout the line for set-up, and a vacuum connected to line 29 to evacuate the trap 30 and the space up to the receiver valve 34e after connections are made.
  • The source bubbler 10 was maintained at about 20°C while the carrier gas was passed through it at a rate of 500 SCCM. Such a high flow rate was chosen to deplete the contents of the bubbler 10 in a relatively less amount of time. It was observed that the saturation of the carrier gas with TMIn was approximately 40%. This is perhaps due to the high flow rate and somewhat lower source temperature. The saturation of the carrier gas can easily be increased to >80% by lowering the flow rate and increasing the source temperature to 30-40°C.
  • The amount of trimethylindium carried was monitored by the weight loss in the source bubbler. NMR spectra were obtained periodically to identify the material in the source bubbler and receiver bubbler. The data indicated that trimethylindium alone was carried through until toward the end. This has been confirmed by the gradual reduction of methyl peaks in the source bubbler. The receiver contained a white solid-trimethylindium-as evidenced by its NMR.
  • The dosimetry of trimethylindium is shown in figure 2. A linear relationship exists up to 110 hours with a gradual slow down in the delivery of TMIn toward the end. In this experiment, approximately 13 grams of the total 15 grams of TMIn (3.0 grams was consumed for NMR samples) was transported in a very uniform manner corresponding to 85% of the initial amount of TMIn. The delivery of TMIn did not drop off even at this stage and showed no erratic delivery behavior. The NMR spectrum indicated a n-Bu₃In rich solution with >80% less TMIn than the initial mixture. These data confirm that TMIn could be consistently delivered for an extended period of time with a uniform rate. Furthermore, it is believed that this uniform delivery can be further enhanced by suspending additional TMIn in this solution.

Claims (5)

  1. A method of providing vapor phase trimethylindium comprising dissolving trimethylindium in a C₃-C₅ trialkylindium solvent to produce a solution and entraining trimethylindium from said solution with a carrier gas.
  2. A method according to claim 1 wherein said solvent comprises tri n-butylindium, triisobutylindium or a mixture thereof.
  3. A method according to claim 1 or claim 2 wherein said trimethylindium is dissolved at a molar ratio relative to said solvent of at least 0.05:1.
  4. A solution comprising a C₃-C₅trialkylindium solvent and trimethylindium dissolved therein.
  5. A solution according to claim 4 wherein said trimethylindium is dissolved at a molar ratio relative to said solvent of at least 0.05:1.
EP94303593A 1993-07-27 1994-05-19 Liquid indium source Expired - Lifetime EP0640610B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US97821 1993-07-27
US08/097,821 US5502227A (en) 1993-07-27 1993-07-27 Liquid indium source

Publications (3)

Publication Number Publication Date
EP0640610A2 true EP0640610A2 (en) 1995-03-01
EP0640610A3 EP0640610A3 (en) 1995-04-12
EP0640610B1 EP0640610B1 (en) 2000-04-19

Family

ID=22265288

Family Applications (1)

Application Number Title Priority Date Filing Date
EP94303593A Expired - Lifetime EP0640610B1 (en) 1993-07-27 1994-05-19 Liquid indium source

Country Status (7)

Country Link
US (1) US5502227A (en)
EP (1) EP0640610B1 (en)
JP (1) JP2596713B2 (en)
KR (1) KR0144640B1 (en)
CA (1) CA2124052C (en)
DE (1) DE69424007T2 (en)
TW (1) TW253888B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5783716A (en) * 1996-06-28 1998-07-21 Advanced Technology Materials, Inc. Platinum source compositions for chemical vapor deposition of platinum
JP2003252878A (en) * 2002-01-17 2003-09-10 Shipley Co Llc Organic indium compound
JP4954448B2 (en) 2003-04-05 2012-06-13 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. Organometallic compounds
JP4689969B2 (en) * 2003-04-05 2011-06-01 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. Preparation of Group IVA and Group VIA compounds
JP4714422B2 (en) 2003-04-05 2011-06-29 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. Method for depositing germanium-containing film and vapor delivery device
PL1747302T3 (en) * 2004-05-20 2013-05-31 Akzo Nobel Chemicals Int Bv Bubbler for constant vapor delivery of a solid chemical
US20060121192A1 (en) * 2004-12-02 2006-06-08 Jurcik Benjamin J Liquid precursor refill system
EP3173507A1 (en) * 2015-11-25 2017-05-31 Umicore AG & Co. KG Method for the organometallic gas phase deposition under use of solutions of indiumalkyl compounds in hydrocarbons

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0181706A1 (en) * 1984-10-25 1986-05-21 Morton Thiokol, Inc. Hybrid organometallic compounds of In and ba and process for metal organic chemical vapour deposition
US4847399A (en) * 1987-01-23 1989-07-11 Morton Thiokol, Inc. Process for preparing or purifying Group III-A organometallic compounds
WO1993003196A1 (en) * 1991-07-30 1993-02-18 Shell Internationale Research Maatschappij B.V. Method for deposition of a metal

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0181706A1 (en) * 1984-10-25 1986-05-21 Morton Thiokol, Inc. Hybrid organometallic compounds of In and ba and process for metal organic chemical vapour deposition
US4847399A (en) * 1987-01-23 1989-07-11 Morton Thiokol, Inc. Process for preparing or purifying Group III-A organometallic compounds
WO1993003196A1 (en) * 1991-07-30 1993-02-18 Shell Internationale Research Maatschappij B.V. Method for deposition of a metal

Also Published As

Publication number Publication date
KR0144640B1 (en) 1998-07-15
KR950003196A (en) 1995-02-16
JP2596713B2 (en) 1997-04-02
DE69424007T2 (en) 2000-09-14
JPH07150357A (en) 1995-06-13
CA2124052A1 (en) 1995-01-28
CA2124052C (en) 1996-11-26
EP0640610A3 (en) 1995-04-12
EP0640610B1 (en) 2000-04-19
TW253888B (en) 1995-08-11
DE69424007D1 (en) 2000-05-25
US5502227A (en) 1996-03-26

Similar Documents

Publication Publication Date Title
JP4874618B2 (en) Method for depositing film and vapor delivery apparatus
US4792467A (en) Method for vapor phase deposition of gallium nitride film
EP0640610B1 (en) Liquid indium source
Larsen et al. GaAs growth using tertiarybutylarsine and trimethylgallium
Cooper et al. The organometallic VPE growth of GaAs 1− y Sb y using trimethylantimony and Ga 1− x In x As using trimethylarsenic
Stuczynski et al. Formation of indium phosphide from trimethylindium (In (CH3) 3) and tris (trimethylsilyl) phosphine (P (Si (CH3) 3) 3)
EP1335415B1 (en) Organoindium compounds for use in chemical vapour deposition processes
US4740606A (en) Gallium hydride/trialkylamine adducts, and their use in deposition of III-V compound films
US6797182B2 (en) Process for the purification of organometallic compounds or heteroatomic organic compounds with hydrogenated getter alloys
Bhat OMCVD growth of GaAs and AlGaAs using a solid as source
EP1061083B1 (en) Adduct of a dialkylgalliumazide with hydrazine for MOCVD of GaN
US20030035763A1 (en) Process for the purification of organometallic compounds or heteroatomic organic compounds with a catalyst based on iron and manganese supported on zeolites
EP0443815B1 (en) Vapor deposition of arsenic-containing films
Hostalhe et al. New group III precursors for the MOVPE of GaAs and InP based material
Weyers New starting materials for MOMBE
JP3560457B2 (en) Vaporization container for liquid source for vapor phase growth
Tsuda et al. Atomic layer epitaxial growth mechanism of a gallium layer on the (100) As surface of GaAs crystals in MOVPE
JPS60500954A (en) Tetramethyltin dopant source for MOCVD grown epitaxial semiconductor layers
KR950011016B1 (en) Semiconductor epitaxy growth method using ultra high vacuum chemical vapor deposition
WO1991009995A2 (en) Process for the deposition of thin films on solids
Hoshino The relationship between the pyrolysis of trimethylgallium in the gas phase and that on the surface
Frigo et al. Ligand exchange in adducts of ethylaluminum hydrides
WO2001078869A1 (en) A process for the purification of organometallic compounds or heteroatomic organic compounds with a palladium-based catalyst
MEYER et al. A characterization of the chemical vapor deposition of gallium arsenide and indium phosphide in the hydride and chloride systems(Interim Report, Jan. 1982- Dec. 1984)

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): CH DE FR GB IT LI NL

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): CH DE FR GB IT LI NL

17P Request for examination filed

Effective date: 19950502

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: MORTON INTERNATIONAL, INC.

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: MORTON INTERNATIONAL, INC.

17Q First examination report despatched

Effective date: 19980408

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): CH DE FR GB IT LI NL

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REF Corresponds to:

Ref document number: 69424007

Country of ref document: DE

Date of ref document: 20000525

ITF It: translation for a ep patent filed
REG Reference to a national code

Ref country code: CH

Ref legal event code: NV

Representative=s name: KIRKER & CIE SA

ET Fr: translation filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

26N No opposition filed
REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20040429

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20040512

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20040519

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 20040524

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20040630

Year of fee payment: 11

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 20050519

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050519

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050531

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20050531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20051201

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20051201

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20050519

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20060131

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee

Effective date: 20051201

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20060131