EP0627330B1 - Verfahren zur Herstellung von gravierten Prägungen vorgesehen mit kontrastierendem Material - Google Patents

Verfahren zur Herstellung von gravierten Prägungen vorgesehen mit kontrastierendem Material Download PDF

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Publication number
EP0627330B1
EP0627330B1 EP19940810320 EP94810320A EP0627330B1 EP 0627330 B1 EP0627330 B1 EP 0627330B1 EP 19940810320 EP19940810320 EP 19940810320 EP 94810320 A EP94810320 A EP 94810320A EP 0627330 B1 EP0627330 B1 EP 0627330B1
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EP
European Patent Office
Prior art keywords
protective layer
contrast material
deposited
varnish
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP19940810320
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English (en)
French (fr)
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EP0627330A1 (de
Inventor
Branko Glavan
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Individual
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Individual
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Publication date
Application filed by Individual filed Critical Individual
Publication of EP0627330A1 publication Critical patent/EP0627330A1/de
Application granted granted Critical
Publication of EP0627330B1 publication Critical patent/EP0627330B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/225—Removing surface-material, e.g. by engraving, by etching by engraving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/04—Producing precipitations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/222—Removing surface-material, e.g. by engraving, by etching using machine-driven mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • B44C1/228—Removing surface-material, e.g. by engraving, by etching by laser radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Definitions

  • the present invention relates to a method for obtaining an engraved imprint provided with a contrast material, on a metallic, ceramic or glass substrate, according to which the substrate is temporarily covered, before etching, with a protective layer. .
  • This method is intended in particular for obtaining imprints engraved on watch glasses, in particular rotating glasses bearing numbers and graduations.
  • the engraving is generally carried out with acid.
  • the image of the imprint to be engraved on the substrate is formed by decal, then the substrate is galvanically coated with a protective layer.
  • the decal is then removed, followed by acid etching, after which the protective layer is removed in turn chemically.
  • PVD cathode sputtering
  • the object of the present invention is to obtain an engraved imprint provided with a contrast material which obviates the defects of the imprints imprinted by known methods, more precisely to obtain an imprint in which the contrast material is deposited very cleanly and has a great adhesion to the substrate.
  • the method according to the invention is characterized in that after etching, a contrasting material of metallic or mineral type is deposited under vacuum, before removing the protective layer, then the protective layer is removed and, with it the contrast material deposited on this protective layer, so that the construction material remains only in the imprint.
  • the contrast material has a hardness and adhesion much higher than that of a varnish and this also on the protective layer. It was therefore thought first of all that it would be very difficult to remove the protective layer, this being protected by the deposited contrast material. However, it has been found that it is possible to chemically attack a metallic protective layer through the layer of contrast material, either by dislocating the latter by heat treatment, or by using the porosity of the contrast material. .
  • a protective lead layer dislocates the layer of construction material deposited on the lead by heating the lead to its melting point.
  • This method can be applied with any protective layer having a melting point substantially lower than that of the substrate.
  • Vacuum deposition of the contrast material can also be done by vacuum metallization or by ion implantation.
  • the protective layer may also consist of a varnish of a different nature from the varnish used for the decal. In this case, the removal of these varnishes is not done by selective dissolution, so as not to remove the protective layer with the decal.
  • the engraving can be carried out with acid or mechanically.
  • the method according to the invention makes it possible to obtain a deposit of contrast material having good adhesion, good chemical resistance and, in the case of vacuum metallization, a wide choice of colors.
  • a decal 2 is deposited, consisting of a varnish (phase A).
  • the method described so far is a known method of engraving.
  • the chosen composition is then deposited by cathode sputtering (PVD), for example a titanium carbide or nitride, which forms a layer 6 over the entire surface of the substrate, that is to say as well over the lead layer 3 as in imprint 5.
  • PVD cathode sputtering
  • the substrate is then heated to the lead melting temperature, which has the effect of dislocating the decorative layer 6 deposited on the lead.
  • the lead is then removed in a bath, for example an ERNE® bath, and the browning is also removed by dissolution.
  • a substrate 1 is obtained having an etched imprint covered with a layer 7 of contrast material. This layer has very high strength and excellent adhesion.
  • This method can be used with various substrates, for example a gold, platinum, titanium, metal, ceramic or glass substrate.
  • the decorative layer 6 could also be deposited by ion implantation. The adhesion of the layer would be even better. Another solution is to deposit the decorative layer 6 by vacuum metallization. The layer obtained has an average adhesion, but on the other hand a much wider choice of colors than by sputtering. However, such a layer has good chemical resistance.
  • the engraving process is susceptible to many variations.
  • the savings layer 2 could in particular consist of a photoresist layer.
  • the protective layer 3 which has the function of effectively protecting the part during the etching, it must at the same time have different physical or chemical characteristics from the substrate and from the decorative layer 6 to allow an effective unraveling of this layer of protection without damaging the piece and the decorative layer deposited in the engraved imprint.
  • a galvanically deposited protective layer it is possible to use for example lead, a mixture of tin and lead, indium, gallium, gold, nickel, etc. Removing these layers without removing the decorative layer can be selectively by several methods, such as selective chemical attack, supercooling or the use of the porosity of the decorative layers.
  • the protective layer 3 can also consist of a varnish.
  • This varnish will, for example, be of a different nature from the varnish constituting the sparing layer 2 to allow the selective dissolution of the latter. It is also possible to cover the entire substrate with any varnish and to remove this varnish, on the surface to be etched, by laser attack.
  • the protective layer 3 could be in photoresist.
  • the surface to be etched 4 would then be released by photolithography.
  • the engraving could also be carried out mechanically, for example by means of a numerically controlled machine.
  • a protective layer which, unlike the state C shown in the drawing, completely covers the surface of the substrate. The process then takes place as previously according to E and F.
  • the engraving could be performed by laser.
  • the deposition of a contrast material by vacuum deposition also has the advantage of being able to be carried out at relatively low temperatures, not resulting in no permanent deformation of the substrate. Such methods are also environmentally friendly.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)

Claims (10)

  1. Verfahren zur Herstellung eines gravierten Abdrucks (5), der mit einem Kontrastmaterial (7) versehen ist, auf einem metallischen, keramischen oder aus Glas bestehenden Substrat (1), wonach das Substrat vor dem Gravieren vorübergehend mit einer Schutzschicht (3) bedeckt wird und wonach nach dem Gravieren, bevor die Schutzschicht (3) beseitigt wird, ein metallisches oder mineralisches Kontrastmaterial (6) unter Vakuum aufgebracht wird und dann die Schutzschicht (3) und mit ihr das auf dieser Schutzschicht aufgebrachte Kontrastmaterial beseitigt wird, derart, dass das Kontrastmaterial nur im Abdruck (7) verbleibt.
  2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass das Kontrastmaterial durch kathodisches Pulverisieren aufgebracht wird.
  3. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass das Kontrastmaterial durch Metallisieren unter Vakuum aufgebracht wird.
  4. Verfahren nach Anspruch 1, dadurch gekennzeichnet, dass das Kontrastmaterial durch Ionenimplantation aufgebracht wird.
  5. Verfahren nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, dass die Schutzschicht (3) eine galvanische Schicht ist.
  6. Verfahren nach Anspruch 5, dadurch gekennzeichnet, dass die Schutzschicht einen Schmelzpunkt aufweist, der merklich niedriger als der des Substrats und des aufgebrachten Kontrastmaterials (6) ist, und dass zur Beseitigung der Schutzschicht das Substrat auf die Schmelztemperatur der Schutzschicht erwärmt wird, derart, dass die auf die Schutzschicht aufgebrachte Schicht des Kontrastmaterials verlagert wird, so dass die Schutzschicht chemisch angegriffen werden kann.
  7. Verfahren nach Anspruch 5, dadurch gekennzeichnet, dass die Schutzschicht aus Blei, Zinn-Blei, Indium, Gallium, Gold oder Nickel besteht.
  8. Verfahren nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, dass die Schutzschicht ein Lack und die zu gravierende Oberfläche beispielsweise durch Laserbehandlung freigesetzt ist.
  9. Verfahren nach einem der Ansprüche 1 bis 7, dadurch gekennzeichnet, dass das Gravieren mit einer Säure oder mechanisch durchgeführt wird.
  10. Verfahren nach Anspruch 9, bei welchem die Stelle des zu gravierenden Abdrucks vor dem Aufbringen der ebenfalls aus einem Lack bestehenden Schutzschicht durch einen Lack geschützt wird, dadurch gekennzeichnet, dass zwei Lacke unterschiedlicher Natur verwendet werden, welche es erlauben, allein den die zu gravierende Oberfläche schützenden Lack selektiv aufzulösen.
EP19940810320 1993-06-03 1994-06-01 Verfahren zur Herstellung von gravierten Prägungen vorgesehen mit kontrastierendem Material Expired - Lifetime EP0627330B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH1655/93 1993-06-03
CH165593A CH684915B5 (fr) 1993-06-03 1993-06-03 Procédé d'obtention d'une empreinte gravée pourvue d'un matériau de contraste.

Publications (2)

Publication Number Publication Date
EP0627330A1 EP0627330A1 (de) 1994-12-07
EP0627330B1 true EP0627330B1 (de) 1997-05-02

Family

ID=4215540

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19940810320 Expired - Lifetime EP0627330B1 (de) 1993-06-03 1994-06-01 Verfahren zur Herstellung von gravierten Prägungen vorgesehen mit kontrastierendem Material

Country Status (3)

Country Link
EP (1) EP0627330B1 (de)
CH (1) CH684915B5 (de)
DE (1) DE69402913D1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108394224A (zh) * 2017-02-07 2018-08-14 王京 在古瓷残片上镶嵌纯金丝、纯银丝的方法及其按压器

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2744066A1 (fr) * 1996-01-30 1997-08-01 Otis Elevator Co Procede d'impression laser
US8008599B2 (en) * 2007-07-09 2011-08-30 Nike, Inc. Method for manufacturing layered elements with incisions
FR2927839B1 (fr) * 2008-02-22 2013-04-05 Novatec Procede de tracabilite de bouteilles par marquage inalterable et lisible automatiquement a la volee.

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH344654A (de) * 1955-07-30 1960-02-15 Vogt Alois Dr Verfahren zur Herstellung scharf begrenzter erhabener Zeichen auf einer Unterlage
GB957292A (en) * 1963-04-24 1964-05-06 Iwatani & Co A method of forming an etched and coloured pattern
JPS60432B2 (ja) * 1978-03-27 1985-01-08 凸版印刷株式会社 部分着色金属化粧板
IT1092437B (it) * 1978-02-07 1985-07-12 Sambonet Spa Processo per l'ottenimento di decorazioni metalliche su superfici metalliche

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108394224A (zh) * 2017-02-07 2018-08-14 王京 在古瓷残片上镶嵌纯金丝、纯银丝的方法及其按压器
CN108394224B (zh) * 2017-02-07 2020-06-26 王京 在古瓷残片上镶嵌纯金丝、纯银丝的方法

Also Published As

Publication number Publication date
EP0627330A1 (de) 1994-12-07
CH684915GA3 (fr) 1995-02-15
DE69402913D1 (de) 1997-06-05
CH684915B5 (fr) 1995-08-15

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